TW344799B - Magnetic sensor utilizing impedance variation of a soft magnetic element in dependence upon a magnetic field strength and a method of manufacturing the same - Google Patents

Magnetic sensor utilizing impedance variation of a soft magnetic element in dependence upon a magnetic field strength and a method of manufacturing the same

Info

Publication number
TW344799B
TW344799B TW086113435A TW86113435A TW344799B TW 344799 B TW344799 B TW 344799B TW 086113435 A TW086113435 A TW 086113435A TW 86113435 A TW86113435 A TW 86113435A TW 344799 B TW344799 B TW 344799B
Authority
TW
Taiwan
Prior art keywords
field strength
dependence
magnetic
soft magnetic
manufacturing
Prior art date
Application number
TW086113435A
Other languages
English (en)
Inventor
Akihiro Isomura
Kenichi Arai
Original Assignee
Tokiin Corp
Kenichi Arai
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP24486096A external-priority patent/JP3210933B2/ja
Priority claimed from JP24507196A external-priority patent/JP3203547B2/ja
Priority claimed from JP24672796A external-priority patent/JP3385501B2/ja
Application filed by Tokiin Corp, Kenichi Arai filed Critical Tokiin Corp
Application granted granted Critical
Publication of TW344799B publication Critical patent/TW344799B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09—Magnetoresistive devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09—Magnetoresistive devices
    • G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Measuring Magnetic Variables (AREA)
  • Hall/Mr Elements (AREA)
TW086113435A 1996-09-17 1997-09-17 Magnetic sensor utilizing impedance variation of a soft magnetic element in dependence upon a magnetic field strength and a method of manufacturing the same TW344799B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP24486096A JP3210933B2 (ja) 1996-09-17 1996-09-17 磁気検出素子及びその製造方法
JP24507196A JP3203547B2 (ja) 1996-09-17 1996-09-17 磁気検出素子
JP24672796A JP3385501B2 (ja) 1996-09-18 1996-09-18 磁気検出素子

Publications (1)

Publication Number Publication Date
TW344799B true TW344799B (en) 1998-11-11

Family

ID=27333293

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086113435A TW344799B (en) 1996-09-17 1997-09-17 Magnetic sensor utilizing impedance variation of a soft magnetic element in dependence upon a magnetic field strength and a method of manufacturing the same

Country Status (8)

