TW201923964A - Manufacturing apparatus of semiconductor and manufacturing method of semiconductor device including a collet confirmation inspection unit capable of confirming the shape and installation state of a collet - Google Patents

Manufacturing apparatus of semiconductor and manufacturing method of semiconductor device including a collet confirmation inspection unit capable of confirming the shape and installation state of a collet Download PDF

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TW201923964A
TW201923964A TW107133558A TW107133558A TW201923964A TW 201923964 A TW201923964 A TW 201923964A TW 107133558 A TW107133558 A TW 107133558A TW 107133558 A TW107133558 A TW 107133558A TW 201923964 A TW201923964 A TW 201923964A
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chuck
head
die
manufacturing apparatus
bonding
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TW107133558A
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Chinese (zh)
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TWI734030B (en
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高野晴之
牧浩
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日商捷進科技有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67121Apparatus for making assemblies not otherwise provided for, e.g. package constructions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/52Mounting semiconductor bodies in containers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67132Apparatus for placing on an insulating substrate, e.g. tape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67144Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes

Abstract

An object of the present invention is to provide a semiconductor manufacturing apparatus including a collet confirmation inspection unit capable of confirming the shape and installation state of a collet. A semiconductor manufacturing apparatus includes a head that sucks and picks a die with a collet, a collet inspection unit that confirms and inspects the collet, and a control device that controls the head and the collet inspection unit. The collet inspection unit includes a shape detection sensor. The control device reads the shape of the collet by the shape detection sensor.

Description

半導體製造裝置及半導體裝置之製造方法Semiconductor manufacturing device and method for manufacturing semiconductor device

本揭示係關於半導體製造裝置,例如能夠適用於具備例如夾頭(collet)檢查部的晶粒接合器。The present disclosure relates to a semiconductor manufacturing apparatus, and can be applied to, for example, a die bonder including, for example, a collet inspection unit.

半導體裝置之製造工程之一部分具有在配線基板或引線框架等(以下,單稱為基板)搭載半導體晶片(以下,單稱為晶粒)而組裝封裝體之工程,組裝封裝體之工程之一部分具有從半導體晶圓(以下,單稱為晶圓)分割晶粒之工程(切割工程),和將分割之晶粒搭載在基板上之接合工程。在接合工程中使用之半導體製造裝置為晶粒接合器。A part of the manufacturing process of a semiconductor device includes a process of assembling a package by mounting a semiconductor wafer (hereinafter, simply referred to as a die) on a wiring board or a lead frame (hereinafter, simply referred to as a substrate), and a part of the process of assembling the package. A process of dicing a die from a semiconductor wafer (hereinafter, simply referred to as a wafer) (dicing process), and a bonding process of mounting the separated die on a substrate. The semiconductor manufacturing device used in the bonding process is a die bonder.

晶粒接合器係以焊料、鍍金、樹脂作為接合材料,將晶粒接合(搭載而予以接合)在基板或已被接合之晶粒上的裝置。將晶粒在例如接合於基板之表面的晶粒接合器中,重覆進行使用被稱為夾頭之吸附噴嘴從晶圓吸附晶粒而進行拾取,且搬運至基板上,賦予推壓力,並且藉由對接合材加熱,進行接合的動作(作業)。夾頭為具有吸附孔,吸引氣體,吸附保持晶粒的保持具,具有與晶粒相同程度的大小。
在如此之晶粒接合器中,必須因應品種(晶粒尺寸等)更換夾頭,或為了防止晶粒之表面之損傷或污染,每一定使用更換與晶粒之表面接觸的夾頭。夾頭更換後,必須將夾頭以適當之態勢設置在適當的位置(例如,專利文獻1)。
[先前技術文獻]
[專利文獻]
The die bonder is a device that uses solder, gold plating, and resin as bonding materials to bond (attach and mount) the die to the substrate or the bonded die. The die is repeatedly picked up in a die bonder bonded to the surface of a substrate, for example, by using a suction nozzle called a chuck to pick up the die from the wafer, and to transfer the die to the substrate to apply a pressing force. The joining operation (operation) is performed by heating the joining material. The chuck is a holder having an adsorption hole for attracting gas and adsorbing and holding the crystal grains, and has the same size as the crystal grains.
In such a die bonder, the chuck must be replaced in accordance with the variety (grain size, etc.), or in order to prevent damage or contamination of the surface of the die, the chuck in contact with the surface of the die must be replaced every time. After the chuck is replaced, it is necessary to set the chuck in an appropriate position at an appropriate position (for example, Patent Document 1).
[Prior technical literature]
[Patent Literature]

[專利文獻1]日本特開2016-139629號公報[Patent Document 1] Japanese Patent Laid-Open No. 2016-139629

[發明所欲解決之課題][Problems to be Solved by the Invention]

在專利文獻1中,在具備有夾頭之晶粒移動手段(拾取頭或接合頭)之移動路徑設置夾頭之複數處接觸的突起,根據夾頭接觸到之時的高度,判定夾頭之傾斜。但是,雖然傾斜可以判別,卻不知道夾頭之形狀異常。
本揭示之課題在於提供具備能夠確認夾頭之形狀及安裝狀態之夾頭確認檢查部的半導體製造裝置。
其他之課題和新穎之特徵從本說明書之記載及附件圖面明顯可知。

[用以解決課題之手段]
In Patent Document 1, protrusions that are contacted at a plurality of positions of the chuck are provided in a movement path of a die moving means (pickup head or bonding head) provided with the chuck, and the chuck is determined based on the height of the chuck when it contacts. tilt. However, although the tilt can be discriminated, the shape of the chuck is not known to be abnormal.
An object of the present disclosure is to provide a semiconductor manufacturing apparatus including a chuck confirmation inspection unit capable of confirming the shape and mounting state of the chuck.
Other problems and novel features are apparent from the description of this specification and the drawings of the attachments.

[Means to solve the problem]

若簡單說明本揭示中代表性之內容的概要則如同下述般。
即是,半導體製造裝置具備以夾頭吸附且拾取晶粒的頭部,和確認及檢查上述夾頭之夾頭檢查部,和控制上述頭部及上述夾頭檢查部的控制裝置。上述夾頭檢查部具備形狀檢測感測器。上述控制裝置藉由上述形狀檢測感測器讀取上述夾頭之形狀。

[發明效果]
A brief description of the representative contents of this disclosure is as follows.
That is, the semiconductor manufacturing apparatus includes a head that sucks and picks up a die with a chuck, a chuck inspection section that confirms and inspects the chuck, and a control device that controls the head and the chuck inspection section. The chuck inspection unit includes a shape detection sensor. The control device reads the shape of the chuck through the shape detection sensor.

[Inventive effect]

若藉由上述半導體製造裝置時,可以進行夾頭之形狀及安裝狀態之確認。When using the above semiconductor manufacturing apparatus, the shape and mounting state of the chuck can be checked.

以下,針對實施例及變形例使用圖面進行說明。但是,在以下之說明中,對相同構成要素賦予相同符號,省略重覆說明。另外,為了使說明更明確,雖然有圖面比起實際態樣,針對各部之寬度、厚度、形狀等,以示意性表示之情形,但是此僅為一例,並非用以限定本發明之解釋。

[實施例]
Hereinafter, examples and modifications will be described using drawings. However, in the following description, the same reference numerals are given to the same constituent elements, and repeated explanations are omitted. In addition, in order to make the description clearer, although the drawing has a schematic representation of the width, thickness, shape, and the like of each part compared to the actual state, this is only an example and is not intended to limit the explanation of the present invention.

[Example]

圖1為與實施例有關之晶粒接合器之概略的上視圖。圖2為從圖1中之箭頭A方向觀看時,說明拾取頭及接合頭之動作的圖示。FIG. 1 is a schematic top view of a die bonder related to the embodiment. FIG. 2 is a diagram illustrating the actions of the pickup head and the bonding head when viewed from the direction of arrow A in FIG. 1.

晶粒接合器10大致具有:供給安裝在成為一個或複數的最終1封裝體的印刷有製品區域(以下,稱為封裝區域P)之基板S的晶粒D的供給部1、拾取部2、中間平台部3、接合部4、搬運部5、基板供給部6、基板搬出部7,和監視各部之動作且進行控制的控制部8。Y軸方向係晶粒接合器10之前後方向,X軸方向為左右方向。晶粒供給部1被配置在晶粒接合器10之前方側,接合部4被配置在深側。The die bonder 10 generally includes a supply unit 1, a pick-up unit 2, and a supply unit 2 for supplying a die D mounted on a printed board region (hereinafter, referred to as a package region P) mounted in one or a plurality of final packages. The intermediate stage part 3, the joint part 4, the conveyance part 5, the substrate supply part 6, the substrate carry-out part 7, and the control part 8 which monitors and controls the operation of each part. The Y-axis direction is the front-back direction of the die bonder 10, and the X-axis direction is the left-right direction. The die supply section 1 is arranged on the front side of the die bonder 10, and the joint section 4 is arranged on the deep side.

