TW201832014A - 曝光裝置 - Google Patents

曝光裝置 Download PDF

Info

Publication number
TW201832014A
TW201832014A TW107100616A TW107100616A TW201832014A TW 201832014 A TW201832014 A TW 201832014A TW 107100616 A TW107100616 A TW 107100616A TW 107100616 A TW107100616 A TW 107100616A TW 201832014 A TW201832014 A TW 201832014A
Authority
TW
Taiwan
Prior art keywords
stage
frame
movable
vibration
viscous fluid
Prior art date
Application number
TW107100616A
Other languages
English (en)
Chinese (zh)
Inventor
長島寿一
Original Assignee
日商牛尾電機股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商牛尾電機股份有限公司 filed Critical 日商牛尾電機股份有限公司
Publication of TW201832014A publication Critical patent/TW201832014A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vibration Prevention Devices (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW107100616A 2017-02-02 2018-01-08 曝光裝置 TW201832014A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-017288 2017-02-02
JP2017017288A JP7052197B2 (ja) 2017-02-02 2017-02-02 露光装置

Publications (1)

Publication Number Publication Date
TW201832014A true TW201832014A (zh) 2018-09-01

Family

ID=63074998

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107100616A TW201832014A (zh) 2017-02-02 2018-01-08 曝光裝置

Country Status (4)

Country Link
JP (1) JP7052197B2 (ko)
KR (1) KR20180090199A (ko)
CN (1) CN108388084A (ko)
TW (1) TW201832014A (ko)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5556774A (en) 1978-10-24 1980-04-25 Ikegami Tsushinki Co Ltd Pickup tube cathode blanking boosting device for television camera
JPS63231028A (ja) * 1987-03-19 1988-09-27 Canon Inc 振動減衰装置
JPH0642578A (ja) * 1992-07-23 1994-02-15 Hitachi Ltd 半能動型除振装置、半能動型ダンパ装置、半能動型剛性機構装置、縮小投影露光装置及びその半能動型除振方法
JPH06307482A (ja) * 1993-04-21 1994-11-01 Canon Inc 粘性ダンパ装置
JPH08170990A (ja) * 1994-12-19 1996-07-02 Nikon Corp ステージ装置
JPH10281216A (ja) * 1997-04-08 1998-10-23 Hitachi Ltd 支持要素
JPH11154698A (ja) * 1997-11-21 1999-06-08 Nikon Corp テーブル支持装置
JPH11162828A (ja) * 1997-11-21 1999-06-18 Nikon Corp 投影露光装置及び投影露光方法
JP3554186B2 (ja) * 1998-04-08 2004-08-18 キヤノン株式会社 露光装置、デバイス製造方法および反力受け方法
US6953109B2 (en) * 2002-10-08 2005-10-11 Nikon Corporation Vibration isolator with low lateral stiffness
JP5556774B2 (ja) * 2011-09-16 2014-07-23 ウシオ電機株式会社 露光装置

Also Published As

Publication number Publication date
JP7052197B2 (ja) 2022-04-12
CN108388084A (zh) 2018-08-10
KR20180090199A (ko) 2018-08-10
JP2018124464A (ja) 2018-08-09

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