TW201534669A - 電荷輸送性清漆、電荷輸送性薄膜及有機電致發光元件 - Google Patents
電荷輸送性清漆、電荷輸送性薄膜及有機電致發光元件 Download PDFInfo
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- TW201534669A TW201534669A TW103133998A TW103133998A TW201534669A TW 201534669 A TW201534669 A TW 201534669A TW 103133998 A TW103133998 A TW 103133998A TW 103133998 A TW103133998 A TW 103133998A TW 201534669 A TW201534669 A TW 201534669A
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- 239000011593 sulfur Substances 0.000 description 1
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Abstract
本發明係提供可低於200℃之低溫進行燒成,同時在該燒成條件下製作的薄膜為高平坦性且具有高電荷輸送性,適用於有機EL元件時,可發揮優異的亮度特性的電荷輸送性清漆。
本發明之電荷輸送性清漆,其特徵係含有由式(1)表示之寡噻吩衍生物所構成之電荷輸送性物質、摻雜物、有機矽烷化合物及有機溶劑。
□(式中,R1~R8各自獨立表示氫、烷基、烯基、炔基、芳基、雜芳基、-OY1基、-SY2基、-NHY3基、-NY4Y5基或-NHC(O)Y6基,n1~n3各自獨立表示自然數,且滿足4≦n1+n2+n3≦20)。
Description
本發明係有關電荷輸送性清漆、電荷輸送性薄膜及有機電致發光(以下稱為有機EL)元件。
有機EL元件中,可使用由有機化合物所構成的電荷輸送性薄膜作為發光層或電荷注入層。此電荷輸送性薄膜之形成方法,大致區分為以蒸鍍法所代表之乾式製程與以旋轉塗佈法所代表的濕式製程。乾式製程與濕式製程比較時,濕式製程可較有效率製造大面積平坦性高的薄膜,因此在期望有機EL等之薄膜之大面積化的領域,大部分藉由濕式製程形成薄膜。
有鑑於此點,本發明人等開發了以濕式製程製作可適用於各種電子裝置之電荷輸送性薄膜用的電荷輸送性清漆(參照例如專利文獻1)。
但是,近年有機EL的領域,因元件之輕量化或薄型化的潮流,而使用由有機化合物所構成之基板取代玻璃基板,因此,要求可比以往更低溫燒成,且該情況下也可提供具有良好電荷輸送性之薄膜的清漆。
[專利文獻1]日本特開2002-151272號公報
本發明有鑑於上述情形而完成者,本發明之目的係提供可低於200℃之低溫進行燒成,同時在該燒成條件下製作的薄膜為高平坦性且具有高電荷輸送性,適用於有機EL元件時,可發揮優異特性的電荷輸送性清漆。
本發明人等,為了達成上述目的而精心研討的結果,發現藉由使用含有由寡噻吩衍生物所構成之電荷輸送性物質、摻雜物、有機矽烷化合物及有機溶劑的電荷輸送性清漆,可得到可低於200℃之低溫進行燒成,同時在該燒成條件下製作的薄膜為具有高平坦性及高電荷輸送性,及該薄膜使用於電洞注入層時,可得到可實現優異的亮度特性的有機EL元件,而完成本發明。
又,專利文獻1未具體揭示使用了寡噻吩衍生物、摻雜物及有機矽烷化合物的清漆。
亦即,本發明係提供下述電荷輸送性清漆及有機EL元件。
1.一種電荷輸送性清漆,其特徵係含有:由式(1)表示之寡噻吩衍生物所構成的電荷輸送性物質、摻雜物、有機矽烷化合物及有機溶劑。
(式中,R1~R6各自獨立表示氫原子、可經Z1所取代之碳數1~20之烷基、可經Z1所取代之碳數2~20之烯基、可經Z1所取代之碳數2~20之炔基、可經Z2所取代之碳數6~20之芳基、可經Z2所取代之碳數2~20之雜芳基、-OY1基、-SY2基、-NHY3基、-NY4Y5基或-NHC(O)Y6基,又,R1~R6非為氫原子時,R1與R2、R3與R4及/或R5與R6互相鍵結可形成2價基,R7及R8各自獨立表示氫原子、可經Z1所取代之碳數1~20之烷基、可經Z1所取代之碳數2~20之烯基、可經Z1所取代之碳數2~20之炔基、可經Z3所取代之碳數6~20之芳基、可經Z3所取代之碳數2~20之雜芳基、-OY1基、-SY2基、-NHY3基、-NY4Y5基或-NHC(O)Y6基,Y1~Y6各自獨立表示可經Z1所取代之碳數1~20之烷基、可經Z1所取代之碳數2~20之烯基、可經Z1所取代之碳數2~20之炔基、可經Z2所取代之碳數6~20之芳基或可經Z2所取代之碳數2~20之雜芳基,Z1表示碳數6~20之芳基或碳數2~20之雜芳基,
Z2表示碳數1~20之烷基、碳數2~20之烯基或碳數2~20之炔基,Z3表示碳數1~20之烷基、碳數2~20之烯基、碳數2~20之炔基、各自之烷基為碳數1~20之烷基的二烷基胺基、或各自之芳基為碳數6~20之芳基的二芳基胺基,n1~n3各自獨立表示自然數,且滿足4≦n1+n2+n3≦20)。
2.如前述第1項之電荷輸送性清漆,其中上述摻雜物含有雜多酸。
3.如前述第2項之電荷輸送性清漆,其中上述雜多酸含有磷鎢酸。
4.如前述第1~3項中任一項之電荷輸送性清漆,其中上述寡噻吩衍生物為以式(2)表示,
(式中,R3~R8及n1~n3係與上述相同)。
5.如前述第1~4項中任一項之電荷輸送性清漆,其中上述有機矽烷化合物為包含選自由二烷氧基矽烷化合物、三烷氧基矽烷化合物或四烷氧基矽烷化合物之至少1種。
6.如前述第1~5項中任一項之電荷輸送性清漆,其係進一步含有式(12)表示之四氰基苯醌二甲烷(tetracyanoquinodimethane)化合物,
(式中,R101~R104各自獨立表示氫原子或鹵素原子,但至少1個為鹵素原子)。
7.如前述第1~6項中任一項之電荷輸送性清漆,其係進一步含有由芳基磺酸化合物所構成之摻雜物。
8.一種電荷輸送性薄膜,其特徵係使用如前述第1~7項中任一項之電荷輸送性清漆來製作。
9.一種有機電致發光元件,其特徵係具有如前述第8項之電荷輸送性薄膜。
10.如前述第9項之有機電致發光元件,其中上述電荷輸送性薄膜為電洞注入層或電洞輸送層。
11.一種電荷輸送性薄膜之製造方法,其特徵係將如前述第1~7項中任一項之電荷輸送性清漆塗佈於基材上,進行燒成者。
12.一種有機電致發光元件之製造方法,其特徵係使用如前述第8項之電荷輸送性薄膜。
13.一種電荷輸送性材料,其特徵係含有:由式(1)表示之寡噻吩衍生物所構成的電荷輸送性物質及摻雜物。
(式中,R1~R6各自獨立表示氫原子、可經Z1所取代之碳數1~20之烷基、可經Z1所取代之碳數2~20之烯基、可經Z1所取代之碳數2~20之炔基、可經Z2所取代之碳數6~20之芳基、可經Z2所取代之碳數2~20之雜芳基、-OY1基、-SY2基、-NHY3基、-NY4Y5基或-NHC(O)Y6基,又,R1~R6非為氫原子時,R1與R2、R3與R4及/或R5與R6互相鍵結可形成2價基,R7及R8各自獨立表示氫原子、可經Z1所取代之碳數1~20之烷基、可經Z1所取代之碳數2~20之烯基、可經Z1所取代之碳數2~20之炔基、可經Z3所取代之碳數6~20之芳基、可經Z3所取代之碳數2~20之雜芳基、-OY1基、-SY2基、-NHY3基、-NY4Y5基或-NHC(O)Y6基,Y1~Y6各自獨立表示可經Z1所取代之碳數1~20之烷基、可經Z1所取代之碳數2~20之烯基、可經Z1所取代之碳數2~20之炔基、可經Z2所取代之碳數6~20之芳基或可經Z2所取代之碳數2~20之雜芳基,Z1表示碳數6~20之芳基或碳數2~20之雜芳基,Z2表示碳數1~20之烷基、碳數2~20之烯基或碳數2~20之炔基,Z3表示碳數1~20之烷基、碳數2~20之烯基、碳數2~20之炔基、各自之烷基為碳數1~20之烷基的二烷基胺基、或各自之芳基為碳數6~20之芳基的二芳基胺基,n1~n3各自獨立表示自然數,且滿足4≦n1+n2+n3≦
20)。
藉由使用本發明之電荷輸送性清漆,以由150~230℃程度之比較低溫~高溫進行燒成時,可得到具有高平坦性及高電荷輸送性,使用於有機EL元件之電洞注入層時,可實現優異的亮度特性的薄膜。
又,藉由使用本發明之電荷輸送性清漆,即使使用旋轉塗佈法或狹縫塗佈法等、可大面積成膜之各種濕式製程時,也可再現性良好製造電荷輸送性優異的薄膜,因此,也可充分因應近年有機EL元件領域的進展。
此外,由本發明之電荷輸送性清漆所得之薄膜,也可作為防靜電膜或有機薄膜太陽能電池之陽極緩衝層等使用。
本發明之電荷輸送性清漆含有由式(1)表示之寡噻吩衍生物所構成之電荷輸送性物質。
本發明中,電荷輸送性係指與導電性同義,與電洞輸送性同義。電荷輸送性物質係可為其自身具有電荷輸送性者,亦可為與電子受容性物質一同使用時具有電荷輸送性者。電荷輸送性清漆係可為其自身具有電荷輸送
性者,亦可為藉其所得之固形膜為具有電荷輸送性者。
式中,R1~R6各自獨立表示氫原子、可經Z1所取代之碳數1~20之烷基、可經Z1所取代之碳數2~20之烯基、可經Z1所取代之碳數2~20之炔基、可經Z2所取代之碳數6~20之芳基、可經Z2所取代之碳數2~20之雜芳基、-OY1基、-SY2基、-NHY3基、-NY4Y5基或-NHC(O)Y6基,又,R1~R6非為氫原子時,R1與R2、R3與R4及/或R5與R6互相鍵結可形成2價基。