首先,晶粒供給部1係供給安裝於基板S之封裝區域P的晶粒D。晶粒供給部1具有保持晶圓11之晶圓保持台12和以從晶圓11上推晶粒D之虛線所示的上推單元13。晶粒供給部1係藉由無圖示之驅動手段在XY方向移動,使拾取之晶粒D移動至上推單元13之位置。First, the die supply unit 1 supplies the die D mounted on the package region P of the substrate S. The die supply unit 1 includes a wafer holding table 12 that holds the wafer 11 and a push-up unit 13 indicated by a broken line that pushes the die D from the wafer 11. The die supply unit 1 moves in the XY direction by a driving means (not shown) to move the picked-up die D to the position of the push-up unit 13.

拾取部2具有拾取晶粒D之拾取頭21、使拾取頭21移動至Y方向之拾取頭之Y驅動部23,和使夾頭22升降、旋轉及X方向移動的無圖示的各驅動部。拾取頭21具有將被上推的晶粒D吸附保持在前端的夾頭22(也參照圖2),從晶粒供給部1拾取晶粒D,載置於中間平台31。拾取頭21具有使夾頭22升降、旋轉及X方向移動的無圖示之各驅動部。The picking section 2 includes a picking head 21 for picking up the die D, a Y driving section 23 for moving the picking head 21 to the Y direction, and various driving sections (not shown) for lifting, rotating, and moving the chuck 22 in the X direction. . The pick-up head 21 includes a chuck 22 (see also FIG. 2) that sucks and holds the pushed-up crystal grains D at the front end, picks up the crystal grains D from the crystal grain supply unit 1, and places them on the intermediate stage 31. The pick-up head 21 includes drive units (not shown) that raise, lower, rotate, and move the chuck 22 in the X direction.

中間平台部3具有暫時性地載置晶粒D之中間平台31,和用以辨識中間平台31上之晶粒D的平台辨識攝影機32,和夾頭檢查部90。The intermediate platform section 3 includes an intermediate platform 31 on which the die D is temporarily placed, a platform identification camera 32 for identifying the die D on the intermediate platform 31, and a chuck inspection section 90.

接合部4係以從中間平台31拾取晶粒D,接合於被搬運至接合平台BS上的基板S之封裝區域P上,或是疊層於已被接合於基板S之封裝區域P之上的晶粒上之形式進行接合。接合部4具有與拾取頭21相同將晶粒D吸附保持於前端的夾頭42(也參照圖2)的接合頭41、使接合頭41移動至Y方向之Y驅動部43,和攝影基板S之封裝區域P之位置辨識標記(無圖示),辨識接合位置之基板辨識攝影機44。
藉由如此之構成,接合頭41根據平台辨識攝影機32之攝影資料而補正拾取位置、姿勢,從中間平台31拾取晶粒D,且根據基板辨識攝影機44之攝影資料將晶粒D接合於基板S。
The bonding portion 4 is used to pick up the die D from the intermediate platform 31, and is bonded to the packaging area P of the substrate S carried to the bonding platform BS, or is laminated on the packaging area P that has been bonded to the substrate S. Bonding in the form on the grain. The bonding portion 4 includes a bonding head 41 (see FIG. 2) of the chuck 42 (see also FIG. 2) for holding and holding the crystal grain D on the front end, a Y driving portion 43 that moves the bonding head 41 to the Y direction, and a photographing substrate S, as in the pickup head 21. A position identification mark (not shown) in the package area P, and a substrate identification camera 44 for identifying a bonding position.
With this configuration, the bonding head 41 corrects the pickup position and posture based on the photographic data of the platform recognition camera 32, picks up the die D from the intermediate platform 31, and bonds the die D to the substrate S based on the photographic data of the substrate recognition camera 44. .

搬運部5具有抓取搬運基板S之基板搬運爪51和基板S移動之搬運通道52。基板S係藉由利用沿著搬運通道52而設置的無圖示之滾珠螺桿驅動被設置在搬運通道52之基板搬運爪51之無圖示的螺帽而在X方向移動。
藉由如此之構成,基板S係從基板供給部6沿著搬運通道52而移動至接合位置,於接合後,移動至基板搬出部7,將基板S交給至基板搬出部7。
The conveyance unit 5 includes a substrate conveyance claw 51 that grasps and conveys the substrate S, and a conveyance path 52 that moves the substrate S. The substrate S is moved in the X direction by driving a nut (not shown) of the substrate transfer claw 51 provided in the transfer channel 52 with a ball screw (not shown) provided along the transfer channel 52.
With this configuration, the substrate S is moved from the substrate supply section 6 to the bonding position along the conveyance path 52, and after the bonding, the substrate S is moved to the substrate carrying-out section 7 and the substrate S is handed over to the substrate carrying-out section 7.

控制部8具備儲存監視且控制晶粒接合器10之各部之動作的程式(軟體)的記憶體,和實行被儲存於記憶體之程式的中央處理裝置(CPU)。The control unit 8 includes a memory that stores a program (software) that monitors and controls the operation of each part of the die bonder 10, and a central processing unit (CPU) that executes the program stored in the memory.

接著,針對晶粒供給部1之構成,使用圖3及圖4進行說明。圖3為表示晶粒供給部之外觀斜視圖的圖示。圖4為表示晶粒供給部之主要部位的概略剖面圖。Next, the structure of the crystal grain supply part 1 is demonstrated using FIG. 3 and FIG. 4. FIG. FIG. 3 is a diagram showing an external perspective view of a die supply section. FIG. 4 is a schematic cross-sectional view showing a main part of a crystal grain supply unit.

晶粒供給部1具備在水平方向(XY方向)移動的晶圓保持台12,在上下方向移動的上推單元13。晶圓保持台12具備保持晶圓環14之擴張環15,和被保持在晶圓環14且將接合複數之晶粒D的切割膠帶16定位成水平的支持環17。上推單元13被配置在支持環17之內側。The die supply unit 1 includes a wafer holding table 12 that moves in the horizontal direction (XY direction), and a push-up unit 13 that moves in the vertical direction. The wafer holding table 12 includes an expansion ring 15 that holds a wafer ring 14, and a support ring 17 that is held on the wafer ring 14 and positions a dicing tape 16 that joins a plurality of dies D to a horizontal level. The push-up unit 13 is disposed inside the support ring 17.

晶粒供給部1係於晶粒D之上推時,使保持晶圓環14之擴張環15下降。其結果,被保持在晶圓環14之切割膠帶16被拉長,晶粒D之間隔變寬,藉由上推單元13從晶粒D下方上推晶粒D,提升晶粒D之拾取性。另外,隨著薄型化,將晶粒接合於基板的接合劑從液狀成為薄膜狀,在晶圓11和切割膠帶16之間貼合被稱為晶粒黏接膜(DAF)18之薄膜狀的接合材料。在具有晶粒黏接膜18之晶圓11中,切割係對晶圓11和晶粒黏接膜18進行。因此,在剝離工程中,從切割膠帶16剝離晶圓11和晶粒黏接膜18。晶粒黏接膜18藉由加熱而硬化。When the die supply unit 1 is pushed on the die D, the expansion ring 15 holding the wafer ring 14 is lowered. As a result, the dicing tape 16 held on the wafer ring 14 is stretched, and the interval between the crystal grains D is widened. The crystal grain D is pushed up from below the crystal grain D by the push-up unit 13 to improve the picking property of the crystal grain D . In addition, as the thickness is reduced, the bonding agent for bonding the crystal grains to the substrate changes from a liquid state to a thin film state, and a thin film state called a die bonding film (DAF) 18 is bonded between the wafer 11 and the dicing tape 16. Bonding material. In the wafer 11 having the die-bonding film 18, dicing is performed on the wafer 11 and the die-bonding film 18. Therefore, in the peeling process, the wafer 11 and the die-bonding film 18 are peeled from the dicing tape 16. The die-bonding film 18 is hardened by heating.

