JPWO2023042717A1 - - Google Patents
Info
- Publication number
- JPWO2023042717A1 JPWO2023042717A1 JP2023548425A JP2023548425A JPWO2023042717A1 JP WO2023042717 A1 JPWO2023042717 A1 JP WO2023042717A1 JP 2023548425 A JP2023548425 A JP 2023548425A JP 2023548425 A JP2023548425 A JP 2023548425A JP WO2023042717 A1 JPWO2023042717 A1 JP WO2023042717A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/235—Heating the glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/02—Other methods of shaping glass by casting molten glass, e.g. injection moulding
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
- C03B25/02—Annealing glass products in a discontinuous way
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/078—Glass compositions containing silica with 40% to 90% silica, by weight containing an oxide of a divalent metal, e.g. an oxide of zinc
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
- C03C3/111—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/125—Silica-free oxide glass compositions containing aluminium as glass former
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
- H10P50/24—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials
- H10P50/242—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials of Group IV materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
- H10P72/722—Details of electrostatic chucks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
- H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
- H10P72/7616—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating, a hardness or a material
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Glass Compositions (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021149104 | 2021-09-14 | ||
| JP2021167594 | 2021-10-12 | ||
| JP2021192308 | 2021-11-26 | ||
| PCT/JP2022/033485 WO2023042717A1 (ja) | 2021-09-14 | 2022-09-06 | ガラスブロックおよびその製造方法ならびに半導体製造装置用部材 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2023042717A1 true JPWO2023042717A1 (https=) | 2023-03-23 |
Family
ID=85602206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023548425A Pending JPWO2023042717A1 (https=) | 2021-09-14 | 2022-09-06 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240217864A1 (https=) |
| JP (1) | JPWO2023042717A1 (https=) |
| KR (1) | KR20240066162A (https=) |
| TW (1) | TW202317492A (https=) |
| WO (1) | WO2023042717A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025215132A1 (de) | 2024-04-12 | 2025-10-16 | Heraeus Quarzglas Gmbh & Co. Kg | Multikomponentenglas mit hoher ätzresistenz beim trockenätzen, bauteil aus dem multikomponentenglas und verwendung desselben |
| KR20250176857A (ko) * | 2024-06-13 | 2025-12-22 | 한솔아이원스 주식회사 | 내플라즈마성 유리, 반도체 제조 공정을 위한 챔버 내부용 부품 및 그들의 제조방법 |
| CN119977324B (zh) * | 2024-09-20 | 2026-01-02 | 中国建筑材料科学研究总院有限公司 | 一种中红外镓酸盐玻璃及其制备方法和应用 |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5626743A (en) * | 1979-08-10 | 1981-03-14 | Fuji Photo Film Co Ltd | Phosphate type glass, its crystallized glass and their manufacture |
| JPS5930731A (ja) * | 1982-07-16 | 1984-02-18 | コ−ニング・グラス・ワ−クス | 高屈折率、低分散および低密度ガラス |
| JPH11116267A (ja) * | 1996-09-04 | 1999-04-27 | Hoya Corp | 高い比弾性率を有するガラス |
| JPH11157867A (ja) * | 1997-11-21 | 1999-06-15 | Sec Kk | 情報記録ディスク基板用ガラス |
| JP2000044279A (ja) * | 1998-07-24 | 2000-02-15 | Shoei Material Kk | 情報記録ディスク基板 |
| JP2002173334A (ja) * | 2000-12-06 | 2002-06-21 | Minolta Co Ltd | 光学ガラス |
| JP2004284828A (ja) * | 2002-03-11 | 2004-10-14 | Tosoh Corp | 高耐久性石英ガラス、製造方法、これを用いた部材及び装置 |
| WO2007129629A1 (ja) * | 2006-05-02 | 2007-11-15 | Nippon Sheet Glass Company, Limited | ガラス組成物およびこれを用いたガラススペーサ |
| JP2015027932A (ja) * | 2013-06-27 | 2015-02-12 | 旭硝子株式会社 | 磁気記録媒体用無アルカリガラス、および、これを用いた磁気記録媒体用ガラス基板 |
| JP2016117641A (ja) * | 2014-12-17 | 2016-06-30 | 日本電気硝子株式会社 | 支持ガラス基板及びこれを用いた積層体 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3659435B2 (ja) | 1996-02-29 | 2005-06-15 | 京セラ株式会社 | 耐食性部材、プラズマ処理装置、半導体製造装置、液晶製造装置及び放電容器。 |
-
2022
- 2022-09-06 KR KR1020247008437A patent/KR20240066162A/ko active Pending
- 2022-09-06 JP JP2023548425A patent/JPWO2023042717A1/ja active Pending
- 2022-09-06 WO PCT/JP2022/033485 patent/WO2023042717A1/ja not_active Ceased
- 2022-09-08 TW TW111134026A patent/TW202317492A/zh unknown
-
2024
- 2024-03-11 US US18/600,865 patent/US20240217864A1/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5626743A (en) * | 1979-08-10 | 1981-03-14 | Fuji Photo Film Co Ltd | Phosphate type glass, its crystallized glass and their manufacture |
| JPS5930731A (ja) * | 1982-07-16 | 1984-02-18 | コ−ニング・グラス・ワ−クス | 高屈折率、低分散および低密度ガラス |
| JPH11116267A (ja) * | 1996-09-04 | 1999-04-27 | Hoya Corp | 高い比弾性率を有するガラス |
| JPH11157867A (ja) * | 1997-11-21 | 1999-06-15 | Sec Kk | 情報記録ディスク基板用ガラス |
| JP2000044279A (ja) * | 1998-07-24 | 2000-02-15 | Shoei Material Kk | 情報記録ディスク基板 |
| JP2002173334A (ja) * | 2000-12-06 | 2002-06-21 | Minolta Co Ltd | 光学ガラス |
| JP2004284828A (ja) * | 2002-03-11 | 2004-10-14 | Tosoh Corp | 高耐久性石英ガラス、製造方法、これを用いた部材及び装置 |
| WO2007129629A1 (ja) * | 2006-05-02 | 2007-11-15 | Nippon Sheet Glass Company, Limited | ガラス組成物およびこれを用いたガラススペーサ |
| JP2015027932A (ja) * | 2013-06-27 | 2015-02-12 | 旭硝子株式会社 | 磁気記録媒体用無アルカリガラス、および、これを用いた磁気記録媒体用ガラス基板 |
| JP2016117641A (ja) * | 2014-12-17 | 2016-06-30 | 日本電気硝子株式会社 | 支持ガラス基板及びこれを用いた積層体 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20240217864A1 (en) | 2024-07-04 |
| KR20240066162A (ko) | 2024-05-14 |
| TW202317492A (zh) | 2023-05-01 |
| WO2023042717A1 (ja) | 2023-03-23 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
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| A621 | Written request for application examination |
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| A131 | Notification of reasons for refusal |
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| A521 | Request for written amendment filed |
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