CN110469160A - A kind of toilet's arragement construction and clear production workshop with secondary humidifying system - Google Patents
A kind of toilet's arragement construction and clear production workshop with secondary humidifying system Download PDFInfo
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- CN110469160A CN110469160A CN201910740337.9A CN201910740337A CN110469160A CN 110469160 A CN110469160 A CN 110469160A CN 201910740337 A CN201910740337 A CN 201910740337A CN 110469160 A CN110469160 A CN 110469160A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 189
- 238000010276 construction Methods 0.000 title abstract 4
- 239000011229 interlayer Substances 0.000 claims abstract description 101
- 238000005192 partition Methods 0.000 claims description 323
- 239000012855 volatile organic compound Substances 0.000 claims description 17
- 238000007789 sealing Methods 0.000 claims description 14
- 229910021536 Zeolite Inorganic materials 0.000 claims description 12
- 239000010457 zeolite Substances 0.000 claims description 12
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 24
- 238000005516 engineering process Methods 0.000 description 15
- 230000007613 environmental effect Effects 0.000 description 15
- 239000010410 layer Substances 0.000 description 10
- 239000003595 mist Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- 239000007921 spray Substances 0.000 description 5
- 230000009286 beneficial effect Effects 0.000 description 4
- 230000002349 favourable effect Effects 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000007791 dehumidification Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 239000010815 organic waste Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000005338 heat storage Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
Classifications
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- E—FIXED CONSTRUCTIONS
- E04—BUILDING
- E04H—BUILDINGS OR LIKE STRUCTURES FOR PARTICULAR PURPOSES; SWIMMING OR SPLASH BATHS OR POOLS; MASTS; FENCING; TENTS OR CANOPIES, IN GENERAL
- E04H5/00—Buildings or groups of buildings for industrial or agricultural purposes
- E04H5/02—Buildings or groups of buildings for industrial purposes, e.g. for power-plants or factories
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D22/00—Control of humidity
- G05D22/02—Control of humidity characterised by the use of electric means
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Abstract
The present invention relates to clear production workshop technical fields, disclose a kind of toilet's arragement construction and clear production workshop with secondary humidifying system, toilet's arragement construction with secondary humidifying system includes: at least one set of secondary humidifying system, each group of secondary humidifying system includes: humidifier, in the upper interlayer of toilet, lower interlayer, return air passageway or clear production area；Relative humidity sensor；The humidity controller connecting with relative humidity sensor and humidifier, humidity controller are used to receive the moisture signal of relative humidity sensor to control humidifier work according to moisture signal.In toilet's arragement construction with secondary humidifying system, secondary humidifying system is provided in toilet, secondary humidifying effectively is carried out to room air, increase the envionmental humidity in clear production area, the relative humidity of the production environment of product is set to reach optimum value, it advantageously ensures that good production process manufacturing environment, improves product yield.
Description
Technical Field
The invention relates to the technical field of clean production plants, in particular to a clean room arrangement structure with a secondary humidification system and a clean production plant.
Background
At present, the mainstream product display device (TFT-LCD) in the electronic industry produces factory building Array exposure area (Array Photo), color film exposure area (CF Photo) glue coating and baking production processes, and the organic waste gas produced in the organic solvent cleaning process of the PI coating, baking and PI reworking production processes of the alignment film (PI area) is connected to a roofing zeolite rotary wheel unit and a heat storage combustion furnace through a waste gas pipeline for centralized processing; but still a part of Volatile Organic Compounds (VOC) remain in the clean room of the VOC production process, which has certain adverse effects on human body and manufacturing environment; particularly, some production processes (such as liquid crystal instillation ODF area) are sensitive to VOC, and when the VOC concentration in the VOC production process area is higher and diffuses to the ODF area through the air flow, the product yield is seriously influenced; the effective measure for removing VOC in a clean room at present is a method for continuously adsorbing and regenerating VOC in the air by arranging a zeolite turbine set in a technical interlayer under a clean area of a VOC production process, and discharging the concentrated and desorbed VOC to a roof organic waste gas treatment main system. However, when the treated air passes through the rotating wheel (Rotor) of the zeolite rotating wheel set, 0.5g/kg dehumidification occurs, and the relative humidity in a clean room in a zeolite rotating wheel setting area is correspondingly reduced. For example, clean room temperature/humidity requirements: 23 +/-1 ℃/55% +/-5%, if the existing temperature/humidity of the clean room is in a state of 23 ℃/55%, the temperature/humidity change of the treated air after dehumidification through a zeolite turbine set is as follows: 23 ℃/52.25%; the temperature and humidity state of the production environment is not optimal after the temperature and humidity change, and then certain influence can be generated on the yield of products.
In addition, with the development of the advanced TFT-LCD display industry, the requirement for cleaning the area of a factory building is larger and larger; for example: the 11 th generation display production factory building generally comprises two layers of core production areas, the clean room area of a single-layer core production area can reach 12 ten thousand square meters, and each layer is provided with a plurality of independent clean production rooms (independent subareas for short) according to different requirements of the clean grade, the temperature and the humidity, the VOC concentration control and the like of each production process; the current high-generation TFT-LCD project generally adopts a clean fresh air processing unit (MAU), a dry coil pipe (DCC), a Fan Filter Unit (FFU) to purify an air-conditioning air supply system; in order to save the area of an auxiliary air conditioner room in a support area, the air conditioner room is generally arranged in the support area of a production plant in a centralized manner, and a plurality of clean fresh air processing units are arranged in the air conditioner room; outdoor air enters each independent subarea after being subjected to centralized cooling and dehumidifying (or heating and humidifying) treatment by the clean fresh air treatment unit, and the relative humidity required by the clean room is ensured by the clean fresh air treatment unit. Different fresh air processing systems are set for different relative humidity requirements of each independent partition without enough space conditions; fresh air is supplied to each independent subarea through the centralized fresh air processing unit, and the same temperature and humidity requirements of each independent subarea can only be realized.