晶粒接合器10具有辨識晶圓11上之晶粒D之姿勢的晶圓辨識攝影機24,和辨識被載置在中間平台31之晶粒D之姿勢的平台辨識攝影機32,和辨識接合平台BS上之安裝位置的基板辨識攝影機44。必須補正辨識攝影機間之姿勢偏移,係與根據接合頭41之拾取有關的平台辨識攝影機32,和與根據接合頭41的朝安裝位置之接合有關的基板辨識攝影機44。The die bonder 10 includes a wafer recognition camera 24 that recognizes the posture of the die D on the wafer 11, a platform recognition camera 32 that recognizes the attitude of the die D placed on the intermediate platform 31, and a bonding platform BS. The camera 44 at the mounting position. It is necessary to correct the posture deviation between the recognition cameras, which are related to the platform recognition camera 32 according to the pickup of the bonding head 41 and the substrate recognition camera 44 related to the bonding by the bonding head 41 toward the mounting position.

接著,針對夾頭及保持夾頭之夾頭保持器,使用圖5~7進行說明。圖5~7係用以說明在圖1之晶粒接合器中使用的夾頭及夾頭保持器之圖示。圖5為拾取頭、夾頭保持器及夾頭之剖面圖。圖6為夾頭保持器之上視圖。圖7為夾頭之下視圖。以下,雖然針對拾取頭21之夾頭22進行說明,但是接合頭41之夾頭42也相同。Next, the chuck and the chuck holder holding the chuck will be described using FIGS. 5 to 7. 5 to 7 are diagrams for explaining a collet and a collet holder used in the die bonder of FIG. 1. 5 is a cross-sectional view of a pickup head, a chuck holder, and a chuck. Figure 6 is a top view of the collet holder. Figure 7 is a bottom view of the chuck. Hereinafter, although the chuck 22 of the pickup head 21 is described, the chuck 42 of the joint head 41 is the same.

夾頭保持器25具備在中心與拾取頭21之吸引孔21a連通的吸引孔25a,和固定夾頭22之磁鐵25b。夾頭保持器25在四邊之各中央附近具有缺口(爪退避部)251c,成為夾頭更換治具可以把持夾頭。以藉由磁鐵25b吸引夾頭22而安裝夾頭22之方式,夾頭保持器25之開口部成為越下方越寬的推拔狀。The chuck holder 25 includes a suction hole 25 a which is communicated with the suction hole 21 a of the pickup head 21 at the center, and a magnet 25 b holding the chuck 22. The chuck holder 25 has notches (claw retreating portions) 251c near the centers of the four sides, and can be used to hold the chuck as a chuck replacement jig. The chuck 22 is attached by attracting the chuck 22 by the magnet 25b, and the opening portion of the chuck holder 25 becomes a push-out shape that becomes wider as it moves downward.

夾頭22係以可以藉由磁鐵固定之方式,將不鏽鋼(SUS(磁性))22b熔接於矽橡膠等之彈性體22a之背面,將4邊保持在夾頭保持器25,為了吸附晶粒D,具備與吸引孔251a連通的複數吸引孔221。在彈性體22a之表面具有與晶粒D接觸並予以保持的保持部22c。保持部22c與彈性體22a被一體性地形成,大小與晶粒D相同程度。The chuck 22 can be fixed by a magnet, and stainless steel (SUS (magnetic)) 22b is welded to the back of an elastic body 22a such as silicone rubber, and the four sides are held on the chuck holder 25. Is provided with a plurality of suction holes 221 communicating with the suction holes 251a. The surface of the elastic body 22a includes a holding portion 22c that is in contact with and holds the crystal grain D. The holding portion 22c is integrally formed with the elastic body 22a, and has the same size as that of the crystal grain D.

夾頭22係於從晶圓11拾取晶粒D之時,著落在晶粒D之表面,此時,受到壓力。之後,藉由拾取頭21之移動,將藉由夾頭22吸附的晶粒D搬運至中間平台31上。該被搬運的晶粒D著落在中間平台31上。夾頭42係從中間平台31拾取晶粒D,藉由接合頭41之移動,將藉由夾頭42吸附的晶粒D搬運至基板S上。該被搬運之晶粒D著落在基板S上,從接合頭41於垂直方向承受用以接合的(荷重數N~數十N)。即是,晶粒接合器藉由重複如此之工程,量產製品。When the chuck 22 picks up the die D from the wafer 11, it lands on the surface of the die D, and at this time, it receives pressure. Thereafter, by the movement of the pickup head 21, the crystal grains D adsorbed by the chuck 22 are transferred to the intermediate platform 31. The transferred crystal grains D land on the intermediate platform 31. The chuck 42 picks up the die D from the intermediate platform 31 and transfers the die D adsorbed by the chuck 42 to the substrate S by the movement of the bonding head 41. The transferred crystal grains D are landed on the substrate S, and are subjected to bonding (load number N to several tens N) for bonding in the vertical direction from the bonding head 41. That is, the die bonder repeats this process and mass-produces products.

因此,以矽橡膠等形成的夾頭22之彈性體22a等,藉由重複上述工程,逐漸變形(所謂,壓潰),當到達某程度之生產量時,需要更換。於該更換之時,雖然以夾頭單體或與夾頭保持器一體進行,但是此時,新更換的夾頭和夾頭之接合部,或夾頭和保持器之接合部,產生誤差(所謂,「晃動」)。Therefore, the elastic body 22a and the like of the collet 22 formed of silicone rubber and the like are gradually deformed (so-called crushed) by repeating the above-mentioned processes, and need to be replaced when a certain amount of production is reached. At the time of replacement, although the chuck is used alone or integrated with the chuck holder, at this time, an error occurs between the newly replaced chuck and the chuck joint, or the chuck and the retainer joint. So-called "shake").

在晶粒接合器中,夾頭在每一定使用必須更換。再者,夾頭更換後,必須將夾頭以適當之態勢設置在適當的位置。In die bonders, the chuck must be replaced every time it is used. Furthermore, after the chuck is replaced, the chuck must be set in an appropriate position in an appropriate state.

接著,於更換前或更換後,針對確認、檢查夾頭之夾頭檢查部,使用圖8~10進行說明。圖8為說明夾頭檢查部之圖示,圖8(A)為夾頭及夾頭檢查部之示意性側面圖,圖8(B)為指紋感測器之示意性斜視圖。圖9為說明圖8之指紋感測器的圖示。圖10為說明根據圖8之指紋感測器檢測夾頭之傾斜的圖示。以下,雖然針對拾取頭21之夾頭22進行說明,但是接合頭41之夾頭42也相同。Next, before or after replacement, the chuck inspection section for confirming and inspecting the chuck will be described using FIGS. 8 to 10. FIG. 8 is a diagram illustrating a chuck inspection section, FIG. 8 (A) is a schematic side view of the chuck and the chuck inspection section, and FIG. 8 (B) is a schematic perspective view of a fingerprint sensor. FIG. 9 is a diagram illustrating the fingerprint sensor of FIG. 8. FIG. 10 is a diagram illustrating the inclination detection of a chuck according to the fingerprint sensor of FIG. 8. Hereinafter, although the chuck 22 of the pickup head 21 is described, the chuck 42 of the joint head 41 is the same.

夾頭檢查部90具備形狀檢測檢測器亦即指紋感測器91,和支持板92,和檢測電路93。檢測電路93係經由纜線94連接指紋感測器91。The chuck inspection unit 90 includes a fingerprint sensor 91 which is a shape detection detector, a support plate 92, and a detection circuit 93. The detection circuit 93 is connected to the fingerprint sensor 91 via a cable 94.

一般而言,能夠檢測到指紋感測器接觸之部分的細微凹凸,有光學方式、靜電電容方式、電場強度方式等。指紋係以手指表面之凹凸而成立,凸部稱為隆線,凹部稱為谷線。平均的指紋凹凸高度約50μm,隆線之間隔約400μm,以約50μm間隔檢測指紋,且轉換成電訊號。例如,靜電電容方式中,利用因應指紋之隆線或谷線之凹凸,手指和感測器之距離變化,靜電電容也變化的特性。In general, the fine unevenness of the portion where the fingerprint sensor is in contact can be detected by optical methods, electrostatic capacitance methods, electric field strength methods, and the like. The fingerprint is established by the unevenness on the surface of the finger. The convex part is called the ridge line, and the concave part is called the valley line. The average fingerprint bump height is about 50 μm, the interval between ridges is about 400 μm, the fingerprint is detected at about 50 μm intervals, and converted into a signal. For example, in the electrostatic capacitance method, in accordance with the bumps and valleys of the fingerprint, the distance between the finger and the sensor changes, and the capacitance also changes.

在實施例中,指紋感測器91檢測夾頭之形狀(外形尺寸、真空吸引孔及/或真空吸引溝之佈局、磨耗、異物附著),以取代指紋。在指紋感測器91使用例如靜電電容方式之情況,如圖9所示般檢測夾頭22之保持部22c之表面和指紋感測器91之平板91a內之電極91b之間之靜電電容,使夾頭之形狀畫像化。無庸置疑指紋感測器91可以使用靜電電容方式以外的指紋感測器。In the embodiment, the fingerprint sensor 91 detects the shape of the chuck (outer dimensions, layout of the vacuum suction hole and / or vacuum suction groove, abrasion, and foreign matter adhesion) to replace the fingerprint. When the fingerprint sensor 91 uses, for example, an electrostatic capacitance method, the electrostatic capacitance between the surface of the holding portion 22c of the chuck 22 and the electrode 91b in the flat plate 91a of the fingerprint sensor 91 is detected as shown in FIG. The shape of the chuck is pictured. Needless to say, the fingerprint sensor 91 may use a fingerprint sensor other than the electrostatic capacitance method.

檢測電路93係以放大器(無圖示)放大從纜線94被輸入的訊號,以A/D轉換器(無圖示)轉換成數位訊號而以訊號處理電路(無圖示)進行處理。The detection circuit 93 amplifies a signal input from the cable 94 with an amplifier (not shown), converts it into a digital signal with an A / D converter (not shown), and processes it with a signal processing circuit (not shown).

在夾頭22之保持部22c之表面有磨耗、異物附著之情況,被檢測出夾頭之形狀不同。The surface of the holding portion 22c of the chuck 22 is worn and foreign matter is attached, and it is detected that the shape of the chuck is different.

指紋感測器91除夾頭之形狀之外,可以進行安裝狀態(傾斜)之確認。例如,如圖10所示般,在夾頭22具有傾斜之情況,因僅夾頭22之保持部22c之一部分接觸於指紋感測器91,故被檢測出夾頭之形狀不同。In addition to the shape of the chuck, the fingerprint sensor 91 can confirm the installation state (tilt). For example, as shown in FIG. 10, when the chuck 22 is inclined, only a part of the holding portion 22c of the chuck 22 contacts the fingerprint sensor 91, so the shape of the chuck is detected to be different.

夾頭22即將接觸於指紋感測器91之前的速度,比起夾頭22在充分離開指紋感測器91之位置移動之時的速度,可以緩慢移動。依此,有除了夾頭22即將接觸於指紋感測器91之前,顯現夾頭22接觸到指紋感測器91之時的衝突所致的夾頭22之損傷、指紋感測器91之損傷、相對於Z驅動部之負擔的優點之外,有在夾頭22從指紋感測器91充分分離之位置移動之時,可以以較夾頭22即將接觸於指紋感測器91之前的速度更快的速度移動,依此可以迅速地實施本件夾頭22之位置的測定之優點。The speed immediately before the chuck 22 contacts the fingerprint sensor 91 can be moved slowly compared to the speed when the chuck 22 moves away from the fingerprint sensor 91 sufficiently. According to this, in addition to the chuck 22 immediately before it contacts the fingerprint sensor 91, there are damages to the chuck 22 caused by the conflict when the chucks 22 contact the fingerprint sensor 91, damage to the fingerprint sensor 91, In addition to the advantage of the burden over the Z drive section, when the chuck 22 is moved from a position where the fingerprint sensor 91 is sufficiently separated, it can be faster than when the chuck 22 is about to contact the fingerprint sensor 91. The speed of movement can be quickly measured, so that the position of the chuck 22 can be quickly measured.

再者,夾頭22接觸於指紋感測器91之時,可以以一定之力,例如1N以下之力,可以檢測接觸。若可以正確且高精度地檢測夾頭22和指紋感測器91之接觸即可。但是,由於接觸之力不太強,可以構成不會破壞夾頭22或指紋感測器91。Furthermore, when the chuck 22 is in contact with the fingerprint sensor 91, the contact can be detected with a certain force, for example, a force of 1N or less. It is only necessary to accurately and accurately detect the contact between the chuck 22 and the fingerprint sensor 91. However, since the contact force is not so strong, it can be constructed so as not to damage the chuck 22 or the fingerprint sensor 91.

雖然夾頭檢查部90配置在中間平台部3(中間平台31之附近),但是即使配置在中間平台31上亦可,即使在中間平台部3之外部,設置在接合頭41和拾取頭21之雙方可以進出的位置亦可。即是,若配置在可以確認檢查接合頭41和拾取頭21之夾頭之雙方的位置即可。再者,夾頭檢查部90即使成為能夠動地設置在接合頭41和拾取頭21之雙方可以進出之位置,可以確認檢查接合頭41和拾取頭21之夾頭之雙方亦可。Although the chuck inspection section 90 is disposed on the intermediate platform section 3 (near the intermediate platform 31), it may be disposed on the intermediate platform 31, and even outside the intermediate platform section 3, it is provided between the joint head 41 and the pickup head 21. Both sides can go in and out. That is, it may be arranged at a position where both of the chucks of the inspection head 41 and the pickup head 21 can be checked. Furthermore, even if the chuck inspection unit 90 is movably provided at a position where both the joining head 41 and the pickup head 21 can enter and exit, it can be confirmed that both the joining head 41 and the pickup head 21 can be inspected.

接著,針對接合動作,使用圖11、12進行說明。圖11、12係表示在圖1之接合器之接合方法之一例的流程圖。圖11之流程圖之端子A與圖12之流程圖之端子A連接,圖12之流程圖之端子B與圖11之流程圖之端子B連接。以下,雖然針對拾取頭21之夾頭22進行說明,但是接合頭41之夾頭42也相同。Next, the joining operation will be described using FIGS. 11 and 12. 11 and 12 are flowcharts showing an example of the joining method of the adapter in FIG. 1. Terminal A of the flowchart of FIG. 11 is connected to terminal A of the flowchart of FIG. 12, and terminal B of the flowchart of FIG. 12 is connected to terminal B of the flowchart of FIG. 11. Hereinafter, although the chuck 22 of the pickup head 21 is described, the chuck 42 of the joint head 41 is the same.

首先,控制部8進行接合之初期化(步驟S1)。在此,控制部8係讀取登記在正確位置的夾頭22之形狀,作為拾取頭21、接合頭41之位置之初期化、晶圓辨識攝影機24、平台辨識攝影機32及基板辨識攝影機44之位置之初期化等之初期化製程之一。具體而言,控制部8係將夾頭22移動至夾頭檢查部90上,使接觸於指紋感測器91而讀取夾頭22之保持部22c之形狀而記憶於控制部8內之記憶體等之記憶手段(無圖示)。First, the control unit 8 initializes the joining (step S1). Here, the control unit 8 reads the shape of the chuck 22 registered at the correct position as the initialization of the positions of the pickup head 21 and the bonding head 41, the wafer identification camera 24, the platform identification camera 32, and the substrate identification camera 44. One of the initializing processes such as initializing the position. Specifically, the control unit 8 moves the chuck 22 to the chuck inspection unit 90 so that the shape of the holding portion 22c of the chuck 22 is read by contacting the fingerprint sensor 91 and stored in the memory of the control unit 8. Body memory (not shown).

