TW201843526A - 感光性樹脂組成物及抗蝕劑圖案的形成方法 - Google Patents

感光性樹脂組成物及抗蝕劑圖案的形成方法 Download PDF

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Publication number
TW201843526A
TW201843526A TW107114324A TW107114324A TW201843526A TW 201843526 A TW201843526 A TW 201843526A TW 107114324 A TW107114324 A TW 107114324A TW 107114324 A TW107114324 A TW 107114324A TW 201843526 A TW201843526 A TW 201843526A
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TW
Taiwan
Prior art keywords
group
protecting group
resin composition
added
compound
Prior art date
Application number
TW107114324A
Other languages
English (en)
Chinese (zh)
Inventor
岩下建一
横澤勉
Original Assignee
日商日立化成股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 日商日立化成股份有限公司 filed Critical 日商日立化成股份有限公司
Publication of TW201843526A publication Critical patent/TW201843526A/zh

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/02—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
    • C08G69/26—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polyamides (AREA)
  • Materials For Photolithography (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW107114324A 2017-04-26 2018-04-26 感光性樹脂組成物及抗蝕劑圖案的形成方法 TW201843526A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-087467 2017-04-26
JP2017087467 2017-04-26

Publications (1)

Publication Number Publication Date
TW201843526A true TW201843526A (zh) 2018-12-16

Family

ID=63920166

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107114324A TW201843526A (zh) 2017-04-26 2018-04-26 感光性樹脂組成物及抗蝕劑圖案的形成方法

Country Status (3)

Country Link
JP (1) JP6733813B2 (ja)
TW (1) TW201843526A (ja)
WO (1) WO2018199247A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114488693A (zh) * 2021-12-24 2022-05-13 苏州理硕科技有限公司 聚合物、含有此聚合物的光刻胶及其应用

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7119997B2 (ja) * 2018-12-28 2022-08-17 信越化学工業株式会社 感光性樹脂組成物、積層体、及びパターン形成方法
TW202208511A (zh) * 2020-08-27 2022-03-01 日商富士軟片股份有限公司 硬化物的製造方法、樹脂組成物、顯影液、積層體的製造方法及半導體器件的製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6951682B1 (en) * 1998-12-01 2005-10-04 Syntrix Biochip, Inc. Porous coatings bearing ligand arrays and use thereof
JP3353292B2 (ja) * 1999-03-29 2002-12-03 日本電気株式会社 化学増幅系レジスト
EP1636648B1 (en) * 2003-06-05 2015-08-12 FujiFilm Electronic Materials USA, Inc. Novel positive photosensitive resin compositions
CN102428121B (zh) * 2009-03-10 2014-05-28 日产化学工业株式会社 聚酰亚胺前体、聚酰亚胺及液晶取向剂

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114488693A (zh) * 2021-12-24 2022-05-13 苏州理硕科技有限公司 聚合物、含有此聚合物的光刻胶及其应用

Also Published As

Publication number Publication date
JP6733813B2 (ja) 2020-08-05
JPWO2018199247A1 (ja) 2019-11-07
WO2018199247A1 (ja) 2018-11-01

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