JP5955964B2 - ターゲット処理ツールのためのガイダンス - Google Patents

ターゲット処理ツールのためのガイダンス Download PDF

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Publication number
JP5955964B2
JP5955964B2 JP2014529637A JP2014529637A JP5955964B2 JP 5955964 B2 JP5955964 B2 JP 5955964B2 JP 2014529637 A JP2014529637 A JP 2014529637A JP 2014529637 A JP2014529637 A JP 2014529637A JP 5955964 B2 JP5955964 B2 JP 5955964B2
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Japan
Prior art keywords
target
bearing
processing tool
support
along
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JP2014529637A
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English (en)
Japanese (ja)
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JP2014528164A5 (enExample
JP2014528164A (ja
Inventor
ペイースター、ジェリー・ヨハネス・マルティヌス
Original Assignee
マッパー・リソグラフィー・アイピー・ビー．ブイ．
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Publication of JP2014528164A5 publication Critical patent/JP2014528164A5/ja
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/002—Elastic or yielding linear bearings or bearing supports
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/04—Ball or roller bearings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/12—Arrangements for adjusting play
    • F16C29/123—Arrangements for adjusting play using elastic means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70816—Bearings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2370/00—Apparatus relating to physics, e.g. instruments

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Bearings For Parts Moving Linearly (AREA)
  • Electron Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2014529637A 2011-09-12 2012-09-07 ターゲット処理ツールのためのガイダンス Active JP5955964B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161533339P 2011-09-12 2011-09-12
US61/533,339 2011-09-12
PCT/NL2012/050630 WO2013039387A1 (en) 2011-09-12 2012-09-07 Guidance for target processing tool

Publications (3)

Publication Number Publication Date
JP2014528164A JP2014528164A (ja) 2014-10-23
JP2014528164A5 JP2014528164A5 (enExample) 2015-10-29
JP5955964B2 true JP5955964B2 (ja) 2016-07-20

Family

ID=47003170

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014529637A Active JP5955964B2 (ja) 2011-09-12 2012-09-07 ターゲット処理ツールのためのガイダンス

Country Status (5)

Country Link
US (1) US9163664B2 (enExample)
EP (1) EP2756354B1 (enExample)
JP (1) JP5955964B2 (enExample)
TW (1) TW201314382A (enExample)
WO (1) WO2013039387A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2756354B1 (en) 2011-09-12 2018-12-19 Mapper Lithography IP B.V. Target processing tool
KR101608625B1 (ko) * 2015-07-30 2016-04-11 주식회사 재원 위치 결정 장치
CN112658691A (zh) * 2020-12-16 2021-04-16 惠州城市职业学院(惠州商贸旅游高级职业技术学校) 一种冲浪板切割打磨一体装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4637738A (en) * 1985-07-31 1987-01-20 Vincent Barkley Alignment compensator for linear bearings
US4802774A (en) * 1987-10-14 1989-02-07 Brown & Sharpe Manfacturing Co. Gas bearing for guiding relative movement of precision machine parts
JPH01240246A (ja) * 1988-03-22 1989-09-25 Kazuya Hirose テーブルの縦横移動機構
US5180230A (en) * 1991-06-12 1993-01-19 Etec Systems, Inc. Rolling element cage constraint
JP3353941B2 (ja) * 1993-05-11 2002-12-09 オリンパス光学工業株式会社 直線移動部材の支持装置
US5760564A (en) 1995-06-27 1998-06-02 Nikon Precision Inc. Dual guide beam stage mechanism with yaw control
US6114799A (en) * 1997-02-10 2000-09-05 Minolta Co., Ltd. Driving mechanism
JP4073512B2 (ja) * 1997-02-10 2008-04-09 コニカミノルタホールディングス株式会社 駆動装置
DE60032568T2 (de) 1999-12-01 2007-10-04 Asml Netherlands B.V. Positionierungsapparat und damit versehener lithographischer Apparat
US6570155B1 (en) * 2000-04-11 2003-05-27 Applied Materials, Inc. Bi-directional electron beam scanning apparatus
DE10140174B4 (de) 2001-08-22 2005-11-10 Leica Microsystems Semiconductor Gmbh Koordinaten-Messtisch und Koordinaten-Messgerät
SG126732A1 (en) * 2002-09-30 2006-11-29 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TWI472884B (zh) 2008-08-18 2015-02-11 Mapper Lithography Ip Bv 帶電粒子射束微影系統以及目標物定位裝置
NL2003846A (en) * 2008-12-19 2010-06-22 Asml Netherlands Bv Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless.
EP2756354B1 (en) 2011-09-12 2018-12-19 Mapper Lithography IP B.V. Target processing tool

Also Published As

Publication number Publication date
US20130070225A1 (en) 2013-03-21
TW201314382A (zh) 2013-04-01
WO2013039387A1 (en) 2013-03-21
EP2756354A1 (en) 2014-07-23
JP2014528164A (ja) 2014-10-23
EP2756354B1 (en) 2018-12-19
US9163664B2 (en) 2015-10-20

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