接著,控制部8係以拾取頭21從晶圓11拾取晶粒D,載置於中間平台31,以接合頭41從中間平台31拾取晶粒D,進行安裝於基板S等之安裝動作(步驟S2)。接著,控制部8判斷是否將安裝動作實施特定次數(步驟S3)。控制部8若實施特定次數時結束處理。控制部8若實施定次數時,判斷實施動作是否超過確認夾頭22之確認所需要的次數或時間亦即確認設定值(裝置生產數或裝置運轉時間為特定值)(步驟S4)。在此,即使夾頭22之確認設定值和夾頭42之確認設定值不同亦可。若超過確認設定值時,返回步驟S2,進行安裝動作。若超越確認定值時,控制部8因掌握夾頭22之保持部22c之消耗度等,故進行夾頭之比對。即是,控制部8係藉由拾取頭21、接合頭41,使夾頭22移動至夾頭檢查部90(步驟S5),藉由夾頭檢查部90,讀取夾頭22之保持部22c之形狀(步驟S6)。控制部8判斷夾頭22之保持部22c之形狀是否為在步驟S1之初期化事先登記的形狀(步驟S7)。在YES之情況,返回步驟S2,進行安裝動作。在NO之情況,更換夾頭22(步驟S8)。Next, the control unit 8 picks up the die D from the wafer 11 with the pick-up head 21 and places it on the intermediate platform 31, picks up the die D from the intermediate platform 31 with the bonding head 41, and performs mounting operations such as mounting on the substrate S (step S2). Next, the control unit 8 determines whether or not the mounting operation is performed a specific number of times (step S3). The control unit 8 ends the process when it executes a specific number of times. When the control unit 8 executes a predetermined number of times, it determines whether the execution action exceeds the number or time required for the confirmation of the confirmation chuck 22, that is, confirms the set value (the number of device production or the device operating time is a specific value) (step S4). Here, the confirmation setting value of the chuck 22 and the confirmation setting value of the chuck 42 may be different. If it exceeds the confirmation setting value, the process returns to step S2 to perform the installation operation. When the confirmation value is exceeded, the control unit 8 compares the chucks because it knows the consumption degree of the holding portion 22c of the chuck 22 and the like. That is, the control section 8 moves the chuck 22 to the chuck inspection section 90 by the pickup head 21 and the joint head 41 (step S5), and reads the holding section 22c of the chuck 22 by the chuck inspection section 90. Shape (step S6). The control unit 8 determines whether the shape of the holding portion 22c of the chuck 22 is a shape registered in advance in the initial stage of step S1 (step S7). In the case of YES, the process returns to step S2 to perform the mounting operation. In the case of NO, the chuck 22 is replaced (step S8).

夾頭22之更換即使為操作者人為性地更換的手動亦可,即使藉由夾頭自動更換技術進行更換亦可。The replacement of the chuck 22 can be performed manually even by an operator, and it can be replaced even by the automatic chuck replacement technology.

接著,控制部8藉由拾取頭21使夾頭22移動且接觸於夾頭檢查部90上(步驟S9),藉由夾頭檢查部90讀取夾頭22之形狀(步驟SA)。判斷夾頭22之形狀是否為在步驟S1之初期化事先登記之形狀(步驟SB)。在YES之情況,返回步驟S2,進行安裝動作。在NO之情況,控制部8通知異常(步驟SC)。在此情況,例如控制部8顯示夾頭畫像,圖案為漂亮夾頭之形狀的情況,操作者判斷夾頭之品種間不同,以手段或自動更換成正確的夾頭。圖案非夾頭之形狀之情況,操作者判斷夾頭傾斜等之安裝不良,將夾頭22以手動或自動再安裝於夾頭保持器25。Next, the control unit 8 moves the chuck 22 to contact the chuck inspection unit 90 by the pickup 21 (step S9), and reads the shape of the chuck 22 by the chuck inspection unit 90 (step SA). It is determined whether the shape of the chuck 22 is a shape registered in advance in the initial stage of step S1 (step SB). In the case of YES, the process returns to step S2 to perform the mounting operation. In the case of NO, the control unit 8 notifies an abnormality (step SC). In this case, for example, when the control unit 8 displays a chuck image and the pattern is in the shape of a beautiful chuck, the operator judges that the types of the chucks are different, and replaces them with a correct chuck by means or automatically. When the pattern is not the shape of the chuck, the operator judges that the chuck is inclined to be installed badly, and reinstalls the chuck 22 to the chuck holder 25 manually or automatically.

接著,針對使用與實施例有關之晶粒接合器的半導體裝置之製造方法,使用圖13進行說明。圖13係表示半導體裝置之製造方法的流程圖。Next, a method for manufacturing a semiconductor device using the die bonder according to the embodiment will be described with reference to FIG. 13. FIG. 13 is a flowchart showing a method of manufacturing a semiconductor device.

步驟S11:係將保持貼附從晶圓11被分割之晶粒D的切割膠帶16的晶圓環14儲存於晶圓卡匣(無圖示),搬入至晶粒接合器10。控制部8係將晶圓環14從填充有晶圓環14之晶圓卡匣供給至晶粒供給部1。再者,準備基板S,搬入至晶粒接合器10。控制部8係以基板供給部6將基板S載置於搬運通道52。Step S11: The wafer ring 14 holding the dicing tape 16 to which the die D divided from the wafer 11 is stored is stored in a wafer cassette (not shown), and is transferred to the die bonder 10. The control unit 8 supplies the wafer ring 14 from the wafer cassette filled with the wafer ring 14 to the die supply unit 1. The substrate S is prepared and carried into the die bonder 10. The control unit 8 places the substrate S on the conveyance path 52 with the substrate supply unit 6.

步驟S12:控制部8係從被保持於晶圓環14之切割膠帶16拾取晶粒D。Step S12: The control unit 8 picks up the die D from the dicing tape 16 held by the wafer ring 14.

步驟S13:控制部8係將拾取到的晶粒D,搭載至基板S之封裝區域P上或疊層於已接合的晶粒上。更具體而言,控制部8係將從切割膠帶16拾取到的晶粒D載置於中間平台31,以接合頭41從中間平台31再次拾取晶粒D,接合於被搬運來的基板S之封裝區域P。Step S13: The control unit 8 mounts the picked-up die D on the package area P of the substrate S or stacks it on the bonded die. More specifically, the control unit 8 places the die D picked up from the dicing tape 16 on the intermediate stage 31, picks up the die D again from the intermediate stage 31 with the bonding head 41, and joins the transferred substrate S Package area P.

步驟S14:控制部8係以基板搬運爪51將基板S移動至基板搬出部7,將基板S交給基板搬運部7而從晶粒接合器10搬出基板S(基板卸載)。Step S14: The control part 8 moves the board | substrate S to the board | substrate carrying-out part 7 by the board | substrate conveying claw 51, passes the board | substrate S to the board | substrate carrying part 7, and carries out the board | substrate S from the die bonder 10 (substrate unloading).

在實施例中,藉由使用光學方式指紋感測器或靜電電容式指紋感測等之指紋感測器,能夠檢測接觸到之部分的細微凹凸而可以高精度地檢測夾頭之形狀(磨耗、異物附著)或安裝狀態(傾斜)。再者,與指紋登記相同可以容易地登記夾頭之形狀。以指紋辨識登記在夾頭自動更換中使用的複數種類夾頭,可以容易地進行自動更換後之確認。可以防止夾頭之異常所致的製品不良於未然。In the embodiment, by using a fingerprint sensor such as an optical fingerprint sensor or an electrostatic capacitance type fingerprint sensor, it is possible to detect the fine unevenness of the contacted portion and to detect the shape of the chuck (wear, Foreign matter adhesion) or installation state (tilted). Furthermore, the shape of the chuck can be easily registered in the same manner as the fingerprint registration. The plural types of chucks used in automatic chuck replacement are registered with fingerprint recognition, and can be easily confirmed after automatic replacement. Can prevent the product caused by the abnormality of the chuck.

(變形例)
以下,針對代表性的變形例,例示幾個。在以下之變形例之說明中,針對具有與在上述實施例中說明者相同的構成及功能之部分,設為能夠使用與上述實施例相同之符號者。而且,針對如此之部分的說明,設為能夠在技術性不矛盾之範圍內,適當援用在上述實施例中之說明者。再者,能夠在技術性不矛盾之範圍內,適當、複合性地適用上述實施例之一部分及複數變形例之全部或一部分。
(Modification)
In the following, a few typical modifications are exemplified. In the following description of the modified example, it is assumed that parts having the same configuration and functions as those described in the above-mentioned embodiment can use the same symbols as those in the above-mentioned embodiment. It should be noted that the description of such a part can be appropriately applied to those described in the above-mentioned embodiment within a range that is not technically contradictory. In addition, all or a part of the above-mentioned embodiments and a plurality of modified examples can be appropriately and compositely applied within a technically non-contradictory range.

圖14為說明與變形例有關之夾頭檢查部之圖示,圖14(A)為夾頭及夾頭檢查部之示意性側面圖,圖14(B)為指紋感測器之示意性斜視圖。圖15為說明根據圖14之指紋感測器檢測夾頭之傾斜的圖示。以下,雖然針對拾取頭21之夾頭22進行說明,但是接合頭41之夾頭42也相同。FIG. 14 is a diagram illustrating a chuck inspection section related to a modification, FIG. 14 (A) is a schematic side view of the chuck and the chuck inspection section, and FIG. 14 (B) is a schematic oblique view of a fingerprint sensor Illustration. FIG. 15 is a diagram illustrating the inclination of a chuck detected by the fingerprint sensor of FIG. 14. Hereinafter, although the chuck 22 of the pickup head 21 is described, the chuck 42 of the joint head 41 is the same.

夾頭檢查部90A除了實施例之夾頭檢查部90之指紋感測器91、支持板92及檢測電路93之外,還具備壓力感測器95a、95b、95c。除了檢測電路93A經由纜線94而與指紋感測器91連接之外,還經由纜線97a、97b、97c及輸出部96a、96b、96c而連接壓力感測器95a、95b、95c。壓力感測器95a、95b、95c係在3點支持指紋感測器91。The chuck inspection unit 90A includes pressure sensors 95a, 95b, and 95c in addition to the fingerprint sensor 91, the support plate 92, and the detection circuit 93 of the chuck inspection unit 90 of the embodiment. In addition to the detection circuit 93A being connected to the fingerprint sensor 91 via a cable 94, pressure sensors 95a, 95b, and 95c are also connected via cables 97a, 97b, and 97c and output units 96a, 96b, and 96c. The pressure sensors 95a, 95b, and 95c support the fingerprint sensor 91 at three points.

除了檢測電路93A與實施例之檢測電路93相同放大從纜線94被輸入的訊號而進行訊號處理之外,還以放大器(無圖示)放大從纜線97a、97b、97c被輸入的訊號,以A/D轉換器(無圖示)轉換成數位訊號而在訊號處理電路(無圖示)進行處理。The detection circuit 93A amplifies the signal input from the cable 94 for signal processing in the same way as the detection circuit 93 of the embodiment, and also amplifies the signal input from the cables 97a, 97b, and 97c with an amplifier (not shown). A / D converter (not shown) is used to convert digital signals into signals and processed in a signal processing circuit (not shown).

壓力感測器95a、95b、95c例如分別由壓敏元件亦即壓電元件所構成。The pressure sensors 95a, 95b, and 95c are each composed of, for example, a pressure-sensitive element, that is, a piezoelectric element.

即是,若藉由成為上述構成的夾頭檢查部90A時,在夾頭22因某種原因而傾斜之情況,從3個壓力感測器95a、95b、95c之輸出產生不平衡。於是,藉由從3個壓力感測器95a、95b、95c之輸出,例如求出其重心點,求出從原本之(無傾斜的情況之)重心點偏移的距離(背離度),能夠容易地求出夾頭22之傾斜。That is, when the chuck inspection unit 90A having the above-mentioned configuration is used, if the chuck 22 is tilted for some reason, an imbalance is generated from the outputs of the three pressure sensors 95a, 95b, and 95c. Then, by outputting from the three pressure sensors 95a, 95b, and 95c, for example, to find the center of gravity point, and to find the distance (distance) from the original point (in the case of no tilt) of the center of gravity point, it is possible to The inclination of the collet 22 can be easily determined.

接著,針對接合動作,使用圖16、17進行說明。圖16、17係表示在圖1之接合器之接合方法之另一例的流程圖。圖16之流程圖之端子A與圖17之流程圖之端子A連接,圖17之流程圖之端子B與圖16之流程圖之端子B連接。以下,雖然針對拾取頭21之夾頭22進行說明,但是接合頭41之夾頭42也相同。Next, the joining operation will be described using FIGS. 16 and 17. 16 and 17 are flowcharts showing another example of the joining method of the adapter of FIG. Terminal A of the flowchart of FIG. 16 is connected to terminal A of the flowchart of FIG. 17, and terminal B of the flowchart of FIG. 17 is connected to terminal B of the flowchart of FIG. 16. Hereinafter, although the chuck 22 of the pickup head 21 is described, the chuck 42 of the joint head 41 is the same.

步驟S1~S5與圖11之實施例相同。Steps S1 to S5 are the same as the embodiment of FIG. 11.

控制部8因掌握夾頭22之消耗度等,進行夾頭之比對。即是,控制部8係藉由拾取頭21、接合頭41,使夾頭22移動至夾頭檢查部90(步驟S5),藉由夾頭檢查部90,讀取夾頭22之高度、形狀(步驟S6A)。The control unit 8 compares the chucks by grasping the degree of consumption of the chucks 22 and the like. That is, the control unit 8 moves the chuck 22 to the chuck inspection unit 90 by the pickup head 21 and the joint head 41 (step S5), and reads the height and shape of the chuck 22 by the chuck inspection unit 90. (Step S6A).

控制部8判斷夾頭22之保持部22c之夾頭高度或高度之偏差是否超過特定值(步驟S7A)。在NO之情況,移至步驟S7,在YES之情況,移至步驟S8。The control unit 8 determines whether the chuck height or the deviation of the height of the holding portion 22c of the chuck 22 exceeds a specific value (step S7A). In the case of NO, the process proceeds to step S7, and in the case of YES, the process proceeds to step S8.

在步驟S7中,控制部8判斷夾頭22之保持部22c之形狀是否為在步驟S1之初期化事先登記的形狀。在YES之情況,返回步驟S2,進行安裝動作。在NO之情況,移至步驟S8。In step S7, the control unit 8 determines whether the shape of the holding portion 22c of the chuck 22 is a shape registered in advance in the initial stage of step S1. In the case of YES, the process returns to step S2 to perform the mounting operation. In the case of NO, the process proceeds to step S8.

在步驟S8中,更換夾頭22。夾頭22之更換即使為操作者人為性地更換的手動亦可,即使藉由夾頭自動更換技術進行更換亦可。In step S8, the chuck 22 is replaced. The replacement of the chuck 22 can be performed manually even by an operator, and it can be replaced even by the automatic chuck replacement technology.

接著,控制部8藉由拾取頭21使夾頭22移動且接觸於夾頭檢查部90上(步驟S9),藉由夾頭檢查部90讀取夾頭22之保持部22c之高度、形狀(步驟SAA)。Next, the control unit 8 moves the chuck 22 to contact the chuck inspection unit 90 by the pickup head 21 (step S9), and reads the height and shape of the holding portion 22c of the chuck 22 by the chuck inspection unit 90 ( Step SAA).

控制部8判斷夾頭22之保持部22c之夾頭高度或高度之偏差是否超過特定值(步驟SBA)。在第一特定值以下之情況,移至步驟SB,在雖然超過第一特定值但為第二特定值以下之情況,移至步驟SD,在超過第二特定值之情況,返回至步驟S8,再安裝夾頭22。The control unit 8 determines whether the chuck height or the height deviation of the holding portion 22c of the chuck 22 exceeds a specific value (step SBA). If it is below the first specific value, move to step SB. If it exceeds the first specific value but is below the second specific value, move to step SD. If it exceeds the second specific value, return to step S8. Then install the chuck 22.

在步驟SD中,控制部8係根據高度之偏差,使拾取頭21移動而調整夾頭22之傾斜。In step SD, the control unit 8 adjusts the inclination of the chuck 22 by moving the pickup head 21 according to the difference in height.

在步驟SB中,控制部8判斷夾頭22之形狀是否為在步驟S1之初期化事先登記之形狀(步驟SB)。在YES之情況,返回步驟S2,進行安裝動作。在NO之情況,控制部8判斷夾頭之品種間不同,返回至步驟S8,更換成正確的夾頭。In step SB, the control unit 8 determines whether the shape of the chuck 22 is a shape registered in advance in the initial stage of step S1 (step SB). In the case of YES, the process returns to step S2 to perform the mounting operation. In the case of NO, the control unit 8 judges that the types of the chucks are different, and returns to step S8 to replace the chuck with a correct one.