R7及R8各自獨立表示氫原子、可經Z1所取代之碳數1~20之烷基、可經Z1所取代之碳數2~20之烯基、可經Z1所取代之碳數2~20之炔基、可經Z3所取代之碳數6~20之芳基、可經Z3所取代之碳數2~20之雜芳基、-OY1基、-SY2基、-NHY3基、-NY4Y5基或-NHC(O)Y6基。
Y1~Y6各自獨立表示可經Z1所取代之碳數1~20之烷基、可經Z1所取代之碳數2~20之烯基、可經Z1所取代之碳數2~20之炔基、可經Z2所取代之碳數6~20之芳基或可經Z2所取代之碳數2~20之雜芳基。
Z1表示碳數6~20之芳基或碳數2~20之雜芳基。
Z2表示碳數1~20之烷基、碳數2~20之烯基或碳數2~20之炔基。
Z3表示碳數1~20之烷基、碳數2~20之烯基、碳數2~20之炔基、各自之烷基為碳數1~20之烷基的二烷基胺基、或各自之芳基為碳數6~20之芳基的二芳基胺基。
碳數1~20之烷基,可為直鏈狀、分支鏈狀、環狀之任一者,列舉例如:甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、s-丁基、t-丁基、n-戊基、n-己基、n-庚基、n-辛基、n-壬基、n-癸基等之碳數1~20之直鏈或分支鏈狀烷基;環丙基、環丁基、環戊基、環己基、環庚基、環辛基、環壬基、環癸基、雙環丁基、雙環戊基、雙環己基、雙環庚基、雙環辛基、雙環壬基、雙環癸基等之碳數3~20之環狀烷基等。
碳數2~20之烯基之具體例,列舉例如:乙烯基、n-1-丙烯基、n-2-丙烯基、1-甲基乙烯基、n-1-丁烯基、n-2-丁烯基、n-3-丁烯基、2-甲基-1-丙烯基、2-甲基-2-丙烯基、1-乙基乙烯基、1-甲基-1-丙烯基、1-甲基-2-丙烯基、n-1-戊烯基、n-1-癸烯基、n-1-二十烯基等。
碳數2~20之炔基之具體例,列舉例如:乙炔基、n-1-丙炔基、n-2-丙炔基、n-1-丁炔基、n-2-丁炔基、n-3-丁炔基、1-甲基-2-丙炔基、n-1-戊炔基、n-2-戊炔基、n-3-戊炔基、n-4-戊炔基、1-甲基-n-丁炔基、2-甲基-n-丁炔基、3-甲基-n-丁炔基、1,1-二甲基-n-丙炔基、n-1-己炔基、n-1-癸炔基、n-1-十五炔基、n-1-二十炔基等。
碳數6~20之芳基之具體例,列舉例如:苯基、1-萘基、2-萘基、1-蒽基、2-蒽基、9-蒽基、1-菲基、2-菲基、3-菲基、4-菲基、9-菲基等。
碳數2~20之雜芳基之具體例,列舉例如:2-噻吩基、3-噻吩基、2-呋喃基、3-呋喃基、2-噁唑基、4-噁唑基、5-噁唑基、3-異噁唑基、4-異噁唑基、5-異噁唑基、2-噻唑基、4-噻唑基、5-噻唑基、3-異噻唑基、4-異噻唑基、5-異噻唑基、2-咪唑基、4-咪唑基、2-吡啶基、3-吡啶基、4-吡啶基等。
式(1)中,R1及R2較佳為氫原子、可經Z1所取代的碳數1~20之烷基或可經Z1所取代的碳數1~20之烷氧基(亦即,Y1為可經Z1所取代的碳數1~20之烷基的-OY1基),更佳為氫原子、可經Z1所取代之碳數1~10之烷基或可經Z1所取代之碳數1~10之烷氧基,又更佳為氫原子、可經Z1所取代的碳數1~8之烷基或可經Z1所取代的碳數1~8之烷氧基,最佳為氫原子。
因此,較佳的寡噻吩衍生物,例如式(2)表示者。
(式中,R3~R8係與上述相同)。
R3~R6較佳為氫原子、可經Z1所取代之碳數
1~20之烷基或可經Z1所取代之碳數1~20之烷氧基(即,Y1為可經Z1所取代之碳數1~20之烷基的-OY1基),更佳為氫原子、可經Z1所取代之碳數1~10之烷基或可經Z1所取代之碳數1~10之烷氧基,又更佳為氫原子、可經Z1所取代之碳數1~8之烷基或可經Z1所取代之碳數1~8之烷氧基。又,R3及R4之中至少一方為可經Z1所取代之碳數1~8之烷基或可經Z1所取代之碳數1~8之烷氧基更佳。
R7及R8較佳為氫原子、-NY4Y5基、或各自之烷基為碳數1~20之烷基的二烷基胺基或各自之芳基為碳數6~20之芳基的二芳基胺基,且可經取代之碳數6~20之芳基。此時,Y4及Y5較佳為可經Z1所取代之碳數1~20之烷基或可經Z1所取代之碳數6~20之芳基,更佳為可經Z1所取代之碳數1~10之烷基或可經Z1所取代之碳數6~10之芳基。
此等中,R7及R8特佳為氫原子、各自之芳基為可經Z2所取代之碳數6~10之芳基的二芳基胺基、或各自之芳基為碳數6~20之芳基的二芳基胺基所取代的苯基,最佳為氫原子或4-二苯基胺基苯基。
又,R1~R8及Y1~Y6中,Z1較佳為碳數6~20之芳基,更佳為苯基,最佳為不存在(即,非取代)。又,Z2較佳為碳數1~20之烷基,更佳為碳數1~10之烷基,又更佳為碳數1~8之烷基,又更佳為碳數1~6之烷基,最佳為不存在(即、非取代者)。Z3較佳為碳數
1~20之烷基、各自之烷基為碳數1~20之烷基的二烷基胺基、或各自之芳基為碳數6~20之芳基的二芳基胺基,更佳為碳數1~10之烷基、各自之烷基為碳數1~10之烷基的二烷基胺基、或各自之芳基為碳數6~10之芳基的二芳基胺基,又更佳為碳數1~8之烷基、各自之烷基為碳數1~8之烷基的二烷基胺基或二苯基胺基,最佳為不存在(即、非取代者)或二苯基胺基。
式(1)及(2)中,n1~n3各自獨立表示自然數,且滿足4≦n1+n2+n3≦20。n1較佳為1~15、更佳為1~10、又更佳為2~5、又更佳為2~3。此外,n2及n3較佳為1~15、更佳為1~10、又更佳為1~5、又更佳為1~3。
又,從提高寡噻吩衍生物對有機溶劑之溶解性的觀點,n1~n3較佳為n1+n2+n3≦8、更佳為n1+n2+n3≦7、又更佳為n1+n2+n3≦6、又更佳為n1+n2+n3≦5。
以下,列舉式(1)所表示之寡噻吩衍生物的具體例,但不限於此等。又,式中,「Me」表示甲基、「Et」表示乙基、「n-Pr」表示n-丙基、「i-Pr」表示i-丙基、「n-Bu」表示n-丁基、「i-Bu」表示異丁基、「s-Bu」表示s-丁基、「t-Bu」表示t-丁基、「n-Pen」表示n-戊基、「n-Hex」表示n-己基、「n-Hep」表示n-庚基、「n-Oct」表示n-辛基、「Ph」表示苯基、「Ar1」表示4-(二苯基胺基)苯基。
在本發明使用的寡噻吩衍生物,可藉由習知的方法(例如日本特開平02-250881號公報或Chem.Eur.J.,2005,11,p.p.3742-3752中所記載的方法)來合成,亦可使用市售品。
在本發明使用的寡噻吩衍生物,具體而言,可藉由例如下述流程1或2所示的反應式來合成,又,特別是兩末端具有烷基、烯基、炔基、芳基或雜芳基的寡噻吩衍生物(式(1’)),亦可藉由下述流程3所示的反應式來合成。
(式中,Hal示為鹵素原子或擬鹵素基,R1~R8及n1~n3係表示與前述同義,nBu表示n-丁基)。
鹵素原子,列舉例如:氟原子、氯原子、溴原子、碘原子等。
擬鹵素基,列舉例如:甲烷磺醯氧基、三氟甲烷磺醯氧基、九氟丁烷磺醯氧基等之(氟)烷基磺醯氧基;苯磺
醯氧基、甲苯磺醯氧基等之芳香族磺醯氧基等。
R9及R10各自獨立表示可經Z1所取代的碳數1~20之烷基、可經Z1所取代的碳數2~20之烯基、可經Z1所取代的碳數2~20之炔基、可經Z3所取代的碳數6~20之芳基、或可經Z3所取代的碳數2~20之雜芳基,此等之具體例,可舉例與上述相同者。又,取代基Z1及Z3係表示與上述同義。
流程1(Scheme)中,式(3)~(5)表示之噻吩衍生物之投入比,通常相對於式(4)表示之噻吩衍生物時,式(3)表示之噻吩衍生物、式(5)表示之噻吩衍生物分別為0.5~1.5當量左右,但較佳為0.9~1.3當量左右。
流程2中,式(6)~(8)表示之噻吩衍生物之投入比,通常相對於式(7)表示之噻吩衍生物時,式(6)表示之噻吩衍生物、式(8)表示之噻吩衍生物分別為0.5~1.5當量左右,但較佳為0.9~1.3當量左右。
流程3中,式(9)表示之噻吩衍生物及式(10)~(11)表示之化合物之投入比,通常相對於式(9)表示之噻吩衍生物時,式(10)表示之化合物、式(11)表示之化合物分別為0.5~1.5當量左右,但較佳為0.9~1.3當量左右。
上述反應所使用的觸媒,列舉例如:氯化銅、溴化銅、碘化銅等的銅觸媒;四(三苯基膦)鈀(Pd(PPh3)4)、雙(三苯基膦)二氯化鈀
(Pd(PPh3)2Cl2)、雙(亞苄基丙酮)鈀(Pd(dba)2)、參(亞苄基丙酮)二鈀(Pd2(dba)3)、雙(三(t-丁基膦)鈀(Pd(P-t-Bu3)2)等的鈀觸媒等。此等觸媒可單獨使用,亦可組合2種以上使用。又,此等觸媒亦可與周知之適當的配位基同時使用。
觸媒之使用量係相對於式(4)、(7)或(9)表示之化合物1mol,一般為0.01~0.2mol左右,較佳為0.05mol左右。
又,使用配位基時,相對於使用的金屬錯體時,配位基之使用量可為0.1~5當量左右,較佳為1~4當量左右。
上述反應可在溶劑中進行。使用溶劑時,只要是該種類不會對於反應有不良影響者即可,無特別限定。具體例可舉例:脂肪族烴(戊烷、n-己烷、n-辛烷、n-癸烷、十氫萘等)、鹵素化脂肪族烴(氯仿、二氯甲烷、二氯乙烷、四氯化碳等)、芳香族烴(苯、硝基苯、甲苯、o-二甲苯、m-二甲苯、p-二甲苯、均三甲苯等)、鹵素化芳香族烴(氯苯、溴苯、o-二氯苯、m-二氯苯、p-二氯苯等)、醚(二乙基醚、二異丙基醚、t-丁基甲基醚、四氫呋喃、二噁烷、1,2-二甲氧乙烷、1,2-二乙氧乙烷等)、酮(丙酮、甲基乙基酮、甲基異丁基酮、二-n-丁基酮、環己酮等)、醯胺(N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等)、內醯胺及內酯類(N-甲基吡咯烷酮、γ-丁內酯等)、脲化合物(N,N-二甲基咪唑啉酮(imidazolidinone)、四甲基脲等)、亞碸(二甲基亞
