TW202200808A - 電磁波透過性積層構件、及其製造方法 - Google Patents

電磁波透過性積層構件、及其製造方法 Download PDF

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Publication number
TW202200808A
TW202200808A TW110108300A TW110108300A TW202200808A TW 202200808 A TW202200808 A TW 202200808A TW 110108300 A TW110108300 A TW 110108300A TW 110108300 A TW110108300 A TW 110108300A TW 202200808 A TW202200808 A TW 202200808A
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TW
Taiwan
Prior art keywords
indium oxide
containing layer
electromagnetic wave
layer
laminated member
Prior art date
Application number
TW110108300A
Other languages
English (en)
Chinese (zh)
Inventor
渡邉太一
陳暁雷
待永広宣
中井孝洋
Original Assignee
日商日東電工股份有限公司
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Publication date
Application filed by 日商日東電工股份有限公司 filed Critical 日商日東電工股份有限公司
Publication of TW202200808A publication Critical patent/TW202200808A/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form
    • B32B3/10—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
TW110108300A 2020-03-09 2021-03-09 電磁波透過性積層構件、及其製造方法 TW202200808A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-040057 2020-03-09
JP2020040057 2020-03-09

Publications (1)

Publication Number Publication Date
TW202200808A true TW202200808A (zh) 2022-01-01

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TW110108300A TW202200808A (zh) 2020-03-09 2021-03-09 電磁波透過性積層構件、及其製造方法

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JP (1) JPWO2021182380A1 (ja)
TW (1) TW202200808A (ja)
WO (1) WO2021182380A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114635113A (zh) * 2022-03-09 2022-06-17 北京科技大学 一种高亮度银白色电磁波透过复合薄膜的制备方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023190612A1 (ja) * 2022-03-30 2023-10-05 日東電工株式会社 積層体、発光デバイス、及びセンシングデバイス

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000006299A (ja) * 1998-06-23 2000-01-11 Mitsui Chemicals Inc 透明導電性積層体
JP4706596B2 (ja) * 2005-10-31 2011-06-22 豊田合成株式会社 樹脂製品及びその製造方法並びに金属皮膜の成膜方法
JPWO2014097943A1 (ja) * 2012-12-18 2017-01-12 東レ株式会社 金属ドット基板および金属ドット基板の製造方法
JP6566750B2 (ja) * 2015-07-02 2019-08-28 Cbc株式会社 不連続金属膜の形成方法
JP6400062B2 (ja) * 2016-10-24 2018-10-03 日東電工株式会社 電磁波透過性金属光沢部材、これを用いた物品、及び、金属薄膜
WO2019139122A1 (ja) * 2018-01-12 2019-07-18 日東電工株式会社 電波透過性金属光沢部材、これを用いた物品、及びその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114635113A (zh) * 2022-03-09 2022-06-17 北京科技大学 一种高亮度银白色电磁波透过复合薄膜的制备方法

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WO2021182380A1 (ja) 2021-09-16

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