在變形例中,在指紋感測器91之下方組裝複數壓力感測器,同時確認夾頭之形狀(外形尺寸、真空吸引孔及/或真空吸引溝之佈局、磨耗、異物附著),和夾頭之安裝狀態(傾斜角度、高度)。依此,可以一次檢測出與夾頭之異常有關之要素(安裝位置、傾斜、磨耗、異物附著)等全部。在傾斜角度為特定值以下之情況,以頭部調整夾頭之傾斜,在傾斜角度超過特定值之情況,再安裝夾頭,依此也可以自動進行夾頭之更換及其確認。藉由自動性地掌握夾頭之消耗度,並且附加夾頭自動更換功能,一連串之動作全部成為自動,能夠謀求刪減人事費成本、降低人為錯誤以提升品質。In the modified example, a plurality of pressure sensors are assembled under the fingerprint sensor 91, and the shape of the chuck (outer dimensions, layout of the vacuum suction hole and / or vacuum suction groove, wear, and foreign matter adhesion) are also confirmed, and the clip Head installation state (tilt angle, height). According to this, all the elements related to the abnormality of the chuck (installation position, tilt, abrasion, foreign matter adhesion) and the like can be detected at one time. When the inclination angle is below a certain value, adjust the inclination of the chuck with the head. When the inclination angle exceeds a certain value, install the chuck. According to this, the chuck can be replaced and confirmed automatically. By automatically grasping the consumption of the chuck and adding the automatic chuck replacement function, a series of actions are all automatic, which can reduce personnel costs and reduce human errors to improve quality.

以上,雖然根據實施例對本發明者所創作岀之發明進行具體性說明,但是本發明並不限定於上述實施例,當然可以做各種變更。As mentioned above, although the invention invented by the present inventors has been specifically described based on the embodiments, the present invention is not limited to the above embodiments, and of course, various changes can be made.

例如,在實施例中,雖然針對夾頭22係由彈性體22a、不鏽鋼22b及保持部22c所構成之例進行說明,但是並不限定於此,例如即使為僅由彈性體構成者亦可。再者,在實施例中,雖然針對在夾頭具有吸引孔之例進行說明,但是並不限定於此,即使為例如具有吸引溝者亦可。For example, although the example in which the chuck 22 is comprised by the elastic body 22a, the stainless steel 22b, and the holding | maintenance part 22c was demonstrated in the Example, it is not limited to this, For example, even if it consists only of an elastomer. In the embodiment, an example in which a suction hole is provided in the chuck is described, but the invention is not limited to this, and may be, for example, a suction groove.

再者,在實施例中,雖然說明使用指紋感測器作為形狀檢測感測器之例而進行說明,但是,若為例如將複數感測器以檢查夾頭之表面的凹凸等之形狀所需的間距設置成格子狀或鋸齒狀之二次元的面板狀或薄片狀之感測器即可。Furthermore, in the embodiment, although a fingerprint sensor is used as an example of the shape detection sensor, it will be described, but it is necessary to use a plurality of sensors to check the shape of the surface of the chuck, for example. The distance between the two-dimensional panel-shaped or sheet-shaped sensors can be set in a grid or sawtooth shape.

再者,在變形例中,雖然使用壓力感測器,但是即使為壓敏片或位移感測器亦可。再者,在變形例中,雖然說明具備3個壓力感測器之例,但是並不限定於此,即使為例如4個以上亦可。Moreover, in the modification, although a pressure sensor is used, it may be a pressure-sensitive sheet or a displacement sensor. In the modified example, an example in which three pressure sensors are provided is described, but it is not limited to this, and may be, for example, four or more.

再者,即使設為自動清掃指紋感測器(板狀)之表面亦可。Moreover, even if it is set to clean the surface of a fingerprint sensor (plate shape) automatically.

再者,即使為具備複數組包含拾取部和對準部和接合部的安裝部及搬運通道的晶粒接合器亦可,即使為具備數組拾取部和對準部和接合部的安裝部,且搬運通道具備一個亦可。Furthermore, it is also possible to use a die bonder having a mounting section including a pick-up section, an alignment section, and a bonding section, and a transport channel, and even a mounting section having a pick-up section, an alignment section, and a bonding section, and It is also possible to have one carrying path.

再者,在實施例中,雖然說明使用晶粒黏接膜之例,但是即使設置在基板塗佈黏接劑之預成形部而不使用晶粒接膜亦可。In addition, although the example using the die-bonding film was demonstrated in the Example, it is good also if it is provided in the preform part of a board | substrate coating adhesive, without using a die-bonding film.

再者,在實施例中,雖然針對以拾取頭從晶粒供給部拾取晶粒而載置於中間平台,以接合頭將被載置於中間平台之晶粒接合於基板之晶粒接合器進行說明,但是不限定於此,能夠適用於從晶粒供給部拾取晶粒的半導體製造裝置。
例如,亦能夠適用於無中間平台和拾取頭,而以接合頭將晶粒供給部之晶粒接合於基板的晶粒接合器。
再者,能夠適用於無中間平台,從晶粒供給部拾取晶粒,使晶粒拾取頭在上方旋轉而將晶粒收授於接合頭,以接合頭接合於基板的倒裝晶片接合器。
再者,亦能夠適用於無中間平台和接合頭,而將以拾取頭從晶粒供給部拾取到的晶粒載置於托盤等之晶粒分類機。
Furthermore, in the embodiment, the die bonder that picks up the die from the die supply section with the pick-up head and places it on the intermediate stage, and uses the bonding head to bond the die placed on the intermediate stage to the substrate. The description is not limited to this, and it can be applied to a semiconductor manufacturing apparatus that picks up a die from a die supply unit.
For example, the present invention can also be applied to a die bonder that does not have an intermediate stage and a pick-up head, and uses a bonding head to bond the die of the die supply section to the substrate.
Furthermore, the present invention can be applied to a flip chip bonder that has no intermediate stage, picks up a die from a die supply unit, rotates the die picking head upward, receives the die to a bonding head, and bonds the bonding head to a substrate.
Furthermore, the present invention can also be applied to a grain sorter that does not have an intermediate platform and a bonding head, and places the grains picked up by the pick-up head from the grain supply section on a tray or the like.

10‧‧‧晶粒接合器10‧‧‧ Die Bonder

1‧‧‧晶粒供給部 1‧‧‧Crystal Supply Department

2‧‧‧拾取部 2‧‧‧Pick up department

21‧‧‧拾取頭 21‧‧‧Pickup head

22‧‧‧夾頭 22‧‧‧ chuck

25‧‧‧夾頭保持器 25‧‧‧ Collet holder

3‧‧‧中間平台部 3‧‧‧Middle Platform Department

31‧‧‧中間平台 31‧‧‧ intermediate platform

4‧‧‧接合部 4‧‧‧ Junction

41‧‧‧接合頭 41‧‧‧Joint head

42‧‧‧夾頭 42‧‧‧Chuck

5‧‧‧搬運部 5‧‧‧Transportation Department

51‧‧‧基板搬運爪 51‧‧‧ substrate handling claw

8‧‧‧控制部 8‧‧‧Control Department

90‧‧‧夾頭檢查部 90‧‧‧ Collet Inspection Department

91‧‧‧指紋感測器 91‧‧‧Fingerprint sensor

92‧‧‧支持板 92‧‧‧ support board

93‧‧‧檢測電路 93‧‧‧Detection circuit

94‧‧‧纜線 94‧‧‧cable

D‧‧‧晶粒 D‧‧‧ Grain

S‧‧‧基板 S‧‧‧ substrate

P‧‧‧封裝區域 P‧‧‧Packing area

圖1為說明晶粒接合器之構成例的圖示。FIG. 1 is a diagram illustrating a configuration example of a die bonder.

圖2為說明圖1之晶粒接合器之構成的圖示。 FIG. 2 is a diagram illustrating the configuration of the die bonder of FIG. 1. FIG.

圖3為說明圖1之晶粒供給部之構成的圖示。 FIG. 3 is a diagram illustrating the configuration of the crystal grain supply section of FIG. 1. FIG.

圖4為說明圖3之晶粒供給部之主要部位的圖示。 FIG. 4 is a diagram illustrating a main part of the crystal grain supply section of FIG. 3.

圖5為說明以圖1之晶粒接合器使用之夾頭接合器之構造的圖示。 FIG. 5 is a diagram illustrating a configuration of a collet adapter used with the die bonder of FIG. 1. FIG.

圖6為說明圖5之夾頭保持器之構造的圖示。 FIG. 6 is a diagram illustrating the configuration of the collet holder of FIG. 5. FIG.

圖7為說明圖5之夾頭的圖示。 FIG. 7 is a diagram illustrating the chuck of FIG. 5.

圖8為說明圖2之夾頭檢查部的圖示。 FIG. 8 is a diagram illustrating the chuck inspection section of FIG. 2.

圖9為說明圖8之指紋感測器的圖示。 FIG. 9 is a diagram illustrating the fingerprint sensor of FIG. 8.

圖10為說明藉由圖8之指紋感測器檢測夾頭之傾斜的圖示。 FIG. 10 is a diagram illustrating the inclination of the chuck detected by the fingerprint sensor of FIG. 8.

圖11為說明在圖1之晶粒接合器之接合方法之一例的圖示。 FIG. 11 is a diagram illustrating an example of a bonding method of the die bonder of FIG. 1. FIG.

圖12為說明在圖1之晶粒接合器之接合方法之一例的圖示。 FIG. 12 is a diagram illustrating an example of a bonding method of the die bonder of FIG. 1. FIG.

圖13為表示使用圖1之接合器的半導體裝置之製造方法之流程圖。 FIG. 13 is a flowchart showing a method of manufacturing a semiconductor device using the adapter of FIG. 1. FIG.

圖14為說明與變形例有關之夾頭檢查部的圖示。 FIG. 14 is a diagram illustrating a chuck inspection section related to a modification.

圖15為說明藉由圖14之指紋感測器檢測夾頭之傾斜的圖示。 FIG. 15 is a diagram illustrating the inclination of the chuck detected by the fingerprint sensor of FIG. 14.

圖16為說明在圖1之晶粒接合器之接合方法之其他例的圖示。 FIG. 16 is a diagram illustrating another example of the bonding method of the die bonder of FIG. 1. FIG.

圖17為說明在圖1之晶粒接合器之接合方法之其他例的圖示。 FIG. 17 is a diagram illustrating another example of the bonding method of the die bonder of FIG. 1. FIG.

Claims (13)

一種半導體製造裝置,具備: 頭部,其係以夾頭吸附晶粒並予以拾取; 夾頭檢查部,其係確認及檢查上述夾頭;及 控制裝置,其係控制上述頭部及上述夾頭檢查部, 上述夾頭檢查部具備形狀檢測感測器, 上述控制裝置藉由上述形狀檢測感測器讀取上述夾頭之形狀。A semiconductor manufacturing apparatus including: Head, which uses a chuck to attract and pick up crystal grains; A chuck inspection unit that confirms and inspects the chucks; and A control device for controlling the head and the chuck inspection section, The chuck inspection section includes a shape detection sensor, The control device reads the shape of the chuck through the shape detection sensor. 如請求項1記載之半導體製造裝置,其中 上述控制裝置比較藉由上述形狀檢測感測器事先讀取在特定位置的夾頭之形狀並予以記憶的資料,和於檢查時藉由上述形狀檢測感測器讀取上述夾頭之形狀的資料,檢測出上述夾頭之異常。The semiconductor manufacturing apparatus according to claim 1, wherein The control device compares the data in which the shape of the chuck at a specific position is read and memorized in advance by the shape detection sensor, and the data in which the shape of the chuck is read by the shape detection sensor during inspection. , The abnormality of the chuck is detected. 如請求項2記載之半導體製造裝置,其中 上述夾頭之異常係夾頭之磨耗、異物附著、傾斜或品種間不同。The semiconductor manufacturing apparatus according to claim 2, wherein The abnormality of the above-mentioned chuck is the abrasion of the chuck, the adhesion of foreign matter, the tilt or the difference between the varieties. 如請求項3記載之半導體製造裝置,其中 在上述控制裝置檢測出上述夾頭之異常的情況,更換上述夾頭。The semiconductor manufacturing apparatus according to claim 3, wherein When the control device detects an abnormality of the chuck, the chuck is replaced. 如請求項2記載之半導體製造裝置,其中 上述夾頭檢查部進一步在上述形狀檢測感測器之下方具有至少3個檢測上述夾頭之高度或高度之偏差的感測器。The semiconductor manufacturing apparatus according to claim 2, wherein The chuck inspection section further includes at least three sensors below the shape detection sensor that detect a height or a deviation in height of the chuck. 如請求項5記載之半導體製造裝置,其中 上述控制裝置係上述夾頭之高度之偏差為第一特定值以下之情況,判斷上述夾頭之安裝為正常,在上述夾頭之高度之偏差大於上述第一特定值並且第二特定值以下之情況,判斷需要調整上述夾頭之傾斜,在上述夾頭之高度之偏差大於上述第二特定值之情況,判斷上述夾頭之安裝異常。The semiconductor manufacturing apparatus according to claim 5, wherein The control device is a case where the height deviation of the chuck is below the first specific value, it is judged that the installation of the chuck is normal, and the height deviation of the chuck is greater than the first specific value and below the second specific value. In some cases, it is judged that the inclination of the chuck needs to be adjusted. In the case where the deviation of the height of the chuck is greater than the second specific value, it is judged that the installation of the chuck is abnormal. 如請求項6記載之半導體製造裝置,其中 上述感測器為壓力感測器、壓敏片或位移感測器。The semiconductor manufacturing apparatus according to claim 6, wherein The sensor is a pressure sensor, a pressure-sensitive sheet, or a displacement sensor. 如請求項1記載之半導體製造裝置,其中 上述形狀檢測感測器為指紋感測器。The semiconductor manufacturing apparatus according to claim 1, wherein The shape detection sensor is a fingerprint sensor. 如請求項1記載之半導體製造裝置,其中 進一步具備: 晶粒供給部,其係具有保持黏貼晶粒之切割膠帶的晶圓環; 拾取頭,其係拾取被黏貼於上述切割膠帶的晶粒; 中間平台,其係載置以上述拾取頭拾取的晶粒;及 接合頭,其係將從上述中間平台拾取到的晶粒接合於基板或已被接合的晶粒上, 上述頭部係上述拾取頭及上述接合頭之至少任一方。The semiconductor manufacturing apparatus according to claim 1, wherein Further: A die supply unit, which is a wafer ring having a dicing tape for holding a die; A picking head, which picks up the crystal grains adhered to the cutting tape; An intermediate platform on which the dies picked up by the pick-up head are placed; and The bonding head is used for bonding the crystal grains picked up from the intermediate platform to the substrate or the bonded crystal grains. The head is at least one of the pickup head and the bonding head. 如請求項9記載之半導體製造裝置,其中 上述夾頭檢查部位於上述拾取頭和上述接合頭之雙方的移動範圍內, 上述控制裝置係使上述拾取頭及上述接合頭移動至上述夾頭檢查部,檢查上述拾取頭之夾頭及上述接合頭之夾頭。The semiconductor manufacturing apparatus according to claim 9, wherein The chuck inspection section is located within a movement range of both the pickup head and the bonding head, The control device moves the pickup head and the bonding head to the chuck inspection section, and inspects the chuck of the pickup head and the chuck of the bonding head. 一種半導體裝置之製造方法,具備: (a)準備如請求項1至10中之任一的半導體製造裝置的工程; (b)搬入保持貼附有晶粒之切割膠帶的晶圓環之工程; (c)準備搬入基板之工程; (d)拾取晶粒之工程;及 (e)將上述拾取到的晶粒接合於上述基板或已被接合之晶粒上的工程。A method for manufacturing a semiconductor device includes: (a) preparation of a semiconductor manufacturing apparatus as claimed in any one of claims 1 to 10; (b) the process of moving into a wafer ring holding a dicing tape with die attached; (c) preparations for moving into the substrate; (d) the process of picking up grains; and (e) A process of bonding the picked-up crystal grains to the substrate or the crystal grains that have already been bonded. 如請求項11記載之半導體裝置之製造方法,其中 上述(d)工程係以上述接合頭拾取被黏貼於上述切割膠帶上之晶粒, 上述(e)工程係以上述接合頭將拾取到的晶粒接合於上述基板或已被接合之晶粒上。The method for manufacturing a semiconductor device according to claim 11, wherein The above (d) process is to pick up the crystal grains adhered to the dicing tape with the bonding head, In the above (e) process, the picked-up die is bonded to the substrate or the bonded die with the bonding head. 如請求項11記載之半導體裝置之製造方法,其中 上述(d)工程具備: (d1)以拾取頭拾取被黏貼於上述切割膠帶上之晶粒的工程;和 (d2)將以上述拾取頭拾取到的晶粒載置於中間平台的工程, 上述(e)工程具備: (e1)以接合頭拾取被載置於上述中間平台的晶粒的工程;和 (e2)將以上述接合頭拾取到的晶粒載置於上述基板的工程。The method for manufacturing a semiconductor device according to claim 11, wherein The above (d) project has: (d1) a process of picking up the crystal grains adhered to the dicing tape by a pick-up head; and (d2) the process of placing the grains picked up by the picking head on the intermediate platform, The above (e) project has: (e1) a process of picking up a die loaded on the intermediate platform with a bonding head; and (e2) A process of placing the crystal grain picked up by the bonding head on the substrate.
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