碸、環丁碸等)、腈(乙腈、丙腈、丁腈等)等。此等溶劑可單獨使用,亦可混合2種以上使用。
反應溫度可於從使用之溶劑的融點至沸點的範圍內適宜設定即可,特別是以0~200℃左右為佳,更佳為20~150℃。
反應結束後,依照常法進行後處理,可得到式(1)或(1’)表示之寡噻吩衍生物。
又,上述反應使用之式(4)、(6)、(8)及(9)表示的化合物,各自依照一般的手法,使用如正丁基鋰般適當的鹼及如三丁基氯錫烷般適當的錫化合物,藉由將三丁基錫基導入至具有對應於各化合物之構造的噻吩化合物之兩末端而得到。此外,式(9)表示之化合物係藉由將三丁基錫基導入至依照流程1或2所得之寡噻吩衍生物的兩末端而得到。
另外,式(3)、(5)、(7)、(10)及(11)表示之化合物可使用市售品,也可依照一般的手法,藉由使具有對應於各化合物之構造的噻吩、烷烴、烯烴、炔烴、芳烴或雜芳烴(噻吩除外),進行鹵素化或擬鹵素化而得到。
本發明之電荷輸送性清漆含有摻雜物。摻雜物無特別限定,可使用有機系之摻雜物、無機系之摻雜物之任一。
其中,最佳的態樣,本發明之電荷輸送性清
漆含有雜多酸作為摻雜物,因此,可得到不僅顯示由銦錫氧化物(ITO)、銦鋅氧化物(IZO)所代表之透明電極之高電洞接受能,且亦顯示由鋁所代表之金屬陽極之高電洞接受能之電荷輸送性優異的薄膜。
雜多酸係指代表性以式(A1)表示之Keggin型或以式(A2)表示之Dawson型之化學結構所表示,具有雜原子位於分子中心之結構,且釩(V)、鉬(Mo)、鎢(W)等之含氧酸(oxoacid)的同素聚合酸(isopoly acid)、與異種元素之含氧酸進行縮合而成的聚酸。這種異種元素之含氧酸,主要可舉例如矽(Si)、磷(P)、砷(As)的含氧酸。
雜多酸之具體例,舉例如:磷鉬酸、矽鉬酸、磷鎢酸、矽鎢酸、磷鎢鉬酸等。此等可單獨使用,亦可組合2種以上使用。又,在本發明使用的雜多酸,可以市售品取得,又,亦可藉由習知方法來合成。
特別是摻雜物為1種類的雜多酸所構成時,其1種類的雜多酸較佳為磷鎢酸或磷鉬酸,更佳為磷鎢酸。又,摻雜物為由2種類以上的雜多酸所構成時,其2種類以上的雜多酸之至少一者,以磷鎢酸或磷鉬酸為佳,
更佳為磷鎢酸。
又,雜多酸在元素分析等的定量分析中,由一般式所示之構造,即使元素數量較多或較少者,只要是以市售品取得者,或依據習知合成方法而適當合成者時,皆可用於本發明。
亦即,例如一般磷鎢酸係以化學式H3(PW12O40)‧nH2O表示,磷鉬酸係以化學式H3(PMo12O40)‧nH2O表示,但在定量分析中,即使此式中之P(磷)、O(氧)或W(鎢)或Mo(鉬)的數量多或少者,只要是其為以市售品取得,或依據習知合成方法而適當合成者時,皆可用於本發明。此時,本發明所規定之雜多酸的質量,非指合成物或市售品中之純粹的磷鎢酸之質量(磷鎢酸含量),而是指可以市售品取得之形態及以習知合成法可分離的形態中,包含水合水或其他雜質等狀態的全質量。
本發明之電荷輸送性清漆所包含的雜多酸,以質量比表示,相對於電荷輸送性物質1,可設為1.0~70.0左右,較佳為2.0~60.0左右,更佳為2.5~55.0左右,又更佳為2.5~25.0左右。
本發明之電荷輸送性清漆所含有之有機矽烷化合物,例如有二烷氧基矽烷化合物、三烷氧基矽烷化合物或四烷氧基矽烷化合物。此等可1種單獨或2種以上組合使用。
特別是有機矽烷化合物,較佳為含有由二烷氧基矽烷化合物及三烷氧基矽烷化合物選出之1種,更佳為含有三烷氧基矽烷化合物。
二烷氧基矽烷化合物、三烷氧基矽烷化合物及四烷氧基矽烷化合物,可舉例如以式(B1)~(B3)所表示者。
SiR’2(OR)2 (B1)
SiR’(OR)3 (B2)
Si(OR)4 (B3)
式中,R各自獨立表示可經Z101取代之碳數1~20之烷基、可經Z101取代之碳數2~20之烯基、可經Z101取代之碳數2~20之炔基、可經Z102取代之碳數6~20之芳基或可經Z102取代之碳數2~20之雜芳基。
R’各自獨立表示可經Z103取代之碳數1~20之烷基、可經Z103取代之碳數2~20之烯基、可經Z103取代之碳數2~20之炔基、可經Z104取代之碳數6~20之芳基或可經Z104取代之碳數2~20之雜芳基。
Z101表示鹵素原子、可經Z105取代之碳數6~20之芳基或可經Z105取代之碳數2~20之雜芳基。
Z102表示鹵素原子、可經Z105取代之碳數1~20之烷基、可經Z105取代之碳數2~20之烯基或可經Z105取代之碳數2~20之炔基。
Z103表示鹵素原子、可經Z105取代之碳數6~20之芳基、可經Z105取代之碳數2~20之雜芳基、環氧基環己基、環氧丙氧基、甲基丙烯醯氧基、丙烯醯氧基、
脲基(-NHCONH2)、硫醇基、異氰酸酯基(-NCO)、胺基、-NHY101基或-NY102Y103基。
Z104表示鹵素原子、可經Z105取代之碳數1~20之烷基、可經Z105取代之碳數2~20之烯基、可經Z105取代之碳數2~20之炔基、環氧基環己基、環氧丙氧基、甲基丙烯醯氧基、丙烯醯氧基、脲基(-NHCONH2)、硫醇基、異氰酸酯基(-NCO)、胺基、-NHY101基或-NY102Y103基。
Y101~Y103各自獨立表示可經Z105取代之碳數1~20之烷基、可經Z105取代之碳數2~20之烯基、可經Z105取代之碳數2~20之炔基、可經Z105取代之碳數6~20之芳基或可經Z105取代之碳數2~20之雜芳基。
Z105表示鹵素原子、胺基、硝基、氰基或硫醇基。
式(B1)~(B3)中之鹵素原子、碳數1~20之烷基、碳數2~20之烯基、碳數2~20之炔基及碳數6~20之芳基,例如有與上述相同者。
R較佳為可經Z101取代之碳數1~20之烷基、可經Z101取代之碳數2~20之烯基或可經Z102取代之碳數6~20之芳基,更佳為可經Z101取代之碳數1~6之烷基、可經Z101取代之碳數2~6之烯基或可經Z102取代之苯基,又更佳為可經Z101取代之碳數1~4之烷基或可經Z102取代之苯基,又更佳為可經Z101取代之甲基或乙基。
又,R’較佳為可經Z103取代之碳數1~20之烷基或可經Z104取代之碳數6~20之芳基,更佳為可經Z103
取代之碳數1~10之烷基或可經Z104取代之碳數6~14之芳基,又更佳為可經Z103取代之碳數1~6之烷基或可經Z104取代之碳數6~10之芳基,又更佳為可經Z103取代之碳數1~4之烷基或可經Z104取代之苯基。
又,複數之R可全部相同或相異,複數之R’也可全部相同或相異。
Z101較佳為鹵素原子或可經Z105取代之碳數6~20之芳基,更佳為氟原子或可經Z105取代之苯基,最佳為不存在(即、非取代)。
又,Z102較佳為鹵素原子或可經Z105取代之碳數6~20之烷基,更佳為氟原子或可經Z105取代之碳數1~10之烷基,最佳為不存在(即、非取代)。
此外,Z103較佳為鹵素原子、可經Z105取代之苯基、可經Z105取代之呋喃基、環氧基環己基、環氧丙氧基、甲基丙烯醯氧基、丙烯醯氧基、脲基、硫醇基、異氰酸酯基、胺基、可經Z105取代之苯基胺基或可經Z104取代之二苯基胺基,更佳為鹵素原子,又更佳為氟原子或不存在(亦即,非取代)。
又,Z104較佳為鹵素原子、可經Z105取代之碳數1~20之烷基、可經Z105取代之呋喃基、環氧基環己基、環氧丙氧基、甲基丙烯醯氧基、丙烯醯氧基、脲基、硫醇基、異氰酸酯基、胺基、可經Z105取代之苯基胺基或可經Z105取代之二苯基胺基,更佳為鹵素原子,又更佳為氟原子或不存在(亦即,非取代)。
此外,Z105較佳為鹵素原子,更佳為氟原子或不存在(即、非取代)。
以下,列舉本發明可使用之有機矽烷化合物的具體例,但是不限於此等者。
二烷氧基矽烷化合物的具體例,可舉例如二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、甲基乙基二甲氧基矽烷、二乙基二甲氧基矽烷、二乙基二乙氧基矽烷、甲基丙基二甲氧基矽烷、甲基丙基二乙氧基矽烷、二異丙基二甲氧基矽烷、苯基甲基二甲氧基矽烷、乙烯基甲基二甲氧基矽烷、3-環氧丙氧基丙基甲基二甲氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、3-(3,4-環氧基環己基)乙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、3-巰基丙基甲基二甲氧基矽烷、3-胺基丙基甲基二乙氧基矽烷、N-(2-胺基乙基)胺基丙基甲基二甲氧基矽烷、3,3,3-三氟丙基甲基二甲氧基矽烷等。
三烷氧基矽烷化合物的具體例,可舉例如甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、丙基三甲氧基矽烷、丙基三乙氧基矽烷、丁基三甲氧基矽烷、丁基三乙氧基矽烷、戊基三甲氧基矽烷、戊基三乙氧基矽烷、庚基三甲氧基矽烷、庚基三乙氧基矽烷、辛基三甲氧基矽烷、辛基三乙氧基矽烷、十二烷基三甲氧基矽烷、十二烷基三乙氧基矽烷、十六基三甲氧基矽烷、十六基三乙氧基矽烷、十八烷基三甲
