TW201800592A - Mask frame and vacuum processing device - Google Patents

Mask frame and vacuum processing device

Info

Publication number
TW201800592A
TW201800592A TW106109119A TW106109119A TW201800592A TW 201800592 A TW201800592 A TW 201800592A TW 106109119 A TW106109119 A TW 106109119A TW 106109119 A TW106109119 A TW 106109119A TW 201800592 A TW201800592 A TW 201800592A
Authority
TW
Taiwan
Prior art keywords
frame
frame elements
longitudinal direction
end side
opening
Prior art date
Application number
TW106109119A
Other languages
Chinese (zh)
Other versions
TWI626324B (en
Inventor
李東偉
Original Assignee
日新電機股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日新電機股份有限公司 filed Critical 日新電機股份有限公司
Publication of TW201800592A publication Critical patent/TW201800592A/en
Application granted granted Critical
Publication of TWI626324B publication Critical patent/TWI626324B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

To provide a mask frame having no gap between each frame element, without a special member for filling the gap in frame elements adjoining to each other, even a size of an opening of the mask frame is changed. The mask frame with a rectangular opening includes four frame elements having a longer direction corresponding to four edges of the opening respectively. An edge end of one end side in the longer direction in each flame element, and a side edge of the opening along the longer direction in the adjoining frame elements to the edge end are arranged facing each other without the gap in a plain view. The four frame elements are provided so as to be slidable in each inclined slide direction to each longer direction in a plain view, and an opening size of the opening can be changed by sliding the four frame elements.

Description

罩幕框架及真空處理裝置Mask frame and vacuum processing device

本發明是有關於一種控制對基板的處理範圍的罩幕框架及使用所述罩幕框架的真空處理裝置。The invention relates to a mask frame for controlling a processing range of a substrate and a vacuum processing device using the mask frame.

作為此種真空處理裝置,如專利文獻1所示,有包括掩蓋基板的周緣部而對基板上的成膜範圍進行控制的罩幕體、以及對所述罩幕體進行固定的罩幕體安裝板的真空處理裝置。As such a vacuum processing apparatus, as shown in Patent Document 1, there are a cover body including a cover portion that covers a peripheral portion of the substrate and controls a film formation range on the substrate, and a cover body fixing the cover body Plate vacuum processing device.

所述罩幕體如圖12所示,包括與開口部的各邊相對應地分割而成的帶狀的4個框架元件(罩幕主體)X1~框架元件(罩幕主體)X4。具體而言,罩幕體包括相互對向的2個框架元件X1、框架元件X2(圖12中為左右的框架元件),以及與該些框架元件X1、框架元件X2正交地配置且相互對向的2個框架元件X3、框架元件X4(圖12中為上下的框架元件)。並且,相互對向的左右的框架元件X1、框架元件X2的兩端部分別與相互對向的上下的框架元件X3、框架元件X4對頂地配置。As shown in FIG. 12, the mask body includes four band-shaped frame elements (mask main body) X1 to frame elements (mask main body) X4 divided in correspondence with each side of the opening portion. Specifically, the cover body includes two frame elements X1, frame elements X2 (left and right frame elements in FIG. 12) facing each other, and orthogonally arranged and opposed to the frame elements X1, frame elements X2. Two frame elements X3 and X4 (the upper and lower frame elements in FIG. 12). In addition, both end portions of the left and right frame elements X1 and X2 facing each other are disposed facing the upper and lower frame elements X3 and X4 facing each other.

而且,各框架元件X1~框架元件X4是在可單獨變更位置的安裝狀態下固定在罩幕體安裝板上。具體而言,框架元件構成為可藉由設置於罩幕體安裝板上的調整螺釘,而在與框架元件的長度方向正交的方向上進行位置變更。 [現有技術文獻] [專利文獻]In addition, each of the frame elements X1 to X4 is fixed to the cover body mounting plate in a mounted state in which positions can be individually changed. Specifically, the frame element is configured such that its position can be changed in a direction orthogonal to the longitudinal direction of the frame element by an adjusting screw provided on the cover body mounting plate. [Prior Art Literature] [Patent Literature]

[專利文獻1]日本專利特開平10-60624號公報[Patent Document 1] Japanese Patent Laid-Open No. 10-60624

[發明所欲解決的問題] 在所述罩幕體中,4個框架元件X1~框架元件X4是在與各自的長度方向正交的方向上移動,故而在變更開口尺寸後(變更成膜區域後),會在各框架元件的端部之間產生間隙G。於是,存在成膜後的基板的四角的膜變得不均勻的問題。[Problems to be Solved by the Invention] In the cover body, the four frame elements X1 to X4 are moved in a direction orthogonal to their respective longitudinal directions. Therefore, after changing the opening size (change the film formation area) After), a gap G is generated between the ends of each frame element. As a result, there is a problem that the film at the four corners of the substrate after film formation becomes uneven.

並且,在所述專利文獻1中,構成為在其中一個框架元件的端部設置有防護板,在另一個框架元件的端部設置有可收容所述防護板的導引用段部,以填埋所述間隙G。In addition, in Patent Document 1, a protective plate is provided at an end portion of one of the frame members, and a guide section portion capable of accommodating the protective plate is provided at an end portion of the other frame member for landfilling. The gap G.

然而,即使是所述構成,由於在框架元件的角部上表面形成有凹部,故而亦存在成膜後的基板的四角的膜變得不均勻的問題。However, even with the above-mentioned configuration, since the recessed portions are formed on the upper surfaces of the corners of the frame element, there is a problem that the films at the four corners of the substrate after film formation become uneven.

因此,本發明是為了解決所述問題而完成的,其主要課題在於設為以下構成:無需在各框架元件的端部設置用以填埋間隙的特別構件,即使變更開口尺寸亦不會在各框架元件間產生間隙,從而提高基板處理的均勻性。 [解決問題的手段]Therefore, the present invention has been made in order to solve the above-mentioned problems, and its main problem is to have a configuration in which a special member for filling a gap does not need to be provided at an end portion of each frame element, and even if the opening size is changed, A gap is generated between the frame elements, thereby improving the uniformity of substrate processing. [Means to solve the problem]

即,本發明的罩幕框架是具有矩形的開口部的罩幕框架,其特徵在於包括:4個框架元件,具有與所述開口部的四邊分別相對應的長度方向;且所述各框架元件的長度方向一端側的端邊部及與所述端邊部鄰接的框架元件的沿長度方向的開口部側邊部是相對向而配置,所述4個框架元件是於俯視時相對於各自的長度方向傾斜的各自的滑動方向上可滑移地設置,藉由使所述4個框架元件滑移而可變更所述開口部的開口尺寸而構成罩幕框架。That is, the mask frame of the present invention is a mask frame having a rectangular opening portion, which is characterized by including: four frame elements having a length direction corresponding to each of the four sides of the opening portion; and each of the frame elements An end portion on one end side in the longitudinal direction and an opening portion side edge portion of the frame element adjacent to the end edge portion in the longitudinal direction are disposed opposite to each other, and the four frame elements are opposed to each other in a plan view. Each of the sliding directions is inclined in the longitudinal direction, and the four frame elements are slid to change the opening size of the opening portion to form a cover frame.

若為如上所述的罩幕框架,則各框架元件的長度方向一端側的端邊部及與所述端邊部鄰接的框架元件的沿長度方向的開口部側邊部是相對向而配置,因此即使變更開口尺寸,亦可維持各框架元件的長度方向一端側的端邊部與鄰接於所述端邊部的框架元件的沿長度方向的開口部側邊部的位置關係。因此,可設為如下構成:無需在相互鄰接的框架元件上設置用以填埋間隙的特別構件,即使變更開口尺寸,亦不會在各框架元件之間於俯視時產生間隙。具體而言,可一面維持各框架元件的長度方向一端側的端邊部及與所述端邊部鄰接的框架元件的沿長度方向的開口部側邊部相接觸或接近的狀態,一面變更開口尺寸。In the case of the curtain frame as described above, the end edge portion of the one end side in the longitudinal direction of each frame element and the opening edge side portion of the frame element adjacent to the end edge portion in the longitudinal direction are arranged to face each other. Therefore, even if the size of the opening is changed, the positional relationship between the end edge portion of one end side in the longitudinal direction of each frame element and the opening edge side portion of the frame element adjacent to the end edge portion in the longitudinal direction can be maintained. Therefore, it is possible to adopt a configuration in which it is not necessary to provide a special member for burying a gap in mutually adjacent frame elements, and even if the opening size is changed, a gap does not occur between the frame elements in a plan view. Specifically, it is possible to change the opening while maintaining the state where the end edge portion of one end side of each frame element in the longitudinal direction and the opening edge side portion of the frame element adjacent to the end edge portion in the longitudinal direction are in contact with or close to each other. size.

更詳細而言,理想的是在相互鄰接的框架元件中,以其中一個框架元件的滑動方向上的傾斜角度與另一個框架元件的滑動方向上的傾斜角度的和為90度的方式而設定。 若為所述構成,則可不改變各框架元件的長度方向一端側的端邊部與鄰接於所述端邊部的框架元件的沿長度方向的開口部側邊部的位置關係,藉由使4個框架元件滑移而變更開口尺寸。More specifically, it is desirable to set the frame elements adjacent to each other such that the sum of the inclination angle in the sliding direction of one frame element and the inclination angle in the sliding direction of the other frame element is 90 degrees. According to the above configuration, the positional relationship between the end portion of the one end side in the longitudinal direction of each frame element and the opening portion side edge portion of the frame element adjacent to the end edge portion in the longitudinal direction can be maintained without changing 4 Each frame element slides to change the size of the opening.

理想的是所述4個框架元件是於俯視時相對於各自的長度方向傾斜45度的方向上可滑移地設置。 若為所述構成,則可在開口尺寸的變更前後維持開口形狀的縱橫比。It is desirable that the four frame elements are slidably disposed in a direction inclined by 45 degrees with respect to a respective length direction in a plan view. With this configuration, the aspect ratio of the opening shape can be maintained before and after the change in the opening size.

理想的是包括對所述4個框架元件進行支撐的支撐構件,且在所述框架元件與所述支撐構件之間設置有可使所述框架元件滑移的滑動導軌機構。 若為所述構成,則可容易地使各框架元件滑移。並且,在各框架元件的長度方向一端側的端邊部及與所述端邊部鄰接的框架元件的沿長度方向的開口部側邊部相接觸的構成的情況下,若使1個框架元件移動,則可使其他框架元件與所述移動聯動地移動,從而可容易地進行開口尺寸的變更。It is desirable to include a support member that supports the four frame members, and a slide rail mechanism that can slide the frame member is provided between the frame member and the support member. With this configuration, each frame element can be easily moved. In addition, in the case where the end edge portion of one end side in the longitudinal direction of each frame element and the opening edge side portion of the frame element adjacent to the end edge portion in the longitudinal direction are in contact with each other, if one frame element is made By moving, other frame elements can be moved in conjunction with the movement, so that the size of the opening can be easily changed.

理想的是所述滑動導軌機構分別設置於所述框架元件的長度方向一端側及長度方向另一端側。 若為所述構成,則滑動導軌機構分別設置於框架元件的長度方向一端側及另一端側,故而容易保持著框架元件的姿勢進行滑移。所述構成中,框架元件越長,所述效果越顯著。並且,當使多個框架元件聯動地移動時,可使該些框架元件穩定地移動。It is desirable that the slide rail mechanism is provided on one end side in the longitudinal direction and the other end side in the longitudinal direction of the frame element, respectively. According to the above configuration, since the slide rail mechanism is provided on one end side and the other end side in the longitudinal direction of the frame element, it is easy to perform sliding while maintaining the posture of the frame element. In the configuration, the longer the frame element is, the more remarkable the effect becomes. In addition, when a plurality of frame elements are moved in conjunction with each other, the frame elements can be stably moved.

理想的是所述框架元件藉由緊固構件而固定於所述支撐構件上,插通所述緊固構件的所述框架元件的插通孔或所述支撐構件的插通孔中的任一者是沿所述滑動方向上的傾斜長孔,利用所述緊固構件及設為所述傾斜長孔的插通孔來構成所述滑動導軌機構。 若為所述構成,則緊固構件兼作滑動導軌機構,從而可簡化罩幕框架的構成。並且,只要在開口尺寸的調整後使緊固構件緊固即可,從而可使自開口尺寸的調整至框架元件的固定為止的操作變得容易。It is desirable that the frame member is fixed to the support member by a fastening member, and either of the insertion hole of the frame member inserted into the fastening member or the insertion hole of the support member. One is an inclined long hole in the sliding direction, and the slide rail mechanism is configured by the fastening member and an insertion hole provided as the inclined long hole. With the above-mentioned configuration, the fastening member doubles as a slide rail mechanism, and the configuration of the curtain frame can be simplified. In addition, as long as the fastening member is fastened after the adjustment of the opening size, the operation from the adjustment of the opening size to the fixing of the frame element can be facilitated.

理想的是所述框架元件的所述開口部側邊部的上表面包含朝向開口部側具有向下傾斜的第1傾斜面,且所述框架元件的所述端邊部包含與所述第1傾斜面相對應的第2傾斜面。 若為所述構成,則藉由在各框架元件上設置第1傾斜面,可消除對位於罩幕框架附近的基板的處理的不均勻。並且,由於框架元件的端邊部包含第2傾斜面,故而可藉由簡單的構成來確實地填埋鄰接的框架間的間隙。Preferably, the upper surface of the opening portion side edge portion of the frame element includes a first inclined surface having a downward slope toward the opening portion side, and the end edge portion of the frame element includes the first inclined surface and the first inclined surface. A second inclined surface corresponding to the inclined surface. With the above-mentioned configuration, by providing the first inclined surface on each frame element, it is possible to eliminate unevenness in the processing of the substrate located near the mask frame. In addition, since the edge portion of the frame element includes the second inclined surface, the gap between adjacent frames can be reliably filled with a simple configuration.

理想的是所述框架元件是以對長度方向一端部進行固定,並且能夠以所述長度方向一端部為起點藉由熱膨脹而沿長度方向移動至長度方向另一端側的方式而構成。 若為所述構成,則可消除框架元件因熱膨脹而產生的撓曲所引起的處理的不均勻,從而可提高處理的均勻性。It is desirable that the frame element is configured to fix one end portion in the longitudinal direction and be able to move in the longitudinal direction to the other end side in the longitudinal direction by thermal expansion using the one end portion in the longitudinal direction as a starting point. With this configuration, it is possible to eliminate processing unevenness caused by deflection of the frame element due to thermal expansion, and to improve processing uniformity.

理想的是在所述框架元件的長度方向另一端側形成有可插通緊固構件的插通孔,且所述緊固構件具有頭部,所述插通孔是沿長度方向的長孔,所述緊固構件在所述頭部與所述框架元件的上表面之間空開間隙而固定所述長度方向另一端側。It is desirable that an insertion hole through which a fastening member can be inserted is formed on the other end side in the length direction of the frame element, and the fastening member has a head, and the insertion hole is a long hole in the length direction. The fastening member opens a gap between the head and the upper surface of the frame member to fix the other end side in the length direction.

若為所述構成,則只要將框架元件的插入孔設為長孔,即可消除因熱膨脹而引起的撓曲,從而可簡化其構成。 [發明的效果]According to the above-mentioned configuration, as long as the insertion hole of the frame element is an elongated hole, deflection due to thermal expansion can be eliminated, and the configuration can be simplified. [Effect of the invention]

根據如上所述而構成的本發明,可設為以下構成:無需在相互鄰接的框架元件上設置用以填埋間隙的特別構件,即使變更罩幕框架的開口部的尺寸,亦不會在各框架元件之間產生間隙,從而提高基板處理的均勻性。According to the present invention configured as described above, it is possible to adopt a configuration in which it is not necessary to provide a special member for filling a gap in mutually adjacent frame elements, and even if the size of the opening portion of the curtain frame is changed, A gap is generated between the frame elements, thereby improving the uniformity of substrate processing.

以下,一面參照圖式,一面對使用本發明的罩幕框架的真空處理裝置的一實施形態進行說明。Hereinafter, an embodiment of a vacuum processing apparatus using a mask frame of the present invention will be described with reference to the drawings.

本實施形態的真空處理裝置100是利用電漿中的離子對靶材(target)進行濺射而在矩形的基板上形成薄膜的濺射(sputtering)裝置。The vacuum processing apparatus 100 according to the present embodiment is a sputtering apparatus that forms a thin film on a rectangular substrate by sputtering a target using ions in a plasma.

具體而言,所述真空處理裝置100如圖1所示,包括對內部進行排氣而形成真空的處理容器2、與處理容器2電性絕緣地設置於所述處理容器2內的濺射電極3、與所述濺射電極3電性連接地安裝的靶材4、以及在與所述靶材4相對向的狀態下對基板W進行支撐的基板支撐部5。Specifically, as shown in FIG. 1, the vacuum processing apparatus 100 includes a processing container 2 that evacuates the inside to form a vacuum, and a sputtering electrode that is electrically insulated from the processing container 2 and disposed in the processing container 2. 3. A target material 4 which is electrically connected to the sputtering electrode 3, and a substrate support portion 5 which supports the substrate W in a state facing the target material 4.

在處理容器2中設置有氣體導入部21,自所述氣體導入部21導入放電用氣體。再者,放電用氣體例如是氬氣等惰性氣體。並且,在處理容器2內,設置有用以對內部進行排氣而形成真空的排氣部22,在所述排氣部22上連接有未圖示的真空泵。A gas introduction section 21 is provided in the processing container 2, and a discharge gas is introduced from the gas introduction section 21. The discharge gas is, for example, an inert gas such as argon. An exhaust unit 22 is provided in the processing container 2 to exhaust the inside to form a vacuum. A vacuum pump (not shown) is connected to the exhaust unit 22.

在濺射電極3上連接有電源部6,藉由所述電源部6而供給高頻電力。A power source section 6 is connected to the sputtering electrode 3, and high-frequency power is supplied by the power source section 6.

基板支撐部5以可調整基板W相對於靶材4的位置構成,在本實施形態中,包括多個支撐銷51、以及使所述支撐銷51上下移動的驅動部52。再者,基板支撐部5與處理容器2之間是藉由伸縮管(bellows)等密封(seal)構件7而遮蔽。再者,處理容器2及基板支撐部5為電性接地。The substrate supporting portion 5 is configured to adjust the position of the substrate W relative to the target 4. In this embodiment, the substrate supporting portion 5 includes a plurality of supporting pins 51 and a driving portion 52 that moves the supporting pins 51 up and down. In addition, the space between the substrate support portion 5 and the processing container 2 is shielded by a seal member 7 such as a bellows. In addition, the processing container 2 and the substrate support portion 5 are electrically grounded.

並且,當自所述氣體導入部21導入放電用氣體,藉由電源部6而對濺射電極3供給高頻電力時,會自所述濺射電極3產生高頻放電。藉由所述高頻放電而使放電用氣體電離而生成電漿。所述電漿中的離子對靶材4進行濺射,自靶材4飛出的濺射粒子入射沈積於基板W上,而在基板W上形成薄膜。再者,真空處理裝置100亦可藉由電源部6而對濺射電極3供給直流電力,且藉由自所述濺射電極3產生的直流放電,而生成電漿。When a discharge gas is introduced from the gas introduction portion 21 and high-frequency power is supplied to the sputtering electrode 3 through the power supply portion 6, a high-frequency discharge is generated from the sputtering electrode 3. The discharge gas is ionized by the high-frequency discharge to generate a plasma. The target 4 is sputtered by the ions in the plasma, and the sputtered particles flying out from the target 4 are incidentally deposited on the substrate W to form a thin film on the substrate W. In addition, the vacuum processing apparatus 100 may supply a DC power to the sputtering electrode 3 by the power supply unit 6 and generate a plasma by a DC discharge generated from the sputtering electrode 3.

然而,本實施形態的真空處理裝置100如圖1及圖2所示,包括自靶材4掩蓋基板W的周緣部的罩幕框架8。However, as shown in FIGS. 1 and 2, the vacuum processing apparatus 100 of this embodiment includes a mask frame 8 that covers the peripheral edge portion of the substrate W from the target 4.

所述罩幕框架8特別是如圖2所示,具有矩形的開口部8X,且包括與所述開口部8X的四邊分別相對應且具有長度方向的4個框架元件81a~框架元件81d、以及對所述4個框架元件81a~框架元件81d進行支撐的支撐構件82。The mask frame 8 has a rectangular opening portion 8X, as shown in FIG. 2, and includes four frame elements 81 a to 81 d corresponding to the four sides of the opening portion 8X and having longitudinal directions, and A support member 82 that supports the four frame elements 81a to 81d.

再者,由4個框架元件81a~框架元件81d形成的開口部8X設定得小於矩形的基板尺寸。本實施形態的支撐構件82設置於處理容器2中,呈具有大於矩形的基板尺寸的矩形的開口部82X的矩形框狀。並且,將4個框架元件81a~框架元件81d固定於所述支撐構件82的上表面。In addition, the opening portion 8X formed by the four frame elements 81a to 81d is set smaller than the rectangular substrate size. The support member 82 according to the present embodiment is provided in the processing container 2 and has a rectangular frame shape having a rectangular opening portion 82X that is larger than a rectangular substrate size. The four frame elements 81 a to 81 d are fixed to the upper surface of the support member 82.

各框架元件81a~框架元件81d於俯視時呈長條狀(矩形),包括沿長度方向的一對側邊部811、側邊部812,以及沿與長度方向正交的方向的一對端邊部813、端邊部814。在本實施形態中,一對側邊部811、側邊部812及一對端邊部813、端邊部814均於俯視時呈直線狀。並且,各框架元件81a~框架元件81d的與長度方向正交的剖面形狀為矩形。Each of the frame elements 81a to 81d is elongated (rectangular) in a plan view, and includes a pair of side portions 811, 812 in the longitudinal direction, and a pair of end edges in a direction orthogonal to the longitudinal direction.部 813 , 端 边 部 814。 813, the end portion 814. In this embodiment, the pair of side portions 811, 812, and the pair of end portions 813 and 814 are linear in a plan view. The cross-sectional shape of each of the frame elements 81a to 81d orthogonal to the longitudinal direction is rectangular.

並且,該些4個框架元件81a~框架元件81d是以形成開口部8X的各邊的方式配置成矩形環狀。具體而言,4個框架元件81a~框架元件81d是以各框架元件81a~框架元件81d的長度方向一端側的端邊部813(以下,稱為一端邊部813)及與所述一端邊部813鄰接的框架元件81a~框架元件81d的沿長度方向的開口部側邊部811相互對向的方式而配置。The four frame elements 81a to 81d are arranged in a rectangular ring shape so as to form each side of the opening portion 8X. Specifically, the four frame elements 81a to 81d are the end edge portions 813 (hereinafter, referred to as one end edge portions 813) of one end side of each of the frame elements 81a to 81d in the longitudinal direction, and the one end edge portions. 813 adjacent frame elements 81a to 81d are arranged such that the opening side edges 811 in the longitudinal direction face each other.

在本實施形態中,各框架元件81a~框架元件81d的一端邊部813與鄰接的框架元件81a~框架元件81d的開口部側邊部811藉由相互接觸,而於俯視時不空開間隙地配置。具體而言,所述一端邊部813的側面與開口部側邊部811的側面為面接觸。In this embodiment, one end edge portion 813 of each of the frame elements 81a to 81d and the adjacent opening side edge portions 811 of the adjacent frame elements 81a to 81d are in contact with each other without opening a gap in a plan view. Configuration. Specifically, the side surface of the one end side portion 813 is in surface contact with the side surface of the opening side portion 811.

如上所述而配置的4個框架元件81a~框架元件81d是於俯視時相對於各自的長度方向傾斜的各自的滑動方向上可滑移地設置。並且,藉由使4個框架元件81a~框架元件81d滑移而可變更開口部8X的開口尺寸而構成。The four frame elements 81a to 81d arranged as described above are slidably provided in respective sliding directions that are inclined with respect to the respective longitudinal directions in a plan view. In addition, the opening size of the opening portion 8X can be changed by sliding the four frame elements 81a to 81d.

具體而言,在相互鄰接的框架元件81a~框架元件81d中,以其中一個框架元件(例如81a)的滑動方向上的傾斜角度、與另一個框架元件(例如81b)的滑動方向上的傾斜角度的和成90度的方式而設定。在本實施形態中,各框架元件81a~框架元件81d的滑動方向上的傾斜角度設為45度。Specifically, among the frame elements 81a to 81d adjacent to each other, the inclination angle in the sliding direction of one of the frame elements (for example, 81a) and the inclination angle in the sliding direction of the other frame element (for example, 81b). The sum is set at 90 degrees. In this embodiment, the inclination angle in the sliding direction of each of the frame elements 81a to 81d is set to 45 degrees.

並且,罩幕框架8如圖2所示,包含用以使4個框架元件81a~框架元件81d分別沿滑動方向移動的滑動導軌機構9。本實施形態的滑動導軌機構9可於俯視時相對於各自的長度方向傾斜45度的滑動方向上滑動。As shown in FIG. 2, the mask frame 8 includes a slide rail mechanism 9 for moving the four frame elements 81 a to 81 d in the sliding direction, respectively. The slide rail mechanism 9 of this embodiment can slide in a sliding direction that is inclined by 45 degrees with respect to the respective longitudinal directions in a plan view.

具體而言,滑動導軌機構9分別設置於各框架元件81a~框架元件81d的長度方向一端側及長度方向另一端側。本實施形態的滑動導軌機構9是使用固定機構10a、固定機構10b而構成,所述固定機構10a、固定機構10b將各框架元件81a~框架元件81d在其長度方向一端側及長度方向另一端側分別固定於支撐構件82上。Specifically, the slide rail mechanism 9 is provided on one end side in the longitudinal direction and the other end side in the longitudinal direction of each of the frame elements 81 a to 81 d. The slide rail mechanism 9 according to the present embodiment is configured using a fixing mechanism 10a and a fixing mechanism 10b that have each of the frame elements 81a to 81d at one end side in the longitudinal direction and the other end side in the longitudinal direction. They are respectively fixed to the support members 82.

長度方向一端側的固定機構10a如圖3及圖4所示,構成為藉由將作為緊固構件的緊固螺栓11插通至形成於框架元件81a~框架元件81d的長度方向一端側的一端側插通孔81h1,且螺合於形成於支撐構件82上的內螺孔12,來對框架元件81a~框架元件81d的長度方向一端側進行固定。此處,形成於框架元件81a~框架元件81d上的一端側插通孔81h1設為沿框架元件81a~框架元件81d的滑動方向(圖4中的符號SD)延伸的傾斜長孔。再者,圖4中的符號LD表示框架元件81a~框架元件81d的長度方向。As shown in FIGS. 3 and 4, the fixing mechanism 10 a on one end side in the longitudinal direction is configured by inserting a fastening bolt 11 as a fastening member to one end formed on one end side in the longitudinal direction of the frame element 81 a to the frame element 81 d. The side insertion hole 81h1 is screwed into the inner screw hole 12 formed in the support member 82 to fix one end side of the frame elements 81a to 81d in the longitudinal direction. Here, one end side insertion hole 81h1 formed in the frame elements 81a to 81d is an inclined long hole extending in the sliding direction (symbol SD in FIG. 4) of the frame elements 81a to 81d. In addition, the symbol LD in FIG. 4 indicates the longitudinal direction of the frame elements 81a to 81d.

在所述構成中,在將緊固螺栓11加以緊固的狀態下,即在緊固螺栓11的頭部111與支撐構件82之間夾著框架元件81a~框架元件81d的狀態下,對框架元件81a~框架元件81d的長度方向一端側進行固定。另一方面,在緊固螺栓11鬆開的狀態下,即,在緊固螺栓11的頭部111與框架元件81a~框架元件81d相離的狀態下,框架元件81a~框架元件81d可相對於緊固螺栓11在滑動方向上滑移。如上所述,利用緊固螺栓11及一端側插通孔81h1構成滑動導軌機構9。即,緊固螺栓11成為設置於支撐構件82上的固定部,一端側插入孔81h1成為相對於所述固定部滑移的滑動部。In the above-mentioned configuration, the frame member 81 a to the frame member 81 d are sandwiched between the head member 111 of the fastening bolt 11 and the support member 82 in a state where the fastening bolt 11 is fastened, that is, the frame member 81 a to a frame member 81 d are sandwiched. One end of the element 81a to the frame element 81d in the longitudinal direction is fixed. On the other hand, in a state where the fastening bolts 11 are loosened, that is, in a state where the head portion 111 of the fastening bolts 11 is separated from the frame elements 81a to 81d, the frame elements 81a to 81d may be opposite to each other. The fastening bolt 11 slides in the sliding direction. As described above, the slide rail mechanism 9 is configured by the fastening bolt 11 and the one-end-side insertion hole 81h1. That is, the fastening bolt 11 becomes a fixed part provided in the support member 82, and the one end side insertion hole 81h1 becomes a sliding part which slides with respect to the said fixed part.

長度方向另一端側的固定機構10b如圖3及圖5所示,構成為藉由將緊固螺栓11插通至形成於框架元件81a~框架元件81d的長度方向另一端側的另一端側插通孔81h2及形成於支撐構件82上的插通孔82h,且螺合於設置於支撐構件82的背面的螺母12,來對框架元件81a~框架元件81d的長度方向另一端側進行固定。此處,圖5中的符號LD表示框架元件81a~框架元件81d的長度方向,符號SD表示框架元件81a~框架元件81d的滑動方向。此處,在支撐構件82的背面,形成有收容螺母13的鍃孔821。並且,形成於支撐構件82上的插通孔82h設為沿框架元件81a~框架元件81d的滑動方向延伸的傾斜長孔。再者,鍃孔821亦設為與插通孔82h一併沿滑動方向延伸的傾斜長孔。As shown in FIGS. 3 and 5, the fixing mechanism 10 b on the other end side in the longitudinal direction is configured by inserting the fastening bolt 11 to the other end side on the other end side in the longitudinal direction formed on the frame elements 81 a to 81 d. The through hole 81h2 and the insertion hole 82h formed in the support member 82 are screwed to the nut 12 provided on the back surface of the support member 82 to fix the other end sides of the frame elements 81a to 81d in the longitudinal direction. Here, the symbol LD in FIG. 5 indicates the longitudinal direction of the frame elements 81a to 81d, and the symbol SD indicates the sliding direction of the frame elements 81a to 81d. Here, a counterbore 821 is formed on the back surface of the support member 82 to receive the nut 13. The insertion hole 82h formed in the support member 82 is an inclined long hole extending in the sliding direction of the frame elements 81a to 81d. In addition, the countersunk hole 821 is also an inclined long hole extending in the sliding direction together with the insertion hole 82h.

在所述構成中,在將緊固螺栓11加以緊固的狀態下,即在緊固螺栓11的頭部111與螺母13之間夾著框架元件81a~框架元件81d及支撐構件82的狀態下,對框架元件81a~框架元件81d的長度方向另一端側進行固定。另一方面,在緊固螺栓11鬆開的狀態下,即,在緊固螺栓11的頭部111及螺母13未夾著框架元件81a~框架元件81d及支撐構件82的狀態下,插通至框架元件81a~框架元件81d的另一端側插通孔81h2中的緊固螺栓11可相對於支撐構件82在滑動方向上滑移。如上所述,利用緊固螺栓11以及另一端側插通孔81h2及鍃孔821構成滑動導軌機構9。即,另一端側插通孔81h2及鍃孔821成為設置於支撐構件82上的固定部,緊固螺栓11成為相對於所述固定部滑移的滑動部。In the above configuration, in a state where the fastening bolt 11 is tightened, that is, a state in which the frame element 81 a to the frame element 81 d and the support member 82 are sandwiched between the head 111 of the fastening bolt 11 and the nut 13. The other end sides of the frame elements 81a to 81d in the longitudinal direction are fixed. On the other hand, in a state where the fastening bolt 11 is loosened, that is, in a state where the head 111 and the nut 13 of the fastening bolt 11 do not sandwich the frame elements 81a to 81d and the support member 82, they are inserted into The fastening bolts 11 in the other end side insertion holes 81h2 of the frame elements 81 a to 81 d can be slid in the sliding direction with respect to the support member 82. As described above, the slide rail mechanism 9 is configured by the fastening bolt 11 and the other end side insertion hole 81h2 and the countersunk hole 821. That is, the other end side insertion hole 81h2 and the countersunk hole 821 are fixed portions provided on the support member 82, and the fastening bolts 11 are sliding portions that slide relative to the fixed portions.

此外,在本實施形態中,各框架元件81a~框架元件81d構成為對長度方向一端部進行固定,並且能夠以所述長度方向一端部為起點藉由熱膨脹而沿長度方向移動至長度方向另一端側。In addition, in this embodiment, each of the frame elements 81a to 81d is configured to fix one end portion in the longitudinal direction, and can move in the longitudinal direction to the other end in the longitudinal direction by thermal expansion using the one end portion in the longitudinal direction as a starting point. side.

具體而言,如圖3及圖5所示,各框架元件81a~框架元件81d的另一端側插通孔81h2設為沿長度方向的長孔。並且,在長度方向另一端側的固定機構10b的緊固螺栓11構成為在將框架元件81a~框架元件81d的長度方向另一端側加以固定的狀態下,在頭部111的下表面與框架元件81a~框架元件81d的上表面之間具有間隙S。再者,即使具有間隙S,由於長度方向一端側經緊固螺栓11緊固,故而在長度方向另一端側,亦以無法朝向與長度方向正交的方向移動的方式而固定。Specifically, as shown in FIGS. 3 and 5, the other end side insertion holes 81 h 2 of each of the frame elements 81 a to 81 d are long holes in the longitudinal direction. Further, the fastening bolts 11 of the fixing mechanism 10b on the other end side in the longitudinal direction are configured such that the lower surface of the head portion 111 and the frame element are fixed in a state where the other end sides in the longitudinal direction of the frame elements 81a to 81d are fixed. There is a gap S between the upper surfaces of 81a to 81d. Furthermore, even if there is a gap S, since one end side in the longitudinal direction is fastened by the fastening bolt 11, the other end side in the longitudinal direction is fixed so as not to be able to move in a direction orthogonal to the longitudinal direction.

詳細而言,如圖5所示,固定機構10b的緊固螺栓11是凸肩螺栓,在螺合於螺母13,在支撐構件82緊固於所述凸肩螺栓11的肩部112與螺母13之間的狀態下,即,在緊固螺栓11固定於支撐構件82的狀態下,在頭部111的下表面與框架元件81a~框架元件81d的上表面之間形成間隙S。Specifically, as shown in FIG. 5, the fastening bolt 11 of the fixing mechanism 10 b is a shoulder bolt, which is screwed to the nut 13 and is fastened to the shoulder 112 and the nut 13 of the shoulder bolt 11 by the support member 82. A gap S is formed between the lower surface of the head 111 and the upper surfaces of the frame elements 81 a to 81 d in a state between them, that is, in a state where the fastening bolt 11 is fixed to the support member 82.

藉由所述構成,即使在框架元件81a~框架元件81d因熱膨脹而在長度方向上延伸時,框架元件81a~框架元件81d的長孔即另一端側插通孔81h2亦可相對於緊固螺栓11在長度方向上相對移動。With this configuration, even when the frame elements 81a to 81d are extended in the longitudinal direction due to thermal expansion, the other end side insertion holes 81h2, which are long holes of the frame elements 81a to 81d, can be used as fastening bolts 11 Relative movement in the length direction.

其次,參照圖6(A)~圖6(C),對如上所述而構成的罩幕框架8的開口部8X的開口尺寸的調整進行說明。 圖6(A)是表示開口部8X的開口尺寸為最大的情況的圖。 在所述狀態下,在長度方向一端側的固定機構10a(滑動導軌機構9)上,緊固螺栓11位於框架元件81a~框架元件81d的插通孔81h1的最內側。並且,在長度方向另一端側的固定機構10b(滑動導軌機構9)中,緊固螺栓11及螺母13位於支撐構件82的插通孔81h2及鍃孔821的最外側。此外,各框架元件81a~框架元件81d的一端邊部813與鄰接的框架元件81a~框架元件81d的開口部側邊部811相接觸。Next, adjustment of the opening size of the opening portion 8X of the mask frame 8 configured as described above will be described with reference to FIGS. 6 (A) to 6 (C). FIG. 6A is a diagram showing a case where the opening size of the opening portion 8X is the largest. In this state, in the fixing mechanism 10 a (the slide rail mechanism 9) on one end side in the longitudinal direction, the fastening bolt 11 is located at the innermost side of the insertion hole 81 h 1 of the frame element 81 a to the frame element 81 d. Further, in the fixing mechanism 10 b (the slide rail mechanism 9) on the other end side in the longitudinal direction, the fastening bolts 11 and the nuts 13 are located at the outermost sides of the insertion holes 81 h 2 and the countersinks 821 of the support member 82. In addition, one end edge portion 813 of each of the frame elements 81a to 81d is in contact with the opening side edge portion 811 of the adjacent frame element 81a to 81d.

當自所述狀態使開口部8X的開口尺寸減小時,鬆開框架元件81a~框架元件81d的長度方向一端側及另一端側的緊固螺栓11。並且,使框架元件81a~框架元件81d沿滑動方向移動至內側。此時,各框架元件81a~框架元件81d維持著接觸的狀態而進行移動(圖6(B))。此處,當使1個框架元件(例如框架元件81a)滑移時,4個框架元件81a~框架元件81d的鄰接的端部彼此相接觸,故而剩下的3個框架元件(例如框架元件81b~框架元件81d)亦聯動地滑移。再者,亦可對2個以上的框架元件同時進行操作而使其滑移。When the opening size of the opening portion 8X is reduced from the state described above, the fastening bolts 11 at one end side and the other end side in the longitudinal direction of the frame elements 81a to 81d are loosened. Then, the frame elements 81a to 81d are moved to the inside in the sliding direction. At this time, each of the frame elements 81 a to 81 d is moved while maintaining the contact state (FIG. 6 (B)). Here, when one frame element (for example, frame element 81a) is slid, the adjacent end portions of the four frame elements 81a to 81d are in contact with each other, so the remaining three frame elements (for example, frame element 81b) ~ The frame element 81d) also slides in linkage. Furthermore, two or more frame elements may be operated simultaneously to cause them to slide.

以如上所述的方式使4個框架元件81a~框架元件81d移動,將位置調整至最佳位置,並對緊固螺栓11進行緊固而加以固定。As described above, the four frame elements 81a to 81d are moved, the positions are adjusted to the optimal positions, and the fastening bolts 11 are fastened and fixed.

再者,圖6(C)是表示開口部8X的開口尺寸為最小的情況的圖。 在所述狀態下,在長度方向一端側的固定機構10a(滑動導軌機構9)上,緊固螺栓11位於框架元件81a~框架元件81d的插通孔81h1的最外側。並且,在長度方向另一端側的固定機構10b(滑動導軌機構9)中,緊固螺栓11及螺母13位於支撐構件82的插通孔81h2及鍃孔821的最內側。此外,各框架元件81a~框架元件81d的一端邊部813與鄰接的框架元件81a~框架元件81d的開口部側邊部811相接觸。6 (C) is a diagram showing a case where the opening size of the opening portion 8X is the smallest. In this state, in the fixing mechanism 10 a (sliding rail mechanism 9) on one end side in the longitudinal direction, the fastening bolt 11 is located at the outermost side of the insertion hole 81 h 1 of the frame element 81 a to the frame element 81 d. Further, in the fixing mechanism 10 b (the slide rail mechanism 9) on the other end side in the longitudinal direction, the fastening bolt 11 and the nut 13 are located at the innermost side of the insertion hole 81 h 2 and the countersink 821 of the support member 82. In addition, one end edge portion 813 of each of the frame elements 81a to 81d is in contact with the opening side edge portion 811 of the adjacent frame element 81a to 81d.

其次,參照圖7(A)~圖7(C),對各框架元件81a~框架元件81d的熱膨脹吸收進行說明。 圖7(A)是表示未產生熱膨脹的狀態(例如成膜處理前)的圖。 在所述狀態下,長度方向另一端側的固定機構10b的緊固螺栓11位於框架元件81a~框架元件81d的插通孔81h2的長度方向另一端部。Next, the thermal expansion absorption of each of the frame elements 81a to 81d will be described with reference to FIGS. 7 (A) to 7 (C). FIG. 7 (A) is a diagram showing a state where thermal expansion does not occur (for example, before a film forming process). In this state, the fastening bolts 11 of the fixing mechanism 10b on the other end side in the longitudinal direction are located at the other end portions in the longitudinal direction of the insertion holes 81h2 of the frame elements 81a to 81d.

並且,若處理開始後框架元件81a~框架元件81d產生熱膨脹,則以框架元件81a~框架元件81d的長度方向一端側的固定機構10a(緊固箇所)為起點,框架元件81a~框架元件81d延伸至長度方向另一端側(圖7(B)及圖7(C))。於是,框架元件81a~框架元件81d的另一端側插通孔81h2相對於固定在支撐構件82上的緊固螺栓11而移動,以吸收其延伸量H。再者,由於如本實施形態般配置有各框架元件81a~框架元件81d,故而即使各框架元件81a~框架元件81d在長度方向上延伸,開口尺寸亦不會變化。 延伸量H的吸收限度取決於框架元件81a~框架元件81d的另一端側插通孔81h2的沿長度方向的長度(圖7(C)),因此需要基於預先設想的延伸量H,來確定另一端側插通孔81h2的長度。In addition, if the frame elements 81a to 81d undergo thermal expansion after the process is started, the frame elements 81a to 81d extend from the fixing mechanism 10a (fastening place) on one end side in the longitudinal direction of the frame elements 81a to 81d. To the other end side in the length direction (Fig. 7 (B) and Fig. 7 (C)). Then, the other end side insertion holes 81h2 of the frame elements 81a to 81d are moved relative to the fastening bolt 11 fixed to the support member 82 to absorb the extension amount H thereof. In addition, since the frame elements 81a to 81d are arranged as in this embodiment, even if each of the frame elements 81a to 81d extends in the longitudinal direction, the opening size does not change. The absorption limit of the extension amount H depends on the length in the longitudinal direction of the other end side insertion hole 81h2 of the frame element 81a to the frame element 81d (FIG. 7 (C)). The length of one end side insertion hole 81h2.

<本實施形態的效果> 根據如上所述而構成的真空處理裝置100,各框架元件81a~框架元件81d的一端邊部813與鄰接的框架元件81a~框架元件81d的開口部側邊部811是相對向而配置,因此即使變更開口尺寸,亦可維持各框架元件81a~框架元件81d的一端邊部813與鄰接的框架元件81a~框架元件81d的開口部側邊部811的接觸關係。因此,可設為如下構成:無需在相互鄰接的框架元件81a~框架元件81d上設置用以填埋間隙的特別構件,即使變更開口尺寸,亦不會在各框架元件81a~框架元件81d之間於俯視時產生間隙。<Effects of the Present Embodiment> According to the vacuum processing apparatus 100 configured as described above, one end portion 813 of each of the frame elements 81a to 81d and the opening side edge portion 811 of the adjacent frame elements 81a to 81d are They are arranged facing each other, so that even if the opening size is changed, the contact relationship between one end edge portion 813 of each of the frame elements 81a to 81d and the adjacent opening element side edge portion 811 of the frame element 81a to 81d can be maintained. Therefore, it is possible to adopt a configuration in which a special member for filling a gap does not need to be provided on the adjacent frame elements 81a to 81d, and even if the opening size is changed, it will not be between the frame elements 81a to 81d. A gap is generated when looking down.

在各框架元件81a~框架元件81d與支撐構件82之間設置有滑動導軌機構9,故而可容易地使各框架元件81a~框架元件81d滑移。並且,當使1個框架元件81a移動時,可使其他框架元件81b~框架元件81d與所述移動聯動地移動,從而可容易地變更開口尺寸。此處,滑動導軌機構9設置於長度方向上的兩個部位,故而容易保持著框架元件81a~框架元件81d的姿勢進行滑移,當使多個框架元件81a~框架元件81d聯動地移動時,可使該些框架元件穩定地移動。Since the slide rail mechanism 9 is provided between each of the frame elements 81a to 81d and the support member 82, each of the frame elements 81a to 81d can be easily slid. In addition, when one frame element 81a is moved, the other frame elements 81b to 81d can be moved in conjunction with the movement, and the opening size can be easily changed. Here, since the slide rail mechanism 9 is provided at two locations in the longitudinal direction, it is easy to slide while maintaining the posture of the frame elements 81a to 81d. When a plurality of frame elements 81a to 81d are moved in conjunction with each other, These frame elements can be stably moved.

相互鄰接的框架元件81a~框架元件81d中的滑動方向相對於各自的長度方向的傾斜角度的和為90度,故而可在使各框架元件81b~框架元件81d的一端邊部813與鄰接的框架元件81b~框架元件81d的開口部側邊部811相接觸的狀態下,變更開口尺寸。此處,滑動方向為45度,可在開口尺寸的變更前後維持開口形狀的縱橫比。The sum of the inclination angles of the sliding directions of the adjacent frame elements 81a to 81d with respect to the respective longitudinal directions is 90 degrees. Therefore, one end portion 813 of each of the frame elements 81b to 81d and the adjacent frame can be made In the state where the opening portion side portion 811 of the element 81b to the frame element 81d is in contact, the opening size is changed. Here, the sliding direction is 45 degrees, and the aspect ratio of the opening shape can be maintained before and after the opening size is changed.

並且,在本實施形態中,固定機構10a、固定機構10b的緊固螺栓11兼作滑動導軌機構9,故而可簡化罩幕框架8的構成。並且,只要在調整開口尺寸後使緊固螺栓11緊固即可,從而可容易地進行自開口尺寸的調整至框架元件81a~框架元件81d的固定為止的操作。Further, in this embodiment, since the fastening bolts 11 of the fixing mechanism 10a and the fixing mechanism 10b also serve as the slide rail mechanism 9, the structure of the curtain frame 8 can be simplified. In addition, as long as the fastening bolt 11 is tightened after adjusting the opening size, operations from adjustment of the opening size to fixing of the frame elements 81a to 81d can be easily performed.

此外,各框架元件81a~框架元件81d構成為對長度方向一端部進行固定,並且能夠以所述長度方向一端部為起點藉由熱膨脹而沿長度方向移動至長度方向另一端側,故而可消除框架元件81a~框架元件81d因熱膨脹而產生的撓曲所引起的處理的不均勻,從而可提高處理的均勻性。In addition, each of the frame elements 81a to 81d is configured to fix one end portion in the longitudinal direction and can move from the one end portion in the longitudinal direction to the other end side in the longitudinal direction by thermal expansion, thereby eliminating the frame. The non-uniformity of the processing due to the deflection due to the thermal expansion of the elements 81a to 81d can improve the uniformity of the processing.

再者,本發明並不限於所述實施形態。 例如,在所述實施形態中,各框架元件81a~框架元件81d的與長度方向正交的剖面呈矩形,但亦可如圖8及圖9所示,框架元件81a~框架元件81d的開口部側邊部811的上表面包含朝向開口部8X側具有向下傾斜的第1傾斜面811x,且框架元件81a~框架元件81d的一端邊部813包含與第1傾斜面811x相對應的第2傾斜面813x。The present invention is not limited to the embodiments described above. For example, in the embodiment described above, each of the frame elements 81a to 81d has a rectangular cross section orthogonal to the longitudinal direction. However, as shown in FIGS. 8 and 9, the openings of the frame elements 81a to 81d may be formed. The upper surface of the side portion 811 includes a first inclined surface 811x having a downward slope toward the opening 8X side, and one end portion 813 of the frame elements 81a to 81d includes a second inclination corresponding to the first inclined surface 811x. Face 813x.

並且,在所述實施形態中,一端邊部813的側面是與上表面垂直的平面,開口部側邊部811的側面亦是與上表面垂直的平面,但只要是一端邊部813於俯視時與開口部側邊部811無間隙地接觸的構成,則亦可為例如經彎曲的面或屈曲的面。Furthermore, in the above-mentioned embodiment, the side surface of the one end side portion 813 is a plane perpendicular to the upper surface, and the side surface of the opening side side portion 811 is also a plane perpendicular to the upper surface. The configuration that is in contact with the opening side portion 811 without a gap may be, for example, a curved surface or a curved surface.

此外,在所述實施形態中,各框架元件81a~框架元件81d呈相同形狀,但只要包含直線狀的開口側邊部811及與所述開口部側邊部相對向的直線狀的一端邊部813,剩下的兩邊即不限於直線形狀。In addition, in the above-mentioned embodiment, each of the frame elements 81a to 81d has the same shape, but as long as it includes a linear opening side edge portion 811 and a linear end edge portion facing the opening side edge portion. 813, the remaining two sides are not limited to straight lines.

在所述實施形態中,罩幕框架於俯視時呈正方形,但亦可如圖10所示,呈長方形。In the above embodiment, the mask frame is square in plan view, but may be rectangular as shown in FIG. 10.

在所述實施形態中,所有框架元件的滑動方向上的傾斜角度均為45度,但亦可如圖11所示,在相互鄰接的框架元件中,其中一個框架元件的滑動方向SD上的傾斜角度θ1設為60度,另一個框架元件的滑動方向SD上的傾斜角度θ2設為30度。如上所述,只要滿足θ1+θ2=90度的關係,則θ1、θ2的具體的角度並不限於所述實施形態。In the embodiment described above, the inclination angle in the sliding direction of all the frame elements is 45 degrees, but as shown in FIG. 11, in the adjacent frame elements, the inclination in the sliding direction SD of one of the frame elements is also possible. The angle θ1 is set to 60 degrees, and the inclination angle θ2 in the sliding direction SD of the other frame element is set to 30 degrees. As described above, as long as the relationship of θ1 + θ2 = 90 degrees is satisfied, the specific angles of θ1 and θ2 are not limited to the embodiment described above.