In view of the above-mentioned situation that the humidity of the production environment changes or the requirements for the relative humidity of the production environment are different, in the prior art, for a room of a clean room with obvious humidity change or high humidity requirements, a measure for increasing the relative humidity by setting a temperature value in a low clean room is only used to approach an indoor temperature and humidity required value without increasing the indoor air moisture content (i.e., the indoor air moisture content remains unchanged), but after the measure is implemented, the indoor temperature and humidity value always has a certain deviation from the production required temperature and humidity value, which has a certain influence on the production environment and is easy to cause a reduction in product yield, so that how to maintain the temperature and humidity value in the clean room to meet the production requirements of the products is an urgent problem to be solved at present.
Disclosure of Invention
The invention provides a clean room arrangement structure with a secondary humidification system and a clean production factory building.
In order to achieve the purpose, the invention provides the following technical scheme:
a clean room arrangement with a secondary humidification system, comprising: at least one set of secondary humidification system, each set of secondary humidification system includes:
the humidifying device is arranged in an upper technical interlayer, a lower technical interlayer or an air return channel or a clean production area of the clean room;
a relative humidity sensor for detecting the humidity of the air in the clean room;
and the humidity controller is used for receiving a humidity signal of the relative humidity sensor so as to control the work of the humidifying device according to the humidity signal.
In the above-mentioned clean room arrangement structure with secondary humidification system, be provided with at least a set of secondary humidification system in the clean room, wherein, each set of secondary humidification system includes: the relative humidity sensor is arranged in the clean room and used for detecting the indoor air humidity, wherein the relative humidity sensor can be arranged in a clean production area of the clean room, the clean production area is a place for placing production equipment, the relative humidity sensor is arranged in the clean production area and can detect the humidity of the clean production area, namely the humidity of the production environment of products is detected, the actual humidity of the production environment of the products can be more accurately determined, in addition, the humidifying device is used for directly humidifying the indoor air, wherein the humidifying device can be arranged in an upper technical interlayer of the clean room, can also be arranged in a lower technical interlayer of the clean room, or is arranged in a return air channel of the clean room, or is arranged in the clean production area of the clean room, and the humidified air can enter an air system in the clean room and can humidify the environment in the whole clean room, certainly, the humidified air can enter the clean production area in the circulation process of the air system in the clean room, the production environment in the clean room obtains the secondary humidification effect, the humidity controller is in signal connection with the relative humidity sensor and is electrically connected with the humidification device, the humidification device can be controlled by receiving the humidity signal detected by the relative humidity sensor and controlling the humidification device through the humidity signal, the humidity signal is the relative humidity value of the clean production area, a preset value is set according to the humidity requirement of the products produced in the clean production area on the clean production area, when the relative humidity sensor detects that the humidity value in the clean production area is smaller than the preset value, the humidity controller controls the humidification device to work, the indoor air is humidified, and the proportion adjustment of humidification quantity can be realized; when the relative humidity sensor detects that the humidity value in the clean production area is larger than or equal to the preset value, the humidity controller controls the humidifying device to proportionally reduce the humidifying amount to a constant continuous humidifying state or does not start working, therefore, the humidity controller controls the humidifying device to automatically humidify the indoor air by receiving the humidity signal of the relative humidity sensor, the relative humidity requirement of the production environment in the clean production area is met, and the relative humidity of the production environment in the clean production area can reach the optimal value.
Therefore, in the above-mentioned arrangement structure of clean room with secondary humidification system, be provided with secondary humidification system in the clean room, can effectively carry out the secondary humidification to the room air, can increase the ambient humidity in clean production district to the relative humidity of the production environment of messenger's product reaches the optimum value, is favorable to guaranteeing good production process manufacturing environment, improves the product yield.
Optionally, be equipped with first independent subregion and second independent subregion in the toilet, first independent subregion with the second independent subregion is equipped with the partition wall subassembly in order at least to incite somebody to action clean production district separates, forms first clean production district and the clean production district of second, just first independent subregion includes first upper technology intermediate layer first clean production district, first lower technology intermediate layer and first return air double-layered way, the second independent subregion includes the second upper technology intermediate layer the clean production district of second, second lower technology intermediate layer and second return air double-layered way, secondary humidification system set up in the first independent subregion.
Optionally, be equipped with first independent subregion and the independent subregion of second in the toilet, first independent subregion with be equipped with the partition wall subassembly between the independent subregion of second in order at least with clean production district separates, forms first clean production district and the clean production district of second, just first independent subregion includes first upper technology intermediate layer first clean production district, first lower technology intermediate layer and first return air double-layered way, the independent subregion of second includes that the second goes up technology intermediate layer the clean production district of second, second lower technology intermediate layer and second return air double-layered way, just secondary humidification system sets up at least two sets ofly, first independent subregion and the independent subregion of second all are provided with secondary humidification system.
Optionally, the partition wall assembly comprises a partition wall disposed between the first and second individual zones, the partition wall being located at least between the first and second clean production zones to separate the first and second clean production zones; or,
the partition wall assembly comprises a first partition wall and a second partition wall which are arranged between the first independent partition and the second independent partition and are arranged side by side, the first partition wall and the second partition wall are at least positioned between the first clean production area and the second clean production area, the first clean production area and the second clean production area are separated, and a return air channel is formed between the first partition wall and the second partition wall; or,
the partition wall assembly comprises a first partition wall, a second partition wall and a third partition wall, wherein the first partition wall, the second partition wall and the third partition wall are arranged between the first independent partition and the second independent partition and are arranged side by side, the first partition wall and the second partition wall are at least positioned between the first clean production area and the second clean production area, the first clean production area and the second clean production area are separated, the third partition wall is arranged between the first partition wall and the second partition wall, the top of the third partition wall extends to the top plate of the upper technical interlayer and is in sealing fit with the top plate of the upper technical interlayer, and the bottom of the third partition wall extends to the bottom plate of the lower technical interlayer and is in sealing fit with the bottom plate of the lower technical interlayer; and a third return air channel is formed between the first partition wall and the third partition wall, and/or a fourth return air channel is formed between the second partition wall and the third partition wall.
Optionally, when the partition wall assembly includes a first partition wall, a second partition wall and a third partition wall which are arranged between the first independent partition and the second independent partition and are arranged side by side, and a third return air duct is formed between the first partition wall and the third partition wall, the humidifying device is arranged in the third return air duct.
