TW202335197A - 電子封裝件及其製法 - Google Patents

電子封裝件及其製法 Download PDF

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TW202335197A
TW202335197A TW111105614A TW111105614A TW202335197A TW 202335197 A TW202335197 A TW 202335197A TW 111105614 A TW111105614 A TW 111105614A TW 111105614 A TW111105614 A TW 111105614A TW 202335197 A TW202335197 A TW 202335197A
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organic material
material substrate
circuit
layer
circuit structure
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TWI824414B (zh
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高灃
王隆源
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矽品精密工業股份有限公司
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Priority to CN202210171632.9A priority patent/CN116646330A/zh
Priority to US17/726,163 priority patent/US20230260886A1/en
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Abstract

一種電子封裝件,其係於複數相堆疊之有機材基板之最上側者設置線路結構,以供接置電子元件,使該線路結構之佈線層之線寬/線距符合該電子元件之線寬/線距,故於該電子元件之尺寸規格朝微小化趨勢設計時,該線路結構所配置之佈線層能有效配合該電子元件之線距/線寬,以實現微小化封裝之需求。

Description

電子封裝件及其製法
本發明係有關一種半導體封裝製程,尤指一種電子封裝件及其製法。
隨著近年來可攜式電子產品的蓬勃發展,各類相關產品亦逐漸朝向高密度、高性能以及輕、薄、短、小之趨勢發展。
如圖1所示,習知半導體封裝件1之製法係先將一半導體晶片11以其作用面11a利用覆晶接合方式(即透過導電凸塊110與底膠111)設於一ABF(Ajinomoto Build-up Film)製成之封裝基板10上,再將一散熱件13以其頂片130藉由散熱膠12結合於該半導體晶片11之非作用面11b上,且該散熱件13之支撐腳131透過黏著層14架設於該封裝基板10上。接著,進行封裝壓模作業,以供封裝膠體(圖略)包覆該半導體晶片11及散熱件13,並使該散熱件13之頂片130外露出封裝膠體。之後,將該封裝基板10設於一電路板上。
惟,習知半導體封裝件1中,當該半導體晶片11之尺寸規格朝微小化趨勢設計時,該半導體晶片11之積體電路之線距/線寬也隨之縮減,導致習知 ABF型之封裝基板10所配置之線路無法配合該半導體晶片11之線距/線寬,因而難以實現微小化封裝之需求。
再者,因該封裝基板10之尺寸會依據該半導體晶片11之功能需求增加而愈來愈大,且其所配置之線路層數亦愈來愈高,故該封裝基板10之製程良率也隨之降低(即層數越多,誤差越大),因而造成該封裝基板10之製作成本遽增且製作時間增長。
因此,如何克服上述習知技術之種種問題,實已成為目前業界亟待克服之難題。
