TW252223B - - Google Patents
Info
- Publication number
- TW252223B TW252223B TW083106944A TW83106944A TW252223B TW 252223 B TW252223 B TW 252223B TW 083106944 A TW083106944 A TW 083106944A TW 83106944 A TW83106944 A TW 83106944A TW 252223 B TW252223 B TW 252223B
- Authority
- TW
- Taiwan
- Prior art keywords
- pct
- gas
- sec
- date
- smif
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/14—Wafer cassette transporting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Packaging Frangible Articles (AREA)
- Packaging For Recording Disks (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4326308A DE4326308C1 (de) | 1993-08-05 | 1993-08-05 | Transportvorrichtung für Magazine zur Aufnahme scheibenförmiger Objekte |
Publications (1)
Publication Number | Publication Date |
---|---|
TW252223B true TW252223B (zh) | 1995-07-21 |
Family
ID=6494527
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW083106944A TW252223B (zh) | 1993-08-05 | 1994-07-29 |
Country Status (7)
Country | Link |
---|---|
US (1) | US5575081A (zh) |
EP (1) | EP0664049B1 (zh) |
KR (1) | KR0180793B1 (zh) |
AT (1) | ATE172324T1 (zh) |
DE (2) | DE4326308C1 (zh) |
TW (1) | TW252223B (zh) |
WO (1) | WO1995005002A1 (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8075690B2 (en) | 2004-09-20 | 2011-12-13 | Applied Materials, Inc. | Diffuser gravity support |
US8074599B2 (en) | 2004-05-12 | 2011-12-13 | Applied Materials, Inc. | Plasma uniformity control by gas diffuser curvature |
US8083853B2 (en) | 2004-05-12 | 2011-12-27 | Applied Materials, Inc. | Plasma uniformity control by gas diffuser hole design |
US8328939B2 (en) | 2004-05-12 | 2012-12-11 | Applied Materials, Inc. | Diffuser plate with slit valve compensation |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4425208C2 (de) * | 1994-07-16 | 1996-05-09 | Jenoptik Technologie Gmbh | Einrichtung zur Kopplung von Be- und Entladegeräten mit Halbleiterbearbeitungsmaschinen |
US5740845A (en) * | 1995-07-07 | 1998-04-21 | Asyst Technologies | Sealable, transportable container having a breather assembly |
DE19540963C2 (de) * | 1995-11-03 | 1999-05-20 | Jenoptik Jena Gmbh | Transportbehälter für scheibenförmige Objekte |
JP3796782B2 (ja) * | 1995-11-13 | 2006-07-12 | アシスト シンコー株式会社 | 機械的インターフェイス装置 |
US5980195A (en) * | 1996-04-24 | 1999-11-09 | Tokyo Electron, Ltd. | Positioning apparatus for substrates to be processed |
US5810062A (en) * | 1996-07-12 | 1998-09-22 | Asyst Technologies, Inc. | Two stage valve for charging and/or vacuum relief of pods |
US5879458A (en) * | 1996-09-13 | 1999-03-09 | Semifab Incorporated | Molecular contamination control system |
JPH10321714A (ja) * | 1997-05-20 | 1998-12-04 | Sony Corp | 密閉コンテナ並びに密閉コンテナ用雰囲気置換装置及び雰囲気置換方法 |
KR100300030B1 (ko) * | 1997-12-30 | 2001-10-19 | 김영환 | 노광장비의레티클세정장치 |
JP3656701B2 (ja) * | 1998-03-23 | 2005-06-08 | 東京エレクトロン株式会社 | 処理装置 |
US5988233A (en) * | 1998-03-27 | 1999-11-23 | Asyst Technologies, Inc. | Evacuation-driven SMIF pod purge system |
US6261044B1 (en) * | 1998-08-06 | 2001-07-17 | Asyst Technologies, Inc. | Pod to port door retention and evacuation system |
US6641349B1 (en) * | 1999-04-30 | 2003-11-04 | Tdk Corporation | Clean box, clean transfer method and system |
JP3226511B2 (ja) * | 1999-06-23 | 2001-11-05 | ティーディーケイ株式会社 | 容器および容器の封止方法 |
DE10104555B4 (de) * | 2001-02-01 | 2007-11-08 | Krauss Maffei Gmbh | Lagervorrichtung zum Einsatz in Reinumgebungen |
DE10204408B4 (de) * | 2002-02-04 | 2007-02-15 | Promos Technologies, Inc. | Vorrichtung und Verfahren zur Verhinderung einer Verschmutzung eines Substratpositionsaufzeichnungssystems in einem SMIF-System mit korrodierenden Gasen, die sich auf den Substraten befinden |
JP4027837B2 (ja) * | 2003-04-28 | 2007-12-26 | Tdk株式会社 | パージ装置およびパージ方法 |
KR100572321B1 (ko) * | 2003-10-02 | 2006-04-19 | 삼성전자주식회사 | 반도체 소자 제조 설비 및 방법 그리고 이에 사용되는스토커 |
KR100583726B1 (ko) * | 2003-11-12 | 2006-05-25 | 삼성전자주식회사 | 기판 처리 장치 및 기판 처리 방법 |
US9010384B2 (en) * | 2004-06-21 | 2015-04-21 | Right Mfg. Co. Ltd. | Load port |
JP4012190B2 (ja) | 2004-10-26 | 2007-11-21 | Tdk株式会社 | 密閉容器の蓋開閉システム及び開閉方法 |
US7418982B2 (en) * | 2006-05-17 | 2008-09-02 | Taiwan Semiconductor Manufacturing Co., Ltd. | Substrate carrier and facility interface and apparatus including same |
US8297319B2 (en) * | 2006-09-14 | 2012-10-30 | Brooks Automation, Inc. | Carrier gas system and coupling substrate carrier to a loadport |
TWI475627B (zh) | 2007-05-17 | 2015-03-01 | Brooks Automation Inc | 基板運送機、基板處理裝置和系統、於基板處理期間降低基板之微粒污染的方法,及使運送機與處理機結合之方法 |
JP2009054859A (ja) * | 2007-08-28 | 2009-03-12 | Tokyo Electron Ltd | 基板受入装置及び基板受入方法 |
JP5273245B2 (ja) * | 2009-05-12 | 2013-08-28 | 村田機械株式会社 | パージ装置およびパージ方法 |
KR101832512B1 (ko) | 2009-12-10 | 2018-02-26 | 엔테그리스, 아이엔씨. | 미세환경 안에 퍼지가스를 균일하게 분포시키는 다공성의 장벽 |
WO2013001482A1 (en) | 2011-06-28 | 2013-01-03 | Dynamic Micro Systems | Semiconductor stocker systems and methods. |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62206826A (ja) * | 1986-03-06 | 1987-09-11 | Nippon Texas Instr Kk | 半導体熱処理装置 |
EP0313693B1 (en) * | 1987-10-28 | 1994-02-09 | Asyst Technologies | Sealable transportable container having a particle filtering system |
US4724874A (en) * | 1986-05-01 | 1988-02-16 | Asyst Technologies | Sealable transportable container having a particle filtering system |
DE3776118D1 (de) * | 1986-12-22 | 1992-02-27 | Siemens Ag | Transportbehaelter mit austauschbarem, zweiteiligem innenbehaelter. |
JPH02117133A (ja) * | 1988-10-26 | 1990-05-01 | Mitsubishi Electric Corp | 半導体ウエハの洗浄方法および洗浄装置 |
US5217053A (en) * | 1990-02-05 | 1993-06-08 | Texas Instruments Incorporated | Vented vacuum semiconductor wafer cassette |
US5169272A (en) * | 1990-11-01 | 1992-12-08 | Asyst Technologies, Inc. | Method and apparatus for transferring articles between two controlled environments |
US5308989A (en) * | 1992-12-22 | 1994-05-03 | Eaton Corporation | Fluid flow control method and apparatus for an ion implanter |
US5444923A (en) * | 1993-04-13 | 1995-08-29 | Texas Instruments Incorporated | Quick cure exhaust manifold |
-
1993
- 1993-08-05 DE DE4326308A patent/DE4326308C1/de not_active Expired - Fee Related
-
1994
- 1994-07-25 KR KR1019950701142A patent/KR0180793B1/ko not_active IP Right Cessation
- 1994-07-25 AT AT94925386T patent/ATE172324T1/de not_active IP Right Cessation
- 1994-07-25 WO PCT/EP1994/002446 patent/WO1995005002A1/de active IP Right Grant
- 1994-07-25 EP EP94925386A patent/EP0664049B1/de not_active Expired - Lifetime
- 1994-07-25 US US08/411,721 patent/US5575081A/en not_active Expired - Lifetime
- 1994-07-25 DE DE59407093T patent/DE59407093D1/de not_active Expired - Fee Related
- 1994-07-29 TW TW083106944A patent/TW252223B/zh not_active IP Right Cessation
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8074599B2 (en) | 2004-05-12 | 2011-12-13 | Applied Materials, Inc. | Plasma uniformity control by gas diffuser curvature |
US8083853B2 (en) | 2004-05-12 | 2011-12-27 | Applied Materials, Inc. | Plasma uniformity control by gas diffuser hole design |
US8328939B2 (en) | 2004-05-12 | 2012-12-11 | Applied Materials, Inc. | Diffuser plate with slit valve compensation |
US9200368B2 (en) | 2004-05-12 | 2015-12-01 | Applied Materials, Inc. | Plasma uniformity control by gas diffuser hole design |
US8075690B2 (en) | 2004-09-20 | 2011-12-13 | Applied Materials, Inc. | Diffuser gravity support |
Also Published As
Publication number | Publication date |
---|---|
ATE172324T1 (de) | 1998-10-15 |
US5575081A (en) | 1996-11-19 |
EP0664049B1 (de) | 1998-10-14 |
DE59407093D1 (de) | 1998-11-19 |
KR950703787A (ko) | 1995-09-20 |
DE4326308C1 (de) | 1994-10-20 |
KR0180793B1 (ko) | 1999-04-15 |
WO1995005002A1 (de) | 1995-02-16 |
EP0664049A1 (de) | 1995-07-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK4A | Expiration of patent term of an invention patent |