Optionally, a zeolite rotary turbine set for adsorbing the volatile organic compound is disposed in the first lower technical interlayer of the first independent partition.
Optionally, a first return air channel is formed between the first independent partition and the partition wall, a second return air channel is formed between the second independent partition, and the humidifying device is arranged in the first return air channel.
Optionally, the relative humidity sensor is located in a clean production zone of the clean room.
Optionally, in each set of the secondary humidification systems, the relative humidity sensors are set to be one or more, and when the relative humidity sensors are set to be one, the humidity signal is a sensing value of the relative humidity sensor; when the relative humidity sensor is provided in plurality, the humidity signal is an average value of humidity sensing values of the plurality of relative humidity sensors.
Based on the same inventive concept, the invention also provides a clean production factory building which comprises any clean room arrangement structure with the secondary humidifying system provided by the technical scheme.
Drawings
FIG. 1 is a side view of a clean room arrangement with a secondary humidification system provided by an embodiment of the present invention;
FIG. 2 is a side view of a clean room arrangement with a secondary humidification system provided by an embodiment of the present invention;
FIG. 3 is a side view of a clean room arrangement with a secondary humidification system provided by an embodiment of the present invention;
FIG. 4 is a side view of a clean room arrangement with a secondary humidification system provided by an embodiment of the present invention;
FIG. 5 is a side view of a clean room arrangement with a secondary humidification system provided by an embodiment of the present invention;
FIG. 6 is a side view of a clean room arrangement with a secondary humidification system provided by an embodiment of the present invention;
FIG. 7 is a side view of a clean room arrangement with a secondary humidification system provided by an embodiment of the present invention;
FIG. 8 is a side view of a clean room arrangement with a secondary humidification system provided in accordance with an embodiment of the present invention;
FIG. 9 is a side view of a clean room arrangement with a secondary humidification system provided in accordance with an embodiment of the present invention;
FIG. 10 is a side view of a clean room arrangement with a secondary humidification system provided by an embodiment of the present invention;
FIG. 11 is a side view of a clean room arrangement with a secondary humidification system provided in accordance with an embodiment of the present invention;
FIG. 12 is a side view of a clean room arrangement with a secondary humidification system provided in accordance with an embodiment of the present invention;
FIG. 13 is a side view of a clean room arrangement with a secondary humidification system provided in accordance with an embodiment of the present invention;
FIG. 14 is a side view of a clean room arrangement with a secondary humidification system provided in accordance with an embodiment of the present invention;
fig. 15 is a schematic flow chart of an air system in a clean room with a secondary humidification system according to an embodiment of the present invention;
FIG. 16 is a schematic top view of a clean manufacturing plant according to an embodiment of the present invention;
fig. 17 is a schematic structural diagram of a spatial two-fluid humidification system according to an embodiment of the present invention;
fig. 18 is a schematic structural diagram of a spatial high-pressure fine mist humidifying system according to an embodiment of the present invention;
icon: 1-a humidifying device; 2-relative humidity sensor; 3-a humidity controller; 4-upper technical interlayer; 5-lower technical interlayer; 6 a-a first return air channel; 6 b-a second return air channel; 7-production equipment; 8-a first independent partition; 9-a second independent partition; 10-first upper technology interlayer; 11-a first clean production zone; 12-first lower technology interlayer; 13-second upper technology interlayer; 14-a second clean production zone; 15-a second lower technical interlayer; 16-zeolite turbine units; 17-a partition wall; 18-a third return air channel; 19-a fourth return air channel; 20-a nozzle; 21-an air inlet pipe; 22, 36-water inlet pipe; 23-compressed air inlet; 24-an intake air auxiliary unit; 25-compressed air filter; 26, 38-water filter; 27-a water inlet auxiliary unit; 28, 37-water inlet; 29-a water outlet; 30-an electric cabinet; 31-a spray head holder; 32-a spray tube; 33-stainless steel nozzle; 34-a humidifying conduit; 35-high-pressure micro-mist humidifying host machine; 39-clean fresh air main pipeline; 40-clean fresh air branch pipelines; 41-a first partition wall; 42-a second partition wall; 43-third compartment wall.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1, wherein a humidification device is disposed in an upper technical interlayer of a clean room in fig. 1, an embodiment of the invention provides a clean room layout structure with a secondary humidification system, including: at least a set of secondary humidification system, each set of secondary humidification system includes: the humidifying device 1 is arranged in an upper technical interlayer 4, a lower technical interlayer 5 or an air return channel or a clean production area of the clean room; a relative humidity sensor 2 for detecting the humidity of the air in the clean room; and the humidity controller 3 is connected with the relative humidity sensor 2 and the humidifying device 1, and the humidity controller 3 is used for receiving a humidity signal of the relative humidity sensor 2 so as to control the humidifying device 1 to work according to the humidity signal.
In the above-mentioned clean room arrangement structure with secondary humidification system, be provided with at least a set of secondary humidification system in the clean room, wherein, each set of secondary humidification system includes: the relative humidity sensor is arranged in the clean room and used for detecting the indoor air humidity, wherein the relative humidity sensor can be arranged in a clean production area of the clean room, the clean production area is a place for placing production equipment, the relative humidity sensor is arranged in the clean production area and can detect the humidity of the clean production area, namely, the relative humidity detection is carried out on the production environment of products, the actual relative humidity of the production environment of the products can be more accurately determined, in addition, the humidifying device is used for directly humidifying the indoor air, wherein, the humidifying device can be arranged in an upper technical interlayer of the clean room, can also be arranged in a lower technical interlayer of the clean room, or is arranged in an air return channel of the clean room, or is arranged in the clean production area of the clean room, the humidified air can enter an air system in the clean room and can humidify the environment in the whole clean room, certainly, the humidified air can enter the clean production area in the circulation process of the air system in the clean room, the production environment in the clean room obtains the secondary humidification effect, the humidity controller is in signal connection with the relative humidity sensor and is electrically connected with the humidification device, the humidity controller can receive a humidity signal detected by the relative humidity sensor and control the humidification device through the humidity signal, the humidity signal is the relative humidity value of the clean production area, a preset value is set according to the relative humidity requirement of products produced in the clean production area on the clean production area, when the relative humidity sensor detects that the humidity value in the clean production area is smaller than the preset value, the humidity controller controls the humidification device to work, the indoor air is humidified, and the proportion adjustment of humidification quantity can be realized; when the relative humidity sensor detects that the humidity value in the clean production area is larger than or equal to the preset value, the humidity controller controls the humidifying device to adjust the proportion of the humidifying quantity to be constant and continuously humidifying or not to start working, therefore, the humidity controller controls the humidifying device to automatically humidify the indoor air by receiving the humidity signal of the relative humidity sensor, the humidity requirement of the production environment in the clean production area is met, and the relative humidity of the production environment in the clean production area can reach the optimal value.