鑑於上述習知技術之種種缺失,本發明係提供一種電子封裝件,係包括:線路結構,係設有佈線層且具有相對之第一表面與第二表面;至少一電子元件,係設於該線路結構之第一表面上並電性連接該佈線層;第一有機材基板,係設於該線路結構之第二表面上且具有第一線路層;以及至少一第二有機材基板,係具有第二線路層,且該第一有機材基板藉由複數支撐體堆疊於該至少一第二有機材基板上,以令該佈線層藉由該第一線路層電性導通至該第二線路層,其中,該線路結構之佈線層之線寬/線距係小於該第一有機材基板之第一線路層之線寬/線距及該至少一第二有機材基板之第二線路層之線寬/線距。
本發明亦提供一種電子封裝件,係包括:線路結構,係設有佈線層且具有相對之第一表面與第二表面;至少一電子元件,係設於該線路結構之第一表面上並電性連接該佈線層;第一有機材基板,係設於該線路結構之第二表面上且具有第一線路層;以及至少一第二有機材基板,係具有第二線路層,且該第 一有機材基板藉由複數支撐體堆疊於該至少一第二有機材基板上,以令該佈線層藉由該第一線路層電性導通至該第二線路層,其中,該至少一第二有機材基板之熱膨脹係數大於該線路結構之熱膨脹係數及該第一有機材基板之熱膨脹係數。
本發明復提供一種電子封裝件之製法,係包括:提供具有佈線層之線路結構、具有第一線路層之第一有機材基板及具有第二線路層之至少一第二有機材基板,其中,該線路結構係具有相對之第一表面與第二表面,且該線路結構之佈線層之線寬/線距係小於該第一有機材基板之第一線路層之線寬/線距及該至少一第二有機材基板之第二線路層之線寬/線距;將至少一電子元件設於該線路結構之第一表面上並電性連接該佈線層,且將第一有機材基板設於該線路結構之第二表面上;以及該第一有機材基板藉由複數支撐體堆疊於該至少一第二有機材基板上,以令該佈線層藉由該第一線路層電性導通至該第二線路層。
本發明另提供一種電子封裝件之製法,係包括:提供具有佈線層之線路結構、具有第一線路層之第一有機材基板及具有第二線路層之至少一第二有機材基板,其中,該線路結構係具有相對之第一表面與第二表面,且該至少一第二有機材基板之熱膨脹係數大於該線路結構之熱膨脹係數及該第一有機材基板之熱膨脹係數;將至少一電子元件設於該線路結構之第一表面上並電性連接該佈線層,且將第一有機材基板設於該線路結構之第二表面上;以及該第一有機材基板藉由複數支撐體堆疊於該至少一第二有機材基板上,以令該佈線層藉由該第一線路層電性導通至該第二線路層。
前述之電子封裝件及其製法中,該線路結構之寬度係小於該第一有機材基板之寬度。
前述之電子封裝件及其製法中,該第一有機材基板係與複數該第二有機材基板相堆疊,且各該第二有機材基板之線寬/線距係朝遠離該線路結構之方向增加。
前述之電子封裝件及其製法中,該第一有機材基板係與複數該第二有機材基板相堆疊,且各該第二有機材基板之熱膨脹係數係朝遠離該線路結構之方向增加。
前述之電子封裝件及其製法中,該線路結構之佈線層之層數係小於該第二有機材基板之第二線路層之層數。
前述之電子封裝件及其製法中,該第一有機材基板之第一線路層之層數係等於該第二有機材基板之第二線路層之層數。
前述之電子封裝件及其製法中,該第一有機材基板上係設有散熱件。
前述之電子封裝件及其製法中,該支撐體係電性連接該第一有機材基板與第二有機材基板。
前述之電子封裝件及其製法中,復包括一電路板,係供該第二有機材基板藉由複數導電元件堆疊於其上。例如,該導電元件係電性連接該電路板與該第二有機材基板。
由上可知,本發明之電子封裝件及其製法中,主要藉由將用以接合該電子元件之線路配置於該線路結構中,使該佈線層之線寬/線距符合該電子元件之線寬/線距,故相較於習知技術,本發明於該電子元件之尺寸規格朝微小化趨勢設計且其積體電路之線距/線寬也隨之縮減時,該線路結構所配置之佈線層能有效配合該電子元件之線距/線寬,以實現微小化封裝之需求。