氧基矽烷、十八烷基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、三乙氧基(4-(三氟甲基)苯基)矽烷、十二烷基三乙氧基矽烷、3,3,3-三氟丙基三甲氧基矽烷、(三乙氧基矽烷基)環己烷、全氟辛基乙基三乙氧基矽烷、三乙氧基氟矽烷、十三氟-1,1,2,2-四氫辛基三乙氧基矽烷、五氟苯基三甲氧基矽烷、五氟苯基三乙氧基矽烷、3-(七氟異丙氧基)丙基三乙氧基矽烷、十七氟-1,1,2,2-四氫癸基三乙氧基矽烷、三乙氧基-2-噻吩基矽烷、3-(三乙氧基矽烷基)呋喃等。
四烷氧基矽烷化合物的具體例,可舉例如四甲氧基矽烷、四乙氧基矽烷、四丙氧基矽烷等。
此等之中,較佳為3,3,3-三氟丙基甲基二甲氧基矽烷、三乙氧基(4-(三氟甲基)苯基)矽烷、3,3,3-三氟丙基三甲氧基矽烷、全氟辛基乙基三乙氧基矽烷、五氟苯基三甲氧基矽烷、五氟苯基三乙氧基矽烷等。
本發明之電荷輸送性清漆中之有機矽烷化合物的含量係相對於電荷輸送性物質及摻雜物的總質量,通常為0.1~50質量%左右,但若考量抑制所得到之薄膜之電荷輸送性之降低,且提高對在電洞輸送層或發光層等之陽極相反側,以接觸電洞注入層方式予以層合之層的電洞注
入能時,較佳為0.5~40質量%左右、更佳為0.8~30質量%左右、又更佳為1~20質量%左右。
調製電荷輸送性清漆時所用的有機溶劑,可使用可良好溶解電荷輸送性物質、摻雜物及有機矽烷化合物的高溶解性溶劑。
這種高溶解性溶劑,可使用例如N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮、1,3-二甲基-2-咪唑啉酮、二乙二醇單甲基醚等的有機溶劑。此等溶劑可單獨使用1種或2種以上混合使用,其使用量係相對於清漆所使用的溶劑全體,可為5~100質量%。
又,電荷輸送性物質及摻雜物皆完全溶解於上述溶劑較佳。
又,本發明中,藉由使清漆含有至少1種在25℃下具有10~200mPa.s、特別是35~150mPa.s之黏度,且在常壓(大氣壓)下沸點為50~300℃、特別是150~250℃之高黏度的有機溶劑,清漆之黏度的調整變得容易,結果,可再現性良好提供平坦性高之薄膜,可因應使用的塗佈方法調製清漆。
高黏度有機溶劑無特別限定,可舉例如環己醇、乙二醇、乙二醇二縮水甘油醚、1,3-辛二醇、二乙二醇、二丙二醇、三乙二醇、三丙二醇、1,3-丁二醇、2,3-丁二醇、1,4-丁二醇、丙二醇、己二醇等。此等溶劑可單
獨使用1種或混合2種以上使用。
高黏度有機溶劑相對於本發明之清漆所使用之溶劑全體的添加比例,較佳為固體不析出的範圍內,在固體不析出的範圍內,添加比例較佳為5~80質量%。
此外,為了提高對基板之濕潤性、調整溶劑之表面張力、調整極性、調整沸點等之目的,相對於清漆所使用之溶劑全體,較佳為混合1~90質量%、更佳為混合1~50質量%之比例的其他的溶劑。
這種溶劑,可舉例如乙二醇單丁基醚、二乙二醇二乙基醚、二乙二醇二甲基醚、二乙二醇單乙基醚乙酸酯、二乙二醇單丁基醚乙酸酯、二丙二醇單甲基醚、丙二醇單甲基醚乙酸酯、二乙二醇單乙基醚、二丙酮醇、γ-丁內酯、乙基乳酸酯、n-己基乙酸酯、丙二醇單甲基醚等,但不限於此等。此等溶劑可1種單獨使用或混合2種以上使用。
本發明之清漆之黏度係配合製作之薄膜的厚度等或固體成分濃度適宜設定者,但通常在25℃下為1~50mPa.s。
又,本發明中之電荷輸送性清漆之固體成分濃度係考量清漆之黏度及表面張力等或製作之薄膜之厚度等而適宜設定者,但通常為0.1~10.0質量%左右,若考量提升清漆之塗佈性時,較佳為0.5~5.0質量%、更佳為1.0~3.0質量%。
本發明之電荷輸送性清漆,較佳為含有式(12)表示之四氰基苯醌二甲烷(tetracyanoquinodimethane)化合物。藉由含有四氰基苯醌二甲烷化合物,將所得之薄膜作為電洞注入層使用時,提高元件的壽命,且進一步提高其亮度等之特性。又,將清漆進行低溫燒成時,也可再現性良好製造高平坦性及高電荷輸送性的薄膜。
式中,R101~R104各自獨立表示氫原子或鹵素原子,但至少1個為鹵素原子。鹵素原子例如有與上述相同者,較佳為氟原子或氯原子,更佳為氟原子。又,R101~R104之至少2個為鹵素原子為佳,至少3個為鹵素原子更佳,全部為鹵素原子則最佳。
四氰基苯醌二甲烷化合物,具體而言,例如有四氟四氰基苯醌二甲烷(F4TCNQ)、四氯四氰基苯醌二甲烷、2-氟四氰基苯醌二甲烷、2-氯四氰基苯醌二甲烷、2,5-二氟四氰基苯醌二甲烷、2,5-二氯四氰基苯醌二甲烷等。四氰基苯醌二甲烷化合物,特佳為F4TCNQ。
本發明之電荷輸送性清漆中之四氰基苯醌二甲烷化合物之含量係相對於噻吩衍生物,較佳為0.0001~1當量、更佳為0.001~0.5當量、又更佳為0.01~0.2當量。
本發明之電荷輸送性清漆,除上述寡噻吩衍生物外,在不妨礙本發明之效果的範圍內,也可含有其他的電荷輸送性物質。又,本發明之電荷輸送性清漆可含有其他的物質,取代作為摻雜物之上述雜多酸。
其他的電荷輸送性物質,列舉例如:日本特開第2002-151272號公報記載的寡苯胺衍生物、國際公開第2004/105446號記載的寡苯胺化合物、國際公開第2005/043962號記載的具有1,4-二噻哌喃環(1,4-dithiin ring)的化合物、國際公開第2008/032617號記載的寡苯胺化合物、國際公開第2008/032616號記載的寡苯胺化合物、國際公開第2013/042623號記載的芳基二胺化合物等。
特別是其他電荷輸送性物質,較佳為苯胺衍生物,考量對有機溶劑之溶解性時,該分子量較佳為4000以下,更佳為3000以下,又更佳為2000以下。
本發明中,適合作為其他電荷輸送性物使用的苯胺衍生物,列舉例如式(13)表示者。
B1表示單鍵、-NH-、-CH2-、-S-或-O-,較佳為單鍵或-NH-。
R201~R206各自獨立表示氫原子、鹵素原子、可經Z201所取代的碳數1~20之烷基、可經Z201所取代的碳數2~20之烯基、可經Z201所取代的碳數2~20之炔基、可經Z202所取代的碳數6~20之芳基、可經Z202所取代的碳數2~20之雜芳基、-OY201基、-SY202基、-NHY203、-NY204Y205基或-NHC(O)Y206基。Y201~Y206各自獨立表示可經Z201所取代的碳數1~20之烷基、可經Z201所取代的碳數2~20之烯基、可經Z201所取代的碳數2~20之炔基、可經Z202所取代的碳數6~20之芳基、或可經Z202所取代的碳數2~20之雜芳基。這種鹵素原子、烷基、烯基、炔基、芳基及雜芳基之具體例,可舉例與上述相同者。
Z201表示鹵素原子、硝基、氰基、醛基、羥基、硫醇基、磺酸基、羧酸基、可經Z203所取代之碳數6~20之芳基或可經Z203所取代之碳數2~20之雜芳基。
Z202表示鹵素原子、硝基、氰基、醛基、羥基、硫醇基、磺酸基、羧酸基、可經Z203所取代之碳數1~20之烷基、可經Z203所取代之碳數2~20之烯基或Z203所取代之碳數2~20之炔基。
Z203表示鹵素原子、硝基、氰基、醛基、羥基、硫醇基、磺酸基或羧酸基。
R201~R204較佳為氫原子、鹵素原子、可經Z201
所取代之碳數1~20之烷基、可經Z202所取代之碳數6~20之芳基、可經Z201所取代之碳數1~20之烷氧基(即、Y201為可經Z201所取代之碳數1~20之烷基的-OY201基),更佳為氫原子、氟原子、可經Z201所取代之碳數1~10之烷基、可經Z202所取代之碳數6~14之芳基、可經Z201所取代之碳數1~10之烷氧基,又更佳為氫原子、氟原子、可經Z201所取代之碳數1~6之烷基、可經Z202所取代之6~10之芳基、可經Z201所取代之碳數1~6之烷氧基,又更佳為氫原子、氟原子、可經Z201所取代之碳數1~6之烷基、可經Z201所取代之碳數1~6之烷氧基,最佳為氫原子。
此外,R205及R206較佳為氫原子、鹵素原子、各自之烷基為可經Z201所取代之碳數1~20之烷基的二烷基胺基(即、Y204及Y205為可經Z201所取代之碳數1~20之烷基的-NY204Y205基)、或各自之芳基為可經Z202所取代之碳數6~20之芳基的二芳基胺基(即、Y204及Y205為可經Z201所取代之碳數6~20之芳基的-NY204Y205基),更佳為氫原子、氟原子、各自之烷基為可經Z201所取代之碳數1~20之烷基的二烷基胺基、或各自之芳基為可經Z202所取代之碳數6~20之芳基的二芳基胺基,又更佳為氫原子、各自之芳基為可經Z202所取代之碳數6~20之芳基的二芳基胺基,又更佳為同時氫原子或各自之芳基為可經Z202所取代之碳數6~20之芳基的二芳基胺基。
式(13)中,p及q各自獨立表示0以上之整
數,且滿足2≦p+q≦20,較佳為2≦p+q≦8、更佳為2≦p+q≦6、又更佳為2≦p+q≦4。
特別是R201~R206及Y201~Y206中,Z201較佳為碳數6~20之芳基,更佳為苯基,最佳為不存在(即、非取代)。又,Z202較佳為碳數1~20之烷基,更佳為碳數1~10之烷基,又更佳為碳數1~8之烷基,又更佳為碳數1~6之烷基,最佳為不存在(即、非取代)。
以下,本發明中,列舉適合作為其他之電荷輸送性物質之苯胺衍生物的具體例,但是不限於此等。
另外,成為摻雜物之其他的物質,可舉出如苯磺酸、對甲苯磺酸(tosic acid)、p-苯乙烯磺酸、2-萘磺酸、4-羥基苯磺酸、5-磺基水楊酸(Sulfosalicylic Acid)、p-十二基苯磺酸、二己基苯磺酸、2,5-二己基苯磺酸、二丁基萘磺酸、6,7-二丁基-2-萘磺酸、十二基萘磺酸、3-十二基-2-萘磺酸、己基萘磺酸、4-己基-1-萘磺酸、辛基萘磺酸、2-辛基-1-萘磺酸、己基萘磺酸、7-己基