Therefore, in the above-mentioned arrangement structure of clean room with secondary humidification system, be provided with secondary humidification system in the clean room, can effectively carry out the secondary humidification to the room air, can increase the relative humidity of clean production area environment to the relative humidity of the production environment of messenger's product reaches the optimum value, is favorable to guaranteeing good production process manufacturing environment, improves the product yield.
Specifically, in the above clean room arrangement structure with the secondary humidification systems, in each set of secondary humidification systems, one or more relative humidity sensors are provided, and when one relative humidity sensor is provided, the humidity signal is the sensing value of the relative humidity sensor; when the relative humidity sensor sets up to a plurality of times, the humidity signal is the average value of a plurality of relative humidity sensor's humidity inductive value, wherein, sets up relative humidity sensor to a plurality of relative humidity sensor to the average value of a plurality of relative humidity sensor's inductive value is as humidity signal, and relative humidity in the test chamber that can be more accurate is favorable to improving secondary humidification system to the accuracy of indoor humidification, is favorable to guaranteeing the best relative humidity value of indoor environment's humidity at production.
It should be noted that, referring to fig. 1 to fig. 3, a plurality of sets of secondary humidification systems may be disposed in the clean room arrangement structure with the secondary humidification systems, which is beneficial to increase the humidification rate of the production environment in the clean room, so as to enable the ambient humidity to reach the relative humidity value required by the production environment more quickly, the humidifying devices 1 in the multiple sets of secondary humidifying systems can be arranged at any one of the upper technical interlayer 4, the lower technical interlayer 5, the return air interlayer or the clean production area of the clean room, or at any two, three or four of the upper technical interlayer, the lower technical interlayer, the return air interlayer or the clean production area, for example, the humidifying devices 1 in the multiple groups of secondary humidifying systems can be all arranged in the upper technical interlayer 4 of the clean room or in the return air channel of the clean room, or all arranged in the lower technical interlayer 5 of the clean room, or all arranged in the clean production area of the clean room; in addition, a part of the humidifying devices in the multiple groups of secondary humidifying systems can be arranged in the upper technical interlayer, and a part of the humidifying devices is arranged in the return air channel; or one part of the humidifying devices in the multiple groups of secondary humidifying systems is arranged in the lower technical interlayer, and the other part of the humidifying devices is arranged in the return air channel; or one part of the humidifying devices in the multiple groups of secondary humidifying systems is arranged in the upper technical interlayer, and the other part of the humidifying devices is arranged in the lower technical interlayer, or one part of the humidifying devices is arranged in the return air channel, and the other part of the humidifying devices is arranged in the clean production area of the clean room; or, some of the humidification devices in the multiple groups of secondary humidification systems are arranged in the upper technical interlayer, some of the humidification devices are arranged in the lower technical interlayer, and some of the humidification devices are arranged in the return air interlayer, that is, the humidification devices are arranged in the upper technical interlayer, the lower technical interlayer and the return air interlayer, and the humidification devices are arranged in the return air interlayer.
In addition, referring to fig. 16 and 7, because the requirements for the production environment are different due to different factors such as different products and different production processes in the production plant of the mainstream product display device in the electronic industry, the production plant may be divided into a plurality of independent partitions according to the factors such as the requirements for the production environment and the special requirements for the preparation processes, and different independent partitions may be used for product preparation or process manufacturing according to different environmental requirements, wherein a first independent partition 8 and a second independent partition 9 may be set in the clean room according to the difference of humidity, that is, the plurality of independent partitions include a first independent partition and a second independent partition, wherein the first independent partition may be set in plurality, the second independent partition may also be set in plurality, and the number and layout of the first independent partition and the second independent partition may be set according to the actual requirements, in addition, the first independent subarea and the second independent subarea are arranged in the clean room, and the setting mode of the secondary humidification system can be selected in various modes, such as:
the first method is as follows:
referring to fig. 4 to 6, a first independent sub-area 8 and a second independent sub-area 9 are provided in a clean room, a partition wall assembly is provided between the first independent sub-area 8 and the second independent sub-area 9 to partition at least a clean production area to form a first clean production area 11 and a second clean production area 14, the first independent sub-area 8 includes a first upper technical interlayer 10, a first clean production area 11, a first lower technical interlayer 12 and a first return air duct 6a, the first return air duct 6a is located on a side of the first independent sub-area 8 facing away from the second independent sub-area 9, the second independent sub-area 9 includes a second upper technical interlayer 13, a second clean production area 14, a second lower technical interlayer 15 and a second return air duct 6b, a secondary humidification system is provided in the first independent sub-area 8 to directly humidify air of the first independent sub-area, thereby effectively increasing indoor air humidity, and in particular the first independent partition, is advantageous to ensure that the relative humidity within the first independent partition is the optimum value for the production requirements. The first independent partition may be provided with a group of secondary humidification systems, or may be provided with a plurality of groups of secondary humidification systems, which is not limited in this embodiment.
For the arrangement of the first independent partition and the second independent partition in the clean room in the first mode, there may be a plurality of setting selection modes, such as:
the independent partition setting mode is as follows:
referring to fig. 13, the partition wall assembly includes one partition wall 17 disposed between the first and second independent partitions 8 and 9, i.e., only one partition wall 17 is disposed between the first and second independent partitions 8 and 9, and the partition wall 17 corresponds to at least the first and second clean production zones 11 and 14, and separates the first and second clean production zones 11 and 14, i.e., the first and second clean production zones are adjacent and next to each other, and only the partition wall separates them.
