CN109072403A - Mask frame and vacuum treatment installation - Google Patents
Mask frame and vacuum treatment installation Download PDFInfo
- Publication number
- CN109072403A CN109072403A CN201780019206.0A CN201780019206A CN109072403A CN 109072403 A CN109072403 A CN 109072403A CN 201780019206 A CN201780019206 A CN 201780019206A CN 109072403 A CN109072403 A CN 109072403A
- Authority
- CN
- China
- Prior art keywords
- frame element
- frame
- length direction
- opening portion
- length
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The present invention is set as following composition: it is not necessary that the special component to fill gap is arranged on the frame element to adjoin each other, even if the size of the opening portion of change mask frame, will not generate gap between each frame element.The present invention is the mask frame with the opening portion of rectangle, it includes with 4 frame elements for distinguishing corresponding length direction with four sides of opening portion, opening portion side edge along its length in the end edge portion of length direction one end in each frame element and the frame element adjacent with the end edge portion is not configure in opposite directions with a gap when looking down, 4 frame elements are when looking down relative to being slippingly arranged in the inclined respective glide direction of respective length direction, constitute while the opening size of the opening portion is changed and sliding 4 frame elements.
Description
Technical field
The present invention relates to a kind of mask frame of the control to the process range of substrate and the vacuum using the mask frame
Processing unit.
Background technique
As such vacuum treatment installation, as shown in Patent Document 1, have including cover substrate peripheral part and on substrate
The mask body that is controlled of Film build range and the vacuum processing for the mask body mounting plate that the mask body is fixed is filled
It sets.
The mask body is as shown in figure 12, the 4 band-like frames being correspondingly split to form including each side with opening portion
Frame element (main body) X1~frame element (main body) X4.Specifically, mask body includes 2 frames opposite each other
Element X1, frame element X2 (being the frame element of left and right in Figure 12), and it is orthogonal with these frame elements X1, frame element X2
Ground configuration and 2 frame element X3 opposite each other, frame element X4 (being upper and lower frame element in Figure 12).Also, mutually
The frame element X1 of opposite left and right, frame element X2 both ends respectively with upper and lower frame element X3, frame opposite each other
Frame element X4 configures top.
Moreover, each frame element X1~frame element X4 is can be fixed on mask under the installation condition of independent change of location
On body mounting plate.Specifically, frame element be configured to can by the adjusting screw that is set on mask body mounting plate, and with
The enterprising line position in the orthogonal direction of the length direction of frame element sets change.
Existing technical literature
Patent document
Patent document 1: Japanese Patent Laid-Open 10-60624 bulletin
Summary of the invention
Problems to be solved by the invention
In the mask body, 4 frame element X1~frame element X4 are in the side orthogonal with respective length direction
It moves up, so after changing opening size (behind change film-forming region), between being generated between the end of each frame element
Gap G.Then, the film of the quadrangle of the substrate after there is film forming becomes non-uniform problem.
Also, in the patent document 1, it is configured to that the end of a wherein frame element is provided with protective plate,
The end of another frame element is provided with the guiding section portion that can accommodate the protective plate, to fill the clearance G.
Even however, the composition, since the corner upper surface in frame element is formed with recess portion, so there is also at
The film of the quadrangle of substrate after film becomes non-uniform problem.
Therefore, the present invention is to complete in order to solve described problem, and major subjects are to be set as following composition: being not necessarily to
In the end of each frame element, the special component to fill gap is set, it will not be in each framework metadata changing opening size
Gap is generated between part, to improve the uniformity of processing substrate.
The means to solve the problem
That is, mask frame of the invention is the mask frame with the opening portion of rectangle, characterized by comprising: 4 frames
Frame element has length direction corresponding with four sides of opening portion difference;And the length direction of each frame element
The opening portion side edge along its length of the end edge portion of one end and the frame element adjacent with the end edge portion be it is opposite and
Configuration, 4 frame elements are when looking down relative to can slide in the inclined respective glide direction of respective length direction
Ground setting is moved, change the opening size of the opening portion and sliding 4 frame elements and constitutes mask frame.
If mask frame as described above, then the end edge portion of the length direction one end of each frame element and with the end
The opening portion side edge along its length of the adjacent frame element of edge is opposite and configure, therefore even if changes open-mouth ruler
It is very little, the edge in the end edge portion of the length direction one end of each frame element with the frame element for being adjacent to the end edge portion can also be maintained
The positional relationship of the opening portion side edge of length direction.Therefore, it can set and be constructed as follows: without in the frame element to adjoin each other
The upper special component being arranged to fill gap will not be between each frame element when looking down even if change opening size
Generate gap.Specifically, can maintain on one side the length direction one end of each frame element end edge portion and with the end edge portion
The opening portion side edge along its length of adjacent frame element is in contact or close state, changes opening size on one side.