此外,在所述實施形態中,是固定機構10a、固定機構10b兼作滑動導軌機構9的構成,但亦可將該些機構分別設置。此時,滑動導軌機構9包括設置於框架元件或支撐構件中的一者上的固定部、以及設置於所述框架元件或所述支撐構件中的另一者上且相對於所述固定部沿滑動方向滑動的滑動部。Moreover, in the said embodiment, although the fixed mechanism 10a and the fixed mechanism 10b also doubled as the slide rail mechanism 9, you may provide these mechanisms separately. At this time, the slide rail mechanism 9 includes a fixing portion provided on one of the frame member or the supporting member, and a fixing portion provided on the other of the frame member or the supporting member and along the fixing member. A sliding portion that slides in the sliding direction.

而且,所述實施形態的固定機構在長度方向一端側與長度方向另一端側具有不同的構成,但亦可將兩者設為相同的構成。In addition, the fixing mechanism of the embodiment has a different configuration on one end side in the longitudinal direction and on the other end side in the longitudinal direction, but they may have the same configuration.

進而,所述實施形態的固定機構是使用緊固螺栓,但亦可使用具有貫通框架元件及支撐構件而設置的軸部及頭部的銷、以及嵌合於所述銷的軸部且與所述頭部之間夾著框架元件及支撐構件的止動環。此外,固定機構亦可使用一體地夾入框架元件及支撐構件而固定的夾緊(clamp)構件。Furthermore, although the fixing mechanism of the above embodiment uses fastening bolts, a pin having a shaft portion and a head portion provided to penetrate the frame element and the supporting member, and a shaft portion fitted to the pin and connected to the shaft portion may be used. The stop ring is sandwiched between the head and the frame member and the support member. In addition, the fixing mechanism may use a clamp member that is fixed by sandwiching the frame element and the support member integrally.

在所述實施形態中,作為真空處理裝置舉出濺射裝置為例進行了說明,此外,亦可應用於化學氣相沈積(chemical vapor deposition,CVD)裝置等使用電漿的真空處理裝置等之中。In the above-mentioned embodiment, a sputtering device has been described as an example of a vacuum processing device. In addition, it can also be applied to a vacuum processing device using a plasma, such as a chemical vapor deposition (CVD) device. in.

此外,本發明當然並不限於所述實施形態,在不脫離其主旨的範圍內可進行各種變形。It is needless to say that the present invention is not limited to the above-mentioned embodiment, and various modifications can be made without departing from the spirit thereof.

2‧‧‧處理容器
3‧‧‧濺射電極
4‧‧‧靶材
5‧‧‧基板支撐部
6‧‧‧電源部
7‧‧‧密封構件
8‧‧‧罩幕框架
8X‧‧‧開口部
9‧‧‧滑動導軌機構
10a、10b‧‧‧固定機構
11‧‧‧緊固構件
12‧‧‧內螺孔
13‧‧‧螺母
21‧‧‧氣體導入部
22‧‧‧排氣部
51‧‧‧支撐銷
52‧‧‧驅動部
81a~81d‧‧‧框架元件
81h1、81h2、82h‧‧‧插通孔
82‧‧‧支撐構件
100‧‧‧真空處理裝置
111‧‧‧頭部
112‧‧‧肩部
811、812‧‧‧開口部側邊部
811x‧‧‧第1傾斜面
813、814‧‧‧長度方向一端側的端邊部
813x‧‧‧第2傾斜面
821‧‧‧鍃孔
H‧‧‧延伸量
LD‧‧‧框架元件81a~框架元件81d的長度方向
G、S‧‧‧間隙
SD‧‧‧滑動方向
W‧‧‧基板
X1~X4‧‧‧框架元件
θ1、θ2‧‧‧傾斜角度
2‧‧‧handling container
3‧‧‧Sputtering electrode
4‧‧‧ target
5‧‧‧ substrate support
6‧‧‧Power Supply Department
7‧‧‧sealing member
8‧‧‧ curtain frame
8X‧‧‧ opening
9‧‧‧ sliding guide mechanism
10a, 10b‧‧‧Fixed institutions
11‧‧‧ Fastening member
12‧‧‧internal screw hole
13‧‧‧ Nut
21‧‧‧Gas introduction department
22‧‧‧Exhaust
51‧‧‧ support pin
52‧‧‧Driver
81a ~ 81d‧‧‧‧Frame element
81h1, 81h2, 82h‧‧‧Plug-in holes
82‧‧‧ support member
100‧‧‧Vacuum processing equipment
111‧‧‧ head
112‧‧‧Shoulder
811, 812‧‧‧‧ opening side
811x‧‧‧1st inclined surface
813, 814‧‧‧‧Ends on one end side in the longitudinal direction
813x‧‧‧ 2nd inclined surface
821‧‧‧ 鍃 hole
H‧‧‧Extension
LD‧‧‧Frame elements 81a to 81d
G, S‧‧‧ Clearance
SD‧‧‧ Sliding direction
W‧‧‧ substrate
X1 ~ X4‧‧‧Frame elements θ1, θ2‧‧‧ inclination angle

圖1是示意性地表示本實施形態的真空處理裝置的構成的剖面圖。 圖2是所述實施形態的罩幕框架的俯視圖。 圖3是所述實施形態的罩幕框架的分解部分立體圖。 圖4是表示所述實施形態的長度方向一端側的固定機構的剖面圖及俯視圖。 圖5是表示所述實施形態的長度方向另一端側的固定機構的剖面圖、俯視圖及底視圖。 圖6(A)~圖6(C)是表示調整所述實施形態的開口部的開口尺寸時的各框架元件的動作的圖。 圖7(A)~圖7(C)是表示所述實施形態的熱膨脹吸收時的各框架元件的動作的圖。 圖8是示意性地表示變形實施形態的真空處理裝置的構成的剖面圖。 圖9是變形實施形態的罩幕框架的局部立體圖及剖面圖。 圖10是變形實施形態的罩幕框架的俯視圖。 圖11是表示變形實施形態的鄰接的框架元件的端部的俯視圖。 圖12是現有的罩幕框架的俯視圖。FIG. 1 is a cross-sectional view schematically showing the configuration of a vacuum processing apparatus according to this embodiment. Fig. 2 is a plan view of a mask frame according to the embodiment. Fig. 3 is an exploded perspective view of a mask frame according to the embodiment. 4 is a cross-sectional view and a plan view showing a fixing mechanism on one end side in the longitudinal direction of the embodiment. 5 is a cross-sectional view, a plan view, and a bottom view showing a fixing mechanism on the other end side in the longitudinal direction of the embodiment. 6 (A) to 6 (C) are diagrams showing the operation of each frame element when the opening size of the opening portion of the embodiment is adjusted. 7 (A) to 7 (C) are diagrams showing the operation of each frame element when the thermal expansion is absorbed in the embodiment. 8 is a cross-sectional view schematically showing a configuration of a vacuum processing apparatus according to a modified embodiment. 9 is a partial perspective view and a cross-sectional view of a mask frame according to a modified embodiment. 10 is a plan view of a mask frame according to a modified embodiment. 11 is a plan view showing an end portion of an adjacent frame element according to a modified embodiment. FIG. 12 is a plan view of a conventional mask frame.

8‧‧‧罩幕框架 8‧‧‧ curtain frame

8X‧‧‧開口部 8X‧‧‧ opening

9‧‧‧滑動導軌機構 9‧‧‧ sliding guide mechanism

10a、10b‧‧‧固定機構 10a, 10b‧‧‧Fixed institutions

81a~81d‧‧‧框架元件 81a ~ 81d‧‧‧Frame Element

82‧‧‧支撐構件 82‧‧‧ support member

811、812‧‧‧開口部側邊部 811, 812‧‧‧‧ opening side

813、814‧‧‧長度方向一端側的端邊部 813, 814‧‧‧‧Ends on one end side in the longitudinal direction

Claims (9)

