TW201314382A - 用於目標物處理工具之導引裝置 - Google Patents

用於目標物處理工具之導引裝置 Download PDF

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Publication number
TW201314382A
TW201314382A TW101133277A TW101133277A TW201314382A TW 201314382 A TW201314382 A TW 201314382A TW 101133277 A TW101133277 A TW 101133277A TW 101133277 A TW101133277 A TW 101133277A TW 201314382 A TW201314382 A TW 201314382A
Authority
TW
Taiwan
Prior art keywords
bearing
target
bearing support
processing tool
target carrier
Prior art date
Application number
TW101133277A
Other languages
English (en)
Chinese (zh)
Inventor
Jerry Johannes Martinus Peijster
Original Assignee
Mapper Lithography Ip Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mapper Lithography Ip Bv filed Critical Mapper Lithography Ip Bv
Publication of TW201314382A publication Critical patent/TW201314382A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70816—Bearings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/002—Elastic or yielding linear bearings or bearing supports
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/04—Ball or roller bearings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/12—Arrangements for adjusting play
    • F16C29/123—Arrangements for adjusting play using elastic means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2370/00—Apparatus relating to physics, e.g. instruments

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Bearings For Parts Moving Linearly (AREA)
  • Electron Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW101133277A 2011-09-12 2012-09-12 用於目標物處理工具之導引裝置 TW201314382A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201161533339P 2011-09-12 2011-09-12

Publications (1)

Publication Number Publication Date
TW201314382A true TW201314382A (zh) 2013-04-01

Family

ID=47003170

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101133277A TW201314382A (zh) 2011-09-12 2012-09-12 用於目標物處理工具之導引裝置

Country Status (5)

Country Link
US (1) US9163664B2 (enExample)
EP (1) EP2756354B1 (enExample)
JP (1) JP5955964B2 (enExample)
TW (1) TW201314382A (enExample)
WO (1) WO2013039387A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112658691A (zh) * 2020-12-16 2021-04-16 惠州城市职业学院(惠州商贸旅游高级职业技术学校) 一种冲浪板切割打磨一体装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2756354B1 (en) 2011-09-12 2018-12-19 Mapper Lithography IP B.V. Target processing tool
KR101608625B1 (ko) * 2015-07-30 2016-04-11 주식회사 재원 위치 결정 장치

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4637738A (en) * 1985-07-31 1987-01-20 Vincent Barkley Alignment compensator for linear bearings
US4802774A (en) * 1987-10-14 1989-02-07 Brown & Sharpe Manfacturing Co. Gas bearing for guiding relative movement of precision machine parts
JPH01240246A (ja) * 1988-03-22 1989-09-25 Kazuya Hirose テーブルの縦横移動機構
US5180230A (en) * 1991-06-12 1993-01-19 Etec Systems, Inc. Rolling element cage constraint
JP3353941B2 (ja) * 1993-05-11 2002-12-09 オリンパス光学工業株式会社 直線移動部材の支持装置
US5760564A (en) 1995-06-27 1998-06-02 Nikon Precision Inc. Dual guide beam stage mechanism with yaw control
US6114799A (en) * 1997-02-10 2000-09-05 Minolta Co., Ltd. Driving mechanism
JP4073512B2 (ja) * 1997-02-10 2008-04-09 コニカミノルタホールディングス株式会社 駆動装置
DE60032568T2 (de) 1999-12-01 2007-10-04 Asml Netherlands B.V. Positionierungsapparat und damit versehener lithographischer Apparat
US6570155B1 (en) * 2000-04-11 2003-05-27 Applied Materials, Inc. Bi-directional electron beam scanning apparatus
DE10140174B4 (de) 2001-08-22 2005-11-10 Leica Microsystems Semiconductor Gmbh Koordinaten-Messtisch und Koordinaten-Messgerät
SG126732A1 (en) * 2002-09-30 2006-11-29 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TWI472884B (zh) 2008-08-18 2015-02-11 Mapper Lithography Ip Bv 帶電粒子射束微影系統以及目標物定位裝置
NL2003846A (en) * 2008-12-19 2010-06-22 Asml Netherlands Bv Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless.
EP2756354B1 (en) 2011-09-12 2018-12-19 Mapper Lithography IP B.V. Target processing tool

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112658691A (zh) * 2020-12-16 2021-04-16 惠州城市职业学院(惠州商贸旅游高级职业技术学校) 一种冲浪板切割打磨一体装置

Also Published As

Publication number Publication date
US20130070225A1 (en) 2013-03-21
WO2013039387A1 (en) 2013-03-21
EP2756354A1 (en) 2014-07-23
JP2014528164A (ja) 2014-10-23
EP2756354B1 (en) 2018-12-19
JP5955964B2 (ja) 2016-07-20
US9163664B2 (en) 2015-10-20

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