More specifically, it is generally desirable in the frame element to adjoin each other, with the sliding side of one of frame element
The sum of upward tilt angle and the tilt angle in the glide direction of another frame element for 90 degree mode and set.
If the composition, then it can not change the end edge portion of the length direction one end of each frame element and be adjacent to described
The positional relationship of the opening portion side edge along its length of the frame element in end edge portion, and sliding 4 frame elements
Change opening size.
Preferably 4 frame elements are on the direction for tilt when looking down relative to respective length direction 45 degree
Slippingly it is arranged.
It, then can be in the aspect ratio for maintaining opening shape afterwards before changing of opening size if the composition.
It preferably include the supporting member being supported to 4 frame elements, and in the frame element and institute
State the rail plate mechanisms for being provided between supporting member and can making the frame element sliding.
If the composition, then each frame element can easily be made to slide.Also, in the length direction of each frame element one
The structure that the opening portion side edge along its length of the end edge portion of end side and the frame element adjacent with the end edge portion is in contact
In the case where, if keeping 1 frame element mobile, other frame elements can be made to move in linkage with the movement, so as to
It is easy to carry out the change of opening size.
Preferably the rail plate mechanisms are respectively arranged at the length direction one end and length of the frame element
Direction another side.
If the composition, then rail plate mechanisms are respectively arranged at the length direction one end and the other end of frame element
Side, so the posture for being easy to remain frame element is slid.In the composition, frame element is longer, and the effect is more aobvious
It writes.Also, when moving multiple frame elements in linkage, these frame elements can be made steadily to move.
Preferably the frame element is fixed on the supporting member using fastening member, inserts the fastening structure
Any one of insertion hole or the insertion hole of the supporting member of the frame element of part are in the glide direction
Inclined elongate using the fastening member and is set as the insertion hole of the inclined elongate and constitutes the rail plate mechanisms.
If the composition, then fastening member doubles as rail plate mechanisms, so as to simplify the composition of mask frame.And
And as long as fasten fastening member after the adjustment of opening size, so as to make adjusting to framework metadata from opening size
Operation until the fixation of part becomes easy.
Preferably the upper surface of the opening portion side edge of the frame element include towards opening portion side have to
Under inclined 1st inclined surface, and the end edge portion of the frame element include incline with the 1st inclined surface the corresponding 2nd
Inclined-plane.
If the composition, then by the way that the 1st inclined surface is arranged on each frame element, can eliminate attached to mask frame is located at
The processing of close substrate it is uneven.Also, since the end edge portion of frame element includes the 2nd inclined surface, so can be by simple
Constitute certainly to fill the gap between adjacent frame.
Preferably the frame element be length direction one end to be fixed, and can be with the length side
It is made up of by way of being moved to length direction another side along its length for starting point thermal expansion to one end.
If the composition, then the unevenness of processing caused by the flexure that frame element is generated by thermal expansion can be eliminated
It is even, so that the uniformity of processing can be improved.
Preferably the insertion hole of insert fastening member is formed in the length direction another side of the frame element, and
The fastening member has head, and the insertion hole is long hole along its length, and the fastening member is on the head and institute
It states and is spaced apart gap between the upper surface of frame element and the fixed length direction another side.
If the composition, as long as the insertion hole of frame element is then set as long hole, it can eliminate and cause because of thermal expansion
Flexure, so as to simplify its composition.
The effect of invention
According to the present invention of composition as described above, following composition can be set as: without on the frame element to adjoin each other
Special component to fill gap is set, it, will not be in each frame element even if the size of the opening portion of change mask frame
Between generate gap, to improve the uniformity of processing substrate.
Detailed description of the invention
Fig. 1 is the sectional view for schematically showing the composition of vacuum treatment installation of present embodiment.
Fig. 2 is the top view of the mask frame of the embodiment.
Fig. 3 is the decomposition partial perspective view of the mask frame of the embodiment.
Fig. 4 is the sectional view and top view for indicating the fixed mechanism of length direction one end of the embodiment.
Fig. 5 is sectional view, top view and the bottom for indicating the fixed mechanism of length direction another side of the embodiment
View.
Fig. 6 is the figure of the movement of each frame element when indicating to adjust the opening size of the opening portion of the embodiment.
Fig. 7 is the figure for indicating the movement of each frame element when the thermal expansion of the embodiment absorbs.
Fig. 8 is the sectional view for schematically showing the composition of vacuum treatment installation of variant embodiment.
Fig. 9 is partial perspective view and the sectional view of the mask frame of variant embodiment.
Figure 10 is the top view of the mask frame of variant embodiment.
Figure 11 is the top view for indicating the end of the frame element of adjoining of variant embodiment.
Figure 12 is the top view of existing mask frame.
