TW201414602A - Surface-treated copper foil, method for manufacturing surface-treated copper foil, and negative electrode material for negative electrode current collector and nonaqueous secondary cell - Google Patents

Surface-treated copper foil, method for manufacturing surface-treated copper foil, and negative electrode material for negative electrode current collector and nonaqueous secondary cell Download PDF

Info

Publication number
TW201414602A
TW201414602A TW102135280A TW102135280A TW201414602A TW 201414602 A TW201414602 A TW 201414602A TW 102135280 A TW102135280 A TW 102135280A TW 102135280 A TW102135280 A TW 102135280A TW 201414602 A TW201414602 A TW 201414602A
Authority
TW
Taiwan
Prior art keywords
copper foil
zinc
treated copper
treatment
tensile strength
Prior art date
Application number
TW102135280A
Other languages
Chinese (zh)
Other versions
TWI468284B (en
Inventor
Misato Tashiro
Ayumu Tateoka
Original Assignee
Mitsui Mining & Smelting Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining & Smelting Co filed Critical Mitsui Mining & Smelting Co
Publication of TW201414602A publication Critical patent/TW201414602A/en
Application granted granted Critical
Publication of TWI468284B publication Critical patent/TWI468284B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/605Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/01Layered products comprising a layer of metal all layers being exclusively metallic
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C18/00Alloys based on zinc
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/05Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/04Wires; Strips; Foils
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/565Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • C25D5/50After-treatment of electroplated surfaces by heat-treatment
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/615Microstructure of the layers, e.g. mixed structure
    • C25D5/617Crystalline layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/64Carriers or collectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/64Carriers or collectors
    • H01M4/66Selection of materials
    • H01M4/661Metal or alloys, e.g. alloy coatings
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/385Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by conversion of the surface of the metal, e.g. by oxidation, whether or not followed by reaction or removal of the converted layer
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/052Li-accumulators
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0355Metal foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703Plating
    • H05K2203/0726Electroforming, i.e. electroplating on a metallic carrier thereby forming a self-supporting structure
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1194Thermal treatment leading to a different chemical state of a material, e.g. annealing for stress-relief, aging
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Abstract

An object of the present invention is to provide a surface-treated copper foil that decreases little in tensile strength even when subjected to a high-temperature heat treatment for a long period of time, a method for manufacturing the surface-treated copper foil, and a negative electrode material for a current collector and a nonaqueous secondary cell that use the surface-treated copper foil. To achieve this object, provided is a surface-treated copper foil comprising zinc-containing surface-treated layers, 20 mg/m2 to 1000 mg/m2 per side, on both sides of a copper foil containing trace constituents of one, two, or more components selected from carbon, sulfur, chlorine, and nitrogen, the total of these components being 100 ppm or more; the surface-treated copper foil characterized in being subjected to a pre-annealing treatment of heating in a temperature range of 200 to 280 DEG C.

Description

表面處理銅箔、表面處理銅箔之製造方法、陰極集電體以及非水系二次電池之陰極材料 Surface treatment copper foil, method for producing surface treated copper foil, cathode current collector, and cathode material for nonaqueous secondary battery

本發明係有關於一種表面處理銅箔、表面處理銅箔之製造方法、陰極集電體以及非水系二次電池之陰極材料。特別是有關於一種在即便於高溫長時間被加熱之情況,拉伸強度的降低亦少之鋰離子二次電池等的陰極集電體用途所使用之表面處理銅箔、其製造方法、使用該表面處理銅箔之陰極集電體及陰極材料。 The present invention relates to a surface-treated copper foil, a method of producing a surface-treated copper foil, a cathode current collector, and a cathode material of a non-aqueous secondary battery. In particular, there is a surface-treated copper foil used for a cathode current collector of a lithium ion secondary battery or the like which has a small decrease in tensile strength even when heated at a high temperature for a long period of time, a method for producing the same, and a method for producing the same The cathode current collector and cathode material of the surface treated copper foil.

先前,銅箔係被使用作為以印刷配線板為首之各種電子零件的電路形成材料。又,近年來,銅箔係不限定於該等電路形成材料,亦被使用作為鋰離子二次電池等的非水系二次電池的陰極集電體。 Previously, copper foil was used as a circuit forming material for various electronic parts including printed wiring boards. In addition, the copper foil is not limited to these circuit forming materials, and is also used as a cathode current collector of a nonaqueous secondary battery such as a lithium ion secondary battery.

通常,鋰離子二次電池的陰極材料,係在由導電性材料所構成之集電體的表面包括含有陰極活物質、導電材料及結著劑(binder)等之陰極合劑層而構成。在鋰離子二次電池充放電時,陰極活物質將鋰進行吸留、排放時,陰極合劑層係伴隨著該情況而膨脹、收縮。因為陰極合劑層係密著於集電體的表面,而且由於鋰離子二次電池重複充放電循環,所以重複應力係施加於陰極合劑層與集電體之間。因此,集電體的伸展 強度低時,由於陰極合劑的體積變化,集電體有伸展而產生皺紋等的變形、或是斷裂之可能性。集電體伸展而產生皺紋等的變形之情況,有在陽極與陰極間產生短路,或是在陽極與陰極之間的距離產生變化而阻礙均勻的電極反應,致使充放電循環耐久性低落之可能性。又,集電體斷裂之情況,平均單位體積的容量減少,鋰離子二次電池的電池特性低落。因此,將銅箔使用作為集電體時,該銅箔係被要求具有高拉伸強度。 In general, a cathode material of a lithium ion secondary battery is composed of a cathode mixture layer containing a cathode active material, a conductive material, and a binder on the surface of a current collector made of a conductive material. When the lithium ion secondary battery is charged and discharged, when the cathode active material occludes and discharges lithium, the cathode mixture layer expands and contracts with this. Since the cathode mixture layer is adhered to the surface of the current collector, and the lithium ion secondary battery repeats the charge and discharge cycle, the repeated stress is applied between the cathode mixture layer and the current collector. Therefore, the extension of the collector When the strength is low, the current collector is stretched to cause deformation such as wrinkles or breakage due to a change in the volume of the cathode mixture. When the current collector is stretched to cause wrinkles or the like, there is a short circuit between the anode and the cathode, or a change in the distance between the anode and the cathode to hinder the uniform electrode reaction, resulting in a low durability of the charge and discharge cycle. Sex. Further, in the case where the current collector is broken, the capacity per unit volume is decreased, and the battery characteristics of the lithium ion secondary battery are lowered. Therefore, when a copper foil is used as a current collector, the copper foil is required to have high tensile strength.

但是,在製造陰極材料之步驟,在集電體的表面形成陰極合劑層時,在集電體係負荷高溫的熱量。通常的銅箔之情況,負荷高溫的熱量時,由於銅的再結晶化致使結晶粒粗大化且拉伸強度等的機械強度降低。因此,使用在集電體用途之銅箔,係被要求在施行高溫熱處理之後,亦能夠維持高拉伸強度。作為此種銅箔,例如,專利文獻1(國際公開第2012/070589號)及專利文獻2(國際公開第2012/070591號),係揭示一種即便於350℃加熱60分鐘之後亦能夠維持40kgf/mm2以上、於400℃加熱60分鐘加熱之後亦能夠維持35kgf/mm2以上的拉伸強度之表面處理銅箔。 However, in the step of manufacturing the cathode material, when the cathode mixture layer is formed on the surface of the current collector, the collector system is loaded with heat at a high temperature. In the case of a normal copper foil, when heat of a high temperature is applied, crystal grains are coarsened due to recrystallization of copper, and mechanical strength such as tensile strength is lowered. Therefore, the copper foil used for the current collector is required to maintain high tensile strength even after high-temperature heat treatment. As such a copper foil, for example, Patent Document 1 (International Publication No. 2012/070589) and Patent Document 2 (International Publication No. 2012/070591) disclose that 40 kgf/ can be maintained even after heating at 350 ° C for 60 minutes. mm 2 or more for 60 minutes after heating also possible to maintain 35kgf / mm 2 in tensile strength between the surface-treated copper foil at least 400 ℃.

但是,在製造鋰離子二次電池之陰極材料時,有對集電體進行在350℃~400℃的溫度範圍加熱大於1小時之情況。此時,在上述專利文獻1或專利文獻2所揭示的表面處理銅箔之拉伸強度係低落,依照加熱時間而有無法維持充分水準的拉伸強度之情形。 However, when manufacturing a cathode material of a lithium ion secondary battery, the current collector is heated in a temperature range of 350 ° C to 400 ° C for more than 1 hour. At this time, the tensile strength of the surface-treated copper foil disclosed in Patent Document 1 or Patent Document 2 is low, and the tensile strength at a sufficient level cannot be maintained depending on the heating time.

因此,本發明之課題,係提供一種即便長時間被施行高溫熱處理之情況,拉伸強度的降低亦少之表面處理銅箔、表面處理銅箔之製造方法、使用該表面處理銅箔之集電體以及非水系二次電池之陰極材料。 Therefore, an object of the present invention is to provide a surface-treated copper foil, a method of producing a surface-treated copper foil, and a current collection using the surface-treated copper foil, in which a reduction in tensile strength is small even when a high-temperature heat treatment is performed for a long period of time. The cathode material of the body and the non-aqueous secondary battery.

本發明者等進行專心研討的結果,藉由採用以下的技術思想而想出一種即便長時間被施行高溫熱處理之情況,拉伸強度的降低亦少之表面處理銅箔。 As a result of intensive studies, the inventors of the present invention have come up with a surface-treated copper foil which has a small reduction in tensile strength even when subjected to a high-temperature heat treatment for a long period of time.

本發明之表面處理銅箔,係在以總量計含有100ppm以上之選自碳、硫、氯及氮之1種或2種以上的微量成分之銅箔的兩面,每一面包括含有20mg/m2~1000mg/m2的鋅之表面處理層之表面處理銅箔,其特徵在於:被施行在200℃~280℃的溫度範圍加熱之預退火處理。 The surface-treated copper foil of the present invention contains both sides of a copper foil containing 100 ppm or more of a trace component selected from the group consisting of carbon, sulfur, chlorine, and nitrogen in a total amount, and each surface includes 20 mg/m. A surface-treated copper foil of a surface treatment layer of zinc of 2 to 1000 mg/m 2 , characterized in that it is subjected to pre-annealing treatment by heating at a temperature ranging from 200 ° C to 280 ° C.

本發明之表面處理銅箔,其於350℃加熱5小時後,係顯示拉伸強度為45kgf/mm2以上。 The surface-treated copper foil of the present invention exhibits a tensile strength of 45 kgf/mm 2 or more after heating at 350 ° C for 5 hours.

在本發明之表面處理銅箔,其中前述表面處理層係除了鋅以外,以含有銅及/或銅中的擴散速度比鋅更快的金屬元素為佳。 In the surface-treated copper foil of the present invention, the surface treatment layer is preferably a metal element containing copper and/or copper which has a faster diffusion rate than zinc, in addition to zinc.

在本發明之表面處理銅箔,其中前述金屬元素係以錫為佳。 In the surface-treated copper foil of the present invention, the aforementioned metal element is preferably tin.

在本發明之表面處理銅箔,其中前述表面處理層係以每一面含有1mg/m2~200mg/m2的錫為佳。 In the surface-treated copper foil of the present invention, the surface treatment layer preferably contains tin of from 1 mg/m 2 to 200 mg/m 2 per side.

在本發明之表面處理銅箔,其中構成前述銅箔之銅的平均結晶粒徑係以1.0μm以下為佳。 In the surface-treated copper foil of the present invention, the average crystal grain size of the copper constituting the copper foil is preferably 1.0 μm or less.

在本發明之表面處理銅箔,其中前述銅箔的常態拉伸強度係以50gf/mm2以上為佳。 In the surface-treated copper foil of the present invention, the copper foil preferably has a normal tensile strength of 50 gf/mm 2 or more.

在本發明之表面處理銅箔,其中在前述預退火處理,係以在前述溫度範圍內的溫度被加熱2小時以上且25小時以下為佳。 In the surface-treated copper foil of the present invention, the pre-annealing treatment is preferably carried out at a temperature within the above temperature range for 2 hours or more and 25 hours or less.

本發明之表面處理銅箔,係在以總量計含有100ppm以上之選自碳、硫、氯及氮之1種或2種以上的微量成分之銅箔的兩面,每一面包括含有20mg/m2~1000mg/m2的鋅之表面處理層之表面處理銅箔,其特徵在於:於350℃加熱5小時後的拉伸強度為50kgf/mm2以上。 The surface-treated copper foil of the present invention contains both sides of a copper foil containing 100 ppm or more of a trace component selected from the group consisting of carbon, sulfur, chlorine, and nitrogen in a total amount, and each surface includes 20 mg/m. A surface-treated copper foil of a surface treatment layer of zinc of 2 to 1000 mg/m 2 , which is characterized in that the tensile strength after heating at 350 ° C for 5 hours is 50 kgf / mm 2 or more.

本發明之表面處理銅箔之製造方法,其特徵在於包括:表面處理步驟,其係在以總量計含有100ppm以上之選自碳、硫、氯及氮之1種或2種以上的微量成分之銅箔的兩面,形成每一面含有20mg/m2~1000mg/m2的鋅之表面處理層;及預退火處理步驟,其係在表面處理步驟之後,在200℃~280℃的溫度範圍加熱。 A method for producing a surface-treated copper foil according to the present invention, comprising: a surface treatment step of containing one or more kinds of trace components selected from the group consisting of carbon, sulfur, chlorine, and nitrogen in an amount of 100 ppm or more based on the total amount. a surface of the copper foil having a surface treatment layer containing 20 mg/m 2 to 1000 mg/m 2 of zinc on each side; and a pre-annealing step of heating at a temperature ranging from 200 ° C to 280 ° C after the surface treatment step .

在本發明之表面處理銅箔之製造方法,其中在前述預退火處理步驟之加熱時間係以2小時以上且25小時以下為佳。 In the method for producing a surface-treated copper foil according to the present invention, the heating time in the pre-annealing step is preferably 2 hours or longer and 25 hours or shorter.

本發明之陰極集電體,其特徵在於:使用上述任一項所述之表面處理銅箔。 The cathode current collector of the present invention is characterized by using the surface-treated copper foil according to any one of the above.

本發明之非水系二次電池之陰極材料,其特徵在於:使用上述陰極集電體。 The cathode material of the nonaqueous secondary battery of the present invention is characterized in that the cathode current collector is used.

本發明之表面處理銅箔,係藉由在銅箔的兩面形成含有鋅之表面處理層且施行上述預退火處理,能夠簡易地製造且能夠提供一種即便長時間被施行高溫熱處理之後,拉伸強度降低亦少之銅箔。 The surface-treated copper foil of the present invention can be easily produced by forming a surface treatment layer containing zinc on both surfaces of a copper foil, and can provide a tensile strength after being subjected to a high-temperature heat treatment for a long period of time. Reduce the copper foil that is also less.

第1圖係顯示於200℃施行預退火處理8小時後,於350℃加熱5小時加熱之後之實施試料1的剖面結晶組織的一個例子之FIB-SIM影像。 Fig. 1 is a FIB-SIM image showing an example of the cross-sectional crystal structure of the sample 1 after performing pre-annealing treatment at 200 ° C for 8 hours and heating at 350 ° C for 5 hours.

第2圖係顯示於350℃加熱5小時加熱之後之比較試料1的剖面結晶組織的一個例子之FIB-SIM影像。 Fig. 2 is a FIB-SIM image showing an example of the cross-sectional crystal structure of the comparative sample 1 after heating at 350 ° C for 5 hours.

以下,依照順序說明本發明之表面處理銅箔、表面處理銅箔之製造方法、陰極集電體以及非水系二次電池之陰極材料的實施形態。 Hereinafter, embodiments of the surface-treated copper foil, the method for producing a surface-treated copper foil, the cathode current collector, and the cathode material of the non-aqueous secondary battery of the present invention will be described in order.

1.表面處理銅箔 Surface treatment copper foil

首先,說明本發明之表面處理銅箔的實施形態。本發明之表面處理銅箔,係使銅箔的兩面包括含有鋅之表面處理層(在本實施形態係稱為鋅黏附層),在形成該鋅黏附層之後,藉由預退火處理,即便長時間被施行高溫熱處理之後,亦能夠抑制拉伸強度降低。又,在本說明書,所謂高溫係指銅產生再結晶化的溫度以上之溫度,主要是指300℃~400℃左右的範圍內之溫度。又,所謂長時間係指大於1小時之時間,主要是意味著5小時以上之時間。以下,在本實施形態,係舉出將 該表面處理銅箔使用作為鋰離子二次電池等的非水系二次電池之陰極集電體時作為例子而進行說明,但是本發明之表面處理銅箔係不限定於該鋰離子二次電池等的非水系二次電池之陰極集電體,能夠使用作為印刷配線板的製造材料係自不待言。 First, an embodiment of the surface-treated copper foil of the present invention will be described. The surface-treated copper foil of the present invention comprises a surface treatment layer containing zinc (in this embodiment, a zinc adhesion layer) on both sides of the copper foil, and after the formation of the zinc adhesion layer, by pre-annealing, even if it is long After the time is subjected to the high-temperature heat treatment, the decrease in tensile strength can also be suppressed. In addition, in the present specification, the term "high temperature" means a temperature equal to or higher than the temperature at which recrystallization of copper occurs, and mainly refers to a temperature in the range of about 300 ° C to 400 ° C. Further, the term "long time" refers to a time greater than one hour, which mainly means a time of more than 5 hours. Hereinafter, in the present embodiment, In the case where the surface-treated copper foil is used as a cathode current collector of a non-aqueous secondary battery such as a lithium ion secondary battery, the surface-treated copper foil of the present invention is not limited to the lithium ion secondary battery. It is needless to say that the cathode current collector of the nonaqueous secondary battery can be used as a material for manufacturing a printed wiring board.

(1)銅箔 (1) Copper foil

首先,說明銅箔。在本發明,係在以總量計含有100ppm以上之選自碳、硫、氯及氮之1種或2種以上的微量成分之銅箔的兩面,設置上述鋅黏附層。 First, the copper foil will be described. In the present invention, the zinc adhesion layer is provided on both surfaces of a copper foil containing 100 ppm or more of a trace component selected from the group consisting of carbon, sulfur, chlorine, and nitrogen.

在此,在本發明所謂「銅箔」,係意味著未施行上述表面處理等的各種處理之未處理的銅箔,所謂「表面處理銅箔」係意味著用以形成上述鋅黏附層之鋅黏附處理、預退火處理、以及各種表面處理後之銅箔。又,該銅箔係可為電解銅箔,亦可為壓延銅箔,但是從容易得到結晶粒微細且拉伸強度高之機械特性優異的銅箔之觀點,以電解銅箔為佳。以下,主要是舉出電解銅箔作為例子而進行說明,但是在以下,只有記載為「銅箔」時,該銅箔係不僅是「電解銅箔」,亦包含「壓延銅箔」。 Here, the term "copper foil" as used in the present invention means an untreated copper foil which is not subjected to various treatments such as the above surface treatment, and the term "surface-treated copper foil" means zinc which is used to form the zinc adhesion layer. Adhesive treatment, pre-annealing, and various surface treated copper foils. In addition, the copper foil may be an electrolytic copper foil or a rolled copper foil. However, it is preferable to use an electrolytic copper foil from the viewpoint of easily obtaining a copper foil having fine crystal grains and excellent mechanical properties with high tensile strength. In the following, an electrolytic copper foil is mainly described as an example. However, in the following description, only the "copper foil" is used, and the copper foil is not only "electrolyzed copper foil" but also "rolled copper foil".

微量成分:在本發明,如上述、該銅箔係以總量計含有100ppm以上之選自碳、硫、氯及氮之1種或2種以上的微量成分。因為該等微量成分的含量係以總量計為100ppm以上時,構成該銅箔之銅的結晶組織(結晶粒)之微細化係變為容易,而且容易得到拉伸強度高之機械強度優異的銅箔。 In the present invention, the copper foil contains one or more kinds of trace components selected from the group consisting of carbon, sulfur, chlorine, and nitrogen in an amount of 100 ppm or more in total. When the content of the trace components is 100 ppm or more in total, the crystal structure (crystal grains) of the copper constituting the copper foil is easily refined, and the mechanical strength with high tensile strength is easily obtained. Copper foil.

在此,在本發明所使用之銅箔,係以總量計含有 100ppm以上之該微量成分,同時以在20ppm~470ppm的範圍含有碳,在5ppm~600ppm的範圍含有硫,在15ppm~600ppm的範圍含有氯,在5ppm~600ppm的範圍含有氮為佳。藉由使銅箔的結晶組織內含有適當量程度之該等微量成分,上述銅的結晶組織之微細化係變為更容易,能夠製成拉伸強度更高之機械強度優異的銅箔。具體而言,藉由使其在上述範圍內含有各微量成分,能夠製成該銅箔之平均結晶粒徑係為1.0μm以下,常態拉伸強度為50kgf/mm2以上且常態伸長率為3%~15%之機械強度優異的銅箔。 Here, the copper foil used in the present invention contains 100 ppm or more of the trace component in total, and contains carbon in the range of 20 ppm to 470 ppm, sulfur in the range of 5 ppm to 600 ppm, and 15 ppm to 600 ppm. The range contains chlorine, and it is preferred to contain nitrogen in the range of 5 ppm to 600 ppm. By containing an appropriate amount of such a trace component in the crystal structure of the copper foil, it is easier to refine the crystal structure of the copper, and it is possible to obtain a copper foil having excellent tensile strength and high mechanical strength. Specifically, by including each trace component in the above range, the copper foil can have an average crystal grain size of 1.0 μm or less, a normal tensile strength of 50 kgf/mm 2 or more, and a normal elongation of 3 %~15% of copper foil with excellent mechanical strength.

在此,各微量成分的含量為小於下限值時,例如,難以得到平均結晶粒徑為1.0μm以下之極微細的結晶組織且無法得到拉伸強度更高之銅箔,乃是不佳。另一方面,該銅箔內之各微量成分的含量為大於上限值時,從以下之觀點,乃是不佳。碳含量大於470ppm時,因為石墨粗大化且容易產生龜裂,乃是不佳。硫含量大於600ppm時,雖然該銅箔的拉伸強度變高,因為伸長率低落且脆化,乃是不佳。氯含量大於600ppm時,電解銅箔時,其析出表面變粗。此時,因為難以使陰極活物質等均勻地密著於其表面,在重複充放電時之體積變化量係在面內變為不均勻且在局部斷裂,乃是不佳。而且,氮含量大於180ppm時,因為氮化合物變為過剩,銅箔的析出組織之微細化效果飽和,使氮含量增加之意義消失,乃是不佳。 When the content of each of the minor components is less than the lower limit, for example, it is difficult to obtain an extremely fine crystal structure having an average crystal grain size of 1.0 μm or less and a copper foil having a higher tensile strength cannot be obtained. On the other hand, when the content of each of the minor components in the copper foil is larger than the upper limit, it is not preferable from the viewpoint of the following. When the carbon content is more than 470 ppm, it is not preferable because the graphite is coarsened and cracks are likely to occur. When the sulfur content is more than 600 ppm, although the tensile strength of the copper foil becomes high, the elongation is low and embrittlement is not preferable. When the chlorine content is more than 600 ppm, when the copper foil is electrolyzed, the precipitation surface becomes thick. At this time, since it is difficult to uniformly adhere the cathode active material or the like to the surface thereof, the volume change amount at the time of repeated charge and discharge becomes uneven in the plane and is locally broken, which is not preferable. In addition, when the nitrogen content is more than 180 ppm, the nitrogen compound becomes excessive, and the effect of refining the precipitation structure of the copper foil is saturated, and the meaning of increasing the nitrogen content is lost, which is not preferable.

但是,在本發明,用以表示該銅箔中之微量成分的含量而使用之稱為「ppm」的單位,係與「mg/kg」同義,所謂以總量計100ppm以上含有該微量成分,係意味著在該銅箔 每1kg所含有的該微量成分之總量為100mg以上。 However, in the present invention, a unit called "ppm" which is used to indicate the content of a trace component in the copper foil is synonymous with "mg/kg", and the trace component is contained in a total amount of 100 ppm or more. Means in the copper foil The total amount of the trace component contained per 1 kg is 100 mg or more.

平均結晶粒徑:其次,針對構成銅箔的結晶組織之銅的結晶粒之平均結晶粒徑進行說明。首先,該平均結晶粒徑係以1.0μm以下為佳,以0.8μm以下為較佳。該平均結晶粒徑大於1.0μm時,因為難以維持作為鋰離子二次電池等的非水系二次電池之陰極集電體所被要求之水準的拉伸強度,乃是不佳。又,構成銅箔之銅的結晶粒係以微細且同時均勻為佳。藉由結晶粒為均勻,結晶晶界係均勻地分布在銅箔內,在該銅箔所負荷的荷重,係被分散而不會偏頗於特定結晶粒,能夠製成拉伸強度高之機械強度優異的銅箔。但是,在此所稱平均結晶粒徑,係指該銅箔在常態時之平均結晶粒徑,能夠基於觀察該銅箔的剖面時,在剖面所顯現的結晶粒之粒徑而求取。 Average crystal grain size: Next, the average crystal grain size of the crystal grains of copper constituting the crystal structure of the copper foil will be described. First, the average crystal grain size is preferably 1.0 μm or less, and more preferably 0.8 μm or less. When the average crystal grain size is more than 1.0 μm, it is difficult to maintain the tensile strength required as a cathode current collector of a nonaqueous secondary battery such as a lithium ion secondary battery. Further, the crystal grains constituting the copper of the copper foil are preferably fine and uniform. Since the crystal grains are uniform, the crystal grain boundaries are uniformly distributed in the copper foil, and the load applied to the copper foil is dispersed without being biased to specific crystal grains, and mechanical strength with high tensile strength can be obtained. Excellent copper foil. However, the average crystal grain size referred to herein means the average crystal grain size of the copper foil in a normal state, and can be obtained from the particle diameter of the crystal grains which are observed in the cross section when the cross section of the copper foil is observed.

常態拉伸強度:該銅箔的常態拉伸強度係以50kgf/mm2以上為佳。但是,在本發明所謂「常態」,係指於常溫被管理之狀態、或是被熱處理前之狀態。藉由使用常態拉伸強度為50kgf/mm2以上之銅箔,即便被施行高溫熱處理之後,亦能夠得到顯示高拉伸強度之表面處理銅箔。但是,即便常態拉伸強度高之銅箔,經施行熱處理之後的拉伸強度亦有顯著降低之情況。因此,在本發明,並不是以該銅箔本身的常態拉伸強度為較高的值為佳,係不管常態拉伸強度之值如何,而以經施行熱處理之後之該表面處理銅箔的拉伸強度為較高的值為佳。 Normal tensile strength: The normal tensile strength of the copper foil is preferably 50 kgf/mm 2 or more. However, the "normal state" in the present invention refers to a state in which it is managed at a normal temperature or a state before being heat-treated. By using a copper foil having a normal tensile strength of 50 kgf/mm 2 or more, a surface-treated copper foil exhibiting high tensile strength can be obtained even after high-temperature heat treatment. However, even in the copper foil having a high normal tensile strength, the tensile strength after the heat treatment is remarkably lowered. Therefore, in the present invention, it is not preferable that the normal tensile strength of the copper foil itself is higher, regardless of the value of the normal tensile strength, and the surface-treated copper foil is subjected to heat treatment. A higher value of the tensile strength is preferred.

厚度:該銅箔的厚度係沒有特別限定。按照該表面處理銅箔的用途而採用適宜妥當的厚度之銅箔即可。例如, 使用本發明之表面處理銅箔作為鋰離子二次電池等的非水系二次電池之陰極集電體之情況,係多半將該銅箔的厚度設為5μm~35μm(計示厚度)的範圍內。又,將該表面處理銅箔使用於製造印刷配線板時之情況,係多半將該銅箔的厚度設為5μm~120μm(計量器厚度)的範圍內。本發明之表面處理銅箔係即便為5μm~35μm之薄銅箔,亦具有作為鋰離子二次電池之陰極集電體在市場上所被要求的水準之拉伸強度。 Thickness: The thickness of the copper foil is not particularly limited. A copper foil having a suitable thickness may be used in accordance with the use of the surface-treated copper foil. E.g, When the surface-treated copper foil of the present invention is used as a cathode current collector of a nonaqueous secondary battery such as a lithium ion secondary battery, the thickness of the copper foil is usually in the range of 5 μm to 35 μm (meter thickness). . Moreover, when this surface-treated copper foil is used for the manufacture of a printed wiring board, the thickness of this copper foil is the range of 5 micrometer - 120 micrometer (meter thickness). The surface-treated copper foil of the present invention has a tensile strength of a standard which is required as a cathode current collector of a lithium ion secondary battery even in a thin copper foil of 5 μm to 35 μm.

(2)鋅黏附層(表面處理層) (2) Zinc adhesion layer (surface treatment layer)

其次,針對鋅黏附層進行說明。本發明之表面處理銅箔係在上述銅箔的兩面,每一面包括含有20mg/m2~1000mg/m2的鋅之鋅黏附層。在銅箔的兩面所設置的鋅黏附層中之鋅,係在時間經過之同時,在銅箔內擴散且與結晶組織內的上述微量成分進行反應。該鋅與上述微量成分的化合物係在結晶晶界析出,在該銅箔負荷熱量時,能夠發揮妨礙結晶粒成長且抑制結晶粒粗大化之效果。在本發明,係藉由在銅箔的兩面形成鋅黏附層之後,施行後述的預退火處理,能夠使用與工業上的生產效率平衡的速度,不僅是使鋅擴散至銅箔的表層部,而且擴散至其內部(中央部)為止。因此,依照本發明,該表面處理銅箔係在隨後的使用過程,即便於高溫被施行較長時間的熱處理時,熱處理後亦能夠維持微細的結晶組織且能夠抑制該銅箔之拉伸強度降低。 Next, the zinc adhesion layer will be described. The surface-treated copper foil of the present invention is on both sides of the above-mentioned copper foil, and each side includes a zinc adhesion layer containing zinc of 20 mg/m 2 to 1000 mg/m 2 . The zinc in the zinc adhesion layer provided on both sides of the copper foil diffuses in the copper foil and reacts with the above-mentioned trace components in the crystal structure while passing through. The zinc and the above-mentioned trace component are precipitated at the crystal grain boundary, and when the copper foil is loaded with heat, the effect of preventing the crystal grain from growing and suppressing the coarsening of the crystal grain can be exhibited. In the present invention, by forming a zinc adhesion layer on both surfaces of the copper foil, a pre-annealing treatment to be described later is performed, and it is possible to use a speed which is balanced with industrial production efficiency, not only to diffuse zinc to the surface layer portion of the copper foil, but also Spread to the inside (central part). Therefore, according to the present invention, the surface-treated copper foil can be used in a subsequent use process, and even when heat treatment is performed for a long period of time at a high temperature, the fine crystal structure can be maintained after the heat treatment and the tensile strength of the copper foil can be suppressed from being lowered. .

在此,鋅黏附層中的鋅含量,亦即對銅箔的表面之鋅的黏附量為每一面小於20mg/m2之情況,因為在銅箔內擴散之鋅量少而無法得到充分地抑制結晶粒的粗大化之效果,而 且難以維持微細的結晶組織,乃是不佳。從該觀點,鋅的黏附量係以25mg/m2以上為佳,以50mg/m2以上為較佳。另一方面,鋅的黏附量大於1000mg/m2時,因為即便使鋅的黏附量増加,並不是得到按照黏附量之效果,而成為資源浪費,乃是不佳。從該觀點、鋅的黏附量係以500mg/m2以下為佳,以300mg/m2以下為較佳,以200mg/m2以下為更佳。 Here, the zinc content in the zinc adhesion layer, that is, the adhesion amount of zinc to the surface of the copper foil is less than 20 mg/m 2 per side, because the amount of zinc diffused in the copper foil is small and cannot be sufficiently suppressed. It is not preferable that the crystal grains are coarsened and it is difficult to maintain a fine crystal structure. From this viewpoint, the adhesion amount of zinc is preferably 25 mg/m 2 or more, and more preferably 50 mg/m 2 or more. On the other hand, when the adhesion amount of zinc is more than 1000 mg/m 2 , even if the amount of adhesion of zinc is increased, the effect of the amount of adhesion is not obtained, which is a waste of resources, which is not preferable. From this point of view, the adhesion amount of zinc is preferably 500 mg/m 2 or less, more preferably 300 mg/m 2 or less, and still more preferably 200 mg/m 2 or less.

在此,因為鋅黏附層係銅箔的每一面含有上述範圍內的鋅,所以鋅對該銅箔之總黏附量為40mg/m2~2000mg/m2的範圍內。而且,從與上述同樣的觀點,該鋅的總黏附量係以50mg/m2以上為佳,以100mg/m2以上為較佳。又,上限值係以1000mg/m2以下為佳,以600mg/m2以下為較佳。但是,該鋅的黏附量係設為假設銅箔的表面為完全平坦的狀態時之平均單位面積之鋅的黏附量(換算量)。 Here, since each side of the zinc adhesive layer-based copper foil contains zinc in the above range, the total adhesion amount of zinc to the copper foil is in the range of 40 mg/m 2 to 2000 mg/m 2 . Further, from the same viewpoint as described above, the total adhesion amount of zinc is preferably 50 mg/m 2 or more, and more preferably 100 mg/m 2 or more. Further, the upper limit is preferably 1000 mg/m 2 or less, and more preferably 600 mg/m 2 or less. However, the adhesion amount of the zinc is assumed to be the amount of zinc (the amount of conversion) of the average unit area when the surface of the copper foil is completely flat.

上述鋅黏附層係除了能夠設為由鋅所構成之鋅層以外,亦可以設為除了鋅以外,亦含有銅及/或銅中的擴散速度比鋅更快的金屬元素之鋅合金層。例如作為在300℃以上之溫度下,銅中的擴散速度比鋅更快的金屬元素(以下,稱為「異種金屬元素」),可舉出Bi、Cd、Sn、Pb、Sb、In、Al、As、Ga、Ge。又,亦能夠將鋅黏附層設為將鋅層與含有上述異種金屬元素之中至少任一種或二種以上之異種金屬層積層而成之鋅系複合層。此時,鋅層與異種金屬層之積層順序係沒有特別限定,可以在銅箔的表面依照鋅層、異種金屬層的順序而積層,亦可以在銅箔的表面,依照異種金屬層、鋅層的順序而積層。藉由將鋅黏附層設為與鋅同時含有上述異種金屬元素之結 構,能夠在銅箔內,與鋅同時使上述異種金屬元素擴散。因為異種金屬元素的擴散速度係比鋅更快,該等異種金屬元素係在銅箔的厚度方向,比鋅更快地且到達到更深的位置。又,該等異種金屬元素係與鋅同樣地與上述微量成分進行反應而形成化合物且抑制銅的結晶粒之粗大化。因此,藉由將鋅黏附層設為與鋅同時含有異種金屬元素之結構,即便於高溫被施行較長時間的熱處理之情況,在銅箔的厚度方向的大略全域,能夠使其更有效地抑制銅的結晶粒的粗大化。又,所謂鋅,係指純度為99%以上的鋅。又,所謂鋅合金,係指鋅與其他元素之混合物、固熔體、共晶、化合物等。 The zinc adhesion layer may be a zinc alloy layer of a metal element having a diffusion rate faster than zinc in copper and/or copper in addition to zinc, in addition to the zinc layer composed of zinc. For example, a metal element having a higher diffusion rate in copper than zinc at a temperature of 300 ° C or higher (hereinafter referred to as "dissimilar metal element") may, for example, be Bi, Cd, Sn, Pb, Sb, In, or Al. , As, Ga, Ge. In addition, the zinc adhesion layer may be a zinc-based composite layer in which a zinc layer and a dissimilar metal containing at least one or two or more of the above-described dissimilar metal elements are laminated. In this case, the order of lamination of the zinc layer and the dissimilar metal layer is not particularly limited, and the surface of the copper foil may be laminated in the order of the zinc layer or the dissimilar metal layer, or may be formed on the surface of the copper foil according to the dissimilar metal layer or the zinc layer. The order is layered. By setting the zinc adhesion layer to contain the above-mentioned heterogeneous metal element with zinc In the copper foil, the dissimilar metal element can be diffused simultaneously with zinc. Since the diffusion rate of the dissimilar metal elements is faster than that of the zinc, the dissimilar metal elements are in the thickness direction of the copper foil, faster than zinc and reach a deeper position. Further, these dissimilar metal elements react with the above-mentioned trace components in the same manner as zinc to form a compound, and suppress coarsening of crystal grains of copper. Therefore, by using a structure in which the zinc adhesion layer contains a dissimilar metal element simultaneously with zinc, even when heat treatment is performed for a long period of time at a high temperature, the entire thickness direction of the copper foil can be more effectively suppressed. The coarsening of the crystal grains of copper. Further, zinc refers to zinc having a purity of 99% or more. Further, the term "zinc alloy" means a mixture of zinc and other elements, a solid solution, a eutectic, a compound, and the like.

在本發明,將鋅黏附層設為鋅合金層或鋅系複合層時,上述異種金屬元素之中,特別是使用錫為佳。此時,係以在上述換算量,上述每一面之錫的黏附量為1mg/m2~200mg/m2之方式施行表面處理為佳。又,此時,以{[鋅黏附量]/[鋅-錫合金黏附量]}×100所算出的鋅含有比率,係以30質量%以上為佳。對銅箔的表面之鋅的黏附量即便為上述範圍內,鋅黏附層中的鋅含有比率為小於30質量%時,相對於鋅量之錫量變為過剩。因此,由於存在錫使得鋅在銅箔內的擴散受到阻礙,致使鋅在銅箔的內部充分地擴散係變為困難而無法得到上述的效果,乃是不佳。又,該等鋅黏附層係例如能夠使用含有鋅或鋅-錫之防鏽處理劑而形成,能夠達成作為防鏽處理層之功能。 In the present invention, when the zinc adhesion layer is a zinc alloy layer or a zinc-based composite layer, among the above-mentioned different metal elements, tin is particularly preferably used. In this case, it is preferable to carry out surface treatment so that the amount of adhesion of tin on each of the above surfaces is 1 mg/m 2 to 200 mg/m 2 in the above-described conversion amount. In this case, the zinc content ratio calculated by {[zinc adhesion amount] / [zinc-tin alloy adhesion amount]} × 100 is preferably 30% by mass or more. When the amount of zinc adhering to the surface of the copper foil is within the above range, and the zinc content ratio in the zinc adhesive layer is less than 30% by mass, the amount of tin relative to the amount of zinc becomes excessive. Therefore, the presence of tin hinders the diffusion of zinc in the copper foil, and it becomes difficult to sufficiently diffuse zinc inside the copper foil, and the above effects are not obtained, which is not preferable. Moreover, these zinc adhesion layers can be formed, for example, using an anti-rust treatment agent containing zinc or zinc-tin, and can function as a rust-preventing treatment layer.