再者,本發明之製法可藉由將預計之線路層數(即該佈線層、第一與第二線路層之層數)分別佈設於該線路結構、第一與第二有機材基板中,使該線路結構、第一與第二有機材基板之線路層數可控制於良率接受範圍內,以提升製程良率,故相較於習知技術,本發明之製法可有效降低該電子封裝件之製作成本且縮減製作時間。
1:半導體封裝件
10:封裝基板
11:半導體晶片
11a,20a:作用面
11b,20b:非作用面
110,200:導電凸塊
111,290:底膠
12:散熱膠
13,23:散熱件
130:頂片
131:支撐腳
14,23b:黏著層
2,3:電子封裝件
2a,3a:載板組件
20:電子元件
21:第一有機材基板
210:第一絕緣層
211:第一線路層
22:第二有機材基板
220:第二絕緣層
221:第二線路層
23a:結合層
230:片體
231:腳部
24:支撐體
25:導電元件
26:電路板
27:線路結構
27a:第一表面
27b:第二表面
270:介電層
271:佈線層
28:封裝層
29:導電體
30:支撐件
A,D:寬度
S1,S2:間隔空間
圖1係為習知半導體封裝件之剖視示意圖。
圖2A至圖2B係為本發明之電子封裝件之製法之剖視示意圖。
圖3係為圖2B之另一實施例之剖視示意圖。
以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。
須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「上」、「第一」、「第二」、「一」等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。
圖2A至圖2B係為本發明之電子封裝件2之製法的剖面示意圖。
如圖2A所示,提供一第一有機材基板21、至少一第二有機材基板22及一線路結構27,且將至少一電子元件20接置於該線路結構27上,以令該電子元件20電性連接該線路結構27,並以一封裝層28包覆該電子元件20。
所述之線路結構27係為無基底形式之載體,如無核心層式(coreless)之載板,其具有相對之第一表面27a與第二表面27b,且包含有至少一介電層270及設於該介電層270上之佈線層(redistribution layer,簡稱RDL)271,其中,最外層之介電層270可作為防銲層,並令最外層之佈線層271之部分表面外露出該防銲層。
於本實施例中,形成該佈線層271之材質係為銅,且形成該介電層270之材質係為如聚對二唑苯(Polybenzoxazole,簡稱PBO)、聚醯亞胺(Polyimide,簡稱PI)、預浸材(Prepreg,簡稱PP)或其它等之介電材。
應可理解地,該線路結構27之整體組成並非習知矽中介板(Si interposer),特此述明。
所述之電子元件20係為主動元件、被動元件或其二者組合等,其中,該主動元件係例如半導體晶片,該被動元件係例如電阻、電容及電感。
於本實施例中,該電子元件20係為主動元件,其具有相對之作用面20a與非作用面20b,該作用面20a具有複數電極墊(圖略),使該些電極墊藉由複數如銲錫材料之導電凸塊200以覆晶方式設於該線路結構27之第一表面27a上且電性連接該佈線層271;或者,該電子元件20可以其非作用面20b設於該線路結構27之第一表面27a上且該些電極墊藉由複數銲線(圖略)以打線方式電性連 接該佈線層271;亦或,該電子元件20可直接接觸該佈線層271以電性連接該佈線層271。然而,有關該電子元件20電性連接該線路結構27之方式不限於上述。
所述之第一有機材基板21係為具有核心層或無核心層(coreless)之線路結構,如封裝基板(substrate),其包含至少一第一絕緣層210與設於該第一絕緣層210上之第一線路層211。
於本實施例中,以製作RDL之方式形成扇出型(fan out)第一線路層211,其材質係為銅,且形成該第一絕緣層210之材質係為如ABF(Ajinomoto Build-up Film)、聚對二唑苯(Polybenzoxazole,簡稱PBO)、聚醯亞胺(Polyimide,簡稱PI)、預浸材(Prepreg,簡稱PP)等之介電材。