-1-萘磺酸、6-己基-2-萘磺酸、二壬基萘磺酸、2,7-二壬基-4-萘磺酸、二壬基萘二磺酸、2,7-二壬基-4,5-萘二磺酸、國際公開第2005/000832號中記載之1,4-苯并二噁烷二磺酸化合物、國際公開第2006/025342號中記載之芳基磺酸化合物、國際公開第2009/096352號中記載之芳基磺酸化合物、聚苯乙烯磺酸等之芳基碸化合物;10-樟腦磺酸等之非芳基碸化合物;7,7,8,8-四氰基醌二甲烷(TCNQ)、2,3-二氯-5,6-二氰基-1,4-苯醌(DDQ)等之有機氧化劑。
此等當中,成為摻雜劑之其他物質,較佳為芳基磺酸化合物,考量對有機溶劑之溶解性時,其分子量較佳為3000以下,更佳為2000以下,又更佳為1000以下。
本發明中,適合作為摻雜劑使用的芳基磺酸化合物,列舉例如式(14)或(15)表示者。
式(14)中,A1表示-O-或-S-,較佳為-O-。A2表示萘環或蒽環,較佳為萘環。A3表示二~四價的全氟聯苯基,j表示A1與A3之鍵結數,並滿足2≦j≦4的整數,A3為二價的全氟聯苯基,較佳為全氟聯苯基-4,4-二基,且j為2較佳。m表示鍵結於A2的磺酸基數,並為
滿足1≦m≦4之整數,但較佳為2。
式(15)中,A4~A8各自獨立表示氫原子、鹵素原子、氰基、碳數1~20之烷基、碳數1~20之鹵素化烷基或碳數2~20之鹵素化烯基,A4~A8中至少3個為鹵素原子。k表示鍵結於萘環的磺酸基數,並為滿足1≦k≦4之整數,但較佳為2~4,更佳為2。
碳數1~20之鹵素化烷基,可舉例如三氟甲基、2,2,2-三氟乙基、1,1,2,2,2-五氟乙基、3,3,3-三氟丙基、2,2,3,3,3-五氟丙基、1,1,2,2,3,3,3-七氟丙基、4,4,4-三氟丁基、3,3,4,4,4-五氟丁基、2,2,3,3,4,4,4-七氟丁基、1,1,2,2,3,3,4,4,4-九氟丁基等。碳數2~20之鹵素化烯基,可舉例如全氟乙烯基、1-全氟丙烯基、全氟烯丙基、全氟丁烯基等。
鹵素原子、碳數1~20之烷基之例,可舉例與上述為相同者,鹵素原子較佳為氟原子。
此等之中,A4~A8較佳為氫原子、鹵素原子、氰基、碳數1~10之烷基、碳數1~10之鹵素化烷基或碳數2~10之鹵素化烯基,且A4~A8中至少3個為氟原子,更佳為氫原子、氟原子、氰基、碳數1~5之烷基、碳數1~5之氟化烷基或碳數2~5之氟化烯基,且A4~A8中至少3個為氟原子,又更佳為氫原子、氟原子、氰基、碳數1~5之全氟烷基或碳數1~5之全氟烯基,且A4、A5及A8為氟原子。
又,全氟烷基係指烷基之全數氫原子經氟原
子所取代之基,全氟烯基係指烯基之全數氫原子經氟原子所取代之基。
舉例適合作為本發明之摻雜物之芳基磺酸化合物的具體例,但並不限定於此等。
本發明之電荷輸送性材料係含有由式(1)表示之寡噻吩衍生物所構成之電荷輸送性物質與摻雜物。這種電荷輸送性材料顯示對有機溶劑之良好的溶解性,如上述,藉由使該電荷輸送性材料溶解於有機溶劑,可容易製造電荷輸送性清漆。
將本發明之電荷輸送性清漆塗佈於基材上,經燒成可在基材上形成電荷輸送性薄膜。
清漆之塗佈方法無特別限定,例如有浸漬
法、旋轉塗佈法、轉印印刷法、輥塗法、刷毛塗佈、噴墨法、噴霧法等,配合塗佈方法調節清漆黏度及表面張力較佳。
又,使用本發明之清漆時,燒成環境也無特別限定,不僅在大氣環境,即使在氮等之惰性氣體或真空中,也可得到具有均勻的成膜面及高的電荷輸送性的薄膜。
燒成溫度考量取得之薄膜的用途、賦予所得之薄膜之電荷輸送性的程度等,可適宜設定在100~260℃之範圍內者,但所得之薄膜作為有機EL元件之電洞注入層使用時,較佳為140~250℃程度,更佳為145~240℃程度。
本發明之清漆之特徵之一為可在未達200℃之低溫下燒成的特徵,即使這種燒成條件下所製作的薄膜也具有高平坦性及高電荷輸送性。
又,燒成時,為了展現更高的均勻成膜性或使在基材上進行反應之目的,可施予2階段以上的溫度變化。加熱使用例如加熱板或烤箱等適當的機器進行即可。
電荷輸送性薄膜之膜厚並無特別限定,作為有機EL元件內之電洞注入層使用時,較佳為5~200nm。使膜厚變化的方法,例如有使清漆中之固體成分濃度變化,或使塗佈時之基板上的溶液量變化等的方法。
使用本發明之電荷輸送性清漆,製作OLED元件時之使用材料或製作方法,可舉出如下述者,但不限於此等。
使用之電極基板,以預先藉由洗劑、醇、純水等之液體洗淨使其淨化為佳,例如陽極基板,在使用之前進行UV臭氧處理、氧-電漿處理等之表面處理為佳。但陽極材料以有機物為主成分時,亦可不施行表面處理。
具有由本發明之電荷輸送性清漆而得之薄膜所構成的電洞注入層之OLED元件之製作方法例,如以下所示。
藉由上述方法,於陽極基板上塗佈本發明之電荷輸送性清漆,經燒成,在電極上製作電洞注入層。將此導入於真空蒸鍍裝置內,依序蒸鍍電洞輸送層、發光層、電子輸送層、電子輸送層/電洞阻隔層、電子注入層、陰極金屬,作成OLED元件。此外,因應必要亦可在發光層與電洞輸送層之間設置電子阻隔層。
陽極材料可列舉如由銦錫氧化物(ITO)、銦鋅氧化物(IZO)所代表之透明電極、由鋁所代表之金屬或此等之合金等所構成之金屬陽極,較佳為進行平坦化處理者。亦可使用具有高電荷輸送性之聚噻吩衍生物或聚苯胺衍生物。
此外,構成金屬陽極之其他金屬,可列舉如鈧、鈦、釩、鉻、錳、鐵、鈷、鎳、銅、鋅、鎵、釔、鋯、鈮、鉬、釕、銠、鈀、鎘、銦、鈧、鑭、鈰、鐠、釹、鉅、釤、銪、釓、鋱、鏑、鈥、鉺、銩、鐿、鉿、
鉈、鎢、錸、鋨、銥、鉑、金、鈦、鉛、鉍或此等之合金等,但不限於此等。
形成電洞輸送層的材料,可列舉例如(三苯基胺)二聚物衍生物、[(三苯基胺)二聚物]螺二聚物、N,N’-雙(萘-1-基)-N,N’-雙(苯基)-聯苯胺(α-NPD)、N,N’-雙(萘-2-基)-N,N’-雙(苯基)-聯苯胺、N,N’-雙(3-甲基苯基)-N,N’-雙(苯基)-聯苯胺、N,N’-雙(3-甲基苯基)-N,N’-雙(苯基)-9,9-螺二茀、N,N’-雙(萘-1-基)-N,N’-雙(苯基)-9,9-螺二茀、N,N’-雙(3-甲基苯基)-N,N’-雙(苯基)-9,9-二甲基-茀、N,N’-雙(萘-1-基)-N,N’-雙(苯基)-9,9-二甲基-茀、N,N’-雙(3-甲基苯基)-N,N’-雙(苯基)-9,9-二苯基-茀、N,N’-雙(萘-1-基)-N,N’-雙(苯基)-9,9-二苯基-茀、N,N’-雙(萘-1-基)-N,N’-雙(苯基)-2,2’-二甲基聯苯胺、2,2’,7,7’-四(N,N-二苯基胺基)-9,9-螺二茀、9,9-雙[4-(N,N-雙-聯苯基-4-基-胺基)苯基]-9H-茀、9,9-雙[4-(N,N-雙-萘-2-基-胺基)苯基]-9H-茀、9,9-雙[4-(N-萘-1-基-N-苯基胺基)-苯基]-9H-茀、2,2’,7,7’-四[N-萘基(苯基)-胺基]-9,9-螺二茀、N,N’-雙(菲-9-基)-N,N’-雙(苯基)-聯苯胺、2,2’-雙[N,N-雙(聯苯基-4-基)胺基]-9,9-螺二茀、2,2’-雙(N,N-二苯基胺基)-9,9-螺二茀、二-[4-(N,N-二(p-甲苯基)胺基)-苯基]環己烷、2,2’,7,7’-四(N,N-二(p-甲苯基)胺基)-9,9-螺二茀、N,N,N’,N’-四-萘-2-基-聯苯胺、N,N,N’,N’-四-(3-甲基苯基)-3,3’-
二甲基聯苯胺、N,N’-二(萘基)-N,N’-二(萘-2-基)-聯苯胺、N,N,N’,N’-四(萘基)-聯苯胺、N,N’-二(萘-2-基)-N,N’-二苯基聯苯胺-1,4-二胺、N1,N4-二苯基-N1,N4-二(m-甲苯基)苯-1,4-二胺、N2,N2,N6,N6-四苯基萘-2,6-二胺、三(4-(喹啉-8-基)苯基)胺、2,2’-雙(3-(N,N-二(p-甲苯基)胺基)苯基)聯苯、4,4’,4”-三[3-甲基苯基(苯基)胺基]三苯基胺(m-MTDATA)、4,4’,4”-三[1-萘基(苯基)胺基]三苯基胺(1-TNATA)等之三芳基胺類、5,5”-雙-{4-[雙(4-甲基苯基)胺基]苯基}-2,2’:5’,2”-三聯噻吩(BMA-3T)等的寡噻吩類等。
形成發光層之材料,可列舉如參(8-羥基喹啉)鋁(III)(Alq3)、雙(8-羥基喹啉)鋅(II)(Znq2)、雙(2-甲基-8-羥基喹啉)-4-(p-苯基苯酚根)鋁(III)(BAlq)、4,4’-雙(2,2-二苯基乙烯基)聯苯、9,10-二(萘-2-基)蒽、2-t-丁基-9,10-二(萘-2-基)蒽、2,7-雙[9,9-二(4-甲基苯基)-茀-2-基]-9,9-二(4-甲基苯基)茀、2-甲基-9,10-雙(萘-2-基)蒽、2-(9,9-旋環雙茀-2-基)-9,9-旋環雙茀、2,7-雙(9,9-旋環雙茀-2-基)-9,9-旋環雙茀、2-[9,9-二(4-甲基苯基)-茀-2-基]-9,9-二(4-甲基苯基)茀、2,2’-二芘基-9,9-旋環雙茀、1,3,5-參(芘-1-基)苯、9,9-雙[4-(芘基)苯基]-9H-茀、2,2’-聯(9,10-二苯基蒽)、2,7-二芘基-9,9-旋環雙茀、1,4-二(芘-1-基)苯、1,3-二(芘-1-基)苯、6,13-二(聯苯-4-基)稠五苯、3,9-二(萘-2-基)苝、3,10-二(萘-2-基)
苝、參[4-(芘基)-苯基]胺、10,10’-二(聯苯-4-基)-9,9’-雙蒽、N,N’-二(萘-1-基)-N,N’-二苯基-[1,1’:4’,1”:4”,1”‘-四聯苯基]-4,4”‘-二胺、4,4’-二[10-(萘-1-基)蒽-9-基]聯苯、二苯並{[f,f’]-4,4’,7,7’-四苯基}二茚基[1,2,3-cd:1’,2’,3’-lm]苝、1-(7-(9,9’-雙蒽-10-基)-9,9-二甲基-9H-茀-2-基)芘、1-(7-(9,9’-雙蒽-10-基)-9,9-二己基-9H-茀-2-基)芘、1,3-雙(咔唑-9-基)苯、1,3,5-參(咔唑-9-基)苯、4,4’,4”-參(咔唑-9-基)三苯基胺、4,4’-雙(咔唑-9-基)聯苯(CBP)、4,4’-雙(咔唑-9-基)-2,2’-二甲基聯苯、2,7-雙(咔唑-9-基)-9,9-二甲基茀、2,2’,7,7’-肆(咔唑-9-基)-9,9-旋環雙茀、2,7-雙(咔唑-9-基)-9,9-二(p-甲苯基)茀、9,9-雙[4-(咔唑-9-基)-苯基]茀、2,7-雙(咔唑-9-基)-9,9-旋環雙茀、1,4-雙(三苯基矽烷基)苯、1,3-雙(三苯基矽烷基)苯、雙(4-N,N-二乙基胺基-2-甲基苯基)-4-甲基苯基甲烷、2,7-雙(咔唑-9-基)-9,9-二辛基茀、4,4”-二(三苯基矽烷基)-p-三聯苯、4,4’-二(三苯基矽烷基)聯苯、9-(4-t-丁基苯基)-3,6-雙(三苯基矽烷基)-9H-咔唑、9-(4-t-丁基苯基)-3,6-二(三苯甲基)-9H-咔唑、9-(4-t-丁基苯基)-3,6-雙(9-(4-甲氧基苯基)-9H-茀-9-基)-9H-咔唑、2,6-雙(3-(9H-咔唑-9-基)苯基)吡啶、三苯基(4-(9-苯基-9H-茀-9-基)苯基)矽烷、9,9-二甲基-N,N-二苯基-7-(4-(1-苯基-1H-苯並[d]咪唑-2-基)苯基)-9H-茀-2-胺、3,5-雙(3-(9H-咔唑-9-基)苯基)吡
啶、9,9-旋環雙茀-2-基-二苯基-膦氧化物、9,9’-(5-(三苯基矽烷基)-1,3-伸苯基)雙(9H-咔唑)、3-(2,7-雙(二苯基磷醯基)-9-苯基-9H-茀-9-基)-9-苯基-9H-咔唑、4,4,8,8,12,12-六(p-甲苯基)-4H-8H-12H-12C-氮雜二苯並[cd,mn]芘、4,7-二(9H-咔唑-9-基)-1,10-啡啉、2,2’-雙(4-(咔唑-9-基)苯基)聯苯、2,8-雙(二苯基磷醯基)二苯並[b,d]噻吩、雙(2-甲基苯基)二苯基矽烷、雙[3,5-二(9H-咔唑-9-基)苯基]二苯基矽烷、3,6-雙(咔唑-9-基)-9-(2-乙基-己基)-9H-咔唑、3-(二苯基磷醯基)-9-(4-(二苯基磷醯基)苯基)-9H-咔唑、3,6-雙[(3,5-二苯基)苯基]-9-苯基咔唑等,且亦可藉由與發光性摻雜物共蒸鍍形成發光層。
發光性摻雜物可列舉如3-(2-苯並噻唑基)-7-(二乙基胺基)香豆素、2,3,6,7-四氫-1,1,7,7-四甲基-1H,5H,11H-10-(2-苯並噻唑基)喹嗪并(quinolizino)[9,9a,1gh]香豆素、喹吖啶酮、N,N’-二甲基-喹吖啶酮、三(2-苯基吡啶)銥(III)(Ir(ppy)3)、雙(2-苯基吡啶)(乙醯丙酮)(Acetylacetonate)銥(III)(Ir(ppy)2(acac))、三[2-(p-甲苯基)吡啶]銥(III)(Ir(mppy)3)、9,10-雙[N,N-二(p-甲苯基)胺基]蒽、9,10-雙[苯基(m-甲苯基)胺基]蒽、雙[2-(2-羥基苯基)苯並噻唑(thiazolato)]鋅(II)、N10,N10,N10,N10-四(p-甲苯基)-9,9’-聯蒽(bianthracene)-10,10’-二胺、N10,N10,N10,N10-四苯基-9,9’-聯蒽-10,10’-二胺、N10,N10-二
苯基-N10,N10-二萘基-9,9’-聯蒽-10,10’-二胺、4,4’-雙(9-乙基-3-咔唑伸乙烯基)-1,1’-聯苯、苝、2,5,8,11-四-t-丁基苝、1,4-雙[2-(3-N-乙基咔唑基)乙烯基]苯、4,4’-雙[4-(二-p-甲苯基胺基)苯乙烯基]聯苯、4-(二-p-甲苯基胺基)-4’-[(二-p-甲苯基胺基)苯乙烯基]茋、雙[3,5-二氟-2-(2-吡啶基)苯基-(2-羧基吡啶基)]銥(III)、4,4’-雙[4-(二苯基胺基)苯乙烯基]聯苯、雙(2,4-二氟苯基吡啶)四(1-吡唑基)硼酸酯銥(III)、N,N’-雙(萘-2-基)-N,N’-雙(苯基)-三(9,9-二甲基伸茀基)、2,7-雙{2-[苯基(m-甲苯基)胺基]-9,9-二甲基-茀-7-基}-9,9-二甲基-茀、N-(4-((E)-2-(6((E)-4-(二苯基胺基)苯乙烯基)萘-2-基)乙烯基)苯基)-N-苯基苯胺、fac-銥(III)參(1-苯基-3-甲基苯並咪唑啉-2-亞基-C,C2)、mer-銥(III)參(1-苯基-3-甲基苯並咪唑啉-2-亞基-C,C2)、2,7-雙[4-(二苯基胺基)苯乙烯基]-9,9-旋環二茀、6-甲基-2-(4-(9-(4-(6-甲基苯並[d]噻唑-2-基)苯基)蒽-10-基)苯基)苯並[d]噻唑、1,4-二[4-(N,N-二苯基)胺基]苯乙烯基苯、1,4-雙(4-(9H-咔唑-9-基)苯乙烯基)苯、(E)-6-(4-(二苯基胺基)苯乙烯基)-N,N-二苯基萘-2-胺、雙(2,4-二氟苯基吡啶)(5-(吡啶-2-基)-1H-四唑)銥(III)、雙(3-三氟甲基-5-(2-吡啶基)吡唑)((2,4-二氟苄基)二苯基亞膦酸酯)銥(III)、雙(3-三氟甲基-5-(2-吡啶基)吡唑)(苄基二苯基亞膦酸酯)銥(III)、雙(1-(2,4-二氟苄
基)-3-甲基苯並咪唑鎓)(3-(三氟甲基)-5-(2-吡啶基)-1,2,4-三唑)銥(III)、雙(3-三氟甲基-5-(2-吡啶基)吡唑)(4’,6’-二氟苯基吡啶酯)銥(III)、雙(4’,6’-二氟苯基吡啶)(3,5-雙(三氟甲基)-2-(2’-吡啶基)吡咯)銥(III)、雙(4’,6’-二氟苯基吡啶)(3-(三氟甲基)-5-(2-吡啶基)-1,2,4-三唑)銥(III)、(Z)-6-三甲苯基-N-(6-三甲苯基(Mesityl)喹啉-2(1H)-亞基)喹啉-2-胺-BF2、(E)-2-(2-(4-(二甲基胺基)苯乙烯基)-6-甲基-4H-吡喃-4-亞基)丙二腈、4-(二氰基亞甲基)-2-甲基-6-久洛尼定基-9-烯基-4H-吡喃、4-(二氰基亞甲基)-2-甲基-6-(1,1,7,7-四甲基久洛尼定基-9-烯基)-4H-吡喃、4-(二氰基亞甲基)-2-t-丁基-6-(1,1,7,7-四甲基久洛尼定-4-基-乙烯基)-4H-吡喃、三(二苯甲醯基甲烷)菲繞啉銪(III)、5,6,11,12-四苯基並四苯、雙(2-苯並[b]噻吩-2-基-吡啶)(乙醯丙酮)銥(III)、三(1-苯基異喹啉)銥(III)、雙(1-苯基異喹啉)(乙醯丙酮)銥(III)、雙[1-(9,9-二甲基-9H-茀-2-基)-異喹啉](乙醯丙酮)銥(III)、雙[2-(9,9-二甲基-9H-茀-2-基)喹啉](乙醯丙酮)銥(III)、三[4,4’-二-t-丁基-(2,2’)-二吡啶]釕(III).雙(六氟磷酸酯)、三(2-苯基喹啉)銥(III)、雙(2-苯基喹啉)(乙醯丙酮)銥(III)、2,8-二-t-丁基-5,11-雙(4-t-丁基苯基)-6,12-二苯基並四苯(tetracene)、雙(2-苯基苯並噻唑)(乙醯丙酮)銥(III)、5,10,15,20-四苯基四苯並卟啉白
金、鋨(II)雙(3-三氟甲基-5-(2-吡啶)-吡唑)二甲基苯基膦、鋨(II)雙(3-(三氟甲基)-5-(4-t-丁基吡啶基)-1,2,4-三唑)二苯基甲基膦、鋨(II)雙(3-(三氟甲基)-5-(2-吡啶基)-1,2,4-三唑)二甲基苯基膦、鋨(II)雙(3-(三氟甲基)-5-(4-t-丁基吡啶基)-1,2,4-三唑)二甲基苯基膦、雙[2-(4-n-己基苯基)喹啉](乙醯丙酮)銥(III)、三[2-(4-n-己基苯基)喹啉]銥(III)、三[2-苯基-4-甲基喹啉]銥(III)、雙(2-苯基喹啉)(2-(3-甲基苯基)吡啶酯)銥(III)、雙(2-(9,9-二乙基-茀-2-基)-1-苯基-1H-苯並[d]咪唑(imidazolato)(乙醯丙酮)銥(III)、雙(2-苯基吡啶)(3-(吡啶-2-基)-2H-色烯-2-歐尼(onate))銥(III)、雙(2-苯基喹啉)(2,2,6,6-四甲基庚烷-3,5-二歐尼)銥(III)、雙(苯基異喹啉)(2,2,6,6-四甲基庚烷-3,5-二歐尼)銥(III)、銥(III)雙(4-苯基噻吩並[3,2-c]吡啶-N,C2)乙醯丙酮、(E)-2-(2-t-丁基-6-(2-(2,6,6-三甲基-2,4,5,6-四氫-1H-吡咯并[3,2,1-ij]喹啉-8-基)乙烯基)-4H-吡喃-4-亞基)丙二腈、雙(3-三氟甲基-5-(1-異喹啉基)吡唑)(甲基二苯基膦)釕、雙[(4-n-己基苯基)異喹啉](乙醯丙酮)銥(III)、白金(II)八乙基卟吩、雙(2-甲基二苯並[f,h]喹喔啉)(乙醯丙酮)銥(III)、三[(4-n-己基苯基)羥基喹啉]銥(III)等。
形成電子輸送層/電洞阻隔層的材料,可列舉
例如8-羥基喹啉-鋰、2,2’,2”-(1,3,5-苄基甲苯基)-三(1-苯基-1-H-苯並咪唑)、2-(4-聯苯基)5-(4-t-丁基苯基)-1,3,4-噁二唑、2,9-二甲基-4,7-二苯基-1,10-菲繞啉、4,7-二苯基-1,10-菲繞啉、雙(2-甲基-8-喹啉)-4-(苯基苯酚(phenolato))鋁、1,3-雙[2-(2,2’-二吡啶-6-基)-1,3,4-噁二唑-5-基]苯、6,6’-雙[5-(聯苯-4-基)-1,3,4-噁二唑-2-基]-2,2’-二吡啶、3-(4-聯苯基)-4-苯基-5-t-丁基苯基-1,2,4-三唑、4-(萘-1-基)-3,5-二苯基-4H-1,2,4-三唑、2,9-雙(萘-2-基)-4,7-二苯基-1,10-菲繞啉、2,7-雙[2-(2,2’-二吡啶-6-基)-1,3,4-噁二唑-5-基]-9,9-二甲基茀、1,3-雙[2-(4-t-丁基苯基)-1,3,4-噁二唑-5-基]苯、三(2,4,6-三甲基-3-(吡啶-3-基)苯基)硼烷、1-甲基-2-(4-(萘-2-基)苯基)-1H-咪唑[4,5f][1,10]菲繞啉、2-(萘-2-基)-4,7-二苯基-1,10-菲繞啉、苯基-二芘基膦氧化物、3,3’,5,5’-四[(m-吡啶基)-苯-3-基]聯苯、1,3,5-三[(3-吡啶基)-苯-3-基]苯、4,4’-雙(4,6-二苯基-1,3,5-三嗪-2-基)聯苯、1,3-雙[3,5-二(吡啶-3-基)苯基]苯、雙(10-羥基苯並[h]喹啉)鈹、二苯基雙(4-(吡啶-3-基)苯基)矽烷、3,5-二(芘-1-基)吡啶等。
形成電子注入層的材料,可列舉出如氧化鋰(Li2O)、氧化鎂(MgO)、氧化鋁(Al2O3)、氟化鋰(LiF)、氟化鈉(NaF)、氟化鎂(MgF2)、氟化銫(CsF)、氟化鍶(SrF2)、三氧化鉬(MoO3)、鋁、Li(acac)、乙酸鋰、苯甲酸鋰等。
陰極材料,可列舉出如鋁、鎂-銀合金、鋁-鋰合金、鋰、鈉、鉀、銫等。
形成電子阻隔層的材料,可列舉出如三(苯基吡唑)銥等。
使用本發明之電荷輸送性清漆之PLED元件的製作方法,無特別限定,可舉出如以下的方法。
在上述OLED元件製作中,取代進行電洞輸送層、發光層、電子輸送層、電子注入層之真空蒸鍍操作,而藉由依序形成電洞輸送性高分子層、發光性高分子層,可製作具有以本發明之電荷輸送性清漆形成之電荷輸送性薄膜的PLED元件。
具體而言,於陽極基板上塗佈本發明之電荷輸送性清漆,藉由上述方法製作電洞注入層,於其上依序形成電洞輸送性高分子層、發光性高分子層,並再蒸鍍陰極電極而作成PLED元件。
使用之陰極及陽極材料,可使用與上述OLED元件製作時相同者,並能進行相同的洗淨處理、表面處理。
電洞輸送性高分子層及發光性高分子層之形成法,可列舉例如對電洞輸送性高分子材料或發光性高分子材料、或對此等添加摻雜物之材料加入溶劑使其溶解,或均勻分散,而塗佈於電洞注入層或電洞輸送性高分子層上後,分別進行燒成而成膜的方法。
電洞輸送性高分子材料,可舉出如聚[(9,9-
二己基茀-2,7-二基)-co-(N,N’-雙{p-丁基苯基}-1,4-二胺基亞苯)]、聚[(9,9-二辛基茀-2,7-二基)-co-(N,N’-雙{p-丁基苯基}-1,1’-亞聯苯-4,4-二胺)]、聚[(9,9-雙{1’-戊烯-5’-基}茀-2,7-二基)-co-(N,N’-雙{p-丁基苯基}-1,4-二胺基亞苯)]、以聚倍半矽氧烷封端之聚[N,N’-雙(4-丁基苯基)-N,N’-雙(苯基)-聯苯胺]、聚[(9,9-二(二辛基)茀-2,7-二基)-co-(4,4’-(N-(p-丁基苯基))二苯基胺)]等。
發光性高分子材料,例如有聚(9,9-二烷基茀)(PDAF)等之聚茀衍生物、聚(2-甲氧基-5-(2’-乙基己氧基)-1,4-伸苯基伸乙烯基)(MEH-PPV)等之聚伸苯基伸乙烯基衍生物、聚(3-烷基噻吩)(PAT)等的聚噻吩衍生物、聚乙烯基咔唑(PVCz)等。
溶劑可列舉例如甲苯、二甲苯、氯仿等。溶解或均勻分散法,可列舉例如攪拌、加熱攪拌、超音波分散等的方法。
塗佈方法無特別限定,可列舉例如噴墨法、噴霧法、浸漬法、旋轉塗佈法、轉印印刷法、輥塗法、刷毛塗佈等。又,塗佈係在氮、氬等的惰性氣體下進行為佳。
燒成方法可列舉例如在惰性氣體下或真空中,以烤箱或加熱板進行加熱的方法。
以下,舉合成例及實施例,更具體說明本發明,但本發明不限於下述實施例。又,使用之裝置如下。
(1)1H-NMR:日本電子(股)製、JNM-ECX300 FT NMR SYSTEM
(2)基板洗淨:長州產業(股)製、基板洗淨裝置(減壓電漿方式)
(3)清漆之塗佈:Mikasa(股)製、旋轉塗佈機MS-A100
(4)膜厚測定:(股)小坂研究所製、微細形狀測定機SurfcorderET-4000
(5)EL元件之製作:長州產業(股)製、多機能蒸鍍裝置系統C-E2L1G1-N
(6)EL元件之亮度等的測定:(有)Tech world製、I-V-L測定系統
藉由下述方法合成式(a-58)表示之寡噻吩衍生物2(TP2)。
在燒瓶內置入3,3'''-二己基-2,2’:5’,2”:5”,2'''-四聯噻吩(Sigma-Aldrich Co.LLC.製、以下稱為TP1)0.50g,進行氮取代後,加入四氫呋喃6.5mL並冷卻至-78℃。其中滴下正丁基鋰之正己烷溶液1.85mL(濃度:1.64mol/L)後,攪拌30分鐘。又,其中再滴下三丁基氯錫烷1.1mL後,昇溫至室溫並攪拌3小時。
攪拌後,添加離子交換水及正己烷進行分液,將所得到的有機層再以離子交換水洗淨2次後,使用硫酸鈉使其乾燥。
又,餾除溶劑得到含有(3,3'''-二己基-[2,2’:5’,2”:5”,2'''-四聯噻吩]-5,5'''-二基)雙(三丁基錫烷)的混合物(1.7g)。
接著,於另外的燒瓶內,置入上述所得之混合物1.48g及2-溴-3-己基噻吩0.46g,進行氮取代後,依序添加甲苯15mL、四(三苯基膦)鈀0.05g,在迴流條件下攪拌4小時。
攪拌後,放冷至室溫,對此添加正己烷、甲苯及離子
交換水進行分液,將所得之有機層以離子交換水洗淨,並使用硫酸鈉使其乾燥。
又,餾除溶劑,並以矽凝膠管柱層析法純化,得到TP2(收量:0.38g,收率:53%二階段合計收率)。1H-NMR之測量結果如以下所示。
1H-NMR(CDCl3):δ 7.16-7.13(m,4H),7.04(d,J=3.9Hz,2H),6.94(s,4H),6.92(d,J=5.4Hz,2H),2.78(m,8H),1.74-1.58(m,8H),1.44-1.31(m,24H),0.95-0.87(m,12H)。
藉由下述方法合成式(a-144)表示之寡噻吩衍生物3(TP3)。
在燒瓶內置入2,3-二氫噻吩[3,4-b][1,4]戴奧辛(dioxin)2.0g及四氫呋喃150mL進行氮取代後,冷卻至-78℃。其中滴下正丁基鋰之正己烷溶液10mL(濃度:1.64mol/L)後,-78℃下攪拌30分鐘,接著,昇溫至-40℃,再滴下三丁基氯錫烷5mL後,昇溫至室溫並攪拌16
小時。
攪拌結束後,將反應混合物濃縮,混合該濃縮液與n-己烷,並將其過濾。然後,將所得之濾液濃縮,得到含有三丁基(2,3-二氫噻吩[3,4-b][1,4]戴奧辛-5-基)錫烷的混合物7.4g。
接著,於另外的燒瓶內,置入5,5’-二溴-2,2’-二噻吩1.5g與四(三苯基膦)鈀0.27g,進行氮取代。其中加入上述含有三丁基(2,3-二氫噻吩[3,4-b][1,4]戴奧辛-5-基)錫烷的混合物6.2g與N,N-二甲基甲醯胺20mL,昇溫至125℃,攪拌2小時。
攪拌結束後,放置冷卻至室溫,其中加入n-己烷進行分液,將所得之N,N-二甲基甲醯胺層滴下至離子交換水與甲醇之混合液中,進行再沉澱。
然後,將沉澱物藉由過濾回收,經乾燥得到TP3(收量:1.4g、收率:66%)。1H-NMR之測量結果如以下所示。
1H-NMR(CDCl3):δ 7.11(d,J=4.2Hz,2H),7.07(d,J=4.2Hz,2H),6.23(s,2H),4.37-4.33(m,4H),4.28-4.24(m,4H)。
藉由以下方法合成式(a-306)表示之寡噻吩衍生物4(TP4)。
在燒瓶內置入TP1(1.00g)並進行氮取代後,加入四氫呋喃13mL並冷卻至-78℃。其中滴下正丁基鋰之正己烷溶液3.7mL(濃度:1.64mol/L)後攪拌30分鐘。又,其中再滴下三丁基氯錫烷2.2mL後,昇溫至室溫並攪拌3小時。
攪拌後,添加離子交換水及正己烷進行分液,將所得之有機層再以離子交換水洗淨2次後,使用硫酸鈉使其乾燥。
又,餾除溶劑得到含有(3,3'''-二己基-[2,2’:5’,2”:5”,2'''-四聯噻吩]-5,5'''-二基)雙(三丁基錫烷)的混合物(3.45g)。
接著,於其他燒瓶內,置入此所得之混合物3.0g及4-溴-N,N-二苯基苯胺1.2g,進行氮取代後,依序添加甲苯45mL、四(三苯基膦)鈀0.10g,在迴流條件下攪拌8小時。
攪拌後,放冷至室溫,其中添加氯仿及離子交換水進行分液,將所得之有機層再以離子交換水洗淨,並使用硫
酸鈉使其乾燥。
又,餾除溶劑並以管柱層析法純化,得到TP4(收量:0.76g、收率:44%、2段階合計收率)。1H-NMR之測量結果如以下所示。
1H-NMR(CDCl3):δ 7.44(4H,d,J=8.9Hz),7.28-7.23(m,8H),7.12-7.10(m,10H),7.06-7.00(m,12H),2.78(t,J=7.4Hz,4H),1.69(quint,J=7.4Hz,4H),1.44-1.30(m,12H),0.89(m,6H)。
藉由以下方法合成式(b-8)表示之苯胺衍生物1(AN1)。
4,4’-二胺基二苯基胺10.00g(50.19mmol)、4-溴三苯基胺34.17g(105.40mmol)、及二甲苯(100g)之混合懸濁液中,加入四(三苯基膦)鈀0.5799g(0.5018mmol)與t-丁氧基鈉10.13g(105.40mmol),在氮下,以130℃攪拌14小時。
然後,將反應混合液過濾,於該濾液中加入飽和食鹽水,進行分液處理後,由有機層中餾除溶劑,將所得之固體使用1,4-二噁烷再結晶,得到AN1(收量:22g、收
率:65%)。1H-NMR之測量結果如以下所示。
1H-NMR(CDCl3):δ 7.83(S,2H),7.68(S,1H),7.26-7.20(m,8H),7.01-6.89(m,28H)。
藉由以下方法合成式(c-1)表示之芳基磺酸化合物1(SA1)。
在經充分乾燥之1-萘酚-3,6-二磺酸鈉11g(31.59mmol)中,在氮環境下依序加入全氟聯苯4.797g(14.36mmol)、碳酸鉀4.167g(30.15mmol)、及N,N-二甲基甲醯胺100mL,將反應系進行氮取代後,在內溫100℃下攪拌6小時。
放置冷卻至室溫後,為了使反應後所析出之SA1再溶解,而再添加N,N-二甲基甲醯胺500mL,室溫下攪拌90分鐘。室溫攪拌後,將此溶液過濾除去碳酸鉀殘渣,進行減壓濃縮。為了進一步除去殘存的雜質,而在殘渣中加入甲醇100mL,進行室溫攪拌。室溫下攪拌30分鐘後,將懸濁溶液過濾,過濾取得濾物。濾物中加入超純水300mL使溶解,藉由使用陽離子交換樹脂DOWEX650C(Dow.Chemical公司製、H型約200mL、餾出溶劑:超
純水)之管柱層析法,進行離子交換。
將pH1以下之分離分在減壓下進行濃縮乾固,使殘渣在減壓下乾固得到SA1(11g、收率85%)。1H-NMR之測量結果如以下所示。
1H-NMR(DMSO-d6):δ 7.18(1H,s,Ar-H),7.89(1H,d,Ar-H),8.01(1H,s,Ar-H),8.23(1H,s,Ar-H),8.28(1H,d,Ar-H)。
藉由以下方法合成式(a-34)表示之寡噻吩衍生物5(TP5)。
氮環境下,燒瓶內加入三噻吩(terthiophene)2.01g及四氫呋喃50mL並冷卻至-78℃。其中滴下正丁基鋰之正己烷溶液19.6mL(濃度:1.64mol/L)後,-78℃下攪拌30分鐘,接著昇溫至0℃,再攪拌1小時。
然後,再冷卻至-78℃,攪拌30分鐘後,其中再滴下三丁基氯錫烷8.8mL後,攪拌10分鐘,接著昇溫至0
℃,再攪拌30分鐘。
攪拌後,由反應混合物中,減壓下餾除溶劑,將所得之殘渣加入甲苯中,藉由過濾除去不溶物,由所得之濾液中,在減壓下餾除溶劑,得到含有三噻吩之雙甲錫烷基體之油狀物12.88g(該雙甲錫烷基體之純度51.91%)。
接著,氮環境下,另外的燒瓶內,依序加入此含有三噻吩之雙甲錫烷基體之油狀物6.44g、2-溴-3-正己基噻吩2.41g、甲苯24mL及四(三苯基膦)鈀0.23g,迴流條件下攪拌4.5小時。
放置冷卻至室溫,減壓餾除溶劑後,藉由過濾除去不溶物。將所得之濾液進行濃縮,使用矽膠管柱層析純化,得到TP5(收量:1.29g、收率:55%、2段階合計收率)。
1H-NMR(CDCl3):δ 7.17(d,J=5.1Hz,2H),7.12(d,J=3.9Hz,2H),7.09(s,2H),7.01(d,J=3.9Hz,2H),6.93(d,J=5.1Hz,2H),2.78(t,J=7.7Hz,4H),1.54-1.70(m,4H),1.28-1.41(m,12H),0.89(t,J=7.0Hz,6H)。
於氮環境下,使TP1(0.035g)與磷鎢酸(PTA、關東化學(股)製)0.210g,溶解於1,3-二甲基-2-咪唑啉酮(DMI)4.0g中。所得之溶液中,加入環己醇(CHA)6.0g及丙二醇(PG)2.0g,然後攪拌,其中添加五氟苯基
三乙氧基矽烷(以下稱為矽烷A)0.024g,再攪拌調製電荷輸送性清漆。
依據表1,除改變電荷輸送性物質、摻雜物、有機矽烷化合物、有機溶劑、此等之使用量外,與實施例1-1同樣的方法調製清漆。
氮環境下,將TP1(0.053g)與PTA(0.318g)溶解於DMI(4.0g)中。所得之溶液中加入CHA(6.0g)及PG(2.0g)進行攪拌調製電荷輸送性清漆。
氮環境下,將TP1(0.052g)與PTA(0.258g)溶解於DMI(2.0g)中。所得之溶液中加入丙二醇單甲基醚(PGME)8.0g,進行攪拌,其中加入矽烷A(0.031g)及F4TCNQ(東京化成工業(股)製)0.031g,再攪拌調製電荷輸送性清漆。
依據表2,除了改變電荷輸送性物質、摻雜物、有機矽烷化合物、有機溶劑、此等之使用量外,與實施例1-27同樣的方法調製清漆。
又,表1及2中,「矽烷B」表示3,3,3-三氟丙基三甲氧基矽烷,「矽烷C」表示苯基三甲氧基矽烷,「DEGME」表示二乙二醇單甲基醚,「2,3-BD」表示2,3-丁二醇,括弧內之各數字表示使用量(單位:g)。
使用旋轉塗佈機將實施例1-1所得之清漆塗佈於ITO基板後,以50℃乾燥5分鐘,接著在大氣環境下,以150℃進行10分鐘燒成,而在ITO基板上形成30nm之均勻薄膜。ITO基板係使用在表面上將銦錫氧化物(ITO)以膜厚150nm經圖型化後之25mm×25mm×0.7t的玻璃基板,在使用前藉由O2電漿洗淨裝置(150W、30秒鐘)去除表面上的雜質。
接著,使用蒸鍍裝置(真空度1.0×10-5Pa),對於形成有薄膜之ITO基板,依序層合α-NPD、Alq3、氟化鋰、及鋁之薄膜,得到有機EL元件。此時,關於蒸鍍速率,關於α-NPD、Alq3及鋁為0.2nm/秒,氟化鋰為0.02nm/秒的條件下分別進行,膜厚分別為30nm、40nm、0.5nm及120nm。
此外,為了防止因空氣中之氧、水等之影響所導致的特性劣化,因此有機EL元件藉由密封基板密封後,評價其特性。密封係依據以下順序施行。在氧濃度2ppm以下、露點-85℃以下之氮環境中,在密封基板之間收納有機EL元件,並藉由接著材料(Nagase Chemtex(股)製XNR5516Z-B1)貼合密封基板。此時,將捕水劑(Dynic(股)製HD-071010W-40)與有機EL元件一同收納於密封基板內。對於已貼合之密封基板,照射UV光(波長:365nm、照射量:6000mJ/cm2)後,在80℃下施行1小時退火處理而使接著材料硬化。
除了分別使用實施例1-2~1-26所得的清漆來取代實施例1-1所得的清漆外,與實施例2-1相同的方法製作有機EL元件。
除了將燒成溫度各自設定為170℃、190℃、210℃
外,與實施例2-10同樣的方法製作元件。
除了將燒成溫度設定為230℃外,各自與實施例2-14~2-16、2-20同樣的方法製作元件。
除了使用比較例1-1所得之清漆取代實施例1-1所得之清漆外,與實施例2-1同樣的方法製作元件。
除了使用各自實施例1-27~1-29所得之清漆取代實施例1-1所得之清漆外,與實施例2-1同樣的方法製作有機EL元件。
除了將燒成溫度設定為230℃外,各自與實施例2-34~2-36同樣的方法製作有機EL元件。
除了各自使用實施例1-30~1-34所得之清漆,取代實施例1-1所得之清漆外,與實施例2-1同樣的方法製作有機EL元件。
除了各自使用實施例1-35~1-37所得之清漆,取代實施例1-1所得之清漆外,與實施例2-1同樣的方法製作有機EL元件。
除了使用實施例1-38所得之清漆,取代實施例1-1所得之清漆,且將燒成溫度各自設定為150℃、160℃、170℃、180℃外,與實施例2-1同樣的方法製作有機EL元件。
測量各元件之驅動電壓5V中之電流密度及亮度。結果如表3、4所示。又,測量實施例2-34、2-35及2-40~2-48之元件的亮度之半衰期(初期亮度5000cd/m2)。結果如表5所示。
如表3、4所示,使用本發明之電荷輸送性清漆時,不僅使用在230℃下燒成的薄膜,且即使用在150℃之低溫燒成的薄膜,也可得到具有優異亮度特性的有機EL元件。又,如表5所示,使用含有F4TCNQ之清漆時,可得到高壽命的元件。
Claims (13)
- 一種電荷輸送性清漆,其特徵係含有:由式(1)表示之寡噻吩衍生物所構成的電荷輸送性物質、摻雜物、有機矽烷化合物及有機溶劑,
- 如申請專利範圍第1項之電荷輸送性清漆,其中上述摻雜物含有雜多酸。
- 如申請專利範圍第2項之電荷輸送性清漆,其中上述雜多酸含有磷鎢酸。
- 如申請專利範圍第1~3項中任一項之電荷輸送性清漆,其中上述寡噻吩衍生物為以式(2)表示,
- 如申請專利範圍第1~4項中任一項之電荷輸送性清漆,其中上述有機矽烷化合物為包含選自由二烷氧基矽烷化合物、三烷氧基矽烷化合物或四烷氧基矽烷化合物之至少1種。
- 如申請專利範圍第1~5項中任一項之電荷輸送性清漆,其係進一步含有式(12)表示之四氰基苯醌二甲烷 (tetracyanoquinodimethane)化合物,
- 如申請專利範圍第1~6項中任一項之電荷輸送性清漆,其係進一步含有由芳基磺酸化合物所構成之摻雜物。
- 一種電荷輸送性薄膜,其特徵係使用如申請專利範圍第1~7項中任一項之電荷輸送性清漆來製作。
- 一種有機電致發光元件,其特徵係具有如申請專利範圍第8項之電荷輸送性薄膜。
- 如申請專利範圍第9項之有機電致發光元件,其中上述電荷輸送性薄膜為電洞注入層或電洞輸送層。
- 一種電荷輸送性薄膜之製造方法,其特徵係將如申請專利範圍第1~7項中任一項之電荷輸送性清漆塗佈於基材上,進行燒成者。
- 一種有機電致發光元件之製造方法,其特徵係使用如申請專利範圍第8項之電荷輸送性薄膜。
- 一種電荷輸送性材料,其特徵係含有:由式(1)表示之寡噻吩衍生物所構成的電荷輸送性物質及摻雜物,
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