(3)其他的層結構 (3) Other layer structures

本發明之表面處理銅箔係除了上述鋅黏附層以 外,亦能夠按照必要而任意地包括粗化處理層、鉻酸鹽處理層、有機劑處理層等其他的表面處理層。 The surface treated copper foil of the present invention is in addition to the above zinc adhesion layer Further, other surface treatment layers such as a roughening treatment layer, a chromate treatment layer, and an organic agent treatment layer may be optionally included as necessary.

例如,藉由設置粗化處理層,在將該表面處理銅箔使用作為鋰離子二次電池之陰極集電體時,能夠使該表面處理銅箔的表面與陰極活物質之密著性變為良好。 For example, when the surface-treated copper foil is used as a cathode current collector of a lithium ion secondary battery by providing a roughening treatment layer, the adhesion between the surface of the surface-treated copper foil and the cathode active material can be changed. good.

又,藉由包括鉻酸鹽處理層及/或有機劑處理層,能夠同時藉由上述鋅黏附層及該等層來抑制銅箔表面產生氧化。又,能夠使其成為與上述鋰離子二次電池的陰極活物質等之密著性變為更良好者。又,作為有機劑處理層,能夠舉出矽烷偶合劑處理層、有機防鏽處理層等。 Further, by including the chromate treatment layer and/or the organic agent treatment layer, oxidation of the surface of the copper foil can be suppressed by the zinc adhesion layer and the layers. Moreover, it is possible to make the adhesion to the cathode active material of the lithium ion secondary battery or the like more favorable. Further, examples of the organic agent treatment layer include a decane coupling agent treatment layer, an organic rustproof treatment layer, and the like.

(4)預退火處理 (4) Pre-annealing treatment

本發明之表面處理銅箔,係能夠藉由在上述銅箔的兩面施行上述表面處理之後,施行在200℃~280℃的溫度範圍加熱之預退火處理來得到。藉由施行該預退火處理,能夠在抑制銅的再結晶化之狀態下使鋅在銅箔內擴散。因此,在該表面處理銅箔負荷銅產生再結晶化的溫度以上的熱量時,藉由在晶界所析出的上述化合物,能夠使其發揮妨礙結晶粒的成長且抑制結晶粒粗大化之效果。又,針對預退火處理係後述。又,在以下,有將上述各表面處理後的銅箔且預退火處理前者稱為「表面處理完畢之銅箔」之情形。 The surface-treated copper foil of the present invention can be obtained by subjecting the surface treatment to the both surfaces of the copper foil, followed by pre-annealing treatment in a temperature range of 200 ° C to 280 ° C. By performing this pre-annealing treatment, it is possible to diffuse zinc in the copper foil while suppressing recrystallization of copper. Therefore, when the surface-treated copper foil is loaded with heat of a temperature higher than the temperature at which the copper is recrystallized, the compound precipitated at the grain boundary can exhibit the effect of preventing the growth of the crystal grains and suppressing the coarsening of the crystal grains. Further, the pre-annealing treatment will be described later. In the following, the copper foil after the surface treatment described above is referred to as a "surface-treated copper foil" before the pre-annealing treatment.

(5)機械特性 (5) Mechanical properties

本發明之表面處理銅箔,係藉由對表面處理完畢的銅箔施行上述預退火處理,在惰性氣體環境下,於350℃加熱5小時後的拉伸強度係顯示45kgf/mm2以上;藉由按照銅箔 及鋅(及錫)的黏附量等而將預退火處理的條件調整為適當的條件,該熱處理後的拉伸強度係顯示50kg/mm2以上。在本發明,特別是以藉由調整預退火處理的條件,於350℃加熱5小時後的拉伸強度係顯示50kgf/mm2以上為佳。 The surface-treated copper foil of the present invention is subjected to the pre-annealing treatment on the surface-treated copper foil, and the tensile strength after heating at 350 ° C for 5 hours in an inert gas atmosphere is 45 kgf/mm 2 or more; The conditions of the pre-annealing treatment are adjusted to appropriate conditions in accordance with the amount of adhesion of copper foil and zinc (and tin), and the tensile strength after the heat treatment is 50 kg/mm 2 or more. In the present invention, in particular, the tensile strength after heating at 350 ° C for 5 hours is preferably 50 kgf / mm 2 or more by adjusting the conditions of the pre-annealing treatment.

又,本發明之表面處理銅箔,係相對於常態時的拉伸強度,於350℃加熱5小時後之拉伸強度的維持率,係以在90%~100%的範圍內為佳,該拉伸強度之維持率係以在95%~100%的範圍內為較佳。依照本發明,相較於不施行預退火處理之情況,藉由施行預退火處理,能夠使該熱處理後之拉伸強度的維持率提升。 Further, the surface-treated copper foil of the present invention preferably has a tensile strength after heating at 350 ° C for 5 hours with respect to the tensile strength in a normal state, and is preferably in the range of 90% to 100%. The tensile strength maintenance ratio is preferably in the range of 95% to 100%. According to the present invention, the maintenance rate of the tensile strength after the heat treatment can be improved by performing the pre-annealing treatment as compared with the case where the pre-annealing treatment is not performed.

2.本發明之表面處理銅箔之製造方法 2. Method for producing surface treated copper foil of the present invention

其次,說明本發明之表面處理銅箔之製造方法的實施形態。藉由使用下述的方法來製造表面處理銅箔,能夠得到上述本發明之表面處理銅箔。以下,各步驟都進行說明。 Next, an embodiment of a method for producing a surface-treated copper foil of the present invention will be described. The surface-treated copper foil of the present invention described above can be obtained by producing a surface-treated copper foil by the following method. Hereinafter, each step will be described.

(1)銅箔的準備 (1) Preparation of copper foil

在本發明,係準備以總量計含有100ppm以上之選自碳、硫、氯及氮之1種或2種以上的微量成分之銅箔。在此,各微量成分的含量係以在各自上述的範圍內為佳。又,針對構成該銅箔之銅的平均結晶粒徑係以1.0μm以下為佳,該平均結晶粒徑係以0.8μm以下為較佳而言,亦如上述。而且,針對以使用常態抗張強度為50kgf/mm2以上之銅箔為較佳而言亦如上述。只要能夠得到滿足此種條件之銅箔,其製造方法就沒有特別限定,從藉由調整電解液中的各種添加物等而容易得到滿足上述條件的銅箔之觀點,以使用電解法來製造銅箔為佳。 In the present invention, a copper foil containing 100 ppm or more of a trace component selected from the group consisting of carbon, sulfur, chlorine, and nitrogen in one or more amounts is prepared. Here, the content of each of the minor components is preferably within the above respective ranges. Further, the average crystal grain size of the copper constituting the copper foil is preferably 1.0 μm or less, and the average crystal grain size is preferably 0.8 μm or less. Further, it is preferable to use a copper foil having a normal tensile strength of 50 kgf/mm 2 or more as described above. The copper foil which satisfies such a condition is not particularly limited, and the copper foil which satisfies the above conditions can be easily obtained by adjusting various additives in the electrolytic solution, etc., and copper is produced by electrolysis. Foil is better.

(2)粗化處理步驟 (2) roughening processing steps

其次,在銅箔的表面設置粗化處理層時,係對上述銅箔的表面施行粗化處理。在本發明,粗化處理層係任意層結構,而且針對粗化處理方法及粗化處理條件係沒有特別限定。又,在施行粗化處理之前,以進行酸洗處理銅箔表面等之前處理為佳係自不待言。但是,粗化處理方法及粗化處理條件,在此係沒有特別限定,按照該銅箔被要求的表面特性而採用先前習知的方法之適宜妥當的方法及條件即可。 Next, when the roughened layer is provided on the surface of the copper foil, the surface of the copper foil is subjected to a roughening treatment. In the present invention, the roughening treatment layer is an arbitrary layer structure, and the roughening treatment method and the roughening treatment conditions are not particularly limited. Further, it is not necessary to perform the treatment before the roughening treatment to perform the pickling treatment on the surface of the copper foil or the like. However, the roughening treatment method and the roughening treatment conditions are not particularly limited, and suitable methods and conditions of the conventional methods may be employed depending on the desired surface characteristics of the copper foil.

(3)鋅黏附步驟(表面處理步驟) (3) Zinc adhesion step (surface treatment step)

其次,在銅箔的表面使用含有鋅之表面處理劑而施行表面處理(以下,稱為「鋅黏附處理」),來形成含有鋅之鋅黏附層。在該鋅黏附處理步驟,係只要能夠在銅箔的表面以鋅的黏附量為上述範圍內之方式形成鋅黏附層,可以使用任何方法。例如,能夠使用電解鍍覆或無電解鍍覆等的電化學手法、濺射蒸鍍或化學氣相反應等的物理蒸鍍手法。但是,考慮生產成本時,以採用電化學手法為佳。又,在表面處理劑,除了鋅以外亦可含有其他的金屬元素係如上述,而且作為該其他的金屬元素係以錫為佳之點,亦如上述。 Next, a surface treatment (hereinafter referred to as "zinc adhesion treatment") is applied to the surface of the copper foil using a surface treatment agent containing zinc to form a zinc-containing zinc adhesion layer. In the zinc adhesion treatment step, any method can be used as long as the zinc adhesion layer can be formed on the surface of the copper foil so that the amount of adhesion of zinc is within the above range. For example, an electrochemical vapor deposition method such as electrolytic plating or electroless plating, or a physical vapor deposition method such as sputtering vapor deposition or chemical vapor phase reaction can be used. However, when considering the production cost, it is preferable to use an electrochemical method. Further, the surface treatment agent may contain other metal elements in addition to zinc as described above, and the other metal elements are preferably tin, as described above.

電解鍍覆法: Electrolytic plating method:

使用電解鍍覆法在銅箔的表面施行鋅黏附處理時,作為鋅鍍覆液,能夠使用焦磷酸鋅鍍覆浴、氰化鋅鍍覆浴、硫酸鋅鍍覆浴等。例如,採用焦磷酸鋅鍍覆浴時,具體而言,係採用鋅濃度為5g/l~30g/l、焦磷酸鉀濃度為50g/l~500g/l、pH9~pH12之浴組成,藉由在液溫20~50℃的溶液中將銅箔本 身極化成為陰極且以電流密度0.3A/dm2~10A/dm2A的條件進行電解,能夠在銅箔表面形成鋅黏附層。 When the zinc adhesion treatment is applied to the surface of the copper foil by the electrolytic plating method, a zinc pyrophosphate plating bath, a zinc cyanide plating bath, a zinc sulfate plating bath, or the like can be used as the zinc plating solution. For example, when a zinc pyrophosphate plating bath is used, specifically, a bath having a zinc concentration of 5 g/l to 30 g/l, a potassium pyrophosphate concentration of 50 g/l to 500 g/l, and a pH of 9 to pH 12 is used. The copper foil itself is polarized to a cathode in a solution having a liquid temperature of 20 to 50 ° C and electrolyzed under the conditions of a current density of 0.3 A/dm 2 to 10 A/dm 2 A to form a zinc adhesion layer on the surface of the copper foil.

(4)鉻酸鹽處理 (4) chromate treatment

可以對鋅黏附層的表面,隨意地施行鉻酸鹽處理。鉻酸鹽處理係有電解鉻酸鹽處理及浸漬鉻酸鹽處理,使用任一方法均無妨。但是,考慮鉻酸鹽皮膜的厚度偏差、黏附量的穩定性等時,以採用電解鉻酸鹽處理為佳。電解鉻酸鹽處理時之電解條件係沒有特別限定,能夠採用適宜、妥當的條件。 The chromate treatment can be optionally applied to the surface of the zinc adhesion layer. The chromate treatment is electrolytic chromate treatment and impregnation chromate treatment, and any method can be used. However, when considering the thickness deviation of the chromate film, the stability of the adhesion amount, etc., it is preferable to use electrolytic chromate treatment. The electrolysis conditions in the electrolytic chromate treatment are not particularly limited, and appropriate and appropriate conditions can be employed.

(5)有機劑處理 (5) Organic agent treatment

又,亦可以對鋅黏附層的表面施行有機劑處理。在此所稱有機劑處理,係有矽烷偶合劑處理、有機防鏽處理等。 Further, the surface of the zinc adhesion layer may be treated with an organic agent. The organic agent treatment referred to herein is a decane coupling agent treatment, an organic rustproof treatment, or the like.

矽烷偶合劑處理: Decane coupling agent treatment:

在本發明,矽烷偶合劑處理係不需要,係考慮對銅箔所要求之與絕緣樹脂基材或是鋰離子二次電池的陰極活物質之密著性等而適當地施行之處理,能夠採用適宜、妥當的條件及方法。 In the present invention, the treatment of the decane coupling agent is not required, and the treatment which is required for the copper foil to be adhered to the insulating resin substrate or the cathode active material of the lithium ion secondary battery is appropriately performed, and can be suitably employed. Appropriate and appropriate conditions and methods.

有機防鏽處理: Organic anti-rust treatment:

又,為了進一步提升防鏽效果而施行有機防鏽處理時,能夠使用例如苯并三唑類的甲基苯并三唑(tolyltriazole)、胺基苯并三唑、羧基苯并三唑、苯并三唑等的有機劑而施行表面處理。又,作為其他的有機劑,亦可使用脂肪族羧酸、烷基胺類、苯甲酸類、咪唑類、三硫醇類等。針對有機防鏽處理,亦沒有特別限定,能夠採用適宜、妥當的條件及方法。 Further, in order to further enhance the rust prevention effect, for example, benzotriazole-based tolyltriazole, aminobenzotriazole, carboxybenzotriazole, benzo can be used. A surface treatment is carried out with an organic agent such as triazole. Further, as other organic agents, aliphatic carboxylic acids, alkylamines, benzoic acids, imidazoles, and trisole may also be used. Mercaptans and the like. The organic rustproof treatment is not particularly limited, and appropriate and appropriate conditions and methods can be employed.

(6)乾燥步驟 (6) Drying step

對銅箔之上述各種表面處理結束時,係進行乾燥步驟,來使在上述各種表面處理步驟處於濕潤狀態下之銅箔乾燥。乾燥條件係沒有特別限定。但是,進行有機劑處理時,係採用能夠防止在銅箔表面所黏附的矽烷偶合劑及/或有機防鏽劑產生熱分解等且能夠使該等藥劑以良好的狀態黏著在銅箔表面之熱處理條件(溫度、時間等)即可。 At the end of the various surface treatments of the copper foil, a drying step is performed to dry the copper foil in the wet state of the various surface treatment steps described above. The drying conditions are not particularly limited. However, when the organic agent treatment is carried out, heat treatment such as prevention of thermal decomposition of the decane coupling agent and/or the organic rust preventive agent adhering to the surface of the copper foil and adhesion of the chemicals to the surface of the copper foil in a good state can be employed. Conditions (temperature, time, etc.) can be.

(7)預退火步驟 (7) Pre-annealing step

其次,針對預退火步驟進行說明。預退火步驟,係對經過至上述乾燥步驟為止的步驟之銅箔,藉由在200C~280℃的溫度範圍施行熱處理,使鋅從鋅黏附層側在銅箔內擴散而得到本發明之表面處理銅箔之步驟。 Next, the pre-annealing step will be described. In the pre-annealing step, the copper foil subjected to the step up to the drying step is subjected to heat treatment in a temperature range of 200 C to 280 ° C to diffuse zinc from the zinc adhesion layer side in the copper foil to obtain a surface treatment of the present invention. The step of copper foil.

溫度: temperature:

在本發明,上述銅箔係藉由存在上述微量成分,即便在200℃~280℃的溫度範圍加熱,結晶粒亦不容易產生粗大化。又,相較於將該銅箔於常溫保管時,在上述溫度範圍內加熱在表面包括鋅黏附層之上述銅箔時,能夠使用與工業上的生產效率更平衡的速度使鋅在銅箔內擴散,而且亦能夠使在銅箔內之鋅的分布更均勻化。因此,藉由施行預退火處理,即便對該表面處理銅箔長時間繼續負荷高溫的熱量,亦能夠提高抑制銅的結晶粒的粗大化之效果,相較於不施行預退火處理時,能夠更充分地抑制拉伸強度降低。 In the present invention, the copper foil is not easily coarsened by heating even in the temperature range of 200 ° C to 280 ° C by the presence of the above-mentioned minor component. Further, when the copper foil is heated at a normal temperature and the copper foil having a zinc adhesion layer on the surface is heated in the above temperature range, zinc can be used in the copper foil at a speed which is more balanced with industrial production efficiency. Diffusion, but also to make the distribution of zinc in the copper foil more uniform. Therefore, by performing the pre-annealing treatment, even if the surface-treated copper foil continues to be subjected to a high-temperature heat for a long period of time, the effect of suppressing the coarsening of the crystal grains of copper can be enhanced, and the pre-annealing treatment can be performed more than when the pre-annealing treatment is not performed. The reduction in tensile strength is sufficiently suppressed.

處理時間: Processing time:

其次,針對施行預退火處理之時間(以下,「處理時 間」)進行說明。相較於在常溫保管時,藉由對上述表面處理後之銅箔施行預退火處理,能夠使在銅箔內之鋅擴散量増加,即便於高溫被施行熱處理之後,亦能夠抑制拉伸強度降低。但是,從不僅是銅箔的表層部,亦使充分量的鋅在銅箔的內部擴散之觀點,該處理時間係以2小時以上且25小時以下為佳。又,從更充分使鋅在銅箔的內部擴散且使銅箔內之鋅的分布更均勻化之觀點,該處理時間係以8小時以上且25小時以下為佳。另一方面,該處理時間小於2小時,在銅箔的內部之鋅擴散量少,長時間施行高溫熱處理時,在銅箔的內部之結晶粒有粗大化之可能性,而且有無法充分地抑制拉伸強度降低之情形。又,預退火時間為25小時以上時,即便施行其以上之預退火處理,抑制銅的結晶粒的粗大化之效果亦飽和。又,熱處理之成本等亦増加。因此,從該等的觀點,預退火時間係以設為25小時以內為佳。 Secondly, the time for performing the pre-annealing treatment (hereinafter, "When processing" ()" to explain. When the surface-treated copper foil is pre-annealed at a normal temperature, the amount of zinc diffusion in the copper foil can be increased, and the tensile strength can be suppressed even after the heat treatment is performed at a high temperature. . However, from the viewpoint of not only the surface layer portion of the copper foil but also a sufficient amount of zinc diffused inside the copper foil, the treatment time is preferably 2 hours or longer and 25 hours or shorter. Further, from the viewpoint of more sufficiently diffusing zinc inside the copper foil and making the distribution of zinc in the copper foil more uniform, the treatment time is preferably 8 hours or longer and 25 hours or shorter. On the other hand, when the treatment time is less than 2 hours, the amount of zinc diffusion in the inside of the copper foil is small, and when the high-temperature heat treatment is performed for a long period of time, the crystal grains inside the copper foil may be coarsened, and the film may not be sufficiently suppressed. The case where the tensile strength is lowered. Further, when the pre-annealing time is 25 hours or longer, even if the pre-annealing treatment is performed, the effect of suppressing the coarsening of the crystal grains of copper is saturated. Moreover, the cost of heat treatment and the like are also increased. Therefore, from these viewpoints, the pre-annealing time is preferably set to be within 25 hours.

但是,預退火條件係按照該銅箔的結晶構造、該銅箔內之微量成分的含量、鋅對該銅箔之黏附量等,適合鋅的擴散之最佳加熱溫度及/或時間係不同。因此,以按照該等而在上述範圍內的溫度及時間之中,適當地設定妥當的預退火條件為佳。 However, the pre-annealing conditions are different depending on the crystal structure of the copper foil, the content of the trace component in the copper foil, the adhesion amount of zinc to the copper foil, and the like, and the optimum heating temperature and/or time for the diffusion of zinc. Therefore, it is preferable to appropriately set the pre-annealing conditions appropriately in the temperature and time within the above range in accordance with the above.

<本發明之陰極集電體的實施形態> <Embodiment of Cathode Current Collector of the Present Invention>

其次,說明本發明之陰極集電體的實施形態。本發明之陰極集電體,其特徵在於使用上述本發明之表面處理銅箔,在鋰離子二次電池等的非水系二次電池,能夠使用作為接觸電池內部的陰極合材之集電體。本發明之集電體係除了使用 上述表面處理銅箔以外,係沒有特別限定。因為本發明之集電體係使用上述表面處理銅箔,所以成為拉伸強度等的機械特性優異者。 Next, an embodiment of the cathode current collector of the present invention will be described. In the cathode current collector of the present invention, the surface-treated copper foil of the present invention can be used as a current collector which is a cathode material in contact with the inside of a nonaqueous secondary battery such as a lithium ion secondary battery. The current collection system of the present invention is used in addition to The surface-treated copper foil is not particularly limited. Since the current collecting system of the present invention uses the surface-treated copper foil described above, it is excellent in mechanical properties such as tensile strength.

<本發明之非水系二次電池之陰極材料的實施形態> <Embodiment of Cathode Material of Nonaqueous Secondary Battery of the Present Invention>

其次,說明本發明之非水系二次電池之陰極材料的實施形態。在此,所謂非水系二次電池,係使用水溶液以外的電解質之二次電池的總稱,係指使用有機電解液、聚合物凝膠電解質、固體電解質、聚合物電解質、熔融鹽電解質等之二次電池。本發明之陰極材料,係只要是使用上述集電體者,針對其形態就沒有特別限定。例如,如鋰離子二次電池之陰極材料,能夠設為在集電體的表面包括陰極合劑層之結構。又,此時,陰極合劑層係例如能夠設為含有陰極活物質、導電劑及結著劑之結構。 Next, an embodiment of a cathode material of a nonaqueous secondary battery of the present invention will be described. Here, the non-aqueous secondary battery is a generic term for a secondary battery using an electrolyte other than an aqueous solution, and is a secondary use of an organic electrolytic solution, a polymer gel electrolyte, a solid electrolyte, a polymer electrolyte, or a molten salt electrolyte. battery. The cathode material of the present invention is not particularly limited as long as it is a current collector. For example, a cathode material such as a lithium ion secondary battery can be configured to include a cathode mixture layer on the surface of the current collector. Moreover, in this case, the cathode mixture layer can be configured to contain, for example, a cathode active material, a conductive agent, and a binder.

如上述,相較於不施行預退火處理時,本發明之表面處理銅箔係抑制拉伸強度降低之效果較高且熱處理後之拉伸強度的維持率較高。其結果,即便在惰性氣體環境下於350℃被加熱5小時,亦能夠維持45kgf/mm2以上、較佳是50kgf/mm2以上之拉伸強度。因此,即便由於在鋰離子二次電池等重複充放電循環而對集電體重複施加應力之情況,在集電體產生皺紋等的變形或是斷裂之可能性小而能夠維持鋰離子二次電池的電特性。又,在製造鋰離子二次電池之陰極材料時,在集電體的表面形成陰極合劑層之步驟,集電體係負荷高溫的熱量。即便此時,亦具有充分水準的拉伸強度。 As described above, the surface-treated copper foil of the present invention has a higher effect of suppressing the decrease in tensile strength and a higher retention rate of tensile strength after heat treatment than when the pre-annealing treatment is not performed. As a result, even if they are heated in an inert gas atmosphere at 350 ℃ 5 hours, and also possible to maintain 45kgf / mm 2 or more, preferably 2 or more and tensile strength of 50kgf / mm. Therefore, even if a stress is repeatedly applied to the current collector due to repeated charge and discharge cycles such as a lithium ion secondary battery, the possibility that the current collector is deformed or broken due to wrinkles or the like is small, and the lithium ion secondary battery can be maintained. Electrical characteristics. Further, in the case of manufacturing a cathode material of a lithium ion secondary battery, a step of forming a cathode mixture layer on the surface of the current collector, the collector system is loaded with heat of a high temperature. Even at this time, it has a sufficient level of tensile strength.

以下,舉出實施例及比較例而更具體地說明本發 明之表面處理銅箔,但是本發明係不被以下實施例限定。 Hereinafter, the present invention will be described more specifically by way of examples and comparative examples. The copper foil is surface treated, but the present invention is not limited by the following examples.

[實施例1] [Example 1]

在本實施例1,係製造本發明之銅箔而且與後述之比較例1對照。以下,依照順序敘述其步驟。 In the present Example 1, the copper foil of the present invention was produced and compared with Comparative Example 1 described later. Hereinafter, the steps will be described in order.

銅箔的準備: Preparation of copper foil:

首先,準備銅箔中之上述微量元素的合計量為100ppm以上(碳44ppm、硫14ppm、氯54ppm、氮11ppm、平均結晶粒徑0.64μm)的電解銅箔。具體而言,係準備三井金屬礦業股份公司製之在製造VLP銅箔所使用之未施行表面處理之厚度12μm的電解銅箔。 First, an electrolytic copper foil having a total amount of the above-mentioned trace elements in the copper foil of 100 ppm or more (44 ppm of carbon, 14 ppm of sulfur, 54 ppm of chlorine, 11 ppm of nitrogen, and an average crystal grain size of 0.64 μm) was prepared. Specifically, an electrolytic copper foil having a thickness of 12 μm which was not subjected to surface treatment used for manufacturing a VLP copper foil manufactured by Mitsui Mining Co., Ltd. was prepared.

粗化處理步驟: Roughing process steps:

然後,將上述銅箔浸漬在自由硫酸(free sulfuric acid)濃度為200g/l、銅濃度為8g/l、液溫35℃的銅鍍覆液之中,來將銅箔本身極化成為陰極,而且在電流密度25A/dm2的燒焦銅鍍覆條件下進行電解,來使微細銅粒析出黏附在銅箔的陰極面側表面。其次,為了防止該微細銅粒脫落,係在自由硫酸濃度為110g/l、銅濃度為70g/l、液溫50℃的銅鍍覆液中,將銅箔本身極化成為陰極,而且在電流密度25A/dm2的平滑鍍覆條件下進行電解而完成陰極面側的粗化處理。 Then, the copper foil is immersed in a copper plating solution having a free sulfuric acid concentration of 200 g/l, a copper concentration of 8 g/l, and a liquid temperature of 35 ° C to polarize the copper foil itself into a cathode. Further, electrolysis was carried out under the conditions of the burnt copper plating of a current density of 25 A/dm 2 to precipitate and adhere the fine copper particles to the cathode surface side surface of the copper foil. Next, in order to prevent the fine copper particles from falling off, the copper foil itself is polarized into a cathode in a copper plating solution having a free sulfuric acid concentration of 110 g/l, a copper concentration of 70 g/l, and a liquid temperature of 50 ° C, and is in a current. Electrolysis was performed under smooth plating conditions of a density of 25 A/dm 2 to complete the roughening treatment on the cathode surface side.

鋅黏附處理步驟: Zinc adhesion treatment steps:

在上述粗化處理後之銅箔的兩面使用含有鋅及錫之表面處理劑,在銅箔的兩面形成由鋅-錫合金所構成之鋅黏附層。首先,針對鋅黏附層的形成方法進行說明。 A surface treatment agent containing zinc and tin is used on both surfaces of the copper foil after the roughening treatment, and a zinc adhesion layer made of a zinc-tin alloy is formed on both surfaces of the copper foil. First, a method of forming a zinc adhesion layer will be described.

在本實施例,係使用焦磷酸鋅-錫鍍覆浴,在銅箔 的兩面形成鋅-銅合金層作為鋅黏附層。焦磷酸鋅-錫鍍覆浴的浴組成係設為鋅濃度為1g/l~6g/l、錫濃度為1g/l~6g/l、焦磷酸鉀濃度為100g/l、pH10.6。在該組成的焦磷酸鋅-錫鍍覆浴中,藉由液溫設為30℃,將銅箔本身極化成為陰極且適當地調整電流密度及電解時間,來得到銅箔的每一面之鋅的黏附量為50mg/m2、錫的黏附量為5mg/m2之銅箔,而且將其設為試料1。 In this example, a zinc pyrophosphate-tin plating bath was used to form a zinc-copper alloy layer on both sides of the copper foil as a zinc adhesion layer. The bath composition of the zinc pyrophosphate-tin plating bath is set to have a zinc concentration of 1 g/l to 6 g/l, a tin concentration of 1 g/l to 6 g/l, a potassium pyrophosphate concentration of 100 g/l, and a pH of 10.6. In the zinc pyrophosphate-tin plating bath of this composition, the copper foil itself was polarized to a cathode by a liquid temperature of 30 ° C, and the current density and the electrolysis time were appropriately adjusted to obtain zinc on each side of the copper foil. The adhesion amount was 50 mg/m 2 , and the adhesion amount of tin was 5 mg/m 2 of copper foil, and this was set as the sample 1.

預退火處理步驟: Pre-annealing steps:

其次,以表1所表示的條件對試料1施行預退火處理,而且將其設為實施試料1。但是,在預退火處理時,係將各試料放入烘箱且使箱內溫度以5℃/min升溫。然後,以在表1之該試料1所適用的處理條件進行加熱。又,在表1,以「○」表示之欄,係意味著以該條件(溫度、處理時間)對預退火處理為在該欄的括弧內所表示的號碼之試料進行。 Next, the sample 1 was subjected to a pre-annealing treatment under the conditions shown in Table 1, and this was carried out to carry out the sample 1. However, in the pre-annealing treatment, each sample was placed in an oven and the temperature inside the chamber was raised at 5 ° C / min. Then, heating was carried out under the treatment conditions applicable to the sample 1 of Table 1. Further, in Table 1, the column indicated by "○" means that the pre-annealing treatment is performed on the sample indicated by the parentheses in the column in the condition (temperature, processing time).

[實施例2] [Embodiment 2]

在實施例2,係除了將錫的每一面之黏附量設為15mg/m2以外,與實施例1同樣地進行而製造試料2之後,以表1所表示的條件施行預退火處理而設為實施試料2。 In the second embodiment, the sample 2 was produced in the same manner as in Example 1 except that the amount of adhesion on each side of the tin was 15 mg/m 2 , and then pre-annealing was performed under the conditions shown in Table 1. Sample 2 was carried out.

[實施例3] [Example 3]

在實施例3,係除了將錫的每一面之黏附量設為30mg/m2以外,與實施例1同樣地進行而製造試料3之後,以表1所表示的條件施行預退火處理而設為實施試料3。 In the third embodiment, the sample 3 was produced in the same manner as in Example 1 except that the amount of adhesion on each side of the tin was 30 mg/m 2 , and then pre-annealing was performed under the conditions shown in Table 1. Sample 3 was carried out.

[實施例4] [Example 4]

在實施例4,係除了將錫的每一面之黏附量設為15mg/m2,將鋅的總黏附量設為100mg/m2以外,與實施例1 同樣地進行而製造試料4之後,以表1所表示的條件施行預退火處理而設為實施試料4。 In the fourth embodiment, the sample 4 was produced in the same manner as in Example 1 except that the amount of adhesion of each side of the tin was 15 mg/m 2 and the total amount of zinc adhered was 100 mg/m 2 . The conditions shown in Table 1 were subjected to a pre-annealing treatment to carry out the sample 4.

[實施例5] [Example 5]

在實施例5,係除了將錫的每一面之黏附量設為15mg/m2,將鋅的總黏附量設為150mg/m2以外,與實施例1同樣地進行而製造試料5之後,以表1所表示的條件施行預退火處理而設為實施試料5。 In the fifth embodiment, the sample 5 was produced in the same manner as in Example 1 except that the amount of adhesion of each side of the tin was 15 mg/m 2 and the total amount of zinc adhered was 150 mg/m 2 . The conditions shown in Table 1 were subjected to a pre-annealing treatment to carry out the sample 5.

[實施例6] [Embodiment 6]

其次,針對實施例6進行說明。在實施例6,係如以下製造本發明之其他的銅箔。以下,依照順序敘述其步驟。 Next, the description will be given of the sixth embodiment. In Example 6, the other copper foil of the present invention was produced as follows. Hereinafter, the steps will be described in order.

銅箔的製造: Copper foil manufacturing:

在實施例6,係使用以下所表示的條件所製造之電解銅箔。首先,作為硫酸系銅電解液,係使用以80g/l的濃度含有銅離子,以250g/l的濃度含有硫酸,而且以2.7ppm的濃度含有氯離子,以2ppm的濃度含有明膠(gelatin)之電解液(50℃),以50A/dm2的電流密度進行電解,來得到12μm厚度的電解銅箔。該電解銅箔中之微量成分的含量為碳49ppm、硫26ppm、氯24ppm、氮11ppm,平均結晶粒徑為0.58μm。 In Example 6, an electrolytic copper foil produced under the conditions shown below was used. First, as a sulfuric acid-based copper electrolytic solution, copper ions are contained at a concentration of 80 g/l, sulfuric acid is contained at a concentration of 250 g/l, chloride ions are contained at a concentration of 2.7 ppm, and gelatin is contained at a concentration of 2 ppm. The electrolytic solution (50 ° C) was electrolyzed at a current density of 50 A/dm 2 to obtain an electrolytic copper foil having a thickness of 12 μm. The content of the trace component in the electrolytic copper foil was 49 ppm of carbon, 26 ppm of sulfur, 24 ppm of chlorine, and 11 ppm of nitrogen, and the average crystal grain size was 0.58 μm.

粗化處理步驟: Roughing process steps:

然後,與實施例1同樣地進行而對上述銅箔施行粗化處理。 Then, the copper foil was subjected to a roughening treatment in the same manner as in the first embodiment.

鋅黏附步驟: Zinc adhesion step:

在上述粗化處理後的電解銅箔,係除了將每一面之錫的黏附量設為25mg/m2,將鋅的黏附量設為150mg/m2以 外,與實施例1同樣地進行而在上述銅箔的兩面形成鋅黏附層,來製造試料6。然後,與實施例1同樣地進行且以表1所表示的條件施行預退火處理,而且將各預退火處理後的試料設為實施試料6。 The electrolytic copper foil after the roughening treatment was carried out in the same manner as in Example 1 except that the amount of adhesion of tin on each side was 25 mg/m 2 and the adhesion amount of zinc was 150 mg/m 2 . A sample of the sample 6 was produced by forming a zinc adhesion layer on both surfaces of the copper foil. Then, in the same manner as in Example 1, the pre-annealing treatment was carried out under the conditions shown in Table 1, and the sample after the pre-annealing treatment was used as the sample 6 to be carried out.

[實施例7] [Embodiment 7]

在實施例7,係除了形成鋅層作為鋅黏附層以外,與實施例1同樣地進行而製造表面處理銅箔。鋅層係使用焦磷酸鋅鍍覆浴而形成。除了焦磷酸鋅鍍覆浴的浴組成係採用鋅濃度為6g/l、焦磷酸鉀濃度為125g/l、pH10.5之浴組成以外,與實施例1同樣地進行電解,銅箔的每一面之鋅的黏附量為50mg/m2之銅箔,而且將其設為試料7。隨後,與實施例1同樣地進行且以在表1所表示的條件來施行預退火處理,而且將各預退火後之試料設為實施試料7。 In Example 7, a surface-treated copper foil was produced in the same manner as in Example 1 except that a zinc layer was formed as a zinc adhesion layer. The zinc layer is formed using a zinc pyrophosphate plating bath. Electrolysis was carried out in the same manner as in Example 1 except that the bath composition of the zinc pyrophosphate plating bath was composed of a bath having a zinc concentration of 6 g/l, a potassium pyrophosphate concentration of 125 g/l, and a pH of 10.5, and each side of the copper foil was used. The amount of zinc adhered was 50 mg/m 2 of copper foil, and it was set to sample 7. Subsequently, the pre-annealing treatment was carried out in the same manner as in Example 1 under the conditions shown in Table 1, and each pre-annealed sample was subjected to the sample 7.

[比較例] [Comparative example]

在比較例,係除了不施行預退火處理以外,與實施例1~實施例7同樣地製造試料,而且將各自設為比較試料1~比較試料7。 In the comparative example, samples were prepared in the same manner as in the first to seventh embodiments except that the pre-annealing treatment was not carried out, and each of the samples was set as the comparative sample 1 to the comparative sample 7.

為了容易對照在各實施例及比較例所製造的試料之條件等,在表2係顯示在各試料之錫及鋅的總黏附量及銅箔之種類的不同。又,在表2,係顯示使用後述的方法所測定之各銅箔(A或B)的常態拉伸強度。又,在表2,所謂銅箔的種別A,係指在實施例1~實施例5及實施例7所使用的電解銅箔,所謂銅箔的種別B,係指使用在實施例6所記載的方法所製造之電解銅箔。 In order to easily compare the conditions of the samples produced in the respective examples and comparative examples, Table 2 shows the difference in the total amount of adhesion of tin and zinc and the type of copper foil in each sample. Moreover, in Table 2, the normal tensile strength of each copper foil (A or B) measured by the method mentioned later is shown. In addition, in Table 2, the type A of the copper foil refers to the electrolytic copper foil used in the first to fifth embodiments and the seventh embodiment, and the type B of the copper foil is used in the sixth embodiment. Electrolytic copper foil produced by the method.

[評價] [Evaluation] 1.評價方法 Evaluation method (1)微量元素含量 (1) Trace element content

在實施例1~實施例6及比較例所使用之各銅箔中的微量元素之微量元素含量係如以下進行而測定。首先,銅箔中的碳及硫含量係使用堀場製作所製股份公司的碳.硫分析裝置(EMIA-920V)而分析。又,針對銅箔中的氮含量,係使用堀場製作所股份公司製的氧.氮分析裝置(EMGA-620)而分析。而且,針對銅箔中的氯含量,係藉由氯化銀比濁法且使用日立HIGHTECHNOLOGIES股份公司製的分光光度計(U-3310)而分析。 The trace element contents of the trace elements in each of the copper foils used in Examples 1 to 6 and Comparative Examples were measured as follows. First of all, the carbon and sulfur content in the copper foil is based on the carbon of the joint-stock company. Analysis by sulfur analyzer (EMIA-920V). In addition, for the nitrogen content in the copper foil, the oxygen produced by the company is used. Analyzed by a nitrogen analyzer (EMGA-620). Further, the chlorine content in the copper foil was analyzed by a silver chloride turbidimetric method using a spectrophotometer (U-3310) manufactured by Hitachi HIGHTECHNOLOGIES Co., Ltd.

(2)拉伸強度 (2) Tensile strength

在惰性氣體環境下,將在實施例1~實施例6及比較例所得到的各試料,於350℃加熱5小時,而且測定加熱後之各試料的拉伸強度。 Each of the samples obtained in Examples 1 to 6 and Comparative Examples was heated at 350 ° C for 5 hours in an inert gas atmosphere, and the tensile strength of each sample after heating was measured.

又,在本發明,「拉伸強度」係指依據IPC-TM-650,使用100mm×10mm(評點間距離:50mm)的薄長方形之銅箔試料,以拉伸速度50mm/min測定時之值。 Further, in the present invention, "tensile strength" means a value obtained by measuring a tensile speed of 50 mm/min using a thin rectangular copper foil sample of 100 mm × 10 mm (distance between points) according to IPC-TM-650. .

(3)結晶組織 (3) Crystalline structure

針對在實施例1及實施例5、比較例1及比較例5所得到的各試料及施行粗化處理、鋅黏附處理等之前之未處理的銅箔(A及B),在惰性氣體環境下,使用以下的方法測定於350℃加熱5小時後之結晶粒徑。又,針對在實施例1及實施例5所得到的實施試料1及實施試料5,係使用以處理條件(1)(200℃)施行預退火處理8小時者。 For each sample obtained in Example 1 and Example 5, Comparative Example 1 and Comparative Example 5, and untreated copper foils (A and B) before roughening treatment, zinc adhesion treatment, etc., in an inert gas atmosphere The crystal grain size after heating at 350 ° C for 5 hours was measured by the following method. Further, for the sample 1 and the sample 5 obtained in the first and fifth embodiments, the pre-annealing treatment was carried out for 8 hours under the treatment conditions (1) (200 ° C).

銅箔的結晶粒徑之測定,係使用搭載有EBSD評價裝置(OIM Analysis、TSL Solutions股份公司製)之FE槍型的掃描型電子顯微鏡(SUPRA 55VP、Carl Zeiss股份公司製)及附屬的EBSD解析裝置。針對被適當地剖面加工後之該試樣,使用該裝置且依照EBSD法而得到銅箔剖面結晶狀態的圖案之影像數據,而且使用EBSD解析程式(OIMAnalysis、TSLSolutions股份公司製)的分析功能表而將該影像數據進行平均結晶粒徑的數值化。在本評價,係將方位差5°以上視為結晶晶界。觀察時之掃描型電子顯微鏡的條件係加速電壓:20kV、孔徑:60mm、High Current mode、試料角度:70°。又,觀察倍率、測定區域、位移尺寸係按照結晶粒的大小而適當地變更條件來測定。 For the measurement of the crystal grain size of the copper foil, a FE-type scanning electron microscope (SUPRA 55VP, manufactured by Carl Zeiss AG) equipped with an EBSD evaluation device (manufactured by OIM Analysis, TSL Solutions Co., Ltd.) and an attached EBSD analysis were used. Device. The image data of the pattern of the cross-sectional crystal state of the copper foil was obtained by the EBSD method, and the EBSD analysis program (OIMAnalysis, manufactured by TSLSolutions Co., Ltd.) was used for the sample. The image data was quantified by the average crystal grain size. In this evaluation, the difference in orientation of 5° or more is regarded as a crystal grain boundary. The conditions of the scanning electron microscope at the time of observation were acceleration voltage: 20 kV, aperture: 60 mm, High Current mode, and sample angle: 70°. Further, the observation magnification, the measurement region, and the displacement size were measured by appropriately changing the conditions according to the size of the crystal grains.

2.評價結果 2. Evaluation results (1)拉伸強度 (1) Tensile strength

首先,在表3~表7,係顯示於350℃施行熱處理5小時後之各實施試料及比較試料的拉伸強度。又,在表7係顯示於350℃加熱1小時後之比較試料5及比較試料6的拉伸強度。又,在各表,係以百分率表示相對於常態拉伸強度之各試料在熱處理後之拉伸強度的維持率。 First, in Tables 3 to 7, the tensile strength of each of the sample and the comparative sample after heat treatment at 350 ° C for 5 hours was shown. Further, Table 7 shows the tensile strengths of Comparative Sample 5 and Comparative Sample 6 after heating at 350 ° C for 1 hour. Further, in each of the tables, the maintenance ratio of the tensile strength after heat treatment of each sample with respect to the normal tensile strength was expressed as a percentage.

如在表3~表6所顯示,本發明之實施試料1~實施試料7,係不管施行預退火處理時的處理條件如何,於350℃加熱5小時後的拉伸強度係任一者均顯示45kgf/mm2以上之值,而且,可維持常態拉伸強度之79%~102%的拉伸強度。又,藉由按照銅箔之微量成分的含量等而調整鋅的黏附量、錫的黏 附量等,同時採用較佳預退火處理條件,能夠維持於350℃加熱5小時後亦能夠維持50kgf/mm2以上的拉伸強度,能夠確認可將拉伸強度降低率抑制在10%以內,較佳是5%以內。 As shown in Tables 3 to 6, the sample 1 to the sample 7 of the present invention is displayed in any one of the tensile strengths after heating at 350 ° C for 5 hours regardless of the processing conditions at the time of performing the pre-annealing treatment. A value of 45 kgf/mm 2 or more, and a tensile strength of 79% to 102% of the normal tensile strength can be maintained. In addition, by adjusting the amount of adhesion of zinc, the amount of adhesion of tin, etc. according to the content of a trace component of the copper foil, etc., and by using preferable pre-annealing conditions, it is possible to maintain 50 kgf/mm after heating at 350 ° C for 5 hours. When the tensile strength of 2 or more is confirmed, the tensile strength reduction rate can be suppressed to 10% or less, preferably 5% or less.

又,比較實施試料1~實施試料6、實施試料7時,能夠確認相較於將鋅黏附層設為不含有錫之鋅層時,藉由將鋅黏附層設為鋅-錫合金層時,熱處理後的拉伸強度之值為較高,而且,維持率亦提升。 Further, when the sample 1 was carried out, the sample 6 was carried out, and the sample 7 was carried out, it was confirmed that when the zinc adhesion layer was made of a zinc layer containing no tin, when the zinc adhesion layer was a zinc-tin alloy layer, The value of the tensile strength after heat treatment is higher, and the maintenance rate is also increased.

另一方面,如表7所表示,比較試料1~比較試料7時,能夠確認於350℃加熱5小時後的拉伸強度,雖然亦有顯示45kgf/mm2以上之值者,但是拉伸強度維持率為65%~87%,任一者之拉伸強度係降低10%以上。例如,雖然比較試料5及比較試料6係各自於350℃加熱1小時後的拉伸強度為51.5kgf/mm2、58.8kgf/mm2,但是於350℃加熱5小時後,各自係降低為47.3kgf/mm2、40kgf/mm2。另一方面,觀察實施試料5及實施試料6,例如,如表3所表示,即便以最低溫度的處理條件(1)(200℃)施行預退火處理8小時後之情況,亦可維持51.3kgf/mm2、46.9kgf/mm2的拉伸強度。又,如表5所表示,將處理時間設為例如2小時之情況,處理條件(3)(250℃)時之實施試料5及實施試料6的拉伸強度係各自顯示50.7kgf/mm2、49.3kgf/mm2;處理條件(5)(275℃)時係各自顯示50.9kgf/mm2、49.2kgf/mm2。因此,能夠確認即便低溫或是短時間,藉由施行預退火處理,即便於高溫被長時間加熱之後,亦能夠得到抑制拉伸強度降低之效果。 On the other hand, as shown in Table 7, when comparing the sample 1 to the comparative sample 7, the tensile strength after heating at 350 ° C for 5 hours can be confirmed, and although the value of 45 kgf / mm 2 or more is also exhibited, the tensile strength is obtained. The maintenance rate is 65% to 87%, and the tensile strength of either one is reduced by more than 10%. For example, although the tensile strength of each of Comparative Sample 5 and Comparative Sample 6 after heating at 350 ° C for 1 hour was 51.5 kgf / mm 2 and 58.8 kgf / mm 2 , the temperature was reduced to 47.3 after heating at 350 ° C for 5 hours. Kgf/mm 2 , 40kgf/mm 2 . On the other hand, the observation sample 5 and the sample 6 are observed. For example, as shown in Table 3, even after the pre-annealing treatment is performed for 8 hours at the lowest temperature treatment condition (1) (200 ° C), 51.3 kgf can be maintained. / mm 2 , tensile strength of 46.9 kgf / mm 2 . Further, as shown in Table 5, the treatment time was, for example, 2 hours, and the tensile strength of the sample 5 and the sample 6 at the time of the treatment condition (3) (250 ° C) showed 50.7 kgf/mm 2 , 49.3 kgf/mm 2 ; treatment conditions (5) (275 ° C) each showed 50.9 kgf / mm 2 , 49.2 kgf / mm 2 . Therefore, it can be confirmed that even if the pre-annealing treatment is performed at a low temperature or a short time, the effect of suppressing the decrease in tensile strength can be obtained even after heating at a high temperature for a long period of time.

[表3] [table 3]

(2)結晶組織 (2) Crystal structure

其次,參照第1圖及第2圖,將實施試料1與比較試料1的結晶組織進行對照。第1圖及第2圖係顯示各自於350℃加熱5小時後之實施試料1及比較試料1的結晶組織之FIB-SIM像。又,在表8,係各自顯示於350℃加熱5小時後之實施試料1、實施試料5、比較試料1及比較試料5的平均結晶粒徑之值。又,如上述,針對實施試料1及實施試料5,係於350℃加熱5小時前,施行預退火處理(以處理條件(1)(200℃)加熱8小時)。如第1圖及第2圖所表示,能夠確認相較於 比較試料1的結晶組織,實施試料1的結晶組織之結晶粒係整體地較微細。又,如表8所表示,能夠確認實施試料1及實施試料5係在銅箔的表層部及中央部的任一區域,平均結晶粒徑均為1.0μm以下,而且於350℃被加熱5小時之後,在銅箔的厚度方向整體亦可維持微細的結晶組織。另一方面,比較試料1及比較試料5係能夠確認在於350℃被加熱5小時後之情況,在任一區域之平均結晶粒徑為大於1.0μm之同時,在銅箔之中央部的結晶粒為粗大之傾向高。因此,能夠確認藉由對各試料施行預退火處理,能夠使鋅(及異種金屬元素)不僅是擴散至銅箔的表層部,而且擴散至銅箔之中央部為止,即便長時間負荷高溫的熱量時,亦能夠抑制銅的結晶粒的粗大化。 Next, referring to Fig. 1 and Fig. 2, the sample 1 and the crystal structure of the comparative sample 1 were compared. Fig. 1 and Fig. 2 show FIB-SIM images of the crystal structures of the sample 1 and the comparative sample 1 which were each heated at 350 °C for 5 hours. In addition, in Table 8, the values of the average crystal grain size of the sample 1, the sample 5, the comparative sample 1, and the comparative sample 5 which were heated at 350 ° C for 5 hours were shown. Further, as described above, the sample 1 and the sample 5 were subjected to pre-annealing treatment (heating under treatment conditions (1) (200 ° C) for 8 hours) before heating at 350 ° C for 5 hours. As shown in Figures 1 and 2, it can be confirmed that compared to The crystal structure of the sample 1 was compared, and the crystal grain system of the crystal structure of the sample 1 was finely formed as a whole. Further, as shown in Table 8, it was confirmed that the sample 1 and the sample 5 were placed in any of the surface layer portion and the center portion of the copper foil, and the average crystal grain size was 1.0 μm or less, and was heated at 350 ° C for 5 hours. Thereafter, a fine crystal structure can be maintained as a whole in the thickness direction of the copper foil. On the other hand, the comparative sample 1 and the comparative sample 5 were confirmed to be heated at 350 ° C for 5 hours, and the average crystal grain size in any of the regions was more than 1.0 μm, and the crystal grains in the central portion of the copper foil were The tendency to be big is high. Therefore, it can be confirmed that the pre-annealing treatment of each sample allows zinc (and dissimilar metal elements) to diffuse not only to the surface layer portion of the copper foil but also to the central portion of the copper foil, even if the heat is applied for a long time. At the same time, coarsening of crystal grains of copper can also be suppressed.

產業上之可利用性 Industrial availability

本發明之表面銅箔係對銅箔的表面施行上述表面處理之後,藉由施行上述預退火處理而能夠簡易地製造,而且,能夠提供一種即便於高溫長時間被施行熱處理之後,拉伸強度降低亦少的銅箔。因此,能夠適合使用於在製造時被暴露 於高溫環境之用途,特別是能夠適合使用作為鋰離子二次電池等的非水系二次電池之陰極集電體、印刷配線板的製造材料。 The surface copper foil of the present invention can be easily produced by performing the above-described surface treatment on the surface of the copper foil, and can provide a reduction in tensile strength even after heat treatment for a long period of time at a high temperature. There is also less copper foil. Therefore, it can be suitably used to be exposed at the time of manufacture. In the use of a high-temperature environment, a cathode current collector or a printed wiring board which is a nonaqueous secondary battery such as a lithium ion secondary battery can be suitably used.

Claims (15)

一種表面處理銅箔,在以總量計含有100ppm以上之選自碳、硫、氯及氮之1種或2種以上的微量成分之銅箔的兩面,每一面包括含有20mg/m2~1000mg/m2的鋅之表面處理層,其特徵在於:被施行在200℃~280℃的溫度範圍加熱之預退火處理。 A surface-treated copper foil comprising, on a total surface, a copper foil containing 100 ppm or more of one or more kinds of trace components selected from the group consisting of carbon, sulfur, chlorine, and nitrogen, each surface comprising 20 mg/m 2 to 1000 mg The surface treatment layer of zinc of /m 2 is characterized in that it is subjected to pre-annealing treatment heated at a temperature ranging from 200 ° C to 280 ° C. 如申請專利範圍第1項所述之表面處理銅箔,其於350℃加熱5小時後之拉伸強度為45kgf/mm2以上。 The surface-treated copper foil according to claim 1, wherein the tensile strength after heating at 350 ° C for 5 hours is 45 kgf / mm 2 or more. 如申請專利範圍第1項所述之表面處理銅箔,其中前述表面處理層係除了鋅以外,含有銅及/或銅中的擴散速度比鋅更快的金屬元素。 The surface-treated copper foil according to claim 1, wherein the surface treatment layer contains a metal element having a higher diffusion rate in copper and/or copper than zinc, in addition to zinc. 如申請專利範圍第3項所述之表面處理銅箔,其中前述金屬元素係錫。 The surface-treated copper foil according to claim 3, wherein the metal element is tin. 如申請專利範圍第4項所述之表面處理銅箔,其中前述表面處理層係每一面含有1mg/m2~200mg/m2的錫。 The surface-treated copper foil according to claim 4, wherein the surface treatment layer contains 1 mg/m 2 to 200 mg/m 2 of tin per side. 如申請專利範圍第1項所述之表面處理銅箔,其中前述銅箔之常態時的銅之平均結晶粒徑為1.0μm以下。 The surface-treated copper foil according to claim 1, wherein the copper foil has a normal crystal grain size of 1.0 μm or less in a normal state. 如申請專利範圍第1項所述之表面處理銅箔,其中前述銅箔的常態拉伸強度為50gf/mm2以上。 The surface-treated copper foil according to claim 1, wherein the copper foil has a normal tensile strength of 50 gf/mm 2 or more. 如申請專利範圍第1項所述之表面處理銅箔,其中在前述預退火處理,係在前述溫度範圍內的溫度被加熱2小時以上且25小時以下。 The surface-treated copper foil according to claim 1, wherein in the pre-annealing treatment, the temperature in the temperature range is heated for 2 hours or more and 25 hours or less. 一種表面處理銅箔,在以總量計含有100ppm以上之選自 碳、硫、氯及氮之1種或2種以上的微量成分之銅箔的兩面,每一面包括含有20mg/m2~1000mg/m2的鋅之表面處理層,其特徵在於:於350℃加熱5小時後的拉伸強度為50kgf/mm2以上。 A surface-treated copper foil comprising, on a total surface, a copper foil containing 100 ppm or more of one or more kinds of trace components selected from the group consisting of carbon, sulfur, chlorine, and nitrogen, each surface comprising 20 mg/m 2 to 1000 mg The zinc surface treatment layer of /m 2 is characterized in that the tensile strength after heating at 350 ° C for 5 hours is 50 kgf / mm 2 or more. 一種表面處理銅箔之製造方法,其特徵在於包括:表面處理步驟,其係在以總量計含有100ppm以上之選自碳、硫、氯及氮之1種或2種以上的微量成分之銅箔的兩面,形成每一面含有20mg/m2~1000mg/m2的鋅之表面處理層;及預退火處理步驟,其係在表面處理步驟之後,在200℃~280℃的溫度範圍加熱。 A method for producing a surface-treated copper foil, comprising: a surface treatment step of copper containing one or more kinds of trace components selected from the group consisting of carbon, sulfur, chlorine, and nitrogen of 100 ppm or more in total amount. The two sides of the foil form a surface treatment layer containing 20 mg/m 2 to 1000 mg/m 2 of zinc on each side; and a pre-annealing step of heating at a temperature ranging from 200 ° C to 280 ° C after the surface treatment step. 如申請專利範圍第10項所述之表面處理銅箔之製造方法,其中在前述預退火處理步驟之加熱時間係2小時以上且25小時以下。 The method for producing a surface-treated copper foil according to claim 10, wherein the heating time in the pre-annealing step is 2 hours or longer and 25 hours or shorter. 一種陰極集電體,其特徵在於:使用如申請專利範圍第1項所述之表面處理銅箔。 A cathode current collector characterized by using the surface-treated copper foil as described in claim 1. 一種陰極集電體,其特徵在於:使用如申請專利範圍第9項所述之表面處理銅箔。 A cathode current collector characterized by using the surface-treated copper foil according to claim 9 of the patent application. 一種非水系二次電池的陰極材,其特徵在於:使用如申請專利範圍第12項所述之陰極集電體。 A cathode material for a nonaqueous secondary battery, characterized in that a cathode current collector according to claim 12 of the patent application is used. 一種非水系二次電池的陰極材,其特徵在於:使用如申請專利範圍第13項所述之陰極集電體。 A cathode material for a nonaqueous secondary battery, characterized in that a cathode current collector according to claim 13 of the patent application is used.
TW102135280A 2012-10-12 2013-09-30 Surface treatment copper foil, surface treatment copper foil manufacturing method, cathode current collector and non-aqueous secondary battery cathode material TWI468284B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012227367A JP6030401B2 (en) 2012-10-12 2012-10-12 Method for producing surface-treated copper foil

Publications (2)

Publication Number Publication Date
TW201414602A true TW201414602A (en) 2014-04-16
TWI468284B TWI468284B (en) 2015-01-11

Family

ID=50477275

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102135280A TWI468284B (en) 2012-10-12 2013-09-30 Surface treatment copper foil, surface treatment copper foil manufacturing method, cathode current collector and non-aqueous secondary battery cathode material

Country Status (5)

Country Link
JP (1) JP6030401B2 (en)
KR (2) KR102170014B1 (en)
CN (1) CN104704137B (en)
TW (1) TWI468284B (en)
WO (1) WO2014057804A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6067910B1 (en) * 2015-11-04 2017-01-25 古河電気工業株式会社 Electrolytic copper foil and lithium ion secondary battery using the electrolytic copper foil
JP6440656B2 (en) * 2016-07-12 2018-12-19 古河電気工業株式会社 Electrolytic copper foil
EP3310137B1 (en) * 2016-10-14 2019-02-27 ATOTECH Deutschland GmbH Method for manufacturing a printed circuit board
TWI791776B (en) * 2018-02-23 2023-02-11 日商古河電氣工業股份有限公司 Electrolytic copper foil, negative electrode for lithium ion secondary battery, lithium ion secondary battery, copper clad laminate, and printed circuit board using the electrolytic copper foil
JP6757773B2 (en) * 2018-09-26 2020-09-23 古河電気工業株式会社 Electrolytic copper foil
CN112151808A (en) * 2020-10-15 2020-12-29 河源市东聚能源科技有限公司 Preparation method of copper foil for lithium battery

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3292774B2 (en) * 1994-02-15 2002-06-17 三井金属鉱業株式会社 Copper foil for printed wiring board and method for producing the same
JPH0851281A (en) * 1994-08-08 1996-02-20 Nikko Gould Foil Kk Method for manufacture high-temperature large-expansion copper foil for printed circuit
JPH10330983A (en) * 1997-05-30 1998-12-15 Fukuda Metal Foil & Powder Co Ltd Electrolytic copper foil and its production
JP3142259B2 (en) * 1998-11-30 2001-03-07 三井金属鉱業株式会社 Copper foil for printed wiring board excellent in chemical resistance and heat resistance and method for producing the same
KR100346542B1 (en) * 1999-01-25 2002-07-26 삼성에스디아이 주식회사 Lithium secondary battery
JP2005251429A (en) * 2004-03-01 2005-09-15 Mitsui Mining & Smelting Co Ltd METAL FOIL WITH Al ALLOY CARRIER OPENING AND MANUFACTURING METHOD OF THE SAME, ELECTRODE FOR SECONDARY BATTERY SEPARATED FROM THE METAL FOIL WITH Al ALLOY CARRIER OPENING AND INCLUDING THE METAL FOIL WITH THE OPENING, AND SECONDARY BATTERY
JP4438541B2 (en) * 2004-04-19 2010-03-24 三井金属鉱業株式会社 Composite foil for negative electrode current collector of non-aqueous electrolyte secondary battery and manufacturing method thereof, and negative electrode current collector, non-aqueous electrolyte secondary battery electrode and non-aqueous electrolyte secondary battery using the composite foil
JP5080719B2 (en) * 2004-06-10 2012-11-21 三井金属鉱業株式会社 Metal foil with carrier foil, method for producing metal foil with carrier foil, and current collector of non-aqueous electrolyte secondary battery using the metal foil with carrier foil
US20060087794A1 (en) * 2004-10-27 2006-04-27 Mitsui Mining & Smelting Co., Ltd. Capacitor layer forming material, method of manufacturing a composite foil used where manufacturing the same, and print wiring board having a circuit where a capacitor is embedded, obtained by using the same
JP2006128326A (en) * 2004-10-27 2006-05-18 Mitsui Mining & Smelting Co Ltd Capacitor-layer forming material, manufacturing method for composite foil used for manufacture of material, and printed-wiring board with built-in capacitor circuit obtained by using capacitor-layer forming material
JP5588607B2 (en) * 2007-10-31 2014-09-10 三井金属鉱業株式会社 Electrolytic copper foil and method for producing the electrolytic copper foil
JP5666839B2 (en) * 2010-06-30 2015-02-12 古河電気工業株式会社 Negative electrode for secondary battery, negative electrode current collector, secondary battery, and production method thereof
MY162358A (en) * 2010-11-22 2017-06-15 Mitsui Mining & Smelting Co Surface-treated copper foil
JP5276158B2 (en) * 2010-12-27 2013-08-28 古河電気工業株式会社 Lithium ion secondary battery, negative electrode for battery, and electrolytic copper foil for battery negative electrode current collector

Also Published As

Publication number Publication date
KR102190664B1 (en) 2020-12-14
CN104704137B (en) 2017-10-13
KR20200057102A (en) 2020-05-25
TWI468284B (en) 2015-01-11
WO2014057804A1 (en) 2014-04-17
KR20150068386A (en) 2015-06-19
JP6030401B2 (en) 2016-11-24
JP2014080636A (en) 2014-05-08
KR102170014B1 (en) 2020-10-26
CN104704137A (en) 2015-06-10

Similar Documents

Publication Publication Date Title
TWI468284B (en) Surface treatment copper foil, surface treatment copper foil manufacturing method, cathode current collector and non-aqueous secondary battery cathode material
JP6553558B2 (en) Surface treated copper foil, negative electrode current collector, and negative electrode material for non-aqueous secondary battery
JP5400960B2 (en) Surface treated copper foil
WO2014156638A1 (en) All-solid-state secondary battery
TWI596220B (en) Copper film, negative electrode collector and negative electrode material of nonaqueous secondary cell
KR101782737B1 (en) Electrolytic copper foil, the negative electrode for a lithium ion secondary battery and a lithium ion secondary battery, printed circuit board and an electromagnetic shielding material
TWI518210B (en) Electrolytic copper foil and method for manufacturing the same and surface-treated copper foil using the electrolytic copper foil
TWI602953B (en) Electrolytic copper foil, battery collector using the same, battery for secondary battery using the same, and secondary battery using the same
WO2014112619A1 (en) Copper foil, anode for lithium ion battery, and lithium ion secondary battery
WO2017078125A1 (en) Electrolytic copper foil, and lithium ion secondary battery using same
JP2013185228A (en) Electrolytic copper foil and negative electrode collector for secondary battery
JP5503814B1 (en) Electrolytic copper foil and method for producing the same, negative electrode of lithium ion secondary battery, and lithium ion secondary battery
JP2017082319A (en) Production method of cupper-cnt three-dimensional nanostructure