再者,該線路結構27之寬度D(或版面面積)係小於該第一有機材基板21之寬度A(或版面面積)。
所述之第二有機材基板22係為類載板(Substrate Like PCB,簡稱SLP),其包含至少一第二絕緣層220與設於該第二絕緣層220上之第二線路層221。
於本實施例中,以增層線路方式形成第二線路層221,其材質係為銅,且形成該第二絕緣層220之材質係為如聚對二唑苯(Polybenzoxazole,簡稱PBO)、聚醯亞胺(Polyimide,簡稱PI)、預浸材(Prepreg,簡稱PP)等之介電材或如綠漆、石墨之防銲材。
再者,該線路結構27之熱膨脹係數(Coefficient of Thermal Expansion,簡稱CTE)不同於第一有機材基板21之熱膨脹係數及該第二有機材基板22之熱膨脹係數。例如,該線路結構27之熱膨脹係數小於該第一有機材基板21 之熱膨脹係數,且該第一有機材基板21之熱膨脹係數小於該第二有機材基板22之熱膨脹係數。
或者,該線路結構27之線距/線寬不同於第一有機材基板21之線距/線寬及該第二有機材基板22之線距/線寬。例如,該佈線層271之線距/線寬小於該第一線路層211之線距/線寬,且該第一線路層211之線距/線寬小於該第二線路層221之線距/線寬。
又,該第一有機材基板21之第一線路層211之層數可依需求等於該第二有機材基板22之第二線路層221之層數。
另外,該第一有機材基板21之寬度A(或版面面積)與該第二有機材基板22之寬度A(或版面面積)係相同。
所述之封裝層28係為絕緣材,如聚醯亞胺(polyimide,簡稱PI)、乾膜(dry film)、如環氧樹脂(epoxy)之封裝膠體或封裝材(molding compound),其可用壓合(lamination)或模壓(molding)之方式形成於該線路結構27上。
於本實施例中,可藉由整平製程,使該封裝層28之表面齊平該電子元件20之非作用面20b。例如,該整平製程係藉由研磨方式,移除該電子元件20之部分材質與該封裝層28之部分材質。
再者,該封裝層28可包覆該些導電凸塊200;或者,亦可先形成底膠(圖略)於該電子元件20與該線路結構27之間以包覆該些導電凸塊200,再形成該封裝層28以包覆該底膠與該電子元件20。
如圖2B所示,將該線路結構27以其第二表面27b藉由複數導電體29堆疊於該第一有機材基板21上,且該第一有機材基板21藉由複數支撐體24堆疊於該第二有機材基板22上,且該第一有機材基板21與該第二有機材基板22均 未接置有晶片,並使該線路結構27與該第一有機材基板21之間及該第一有機材基板21與該第二有機材基板22之間分別呈現有間隔空間S1,S2。之後,可選擇性設置一散熱件23於該第一有機材基板21上。
所述之導電體29係為銲球(solder ball)、銅核心球或如銅材或金材等之金屬件(如柱狀、塊狀或針狀)等,其電性連接該線路結構27與該第一有機材基板21。
於本實施例中,可形成底膠290於該第一有機材基板21與該線路結構27之第二表面27b之間以包覆該些導電體29。
所述之支撐體24係為銲球(solder ball)、銅核心球或如銅材或金材等之金屬件(如柱狀、塊狀或針狀)等,其電性連接該第一有機材基板21與該第二有機材基板22。
所述之散熱件23係為金屬構造並包含有片體230及腳部231,且以其片體230藉由結合層23a結合於該電子元件20之非作用面20b上,並使該散熱件23之腳部231藉由黏著層23b架設於該第一有機材基板21(或第一線路層211)上。
於本實施例中,該結合層23a係為導熱介面材(Thermal Interface Material,簡稱TIM)、導熱膠或其它適當材質,且該黏著層23b係為絕緣膠、導電膠或其它適當材質等。