Country Link
US (2) US6069475A (zh)
EP (2) EP0965851B1 (zh)
CN (2) CN1110794C (zh)
DE (2) DE69705095T2 (zh)
HK (1) HK1004822A1 (zh)
MY (1) MY130911A (zh)
SG (2) SG82576A1 (zh)
TW (1) TW344799B (zh)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3344468B2 (ja) * 1998-12-21 2002-11-11 アルプス電気株式会社 薄膜磁気ヘッド
JP2000284028A (ja) * 1999-03-30 2000-10-13 Kaneo Mori 薄膜磁性体ｍｉ素子
EP1045375A3 (en) * 1999-04-15 2006-03-08 Matsushita Electric Industrial Co., Ltd. Magnetic reproduction device, magnetic head using the device and method for producing the magnetic head
US6538843B1 (en) 1999-11-09 2003-03-25 Matsushita Electric Industrial Co., Ltd. Magnetic head
KR100383564B1 (ko) * 2000-02-17 2003-05-12 주식회사 코디소프트 임피던스 밸브형 물질 형성 방법 및 그 임피던스 밸브형 물질
JP2002056510A (ja) * 2000-08-07 2002-02-22 Matsushita Electric Ind Co Ltd シールド型磁気ヘッド並びに磁気再生装置
JP2002208118A (ja) * 2001-01-04 2002-07-26 Tdk Corp 薄膜磁気ヘッド装置
US6727692B2 (en) 2001-02-15 2004-04-27 Petru Ciureanu Magnetic field sensor with enhanced sensitivity, internal biasing and magnetic memory
KR20040019018A (ko) 2001-07-19 2004-03-04 마쯔시다덴기산교 가부시키가이샤 자기센서 및 그 제조방법
US6853186B2 (en) * 2002-01-15 2005-02-08 National University Of Singapore Variable permeability magnetic field sensor and method
US7196514B2 (en) * 2002-01-15 2007-03-27 National University Of Singapore Multi-conductive ferromagnetic core, variable permeability field sensor and method
EP1450378A3 (en) * 2003-02-24 2006-07-05 TDK Corporation Soft magnetic member, method for manufacturing thereof and electromagnetic wave controlling sheet
KR100743384B1 (ko) * 2003-07-18 2007-07-30 아이치 세이코우 가부시키가이샤 3차원 자기 방위센서 및 마그네토-임피던스 센서 소자
US7554324B2 (en) * 2003-10-28 2009-06-30 Honeywell International Inc. Turbine blade proximity sensor and control system
US20050237197A1 (en) * 2004-04-23 2005-10-27 Liebermann Howard H Detection of articles having substantially rectangular cross-sections
US6998538B1 (en) 2004-07-30 2006-02-14 Ulectra Corporation Integrated power and data insulated electrical cable having a metallic outer jacket
US7208684B2 (en) 2004-07-30 2007-04-24 Ulectra Corporation Insulated, high voltage power cable for use with low power signal conductors in conduit
US7145321B2 (en) 2005-02-25 2006-12-05 Sandquist David A Current sensor with magnetic toroid
JP4283263B2 (ja) * 2005-10-20 2009-06-24 本田技研工業株式会社 磁歪式トルクセンサの製造方法
US8461834B2 (en) 2009-02-27 2013-06-11 Aichi Steel Corporation Magneto-impedance sensor element and method for manufacturing the same
US8269490B2 (en) * 2009-04-03 2012-09-18 Honeywell International Inc. Magnetic surface acoustic wave sensor apparatus and method
CN101880858B (zh) * 2009-05-06 2015-07-29 光洋应用材料科技股份有限公司 高磁通量的钴铁基合金磁性溅射靶材及其制造方法
US8994366B2 (en) 2012-12-12 2015-03-31 Ascension Technology Corporation Magnetically tracked sensor
US20180266991A1 (en) * 2017-03-15 2018-09-20 Qualcomm Incorporated Magneto-impedance (mi) sensors employing current confinement and exchange bias layer(s) for increased sensitivity
JP7203490B2 (ja) 2017-09-29 2023-01-13 昭和電工株式会社 磁気センサ集合体及び磁気センサ集合体の製造方法
JP6516057B1 (ja) * 2017-12-26 2019-05-22 Tdk株式会社 磁気センサ
CN111323737B (zh) * 2020-04-09 2021-03-02 西安交通大学 一种阻抗敏感型磁传感器及其硬件检测电路
JP2022030276A (ja) * 2020-08-06 2022-02-18 昭和電工株式会社 磁気センサ回路および磁界検出装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4635152A (en) * 1983-07-29 1987-01-06 Kabushiki Kaisha Toshiba Magnetic resonance-type playback apparatus including a magnetic material having magnetic anisotropy
US5390061A (en) * 1990-06-08 1995-02-14 Hitachi, Ltd. Multilayer magnetoresistance effect-type magnetic head
JP3082377B2 (ja) * 1991-02-28 2000-08-28 ソニー株式会社 分布定数回路型磁界検出装置
JPH05303724A (ja) * 1992-02-26 1993-11-16 Hitachi Ltd 磁気ディスク装置
JP3272423B2 (ja) * 1992-12-01 2002-04-08 科学技術振興事業団 磁気インダクタンス素子の製造方法、磁気インダクタンス素子、磁界センサ、および磁気スイッチハイブリッドｉｃデバイス
DE69431614T2 (de) * 1993-08-25 2003-06-12 Nippon Telegraph & Telephone Magnetfeldmessverfahren und -vorrichtung
JPH07248365A (ja) * 1994-03-10 1995-09-26 Sumitomo Metal Mining Co Ltd 磁気・磁気方位センサ及び磁気・磁気方位測定方法
JP3360519B2 (ja) * 1995-03-17 2002-12-24 株式会社豊田中央研究所 積層型磁界検出装置
US5978186A (en) * 1996-03-14 1999-11-02 Matsushita Electric Industrial Co., Ltd. Magnetic head and reproducing apparatus with head having central core with winding thereabout and wire therethrough

Also Published As

Publication number Publication date
DE69705095D1 (de) 2001-07-12
CN1186295A (zh) 1998-07-01
EP0831335A3 (en) 1998-06-03
SG82576A1 (en) 2001-08-21
HK1004822A1 (en) 1998-12-11
DE69714613T2 (de) 2003-04-10
EP0965851A3 (en) 2000-03-15
EP0831335B1 (en) 2001-06-06
EP0965851A2 (en) 1999-12-22
CN1432998A (zh) 2003-07-30
MY130911A (en) 2007-07-31
US6069475A (en) 2000-05-30
US6255813B1 (en) 2001-07-03
SG89311A1 (en) 2002-06-18
EP0965851B1 (en) 2002-08-07
DE69714613D1 (de) 2002-09-12
EP0831335A2 (en) 1998-03-25
DE69705095T2 (de) 2002-02-07
CN1110794C (zh) 2003-06-04

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees