TW201827626A - 具擴散阻障層及抗侵蝕層的多層塗層 - Google Patents
具擴散阻障層及抗侵蝕層的多層塗層 Download PDFInfo
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- TW201827626A TW201827626A TW107101620A TW107101620A TW201827626A TW 201827626 A TW201827626 A TW 201827626A TW 107101620 A TW107101620 A TW 107101620A TW 107101620 A TW107101620 A TW 107101620A TW 201827626 A TW201827626 A TW 201827626A
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- Prior art keywords
- layer
- diffusion barrier
- barrier layer
- zirconium
- precursor
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
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| US10535525B2 (en) * | 2017-08-31 | 2020-01-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for forming semiconductor device structure |
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| US11086233B2 (en) * | 2018-03-20 | 2021-08-10 | Lam Research Corporation | Protective coating for electrostatic chucks |
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| US11183368B2 (en) | 2018-08-02 | 2021-11-23 | Lam Research Corporation | RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks |
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| CN110015895A (zh) * | 2019-04-01 | 2019-07-16 | 中国有色桂林矿产地质研究院有限公司 | 一种氧化铝-氧化锆-氧化钇-氮化钛纳米复合陶瓷粉体及其制备方法 |
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| CN112053929A (zh) * | 2019-06-06 | 2020-12-08 | 中微半导体设备(上海)股份有限公司 | 用于等离子体腔室内部的部件及其制作方法 |
| CN114402413B (zh) * | 2019-08-09 | 2024-07-26 | 应用材料公司 | 用于处理腔室部件的保护性多层涂层 |
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| CN112981323A (zh) * | 2019-12-12 | 2021-06-18 | 有研工程技术研究院有限公司 | 一种氧化铝/氧化铒陶瓷涂层复合体系及其制备方法 |
| US11658014B2 (en) * | 2020-04-11 | 2023-05-23 | Applied Materials, Inc. | Apparatuses and methods of protecting nickel and nickel containing components with thin films |
| JP7562824B2 (ja) * | 2020-07-09 | 2024-10-07 | インテグリス・インコーポレーテッド | フッ化酸化イットリウムおよび金属酸化物を含有するコーティング、ならびにコーティングを調製および使用する方法 |
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-
2017
- 2017-07-11 US US15/646,602 patent/US20180016678A1/en not_active Abandoned
- 2017-07-14 TW TW107101620A patent/TW201827626A/zh unknown
- 2017-07-14 KR KR1020187004122A patent/KR102481924B1/ko active Active
- 2017-07-14 KR KR1020197005973A patent/KR102481950B1/ko active Active
- 2017-07-14 JP JP2018503240A patent/JP7053452B2/ja active Active
- 2017-07-14 WO PCT/US2017/042110 patent/WO2018013909A1/en not_active Ceased
- 2017-07-14 TW TW106123559A patent/TW201823487A/zh unknown
- 2017-07-14 CN CN201780002518.0A patent/CN107849704A/zh not_active Withdrawn
- 2017-07-14 CN CN201810637499.5A patent/CN108531907A/zh not_active Withdrawn
- 2017-12-15 US US15/844,335 patent/US11008653B2/en active Active
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2019
- 2019-07-23 JP JP2019135023A patent/JP7048544B2/ja active Active
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|---|---|
| US20180016678A1 (en) | 2018-01-18 |
| TW201823487A (zh) | 2018-07-01 |
| WO2018013909A1 (en) | 2018-01-18 |
| US20180112311A1 (en) | 2018-04-26 |
| US11008653B2 (en) | 2021-05-18 |
| KR20190022944A (ko) | 2019-03-06 |
| JP2019214790A (ja) | 2019-12-19 |
| KR20190019887A (ko) | 2019-02-27 |
| JP7048544B2 (ja) | 2022-04-05 |
| JP7053452B2 (ja) | 2022-04-12 |
| CN107849704A (zh) | 2018-03-27 |
| KR102481924B1 (ko) | 2022-12-26 |
| CN108531907A (zh) | 2018-09-14 |
| JP2019522104A (ja) | 2019-08-08 |
| KR102481950B1 (ko) | 2022-12-26 |
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