TWI626324B - Cover frame and vacuum processing device - Google Patents

Cover frame and vacuum processing device Download PDF

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Publication number
TWI626324B
TWI626324B TW106109119A TW106109119A TWI626324B TW I626324 B TWI626324 B TW I626324B TW 106109119 A TW106109119 A TW 106109119A TW 106109119 A TW106109119 A TW 106109119A TW I626324 B TWI626324 B TW I626324B
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Taiwan
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frame
longitudinal direction
frame member
end side
opening
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TW106109119A
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Chinese (zh)
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TW201800592A (en
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Dongwei Li
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Nissin Electric Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

本發明為罩幕框架及真空處理裝置。罩幕框架包括:具有與開口部的四邊分別相對應的長度方向的4個框架元件,各框架元件中的長度方向一端側的端邊部及與所述端邊部鄰接的框架元件中的沿長度方向的開口部側邊部是於俯視時不空開間隙地相對向而配置,4個框架元件是於俯視時相對於各自的長度方向傾斜的各自的滑動方向上可滑移地設置,藉由使所述4個框架元件滑移而可變更所述開口部的開口尺寸地構成。 The invention is a mask frame and a vacuum processing device. The mask frame includes four frame members having a longitudinal direction corresponding to each of four sides of the opening portion, and an end portion of one end side of each of the frame members in the longitudinal direction and an edge of the frame member adjacent to the end portion The side portions of the opening portion in the longitudinal direction are disposed so as not to face each other in a plan view, and the four frame members are slidably disposed in the respective sliding directions inclined with respect to the respective longitudinal directions in a plan view. The opening size of the opening portion can be changed by sliding the four frame members.

Description

罩幕框架及真空處理裝置 Cover frame and vacuum processing device

本發明是有關於一種控制對基板的處理範圍的罩幕框架及使用所述罩幕框架的真空處理裝置。 The present invention relates to a mask frame for controlling a processing range of a substrate and a vacuum processing apparatus using the mask frame.

作為此種真空處理裝置,如專利文獻1所示,有包括掩蓋基板的周緣部而對基板上的成膜範圍進行控制的罩幕體、以及對所述罩幕體進行固定的罩幕體安裝板的真空處理裝置。 As such a vacuum processing apparatus, as disclosed in Patent Document 1, there is provided a mask body that covers a peripheral portion of a substrate and controls a film formation range on the substrate, and a mask body that fixes the mask body. Plate vacuum processing unit.

所述罩幕體如圖12所示,包括與開口部的各邊相對應地分割而成的帶狀的4個框架元件(罩幕主體)X1~框架元件(罩幕主體)X4。具體而言,罩幕體包括相互對向的2個框架元件X1、框架元件X2(圖12中為左右的框架元件),以及與該些框架元件X1、框架元件X2正交地配置且相互對向的2個框架元件X3、框架元件X4(圖12中為上下的框架元件)。並且,相互對向的左右的框架元件X1、框架元件X2的兩端部分別與相互對向的上下的框架元件X3、框架元件X4對頂地配置。 As shown in FIG. 12, the cover body includes four strip-shaped frame members (cover main body) X1 to frame member (cover main body) X4 which are divided in accordance with each side of the opening. Specifically, the mask body includes two frame members X1 and a frame member X2 (left and right frame members in FIG. 12) facing each other, and is disposed orthogonally to the frame members X1 and X2, and is opposed to each other. Two frame elements X3 and frame elements X4 (upper and lower frame elements in Fig. 12). Further, the left and right frame members X1 and the frame members X2 are opposed to each other, and the upper and lower frame members X3 and X4 are opposed to each other.

而且,各框架元件X1~框架元件X4是在可單獨變更位置的安裝狀態下固定在罩幕體安裝板上。具體而言,框架元件構成為可藉由設置於罩幕體安裝板上的調整螺釘,而在與框架元件的長度方向正交的方向上進行位置變更。 Further, each of the frame members X1 to X4 is fixed to the cover body mounting plate in a mounted state in which the position can be individually changed. Specifically, the frame member is configured to be positionally changeable in a direction orthogonal to the longitudinal direction of the frame member by an adjusting screw provided on the cover body mounting plate.

[現有技術文獻] [Prior Art Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本專利特開平10-60624號公報 [Patent Document 1] Japanese Patent Laid-Open No. Hei 10-60624

在所述罩幕體中,4個框架元件X1~框架元件X4是在與各自的長度方向正交的方向上移動,故而在變更開口尺寸後(變更成膜區域後),會在各框架元件的端部之間產生間隙G。於是,存在成膜後的基板的四角的膜變得不均勻的問題。 In the cover body, the four frame elements X1 to X4 move in a direction orthogonal to the respective longitudinal directions. Therefore, after the opening size is changed (after changing the film formation area), each frame element is A gap G is created between the ends of the ends. Then, there is a problem that the film at the four corners of the substrate after the film formation becomes uneven.

並且,在所述專利文獻1中,構成為在其中一個框架元件的端部設置有防護板,在另一個框架元件的端部設置有可收容所述防護板的導引用段部,以填埋所述間隙G。 Further, in Patent Document 1, a shield is provided at one end of one of the frame members, and a guide portion for accommodating the shield is provided at an end of the other frame member for landfill The gap G.

然而,即使是所述構成,由於在框架元件的角部上表面形成有凹部,故而亦存在成膜後的基板的四角的膜變得不均勻的問題。 However, even in the above configuration, since the concave portion is formed on the upper surface of the corner portion of the frame member, there is a problem that the film at the four corners of the substrate after the film formation becomes uneven.

因此,本發明是為了解決所述問題而完成的,其主要課題在於設為以下構成:無需在各框架元件的端部設置用以填埋間隙的特別構件,即使變更開口尺寸亦不會在各框架元件間產生間隙,從而提高基板處理的均勻性。 Therefore, the present invention has been made to solve the above problems, and a main object of the present invention is to provide a configuration in which it is not necessary to provide a special member for filling a gap at an end portion of each frame member, and it is not necessary to change the size of the opening. A gap is created between the frame members to improve the uniformity of substrate processing.

即,本發明的罩幕框架是具有矩形的開口部的罩幕框架,其特徵在於包括:4個框架元件,具有與所述開口部的四邊分別相對應的長度方向;且所述各框架元件的長度方向一端側的端邊部及與所述端邊部鄰接的框架元件的沿長度方向的開口部側邊部是相對向而配 置,所述4個框架元件是於俯視時相對於各自的長度方向傾斜的各自的滑動方向上可滑移地設置,藉由使所述4個框架元件滑移而可變更所述開口部的開口尺寸而構成罩幕框架。 That is, the mask frame of the present invention is a mask frame having a rectangular opening portion, comprising: four frame members having respective length directions corresponding to four sides of the opening portion; and the frame members The end portion on one end side in the longitudinal direction and the side portion on the opening side in the longitudinal direction of the frame member adjacent to the end portion are opposed to each other The four frame elements are slidably disposed in respective sliding directions inclined with respect to respective longitudinal directions in a plan view, and the openings of the openings can be changed by sliding the four frame members. The size of the opening constitutes a mask frame.

若為如上所述的罩幕框架,則各框架元件的長度方向一端側的端邊部及與所述端邊部鄰接的框架元件的沿長度方向的開口部側邊部是相對向而配置,因此即使變更開口尺寸,亦可維持各框架元件的長度方向一端側的端邊部與鄰接於所述端邊部的框架元件的沿長度方向的開口部側邊部的位置關係。因此,可設為如下構成:無需在相互鄰接的框架元件上設置用以填埋間隙的特別構件,即使變更開口尺寸,亦不會在各框架元件之間於俯視時產生間隙。具體而言,可一面維持各框架元件的長度方向一端側的端邊部及與所述端邊部鄰接的框架元件的沿長度方向的開口部側邊部相接觸或接近的狀態,一面變更開口尺寸。 In the mask frame as described above, the end side portion on the one end side in the longitudinal direction of each frame member and the side portion on the opening side in the longitudinal direction of the frame member adjacent to the end side portion are opposed to each other. Therefore, even if the opening size is changed, the positional relationship between the end side portion on the one end side in the longitudinal direction of each frame member and the side portion of the opening portion in the longitudinal direction of the frame member adjacent to the end side portion can be maintained. Therefore, it is possible to provide a configuration in which a special member for filling a gap is not provided in the frame members adjacent to each other, and even if the size of the opening is changed, a gap is not formed between the frame members in plan view. Specifically, the opening can be changed while maintaining the end side portion on the one end side in the longitudinal direction of each frame element and the side portion of the opening portion in the longitudinal direction of the frame member adjacent to the end side portion. size.

更詳細而言,理想的是在相互鄰接的框架元件中,以其中一個框架元件的滑動方向上的傾斜角度與另一個框架元件的滑動方向上的傾斜角度的和為90度的方式而設定。 More specifically, it is preferable that the frame members adjacent to each other are set such that the sum of the inclination angle in the sliding direction of one of the frame members and the inclination angle in the sliding direction of the other frame member is 90 degrees.

若為所述構成,則可不改變各框架元件的長度方向一端側的端邊部與鄰接於所述端邊部的框架元件的沿長度方向的開口部側邊部的位置關係,藉由使4個框架元件滑移而變更開口尺寸。 According to this configuration, the positional relationship between the end side portion on the one end side in the longitudinal direction of each frame member and the side portion of the opening portion in the longitudinal direction of the frame member adjacent to the end side portion can be changed. The frame elements are slipped to change the opening size.

理想的是所述4個框架元件是於俯視時相對於各自的長度方向傾斜45度的方向上可滑移地設置。 It is desirable that the four frame members are slidably disposed in a direction inclined by 45 degrees with respect to the respective longitudinal directions in a plan view.

若為所述構成,則可在開口尺寸的變更前後維持開口形狀的縱橫 比。 According to this configuration, the aspect of the opening shape can be maintained before and after the change in the opening size. ratio.

理想的是包括對所述4個框架元件進行支撐的支撐構件,且在所述框架元件與所述支撐構件之間設置有可使所述框架元件滑移的滑動導軌機構。 It is desirable to include a support member that supports the four frame members, and a slide rail mechanism that allows the frame member to slip is disposed between the frame member and the support member.

若為所述構成,則可容易地使各框架元件滑移。並且,在各框架元件的長度方向一端側的端邊部及與所述端邊部鄰接的框架元件的沿長度方向的開口部側邊部相接觸的構成的情況下,若使1個框架元件移動,則可使其他框架元件與所述移動聯動地移動,從而可容易地進行開口尺寸的變更。 According to this configuration, each frame member can be easily slipped. Further, when the end side portion on one end side in the longitudinal direction of each frame element and the side portion of the opening portion adjacent to the end side portion in the longitudinal direction are in contact with each other, one frame member is used. When moving, the other frame members can be moved in conjunction with the movement, so that the change in the opening size can be easily performed.

理想的是所述滑動導軌機構分別設置於所述框架元件的長度方向一端側及長度方向另一端側。 It is preferable that the slide rail mechanisms are respectively provided at one end side in the longitudinal direction and the other end side in the longitudinal direction of the frame member.

若為所述構成,則滑動導軌機構分別設置於框架元件的長度方向一端側及另一端側,故而容易保持著框架元件的姿勢進行滑移。所述構成中,框架元件越長,所述效果越顯著。並且,當使多個框架元件聯動地移動時,可使該些框架元件穩定地移動。 According to this configuration, since the slide rail mechanisms are respectively provided at one end side and the other end side in the longitudinal direction of the frame member, it is easy to maintain the posture of the frame member and to slip. In the above configuration, the longer the frame member, the more remarkable the effect. Further, when a plurality of frame members are moved in conjunction, the frame members can be stably moved.

理想的是所述框架元件藉由緊固構件而固定於所述支撐構件上,插通所述緊固構件的所述框架元件的插通孔或所述支撐構件的插通孔中的任一者是沿所述滑動方向上的傾斜長孔,利用所述緊固構件及設為所述傾斜長孔的插通孔來構成所述滑動導軌機構。 It is desirable that the frame member is fixed to the support member by a fastening member, and any one of an insertion hole of the frame member of the fastening member or an insertion hole of the support member is inserted. The inclined long hole is formed in the sliding direction, and the sliding rail mechanism is configured by the fastening member and the insertion hole provided as the inclined elongated hole.

若為所述構成,則緊固構件兼作滑動導軌機構,從而可簡化罩幕框架的構成。並且,只要在開口尺寸的調整後使緊固構件緊固即可,從而可使自開口尺寸的調整至框架元件的固定為止的操作變得容易。 According to this configuration, the fastening member also serves as a slide rail mechanism, and the configuration of the mask frame can be simplified. Further, the fastening member can be fastened after the adjustment of the opening size, and the operation from the adjustment of the opening size to the fixing of the frame member can be facilitated.

理想的是所述框架元件的所述開口部側邊部的上表面包含朝向開口部側具有向下傾斜的第1傾斜面,且所述框架元件的所述端邊部包含與所述第1傾斜面相對應的第2傾斜面。 It is preferable that an upper surface of the opening side portion of the frame member includes a first inclined surface that is inclined downward toward the opening side, and the end portion of the frame member includes the first portion The second inclined surface corresponding to the inclined surface.

若為所述構成,則藉由在各框架元件上設置第1傾斜面,可消除對位於罩幕框架附近的基板的處理的不均勻。並且,由於框架元件的端邊部包含第2傾斜面,故而可藉由簡單的構成來確實地填埋鄰接的框架間的間隙。 According to this configuration, by providing the first inclined surface on each of the frame members, it is possible to eliminate unevenness in the processing of the substrate located in the vicinity of the mask frame. Further, since the end side portion of the frame member includes the second inclined surface, the gap between the adjacent frames can be reliably filled with a simple configuration.

理想的是所述框架元件是以對長度方向一端部進行固定,並且能夠以所述長度方向一端部為起點藉由熱膨脹而沿長度方向移動至長度方向另一端側的方式而構成。 It is preferable that the frame member is fixed to one end portion in the longitudinal direction, and is configured to be movable in the longitudinal direction to the other end side in the longitudinal direction by thermal expansion from the one end portion in the longitudinal direction.

若為所述構成,則可消除框架元件因熱膨脹而產生的撓曲所引起的處理的不均勻,從而可提高處理的均勻性。 According to this configuration, the unevenness of the processing due to the deflection of the frame member due to thermal expansion can be eliminated, and the uniformity of the treatment can be improved.

理想的是在所述框架元件的長度方向另一端側形成有可插通緊固構件的插通孔,且所述緊固構件具有頭部,所述插通孔是沿長度方向的長孔,所述緊固構件在所述頭部與所述框架元件的上表面之間空開間隙而固定所述長度方向另一端側。 It is preferable that an insertion hole through which the fastening member can be inserted is formed on the other end side in the longitudinal direction of the frame member, and the fastening member has a head, and the insertion hole is a long hole in the longitudinal direction. The fastening member fixes the other end side in the longitudinal direction with a gap between the head and the upper surface of the frame member.

若為所述構成,則只要將框架元件的插入孔設為長孔,即可消除因熱膨脹而引起的撓曲,從而可簡化其構成。 According to this configuration, if the insertion hole of the frame member is a long hole, the deflection due to thermal expansion can be eliminated, and the configuration can be simplified.

根據如上所述而構成的本發明,可設為以下構成:無需在相互鄰接的框架元件上設置用以填埋間隙的特別構件,即使變更罩幕框架的開口部的尺寸,亦不會在各框架元件之間產生間隙,從而提高 基板處理的均勻性。 According to the present invention configured as described above, it is possible to provide a special member for filling a gap between adjacent frame members, and even if the size of the opening of the mask frame is changed, a gap is created between the frame elements, thereby increasing Uniformity of substrate processing.

2‧‧‧處理容器 2‧‧‧Processing container

3‧‧‧濺射電極 3‧‧‧ Sputtering electrode

4‧‧‧靶材 4‧‧‧ Target

5‧‧‧基板支撐部 5‧‧‧Substrate support

6‧‧‧電源部 6‧‧‧Power Supply Department

7‧‧‧密封構件 7‧‧‧ Sealing member

8‧‧‧罩幕框架 8‧‧‧ Cover Frame

8X‧‧‧開口部 8X‧‧‧ openings

9‧‧‧滑動導軌機構 9‧‧‧Sliding rail mechanism

10a、10b‧‧‧固定機構 10a, 10b‧‧‧fixed institutions

11‧‧‧緊固構件 11‧‧‧ fastening members

12‧‧‧內螺孔 12‧‧‧Inner hole

13‧‧‧螺母 13‧‧‧ nuts

21‧‧‧氣體導入部 21‧‧‧Gas introduction department

22‧‧‧排氣部 22‧‧‧Exhaust Department

51‧‧‧支撐銷 51‧‧‧Support pins

52‧‧‧驅動部 52‧‧‧ Drive Department

81a~81d‧‧‧框架元件 81a~81d‧‧‧Frame components

81h1、81h2、82h‧‧‧插通孔 81h1, 81h2, 82h‧‧‧ inserted through hole

82‧‧‧支撐構件 82‧‧‧Support members

100‧‧‧真空處理裝置 100‧‧‧Vacuum treatment unit

111‧‧‧頭部 111‧‧‧ head

112‧‧‧肩部 112‧‧‧ shoulder

811、812‧‧‧開口部側邊部 811, 812‧‧ ‧ side of the opening

811x‧‧‧第1傾斜面 811x‧‧‧1st inclined surface

813、814‧‧‧長度方向一端側的端邊部 813, 814‧‧‧ end side of one end side in the longitudinal direction

813x‧‧‧第2傾斜面 813x‧‧‧2nd inclined surface

821‧‧‧鍃孔 821‧‧‧鍃孔

H‧‧‧延伸量 H‧‧‧Extension

LD‧‧‧框架元件81a~框架元件81d的長度方向 Length direction of LD‧‧‧ frame member 81a~frame member 81d

G、S‧‧‧間隙 G, S‧‧‧ gap

SD‧‧‧滑動方向 SD‧‧‧ sliding direction

W‧‧‧基板 W‧‧‧Substrate

X1~X4‧‧‧框架元件 X1~X4‧‧‧Frame components

θ1、θ2‧‧‧傾斜角度 Θ1, θ2‧‧‧ tilt angle

圖1是示意性地表示本實施形態的真空處理裝置的構成的剖面圖。 Fig. 1 is a cross-sectional view schematically showing a configuration of a vacuum processing apparatus of the embodiment.

圖2是所述實施形態的罩幕框架的俯視圖。 Fig. 2 is a plan view of the mask frame of the embodiment.

圖3是所述實施形態的罩幕框架的分解部分立體圖。 Fig. 3 is an exploded perspective view showing the mask frame of the embodiment.

圖4(A)~圖4(B)是表示所述實施形態的長度方向一端側的固定機構的剖面圖及俯視圖。 4(A) to 4(B) are a cross-sectional view and a plan view showing a fixing mechanism on one end side in the longitudinal direction of the embodiment.

圖5(A)~圖5(C)是表示所述實施形態的長度方向另一端側的固定機構的剖面圖、俯視圖及底視圖。 5(A) to 5(C) are a cross-sectional view, a plan view, and a bottom view showing a fixing mechanism on the other end side in the longitudinal direction of the embodiment.

圖6(A)~圖6(C)是表示調整所述實施形態的開口部的開口尺寸時的各框架元件的動作的圖。 6(A) to 6(C) are views showing the operation of each frame element when the opening size of the opening in the embodiment is adjusted.

圖7(A)~圖7(C)是表示所述實施形態的熱膨脹吸收時的各框架元件的動作的圖。 7(A) to 7(C) are views showing the operation of each frame element at the time of thermal expansion absorption in the embodiment.

圖8是示意性地表示變形實施形態的真空處理裝置的構成的剖面圖。 Fig. 8 is a cross-sectional view schematically showing a configuration of a vacuum processing apparatus according to a modified embodiment.

圖9是變形實施形態的罩幕框架的局部立體圖及剖面圖。 Fig. 9 is a partial perspective view and a cross-sectional view showing a mask frame according to a modified embodiment.

圖10是變形實施形態的罩幕框架的俯視圖。 Fig. 10 is a plan view of a mask frame according to a modified embodiment.

圖11是表示變形實施形態的鄰接的框架元件的端部的俯視圖。 Fig. 11 is a plan view showing an end portion of an adjacent frame member in a modified embodiment.

圖12是現有的罩幕框架的俯視圖。 Figure 12 is a plan view of a conventional mask frame.

以下,一面參照圖式,一面對使用本發明的罩幕框架的真空處理裝置的一實施形態進行說明。 Hereinafter, an embodiment of a vacuum processing apparatus using the mask frame of the present invention will be described with reference to the drawings.

本實施形態的真空處理裝置100是利用電漿中的離子對靶材(target)進行濺射而在矩形的基板上形成薄膜的濺射(sputtering)裝置。 The vacuum processing apparatus 100 of the present embodiment is a sputtering apparatus that forms a thin film on a rectangular substrate by sputtering a target in a plasma.

具體而言,所述真空處理裝置100如圖1所示,包括對內部進行排氣而形成真空的處理容器2、與處理容器2電性絕緣地設置於所述處理容器2內的濺射電極3、與所述濺射電極3電性連接地安裝的靶材4、以及在與所述靶材4相對向的狀態下對基板W進行支撐的基板支撐部5。 Specifically, as shown in FIG. 1 , the vacuum processing apparatus 100 includes a processing container 2 that exhausts the inside to form a vacuum, and a sputtering electrode that is electrically insulated from the processing container 2 and disposed in the processing container 2 . 3. A target 4 that is electrically connected to the sputtering electrode 3 and a substrate supporting portion 5 that supports the substrate W in a state of being opposed to the target 4 .

在處理容器2中設置有氣體導入部21,自所述氣體導入部21導入放電用氣體。再者,放電用氣體例如是氬氣等惰性氣體。並且,在處理容器2內,設置有用以對內部進行排氣而形成真空的排氣部22,在所述排氣部22上連接有未圖示的真空泵。 The processing container 2 is provided with a gas introduction portion 21, and a gas for discharge is introduced from the gas introduction portion 21. Further, the discharge gas is, for example, an inert gas such as argon. Further, in the processing container 2, an exhaust portion 22 for evacuating the inside to form a vacuum is provided, and a vacuum pump (not shown) is connected to the exhaust portion 22.

在濺射電極3上連接有電源部6,藉由所述電源部6而供給高頻電力。 The power supply unit 6 is connected to the sputtering electrode 3, and the high-frequency power is supplied by the power supply unit 6.

基板支撐部5以可調整基板W相對於靶材4的位置構成,在本實施形態中,包括多個支撐銷51、以及使所述支撐銷51上下移動的驅動部52。再者,基板支撐部5與處理容器2之間是藉由伸縮管(bellows)等密封(seal)構件7而遮蔽。再者,處理容器2及基板支撐部5為電性接地。 The substrate supporting portion 5 is configured to adjust the position of the substrate W with respect to the target 4, and in the present embodiment, includes a plurality of support pins 51 and a driving portion 52 that moves the support pins 51 up and down. Further, the substrate supporting portion 5 and the processing container 2 are shielded by a sealing member 7 such as a bellows. Furthermore, the processing container 2 and the substrate supporting portion 5 are electrically grounded.