Specific embodiment
Hereinafter, one side faces an embodiment party of the vacuum treatment installation using mask frame of the invention referring to attached drawing, one
Formula is illustrated.
The vacuum treatment installation 100 of present embodiment is splashed using the ion pair target (target) in plasma
Penetrate and formed on the substrate of rectangle sputtering (sputtering) device of film.
Specifically, the vacuum treatment installation 100 is as shown in Figure 1, include being exhausted to inside and forming vacuum
Process container 2, the sputtering electrode 3 being set to being electrically insulated with process container 2 in the process container 2 and sputtering electricity
The substrate branch that pole 3 is electrically connected the target 4 of ground installation and is supported in the state of opposite with the target 4 to substrate W
Support part 5.
It is provided with gas introduction part 21 in process container 2, imports electric discharge gas from the gas introduction part 21.Again
Person, electric discharge are, for example, the inert gases such as argon gas with gas.Also, in process container 2, it is provided with inside to be exhausted
And the exhaust portion 22 of vacuum is formed, vacuum pump (not shown) is connected in the exhaust portion 22.
Power supply unit 6 is connected on sputtering electrode 3, the supply high frequency electric power using the power supply unit 6.
Substrate support 5 is constituted in a manner of adjustable position of the substrate W relative to target 4, in the present embodiment, packet
The driving portion 52 for including multiple supporting pins 51 and moving up and down the supporting pin 51.Furthermore substrate support 5 and processing are held
It is to seal (seal) component 7 using telescoping tube (bellows) etc. and cover between device 2.Furthermore process container 2 and substrate support
Portion 5 is electrical ground.
Also, when importing electric discharge gas from the gas introduction part 21, sputtering electrode 3 is supplied using power supply unit 6
When RF power, high-frequency discharge can be generated from the sputtering electrode 3.Make electric discharge gas ionization by the high-frequency discharge and
Generate plasma.Ion pair target 4 in the plasma is sputtered, and the sputtering particle incidence to fly out from target 4 is heavy
Product forms film on substrate W on substrate W.Furthermore vacuum treatment installation 100 can also be used power supply unit 6 and to sputtering electricity
Pole 3 supplies direct current power, and the direct-current discharge by generating from the sputtering electrode 3, and generates plasma.
However, the vacuum treatment installation 100 of present embodiment is as shown in Figures 1 and 2, including covering substrate W's from target 4
The mask frame 8 of peripheral part.
The mask frame 8 be especially as shown in Fig. 2, with rectangle opening portion 8X, and including with the opening portion 8X
Four sides distinguish it is corresponding and with length direction 4 frame element 81a~frame element 81d and to 4 frames
The supporting member 82 that element 81a~frame element 81d is supported.
Furthermore the substrate of rectangle is set smaller than by the opening portion 8X that 4 frame element 81a~frame element 81d are formed
Size.The supporting member 82 of present embodiment is set in process container 2, in the rectangle with the substrate size greater than rectangle
Opening portion 82X's is rectangular box-like.Also, 4 frame element 81a~frame element 81d are fixed on the supporting member 82
Upper surface.
Each frame element 81a~frame element 81d is (rectangle) in long strip when looking down, including a pair along its length
Side portion 811, side portion 812, and a pair of end edge 813 along direction orthogonal to the longitudinal direction, end edge portion 814.At this
In embodiment, a pair of of side portion 811, side portion 812 and a pair of end edge 813, end edge portion 814 are linear when looking down
Shape.Also, the section shape orthogonal to the longitudinal direction of each frame element 81a~frame element 81d is rectangle.
Also, these 4 frame element 81a~frame element 81d are configured in a manner of each side for forming opening portion 8X
Rectangular ring-type.Specifically, 4 frame element 81a~frame element 81d are with each frame element 81a~frame element 81d
Length direction one end end edge portion 813 (hereinafter referred to as one end edge 813) and the frame adjacent with one end edge 813
The opening portion side edge 811 of frame element 81a~frame element 81d along its length mode opposite each other and configure.
In the present embodiment, one end edge 813 of each frame element 81a~frame element 81d and adjacent framework metadata
Part 81a~frame element 81d opening portion side edge 811 is not configured with a gap when looking down by contacting with each other.Tool
For body, the side of one end edge 813 and the side of opening portion side edge 811 are face contact.
The 4 frame element 81a~frame element 81d configured as described above are when looking down relative to respective length
Slippingly it is arranged in the inclined respective glide direction in direction.Also, by making 4 frame element 81a~frame element 81d
It slides and changes the opening size of opening portion 8X and constitute.
Specifically, in the frame element 81a~frame element 81d to adjoin each other, with one of frame element (example
Such as 81a) glide direction on tilt angle, with the tilt angle in the glide direction of another frame element (such as 81b)
Sum set at 90 degree of mode.In the present embodiment, in the glide direction of each frame element 81a~frame element 81d
Tilt angle be set as 45 degree.
Also, mask frame 8 is as shown in Fig. 2, comprising to make 4 frame element 81a~frame element 81d respectively along cunning
The mobile rail plate mechanisms 9 in dynamic direction.The rail plate mechanisms 9 of present embodiment can be when looking down relative to respective length
It is slided in the glide direction of 45 degree of direction inclination.
Specifically, rail plate mechanisms 9 are respectively arranged at the length direction of each frame element 81a~frame element 81d
One end and length direction another side.The rail plate mechanisms 9 of present embodiment are using fixed mechanism 10a, fixed mechanism
10b and constitute, the fixed mechanism 10a, fixed mechanism 10b are by each frame element 81a~frame element 81d in its length direction
One end and length direction another side are individually fixed on supporting member 82.
The fixed mechanism 10a of length direction one end is as shown in Figures 3 and 4, is configured to by that will be used as fastening member
Fastening bolt 11 is inserted to the one end insertion hole for being formed in frame element 81a~frame element 81d length direction one end
81h1, and it is screwed together in the inner bolt hole 12 being formed on supporting member 82, to frame element 81a~frame element 81d length
Direction one end is fixed.Herein, the one end insertion hole 81h1 being formed on frame element 81a~frame element 81d is set
For the inclined elongate extended along frame element 81a~frame element 81d glide direction (the symbol SD in Fig. 4).Furthermore Fig. 4
In symbol LD representational framework element 81a~frame element 81d length direction.
In the composition, in the state that fastening bolt 11 is subject to fastening, i.e., the head of fastening bolt 11 111 with
In the state of clipping frame element 81a~frame element 81d between supporting member 82, to frame element 81a~frame element 81d
Length direction one end be fixed.On the other hand, in the state that fastening bolt 11 is unclamped, that is, in fastening bolt 11
For head 111 and frame element 81a~frame element 81d phase from the state of, frame element 81a~frame element 81d can be opposite
It is slid in glide direction in fastening bolt 11.It is slided as described above, being constituted using fastening bolt 11 and one end insertion hole 81h1
Dynamic guide rail mechanism 9.That is, fastening bolt 11 becomes the fixed part being set on supporting member 82, one end insertion hole 81h1 becomes
Sliding part relative to fixed part sliding.
The fixed mechanism 10b of length direction another side as depicted in figs. 3 and 5, is configured to by inserting fastening bolt 11
Pass to the another side insertion hole 81h2 and shape for being formed in frame element 81a~frame element 81d length direction another side
At in the insertion hole 82h on supporting member 82, and it is screwed together in the nut 12 for being set to the back side of supporting member 82, to framework metadata
Part 81a~frame element 81d length direction another side is fixed.Herein, the symbol LD representational framework element in Fig. 5
81a~frame element 81d length direction, symbol SD representational framework element 81a~frame element 81d glide direction.Herein,
At the back side of supporting member 82, it is formed with the spot-facing 821 of receiving nut 13.Also, the insertion hole being formed on supporting member 82
82h is set as the inclined elongate extended along frame element 81a~frame element 81d glide direction.Furthermore spot-facing 821 is also set as
The inclined elongate extended together along glide direction with insertion hole 82h.
In the composition, in the state that fastening bolt 11 is subject to fastening, i.e., the head of fastening bolt 11 111 with
In the state of clipping frame element 81a~frame element 81d and supporting member 82 between nut 13, to frame element 81a~frame
The length direction another side of frame element 81d is fixed.On the other hand, in the state that fastening bolt 11 is unclamped, that is, tight
In the state that the head 111 of fixing bolt 11 and nut 13 do not clip frame element 81a~frame element 81d and supporting member 82,
The fastening bolt 11 inserted into frame element 81a~frame element 81d another side insertion hole 81h2 can be relative to support
Component 82 slides in glide direction.As described above, utilizing fastening bolt 11 and another side insertion hole 81h2 and spot-facing 821
Constitute rail plate mechanisms 9.That is, another side insertion hole 81h2 and spot-facing 821 become the fixation being set on supporting member 82
Portion, fastening bolt 11 become the sliding part slid relative to the fixed part.
In addition, in the present embodiment, each frame element 81a~frame element 81d is configured to length direction one end
It is fixed, and length side can be moved to along its length by thermal expansion using the length direction one end as starting point
To another side.
Specifically, as depicted in figs. 3 and 5, the another side insertion hole of each frame element 81a~frame element 81d
81h2 is set as long hole along its length.Also, it is constituted in the fastening bolt 11 of the fixed mechanism 10b of length direction another side
For in the state of being fixed frame element 81a~frame element 81d length direction another side, on head 111
There is gap S between lower surface and the upper surface frame element 81a~frame element 81d.Furthermore even if having gap S, due to
Length direction one end is fastened through fastening bolt 11, so in length direction another side, also with can not towards with length direction
The mobile mode in orthogonal direction and fix.
Specifically, as shown in figure 5, the fastening bolt 11 of fixed mechanism 10b is shoulder bolt, it is being screwed together in nut 13,
In the state of between the shoulder 112 and nut 13 that supporting member 82 is anchored on the shoulder bolt 11, that is, in fastening bolt 11
It is fixed in the state of supporting member 82, in the lower surface and the upper surface frame element 81a~frame element 81d on head 111
Between formed gap S.
Using the composition, even if extending in the longitudinal direction in frame element 81a~frame element 81d because of thermal expansion
When, frame element 81a~frame element 81d long hole, that is, another side insertion hole 81h2 can also be relative to fastening bolt 11 in length
Degree relatively moves on direction.
Secondly, referring to Fig. 6, to as described above and the adjustment of the opening size of the opening portion 8X of mask frame 8 that constitutes into
Row explanation.
Fig. 6 (A) is to indicate that the opening size of opening portion 8X is the figure of maximum situation.
In this condition, on the fixed mechanism 10a (rail plate mechanisms 9) of length direction one end, fastening bolt
11 are located at the most inner side of frame element 81a~frame element 81d insertion hole 81h1.Also, in length direction another side
In fixed mechanism 10b (rail plate mechanisms 9), fastening bolt 11 and nut 13 are located at the insertion hole 81h2 and ream of supporting member 82
The outermost in hole 821.In addition, one end edge 813 of each frame element 81a~frame element 81d and adjacent frame element 81a
The opening portion side edge 811 of~frame element 81d is in contact.
When reducing the opening size of opening portion 8X from the state, frame element 81a~frame element 81d is unclamped
The fastening bolt 11 of length direction one end and another side.Also, make frame element 81a~frame element 81d along sliding side
To on the inside of being moved to.At this point, each frame element 81a~frame element 81d maintains the state of contact and carries out mobile (Fig. 6
(B)).Herein, when making 1 frame element (such as frame element 81a) sliding, 4 frame element 81a~frame element 81d
Adjoining end it is contacting one another, so remaining 3 frame elements (such as frame element 81b~frame element 81d)
It slides in linkage.Furthermore 2 or more frame elements can also be operated simultaneously and make its sliding.
Make 4 frame element 81a~frame element 81d mobile in the manner, position is adjusted to optimum bit
It sets, and fastening bolt 11 is fastened and is fixed.
Furthermore Fig. 6 (C) is to indicate that the opening size of opening portion 8X is the figure of minimum situation.
In this condition, on the fixed mechanism 10a (rail plate mechanisms 9) of length direction one end, fastening bolt
11 are located at the outermost of frame element 81a~frame element 81d insertion hole 81h1.Also, in length direction another side
In fixed mechanism 10b (rail plate mechanisms 9), fastening bolt 11 and nut 13 are located at the insertion hole 81h2 and ream of supporting member 82
The most inner side in hole 821.In addition, one end edge 813 of each frame element 81a~frame element 81d and adjacent frame element 81a
The opening portion side edge 811 of~frame element 81d is in contact.
Secondly, being illustrated referring to Fig. 7 to the thermal expansion absorption of each frame element 81a~frame element 81d.
Fig. 7 (A) is the figure for indicating not generate the state (such as before film process) of thermal expansion.
In this condition, the fastening bolt 11 of the fixed mechanism 10b of length direction another side is located at frame element 81a
Length direction the other end of the insertion hole 81h2 of~frame element 81d.
Also, if processing starts afterframe element 81a~frame element 81d and generates thermal expansion, with frame element 81a~
The fixed mechanism 10a (fastening position) of the length direction one end of frame element 81d is starting point, frame element 81a~framework metadata
Part 81d extends to length direction another side (Fig. 7 (B) and Fig. 7 (C)).Then, frame element 81a~frame element 81d is another
One end insertion hole 81h2 is moved relative to the fastening bolt 11 being fixed on supporting member 82, to absorb its elongation H.Again
Person, due to being configured with each frame element 81a~frame element 81d as in the present embodiment, so even if each frame element 81a
~frame element 81d extends in the longitudinal direction, and opening size will not change.
The absorption limit of elongation H is depending on frame element 81a~frame element 81d another side insertion hole 81h2's
Length (Fig. 7 (C)) along its length, it is therefore desirable to based on the elongation H imagined in advance, to determine another side insertion hole
The length of 81h2.