再者,可將該第二有機材基板22藉由複數導電元件25接置於一電路板26上。例如,該第二有機材基板22之熱膨脹係數小於該電路板26之熱膨脹係數,且該導電元件25係為銲球(solder ball)、銅核心球或如銅材或金材等之金屬件(如柱狀、塊狀或針狀)等,其電性連接該電路板26與該第二線路層221。
本發明之製法主要藉由將預計接合該電子元件20之線路配置於該線路結構27中,使該佈線層271之線寬/線距符合該電子元件20之積體電路(或導電凸塊200)之線寬/線距,再將該線路結構27、第一有機材基板21與第二有機材基板22以組合方式(如堆疊)構成所需線路層數量之載板組件2a,故相較於習知技術,當該電子元件20之尺寸規格朝微小化趨勢設計且其積體電路之線距/線寬也隨之縮減時,該線路結構27所配置之佈線層271能有效配合該電子元件20之線距/線寬,以實現微小化封裝之需求。
再者,即使該載板組件2a之尺寸依據該電子元件20之數量或功能需求增加而愈來愈大,致使其預計之線路層數愈來愈高,仍可藉由將預計之線路層數分別佈設於該線路結構27、第一有機材基板21與第二有機材基板22中(即構成該佈線層271、第一線路層211與第二線路層221之層數),以提升該載板組件2a之製程良率(即該線路結構27、第一有機材基板21與第二有機材基板22之線路層數可控制於良率接受範圍內),故相較於習知技術,本發明能有效降低該載板組件2a之製作成本且縮減製作時間。
又,於該電子封裝件2中,各板材結構(即該線路結構27、第一有機材基板21與第二有機材基板22)之排設可依CTE之大小依序,如由上而下依序為CTE最小之線路結構27、第一有機材基板21、CTE最大之第二有機材基板22(其CTE介於第一有機材基板21與電路板26之間),以令CTE由上往下逐步變大,故相較於習知技術,本發明之製法於該電路板26之CTE維持不變之情況下,可藉由該第二有機材基板22緩衝該載板組件2a之整體熱膨脹變形量,以避免該載板組件2a與該電路板26之間因CTE不匹配而相分離之問題,即避免該導電元件25之連 接可靠度之問題,使該第二有機材基板22能有效電性連接該電路板26或該載板組件2a能通過可靠度測試,進而提高產品之良率。
於另一實施例中,如圖3所示之電子封裝件3,亦可依良率需求,使該載板組件3a包含複數個第二有機材基板22,且各該第二有機材基板22之間係藉由複數支撐件30相堆疊。例如,各該第二有機材基板22之熱膨脹係數可相同或不相同,且該支撐件30係為銲球(solder ball)、銅核心球或如銅材或金材等之金屬件(如柱狀、塊狀或針狀)等,其電性連接該電路板26與各該第二有機材基板22。較佳地,各該第二有機材基板22之線寬/線距(或熱膨脹係數)可朝遠離該線路結構27之方向增加。
因此,於該電子封裝件3中,各該第二有機材基板22之排設可由上而下依序為CTE最小至CTE最大,以令該些第二有機材基板22之CTE係由上往下逐步變大,故相較於習知技術,本發明之製法於該電路板26之CTE維持不變之情況下,可藉由最靠近該電路板26(或最遠離該線路結構27)之第二有機材基板22緩衝該載板組件3a之整體熱膨脹變形量,以避免該載板組件3a與該電路板26之間因CTE不匹配而相分離之問題,使該第二有機材基板22能有效電性連接該電路板26或該載板組件3a能通過可靠度測試,進而提高產品之良率。
本發明復提供一種電子封裝件2,3,其包括:一線路結構27、至少一電子元件20、一第一有機材基板21以及至少一第二有機材基板22。
所述之線路結構27係具有相對之第一表面27a與第二表面27b且包含有至少一佈線層271。
所述之電子元件20係設於該線路結構27之第一表面27a上並電性連接該佈線層271。
所述之第一有機材基板21係設於該線路結構27之第二表面27b上且具有第一線路層211,其中,該線路結構27之佈線層271之線寬/線距係小於該第一有機材基板21之第一線路層211之線寬/線距及該第二有機材基板22之第二線路層221之線寬/線距、或者,該第二有機材基板22之熱膨脹係數大於該線路結構27之熱膨脹係數及該第一有機材基板21之熱膨脹係數。