並且,當自所述氣體導入部21導入放電用氣體,藉由電源 部6而對濺射電極3供給高頻電力時,會自所述濺射電極3產生高頻放電。藉由所述高頻放電而使放電用氣體電離而生成電漿。所述電漿中的離子對靶材4進行濺射,自靶材4飛出的濺射粒子入射沈積於基板W上,而在基板W上形成薄膜。再者,真空處理裝置100亦可藉由電源部6而對濺射電極3供給直流電力,且藉由自所述濺射電極3產生的直流放電,而生成電漿。 Further, when the gas for discharge is introduced from the gas introduction portion 21, the power source is used. When the high-frequency electric power is supplied to the sputter electrode 3 in the portion 6, high-frequency discharge is generated from the sputter electrode 3. The discharge gas is ionized by the high-frequency discharge to generate a plasma. The ions in the plasma are sputtered on the target 4, and sputtered particles flying out from the target 4 are incident on the substrate W, and a thin film is formed on the substrate W. Further, in the vacuum processing apparatus 100, DC power can be supplied to the sputtering electrode 3 by the power supply unit 6, and plasma can be generated by DC discharge generated from the sputtering electrode 3.

然而,本實施形態的真空處理裝置100如圖1及圖2所示,包括自靶材4掩蓋基板W的周緣部的罩幕框架8。 However, as shown in FIGS. 1 and 2, the vacuum processing apparatus 100 of the present embodiment includes a mask frame 8 that covers the peripheral edge portion of the substrate W from the target 4.

所述罩幕框架8特別是如圖2所示,具有矩形的開口部8X,且包括與所述開口部8X的四邊分別相對應且具有長度方向的4個框架元件81a~框架元件81d、以及對所述4個框架元件81a~框架元件81d進行支撐的支撐構件82。 The mask frame 8 has, in particular, a rectangular opening portion 8X as shown in FIG. 2, and includes four frame members 81a to 81d having a longitudinal direction corresponding to the four sides of the opening portion 8X, respectively, and A support member 82 that supports the four frame members 81a to 81d.

再者,由4個框架元件81a~框架元件81d形成的開口部8X設定得小於矩形的基板尺寸。本實施形態的支撐構件82設置於處理容器2中,呈具有大於矩形的基板尺寸的矩形的開口部82X的矩形框狀。並且,將4個框架元件81a~框架元件81d固定於所述支撐構件82的上表面。 Further, the opening portion 8X formed by the four frame members 81a to 81d is set smaller than the rectangular substrate size. The support member 82 of the present embodiment is provided in the processing container 2, and has a rectangular frame shape having a rectangular opening portion 82X larger than the rectangular substrate size. Further, four frame members 81a to 81d are fixed to the upper surface of the support member 82.

各框架元件81a~框架元件81d於俯視時呈長條狀(矩形),包括沿長度方向的一對側邊部811、側邊部812,以及沿與長度方向正交的方向的一對端邊部813、端邊部814。在本實施形態中,一對側邊部811、側邊部812及一對端邊部813、端邊部814均於俯視時呈直線狀。並且,各框架元件81a~框架元件81d的與長度方向正 交的剖面形狀為矩形。 Each of the frame members 81a to 81d has an elongated shape (rectangular shape) in a plan view, and includes a pair of side portions 811 in the longitudinal direction, side portions 812, and a pair of end sides in a direction orthogonal to the longitudinal direction. Portion 813 and end portion 814. In the present embodiment, the pair of side portions 811, the side portions 812, the pair of end portions 813, and the end portions 814 are linear in plan view. Further, the longitudinal direction of each of the frame members 81a to 81d is positive The cross-sectional shape of the intersection is a rectangle.

並且,該些4個框架元件81a~框架元件81d是以形成開口部8X的各邊的方式配置成矩形環狀。具體而言,4個框架元件81a~框架元件81d是以各框架元件81a~框架元件81d的長度方向一端側的端邊部813(以下,稱為一端邊部813)及與所述一端邊部813鄰接的框架元件81a~框架元件81d的沿長度方向的開口部側邊部811相互對向的方式而配置。 Further, the four frame members 81a to 81d are arranged in a rectangular ring shape so as to form the respective sides of the opening portion 8X. Specifically, the four frame elements 81a to 81d are end portions 813 (hereinafter referred to as end portions 813) on one end side in the longitudinal direction of each of the frame elements 81a to 81d, and the one end portion 813 adjacent frame members 81a to 81d are arranged such that the opening side edges 811 in the longitudinal direction face each other.

在本實施形態中,各框架元件81a~框架元件81d的一端邊部813與鄰接的框架元件81a~框架元件81d的開口部側邊部811藉由相互接觸,而於俯視時不空開間隙地配置。具體而言,所述一端邊部813的側面與開口部側邊部811的側面為面接觸。 In the present embodiment, the one end side portion 813 of each of the frame members 81a to 81d and the opening side portion 811 of the adjacent frame member 81a to the frame member 81d are in contact with each other, and the gap is not opened in plan view. Configuration. Specifically, the side surface of the one end side portion 813 is in surface contact with the side surface of the opening side portion 811.

如上所述而配置的4個框架元件81a~框架元件81d是於俯視時相對於各自的長度方向傾斜的各自的滑動方向上可滑移地設置。並且,藉由使4個框架元件81a~框架元件81d滑移而可變更開口部8X的開口尺寸而構成。 The four frame elements 81a to 81d arranged as described above are slidably provided in the respective sliding directions inclined with respect to the respective longitudinal directions in plan view. Further, by sliding the four frame elements 81a to 81d, the opening size of the opening 8X can be changed.

具體而言,在相互鄰接的框架元件81a~框架元件81d中,以其中一個框架元件(例如81a)的滑動方向上的傾斜角度、與另一個框架元件(例如81b)的滑動方向上的傾斜角度的和成90度的方式而設定。在本實施形態中,各框架元件81a~框架元件81d的滑動方向上的傾斜角度設為45度。 Specifically, in the frame members 81a to 81d adjacent to each other, the inclination angle in the sliding direction of one of the frame members (for example, 81a) and the inclination angle in the sliding direction of the other frame member (for example, 81b) And set it in a 90 degree way. In the present embodiment, the inclination angle in the sliding direction of each of the frame members 81a to 81d is set to 45 degrees.

並且,罩幕框架8如圖2所示,包含用以使4個框架元件81a~框架元件81d分別沿滑動方向移動的滑動導軌機構9。本實施形 態的滑動導軌機構9可於俯視時相對於各自的長度方向傾斜45度的滑動方向上滑動。 Further, as shown in FIG. 2, the mask frame 8 includes a slide rail mechanism 9 for moving the four frame members 81a to 81d in the sliding direction. This embodiment The slide rail mechanism 9 of the state is slidable in a sliding direction inclined by 45 degrees with respect to the respective longitudinal directions in a plan view.

具體而言,滑動導軌機構9分別設置於各框架元件81a~框架元件81d的長度方向一端側及長度方向另一端側。本實施形態的滑動導軌機構9是使用固定機構10a、固定機構10b而構成,所述固定機構10a、固定機構10b將各框架元件81a~框架元件81d在其長度方向一端側及長度方向另一端側分別固定於支撐構件82上。 Specifically, the slide rail mechanism 9 is provided on one end side in the longitudinal direction and the other end side in the longitudinal direction of each of the frame elements 81a to 81d. The slide rail mechanism 9 of the present embodiment is configured by using a fixing mechanism 10a and a fixing mechanism 10b. The fixing mechanism 10a and the fixing mechanism 10b have the frame member 81a to the frame member 81d at one end side in the longitudinal direction and the other end side in the longitudinal direction. They are respectively fixed to the support member 82.

長度方向一端側的固定機構10a如圖3及圖4(A)~圖4(B)所示,構成為藉由將作為緊固構件的緊固螺栓11插通至形成於框架元件81a~框架元件81d的長度方向一端側的一端側插通孔81h1,且螺合於形成於支撐構件82上的內螺孔12,來對框架元件81a~框架元件81d的長度方向一端側進行固定。此處,形成於框架元件81a~框架元件81d上的一端側插通孔81h1設為沿框架元件81a~框架元件81d的滑動方向(圖4(B)中的符號SD)延伸的傾斜長孔。再者,圖4(B)中的符號LD表示框架元件81a~框架元件81d的長度方向。 As shown in FIGS. 3 and 4(A) to 4(B), the fixing mechanism 10a on the one end side in the longitudinal direction is configured to be inserted into the frame member 81a to the frame by inserting the fastening bolt 11 as a fastening member. One end side insertion hole 81h1 on one end side in the longitudinal direction of the element 81d is screwed to the inner screw hole 12 formed in the support member 82, and is fixed to one end side of the frame element 81a to the frame element 81d in the longitudinal direction. Here, the one end side insertion hole 81h1 formed in the frame element 81a to the frame element 81d is an inclined long hole extending in the sliding direction of the frame element 81a to the frame element 81d (symbol SD in FIG. 4(B)). Further, the symbol LD in Fig. 4(B) indicates the longitudinal direction of the frame member 81a to the frame member 81d.

在所述構成中,在將緊固螺栓11加以緊固的狀態下,即在緊固螺栓11的頭部111與支撐構件82之間夾著框架元件81a~框架元件81d的狀態下,對框架元件81a~框架元件81d的長度方向一端側進行固定。另一方面,在緊固螺栓11鬆開的狀態下,即,在緊固螺栓11的頭部111與框架元件81a~框架元件81d相離的狀態下,框架元件81a~框架元件81d可相對於緊固螺栓11在滑動方向上滑移。如 上所述,利用緊固螺栓11及一端側插通孔81h1構成滑動導軌機構9。即,緊固螺栓11成為設置於支撐構件82上的固定部,一端側插入孔81h1成為相對於所述固定部滑移的滑動部。 In the above configuration, in a state in which the fastening bolt 11 is fastened, that is, in a state in which the frame member 81a to the frame member 81d are interposed between the head portion 111 of the fastening bolt 11 and the support member 82, the frame is attached. One end side of the element 81a to the frame element 81d in the longitudinal direction is fixed. On the other hand, in a state where the fastening bolt 11 is loosened, that is, in a state where the head portion 111 of the fastening bolt 11 is separated from the frame member 81a to the frame member 81d, the frame member 81a to the frame member 81d can be opposed to the frame member 81d. The fastening bolt 11 slides in the sliding direction. Such as As described above, the slide rail mechanism 9 is constituted by the fastening bolt 11 and the one end side insertion hole 81h1. In other words, the fastening bolt 11 is a fixing portion provided on the support member 82, and the one end side insertion hole 81h1 is a sliding portion that slides with respect to the fixing portion.

長度方向另一端側的固定機構10b如圖3及圖5(A)~圖5(C)所示,構成為藉由將緊固螺栓11插通至形成於框架元件81a~框架元件81d的長度方向另一端側的另一端側插通孔81h2及形成於支撐構件82上的插通孔82h,且螺合於設置於支撐構件82的背面的螺母13,來對框架元件81a~框架元件81d的長度方向另一端側進行固定。此處,圖5(B)~圖5(C)中的符號LD表示框架元件81a~框架元件81d的長度方向,符號SD表示框架元件81a~框架元件81d的滑動方向。此處,在支撐構件82的背面,形成有收容螺母13的鍃孔821。並且,形成於支撐構件82上的插通孔82h設為沿框架元件81a~框架元件81d的滑動方向延伸的傾斜長孔。再者,鍃孔821亦設為與插通孔82h一併沿滑動方向延伸的傾斜長孔。 As shown in FIGS. 3 and 5(A) to 5(C), the fixing mechanism 10b on the other end side in the longitudinal direction is formed by inserting the fastening bolt 11 to the length of the frame member 81a to the frame member 81d. The other end side insertion hole 81h2 on the other end side and the insertion hole 82h formed in the support member 82 are screwed to the nut 13 provided on the back surface of the support member 82 to the frame member 81a to the frame member 81d. Fix the other end side in the length direction. Here, the symbol LD in FIGS. 5(B) to 5(C) indicates the longitudinal direction of the frame element 81a to the frame element 81d, and the symbol SD indicates the sliding direction of the frame element 81a to the frame element 81d. Here, a bore 821 in which the nut 13 is housed is formed on the back surface of the support member 82. Further, the insertion hole 82h formed in the support member 82 is an inclined long hole extending in the sliding direction of the frame member 81a to the frame member 81d. Further, the pupil 821 is also provided as an inclined long hole extending in the sliding direction together with the insertion hole 82h.

在所述構成中,在將緊固螺栓11加以緊固的狀態下,即在緊固螺栓11的頭部111與螺母13之間夾著框架元件81a~框架元件81d及支撐構件82的狀態下,對框架元件81a~框架元件81d的長度方向另一端側進行固定。另一方面,在緊固螺栓11鬆開的狀態下,即,在緊固螺栓11的頭部111及螺母13未夾著框架元件81a~框架元件81d及支撐構件82的狀態下,插通至框架元件81a~框架元件81d的另一端側插通孔81h2中的緊固螺栓11可相對於支撐構件82在滑動方向上滑移。如上所述,利用緊固螺栓11以及另一端側插通孔81h2及 鍃孔821構成滑動導軌機構9。即,另一端側插通孔81h2及鍃孔821成為設置於支撐構件82上的固定部,緊固螺栓11成為相對於所述固定部滑移的滑動部。 In the above configuration, in a state in which the fastening bolt 11 is fastened, that is, in a state in which the frame member 81a to the frame member 81d and the support member 82 are sandwiched between the head portion 111 of the fastening bolt 11 and the nut 13 The other end side of the frame member 81a to the frame member 81d in the longitudinal direction is fixed. On the other hand, in a state where the fastening bolt 11 is loosened, that is, in a state where the head portion 111 of the fastening bolt 11 and the nut 13 are not sandwiched between the frame member 81a to the frame member 81d and the support member 82, the insertion is performed to The fastening bolt 11 in the other end side insertion hole 81h2 of the frame member 81a to the frame member 81d is slidable in the sliding direction with respect to the support member 82. As described above, the fastening bolt 11 and the other end side insertion hole 81h2 are used. The bore 821 constitutes a slide rail mechanism 9. In other words, the other end side insertion hole 81h2 and the bore 821 are fixing portions provided on the support member 82, and the fastening bolt 11 is a sliding portion that slides with respect to the fixing portion.

此外,在本實施形態中,各框架元件81a~框架元件81d構成為對長度方向一端部進行固定,並且能夠以所述長度方向一端部為起點藉由熱膨脹而沿長度方向移動至長度方向另一端側。 Further, in the present embodiment, each of the frame members 81a to 81d is configured to be fixed to one end portion in the longitudinal direction, and is movable in the longitudinal direction to the other end in the longitudinal direction by thermal expansion from the one end portion in the longitudinal direction as a starting point. side.

具體而言,如圖3及圖5(A)~圖5(C)所示,各框架元件81a~框架元件81d的另一端側插通孔81h2設為沿長度方向的長孔。並且,在長度方向另一端側的固定機構10b的緊固螺栓11構成為在將框架元件81a~框架元件81d的長度方向另一端側加以固定的狀態下,在頭部111的下表面與框架元件81a~框架元件81d的上表面之間具有間隙S。再者,即使具有間隙S,由於長度方向一端側經緊固螺栓11緊固,故而在長度方向另一端側,亦以無法朝向與長度方向正交的方向移動的方式而固定。 Specifically, as shown in FIG. 3 and FIG. 5(A) to FIG. 5(C), the other end side insertion hole 81h2 of each of the frame elements 81a to 81d is a long hole in the longitudinal direction. Further, the fastening bolt 11 of the fixing mechanism 10b on the other end side in the longitudinal direction is configured such that the lower surface of the head portion 111 and the frame member are fixed in a state in which the other end sides of the frame member 81a to the frame member 81d are fixed in the longitudinal direction. There is a gap S between the upper surfaces of the frame members 81d to 81a. In addition, even if the gap S is provided, the one end side in the longitudinal direction is fastened by the fastening bolts 11, and the other end side in the longitudinal direction is also fixed so as not to be movable in a direction orthogonal to the longitudinal direction.

詳細而言,如圖5(A)~圖5(C)所示,固定機構10b的緊固螺栓11是凸肩螺栓,在螺合於螺母13,在支撐構件82緊固於所述緊固螺栓11的肩部112與螺母13之間的狀態下,即,在緊固螺栓11固定於支撐構件82的狀態下,在頭部111的下表面與框架元件81a~框架元件81d的上表面之間形成間隙S。 Specifically, as shown in FIGS. 5(A) to 5(C), the fastening bolt 11 of the fixing mechanism 10b is a shoulder bolt, and is screwed to the nut 13, and the support member 82 is fastened to the fastening. In a state between the shoulder portion 112 of the bolt 11 and the nut 13, that is, in a state where the fastening bolt 11 is fixed to the support member 82, on the lower surface of the head portion 111 and the upper surfaces of the frame member 81a to the frame member 81d A gap S is formed therebetween.

藉由所述構成,即使在框架元件81a~框架元件81d因熱膨脹而在長度方向上延伸時,框架元件81a~框架元件81d的長孔即另一端側插通孔81h2亦可相對於緊固螺栓11在長度方向上相對移動。 With the above configuration, even when the frame member 81a to the frame member 81d extend in the longitudinal direction due to thermal expansion, the long hole of the frame member 81a to the frame member 81d, that is, the other end side insertion hole 81h2 can be opposed to the fastening bolt. 11 moves relatively in the length direction.

其次,參照圖6(A)~圖6(C),對如上所述而構成的罩幕框架8的開口部8X的開口尺寸的調整進行說明。 Next, the adjustment of the opening size of the opening 8X of the mask frame 8 configured as described above will be described with reference to FIGS. 6(A) to 6(C).

圖6(A)是表示開口部8X的開口尺寸為最大的情況的圖。 Fig. 6(A) is a view showing a state in which the opening size of the opening 8X is the largest.

在所述狀態下,在長度方向一端側的固定機構10a(滑動導軌機構9)上,緊固螺栓11位於框架元件81a~框架元件81d的插通孔81h1的最內側。並且,在長度方向另一端側的固定機構10b(滑動導軌機構9)中,緊固螺栓11及螺母13位於支撐構件82的插通孔81h2及鍃孔821的最外側。此外,各框架元件81a~框架元件81d的一端邊部813與鄰接的框架元件81a~框架元件81d的開口部側邊部811相接觸。 In the state described above, the fastening bolt 11 is located at the innermost side of the insertion hole 81h1 of the frame member 81a to the frame member 81d in the fixing mechanism 10a (sliding rail mechanism 9) on the one end side in the longitudinal direction. Further, in the fixing mechanism 10b (sliding rail mechanism 9) on the other end side in the longitudinal direction, the fastening bolt 11 and the nut 13 are located at the outermost sides of the insertion hole 81h2 and the bore 821 of the support member 82. Further, one end side portion 813 of each of the frame members 81a to 81d is in contact with the opening side portion 811 of the adjacent frame member 81a to the frame member 81d.

當自所述狀態使開口部8X的開口尺寸減小時,鬆開框架元件81a~框架元件81d的長度方向一端側及另一端側的緊固螺栓11。並且,使框架元件81a~框架元件81d沿滑動方向移動至內側。此時,各框架元件81a~框架元件81d維持著接觸的狀態而進行移動(圖6(B))。此處,當使1個框架元件(例如框架元件81a)滑移時,4個框架元件81a~框架元件81d的鄰接的端部彼此相接觸,故而剩下的3個框架元件(例如框架元件81b~框架元件81d)亦聯動地滑移。再者,亦可對2個以上的框架元件同時進行操作而使其滑移。 When the opening size of the opening portion 8X is reduced from the above state, the fastening bolts 11 on the one end side and the other end side in the longitudinal direction of the frame member 81a to the frame member 81d are loosened. Further, the frame member 81a to the frame member 81d are moved to the inner side in the sliding direction. At this time, each of the frame elements 81a to 81d is moved while maintaining the contact state (FIG. 6(B)). Here, when one frame member (for example, the frame member 81a) is slipped, the adjacent end portions of the four frame members 81a to 81d are in contact with each other, and thus the remaining three frame members (for example, the frame member 81b) The frame member 81d) also slides in conjunction. Furthermore, two or more frame elements can be simultaneously operated and slipped.

以如上所述的方式使4個框架元件81a~框架元件81d移動,將位置調整至最佳位置,並對緊固螺栓11進行緊固而加以固定。 The four frame members 81a to 81d are moved as described above, the position is adjusted to an optimum position, and the fastening bolts 11 are fastened and fixed.

再者,圖6(C)是表示開口部8X的開口尺寸為最小的情況的圖。 In addition, FIG. 6(C) is a view showing a state in which the opening size of the opening 8X is the smallest.

在所述狀態下,在長度方向一端側的固定機構10a(滑動導軌機構9)上,緊固螺栓11位於框架元件81a~框架元件81d的插通孔81h1的最外側。並且,在長度方向另一端側的固定機構10b(滑動導軌機構9)中,緊固螺栓11及螺母13位於支撐構件82的插通孔81h2及鍃孔821的最內側。此外,各框架元件81a~框架元件81d的一端邊部813與鄰接的框架元件81a~框架元件81d的開口部側邊部811相接觸。 In the state described above, in the fixing mechanism 10a (sliding rail mechanism 9) on the one end side in the longitudinal direction, the fastening bolt 11 is located at the outermost side of the insertion hole 81h1 of the frame member 81a to the frame member 81d. Further, in the fixing mechanism 10b (sliding rail mechanism 9) on the other end side in the longitudinal direction, the fastening bolt 11 and the nut 13 are located at the innermost side of the insertion hole 81h2 and the bore 821 of the support member 82. Further, one end side portion 813 of each of the frame members 81a to 81d is in contact with the opening side portion 811 of the adjacent frame member 81a to the frame member 81d.

其次,參照圖7(A)~圖7(C),對各框架元件81a~框架元件81d的熱膨脹吸收進行說明。 Next, the thermal expansion absorption of each of the frame elements 81a to 81d will be described with reference to FIGS. 7(A) to 7(C).

圖7(A)是表示未產生熱膨脹的狀態(例如成膜處理前)的圖。 Fig. 7(A) is a view showing a state in which thermal expansion does not occur (for example, before a film formation process).

在所述狀態下,長度方向另一端側的固定機構10b的緊固螺栓11位於框架元件81a~框架元件81d的插通孔81h2的長度方向另一端部。 In the above state, the fastening bolt 11 of the fixing mechanism 10b on the other end side in the longitudinal direction is located at the other end portion in the longitudinal direction of the insertion hole 81h2 of the frame member 81a to the frame member 81d.

並且,若處理開始後框架元件81a~框架元件81d產生熱膨脹,則以框架元件81a~框架元件81d的長度方向一端側的固定機構10a(緊固箇所)為起點,框架元件81a~框架元件81d延伸至長度方向另一端側(圖7(B)及圖7(C))。於是,框架元件81a~框架元件81d的另一端側插通孔81h2相對於固定在支撐構件82上的緊固螺栓11而移動,以吸收其延伸量H。再者,由於如本實施形態般配置有各框架元件81a~框架元件81d,故而即使各框架元件81a~框架元件81d在長度方向上延伸,開口尺寸亦不會變化。 When the frame element 81a to the frame element 81d are thermally expanded after the start of the process, the frame member 81a to the frame member 81d extend from the fixing mechanism 10a (fastening) on the one end side in the longitudinal direction of the frame member 81a to the frame member 81d. To the other end side in the length direction (Fig. 7 (B) and Fig. 7 (C)). Then, the other end side insertion hole 81h2 of the frame member 81a to the frame member 81d is moved with respect to the fastening bolt 11 fixed to the support member 82 to absorb the amount of extension H thereof. In addition, since each of the frame elements 81a to 81d is disposed as in the present embodiment, the opening size does not change even if the frame elements 81a to 81d extend in the longitudinal direction.

延伸量H的吸收限度取決於框架元件81a~框架元件81d的另一 端側插通孔81h2的沿長度方向的長度(圖7(C)),因此需要基於預先設想的延伸量H,來確定另一端側插通孔81h2的長度。 The absorption limit of the amount of extension H depends on the other of the frame member 81a to the frame member 81d. The length of the end side insertion hole 81h2 in the longitudinal direction (Fig. 7(C)), therefore, it is necessary to determine the length of the other end side insertion hole 81h2 based on the amount of extension H assumed in advance.

<本實施形態的效果> <Effects of the embodiment>

根據如上所述而構成的真空處理裝置100,各框架元件81a~框架元件81d的一端邊部813與鄰接的框架元件81a~框架元件81d的開口部側邊部811是相對向而配置,因此即使變更開口尺寸,亦可維持各框架元件81a~框架元件81d的一端邊部813與鄰接的框架元件81a~框架元件81d的開口部側邊部811的接觸關係。因此,可設為如下構成:無需在相互鄰接的框架元件81a~框架元件81d上設置用以填埋間隙的特別構件,即使變更開口尺寸,亦不會在各框架元件81a~框架元件81d之間於俯視時產生間隙。 According to the vacuum processing apparatus 100 configured as described above, the one end side portion 813 of each of the frame members 81a to 81d and the opening side portion 811 of the adjacent frame member 81a to the frame member 81d are opposed to each other, and therefore even By changing the opening size, the contact relationship between the one end side portion 813 of each of the frame members 81a to 81d and the opening side portion 811 of the adjacent frame member 81a to the frame member 81d can be maintained. Therefore, it is not necessary to provide a special member for filling the gap between the frame members 81a to 81d adjacent to each other, and even if the size of the opening is changed, it is not between the frame members 81a to 81d. A gap is created in a plan view.

在各框架元件81a~框架元件81d與支撐構件82之間設置有滑動導軌機構9,故而可容易地使各框架元件81a~框架元件81d滑移。並且,當使1個框架元件81a移動時,可使其他框架元件81b~框架元件81d與所述移動聯動地移動,從而可容易地變更開口尺寸。此處,滑動導軌機構9設置於長度方向上的兩個部位,故而容易保持著框架元件81a~框架元件81d的姿勢進行滑移,當使多個框架元件81a~框架元件81d聯動地移動時,可使該些框架元件穩定地移動。 Since the slide rail mechanism 9 is provided between each of the frame members 81a to 81d and the support member 82, the frame members 81a to 81d can be easily slid. Further, when one frame element 81a is moved, the other frame elements 81b to 81d can be moved in conjunction with the movement, and the opening size can be easily changed. Here, since the slide rail mechanism 9 is provided at two locations in the longitudinal direction, it is easy to maintain the posture of the frame member 81a to the frame member 81d, and when the plurality of frame members 81a to 81d are moved in conjunction with each other, The frame members can be stably moved.

相互鄰接的框架元件81a~框架元件81d中的滑動方向相對於各自的長度方向的傾斜角度的和為90度,故而可在使各框架元件81b~框架元件81d的一端邊部813與鄰接的框架元件81b~框架元件 81d的開口部側邊部811相接觸的狀態下,變更開口尺寸。此處,滑動方向為45度,可在開口尺寸的變更前後維持開口形狀的縱橫比。 The sum of the inclination directions of the sliding direction of the frame members 81a to 81d adjacent to each other with respect to the respective longitudinal directions is 90 degrees, so that the one end side portion 813 of each of the frame members 81b to 81d and the adjacent frame can be made. Element 81b~frame element When the opening side edge portion 811 of 81d is in contact with each other, the opening size is changed. Here, the sliding direction is 45 degrees, and the aspect ratio of the opening shape can be maintained before and after the change in the opening size.

並且,在本實施形態中,固定機構10a、固定機構10b的緊固螺栓11兼作滑動導軌機構9,故而可簡化罩幕框架8的構成。並且,只要在調整開口尺寸後使緊固螺栓11緊固即可,從而可容易地進行自開口尺寸的調整至框架元件81a~框架元件81d的固定為止的操作。 Further, in the present embodiment, the fastening bolts 11 of the fixing mechanism 10a and the fixing mechanism 10b also serve as the slide rail mechanism 9, so that the configuration of the mask frame 8 can be simplified. Further, the tightening bolt 11 can be tightened after the opening size is adjusted, and the operation from the adjustment of the opening size to the fixing of the frame member 81a to the frame member 81d can be easily performed.

此外,各框架元件81a~框架元件81d構成為對長度方向一端部進行固定,並且能夠以所述長度方向一端部為起點藉由熱膨脹而沿長度方向移動至長度方向另一端側,故而可消除框架元件81a~框架元件81d因熱膨脹而產生的撓曲所引起的處理的不均勻,從而可提高處理的均勻性。 Further, each of the frame elements 81a to 81d is configured to be fixed to one end portion in the longitudinal direction, and can be moved in the longitudinal direction to the other end side in the longitudinal direction by thermal expansion from the one end portion in the longitudinal direction, thereby eliminating the frame. The unevenness of the processing caused by the deflection of the elements 81a to 81d due to thermal expansion can improve the uniformity of the processing.

再者,本發明並不限於所述實施形態。 Furthermore, the present invention is not limited to the embodiment.

例如,在所述實施形態中,各框架元件81a~框架元件81d的與長度方向正交的剖面呈矩形,但亦可如圖8及圖9所示,框架元件81a~框架元件81d的開口部側邊部811的上表面包含朝向開口部8X側具有向下傾斜的第1傾斜面811x,且框架元件81a~框架元件81d的一端邊部813包含與第1傾斜面811x相對應的第2傾斜面813x。 For example, in the above-described embodiment, each of the frame members 81a to 81d has a rectangular cross section orthogonal to the longitudinal direction. However, as shown in FIGS. 8 and 9, the frame members 81a to 81d may have openings. The upper surface of the side portion 811 includes a first inclined surface 811x that is inclined downward toward the opening 8X side, and the one end portion 813 of the frame member 81a to the frame element 81d includes a second inclination corresponding to the first inclined surface 811x. Face 813x.

並且,在所述實施形態中,一端邊部813的側面是與上表面垂直的平面,開口部側邊部811的側面亦是與上表面垂直的平面,但只要是一端邊部813於俯視時與開口部側邊部811無間隙地接觸的構成,則亦可為例如經彎曲的面或屈曲的面。 Further, in the above-described embodiment, the side surface of the one end side portion 813 is a plane perpendicular to the upper surface, and the side surface of the opening side portion 811 is also a plane perpendicular to the upper surface, but the end portion 813 is a plan view. The configuration that is in contact with the opening side edge portion 811 without a gap may be, for example, a curved surface or a curved surface.

此外,在所述實施形態中,各框架元件81a~框架元件81d 呈相同形狀,但只要包含直線狀的開口側邊部811及與所述開口部側邊部相對向的直線狀的一端邊部813,剩下的兩邊即不限於直線形狀。 Further, in the embodiment, each of the frame members 81a to 81d is 81d. The same shape is included, but the left side opening portion 811 and the linear one end side portion 813 that faces the opening side portion are not limited to a straight shape.

在所述實施形態中,罩幕框架於俯視時呈正方形,但亦可如圖10所示,呈長方形。 In the above embodiment, the mask frame has a square shape in plan view, but may have a rectangular shape as shown in FIG.

在所述實施形態中,所有框架元件的滑動方向上的傾斜角度均為45度,但亦可如圖11所示,在相互鄰接的框架元件中,其中一個框架元件的滑動方向SD上的傾斜角度θ1設為60度,另一個框架元件的滑動方向SD上的傾斜角度θ2設為30度。如上所述,只要滿足θ1+θ2=90度的關係,則θ1、θ2的具體的角度並不限於所述實施形態。 In the above embodiment, the inclination angles of all the frame members in the sliding direction are both 45 degrees, but as shown in Fig. 11, in the frame members adjacent to each other, the inclination of the sliding direction of one of the frame members is SD. The angle θ1 is set to 60 degrees, and the inclination angle θ2 in the sliding direction SD of the other frame member is set to 30 degrees. As described above, the specific angles of θ1 and θ2 are not limited to the above embodiment as long as the relationship of θ1 + θ2 = 90 degrees is satisfied.