The partition wall can only correspond to the first clean production area and the second clean production area, namely, the first upper technical interlayer and the second upper technical interlayer can be communicated, and the first lower technical interlayer and the second lower technical interlayer can also be communicated; in addition, the bottom of the partition wall can also be arranged to extend to the bottom plate of the lower technical interlayer and be in sealing fit with the bottom plate of the lower technical interlayer, namely, the first lower technical interlayer and the second lower technical interlayer are separated by the partition wall; in addition, as shown in fig. 13, the bottom of the partition wall 17 may extend to the bottom plate of the lower technical sandwich and be in sealing fit with the bottom plate of the lower technical sandwich, and at the same time, the top of the partition wall extends to the top plate of the upper technical sandwich and be in sealing fit with the top plate of the upper technical sandwich, that is, the first lower technical sandwich 12 and the second lower technical sandwich 15 are separated by the partition wall, and the first upper technical sandwich 10 and the second upper technical sandwich 13 are also separated by the partition wall, so that the two independent partitions are completely separated, and the first independent partition and the second independent partition are set as independent spaces which are not communicated with each other, so that the environmental conditions between each other do not affect each other, and the respective environmental requirements are further favorably ensured.
In the first independent partition setting mode, when the first independent partition and the second independent partition of the partition are set to be independent spaces which are not communicated with each other, the environmental conditions between the first independent partition and the second independent partition can not be influenced, and the respective environmental requirements can be better ensured.
And a second independent partition setting mode:
referring to fig. 2 to 6, the partition wall assembly includes two side-by-side partition walls disposed between a first independent partition 8 and a second independent partition 9, a first partition wall 41, a second partition wall 42, i.e., a first partition wall 41 and a second partition wall 42 disposed side-by-side and opposite to each other between the first independent partition 8 and the second independent partition 9 and corresponding to at least a first clean production zone 11 and a second clean production zone 14, and separating the first clean production zone 11 from the second production zone 14, the first partition wall 41 being disposed in the first independent partition 8, the second partition wall 42 being disposed in the second independent partition 9, and a return air duct being formed between the first partition wall 41 and the second partition wall 42, wherein the first partition wall and the second partition wall may correspond to only the first clean production zone and the second clean production zone, and the first upper technology duct communicates with the second upper technology duct, the first lower technical interlayer is communicated with the second lower technical interlayer; in addition, the bottom of the first partition wall can also be arranged to extend to the lower technical interlayer, and the bottom of the second partition wall can also be arranged to extend to the lower technical interlayer.
Setting a third independent partition mode:
referring to fig. 10, 11 and 12, in order to improve the precision of the environment requirement in each independent partition, each independent partition may be completely partitioned to form two independent spaces not communicating with each other, and the partition wall assembly includes three side-by-side partition walls between the first independent partition 8 and the second independent partition 9, a first partition wall 41, a second partition wall 42 and a third partition wall 43, and the third partition wall 43 is located between the first partition wall 41 and the second partition wall 42, the first partition wall 41 is located in the first independent partition 8, the second partition wall 42 is located in the second independent partition 9, the top of the third partition wall 43 extends to the top plate of the upper technical sandwich and is in sealing engagement with the top plate of the upper technical sandwich, and the bottom of the third partition wall 43 extends to the bottom plate of the lower technical sandwich and is in sealing engagement with the bottom plate of the lower technical sandwich, and the first independent partition 8 and the second independent partition 9 are partitioned into two independent spaces not communicating with each other, the first partition wall corresponds to the first clean production area, and the bottom of the first partition wall extends to the lower technical interlayer, the second partition wall corresponds to the second clean production area, and the bottom of the second partition wall extends to the lower technical interlayer, and a third return air duct 18 is formed between the first partition wall 41 and the third partition wall 43, or a fourth return air duct 19 is formed between the second partition wall 42 and the third partition wall 43, or a third return air duct 18 is formed between the first partition wall 41 and the third partition wall 43, and at the same time, a fourth return air duct 19 is formed between the second partition wall 42 and the third partition wall 43.
In the third independent partition setting mode, the first independent partition and the second independent partition are set to be independent spaces which are not communicated with each other, so that environmental conditions between the first independent partition and the second independent partition are not influenced mutually, and the respective environmental requirements are better guaranteed.
As shown in fig. 9, when the third return air duct 18 is formed between the first partition wall 41 and the third partition wall 43, a humidifying device may be provided in the third return air duct 18 to humidify the first independent section.
Further, in the first mode, referring to fig. 2,3, 8, 9 and 13, the first production clean zone 11 in the first independent sub-zone 8 is provided with the production equipment 7 which produces volatile organic compounds during the working process, the first lower technical interlayer 12 is provided with the zeolite rotating wheel unit 16 which adsorbs volatile organic compounds, the zeolite rotating wheel unit 16 can reduce the humidity of the indoor air to a certain extent during the working process, so that the environmental humidity of the clean room, especially the first independent sub-zone is reduced and deviates from the environmental humidity requirement value of the product production, and the first independent sub-zone 8 is provided with the secondary humidification system which can directly humidify the indoor air, can improve the relative humidity of the indoor air, and is beneficial to ensuring that the relative humidity value of the indoor air is maintained at the optimal humidity requirement value of the product production, and is beneficial to ensuring the product yield.
The second method comprises the following steps:
as shown in fig. 1, a first independent partition 8 and a second independent partition 9 are provided in a clean room, a partition wall assembly is provided between the first independent partition 8 and the second independent partition 9 to partition at least a clean production area to form a first clean production area and a second clean production area, the first independent partition 8 includes a first upper technical interlayer 10, a first clean production area 11, a first lower technical interlayer 12 and a first return air duct 6a, the second independent partition 9 includes a second upper technical interlayer 13, a second clean production area 14, a second lower technical interlayer 15 and a second return air duct 6b, and the secondary humidification systems are provided in at least two groups, the secondary humidification systems are provided in the first independent partition 8 and the second independent partition 9, wherein the secondary humidification systems may be provided in two groups, the secondary humidification systems are provided in the first independent partition 8 and the second independent partition 9, alternatively, the secondary humidification system may be provided in a plurality of sets, and the first independent section 8 and the second independent section 9 are provided therein with a plurality of sets, respectively.
In the second mode, the secondary humidification systems are arranged in the first independent partition and the second independent partition, so that the relative humidity of the air in the first independent partition and the air in the second independent partition can be rapidly improved, the relative humidity of the air in the first independent partition and the relative humidity of the air in the second independent partition can be guaranteed to be at the optimal required value, and the product yield can be guaranteed.
For the arrangement of the first independent partition and the second independent partition in the clean room in the second mode, there may be various arrangement selection modes, such as:
the independent partition setting mode is as follows:
referring to fig. 14, the partition wall assembly comprises one partition wall 17 disposed between the first and second independent sub-areas 8 and 9, i.e. only one partition wall is disposed between the first and second independent sub-areas 8 and 9, and the partition wall 17 corresponds to at least the first and second clean production zones 11 and 14, and separates the first and second clean production zones 11 and 14, i.e. the first and second clean production zones 11 and 14 are adjacent and next to each other, and only the partition wall 17 separates them. The partition wall can only correspond to the first clean production area and the second clean production area, namely, the first upper technical interlayer and the second upper technical interlayer can be communicated, and the first lower technical interlayer and the second lower technical interlayer can also be communicated; in addition, the bottom of the partition wall can also be arranged to extend to the bottom plate of the lower technical interlayer and be in sealing fit with the bottom plate of the lower technical interlayer, namely, the first lower technical interlayer and the second lower technical interlayer are separated by the partition wall; in addition, as shown in fig. 14, the bottom of the partition wall 17 may extend to and be in sealing engagement with the bottom plate of the lower technical sandwich, and at the same time, the top of the partition wall extends to and is in sealing engagement with the top plate of the upper technical sandwich, that is, the first lower technical sandwich 12 and the second lower technical sandwich 15 are separated by the partition wall, and the first upper technical sandwich 10 and the second upper technical sandwich 13 are also separated by the partition wall, so that the two independent partitions are completely separated, and the first independent partition and the second independent partition are provided as independent spaces which are not communicated with each other, so that the environmental conditions of each independent partition do not affect each other, and the respective environmental requirements are further ensured.
In the first independent partition setting mode of the second mode, when the first independent partition and the second independent partition of the partition are set to be independent spaces which are not communicated with each other, environmental conditions between the first independent partition and the second independent partition can not affect each other, and the respective environmental requirements can be better ensured.
And a second independent partition setting mode:
as shown in fig. 1, the partition wall assembly includes two side-by-side partition walls disposed between a first independent partition 8 and a second independent partition 9, a first partition wall 41, a second partition wall 42, i.e., a first partition wall 41 and a second partition wall 42 disposed side-by-side and opposite to each other between the first independent partition 8 and the second independent partition 9, and corresponding to at least a first clean production zone 11 and a second clean production zone 14, and separating the first clean production zone 11 from the second production zone 14, the first partition wall 41 being disposed in the first independent partition 8, the second partition wall 42 being disposed in the second independent partition 9, and a return air duct being formed between the first partition wall 41 and the second partition wall 42, wherein the first partition wall and the second partition wall may correspond to only the first clean production zone and the second clean production zone, and the first upper technology duct is in communication with the second upper technology duct, the first lower technical interlayer is communicated with the second lower technical interlayer; in addition, the bottom of the first partition wall can also be arranged to extend to the lower technical interlayer, and the bottom of the second partition wall can also be arranged to extend to the lower technical interlayer.
Setting a third independent partition mode:
referring to fig. 7, in order to improve the precision of the environment requirement in each independent partition, each independent partition may be completely partitioned to form two independent spaces not communicating with each other, and the partition wall assembly includes three side-by-side partition walls between a first independent partition 8 and a second independent partition 9, a first partition wall 41, a second partition wall 42 and a third partition wall 43, and the third partition wall 43 is positioned between the first partition wall 41 and the second partition wall 42, the first partition wall 41 is positioned in the first independent partition 8, the second partition wall 42 is positioned in the second independent partition 9, the top of the third partition wall 43 extends to the top plate of the upper technical interlayer and is in sealing engagement with the top plate of the upper technical interlayer, and the bottom of the third partition wall 43 extends to the bottom plate of the lower technical interlayer and is in sealing engagement with the bottom plate of the lower technical interlayer, the first independent partition and the second independent partition are partitioned into two independent spaces not communicating with each other, the first partition wall corresponds to the first clean production area, the bottom of the first partition wall extends to the lower technical interlayer, the second partition wall corresponds to the second clean production area, the bottom of the second partition wall extends to the lower technical interlayer, a third return air channel 18 is formed between the first partition wall 41 and the third partition wall 43, a fourth return air channel 19 is formed between the second partition wall 42 and the third partition wall 43, a third return air channel is formed between the first partition wall and the third partition wall, and a fourth return air channel is formed between the second partition wall and the third partition wall.
In the third independent partition setting mode of the second mode, the first independent partition and the second independent partition are set to be independent spaces which are not communicated with each other, so that environmental conditions between the first independent partition and the second independent partition are not influenced with each other, and the respective environmental requirements are better guaranteed.
When a third return air channel is formed between the first partition wall and the third partition wall, a humidifying device can be arranged in the third return air channel, so that the first independent partition can be humidified conveniently; when a fourth return air channel is formed between the second partition wall and the third partition wall, a humidifying device can be arranged in the fourth return air channel, so that the second independent partition is conveniently humidified.
Further, in the second embodiment, referring to fig. 7, a production facility 7 for producing volatile organic compounds during operation is disposed in the first production clean zone 11 in the first independent sub-zone 8, a zeolite turbine set 16 for adsorbing volatile organic compounds is disposed in the first lower technical interlayer 12, the zeolite turbine set 16 can reduce humidity of indoor air during operation to a certain extent, so that the ambient humidity of the clean room, particularly the first independent sub-zone, is reduced and deviates from the ambient humidity requirement value of product production, and secondary humidification systems are disposed in both the first independent sub-zone and the second independent sub-zone, so as to humidify the indoor air directly, increase the relative humidity of the indoor air, and help to ensure that the relative humidity of the indoor air is maintained at the optimal requirement value of product production, and help to ensure the product yield.
Specifically, in the first and second modes, referring to fig. 15 and 16, the clean room arrangement structure with the secondary humidification system further includes: the clean fresh air main pipeline 39 arranged in the upper technical interlayer 4 of the clean room and the clean fresh air branch pipeline 40 extending into the return air interlayer of each independent subarea and used for outputting fresh air provide fresh air for each independent subarea.
Specifically, the secondary humidification system may be a spatial two-fluid humidification system or a spatial high-pressure micro-mist humidification system, or may also be a spatial electric humidifier or a spatial electrode humidifier, and may directly humidify the indoor air of the clean room, increase the indoor humidity, and implement full-automatic control of the secondary humidification.
Specifically, referring to fig. 17, the spatial type two-fluid humidifying system includes a relative humidity sensor, a humidifying device and a humidity controller, the humidifying device of the spatial type two-fluid humidifying system includes a plurality of nozzles 20, each nozzle 20 includes two input ports, one input port is connected and communicated with an air inlet pipe 21, the air inlet pipe 21 can be a stainless steel humidifying pipeline, the other input port is connected and communicated with a water inlet pipe 22, one end of the air inlet pipe 21 includes a compressed air inlet 23 for connecting with an air supply device, an air inlet auxiliary unit 24 and a compressed air filter 25 for controlling air inlet are disposed at the air inlet end of the air inlet pipe 21, one end of the water inlet pipe 22 includes a water inlet 28 for connecting with a water supply device, the water inlet end of the water inlet pipe 22 is disposed with a water filter 26 and a water inlet auxiliary unit 27, and the water inlet auxiliary unit 27 is disposed, the water inlet auxiliary unit 27 and the air inlet auxiliary unit 24 are electrically connected with the electric cabinet 30, the electric cabinet 30 forms a humidity controller, the electric cabinet 30 is connected with a relative humidity sensor, the water inlet auxiliary unit 27 and the air inlet auxiliary unit 24 can be controlled by receiving a humidity signal of the relative humidity sensor so as to control humidification work, and in addition, the water inlet auxiliary unit and the air inlet auxiliary unit can be adjusted manually so as to better humidify indoor air; the dual control design, the gas pipeline and the water pipeline are mixed, the nozzle blockage is effectively prevented, the continuous and good humidification work can be ensured, in addition, the compressed air consumption is low, the humidification efficiency is high, the indoor air humidification efficiency is favorably improved, and the product production yield is ensured.
Specifically, referring to fig. 18, the spatial high-pressure micro-mist humidifying system includes a relative humidity sensor, a humidifying device and a humidity controller, the humidifying device of the spatial high-pressure micro-mist humidifying system includes a nozzle holder 31, the nozzle holder 31 is provided with a plurality of spray pipes 32, each spray pipe 31 is provided with a plurality of stainless steel nozzles 33, each spray pipe 31 includes an input port, the input port is connected and communicated with a humidifying pipe 34, the input end of the humidifying pipe 34 is connected to a high-pressure micro-mist humidifying host 35, the high-pressure micro-mist humidifying host 35 is connected to a water inlet pipe 36, the water inlet pipe 36 is provided with a water inlet 37 for connecting with a water supply device, the water inlet pipe 36 is connected with a water filter 38, the high-pressure micro-mist humidifying host 35 is electrically connected to the temperature controller, the temperature controller can control the high-pressure micro-mist humidifying host according to a, the space type high-pressure micro-mist humidification system is large in humidification quantity, low in power consumption, energy-saving, high in reaction speed and humidification efficiency, and beneficial to improving indoor humidification efficiency and guaranteeing the production yield of products.
Based on the same inventive concept, the embodiment of the invention also provides a clean production plant, which comprises any one of the clean room arrangement structures with the secondary humidification system provided by the above embodiments.
It will be apparent to those skilled in the art that various changes and modifications may be made in the embodiments of the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (9)
1. A clean room arrangement with a secondary humidification system, comprising: at least one set of secondary humidification system, each set of secondary humidification system includes:
the humidifying device is arranged in an upper technical interlayer, a lower technical interlayer, an air return channel or a clean production area of the clean room;
a relative humidity sensor for detecting the humidity of the air in the clean room;
and the humidity controller is used for receiving a humidity signal of the relative humidity sensor so as to control the work of the humidifying device according to the humidity signal.
2. The clean room arrangement structure with the secondary humidification system as claimed in claim 1, wherein a first independent partition and a second independent partition are provided in the clean room, a partition wall assembly is provided between the first independent partition and the second independent partition to partition at least the clean production area to form a first clean production area and a second clean production area, and the first independent partition comprises a first upper technical interlayer, the first clean production area, a first lower technical interlayer and a first return air channel, the second independent partition comprises a second upper technical interlayer, the second clean production area, a second lower technical interlayer and a second return air channel, and the secondary humidification system is provided in the first independent partition.
3. The clean room arrangement structure with the secondary humidification system as claimed in claim 1, wherein a first independent partition and a second independent partition are provided in the clean room, a partition wall assembly is provided between the first independent partition and the second independent partition to partition at least the clean production area to form a first clean production area and a second clean production area, and the first independent partition comprises a first upper technical interlayer, the first clean production area, a first lower technical interlayer and a first return air channel, the second independent partition comprises a second upper technical interlayer, the second clean production area, a second lower technical interlayer and a second return air channel, and the secondary humidification system is provided with at least two groups, and the first independent partition and the second independent partition are provided with the secondary humidification system.
4. The clean room arrangement with a secondary humidification system as claimed in claim 2 or 3, wherein the partition wall assembly comprises a partition wall provided between the first and second independent zones, the partition wall being located at least between the first and second clean production zones to separate the first and second clean production zones; or,
the partition wall assembly comprises a first partition wall and a second partition wall which are arranged between the first independent partition and the second independent partition and are arranged side by side, the first partition wall and the second partition wall are at least positioned between the first clean production area and the second clean production area, the first clean production area and the second clean production area are separated, and a return air channel is formed between the first partition wall and the second partition wall; or,
the partition wall assembly comprises a first partition wall, a second partition wall and a third partition wall, wherein the first partition wall, the second partition wall and the third partition wall are arranged between the first independent partition and the second independent partition and are arranged side by side, the first partition wall and the second partition wall are at least positioned between the first clean production area and the second clean production area, the first clean production area and the second clean production area are separated, the third partition wall is arranged between the first partition wall and the second partition wall, the top of the third partition wall extends to the top plate of the upper technical interlayer and is in sealing fit with the top plate of the upper technical interlayer, and the bottom of the third partition wall extends to the bottom plate of the lower technical interlayer and is in sealing fit with the bottom plate of the lower technical interlayer; and a third return air channel is formed between the first partition wall and the third partition wall, and/or a fourth return air channel is formed between the second partition wall and the third partition wall.