所述之第二有機材基板22係具有第二線路層221,且該第一有機材基板21藉由複數支撐體24堆疊於該第二有機材基板22上,以令該佈線層271藉由該第一線路層211電性導通至該第二線路層221。
於一實施例中,該線路結構27之寬度D係小於該第一有機材基板21之寬度A。
於一實施例中,該第一有機材基板21係藉由複數支撐件30與複數該第二有機材基板22相堆疊,且各該第二有機材基板22之線寬/線距係朝遠離該線路結構27之方向增加。
於一實施例中,該第一有機材基板21係藉由複數支撐件30與複數該第二有機材基板22相堆疊,且各該第二有機材基板22之熱膨脹係數係朝遠離該線路結構27之方向增加。
於一實施例中,該線路結構27之佈線層271之層數係小於該第二有機材基板22之第二線路層221之層數。
於一實施例中,該第一有機材基板21之第一線路層211之層數係等於該第二有機材基板22之第二線路層221之層數。
於一實施例中,該第一有機材基板21上係設有散熱件23。
於一實施例中,該支撐體24係電性連接該第一有機材基板21與第二有機材基板22。
於一實施例中,所述之電子封裝件2,3復包括一電路板26,係供該第二有機材基板22藉由複數導電元件25堆疊於其上。例如,該導電元件25係電性連接該電路板26與該第二有機材基板22。
綜上所述,本發明之電子封裝件及其製法,係藉由將預計接合該電子元件之線路配置於該線路結構中,使該線路結構之佈線層之線寬/線距符合該電子元件之線寬/線距,故本發明之電子封裝件得以實現微小化封裝之需求。
再者,藉由將預計之線路層數分別佈設於該線路結構、第一有機材基板與第二有機材基板中,以提升該線路結構、第一有機材基板與第二有機材基板之製程良率,故本發明之製法能有效降低該電子封裝件之製作成本且縮減製作時間。
上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。
2:電子封裝件
200:導電凸塊
290:底膠
23:散熱件
23b:黏著層
20:電子元件
21:第一有機材基板
210:第一絕緣層
211:第一線路層
22:第二有機材基板
220:第二絕緣層
221:第二線路層
23a:結合層
230:片體
231:腳部
24:支撐體
25:導電元件
26:電路板
27:線路結構
27a:第一表面
27b:第二表面
270:介電層
271:佈線層
28:封裝層
29:導電體
S1,S2:間隔空間

Claims (22)

  1. 一種電子封裝件,係包括:
    線路結構,係設有佈線層且具有相對之第一表面與第二表面;
    至少一電子元件,係設於該線路結構之第一表面上並電性連接該佈線層;
    第一有機材基板,係設於該線路結構之第二表面上且具有第一線路層;以及
    至少一第二有機材基板,係具有第二線路層,且該第一有機材基板藉由複數支撐體堆疊於該至少一第二有機材基板上,以令該佈線層藉由該第一線路層電性導通至該第二線路層,其中,該線路結構之佈線層之線寬/線距係小於該第一有機材基板之第一線路層之線寬/線距及該至少一第二有機材基板之第二線路層之線寬/線距。
  2. 一種電子封裝件,係包括:
    線路結構,係設有佈線層且具有相對之第一表面與第二表面;
    至少一電子元件,係設於該線路結構之第一表面上並電性連接該佈線層;
    第一有機材基板,係設於該線路結構之第二表面上且具有第一線路層;以及
    至少一第二有機材基板,係具有第二線路層,且該第一有機材基板藉由複數支撐體堆疊於該至少一第二有機材基板上,以令該佈線層藉由該第一線路層電性導通至該第二線路層,其中,該至少一第二有機材基板之熱膨脹係數大於該線路結構之熱膨脹係數及該第一有機材基板之熱膨脹係數。
  3. 如請求項1或2所述之電子封裝件,其中,該線路結構之寬度係小於該第一有機材基板之寬度。