<effect of present embodiment>
According to the vacuum treatment installation 100 of composition, one end of each frame element 81a~frame element 81d as described above
Edge 813 and adjacent frame element 81a~frame element 81d opening portion side edge 811 be opposite and configure, therefore even if
Opening size is changed, one end edge 813 of each frame element 81a~frame element 81d and the frame element of adjoining can also be maintained
The contact relation of 81a~frame element 81d opening portion side edge 811.Therefore, it can set and be constructed as follows: without mutual adjacent
Special component to fill gap is set on the frame element 81a~frame element 81d connect, even if change opening size,
Gap will not be generated when looking down between each frame element 81a~frame element 81d.
In each frame element 81a~be provided with rail plate mechanisms 9 between frame element 81d and supporting member 82, so
Each frame element 81a~frame element 81d sliding can easily be made.Also, when keeping 1 frame element 81a mobile, it can be made
His frame element 81b~frame element 81d is moved in linkage with the movement, so as to easily change opening size.Herein,
Two positions of the setting of rail plate mechanisms 9 in the longitudinal direction, so be easy to remain frame element 81a~frame element
The posture of 81d is slid, and when moving multiple frame element 81a~frame element 81d in linkage, can make these framework metadatas
Part steadily moves.
The glide direction in frame element 81a~frame element 81d to adjoin each other is relative to respective length direction
Tilt angle and be 90 degree, so can one end edge 813 for making each frame element 81b~frame element 81d with abut
In the state that frame element 81b~frame element 81d opening portion side edge 811 is in contact, opening size is changed.Herein, sliding
Dynamic direction is 45 degree, can be in the aspect ratio for maintaining opening shape afterwards before changing of opening size.
Also, in the present embodiment, the fastening bolt 11 of fixed mechanism 10a, fixed mechanism 10b are as slide rail machine
Structure 9, so the composition of mask frame 8 can be simplified.If also, fasten fastening bolt 11 after adjusting opening size,
So as to be easy to carry out the operation adjusted until frame element 81a~frame element 81d fixation from opening size.
In addition, each frame element 81a~frame element 81d is configured to that length direction one end is fixed, and energy
It is enough that length direction another side is moved to by thermal expansion along its length using the length direction one end as starting point, so
The uneven of processing caused by the flexure that frame element 81a~frame element 81d is generated by thermal expansion can be eliminated, so as to
Improve the uniformity of processing.
Furthermore the present invention is not limited to the embodiments.
For example, in said embodiment, each the orthogonal to the longitudinal direction of frame element 81a~frame element 81d is cutd open
Face is in rectangle, but can also as can be seen from figures 8 and 9, the upper table of frame element 81a~frame element 81d opening portion side edge 811
Bread is containing having the 1st inclined surface 811x that tilts down, and frame element 81a~frame element 81d towards the opening portion side 8X
One end edge 813 includes 2nd inclined surface 813x corresponding with the 1st inclined surface 811x.
Also, in said embodiment, the side of one end edge 813 is the plane vertical with upper surface, opening portion side
The side of edge 811 is also the plane vertical with upper surface, but as long as be one end edge 813 when looking down with opening portion side edge
811 compositions seamlessly contacted then can also be such as face through curved face or buckling.
In addition, in said embodiment, each frame element 81a~frame element 81d is in same shape, but as long as comprising
Linear open side edge 811 and the linear one end edge 813 opposite with the opening portion side edge, remaining both sides
It is not limited to rectilinear form.
In said embodiment, mask frame is square when looking down, but can also be as shown in Figure 10, is rectangle.
In said embodiment, the tilt angle in the glide direction of all frame elements is 45 degree, but can also be such as
Shown in Figure 11, in the frame element to adjoin each other, the tilt angle theta 1 on the glide direction SD of one of frame element is set
It is 60 degree, the tilt angle theta 2 on the glide direction SD of another frame element is set as 30 degree.As long as described above, meeting θ 1+ θ
The relationship of 2=90 degree, then θ 1, θ 2 specific angle be not limited to the embodiment.
In addition, being the structure that fixed mechanism 10a, fixed mechanism 10b double as rail plate mechanisms 9 in said embodiment
At, but these mechanisms can also be respectively set.At this point, rail plate mechanisms 9 include being set in frame element or supporting member
One of on fixed part and to be set to the other of the frame element or the supporting member upper and relative to described
The sliding part that fixed part is slided along glide direction.
Moreover, the fixed mechanism of the embodiment have in length direction one end and length direction another side it is different
Composition, but the two can also be set as to identical composition.
In turn, the fixed mechanism of the embodiment be using fastening bolt, but can also be used have perforation frame element
And it supporting member and the pin of axle portion and head that is arranged and is embedded in the axle portion of the pin and clips frame between the head
The locating snap ring of frame element and supporting member.In addition, fixed mechanism can also be used integrally sandwich frame element and supporting member and
Fixed clamping (clamp) component.
In said embodiment, it is illustrated for enumerating sputtering equipment as vacuum treatment installation, in addition, can also
The vacuum processing of plasma is used applied to chemical vapor deposition (chemical vapor deposition, CVD) device etc.
Among device etc..
In addition, the present invention is certainly not limited to the embodiment, can carry out within the scope of its spirit various
Deformation.
The explanation of symbol
100: vacuum treatment installation
8: mask frame
8X: opening portion
81a~81d: frame element
811: opening portion side edge
813: the end edge portion of length direction one end
82: supporting member
9: rail plate mechanisms
11: fastening member
81h1,81h2: insertion hole
111: head
S: gap
811x: the 1 inclined surface
813x: the 2 inclined surface
Claims (9)
1. a kind of mask frame, the opening portion with rectangle, and
Include: 4 frame elements, there is length direction corresponding with four sides of opening portion difference;And
The end edge portion of the length direction one end in each frame element and the frame element adjacent with the end edge portion
In opening portion side edge along its length be opposite and configure,
4 frame elements are when looking down relative to can slide in the inclined respective glide direction of respective length direction
Ground setting is moved,
The opening size of the opening portion is changed and enabling 4 frame elements to slide and constitutes mask frame.
2. mask frame according to claim 1, wherein 4 frame elements are when looking down relative to respective length
Can slippingly it be arranged in the glide direction of 45 degree of degree direction inclination.
3. mask frame according to claim 1 or 2, wherein
Include: supporting member, the frame element is supported;And
The slide rail machine that can make the frame element sliding is provided between the frame element and the supporting member
Structure.
4. mask frame according to claim 3, wherein the rail plate mechanisms are respectively arranged at the frame element
Length direction one end and length direction another side.
5. mask frame according to claim 3 or 4, wherein
The frame element is fixed on the supporting member using fastening member,
Any one of insertion hole or the insertion hole of the supporting member for inserting the frame element of the fastening member be
Along the inclined elongate of the glide direction,
The rail plate mechanisms are constituted using the fastening member and the insertion hole for being set as the inclined elongate.
6. mask frame according to any one of claim 1 to 5, wherein
The upper surface of the opening portion side edge of the frame element includes to have the tilt down the 1st to incline towards opening portion side
Inclined-plane,
The end edge portion of the frame element includes the 2nd inclined surface corresponding with the 1st inclined surface.
7. mask frame according to any one of claim 1 to 6, wherein the frame element is to length direction one
End is fixed, and can be moved to along its length length by thermal expansion using the length direction one end as starting point
It spends the mode of direction another side and constitutes.
8. mask frame according to claim 7, wherein
It is formed with the insertion hole of insert fastening member in the length direction another side of the frame element,
The fastening member has head,
The insertion hole is long hole along its length,
The fastening member is to be spaced apart gap between the head and the upper surface of the frame element and the fixed length
Direction another side.
9. a kind of vacuum treatment installation, including such as mask frame described in any item of the claim 1 to 8.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016-062580 | 2016-03-25 | ||
JP2016062580A JP6876244B2 (en) | 2016-03-25 | 2016-03-25 | Mask frame and vacuum processing equipment |
PCT/JP2017/009243 WO2017163878A1 (en) | 2016-03-25 | 2017-03-08 | Mask frame and vacuum processing device |
Publications (2)
Publication Number | Publication Date |
---|---|
CN109072403A true CN109072403A (en) | 2018-12-21 |
CN109072403B CN109072403B (en) | 2021-04-20 |
Family
ID=59900142
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201780019206.0A Active CN109072403B (en) | 2016-03-25 | 2017-03-08 | Mask frame and vacuum processing apparatus |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6876244B2 (en) |
CN (1) | CN109072403B (en) |
TW (1) | TWI626324B (en) |
WO (1) | WO2017163878A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6298110B2 (en) * | 2016-07-08 | 2018-03-20 | キヤノントッキ株式会社 | Mask support, film forming apparatus and film forming method |
CN107675128B (en) * | 2017-11-17 | 2023-10-27 | 京东方科技集团股份有限公司 | mask frame |
JP7012157B2 (en) * | 2018-06-20 | 2022-01-27 | 株式会社アルバック | Adhesive members and vacuum processing equipment |
JP7246148B2 (en) * | 2018-06-26 | 2023-03-27 | 東京エレクトロン株式会社 | sputtering equipment |
US11414747B2 (en) | 2018-06-26 | 2022-08-16 | Tokyo Electron Limited | Sputtering device |
KR102515305B1 (en) * | 2022-05-18 | 2023-03-29 | 에스케이엔펄스 주식회사 | Shadow mask and manufacturing method of blankmask applied thereby |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004079803A (en) * | 2002-08-19 | 2004-03-11 | Seiko Epson Corp | Exposure system and semiconductor device |
JP2008088509A (en) * | 2006-10-03 | 2008-04-17 | Seiko Epson Corp | Film deposition apparatus and film deposition method using the same |
CN102337511A (en) * | 2010-07-20 | 2012-02-01 | 东京毅力科创株式会社 | Shield member, components thereof and substrate mounting table comprising shield member |
CN103261474A (en) * | 2010-08-27 | 2013-08-21 | 应用材料公司 | Carrier for a substrate and a method for assembling the same |
JP2014522914A (en) * | 2011-08-09 | 2014-09-08 | アプライド マテリアルズ インコーポレイテッド | Adjustable mask |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3086095B2 (en) * | 1992-12-22 | 2000-09-11 | キヤノン株式会社 | Sputtering equipment |
JPH1060624A (en) * | 1996-08-20 | 1998-03-03 | Matsushita Electric Ind Co Ltd | Sputtering device |
JP2004079804A (en) * | 2002-08-19 | 2004-03-11 | Seiko Epson Corp | Aligner, its controlling method, and semiconductor device |
CN103668051A (en) * | 2012-09-07 | 2014-03-26 | 昆山允升吉光电科技有限公司 | Mask frame and corresponding mask component thereof for vapor deposition |
-
2016
- 2016-03-25 JP JP2016062580A patent/JP6876244B2/en active Active
-
2017
- 2017-03-08 CN CN201780019206.0A patent/CN109072403B/en active Active
- 2017-03-08 WO PCT/JP2017/009243 patent/WO2017163878A1/en active Application Filing
- 2017-03-20 TW TW106109119A patent/TWI626324B/en active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004079803A (en) * | 2002-08-19 | 2004-03-11 | Seiko Epson Corp | Exposure system and semiconductor device |
JP2008088509A (en) * | 2006-10-03 | 2008-04-17 | Seiko Epson Corp | Film deposition apparatus and film deposition method using the same |
CN102337511A (en) * | 2010-07-20 | 2012-02-01 | 东京毅力科创株式会社 | Shield member, components thereof and substrate mounting table comprising shield member |
CN103261474A (en) * | 2010-08-27 | 2013-08-21 | 应用材料公司 | Carrier for a substrate and a method for assembling the same |
JP2014522914A (en) * | 2011-08-09 | 2014-09-08 | アプライド マテリアルズ インコーポレイテッド | Adjustable mask |
Also Published As
Publication number | Publication date |
---|---|
TWI626324B (en) | 2018-06-11 |
JP2017172028A (en) | 2017-09-28 |
JP6876244B2 (en) | 2021-05-26 |
CN109072403B (en) | 2021-04-20 |
TW201800592A (en) | 2018-01-01 |
WO2017163878A1 (en) | 2017-09-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN109072403A (en) | Mask frame and vacuum treatment installation | |
US9827578B2 (en) | Tightly fitted ceramic insulator on large area electrode | |
US9165813B2 (en) | Semiconductor manufacturing apparatus member | |
US20180254178A1 (en) | Method and device for ion mobility separation | |
KR102004627B1 (en) | Substrate holder reception apparatus | |
JP2016184610A (en) | Upper electrode, edge ring and plasma processing apparatus | |
TWI537419B (en) | A vacuum processing chamber | |
JP6816835B2 (en) | Mass spectrometer | |
JP6835264B2 (en) | Mass spectrometer | |
US20130306580A1 (en) | Supporting stand for multiple screens | |
CN103088298B (en) | Film coating correction plate and coating apparatus | |
KR102110749B1 (en) | Apparatus for holding a substrate in a vacuum deposition process, a system for depositing a layer on a substrate, and a method for holding a substrate | |
JP2004200421A (en) | Plasma cvd equipment, film forming method using the same, and manufacturing method of semiconductor device | |
CN110538389A (en) | Beam flow line deflection device, rotating rack with same and radiation equipment | |
KR101064468B1 (en) | Apparatus for measuring the thickness | |
US20130098553A1 (en) | Electron beam plasma source with profiled chamber wall for uniform plasma generation | |
JP2009516776A (en) | Flexible magnetron including a partially rotating support and a centering pin | |
KR100911747B1 (en) | Apparatus for processing substrate | |
CN105177665A (en) | Metallographical laminating device | |
KR102156500B1 (en) | Wiring fixing structure and processing apparatus | |
KR20090033718A (en) | Plasma treatment apparatus having linear antenna enclosing magnet | |
CN107078004B (en) | For having the device and method of big width flexible base board using electron beam treatment | |
US11978615B2 (en) | Sputtering apparatus | |
WO2016117427A1 (en) | Wafer support structure | |
TWI757506B (en) | Plasma processing device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |