TW201336012A - Film forming device and substrate conveying mechanism for the film forming device - Google Patents

Film forming device and substrate conveying mechanism for the film forming device Download PDF

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Publication number
TW201336012A
TW201336012A TW102105291A TW102105291A TW201336012A TW 201336012 A TW201336012 A TW 201336012A TW 102105291 A TW102105291 A TW 102105291A TW 102105291 A TW102105291 A TW 102105291A TW 201336012 A TW201336012 A TW 201336012A
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Taiwan
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substrate
moving
fixed
film forming
base
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TW102105291A
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Chinese (zh)
Inventor
Tadashi Wakabayashi
Noboru Kato
Iori Zushi
Yasuaki Ishizawa
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Hitachi High Tech Corp
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Publication of TW201336012A publication Critical patent/TW201336012A/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568Transferring the substrates through a series of coating stations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063Transporting devices for sheet glass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766Mechanical parts of transfer devices

Abstract

To provide a long stroke conveying mechanism capable of decreasing height of an exchange chamber and height of a processing chamber, and reducing vertical size of an opening of a valve. A second section of a linear motion bearing counted from bottom to top includes two vertical rotation bodies kept in a back to back manner and installed on a base (first moving part); a subsequent section of the linear motion bearing includes two vertical rail shafts installed on the base (second moving part) in a back to back manner; the first moving part and the second moving part are mutually combined to form a cross roller guiding part, in order to convey a substrate carried on a flat panel at a distance set in a vacuum status.

Description

成膜裝置、以及成膜裝置用基板搬送機構 Film forming apparatus and substrate conveying mechanism for film forming apparatus

本發明係有關於在處理腔室內於基板上形成膜之成膜裝置、以及成膜裝置用基板搬送機構,特別是有關在真空中於基板上成膜之成膜裝置、成膜裝置用基板搬送機構。 The present invention relates to a film forming apparatus for forming a film on a substrate in a processing chamber, and a substrate transfer mechanism for a film forming apparatus, and more particularly to a film forming apparatus for forming a film on a substrate in a vacuum, and a substrate for a film forming apparatus. mechanism.

有關本發明之成膜裝置,例舉有機電激發光裝置製造裝置進行說明。有機電激發光裝置製造裝置係把為製品之有機電激發光裝置保持在真空中交接到之後的製程;該有機電激發光裝置不單是僅形成發光材料層(電激發光層)並以電極做包挾之構造,為了在陽極之上形成正孔注入層或輸送層、在陰極之上形成電子注入層或輸送層等把各式各樣的材料予以薄膜化之多層構造,或是洗淨基板,從而經過複數之製造裝置,進行處理。又例如,複數之製造裝置,乃是進行多數回不同蒸鍍之蒸鍍裝置。 The film forming apparatus of the present invention will be described by exemplifying an apparatus for manufacturing an organic electroluminescence device. The organic electroluminescent device manufacturing device maintains the organic electroluminescent device for the product in a vacuum and transfers the subsequent process; the organic electroluminescent device not only forms a layer of luminescent material (electroluminescent layer) but also performs electrodes In order to form a positive hole injection layer or a transport layer on the anode, an electron injection layer or a transport layer on the cathode, a multilayer structure for thinning various materials, or a substrate to be cleaned Therefore, the processing is performed through a plurality of manufacturing apparatuses. Further, for example, a plurality of manufacturing apparatuses are a vapor deposition apparatus that performs a plurality of different vapor depositions.

圖1為基板搬送機構的有機電激發光裝置製造線之一例,為表示利用前後長行程進給機構搬送處理對象的基板之製造線的圖。100為有機電激發光裝置製造線,9為整合控制有機電激發光裝置製造線100全體之控制 部,3為處理對象之基板,1為處理基板3之製程腔室,2為藉由使用長行程直線移動軸承機構之長行程搬送機構搬入及搬出基板3之交接室。製程腔室1及交接室2的第1添加字符a~d,是關聯到製程腔室及後製程;製程腔室1及交接室2的第2添加字符、以及基板3的第1添加字符之u與d,乃是表示上側的線道(u)與下側的線道(d)。基板3是從上游到下游(圖中從左向右)依序在製程腔室1a、1b、1c、1d做處理,繼續到後製程。尚且,在本書中,從上游向下游的方向稱為X方向,與平面上X方向正交的方向稱為Y方向。又,高度方向(Z方向)為與X方向及Y方向正交的方向。 1 is an example of a manufacturing line of an organic electroluminescence device of a substrate transfer mechanism, and is a view showing a manufacturing line of a substrate to be processed by a long-travel feed mechanism. 100 is an organic electroluminescent device manufacturing line, and 9 is a control for the integrated control of the organic electroluminescent device manufacturing line 100. The part 3 is a substrate to be processed, 1 is a processing chamber for processing the substrate 3, and 2 is a transfer chamber for loading and unloading the substrate 3 by a long-length transfer mechanism using a long-stroke linear motion bearing mechanism. The first added characters a to d of the process chamber 1 and the transfer chamber 2 are associated with the process chamber and the post process; the second added character of the process chamber 1 and the transfer chamber 2, and the first added character of the substrate 3 u and d are the upper track (u) and the lower track (d). The substrate 3 is processed sequentially from the upstream to the downstream (from left to right in the drawing) in the process chambers 1a, 1b, 1c, 1d, and continues to the post process. Further, in this book, the direction from the upstream to the downstream is referred to as the X direction, and the direction orthogonal to the X direction on the plane is referred to as the Y direction. Further, the height direction (Z direction) is a direction orthogonal to the X direction and the Y direction.

圖1之搬入、處理及搬出有機電激發光裝置100的基板3的室內,全部維持在有機電激發光裝置製造裝置100在處理時必要之所設定的真空度的真空狀態下;大體而言,是由搬入處理對象之基板3的交接室2au及2ad、處理基板3之3個製程腔室1(1a、1b、1c)、在各製程腔室1之間設置搬出及搬入(交接)基板的直線移動式長行程搬送機構之交接室2(2bu、2bd、2cu、2cd)、以及被設置在製程腔室1與次製程(密封製程)之間之交接室2du及2dd所構成。在本實施型態中,把基板的蒸鍍面朝上放置並水平搬送,在做蒸鍍時也把基板維持水平進行蒸鍍。 In the interior of the substrate 3 of the organic electroluminescent device 100, which is carried in, processed, and carried out in FIG. 1, all of the cells are maintained in a vacuum state in which the degree of vacuum set by the organic electroluminescent device manufacturing apparatus 100 is high during processing; The transfer chambers 2au and 2ad of the substrate 3 to be processed and the three process chambers 1 (1a, 1b, 1c) of the processing substrate 3 are provided, and the substrates are carried out and transferred (crossed) between the processing chambers 1. The transfer chamber 2 (2bu, 2bd, 2cu, 2cd) of the linear moving long-travel conveying mechanism and the transfer chambers 2du and 2dd provided between the process chamber 1 and the secondary process (sealing process). In the present embodiment, the vapor deposition surface of the substrate is placed upward and conveyed horizontally, and the substrate is also horizontally vapor-deposited during vapor deposition.

在圖1的有機電激發光裝置製造裝置100中,於同一個製程腔室中,在第2基板3d的處理中,進行 搬出處理結束的第1基板3u、以及搬入接著要處理的第1基板3u。又相反地,於同一個製程腔室中,在第1基板3u的處理中,進行搬出處理結束的第2基板3d、以及搬入接著要處理的第2基板3d。如此,藉由交互進行處理與搬出、搬入的方式,縮短了處理量(throughput)。 In the organic electroluminescent device manufacturing apparatus 100 of FIG. 1, in the same processing chamber, in the processing of the second substrate 3d, The first substrate 3u after the completion of the processing is carried out, and the first substrate 3u to be processed is carried. On the other hand, in the same processing chamber, in the processing of the first substrate 3u, the second substrate 3d after the carry-out processing is completed and the second substrate 3d to be processed are carried. In this way, the processing is performed by interaction, and the method of moving out and moving in, shortens the throughput.

例如,在製程腔室1b中,於第2基板3d的處理中,交接室2cu從製程腔室1b搬出處理已結束的第1基板3u。又,交接室2bu把這些欲處理的第1基板3u搬入到製程腔室1b。 For example, in the processing chamber 1b, in the processing of the second substrate 3d, the delivery chamber 2cu carries out the processing of the first substrate 3u from the processing chamber 1b. Moreover, the transfer chamber 2bu carries the first substrate 3u to be processed into the process chamber 1b.

又相反地,在製程腔室1b中,於第1基板3u的處理中,交接室2cd從製程腔室1b搬出處理已結束的第2基板3d。又,交接室2bd把這些欲處理的第2基板3d搬入到製程腔室1b。 On the other hand, in the processing chamber 1b, in the processing of the first substrate 3u, the transfer chamber 2cd carries out the second substrate 3d whose processing has been completed from the processing chamber 1b. Moreover, the transfer chamber 2bd carries the second substrate 3d to be processed into the process chamber 1b.

在圖1中,控制部9以未圖示的控制線(包含無線手段)連接到製造線全體之各裝置,並發送控制信號到各裝置,且從各裝置接收裝置的狀態資訊,整合控制各裝置全體。例如,在使搬入及搬出基板3的長行程搬送機構(後述)作動的情況下,操作控制使長行程搬送機構之各直線移動軸承機構做滑動移動的驅動系統,同時進行對應的閘閥之開關控制。驅動系統乃是例如滾珠螺桿機構等。 In FIG. 1, the control unit 9 is connected to each device of the entire manufacturing line by a control line (including a wireless means) (not shown), and transmits a control signal to each device, and receives status information of the device from each device, and integrates and controls each. The whole device. For example, when the long-length transport mechanism (described later) for loading and unloading the substrate 3 is actuated, the drive system for slidingly moving the linear motion bearing mechanisms of the long-stroke transport mechanism is operated, and the corresponding gate valve is controlled. . The drive system is, for example, a ball screw mechanism or the like.

圖2是用以說明設置在圖1的交接室2的中央部,用來搬出或搬入基板3之長行程搬送機構的側面圖。200為基板搬送機構(以下,稱為長行程搬送機構),202為被固定在交接室2的基底部之固定基座,204為第 1基座,206為第2基座,208為搭載基板3的平板,203為被固定在固定基座202的上部之固定軌道軸,241與242為在被固定在第1基座204的下部之固定軌道軸203的軌道(軌條)上移動於X軸方向之第1轉動體保持部,205為被固定在第1基座204的上部之第1軌道軸,261與262為被固定在第2基座206的下部且在第1軌道軸205的軌道(軌條)上移動於X軸方向之第2轉動體保持部,207為被固定在第2基座206的上部之第2軌道軸,281與282為被固定在平板208的下部且在第2軌道軸207的軌道(軌條)上移動於X軸方向之第3轉動體保持部。 FIG. 2 is a side view for explaining a long stroke conveying mechanism for carrying out or loading the substrate 3 in the center portion of the delivery chamber 2 of FIG. 1 . Reference numeral 200 denotes a substrate transfer mechanism (hereinafter referred to as a long-length transfer mechanism), and 202 denotes a fixed base fixed to the base portion of the transfer chamber 2, 204 is a 1 pedestal 206 is a second pedestal, 208 is a flat plate on which the substrate 3 is mounted, 203 is a fixed rail shaft fixed to the upper portion of the fixed base 202, and 241 and 242 are fixed to the lower portion of the first pedestal 204. The rail (track) of the fixed rail shaft 203 is moved by the first rotor retaining portion in the X-axis direction, and 205 is the first rail shaft fixed to the upper portion of the first base 204, and 261 and 262 are fixed. The lower portion of the second pedestal 206 moves on the track (track) of the first track shaft 205 in the second rotator holding portion in the X-axis direction, and 207 is the second track fixed to the upper portion of the second pedestal 206 The shafts 281 and 282 are fixed to the lower portion of the flat plate 208 and move on the rail (track) of the second track shaft 207 in the third rotor holding portion in the X-axis direction.

圖2(a)為表示長行程搬送機構200的平板208位置於長行程搬送機構200的中心部(X=0)的狀態之側剖面圖。又,圖2(b)為表示長行程搬送機構200的平板208移動到X軸方向最右邊的狀態之側剖面圖。更進一步,圖2(c)為由上觀看圖2(a)之圖。尚且,在圖2(c)中,省略第1轉動體保持部241、242,以及第2轉動體保持部261、262。又,在圖2(b)與圖2(c)中,僅表示出朝X軸上的右方向的移動,但是朝左方向也同樣可以移動。 (a) of FIG. 2 is a side cross-sectional view showing a state in which the flat plate 208 of the long stroke conveying mechanism 200 is positioned at the center portion (X=0) of the long stroke conveying mechanism 200. In addition, FIG. 2(b) is a side cross-sectional view showing a state in which the flat plate 208 of the long stroke conveying mechanism 200 is moved to the rightmost side in the X-axis direction. Further, Fig. 2(c) is a view of Fig. 2(a) viewed from above. In addition, in FIG. 2(c), the first rotor holding portions 241 and 242 and the second rotor holding portions 261 and 262 are omitted. Further, in FIGS. 2(b) and 2(c), only the movement in the right direction on the X-axis is shown, but the movement in the left direction is also possible.

由圖2(c)了解到,長行程搬送機構200,是把固定軌道軸203、第1轉動體保持部241及242、第1基座204、第1軌道軸205、第2基座206、第2軌道軸207、以及第2轉動體保持部261及262,各自設1對在Y軸方 向上。 2(c), the long-stroke conveying mechanism 200 fixes the rail shaft 203, the first rotor holding portions 241 and 242, the first susceptor 204, the first rail shaft 205, and the second pedestal 206, The second track shaft 207 and the second rotor holding portions 261 and 262 are each provided in a pair on the Y-axis side. up.

尚且,圖2之高度方向的說明,後述之。 In addition, the description of the height direction of FIG. 2 will be described later.

在圖2中,固定基座202,是被安裝固定在交接室2的緣故,是無法移動在X軸方向(左右方向)上。又,固定軌道軸203,是被安裝固定在固定基座202的緣故,是無法移動在X軸方向上。 In FIG. 2, the fixed base 202 is attached and fixed to the delivery chamber 2, and cannot be moved in the X-axis direction (left-right direction). Further, the fixed rail shaft 203 is attached and fixed to the fixed base 202, and cannot be moved in the X-axis direction.

第1轉動體保持部241及242,藉由未圖示的驅動系統(例如,輸送螺桿驅動、缸筒驅動、皮帶驅動等),可以沿著固定軌道軸203移動在X軸方向。連動到該移動,移動被固定在第1轉動體保持部241及242的第1基座204,其上部的構成物也一起移動(尚且,省略並未圖示連桿機構)。 The first rotor holding portions 241 and 242 can be moved in the X-axis direction along the fixed rail shaft 203 by a drive system (for example, conveyance screw drive, cylinder drive, belt drive, or the like) (not shown). In conjunction with this movement, the movement is fixed to the first pedestal 204 of the first rotator holding portions 241 and 242, and the components on the upper portion are also moved together (the link mechanism not shown is omitted).

又,第2轉動體保持部261及262,是藉由未圖示驅動系統,可以沿著第1導引軌道軸移動在X軸方向。依照該移動,移動被固定在第2轉動體保持部261及262的第2基座206,由此,上部的構成物也一起移動。 Further, the second rotor retaining portions 261 and 262 are movable in the X-axis direction along the first guide rail axis by a drive system not shown. According to this movement, the movement is fixed to the second pedestals 206 of the second rotator holding portions 261 and 262, whereby the upper components also move together.

更進一步,第3轉動體保持部281及282,是藉由未圖示驅動系統,可以沿著第2軌道軸207移動在X軸方向。依照該移動,移動被固定在第3轉動體保持部281及282的平板208,由此,上部的構成物也一起移動。因此,載置在平板208的基板3,跟著這些移動而移動。 Further, the third rotor retaining portions 281 and 282 are movable in the X-axis direction along the second rail axis 207 by a drive system not shown. According to this movement, the movement is fixed to the flat plates 208 of the third rotor holding portions 281 and 282, whereby the upper components also move together. Therefore, the substrate 3 placed on the flat plate 208 moves in accordance with these movements.

第1轉動體保持部241及242可以移動在固定軌道軸203上的距離(行程Sx)、第2轉動體保持部261及262可以移動在第1軌道軸205上的距離、以及、 第3轉動體保持部281及282可以移動在第2軌道軸207上的距離,令各軌道軸的長度為2L,令成對之轉動體保持部的兩端的距離為Lx的話,行程為Sx=Lx/2,為各軌道軸的長度的4分之1。 The distance between the first rotor retaining portions 241 and 242 on the fixed rail shaft 203 (stroke Sx), the distance at which the second rotor retaining portions 261 and 262 can move on the first rail shaft 205, and The third rotor retaining portions 281 and 282 can move the distance on the second rail shaft 207 such that the length of each of the rail shafts is 2L, and the distance between the two ends of the pair of rotor retaining portions is Lx, and the stroke is Sx= Lx/2 is one-fourth of the length of each track axis.

接著,在圖2中,因為軌道軸與轉動體保持部的組合為3段,所以該長行程搬送機構可以從中心位置(X=0)移動(可以搬送)到總計為3Lx/2的距離。 Next, in FIG. 2, since the combination of the track axis and the rotor holding portion is three stages, the long stroke conveying mechanism can be moved from the center position (X=0) (can be conveyed) to a total distance of 3 Lx/2.

圖3是概略表示使用以往的長行程搬送機構之有機電激發光裝置製造線的一部分之概略側剖面圖。在圖3中,表示以往的製程腔室1b與其前後的交接室2bd與2cd。390為製程腔室1b的設置面,300為以往的長行程直線移動軸承機構,351為開關各個交接室2bd及製程腔室1b的室內彼此之閘閥,351g為閘閥351的開口部,352為開關各個製程腔室1b及交接室2cd的真空室內彼此之閘閥,352g為閘閥352的開口部,301r為用以搬入或搬出製程腔室1b內的基板之交接部,320為在設定的位置接收從交接室1bd藉由長行程搬送機構300所搬入之處理前的基板3之平台,321為讓平台320沿著Z軸上下作動的驅動部,322為用以引導平台320正確地在Z軸上之導引件。 3 is a schematic side cross-sectional view schematically showing a part of a manufacturing line of an organic electroluminescence device using a conventional long-length transfer mechanism. In Fig. 3, the conventional processing chamber 1b and the front and rear transfer chambers 2bd and 2cd are shown. 390 is the installation surface of the process chamber 1b, 300 is a conventional long-stroke linear motion bearing mechanism, 351 is a gate valve for switching each of the transfer chamber 2bd and the process chamber 1b, 351g is an opening of the gate valve 351, and 352 is a switch Each of the process chamber 1b and the transfer chamber 2cd has a gate valve between the vacuum chambers, 352g is an opening of the gate valve 352, 301r is a transfer portion for loading or unloading the substrate in the process chamber 1b, and 320 is received at a set position. The transfer chamber 1bd is a platform for the substrate 3 before processing by the long-length transport mechanism 300, 321 is a drive portion for moving the platform 320 up and down along the Z-axis, and 322 is for guiding the platform 320 correctly on the Z-axis. Guide.

在圖3中,平台320,是從交接室2bd,通過閘閥351的開口部351g,藉由長行程搬送機構300被搬入到製程腔室1b的基板3載置在交接部301r後,藉由驅動部321及導引件322下降到製程腔室1b的處理部301p,進 行蒸鍍等的處理。處理基板3後,平台320再度上升,回到交接部301r的上述設定的位置。接著,處理後的基板3,在上述設定的位置,藉由長行程搬送機構300,從製程腔室1b的交接部301r通過閘閘閥352的開口部352g,搬出到交接室2cd。 In FIG. 3, the platform 320 is driven from the delivery chamber 2bd through the opening 351g of the gate valve 351, and the substrate 3 loaded into the processing chamber 1b by the long-length transfer mechanism 300 is placed on the delivery portion 301r. The portion 321 and the guiding member 322 are lowered to the processing portion 301p of the processing chamber 1b, The treatment such as vapor deposition is performed. After the substrate 3 is processed, the stage 320 rises again and returns to the set position of the delivery unit 301r. Then, the processed substrate 3 is carried out from the delivery portion 301r of the processing chamber 1b through the opening portion 352g of the gate valve 352 to the delivery chamber 2cd at the set position described above by the long-length transfer mechanism 300.

尚且,有關本發明之先前技術文獻,並未有所發現。 Further, the prior art documents relating to the present invention have not been found.

長行程搬送機構與利用群組式的真空機器人的搬送方式相比,於交接到後面的製程之際,因為不用反轉相對於搬送方向之基板的前後關係的緣故,不需要旋轉機構,而且,為可以便宜、高效率、確實地搬送,塵屑的產生也少之搬送機構。 The long-stroke transport mechanism does not require a rotating mechanism because it does not need to reverse the anteroposterior relationship with respect to the substrate in the transport direction, as compared with the transport method using the group-type vacuum robot. It is a transport mechanism that can be transported cheaply, efficiently, and reliably, and the generation of dust is small.

但是,上述以往的長行程搬送機構,相對於移動距離高度為高。單純地增加直線移動軸承的方式,會導致閘閥大型化。亦即,在以往的長行程搬送機構中,高度方向變得較大。更進一步,收容該長行程搬送機構的交接室的高度也會變高。又更進一步,基板為了進行水平搬入或是搬送,搬送基板的製程腔室的高度,以及閘閥開口的上下方向的大小也會變大。其結果,提高了製品成本,也提高了維持真空狀態的費用(運轉成本)。 However, the above-described conventional long-stroke conveying mechanism has a high height with respect to the moving distance. Simply increasing the way of moving the linear bearing will result in a larger gate valve. In other words, in the conventional long-stroke conveying mechanism, the height direction becomes large. Further, the height of the transfer chamber accommodating the long-length transport mechanism also becomes high. Further, in order to perform horizontal loading or transporting of the substrate, the height of the processing chamber for transporting the substrate and the size of the gate valve opening in the vertical direction are also increased. As a result, the cost of the product is increased, and the cost of maintaining the vacuum state (running cost) is also increased.

直接滾子搬送基板的機構是為便宜,但是對基板產生 不良影響的塵屑產生較多的緣故,遂成為問題。更進一步,在滾子搬送中,進行搬送而不傷到基板表面是很困難的。又更進一步,在滾子搬送中,不傷到基板表面地來確實地停止及定位是很困難的。 The mechanism for transferring the substrate by direct roller is cheap, but it is generated on the substrate. Dirty dust is more likely to occur, and cockroaches become a problem. Further, it is difficult to carry the conveyance without causing damage to the surface of the substrate during the roller conveyance. Further, it is difficult to reliably stop and position the substrate without damaging the surface of the substrate during roller transport.

本發明的目的為,由鑑於上述如此之問題,提供有可以降低交接室的高度及製程腔室的高度,且縮小閘閥的開口的上下方向的大小之長行程搬送機構。 An object of the present invention is to provide a long stroke conveying mechanism that can reduce the height of the delivery chamber and the height of the processing chamber and reduce the size of the opening of the gate valve in the vertical direction in view of the above problems.

為了達成上述目的之本發明的構成係如以下所述。 The constitution of the present invention for achieving the above object is as follows.

一種成膜裝置,具備有:在內部具備把膜形成在基板上的成膜機構之成膜腔室、用以在複數之該成膜腔室間搬送基板之交接室、以及分隔該成膜腔室與該交接室之閘閥;其特徵為,把利用載置基板並使其移動來搬送基板的搬送機構,利用堆疊了複數之移動單位來構成,且把該移動單位與移動單位之間,利用一對軌條與沿著該軌條移動的轉動體所構成的直線移動導軌做直接、或是間接連接,更進一步,至少1個前述移動單位是在上下面僅具備有軌條、或是僅具備有轉動體之其中任一種。上述成膜裝置,亦可具備有驅動前述搬送機構之最下段的移動單位在設定的方向上之驅動機構,且該最下段的移動單位的動作利用連桿機構,傳遞到其他的移動單位,使該搬送機構上的基板移動到設定的位置。 A film forming apparatus comprising: a film forming chamber having a film forming mechanism for forming a film on a substrate; a transfer chamber for transporting a substrate between the plurality of film forming chambers; and separating the film forming chamber A gate valve of the chamber and the transfer chamber; wherein the transport mechanism that transports the substrate by moving the substrate is configured by stacking a plurality of mobile units, and using the mobile unit and the mobile unit The pair of rails are directly or indirectly connected to the linear moving rail formed by the rotating body moving along the rail. Further, at least one of the aforementioned moving units is only provided with rails on the upper and lower sides, or only It has any one of the rotating bodies. The film forming apparatus may further include a driving mechanism that drives a moving unit of the lowermost stage of the conveying mechanism in a set direction, and the movement of the lowermost moving unit is transmitted to another moving unit by a link mechanism. The substrate on the transport mechanism moves to a set position.

根據本發明,可以提供有可以降低交接室的高度及製程腔室的高度,且縮小閘閥的開口的上下方向的大小之長行程搬送機構。其結果,於用交接室連接在真空中進行處理之多數的處理腔室之製造線方面,可以提供有製造成本便宜的製造裝置及製造線。更進一步,真空腔室的容積較小的緣故,可以快速地進行維持真空狀態、真空與排氣的切換等,期望有低運轉成本、加快處理速度。 According to the present invention, it is possible to provide a long stroke conveying mechanism that can reduce the height of the transfer chamber and the height of the process chamber, and reduce the size of the opening of the gate valve in the vertical direction. As a result, it is possible to provide a manufacturing apparatus and a manufacturing line which are inexpensive to manufacture, in terms of a manufacturing line in which a plurality of processing chambers which are processed in a vacuum are connected by a transfer chamber. Further, since the volume of the vacuum chamber is small, it is possible to quickly maintain the vacuum state, switch between the vacuum and the exhaust gas, and the like, and it is desired to have a low running cost and an increased processing speed.

1、1a、1b、1c、1d‧‧‧製程腔室 1, 1a, 1b, 1c, 1d‧‧‧ process chamber

2、2au、2ad、2bu、2bd、2cu、2cd、2du、2dd‧‧‧交接室 2, 2au, 2ad, 2bu, 2bd, 2cu, 2cd, 2du, 2dd‧‧‧ transfer room

3、3u、3d‧‧‧基板 3, 3u, 3d‧‧‧ substrate

6‧‧‧基板 6‧‧‧Substrate

9‧‧‧控制部 9‧‧‧Control Department

100‧‧‧有機電激發光裝置製造線 100‧‧‧Organic electroluminescent device manufacturing line

200‧‧‧長行程直線移動軸承機構 200‧‧‧Long stroke linear moving bearing mechanism

202‧‧‧固定基座 202‧‧‧Fixed base

203、203'‧‧‧固定軌道軸 203, 203'‧‧‧ fixed track axle

204‧‧‧第1基座 204‧‧‧1st pedestal

205‧‧‧第1固定軌道軸 205‧‧‧1st fixed orbital axis

206‧‧‧第2基座 206‧‧‧2nd base

207‧‧‧第2固定軌道軸 207‧‧‧2nd fixed orbital axis

208‧‧‧平板 208‧‧‧ tablet

241、242‧‧‧第1轉動體保持部 241, 242‧‧‧1st rotor retaining unit

261、262‧‧‧第2轉動體保持部 261, 262‧‧‧2nd rotor retaining section

281、281'、282、282'‧‧‧第3轉動體保持部 281, 281', 282, 282' ‧ ‧ third rotating body holding portion

300‧‧‧長行程直線移動軸承機構 300‧‧‧Long stroke linear moving bearing mechanism

301r‧‧‧交接部 301r‧‧‧Transfer Department

301p‧‧‧處理部 301p‧‧‧Processing Department

351g、352g‧‧‧開口部 351g, 352g‧‧‧ openings

320‧‧‧平台 320‧‧‧ platform

321‧‧‧驅動部 321‧‧‧ Drive Department

322‧‧‧導引件 322‧‧‧Guide

351、352‧‧‧閘閥 351, 352‧‧‧ gate valve

390‧‧‧設置面 390‧‧‧Setting surface

400‧‧‧長行程直線移動軸承機構 400‧‧‧Long stroke linear moving bearing mechanism

401b‧‧‧製程腔室 401b‧‧‧Processing chamber

401r‧‧‧交接部 401r‧‧‧Transfer Department

402bd、402cd‧‧‧交接室 402bd, 402cd‧‧‧ transfer room

451、452‧‧‧閘閥 451, 452‧‧‧ gate valve

451g、452g‧‧‧開口部 451g, 452g‧‧‧ openings

500‧‧‧長行程搬送機構 500‧‧‧Long-term transport mechanism

505、505'‧‧‧固定軌道軸 505, 505'‧‧‧ fixed track axle

571‧‧‧移動件 571‧‧‧Mobile parts

504、504'‧‧‧第1基座 504, 504'‧‧‧1st pedestal

506、506'‧‧‧第2基座 506, 506'‧‧‧2nd base

507、507'‧‧‧固定軌道軸 507, 507'‧‧‧ fixed track axle

541、541'、542、542'‧‧‧轉動體保持部 541, 541', 542, 542'‧‧‧ Rotating body holding unit

561、561'、562、562'‧‧‧轉動體保持部 561, 561', 562, 562'‧‧‧ rotating body holding unit

571、571'‧‧‧第1移動件 571,571'‧‧‧1st moving parts

581、581'‧‧‧第2移動件 581, 581'‧‧‧2nd moving parts

600‧‧‧長行程搬送機構 600‧‧‧Long-term transport mechanism

602‧‧‧固定基座 602‧‧‧ Fixed base

603‧‧‧固定軌道軸 603‧‧‧ Fixed track axle

604‧‧‧第1基座 604‧‧‧1st pedestal

605‧‧‧第1軌道軸 605‧‧‧1st track axle

606‧‧‧第2基座 606‧‧‧2nd pedestal

607‧‧‧第2軌道軸 607‧‧‧2nd track axle

608‧‧‧第3基座 608‧‧‧3rd pedestal

609‧‧‧第3軌道軸 609‧‧‧3rd track axle

610‧‧‧第4基座 610‧‧‧4th base

611‧‧‧第4軌道軸 611‧‧‧4th track axle

612‧‧‧平板 612‧‧‧ tablet

621、622‧‧‧第1轉動體保持部 621, 622‧‧‧1st rotor retaining section

623、624‧‧‧第2轉動體保持部 623, 624‧‧‧2nd rotor retaining section

625、626‧‧‧第3轉動體保持部 625, 626‧‧‧3rd rotor retaining section

627、628‧‧‧第4轉動體保持部 627, 628‧‧‧4th rotor retaining unit

629、630‧‧‧第5轉動體保持部 629, 630‧‧‧5th rotor retaining unit

700‧‧‧長行程搬送機構 700‧‧‧Long-term transport mechanism

704‧‧‧第1基座 704‧‧‧1st pedestal

705‧‧‧第1軌道軸 705‧‧‧1st track axle

706‧‧‧第2基座 706‧‧‧2nd pedestal

707‧‧‧第2軌道軸 707‧‧‧2nd track axle

708‧‧‧第3基座 708‧‧‧3rd pedestal

709‧‧‧第3軌道軸 709‧‧‧3rd track axle

710‧‧‧第4基座 710‧‧‧4th base

711‧‧‧第4軌道軸 711‧‧‧4th track axle

721、722‧‧‧第1轉動體保持部 721, 722‧‧‧1st rotor retaining section

723、724‧‧‧第2轉動體保持部 723, 724‧‧‧2nd rotor retaining section

725、726‧‧‧第3轉動體保持部 725, 726‧‧‧3rd rotor retaining section

727、728‧‧‧第4轉動體保持部 727, 728‧‧‧4th rotor retaining unit

771、772‧‧‧第1移動件 771, 772‧‧‧1st moving parts

781、782‧‧‧第2移動件 781, 782‧‧‧2nd moving parts

800‧‧‧長行程搬送機構 800‧‧‧Long-term transport mechanism

[圖1]表示有機電激發光裝置製造裝置的一例之圖。 Fig. 1 is a view showing an example of an apparatus for manufacturing an organic electroluminescence device.

[圖2]用以說明以往的長行程搬送機構之圖。 FIG. 2 is a view for explaining a conventional long-stroke conveying mechanism.

[圖3]表示使用以往的長行程搬送機構之有機電激發光裝置製造線的一部分之概略側剖面圖。 Fig. 3 is a schematic side cross-sectional view showing a part of a manufacturing line of an organic electroluminescence device using a conventional long-length transfer mechanism.

[圖4]表示使用本發明之一實施例的長行程搬送機構之有機電激發光裝置製造線的一部分之概略側剖面圖。 Fig. 4 is a schematic side cross-sectional view showing a part of a manufacturing line of an organic electroluminescence device using a long-length transfer mechanism according to an embodiment of the present invention.

[圖5]用以說明本發明的長行程搬送機構的一實施例之圖。 Fig. 5 is a view for explaining an embodiment of a long stroke conveying mechanism of the present invention.

[圖6]用以說明以往的長行程搬送機構的一例之側剖面圖。 Fig. 6 is a side cross-sectional view showing an example of a conventional long stroke conveying mechanism.

[圖7]用以說明本發明的長行程搬送機構的一實施例之側剖面圖。 Fig. 7 is a side sectional view showing an embodiment of a long stroke conveying mechanism of the present invention.

[圖8]為由上方看本發明的長行程搬送機構的一實施例之俯視圖。 Fig. 8 is a plan view showing an embodiment of the long stroke conveying mechanism of the present invention as seen from above.

有關本發明的長行程搬送機構,其由下往上數第2段的直線移動軸承,係上下2個轉動體保持部背對背被安裝固定到同一基座(第1移動件);其次的段的直線移動軸承,係上下2個軌道軸背對背被安裝固定到基座(第2移動件);交互組合第1移動件與第2移動件以形成多段直線移動導軌,在真空中設定的距離下搬送載置在平板上的基板。 In the long-stroke conveying mechanism according to the present invention, the linear moving bearing of the second stage from the bottom to the top is attached to the same base (first moving member) by the upper and lower rotor holding portions, and the second stage; The linear motion bearing is configured such that two upper and lower rail shafts are mounted back to the base back to the base (second moving member); the first moving member and the second moving member are combined to form a plurality of linear moving guides, and are transported at a distance set in a vacuum. A substrate placed on a flat plate.

以下為有關本發明之一實施型態,使用圖面等說明之。尚且,以下的說明,是用以說明本發明之一實施型態,並非限制本案發明的範圍。所以,本發明所屬技術領域中具有通常知識者皆可採用均等置換某些要件或是全部要件所成的實施型態,這些實施型態亦被包含在本案發明的範圍中。 The following is an embodiment of the present invention, which will be described using a drawing or the like. The following description is intended to illustrate one embodiment of the invention and is not intended to limit the scope of the invention. Therefore, those skilled in the art to which the present invention pertains may adopt an implementation form in which certain requirements or all of the elements are equally substituted. These embodiments are also included in the scope of the present invention.

又,在各圖的說明中,包含了使用以往說明之圖面,在具有共通的功能之構成要件方面賦予同一之參考編號,盡可能地避免重複說明。 In the description of the drawings, the same reference numerals are used for the components having the common functions, and the repeated description is avoided as much as possible.

使用圖4,說明本發明之一實施例。圖4為表示使用本發明之一實施例的長行程搬送機構之例如圖1的有機電激發光裝置製造線的一部分之概略側剖面圖。400為長行程直線移動軸承機構,401b為製程腔室,402bd與 402cd為交接室,451為開關各個交接室402bd及製程腔室401b的室內彼此之閘閥,451g為閘閥451的開口部,452為開關各個製程腔室401b及交接室402cd的真空室內彼此之閘閥,452g為閘閥452的開口部,401r為用以搬入或搬送製程腔室401b內的基板之交接部。在圖4中,表示製程腔室401b與其前後的交接室402bd與402cd。 An embodiment of the present invention will be described using FIG. Fig. 4 is a schematic side cross-sectional view showing a part of a manufacturing line of the organic electroluminescent device of Fig. 1 using a long-length conveying mechanism according to an embodiment of the present invention. 400 is a long stroke linear moving bearing mechanism, 401b is a process chamber, 402bd and 402cd is a transfer chamber, 451 is a gate valve for switching each of the transfer chamber 402bd and the process chamber 401b, 451g is an opening of the gate valve 451, and 452 is a gate valve for switching each process chamber 401b and the transfer chamber 402cd to each other in the vacuum chamber. 452g is an opening of the gate valve 452, and 401r is an interface for loading or transporting the substrate in the process chamber 401b. In Fig. 4, the process chamber 401b and the front and rear transfer chambers 402bd and 402cd are shown.

也在圖4中,與圖3同樣地,平台320,是從交接室402bd,通過閘閥451的開口部451g,藉由長行程搬送機構400被搬入到製程腔室401b的基板3載置在交接部401r後,藉由驅動部321及導引件322下降到製程腔室401b的處理部301p,進行蒸鍍等的處理。處理基板3後,平台320再度上升,回到交接部401r的上述設定的位置。接著,處理後的基板3,在上述設定的位置,藉由長行程搬送機構400,從製程腔室401b的交接部401r通過閘閘閥452的開口部452g,搬出到交接室402cd。 4, the platform 320 is placed on the substrate 3 loaded into the process chamber 401b by the long-length transfer mechanism 400 through the opening portion 451g of the gate valve 451 from the transfer chamber 402bd, as shown in FIG. After the portion 401r, the driving portion 321 and the guide 322 are lowered to the processing portion 301p of the processing chamber 401b, and processing such as vapor deposition is performed. After the substrate 3 is processed, the stage 320 rises again and returns to the set position of the delivery unit 401r. Then, the processed substrate 3 is carried out from the delivery portion 401r of the processing chamber 401b through the opening portion 452g of the gate valve 452 to the delivery chamber 402cd by the long-length transfer mechanism 400 at the set position.

尚且,有機電激發光裝置製造線,例如,在圖1的製造線100中,如上述圖4般地,是為變更了構成要件之製造線。 Further, in the manufacturing line 100 of the organic electroluminescence device, for example, in the manufacturing line 100 of FIG. 1, as in the above-described FIG. 4, the manufacturing line in which the constituent elements are changed is used.

藉由圖2及圖5說明本發明的長行程搬送機構的一實施例。圖5為用以說明本發明的長行程搬送機構的一實施例之圖。500為長行程搬送機構,571為第1移動件,504為構成移動件571之第1基座,541與542為移動件571下側之轉動體保持部,561與562為移動件 571上側的轉動體保持部,581為第2移動件,506為第2移動件581之第2基座,505為第2基座506下側的軌道軸,507為第2基座506上側的軌道軸。以下側的轉動體保持部541與542、第1基座504、以及上側的轉動體保持部561與562構成第1移動件571。又,以下側的軌道軸505、第2基座506、以及上側的軌道軸構成第2移動件581。 An embodiment of the long stroke conveying mechanism of the present invention will be described with reference to Figs. 2 and 5 . Fig. 5 is a view for explaining an embodiment of the long stroke conveying mechanism of the present invention. 500 is a long stroke conveying mechanism, 571 is a first moving member, 504 is a first base constituting the moving member 571, 541 and 542 are rotating body holding portions on the lower side of the moving member 571, and 561 and 562 are moving members. The rotor holding portion 571 on the upper side of the 571 is a second movable member, 506 is a second base of the second movable member 581, 505 is a track shaft on the lower side of the second base 506, and 507 is on the upper side of the second base 506. Track axis. The rotor holding portions 541 and 542 on the lower side, the first base 504, and the upper rotor holding portions 561 and 562 constitute the first movable member 571. Further, the track shaft 505, the second base 506, and the upper track axis on the lower side constitute the second mover 581.

第1轉動體保持部541及542,藉由未圖示的驅動系統(例如,輸送螺桿驅動、缸筒驅動、皮帶驅動等),可以沿著固定軌道軸203移動在X軸方向。連動到該移動,被固定在第1轉動體保持部541及542的第1基座504,同時、同方向、等速且等距離地與第1轉動體保持部541及542的移動一塊移動。其結果,被固定在第1基座504的第2轉動體保持部561及562,同時、同方向、等速且等距離地與第1轉動體保持部541及542的移動一塊移動。更進一步,連動到第2轉動體保持部561及562的移動,軌道軸505,同時、同方向、等速且等距離地與第1轉動體保持部541及542的移動一塊移動。其結果,被固定在軌道軸505上的第2基座506及軌道軸507,同時、同方向、等速且等距離地與第1轉動體保持部541及542的移動一塊移動。又更進一步,連動到軌道軸507的移動,被固定在第3轉動體保持部281及282,同時、同方向、等速且等距離地與第1轉動體保持部541及542的移動一塊移動。其結果,被固定在軌道軸507上的平板208及基 板3,同時、同方向、等速且等距離地與第1轉動體保持部541及542的移動一塊移動。 The first rotor holding portions 541 and 542 can be moved in the X-axis direction along the fixed rail shaft 203 by a drive system (for example, conveyance screw drive, cylinder drive, belt drive, or the like) (not shown). In association with this movement, the first base 504 of the first rotor holding portions 541 and 542 is fixed, and moves in the same direction, at the same speed, and equidistantly with the movement of the first rotor holding portions 541 and 542. As a result, the second rotator holding portions 561 and 562 of the first susceptor 504 are fixed, and move in the same direction, at the same speed, and equidistantly with the movement of the first rotator holding portions 541 and 542. Further, the movement of the second rotor holding portions 561 and 562 is linked to the movement of the first rotor holding portions 541 and 542 at the same time, in the same direction, at the same speed, and at equal speed. As a result, the second pedestal 506 and the orbital shaft 507 fixed to the orbital shaft 505 move simultaneously with the movement of the first rotator holding portions 541 and 542 at the same direction, at the same speed, and equidistantly. Further, the movement of the orbiting shaft 507 is fixed to the third rotor holding portions 281 and 282, and moves in the same direction, at the same speed, and equidistantly with the movement of the first rotor holding portions 541 and 542. . As a result, the plate 208 and the base fixed to the track shaft 507 are The plate 3 moves simultaneously with the movement of the first rotor holding portions 541 and 542 at the same time, in the same direction, at the same speed, and equidistantly.

如此,在長行程搬送機構中,第1轉動體保持部541及542,藉由未圖示的驅動系統,沿著固定軌道軸203移動在X軸方向的情況下,其上部的構成物也一起移動(尚且,省略並未圖示連桿機構)。 In the long-stroke conveying mechanism, when the first rotor retaining portions 541 and 542 are moved in the X-axis direction along the fixed rail shaft 203 by a drive system (not shown), the upper components are also together. Movement (still, the linkage mechanism not shown is omitted).

在圖2及圖5中,為了簡略化,在以下的條件下進行說明。 In FIGS. 2 and 5, for simplification, description will be made under the following conditions.

(條件01)基板3,以座標系統X的座標0為中心之X方向長度為Lx,厚度為tp。 (Condition 01) The substrate 3 has a length Lx in the X direction centered on the coordinate 0 of the coordinate system X, and a thickness tp.

(條件02)該長行程搬送機構200及500,乃是用以使基板3移動在[+X]及[-X]兩方向上、距離Lx以上之直線移動導軌。 (Condition 02) The long-travel conveying mechanisms 200 and 500 are linear moving guides for moving the substrate 3 in the directions of [+X] and [-X] and having a distance Lx or more.

(條件03)基板3的移動行程(最大移動距離),為從基座的寬度2Lx開始到基板3完全露出之距離。 (Condition 03) The moving stroke (maximum moving distance) of the substrate 3 is a distance from the width 2Lx of the susceptor to the complete exposure of the substrate 3.

(條件04)保持直線移動軸承的轉動體("滾珠"或是"滾子")的部分(轉動體保持部241、242、261、262、281、282、541、542、561及562)係支撐長度Lx的基板3。 (Condition 04) A portion that holds the rotating body ("ball" or "roller") of the linear motion bearing (rotor holding portions 241, 242, 261, 262, 281, 282, 541, 542, 561, and 562) A substrate 3 supporting the length Lx.

(條件05)軌條(軌道軸203、205、207、505及507)的長度為2Lx,固定軌道軸(軌道軸203、205、207、505及507)的基座202、204、206及506也是相同長度。尚且,基座202、204、206及506與平板208,係例如為不鏽鋼等之金屬平板。 (Condition 05) The rails (track shafts 203, 205, 207, 505, and 507) have a length of 2Lx, and the bases 202, 204, 206, and 506 of the fixed rail shafts (track shafts 203, 205, 207, 505, and 507) It is also the same length. Further, the susceptors 202, 204, 206, and 506 and the flat plate 208 are, for example, metal flat plates of stainless steel or the like.

(條件06)轉動體保持部241、242、261、262、281、282、541、542、561及562,是無法露出自軌道軸203、205、207、505及507(實際上,在端部設有機械式或是電氣式作用之止動件)。 (Condition 06) The rotor holding portions 241, 242, 261, 262, 281, 282, 541, 542, 561, and 562 cannot be exposed from the rail shafts 203, 205, 207, 505, and 507 (actually, at the end portion) There are mechanical or electrical action stops).

(條件07)最上部的平板208具有與基板3同樣的長度。 (Condition 07) The uppermost flat plate 208 has the same length as the substrate 3.

(條件08)為了得到必要的移動距離(移動行程),增加直線移動軸承(把基座、軌道軸及轉動體保持部作為構成要件)來使用作為1個移動單位。 (Condition 08) In order to obtain a necessary moving distance (moving stroke), a linear moving bearing (a base, a track shaft, and a rotating body holding portion is used as a constituent element) is added and used as one moving unit.

由上述的條件,決定接下來的規格。亦即, The following specifications are determined by the above conditions. that is,

(規格01)基板3的移動行程為±3Lx/2。 (Specification 01) The movement stroke of the substrate 3 is ±3Lx/2.

(規格02)直線移動軸承1套(set)(軌道軸+轉動體保持部)份的移動量為±Lx/2。 (Specification 02) The movement amount of one set (track axis + rotor holding portion) of the linear motion bearing is ±Lx/2.

(規格03)由上述2項,必要的直線移動軸承數為3套。 (Specification 03) From the above two items, the number of necessary linear moving bearings is three sets.

在圖2之以往方式的長行程搬送機構200中, In the long-length transport mechanism 200 of the conventional method of FIG. 2,

(01a)1軸導引機構(軌道軸、2個轉動體保持部及基座)為單純地3段疊加。 (01a) The one-axis guide mechanism (the track shaft, the two rotor holding portions, and the susceptor) is simply superposed in three stages.

(02a)除了最上部的平板208,連接轉動體保持部241、242、261及262的部分,係因為成為基座202、204或是206緣故,這些的長度為2Lx。 (02a) In addition to the uppermost flat plate 208, the portions connecting the rotor holding portions 241, 242, 261, and 262 are 2Lx because they are the bases 202, 204, or 206.

(03a)於在X方向移動時,露出自最下段的基座(固定基座202)的部分的高度為Ha'。 (03a) When moving in the X direction, the height of the portion exposed from the lowermost base (fixed base 202) is Ha'.

又,在圖5之本發明的長行程搬送機構500中, Further, in the long stroke conveying mechanism 500 of the present invention in Fig. 5,

(01b)由下往上數第2個直線移動軸承,係轉動體保持部561及562與軌道軸505的上下關係為顛倒,轉動體保持部541及542和轉動體保持部561及562兩套一起被固定到基座504,為一體化移動之構造。該部分為第1移動件571。 (01b) The second linear motion bearing is moved from the bottom to the top, and the vertical relationship between the rotor holding portions 561 and 562 and the rail shaft 505 is reversed, and the rotor holding portions 541 and 542 and the rotor holding portions 561 and 562 are provided. Together, they are fixed to the base 504 in a configuration that is integrally moved. This portion is the first moving member 571.

(02b)在以往方式之圖2的情況下,除了最上部的平板208,固定轉動體保持部241、242、261及262的基座的長度為2Lx。但是,在本發明之圖5的情況中,包含到第1移動件571的基座504的長度為其之一半,長度是為Lx。 (02b) In the case of Fig. 2 of the conventional embodiment, the length of the base of the fixed rotor holding portions 241, 242, 261, and 262 is 2Lx except for the uppermost flat plate 208. However, in the case of Fig. 5 of the present invention, the length of the susceptor 504 included in the first movable member 571 is one half thereof and the length is Lx.

(03c)在移動時,露出自最下段的基座(固定基座202)的部分的高度為Hb'。 (03c) When moving, the height of the portion exposed from the lowermost base (fixed base 202) is Hb'.

比較圖2與圖5之際,進行單純化,以以下這樣的條件做比較。 When comparing Fig. 2 with Fig. 5, simplification was carried out, and comparison was made under the following conditions.

圖2及圖5的深度方向(Y方向)的長度D,一律D=1。又,基座202、204、206、208、504、506的厚度,以及軌道軸203、205、207、505、507與介隔了轉動體保持部241、242、261、262、281、282、541、542、561、563的基座204、206、504、506、或是平板208之間的距離,是與平板208的厚度tm為相同。更進一步,軌道軸203、205、207、505、507的高度也為2tm。又更進一步,基座202、204、206、208、504、506及平板208的 密度ρ,令ρ=1。 The length D in the depth direction (Y direction) of FIGS. 2 and 5 is uniformly D=1. Further, the thicknesses of the pedestals 202, 204, 206, 208, 504, 506, and the track shafts 203, 205, 207, 505, 507 are interposed with the rotor holding portions 241, 242, 261, 262, 281, 282, The distance between the pedestals 204, 206, 504, 506 or the flat plates 208 of 541, 542, 561, 563 is the same as the thickness tm of the flat plate 208. Further, the heights of the track shafts 203, 205, 207, 505, 507 are also 2 tm. Still further, the bases 202, 204, 206, 208, 504, 506 and the plate 208 Density ρ, let ρ=1.

根據上述的條件,以往方式之圖2的基座202、204、206與平板208的質量之和Ma',則Ma'=tm(3×2×Lx+Lx)=7tm.Lx。又圖5的基座202、504、506與平板208的質量之和Mb',則Mb'=tm(3×2×Lx)=6tm.Lx。 According to the above conditions, the sum of the masses of the pedestals 202, 204, 206 and the flat plate 208 of Fig. 2 in the conventional manner is Ma' = tm (3 × 2 × Lx + Lx) = 7 tm. Lx. 5, the sum of masses Mb' of the pedestals 202, 504, 506 and the plate 208 of FIG. 5, then Mb' = tm (3 × 2 × Lx) = 6 tm. Lx.

所以,比起以往方式的質量Ma',利用本發明的質量Mb'是可以減少的。亦即,Ma'>Mb'。 Therefore, the mass Mb' using the present invention can be reduced compared to the mass Ma' of the conventional method. That is, Ma'>Mb'.

接著,圖2中露出的高度Ha'為9tm+ts。又,圖5中露出的高度Hb'為7tm+ts。 Next, the height Ha' exposed in FIG. 2 is 9tm+ts. Moreover, the height Hb' exposed in FIG. 5 is 7tm+ts.

所以,比起以往方式的露出高度Ha',利用本發明的高度Hb'是可以縮小的。亦即,Ha'>Hb'。 Therefore, the height Hb' of the present invention can be reduced compared to the exposure height Ha' of the conventional method. That is, Ha'>Hb'.

接著,藉由圖6及圖7說明本發明的長行程搬送機構的其他實施例。圖6是用以說明以往的長行程搬送機構的之側剖面圖。又圖7是用以說明本發明的長行程搬送機構的一實施例之側剖面圖。圖6及圖7皆是表示其長行程搬送機構移動到最右邊的情況之圖。 Next, another embodiment of the long stroke conveying mechanism of the present invention will be described with reference to Figs. 6 and 7 . Fig. 6 is a side cross-sectional view for explaining a conventional long stroke conveying mechanism. Fig. 7 is a side cross-sectional view showing an embodiment of the long stroke conveying mechanism of the present invention. 6 and 7 are views showing a state in which the long-length conveying mechanism is moved to the rightmost side.

600為以往之長行程搬送機構,602為被固定在交接室2的基底部之固定基座,604為第1基座,606為第2基座,608為第3基座,610為第4基座,612為搭載基板3之平板,603為被固定在固定基座602的上部之固定軌道軸,621與622為在被固定在第1基座604的下部之固定軌道軸603的軌道(軌條)上移動在X軸方向的第1轉動體保持部,605為被固定在第1基座604的上部之第 1軌道軸,623與624為在被固定在第2基座606的下部之第1軌道軸605的軌道(軌條)上移動在X軸方向的第2轉動體保持部,607為被固定在第2基座606的上部之第2軌道軸,625與626為被固定在第3基座608的下部且在第2軌道軸607的軌道(軌條)上移動在X軸方向的第3轉動體保持部,609為被固定在第3基座608的上部之第3軌道軸,627與628為被固定在第4基座610的下部且在第3軌道軸609的軌道(軌條)上移動在X軸方向的第4轉動體保持部,611為被固定在第4基座610的上部之第4軌道軸,629與630為被固定在第平板612的下部且在第4軌道軸611的軌道(軌條)上移動在X軸方向的第5轉動體保持部,3為被載置在平板612的上部之基板。 600 is a conventional long-stroke conveying mechanism, 602 is a fixed base fixed to the base portion of the transfer chamber 2, 604 is a first pedestal, 606 is a second pedestal, 608 is a third pedestal, and 610 is 4th. The pedestal 612 is a flat plate on which the substrate 3 is mounted, 603 is a fixed rail shaft fixed to the upper portion of the fixed base 602, and 621 and 622 are rails fixed to the fixed rail shaft 603 at the lower portion of the first pedestal 604 ( The first rotor holding portion that moves in the X-axis direction, and the 605 is fixed to the upper portion of the first base 604. 1 orbital shafts 623 and 624 are second rotor holding portions that move in the X-axis direction on the rails (tracks) of the first rail shaft 605 that are fixed to the lower portion of the second base 606, and 607 is fixed to The second track shafts 625 and 626 of the upper portion of the second base 606 are fixed to the lower portion of the third base 608 and move in the third rotation in the X-axis direction on the track (track) of the second track shaft 607. The body holding portion 609 is a third track shaft fixed to the upper portion of the third base 608, and 627 and 628 are fixed to the lower portion of the fourth base 610 and on the track (track) of the third track shaft 609. The fourth rotor holding portion that moves in the X-axis direction, 611 is a fourth track shaft that is fixed to the upper portion of the fourth base 610, and 629 and 630 are fixed to the lower portion of the flat plate 612 and on the fourth track shaft 611. The fifth track holding portion in the X-axis direction is moved on the rail (track), and the substrate 3 is placed on the upper portion of the flat plate 612.

又,700為本發明之長行程搬送機構,704為第1基座,706為第2基座,708為第3基座,710為第4基座,721與722為被固定在第1基座704的下部且在固定軌道軸603的軌道(軌條)上移動於X軸方向的第1轉動體保持部,705為被固定在第2基座706的下部之第1軌道軸,723與724為被固定在第1基座704的上部且在第1軌道軸705的軌道(軌條)上移動於X軸方向的第2轉動體保持部,707為被固定在第2基座706的上部之第2軌道軸,725與726為被固定在第3基座708的下部且在第2軌道軸707的軌道(軌條)上移動於X軸方向之第3轉動體保持部,709為被固定在第4基座710的下部之第3 軌道軸,727與728為被固定在第4基座708的上部且使第3軌道軸709移動於其軌道(軌條)上的X軸方向之第4轉動體保持部,711為被固定在第4基座710的上部之第4軌道軸,629與630為被固定在平板612的下部且在第4軌道軸711的軌道(軌條)上移動於X軸方向之第5轉動體保持部。又,771為利用第1基座704、第1轉動體保持部721、722、第2轉動體保持部723、724所構成之第1移動件,772為利用第3基座708、第3轉動體保持部725、726、第4轉動體保持部727、728所構成之第2移動件。 Further, 700 is the long-stroke conveying mechanism of the present invention, 704 is the first pedestal, 706 is the second pedestal, 708 is the third pedestal, 710 is the fourth pedestal, and 721 and 722 are fixed to the first base. The lower portion of the seat 704 moves on the rail (track) of the fixed rail shaft 603 in the first rotor holding portion in the X-axis direction, and the 705 is the first rail shaft fixed to the lower portion of the second base 706, 723 and 724 is a second rotator holding portion that is fixed to the upper portion of the first pedestal 704 and moves in the X-axis direction on the rail (track) of the first trajectory 705, and 707 is fixed to the second pedestal 706. The upper second track shafts 725 and 726 are fixed to the lower portion of the third base 708 and move on the rail (track) of the second track shaft 707 in the third rotor holding portion in the X-axis direction, and 709 is 3rd fixed to the lower portion of the 4th pedestal 710 The track shafts 727 and 728 are the fourth rotor holding portions that are fixed to the upper portion of the fourth base 708 and move the third track shaft 709 in the X-axis direction on the rails (tracks), and 711 is fixed to The fourth track shafts 629 and 630 of the upper portion of the fourth base 710 are fixed to the lower portion of the flat plate 612 and move on the rail (track) of the fourth track shaft 711 in the fifth rotor holding portion in the X-axis direction. . Further, 771 is a first movable member including the first base 704, the first rotor holding portions 721 and 722, and the second rotor holding portions 723 and 724, and the 772 is the third base 708 and the third rotation. The second moving members constituted by the body holding portions 725 and 726 and the fourth rotor holding portions 727 and 728.

又,在圖6與圖7中,僅表示出朝X軸上的+方向(圖中右方向)的移動,但是朝-方向(圖中左方向)也同樣可以移動。 Further, in FIGS. 6 and 7, only the movement in the + direction (the right direction in the drawing) on the X-axis is shown, but the movement in the - direction (the left direction in the drawing) is also similar.

也在圖6及圖7中,為了簡略化,在以下的條件下進行說明。 In addition, in FIGS. 6 and 7, for simplification, description will be made under the following conditions.

(條件11)寬度Lx/2的閘閥352或452存在挾有直線移動導引機構。尚且,並未圖示有-X方向的閘閥351、451。 (Condition 11) The gate valve 352 or 452 having the width Lx/2 is present with a linear movement guiding mechanism. Further, the gate valves 351 and 451 in the -X direction are not shown.

(條件12)閘閥352及452,係設置在當基板3在X=0的位置時,在X方向上,從直線移動導引機構的端面距離Lx/4的位置上。 (Condition 12) The gate valves 352 and 452 are provided at positions where the end surface distance Lx/4 of the linear movement guide mechanism is moved in the X direction when the substrate 3 is at the position of X=0.

(條件13)該長行程搬送機構600及700為直線移動導引機構,用以讓基板3在[+X]及[-X]兩方向上,通過閘閥352的開口部352g(在-X方向上,閘閥351的開口 部351g)或閘閥452的開口部452g(在-X方向上,閘閥451的開口部451g),使其移動距離Lx以上。 (Condition 13) The long-travel conveying mechanisms 600 and 700 are linear movement guiding mechanisms for allowing the substrate 3 to pass through the opening portion 352g of the gate valve 352 in both [+X] and [-X] directions (in the -X direction). Upper, opening of the gate valve 351 The portion 351g) or the opening portion 452g of the gate valve 452 (the opening portion 451g of the gate valve 451 in the -X direction) is moved by a distance Lx or more.

(條件14)基板3的移動行程(最大移動距離),為基板3完全通過閘閥352或452(在-X方向上,閘閥351或451),從閘閥352或452的端面到基板3的端面,移動到離開Lx/4以上的位置之距離。 (Condition 14) The moving stroke (maximum moving distance) of the substrate 3 is such that the substrate 3 passes completely through the gate valve 352 or 452 (in the -X direction, the gate valve 351 or 451), from the end surface of the gate valve 352 or 452 to the end surface of the substrate 3, Move to a distance away from the position above Lx/4.

(條件15)開口部352g或452g,係相對於通過的直線移動導引機構及基板3,在上下的方向(Z方向)上,大開口到基板3的厚度tm以上(-X方向也同樣)。 (Condition 15) The opening 352g or 452g is a large opening to the thickness tm of the substrate 3 in the vertical direction (Z direction) with respect to the passing linear movement guide mechanism and the substrate 3 (the same applies to the -X direction) .

其他方面,圖2與圖5的比較條件為同樣。例如, Otherwise, the comparison conditions of FIG. 2 and FIG. 5 are the same. E.g,

(條件01)基板3,以座標系統X的座標0為中心之X方向長度為Lx,厚度為tp。 (Condition 01) The substrate 3 has a length Lx in the X direction centered on the coordinate 0 of the coordinate system X, and a thickness tp.

(條件04)保持直線移動軸承的轉動體("滾珠"或是"滾子")的部分(轉動體保持部621~630、721~730)係支撐長度Lx的基板3。 (Condition 04) The portion (the rotor holding portions 621 to 630, 721 to 730) that holds the rotating body ("ball" or "roller") of the linear motion bearing supports the substrate 3 of the length Lx.

(條件05)軌條(軌道軸603、605、607、609、611、705、707、709及711)的長度為2Lx,固定軌道軸(軌道軸603、605、607、609、611、705、707、709及711)的基座602、604、606、608、610、706及710也是相同長度。 (Condition 05) The length of the rails (track shafts 603, 605, 607, 609, 611, 705, 707, 709, and 711) is 2Lx, and the fixed rail axis (track shafts 603, 605, 607, 609, 611, 705, The pedestals 602, 604, 606, 608, 610, 706, and 710 of 707, 709, and 711) are also of the same length.

(條件06)轉動體保持部621~630、721~728,是無法露出自軌道軸603、605、607、609、611、705、707、709及711(實際上,在端部設有機械式或是電氣式作用之止動件)。 (Condition 06) The rotor holding portions 621 to 630 and 721 to 728 cannot be exposed from the rail shafts 603, 605, 607, 609, 611, 705, 707, 709, and 711 (actually, mechanical parts are provided at the ends). Or the action of the electrical action).

(條件07)最上部的平板612及712具有與基板3同樣的長度。 (Condition 07) The uppermost flat plates 612 and 712 have the same length as the substrate 3.

(條件08)為了得到必要的移動距離(移動行程),增加直線移動軸承(把基座、軌道軸及轉動體保持部作為構成要件)來使用。 (Condition 08) In order to obtain a necessary moving distance (moving stroke), a linear moving bearing (a base, a track shaft, and a rotating body holding portion is used as a constituent element) is used.

由上述的條件,決定接下來的規格。亦即, The following specifications are determined by the above conditions. that is,

(規格11)基板3的移動行程為±5Lx/2。 (Specification 11) The movement stroke of the substrate 3 is ±5 Lx/2.

(規格12)直線移動軸承1套(set)(軌道軸+轉動體保持部)份的移動量為±Lx/2。 (Specification 12) The movement amount of one set (track shaft + rotor holding portion) of the linear motion bearing is ±Lx/2.

(規格13)由上述2項,必要的直線移動軸承數為5套。 (Specification 13) From the above two items, the number of necessary linear moving bearings is five sets.

在圖6之以往方式的長行程搬送機構600中, In the long-length transport mechanism 600 of the conventional method of FIG. 6,

(11a)1軸導引機構(軌道軸、2個轉動體保持部及基座)為單純地5段疊加。 (11a) The one-axis guide mechanism (the track shaft, the two rotor holding portions, and the susceptor) is simply superposed in five stages.

(12a)除了最上部的平板612,連接轉動體保持部621~628的部分,係因為成為基座604、606、608或是610的緣故,這些的長度為2Lx。 (12a) In addition to the uppermost flat plate 612, the portions connecting the rotor holding portions 621 to 628 are 2Lx because they are the bases 604, 606, 608 or 610.

(13a)於在X方向移動時,露出自最下段的基座(固定基座602)的部分的高度為Ha。 (13a) When moving in the X direction, the height of the portion exposed from the lowermost base (fixed base 602) is Ha.

又,在圖7之本發明的長行程搬送機構700中, Further, in the long stroke conveying mechanism 700 of the present invention in Fig. 7,

(11b)由下往上數第2及第4個直線移動軸承,係轉動體保持部723及724與軌道軸705的上下關係為顛倒 ,轉動體保持部721及722和轉動體保持部723及724兩套為一起在第1基座704一體化移動之構造。該部分為第1移動件771。 (11b) The second and fourth linear moving bearings are counted from the bottom to the top, and the vertical relationship between the rotating body holding portions 723 and 724 and the orbital shaft 705 is reversed. The rotor holding portions 721 and 722 and the rotor holding portions 723 and 724 are integrally moved together in the first base 704. This portion is the first moving member 771.

(12b)在以往方式之圖6的情況下,除了最上部的平板612,固定轉動體保持部621~628的基座的長度為2Lx。但是,在本發明之圖7的情況中,包含到第1移動件771的基座704的長度為其之一半,長度是為Lx。 (12b) In the case of Fig. 6 of the conventional embodiment, the length of the base of the fixed rotor holding portions 621 to 628 is 2Lx except for the uppermost flat plate 612. However, in the case of Fig. 7 of the present invention, the length of the base 704 included in the first movable member 771 is one half thereof and the length is Lx.

(13b)在移動時,露出自最下段的基座(固定基座602)的部分的高度為Hb。 (13b) When moving, the height of the portion exposed from the lowermost base (fixed base 602) is Hb.

比較圖6與圖7之際,進行單純化,進行與在圖2與圖5同樣的比較。亦即,以以下的條件進行比較。 Comparing Fig. 6 with Fig. 7, simplification was carried out, and the same comparison as in Fig. 2 and Fig. 5 was carried out. That is, the comparison is made under the following conditions.

圖6及圖7的深度方向(Y方向)的長度D,一律D=1。又,基座602、604、606、608、610、704、706、708、710的厚度,以及軌道軸603、605、607、609、611、705、707、709、711與介隔了轉動體保持部621~630、721~728的基座602、604、606、608、610、704、706、708、710、或是平板612之間的距離,是與平板612的厚度tm為相同。更進一步,軌道軸603、605、607、609、611、705、707、709、711的高度也為2tm。又更進一步,基座602、604、606、608、610、704、706、708、710及平板612的密度ρ,令ρ=1。 The length D in the depth direction (Y direction) of FIGS. 6 and 7 is uniformly D=1. Moreover, the thicknesses of the pedestals 602, 604, 606, 608, 610, 704, 706, 708, 710, and the track axes 603, 605, 607, 609, 611, 705, 707, 709, 711 are separated from the rotating body The distance between the pedestals 602, 604, 606, 608, 610, 704, 706, 708, 710 or the flat plate 612 of the holding portions 621 to 630 and 721 to 728 is the same as the thickness tm of the flat plate 612. Further, the heights of the track shafts 603, 605, 607, 609, 611, 705, 707, 709, 711 are also 2 tm. Still further, the density ρ of the pedestals 602, 604, 606, 608, 610, 704, 706, 708, 710 and the plate 612 is such that ρ=1.

根據上述的條件,以往方式之圖6的基座602、604、606、608、610與平板612的質量之和Ma,則 Ma=tm(11Lx)。又圖7的基座602、704、706、708、710與平板612的質量之和Mb,則Mb=tm(9Lx)。 According to the above conditions, the sum of the masses of the pedestals 602, 604, 606, 608, 610 and the flat plate 612 of FIG. 6 in the conventional manner is Ma=tm (11Lx). Further, the sum Mb of the masses of the pedestals 602, 704, 706, 708, 710 and the flat plate 612 of Fig. 7 is Mb = tm (9Lx).

所以,比起以往方式的質量Ma,利用本發明的質量Mb是可以減少的。亦即,Ma>Mb。 Therefore, the mass Mb using the present invention can be reduced compared to the mass Ma of the conventional method. That is, Ma>Mb.

接著,圖6的閘閥的開口部352g的高度Hag為19tm+ts。又,圖7的閘閥的開口部452g的高度Hbg為17tm+ts。 Next, the height Hag of the opening 352g of the gate valve of Fig. 6 is 19 tm + ts. Moreover, the height Hbg of the opening 452g of the gate valve of FIG. 7 is 17tm+ts.

所以,比起以往方式的閘閥的開口高度Hag,利用本發明的閘閥的開口高度Hbg是可以縮小的。亦即,Hag>Hbg。 Therefore, the opening height Hbg of the gate valve of the present invention can be reduced compared to the opening height Hag of the gate valve of the conventional method. That is, Hag>Hbg.

如上述,根據圖5或圖7的實施例, As described above, according to the embodiment of FIG. 5 or FIG. 7,

i)在第1移動件的轉動體保持部完全背對背固定的情況下,在被包含到的平板作用有引伸力及壓縮力。但是,幾乎沒有受到彎曲力矩,可以讓移動件變薄。 i) When the rotor holding portion of the first moving member is completely fixed back to back, an extension force and a compressive force are applied to the plate to be included. However, there is almost no bending moment, which can make the moving parts thin.

ii)第1移動件,係可以視為1個轉動體保持部的緣故,明顯減少了長行程搬送機構的疊加段數。 Ii) The first moving member can be regarded as one rotating body holding portion, and the number of superimposed segments of the long stroke conveying mechanism is remarkably reduced.

iii)良好平衡且承受彎曲力矩方面,無論是以往的方式或是本發明的長行程搬送機構,是有必要從下面的段朝向上面的段來減少質量。為此,有必要使各段基座的質量及強度做變化。但是,與以往的方式相比,本發明的長行程搬送機構係基座數量較少的緣故,可以減少質量及強度為相異的零件的數量。 Iii) In terms of good balance and withstanding bending moments, it is necessary to reduce the mass from the lower section toward the upper section, either in the conventional manner or in the long-stroke conveying mechanism of the present invention. For this reason, it is necessary to change the quality and strength of each stage base. However, compared with the conventional method, the long-stroke conveying mechanism of the present invention has a small number of pedestals, and it is possible to reduce the number of parts having different qualities and strengths.

上述圖5或圖7的實施例的長行程搬送機構,為在垂直方向上疊加第1移動件、第2移動件等之構造 。但是,也可以疊加在水平方向上。根據圖8,表示有疊加在水平方向上與圖5同樣段數的長行程搬送機構之一實施例。圖8為由上方看本發明的長行程搬送機構的一實施例之俯視圖。又圖8同樣是表示其長行程搬送機構移動到最右邊的情況之圖。 The long-stroke conveying mechanism of the embodiment of FIG. 5 or FIG. 7 is a structure in which the first moving member, the second moving member, and the like are superimposed in the vertical direction. . However, it can also be superimposed in the horizontal direction. Fig. 8 shows an embodiment of a long-stroke conveying mechanism superimposed on the same number of stages as in Fig. 5 in the horizontal direction. Fig. 8 is a plan view showing an embodiment of the long stroke conveying mechanism of the present invention as seen from above. Fig. 8 is also a view showing a state in which the long stroke conveying mechanism is moved to the rightmost side.

800為長行程搬送機構,571'為第1移動件,581'為第2移動件,504'為移動件571'的第1基座,506'為第2基座,203'為被固定在固定基座202(從上方是看不到)的Z方向上部之固定軌道軸,541'與542'為被固定在第1基座504'的其中一方的側面部且在固定軌道軸203'的軌道上移動於X軸方向之移動件571'的第1轉動體保持部,505'為被固定在第2基座506'的其中一方的側面部之第1軌道軸,561'與562'為被固定在第1基座504'的其中另一方的側面部且在固定軌道軸505'的軌道上移動於X軸方向之移動件571'的第2轉動體保持部,507'為被固定在第2基座506'的其中另一方的側面部之第2軌道軸,281'與282'為被固定在平板208(有基板3的緣故,從上方是看不到)的兩側面部且在第2軌道軸507'的軌道上移動於X軸方向之第3轉動體保持部。在此,以轉動體保持部541'與542'、第1基座504'、以及轉動體保持部561'與562',構成第1移動件571'。又,以軌道軸505'、第2基座506'、以及軌道軸507',構成第2移動件581'。 800 is a long stroke conveying mechanism, 571' is a first moving member, 581' is a second moving member, 504' is a first base of the moving member 571', 506' is a second base, and 203' is fixed at The fixed base shaft of the upper portion of the fixed base 202 (not visible from above) in the Z direction, 541' and 542' are fixed to one side surface of the first base 504' and fixed to the track shaft 203'. The first rotor holding portion of the movable member 571' that moves in the X-axis direction on the track, 505' is the first track shaft that is fixed to one of the side surfaces of the second base 506', and 561' and 562' are The second rotor holding portion 507' that is fixed to the side surface portion of the first base 504' and that moves on the rail of the fixed rail shaft 505' in the X-axis direction is fixed to The second orbital shafts 281' and 282' of the other side surface portion of the second pedestal 506' are fixed to the both side faces of the flat plate 208 (the substrate 3 is not visible from above) and are The track of the second track shaft 507' moves on the third rotor holding portion in the X-axis direction. Here, the first moving member 571' is configured by the rotor holding portions 541' and 542', the first base 504', and the rotor holding portions 561' and 562'. Further, the second movable member 581' is constituted by the orbital shaft 505', the second base 506', and the orbital shaft 507'.

如圖8所示,在固定基座202上固定2根固定軌道軸203',於該2根固定軌道軸203'的內側面,組合 移動件571'、第1軌道軸505'、第2基座506'、第2軌道軸507'、第3轉動體保持部281'及282',而且,在第3轉動體保持部281'及282'的上部安裝並固定平板208'。在該平板208'上載置基板3,該被載置的基板3是藉由長行程搬送機構800而被搬入及搬出。 As shown in FIG. 8, two fixed rail shafts 203' are fixed to the fixed base 202, and the inner side surfaces of the two fixed rail shafts 203' are combined. The movable member 571', the first track shaft 505', the second base 506', the second track shaft 507', the third rotor holding portions 281' and 282', and the third rotor holding portion 281' and The upper portion of the 282' is mounted and fixed to the plate 208'. The substrate 3 is placed on the flat plate 208', and the substrate 3 placed thereon is carried in and out by the long-length transport mechanism 800.

但是,在圖8的實施例的長行程搬送機構800的情況下,於移動件作用有力矩負載及剪切負載。 However, in the case of the long stroke conveying mechanism 800 of the embodiment of Fig. 8, a moment load and a shear load act on the moving member.

在上述的圖1、4、5、7或8的實施例中,乃是水平搬送(搬入及搬出)基板的長行程搬送機構。但是,不僅限於水平搬送基板,當然也可以以垂直或設定的角度來進行搬送。特別是,圖8的實施例之長行程搬送機構,是在垂直方向上搬送基板。在該情況下,於移動件沒有作用有力矩負載及剪切負載。 In the embodiment of Fig. 1, 4, 5, 7 or 8 described above, it is a long-length transport mechanism that transports (loads in and out) the substrate horizontally. However, it is not limited to the horizontal transfer of the substrate, and it is of course possible to carry it at a vertical or set angle. In particular, in the long stroke conveying mechanism of the embodiment of Fig. 8, the substrate is conveyed in the vertical direction. In this case, the moving load does not act on the moment load and the shear load.

亦即,根據圖8的實施例,可以讓移動件變薄,明顯減少了長行程搬送機構的疊加段數。更進一步,與以往的方式相比,基座零件的質量為較輕的緣故,可以小型化機構。 That is, according to the embodiment of Fig. 8, the moving member can be thinned, and the number of superimposed segments of the long-travel conveying mechanism is remarkably reduced. Further, the quality of the base member is lighter than in the conventional method, and the mechanism can be miniaturized.

如此,根據上述的圖1、4、5、7或8的實施例,可以提供有可以降低交接室的高度及製程腔室的高度,且縮小閘閥的開口的上下方向的大小之長行程搬送機構。 Thus, according to the embodiment of FIG. 1, 4, 5, 7 or 8 above, a long-stroke conveying mechanism capable of reducing the height of the transfer chamber and the height of the process chamber and reducing the size of the opening of the gate valve in the vertical direction can be provided. .

其結果,於用交接室連接在真空中的處理之多數的處理腔室之製造線方面,可以提供有製造成本便宜的製造裝置及製造線。更進一步,真空腔室的容積較小的緣故,可以快速地進行維持真空、真空的切換等,期望有低運轉成 本、加快處理速度。 As a result, it is possible to provide a manufacturing apparatus and a manufacturing line which are inexpensive to manufacture, in terms of the manufacturing line of the processing chamber which is connected to the processing in the vacuum chamber. Further, since the volume of the vacuum chamber is small, it is possible to quickly maintain the vacuum, switch the vacuum, etc., and it is desired to have a low operation. This speeds up processing.

尚且,在上述的圖1、4、5、7及8的實施例之長行程搬送機構中,是可以在X軸方向之左右兩方上移動,但是,僅可以在左邊或是右邊移動這一點也是不言而喻的。 Further, in the long-stroke conveying mechanism of the embodiment of FIGS. 1, 4, 5, 7 and 8 described above, it is possible to move both the left and right in the X-axis direction, but it is only possible to move to the left or right. It is also self-evident.

3‧‧‧基板 3‧‧‧Substrate

202‧‧‧固定基座 202‧‧‧Fixed base

203‧‧‧固定軌道軸 203‧‧‧ Fixed track axle

208‧‧‧平板 208‧‧‧ tablet

281、282‧‧‧第3轉動體保持部 281, 282‧‧‧3rd rotor retaining section

500‧‧‧長行程搬送機構 500‧‧‧Long-term transport mechanism

505‧‧‧固定軌道軸 505‧‧‧ Fixed track axle

504、504'‧‧‧第1基座 504, 504'‧‧‧1st pedestal

506‧‧‧第2基座 506‧‧‧2nd pedestal

507‧‧‧固定軌道軸 507‧‧‧ Fixed track axle

541、542‧‧‧轉動體保持部 541, 542‧‧ ‧ Rotating body retention department

561、562‧‧‧轉動體保持部 561, 562‧‧‧ Rotating body holding department

571‧‧‧第1移動件 571‧‧‧1st moving piece

581‧‧‧第2移動件 581‧‧‧2nd moving parts

Claims (5)

一種成膜裝置,具備有:在內部具備把膜形成在基板上的成膜機構之成膜腔室、用以在複數之該成膜腔室間搬送基板之交接室、以及分隔該成膜腔室與該交接室之閘閥;其特徵為:把利用載置基板並使其移動來搬送基板的搬送機構,利用堆疊了複數之移動單位來構成,且把該移動單位與移動單位之間,利用一對軌條與沿著該軌條移動的轉動體所構成的直線移動導軌做直接、或是間接連接,更進一步,至少1個前述移動單位是在上下面僅具備有軌條、或是僅具備有轉動體之其中任一種。 A film forming apparatus comprising: a film forming chamber having a film forming mechanism for forming a film on a substrate; a transfer chamber for transporting a substrate between the plurality of film forming chambers; and separating the film forming chamber A gate valve of the chamber and the transfer chamber; characterized in that the transport mechanism that transports the substrate by moving the substrate is configured by stacking a plurality of mobile units, and using the mobile unit and the mobile unit The pair of rails are directly or indirectly connected to the linear moving rail formed by the rotating body moving along the rail. Further, at least one of the aforementioned moving units is only provided with rails on the upper and lower sides, or only It has any one of the rotating bodies. 如請求項1之成膜裝置,其中,具備有驅動前述搬送機構之最下段的移動單位在設定的方向上之驅動機構,且該最下段的移動單位的動作利用連桿機構,傳遞到其他的移動單位,使該搬送機構上的基板移動到設定的位置。 The film forming apparatus according to claim 1, further comprising: a driving mechanism that drives a moving unit of the lowermost stage of the conveying mechanism in a set direction, and the movement of the lowermost moving unit is transmitted to the other by a link mechanism Move the unit to move the substrate on the transport mechanism to the set position. 如請求項1或2之成膜裝置,其中,前述移動單位的基座,為金屬平板。 The film forming apparatus of claim 1 or 2, wherein the base of the moving unit is a metal flat plate. 一種基板搬送裝置,具備有:把利用載置基板並使其移動來搬送基板的搬送機構,利用堆疊了複數之移動單位來構成,且把該移動單位與移動單位之間,利用一對軌條與沿著該軌條移動的轉動體所構成的直線移動導軌做直接、或是間接連接,更進一步,至少1個前述移動單位是在上下面僅具備有軌條、或是僅具備有轉動體之其中任 一種。 A substrate transfer device includes a transfer mechanism that transports a substrate by moving the substrate, and is configured by stacking a plurality of moving units, and using a pair of rails between the moving unit and the moving unit The linear moving rail formed by the rotating body moving along the rail is directly or indirectly connected, and further, at least one of the moving units is only provided with a rail in the upper and lower surfaces, or only has a rotating body. Any of them One. 如請求項4之基板搬送裝置,其中,具備有驅動前述搬送機構之最下段的移動單位在設定的方向上之驅動機構,且該最下段的移動單位的動作利用連桿機構,傳遞到其他的移動單位,使該搬送機構上的基板移動到設定的位置。 The substrate transfer apparatus according to claim 4, further comprising: a drive mechanism that drives a movement unit of a lowermost stage of the transport mechanism in a set direction; and the movement of the lowermost movement unit is transmitted to the other by a link mechanism Move the unit to move the substrate on the transport mechanism to the set position.
TW102105291A 2012-02-21 2013-02-08 Film forming device and substrate conveying mechanism for the film forming device TW201336012A (en)

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