一種罩幕框架,具有矩形的開口部,且 包括:4個框架元件,具有與所述開口部的四邊分別相對應的長度方向;且 所述各框架元件中的所述長度方向一端側的端邊部及與所述端邊部鄰接的所述框架元件中的沿所述長度方向的所述開口部側邊部是相對向而配置, 所述4個框架元件是於俯視時相對於各自的所述長度方向傾斜的各自的滑動方向上可滑移地設置, 藉由使所述4個框架元件滑移而可變更所述開口部的開口尺寸而構成罩幕框架。A curtain frame has a rectangular opening portion and includes: 4 frame elements having length directions corresponding to four sides of the opening portion; and an end on one end side of the length direction in each frame element. Among the side portions and the frame elements adjacent to the end side portions, the side portions of the openings in the longitudinal direction are opposite to each other, and the four frame elements are opposed to each other in a plan view. The lengthwise slanting direction is slidably provided in each of the sliding directions, and the four frame elements can be slid to change the opening size of the opening portion to form a mask frame. 如申請專利範圍第1項所述的罩幕框架,其中所述4個框架元件是於俯視時相對於各自的所述長度方向傾斜45度的滑動方向上可滑移地設置。The mask frame according to item 1 of the scope of patent application, wherein the four frame elements are slidably disposed in a sliding direction inclined by 45 degrees with respect to the respective length direction in a plan view. 如申請專利範圍第1項或第2項所述的罩幕框架,其中 包括:支撐構件,對所述框架元件進行支撐;且 在所述框架元件與所述支撐構件之間設置有可使所述框架元件滑移的滑動導軌機構。The mask frame according to item 1 or item 2 of the scope of patent application, which includes: a supporting member for supporting the frame element; and a space between the frame element and the supporting member is provided. The sliding guide mechanism for sliding the frame element is described. 如申請專利範圍第3項所述的罩幕框架,其中所述滑動導軌機構分別設置於所述框架元件的所述長度方向一端側及所述長度方向另一端側。The mask frame according to item 3 of the patent application scope, wherein the slide rail mechanism is provided on one end side in the length direction and the other end side in the length direction of the frame element, respectively. 如申請專利範圍第3項或第4項所述的罩幕框架,其中 所述框架元件藉由緊固構件而固定於所述支撐構件上, 插通所述緊固構件的所述框架元件的插通孔或所述支撐構件的插通孔中的任一者是沿所述滑動方向的傾斜長孔, 利用所述緊固構件及設為所述傾斜長孔的所述插通孔構成所述滑動導軌機構。The mask frame according to item 3 or 4 of the scope of patent application, wherein the frame member is fixed to the support member by a fastening member, and the frame member is inserted through the frame member of the fastening member. Either the insertion hole or the insertion hole of the support member is an inclined long hole in the sliding direction, and the fastening member and the insertion hole provided as the inclined long hole constitute an The sliding guide mechanism is described. 如申請專利範圍第1項至第5項中任一項所述的罩幕框架,其中 所述框架元件的所述開口部側邊部的上表面包含朝向所述開口部側具有向下傾斜的第1傾斜面, 所述框架元件的所述端邊部包含與所述第1傾斜面相對應的第2傾斜面。The mask frame according to any one of claims 1 to 5, wherein an upper surface of the opening portion side edge portion of the frame element includes a surface having a downward slope toward the opening portion side. The first inclined surface, the end edge portion of the frame element includes a second inclined surface corresponding to the first inclined surface. 如申請專利範圍第1項至第6項中任一項所述的罩幕框架,其中所述框架元件是以對所述長度方向一端部進行固定,並且能夠以所述長度方向一端部為起點藉由熱膨脹而沿所述長度方向移動至所述長度方向另一端側的方式而構成。The mask frame according to any one of claims 1 to 6, wherein the frame element fixes the one end portion in the longitudinal direction and can start from the one end portion in the longitudinal direction. It is configured by thermal expansion to move in the longitudinal direction to the other end side in the longitudinal direction. 如申請專利範圍第7項所述的罩幕框架,其中 在所述框架元件的所述長度方向另一端側形成有可插通緊固構件的插通孔, 所述緊固構件具有頭部, 所述插通孔是沿所述長度方向的長孔, 所述緊固構件是在所述頭部與所述框架元件的上表面之間空開間隙而固定所述長度方向另一端側。The mask frame according to item 7 of the scope of patent application, wherein an insertion hole through which a fastening member can be inserted is formed at the other end side of the frame member in the length direction, the fastening member has a head portion, The insertion hole is a long hole along the length direction, and the fastening member is provided with a gap between the head and the upper surface of the frame member to fix the other end side in the length direction. 一種真空處理裝置,包括如申請專利範圍第1項至第8項中任一項所述的罩幕框架。A vacuum processing device includes a mask frame according to any one of claims 1 to 8 of the scope of patent application.
TW106109119A 2016-03-25 2017-03-20 Cover frame and vacuum processing device TWI626324B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-062580 2016-03-25
JP2016062580A JP6876244B2 (en) 2016-03-25 2016-03-25 Mask frame and vacuum processing equipment

Publications (2)

Publication Number Publication Date
TW201800592A true TW201800592A (en) 2018-01-01
TWI626324B TWI626324B (en) 2018-06-11

Family

ID=59900142

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106109119A TWI626324B (en) 2016-03-25 2017-03-20 Cover frame and vacuum processing device

Country Status (4)

Country Link
JP (1) JP6876244B2 (en)
CN (1) CN109072403B (en)
TW (1) TWI626324B (en)
WO (1) WO2017163878A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6298110B2 (en) * 2016-07-08 2018-03-20 キヤノントッキ株式会社 Mask support, film forming apparatus and film forming method
CN107675128B (en) * 2017-11-17 2023-10-27 京东方科技集团股份有限公司 mask frame
JP7012157B2 (en) * 2018-06-20 2022-01-27 株式会社アルバック Adhesive members and vacuum processing equipment
JP7246148B2 (en) * 2018-06-26 2023-03-27 東京エレクトロン株式会社 sputtering equipment
US11414747B2 (en) 2018-06-26 2022-08-16 Tokyo Electron Limited Sputtering device
KR102515305B1 (en) * 2022-05-18 2023-03-29 에스케이엔펄스 주식회사 Shadow mask and manufacturing method of blankmask applied thereby

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3086095B2 (en) * 1992-12-22 2000-09-11 キヤノン株式会社 Sputtering equipment
JPH1060624A (en) * 1996-08-20 1998-03-03 Matsushita Electric Ind Co Ltd Sputtering device
JP2004079804A (en) * 2002-08-19 2004-03-11 Seiko Epson Corp Aligner, its controlling method, and semiconductor device
JP2004079803A (en) * 2002-08-19 2004-03-11 Seiko Epson Corp Exposure system and semiconductor device
JP2008088509A (en) * 2006-10-03 2008-04-17 Seiko Epson Corp Film deposition apparatus and film deposition method using the same
KR101282554B1 (en) * 2010-07-20 2013-07-04 도쿄엘렉트론가부시키가이샤 Shield member, components thereof and substrate mounting table comprising shield member
EP2423350B1 (en) * 2010-08-27 2013-07-31 Applied Materials, Inc. Carrier for a substrate and a method for assembling the same
EP2742166A1 (en) * 2011-08-09 2014-06-18 Applied Materials, Inc. Adjustable mask
CN103668051A (en) * 2012-09-07 2014-03-26 昆山允升吉光电科技有限公司 Mask frame and corresponding mask component thereof for vapor deposition

Also Published As

Publication number Publication date
TWI626324B (en) 2018-06-11
CN109072403B (en) 2021-04-20
JP6876244B2 (en) 2021-05-26
CN109072403A (en) 2018-12-21
WO2017163878A1 (en) 2017-09-28
JP2017172028A (en) 2017-09-28

Similar Documents

Publication Publication Date Title
TW201800592A (en) Mask frame and vacuum processing device
KR100964224B1 (en) Evaporating apparatus and method for forming thin film
JP5197663B2 (en) Vapor deposition equipment
US9187827B2 (en) Substrate support with ceramic insulation
JP4281692B2 (en) Plasma processing equipment
JP5956564B2 (en) Flip edge shadow frame
US20150228461A1 (en) Plasma treatment apparatus and method
KR20150077347A (en) Substrate processing apparatus, shutter device and plasma processing apparatus
US10676817B2 (en) Flip edge shadow frame
JP6600990B2 (en) Plasma processing equipment
KR20180106896A (en) Collimator and processing device
JP5969856B2 (en) Sputtering equipment
JP6416261B2 (en) Substrate processing apparatus and substrate processing method
KR20150137103A (en) Sputtering device
WO2021182638A1 (en) Sputtering device
JP6967745B2 (en) Board processing equipment
CN109642309B (en) High-precision shadow mask deposition system and method
TWI505397B (en) Chamber and processing device
KR100911747B1 (en) Apparatus for processing substrate
JP2005302697A (en) Electrode structure of plasma treating apparatus
KR102402497B1 (en) Shadow frame with sides with varying profiles for improved deposition uniformity
JP4664063B2 (en) Plasma processing equipment
JP7450159B2 (en) Substrate processing equipment
KR102584725B1 (en) laser processing apparatus
JP2007311417A (en) Apparatus and method for manufacturing thin film