TW365641B - Clean room - Google Patents
Clean roomInfo
- Publication number
- TW365641B TW365641B TW086104483A TW86104483A TW365641B TW 365641 B TW365641 B TW 365641B TW 086104483 A TW086104483 A TW 086104483A TW 86104483 A TW86104483 A TW 86104483A TW 365641 B TW365641 B TW 365641B
- Authority
- TW
- Taiwan
- Prior art keywords
- chemical
- air conditioning
- clean room
- areas
- adopted
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
- F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
- F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
- F24F3/167—Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Abstract
This invention is to provide a clean room which, in a semiconductor device manufacturing process, can completely prevent diffusion of chemical materials from a manufacturing device that uses the chemical materials and which can control air conditioning at low cost to meet the need for preventing chemical pollution when conveying or storing semiconductor wafers. A clean room 1 is divided into a plurality of areas whose air conditioning systems are independent of one another, and in a second clean room 1b where a manufacturing device 6a leaking chemical materials is placed, a chemical filter is installed on a circulation duct 13 and an air conditioning method by which air from which chemical mist produced in a working zone 5 has been removed is circulated to a ceiling chamber 4 is adopted to prevent the diffusion of the chemical mist to the areas with different air conditioning systems. In a first clean room 1a where conveyors 7a, 7b and storage devices 8a, 8b or the like are installed, an air conditioning method by which chemical-free air is supplied locally to only the required areas is adopted.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8249529A JPH1096332A (en) | 1996-09-20 | 1996-09-20 | Clean room |
Publications (1)
Publication Number | Publication Date |
---|---|
TW365641B true TW365641B (en) | 1999-08-01 |
Family
ID=17194345
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086104483A TW365641B (en) | 1996-09-20 | 1997-04-09 | Clean room |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPH1096332A (en) |
KR (1) | KR19980024008A (en) |
CN (1) | CN1135331C (en) |
DE (1) | DE19723954A1 (en) |
TW (1) | TW365641B (en) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2951949B1 (en) * | 1998-07-03 | 1999-09-20 | 富士電機総設株式会社 | Local air conditioning system for clean room |
JP3375294B2 (en) * | 1998-12-17 | 2003-02-10 | 東京エレクトロン株式会社 | Processing apparatus, processing system, and method for supplying clean air in the apparatus |
JP3287337B2 (en) * | 1999-07-14 | 2002-06-04 | 日本電気株式会社 | Fan filter unit |
JP3476395B2 (en) * | 1999-09-24 | 2003-12-10 | Necエレクトロニクス株式会社 | Clean room and clean room air conditioning method |
DE10029200A1 (en) * | 2000-02-21 | 2001-08-23 | Data Disc Robots Gmbh | Production line for manufacturing optical data media has process climate control with conditioned air fed to limited region of production line and only air free of particles to other regions |
JP2002147811A (en) | 2000-11-08 | 2002-05-22 | Sharp Corp | Cleanroom |
JP3631993B2 (en) * | 2001-11-21 | 2005-03-23 | 株式会社織部精機製作所 | Disaster prevention shelter system |
JP2005340435A (en) * | 2004-05-26 | 2005-12-08 | Alps Electric Co Ltd | Clean sheet |
DE102004049520A1 (en) * | 2004-10-11 | 2006-04-13 | Alfred Reinicke | Process and plant for the ventilation of clean rooms |
CN100434642C (en) * | 2005-12-05 | 2008-11-19 | 亚翔系统集成科技(苏州)有限公司 | Modularized mfg. process factory building for liquid crystal display |
JP4378652B2 (en) * | 2007-01-10 | 2009-12-09 | 株式会社ダイフク | Purified air ventilation-type goods storage facility |
US9435552B2 (en) * | 2007-12-14 | 2016-09-06 | Ge-Hitachi Nuclear Energy Americas Llc | Air filtration and handling for nuclear reactor habitability area |
DE102007062813B4 (en) | 2007-12-21 | 2009-11-12 | Khs Ag | Partition, in particular for housing packaging machines for food |
DE102008005606B3 (en) | 2008-01-22 | 2010-04-15 | Khs Ag | Device for sealing vertical joints between plate-shaped wall elements |
JP5408909B2 (en) * | 2008-06-05 | 2014-02-05 | 株式会社竹中工務店 | Clean room |
CN104748265B (en) * | 2015-03-10 | 2017-09-26 | 芜湖锐进医疗设备有限公司 | Medical electric Ju Zuan clean rooms air cleaning system |
CN105666528B (en) * | 2016-03-29 | 2018-12-07 | 威格气体纯化科技(苏州)股份有限公司 | Dust free room circulation filter, dust free room and glove box |
CN106760700A (en) * | 2016-11-28 | 2017-05-31 | 中国铁塔股份有限公司长春市分公司 | A kind of base station machine room |
CN106760675B (en) * | 2017-01-22 | 2019-01-18 | 中联西北工程设计研究院有限公司 | The high precision temperature control room in ultra-clean space and temperature control method |
JP6911799B2 (en) * | 2018-03-15 | 2021-07-28 | 信越半導体株式会社 | Clean booth for silicon polycrystalline filling work |
EP4006434A4 (en) * | 2019-07-23 | 2022-08-31 | China Electronics Engineering Design Institute Co., Ltd. | Clean workshop capable of being controlled in partition mode |
CN110469160A (en) * | 2019-08-12 | 2019-11-19 | 中国电子工程设计院有限公司 | A kind of toilet's arragement construction and clear production workshop with secondary humidifying system |
JP7181425B2 (en) * | 2019-12-04 | 2022-11-30 | 日立グローバルライフソリューションズ株式会社 | air conditioning system |
-
1996
- 1996-09-20 JP JP8249529A patent/JPH1096332A/en active Pending
-
1997
- 1997-04-09 TW TW086104483A patent/TW365641B/en not_active IP Right Cessation
- 1997-04-18 KR KR1019970014470A patent/KR19980024008A/en not_active Application Discontinuation
- 1997-06-06 DE DE19723954A patent/DE19723954A1/en not_active Withdrawn
- 1997-07-21 CN CNB971154422A patent/CN1135331C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH1096332A (en) | 1998-04-14 |
CN1135331C (en) | 2004-01-21 |
CN1177709A (en) | 1998-04-01 |
KR19980024008A (en) | 1998-07-06 |
DE19723954A1 (en) | 1998-03-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |