TW202334748A - 轉印膜、具有導體圖案的積層體、具有導體圖案的積層體的製造方法、轉印膜的製造方法 - Google Patents

轉印膜、具有導體圖案的積層體、具有導體圖案的積層體的製造方法、轉印膜的製造方法 Download PDF

Info

Publication number
TW202334748A
TW202334748A TW111143850A TW111143850A TW202334748A TW 202334748 A TW202334748 A TW 202334748A TW 111143850 A TW111143850 A TW 111143850A TW 111143850 A TW111143850 A TW 111143850A TW 202334748 A TW202334748 A TW 202334748A
Authority
TW
Taiwan
Prior art keywords
photosensitive composition
composition layer
meth
group
mass
Prior art date
Application number
TW111143850A
Other languages
English (en)
Chinese (zh)
Inventor
佐藤守正
Original Assignee
日商富士軟片股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商富士軟片股份有限公司 filed Critical 日商富士軟片股份有限公司
Publication of TW202334748A publication Critical patent/TW202334748A/zh

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Human Computer Interaction (AREA)
  • Materials For Photolithography (AREA)
TW111143850A 2021-11-30 2022-11-17 轉印膜、具有導體圖案的積層體、具有導體圖案的積層體的製造方法、轉印膜的製造方法 TW202334748A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-194465 2021-11-30
JP2021194465 2021-11-30

Publications (1)

Publication Number Publication Date
TW202334748A true TW202334748A (zh) 2023-09-01

Family

ID=86611855

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111143850A TW202334748A (zh) 2021-11-30 2022-11-17 轉印膜、具有導體圖案的積層體、具有導體圖案的積層體的製造方法、轉印膜的製造方法

Country Status (3)

Country Link
CN (1) CN118235091A (ja)
TW (1) TW202334748A (ja)
WO (1) WO2023100553A1 (ja)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004191648A (ja) * 2002-12-11 2004-07-08 Hitachi Chem Co Ltd 感光性エレメント、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法
KR20160002887A (ko) * 2013-04-24 2016-01-08 히타치가세이가부시끼가이샤 감광성 엘리먼트, 감광성 엘리먼트 롤, 레지스트 패턴의 제조방법 및 전자부품

Also Published As

Publication number Publication date
CN118235091A (zh) 2024-06-21
WO2023100553A1 (ja) 2023-06-08

Similar Documents

Publication Publication Date Title
WO2022045203A1 (ja) 転写フィルム、積層体の製造方法、回路配線の製造方法
JP7342246B2 (ja) 感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法及びタッチパネルの製造方法
WO2021220981A1 (ja) 感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法及びタッチパネルの製造方法、並びに、ポリエチレンテレフタレートフィルム
TW202236009A (zh) 積層體之製造方法、電路配線基板之製造方法、轉印薄膜
WO2021199542A1 (ja) 感光性転写材料、樹脂パターンの製造方法、及び回路配線の製造方法
CN115698856A (zh) 转印膜、层叠体的制造方法
TW202334748A (zh) 轉印膜、具有導體圖案的積層體、具有導體圖案的積層體的製造方法、轉印膜的製造方法
WO2022138578A1 (ja) 感光性転写材料、樹脂パターンの製造方法、積層体の製造方法、回路配線の製造方法、及び、電子デバイスの製造方法
WO2022138576A1 (ja) 感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法、電子デバイスの製造方法、及び、積層体の製造方法
WO2022138577A1 (ja) 感光性転写材料、樹脂パターンの製造方法、積層体の製造方法、回路配線の製造方法、及び、電子デバイスの製造方法
WO2022075090A1 (ja) 転写フィルム、積層体の製造方法、回路配線の製造方法
WO2022131324A1 (ja) 転写フィルム、積層体の製造方法、回路配線の製造方法
WO2023145156A1 (ja) 転写フィルム及び導体パターン形成方法
WO2021161965A1 (ja) 感光性フィルム、及び感光性フィルムの製造方法
US20230094866A1 (en) Photosensitive transfer material for led array, light shielding material for led array, led array, and electronic apparatus
KR20240090361A (ko) 전사 필름, 도체 패턴을 갖는 적층체 및 도체 패턴을 갖는 적층체의 제조 방법, 전사 필름의 제조 방법
WO2022138630A1 (ja) 転写フィルム、積層体の製造方法、回路配線の製造方法
WO2022138493A1 (ja) 積層体の製造方法、回路配線の製造方法、転写フィルム
WO2022181611A1 (ja) 導体パターンを有する積層体の製造方法
JP2022156251A (ja) 転写フィルム、積層体の製造方法、導体パターンを有する積層体の製造方法
TW202402530A (zh) 轉印膜、圖案之形成方法及電路配線之製造方法
TW202243907A (zh) 積層體之製造方法、電路配線之製造方法
TW202309662A (zh) 感光性組成物、感光性組成物層、轉印膜、具有導體圖案之積層體之製造方法
TW202311049A (zh) 轉印膜、具有導體圖案之積層體之製造方法
TW202311872A (zh) 具有導體圖案之積層體之製造方法、轉印膜