TW202317492A - 玻璃磚及其製造方法以及半導體製造裝置用構件 - Google Patents

玻璃磚及其製造方法以及半導體製造裝置用構件 Download PDF

Info

Publication number
TW202317492A
TW202317492A TW111134026A TW111134026A TW202317492A TW 202317492 A TW202317492 A TW 202317492A TW 111134026 A TW111134026 A TW 111134026A TW 111134026 A TW111134026 A TW 111134026A TW 202317492 A TW202317492 A TW 202317492A
Authority
TW
Taiwan
Prior art keywords
content
mol
less
mole
glass
Prior art date
Application number
TW111134026A
Other languages
English (en)
Chinese (zh)
Inventor
金原一樹
稲葉誠二
小川修平
Original Assignee
日商Ａｇｃ股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商Ａｇｃ股份有限公司 filed Critical 日商Ａｇｃ股份有限公司
Publication of TW202317492A publication Critical patent/TW202317492A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/235—Heating the glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/02—Other methods of shaping glass by casting molten glass, e.g. injection moulding
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B25/00—Annealing glass products
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B25/00—Annealing glass products
    • C03B25/02—Annealing glass products in a discontinuous way
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/078—Glass compositions containing silica with 40% to 90% silica, by weight containing an oxide of a divalent metal, e.g. an oxide of zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
    • C03C3/111—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/12—Silica-free oxide glass compositions
    • C03C3/125—Silica-free oxide glass compositions containing aluminium as glass former
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/24—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials
    • H10P50/242—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials of Group IV materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H10P72/722—Details of electrostatic chucks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7616—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating, a hardness or a material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Compositions (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
TW111134026A 2021-09-14 2022-09-08 玻璃磚及其製造方法以及半導體製造裝置用構件 TW202317492A (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2021149104 2021-09-14
JP2021-149104 2021-09-14
JP2021167594 2021-10-12
JP2021-167594 2021-10-12
JP2021192308 2021-11-26
JP2021-192308 2021-11-26

Publications (1)

Publication Number Publication Date
TW202317492A true TW202317492A (zh) 2023-05-01

Family

ID=85602206

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111134026A TW202317492A (zh) 2021-09-14 2022-09-08 玻璃磚及其製造方法以及半導體製造裝置用構件

Country Status (5)

Country Link
US (1) US20240217864A1 (https=)
JP (1) JPWO2023042717A1 (https=)
KR (1) KR20240066162A (https=)
TW (1) TW202317492A (https=)
WO (1) WO2023042717A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025215132A1 (de) 2024-04-12 2025-10-16 Heraeus Quarzglas Gmbh & Co. Kg Multikomponentenglas mit hoher ätzresistenz beim trockenätzen, bauteil aus dem multikomponentenglas und verwendung desselben
KR20250176857A (ko) * 2024-06-13 2025-12-22 한솔아이원스 주식회사 내플라즈마성 유리, 반도체 제조 공정을 위한 챔버 내부용 부품 및 그들의 제조방법
CN119977324B (zh) * 2024-09-20 2026-01-02 中国建筑材料科学研究总院有限公司 一种中红外镓酸盐玻璃及其制备方法和应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS608985B2 (ja) * 1979-08-10 1985-03-07 富士写真フイルム株式会社 結晶化ガラスおよびその製造方法
FR2530235A1 (fr) * 1982-07-16 1984-01-20 Corning Glass Works Verres a haut indice de refraction, faible dispersion et faible densite
JP3659435B2 (ja) 1996-02-29 2005-06-15 京セラ株式会社 耐食性部材、プラズマ処理装置、半導体製造装置、液晶製造装置及び放電容器。
JP3950203B2 (ja) * 1996-09-04 2007-07-25 Ｈｏｙａ株式会社 高い比弾性率を有するガラス
JPH11157867A (ja) * 1997-11-21 1999-06-15 Sec Kk 情報記録ディスク基板用ガラス
JP2000044279A (ja) * 1998-07-24 2000-02-15 Shoei Material Kk 情報記録ディスク基板
JP2002173334A (ja) * 2000-12-06 2002-06-21 Minolta Co Ltd 光学ガラス
JP4439192B2 (ja) * 2002-03-11 2010-03-24 東ソー株式会社 高耐久性石英ガラス、製造方法、これを用いた部材及び装置
US20090105061A1 (en) * 2006-05-02 2009-04-23 Nippon Sheet Glass Company, Limited Glass Composition and Glass Spacer Using the Same
JP2015027932A (ja) * 2013-06-27 2015-02-12 旭硝子株式会社 磁気記録媒体用無アルカリガラス、および、これを用いた磁気記録媒体用ガラス基板
JP6802966B2 (ja) * 2014-12-17 2020-12-23 日本電気硝子株式会社 支持ガラス基板及びこれを用いた積層体

Also Published As

Publication number Publication date
US20240217864A1 (en) 2024-07-04
KR20240066162A (ko) 2024-05-14
JPWO2023042717A1 (https=) 2023-03-23
WO2023042717A1 (ja) 2023-03-23

Similar Documents

Publication Publication Date Title
TW202317492A (zh) 玻璃磚及其製造方法以及半導體製造裝置用構件
EP3475236B1 (en) Zirconia-toughened glass ceramics
KR101712225B1 (ko) 고성능 유리 세라믹 및 고성능 유리 세라믹의 제조 방법
US8563453B2 (en) High zirconia fused cast refractory
KR102376825B1 (ko) 알루미나 소결체 및 광학 소자용 하지 기판
US7084084B2 (en) Highly durable silica glass, process for producing same, member comprised thereof, and apparatus provided therewith
EP3708556A1 (en) Alumina-zirconia-silica fused cast refractory and glass melting furnace
JP2007332018A (ja) ビスマス系封着材料およびビスマス系ペースト材料
JP5751744B2 (ja) ガラス
CN109661380B (zh) 斜锰辉石玻璃陶瓷
US20240425407A1 (en) Glass block, method for producing same, and plasma-resistant member
CN117940385A (zh) 玻璃块及其制造方法和半导体制造装置用部件
US20260062339A1 (en) Glass, method for producing glass, member for semiconductor production apparatus, and semiconductor production apparatus
KR20070070058A (ko) 고지르코니아 주조 내화물
WO2016006531A1 (ja) アルミナ・ジルコニア・シリカ質溶融鋳造耐火物、ガラス溶融窯、およびガラス板の製造方法
JP7704315B2 (ja) ガラス部材およびその製造方法
JP2026047198A (ja) ガラス、ガラスの製造方法、半導体製造装置用部材および半導体製造装置
TW202231603A (zh) 高氧化鋯電熔融鑄造耐火物
JP2000086281A (ja) 半導体パッケ―ジ用窓材ガラス及びその製造方法
KR102779544B1 (ko) 내플라즈마 유리 및 그 제조방법
WO2007077680A1 (ja) ガラス組成物
WO2007077681A1 (ja) ガラス組成物
US20250289751A1 (en) Chemically tempered crystallized glass, and crystallized glass to be chemically tempered
US20260078052A1 (en) Chemically strengthened glass and method for producing chemically strengthened glass
JP7132735B2 (ja) 金属製真空二重容器封着用ガラス組成物と金属製真空二重容器