此外,在所述實施形態中,是固定機構10a、固定機構10b兼作滑動導軌機構9的構成,但亦可將該些機構分別設置。此時,滑動導軌機構9包括設置於框架元件或支撐構件中的一者上的固定部、以及設置於所述框架元件或所述支撐構件中的另一者上且相對於所述固定部沿滑動方向滑動的滑動部。 Further, in the above-described embodiment, the fixing mechanism 10a and the fixing mechanism 10b also serve as the slide rail mechanism 9, but these mechanisms may be provided separately. At this time, the slide rail mechanism 9 includes a fixing portion provided on one of the frame member or the support member, and is disposed on the other of the frame member or the support member and along the fixed portion a sliding portion that slides in the sliding direction.

而且,所述實施形態的固定機構在長度方向一端側與長度方向另一端側具有不同的構成,但亦可將兩者設為相同的構成。 Further, the fixing mechanism of the above-described embodiment has a configuration in which one end side in the longitudinal direction and the other end side in the longitudinal direction have different configurations, but both of them may have the same configuration.

進而,所述實施形態的固定機構是使用緊固螺栓,但亦可使用具有貫通框架元件及支撐構件而設置的軸部及頭部的銷、以及嵌合於所述銷的軸部且與所述頭部之間夾著框架元件及支撐構件的止動環。此外,固定機構亦可使用一體地夾入框架元件及支撐構件而固定的夾緊(clamp)構件。 Further, although the fixing mechanism of the above-described embodiment uses a fastening bolt, a pin having a shaft portion and a head provided through the frame member and the support member, and a shaft portion fitted to the pin may be used. A stop ring that sandwiches the frame member and the support member between the heads. Further, the fixing mechanism may also use a clamp member that is integrally clamped into the frame member and the support member.

在所述實施形態中,作為真空處理裝置舉出濺射裝置為例進行了說明,此外,亦可應用於化學氣相沈積(chemical vapor deposition,CVD)裝置等使用電漿的真空處理裝置等之中。 In the above-described embodiment, a sputtering apparatus is exemplified as a vacuum processing apparatus, and it can also be applied to a vacuum processing apparatus using a plasma such as a chemical vapor deposition (CVD) apparatus. in.

此外,本發明當然並不限於所述實施形態,在不脫離其主旨的範圍內可進行各種變形。 The present invention is of course not limited to the embodiments described above, and various modifications can be made without departing from the spirit and scope of the invention.

Claims (9)

一種罩幕框架,具有矩形的開口部,且包括:4個框架元件,具有與所述開口部的四邊分別相對應的長度方向;且所述各框架元件中的所述長度方向一端側的端邊部及與所述端邊部鄰接的所述框架元件中的沿所述長度方向的所述開口部側邊部是相對向而配置,所述4個框架元件是於面對所述開口部進行俯視時相對於各自的所述長度方向傾斜的各自的滑動方向上可滑移地設置,所述各框架元件的所述端邊部與鄰接的所述框架元件的所述開口部側邊部相接觸,所述4個框架元件維持著接觸的狀態而進行滑移,藉由使所述4個框架元件滑移而可變更所述開口部的開口尺寸而構成罩幕框架。 A mask frame having a rectangular opening portion and comprising: four frame members having respective longitudinal directions corresponding to four sides of the opening portion; and one end of the frame members on the one end side in the longitudinal direction The side portion and the side portion of the opening portion in the longitudinal direction of the frame member adjacent to the end portion are disposed to face each other, and the four frame members face the opening portion Slidably disposed in a respective sliding direction inclined with respect to the respective longitudinal directions in a plan view, the end sides of the frame members and the opening side portions of the adjacent frame members When the four frame elements are in contact with each other, the four frame elements are slid while being held in contact with each other, and by sliding the four frame elements, the opening size of the opening portion can be changed to form a mask frame. 如申請專利範圍第1項所述的罩幕框架,其中所述4個框架元件是於俯視時相對於各自的所述長度方向傾斜45度的滑動方向上可滑移地設置。 The mask frame according to claim 1, wherein the four frame members are slidably disposed in a sliding direction inclined by 45 degrees with respect to the respective longitudinal directions in a plan view. 如申請專利範圍第1項或第2項所述的罩幕框架,其中包括:支撐構件,對所述框架元件進行支撐;且在所述框架元件與所述支撐構件之間設置有可使所述框架元件滑移的滑動導軌機構。 The mask frame of claim 1 or 2, comprising: a support member for supporting the frame member; and a space between the frame member and the support member A sliding rail mechanism in which the frame member slides. 如申請專利範圍第3項所述的罩幕框架,其中所述滑動導軌機構分別設置於所述框架元件的所述長度方向一端側及所述長度方 向另一端側。 The mask frame according to claim 3, wherein the sliding rail mechanism is respectively disposed at one end side and the length side of the frame member in the longitudinal direction To the other end side. 如申請專利範圍第3項所述的罩幕框架,其中所述框架元件藉由緊固構件而固定於所述支撐構件上,插通所述緊固構件的所述框架元件的插通孔或所述支撐構件的插通孔中的任一者是沿所述滑動方向的傾斜長孔,利用所述緊固構件及設為所述傾斜長孔的所述插通孔構成所述滑動導軌機構。 The mask frame of claim 3, wherein the frame member is fixed to the support member by a fastening member, and the insertion hole of the frame member of the fastening member is inserted or Any one of the insertion holes of the support member is an inclined long hole along the sliding direction, and the sliding guide mechanism is configured by the fastening member and the insertion hole provided as the inclined elongated hole . 如申請專利範圍第1項或第2項所述的罩幕框架,其中所述框架元件的所述開口部側邊部的上表面包含朝向所述開口部側具有向下傾斜的第1傾斜面,所述框架元件的所述端邊部包含與所述第1傾斜面相對應的第2傾斜面。 The mask frame according to the first or second aspect of the invention, wherein the upper surface of the opening side portion of the frame member includes a first inclined surface that is inclined downward toward the opening portion side. The end side portion of the frame member includes a second inclined surface corresponding to the first inclined surface. 如申請專利範圍第1項或第2項所述的罩幕框架,其中所述框架元件是以對所述長度方向一端部進行固定,並且能夠以所述長度方向一端部為起點藉由熱膨脹而沿所述長度方向移動至所述長度方向另一端側的方式而構成。 The mask frame according to claim 1 or 2, wherein the frame member is fixed to one end portion in the longitudinal direction, and is capable of being thermally expanded by using one end portion in the longitudinal direction as a starting point. It is configured to move in the longitudinal direction to the other end side in the longitudinal direction. 如申請專利範圍第7項所述的罩幕框架,其中在所述框架元件的所述長度方向另一端側形成有可插通緊固構件的插通孔,所述緊固構件具有頭部,所述插通孔是沿所述長度方向的長孔,所述緊固構件是在所述頭部與所述框架元件的上表面之間空開 間隙而固定所述長度方向另一端側。 The mask frame according to claim 7, wherein an insertion hole through which the fastening member can be inserted is formed at the other end side of the longitudinal direction of the frame member, the fastening member having a head. The insertion hole is an elongated hole along the length direction, and the fastening member is open between the head and the upper surface of the frame member The other end side in the longitudinal direction is fixed by a gap. 一種真空處理裝置,包括如申請專利範圍第1項至第8項中任一項所述的罩幕框架。 A vacuum processing apparatus comprising the mask frame according to any one of claims 1 to 8.
TW106109119A 2016-03-25 2017-03-20 Cover frame and vacuum processing device TWI626324B (en)

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