  4. 如請求項1或2所述之電子封裝件,其中,該第一有機材基板係與複數該第二有機材基板相堆疊,且各該第二有機材基板之線寬/線距係朝遠離該線路結構之方向增加。
  5. 如請求項1或2所述之電子封裝件,其中,該第一有機材基板係與複數該第二有機材基板相堆疊,且各該第二有機材基板之熱膨脹係數係朝遠離該線路結構之方向增加。
  6. 如請求項1或2所述之電子封裝件,其中,該線路結構之佈線層之層數係小於該至少一第二有機材基板之第二線路層之層數。
  7. 如請求項1或2所述之電子封裝件,其中,該第一有機材基板之第一線路層之層數係等於該至少一第二有機材基板之第二線路層之層數。
  8. 如請求項1或2所述之電子封裝件,其中,該第一有機材基板上係設有散熱件。
  9. 如請求項1或2所述之電子封裝件,其中,該複數支撐體係電性連接該第一有機材基板與該至少一第二有機材基板。
  10. 如請求項1或2所述之電子封裝件,復包括一電路板,係供該至少一第二有機材基板藉由複數導電元件堆疊於其上。
  11. 如請求項10所述之電子封裝件,其中,該複數導電元件係電性連接該電路板與該至少一第二有機材基板。
  12. 一種電子封裝件之製法,係包括:
    提供具有佈線層之線路結構、具有第一線路層之第一有機材基板及具有第二線路層之至少一第二有機材基板,其中,該線路結構係具有相對之第一表面與 第二表面,且該線路結構之佈線層之線寬/線距係小於該第一有機材基板之第一線路層之線寬/線距及該至少一第二有機材基板之第二線路層之線寬/線距;
    將至少一電子元件設於該線路結構之第一表面上並電性連接該佈線層,且將第一有機材基板設於該線路結構之第二表面上;以及
    該第一有機材基板藉由複數支撐體堆疊於該至少一第二有機材基板上,以令該佈線層藉由該第一線路層電性導通至該第二線路層。
  13. 一種電子封裝件之製法,係包括:
    提供具有佈線層之線路結構、具有第一線路層之第一有機材基板及具有第二線路層之至少一第二有機材基板,其中,該線路結構係具有相對之第一表面與第二表面,且該至少一第二有機材基板之熱膨脹係數大於該線路結構之熱膨脹係數及該第一有機材基板之熱膨脹係數;
    將至少一電子元件設於該線路結構之第一表面上並電性連接該佈線層,且將第一有機材基板設於該線路結構之第二表面上;以及
    該第一有機材基板藉由複數支撐體堆疊於該至少一第二有機材基板上,以令該佈線層藉由該第一線路層電性導通至該第二線路層。
  14. 如請求項12或13所述之電子封裝件之製法,其中,該線路結構之寬度係小於該第一有機材基板之寬度。
  15. 如請求項12或13所述之電子封裝件之製法,其中,該第一有機材基板係與複數該第二有機材基板相堆疊,且各該第二有機材基板之線寬/線距係朝遠離該線路結構之方向增加。
  16. 如請求項12或13所述之電子封裝件之製法,其中,該第一有機材基板係與複數該第二有機材基板相堆疊,且各該第二有機材基板之熱膨脹係數係朝遠離該線路結構之方向增加。
  17. 如請求項12或13所述之電子封裝件之製法,其中,該線路結構之佈線層之層數係小於該至少一第二有機材基板之第二線路層之層數。
  18. 如請求項12或13所述之電子封裝件之製法,其中,該第一有機材基板之第一線路層之層數係等於該至少一第二有機材基板之第二線路層之層數。
  19. 如請求項12或13所述之電子封裝件之製法,復包括於該第一有機材基板上設置散熱件。
  20. 如請求項12或13所述之電子封裝件之製法,其中,該複數支撐體係電性連接該第一有機材基板與該至少一第二有機材基板。
  21. 如請求項12或13所述之電子封裝件之製法,復包括提供一電路板,係供該至少一第二有機材基板藉由複數導電元件堆疊於其上。
  22. 如請求項21所述之電子封裝件之製法,其中,該複數導電元件係電性連接該電路板與該至少一第二有機材基板。
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