5. The clean room arrangement structure with the secondary humidification system as claimed in claim 4, wherein when the partition wall assembly comprises a first partition wall, a second partition wall and a third partition wall which are arranged between the first independent partition and the second independent partition and are arranged side by side, and a third return air duct is formed between the first partition wall and the third partition wall, the humidification device is arranged in the third return air duct.
6. The clean room arrangement with a secondary humidification system of claim 2 or 3, wherein a zeolite turbine set for adsorbing the volatile organic compounds is provided in the first lower technical interlayer of the first independent partition.
7. The clean room arrangement with a secondary humidification system of claim 1, wherein the relative humidity sensor is provided in a clean production zone of the clean room.
8. The clean room arrangement with secondary humidification systems as claimed in claim 1, wherein in each set of secondary humidification systems, the relative humidity sensors are set to one or more and when the relative humidity sensors are set to one, the humidity signal is a sensing value of the relative humidity sensor; when the relative humidity sensor is provided in plurality, the humidity signal is an average value of humidity sensing values of the plurality of relative humidity sensors.
9. A clean production plant, characterized by comprising a clean room arrangement with a secondary humidification system according to any one of claims 1 to 8.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910740337.9A CN110469160B (en) | 2019-08-12 | 2019-08-12 | Clean room arrangement structure with secondary humidification system and clean production factory building |
| EP20844025.5A EP4006434B1 (en) | 2019-07-23 | 2020-07-20 | Clean workshop capable of being controlled in partition mode |
| PCT/CN2020/103109 WO2021013133A1 (en) | 2019-07-23 | 2020-07-20 | Clean workshop capable of being controlled in partition mode |
| KR1020217043108A KR102686948B1 (en) | 2019-07-23 | 2020-07-20 | Clean workplace controllable in partition mode |
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| CN201910740337.9A CN110469160B (en) | 2019-08-12 | 2019-08-12 | Clean room arrangement structure with secondary humidification system and clean production factory building |
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| CN110469160A true CN110469160A (en) | 2019-11-19 |
| CN110469160B CN110469160B (en) | 2024-08-27 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021013133A1 (en) * | 2019-07-23 | 2021-01-28 | 中国电子工程设计院有限公司 | Clean workshop capable of being controlled in partition mode |
| CN112728664A (en) * | 2020-12-24 | 2021-04-30 | 上海和辉光电股份有限公司 | Dust-free room arrangement mode for avoiding environmental pollution and dust-free room adopting same |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1096332A (en) * | 1996-09-20 | 1998-04-14 | Mitsubishi Electric Corp | Clean room |
| CN1220615A (en) * | 1997-01-31 | 1999-06-23 | 高砂热学工业株式会社 | Air cleaning apparatus, filter and method of manufacturing the same |
| US20020068524A1 (en) * | 2000-11-08 | 2002-06-06 | Toshiaki Nakagawa | Clean room for semiconductor device |
| CN1731032A (en) * | 2005-08-22 | 2006-02-08 | 无锡华润微电子有限公司 | Flow pattern of air conditioning and purifying system in cleaning room |
| CN102200334A (en) * | 2010-03-25 | 2011-09-28 | 元邦Tech株式会社 | Water spray humidification control method for clean room and humidification control system |
| CN103046776A (en) * | 2013-01-10 | 2013-04-17 | 亚翔系统集成科技（苏州）股份有限公司 | Clean room for semiconductor plant |
| CN106524341A (en) * | 2016-12-07 | 2017-03-22 | 广东申菱环境系统股份有限公司 | Air conditioner system for cleaning room |
| CN211949806U (en) * | 2019-08-12 | 2020-11-17 | 中国电子工程设计院有限公司 | Toilet arrangement structure with secondary humidification system and clean production factory building |
-
2019
- 2019-08-12 CN CN201910740337.9A patent/CN110469160B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1096332A (en) * | 1996-09-20 | 1998-04-14 | Mitsubishi Electric Corp | Clean room |
| CN1220615A (en) * | 1997-01-31 | 1999-06-23 | 高砂热学工业株式会社 | Air cleaning apparatus, filter and method of manufacturing the same |
| US20020068524A1 (en) * | 2000-11-08 | 2002-06-06 | Toshiaki Nakagawa | Clean room for semiconductor device |
| CN1731032A (en) * | 2005-08-22 | 2006-02-08 | 无锡华润微电子有限公司 | Flow pattern of air conditioning and purifying system in cleaning room |
| CN102200334A (en) * | 2010-03-25 | 2011-09-28 | 元邦Tech株式会社 | Water spray humidification control method for clean room and humidification control system |
| CN103046776A (en) * | 2013-01-10 | 2013-04-17 | 亚翔系统集成科技（苏州）股份有限公司 | Clean room for semiconductor plant |
| CN106524341A (en) * | 2016-12-07 | 2017-03-22 | 广东申菱环境系统股份有限公司 | Air conditioner system for cleaning room |
| CN211949806U (en) * | 2019-08-12 | 2020-11-17 | 中国电子工程设计院有限公司 | Toilet arrangement structure with secondary humidification system and clean production factory building |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021013133A1 (en) * | 2019-07-23 | 2021-01-28 | 中国电子工程设计院有限公司 | Clean workshop capable of being controlled in partition mode |
| CN112728664A (en) * | 2020-12-24 | 2021-04-30 | 上海和辉光电股份有限公司 | Dust-free room arrangement mode for avoiding environmental pollution and dust-free room adopting same |
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|---|---|
| CN110469160B (en) | 2024-08-27 |
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