TW201302320A - Floating substrate coating apparatus - Google Patents

Abstract

The subject of this invention is to expand the level difference tolerance of the boundaries (joints) of divided platform zones in a floating platform, so as to simplify the height position adjustment operation of floating surface in a short time. The solution of this invention is as following. In the floating platform (10), the move-in platform zone (SBA) at the left end is equipped with a first rough floating zone (MIN) specifically disposed with several jetting ports (12). The platform zone (SBB) at the center is partially equipped on the two end parts in the conveying direction (X direction) with a pushing floating zone (MP, MQ) specifically disposed with several jetting ports (12) respectively; and equipped with a precision floating zone (MCT) mixedly disposed with several jetting ports (12) and suction ports (14). Moreover, the move-out platform zone (SBC) at the right end is equipped with a second rough floating zone (MOUT) specifically disposed with several jetting ports (12).

Description

Floating coating device

The present invention relates to a coating device in which a processing liquid is applied to a substrate while floating on a substrate and a processing liquid is applied to the substrate.

In the photolithography process of the manufacturing process of a flat panel display (FPD; Flat Panel Display), most of the resistive nozzles which are oppositely scanned with a slit-shaped discharge port are coated on the substrate to be processed. A non-rotating coating method of the solution.

In one form of the spin-free coating method, for example, as disclosed in Patent Document 1, a rectangular substrate to be processed (for example, a glass substrate) for FPD is floated in the air on a long floating platform to be conveyed in one horizontal direction ( In the longitudinal direction of the platform, the resist processing liquid is discharged in a strip shape by an elongated resist nozzle disposed above the platform, thereby applying a resist from one end to the other end of the substrate. The way the liquid floats is known.

The floating platform used in such a floating-type resist coating device ejects a high-pressure gas (usually air) vertically above the platform, and the substrate is lifted in a horizontal posture by the pressure of the high-pressure air. Then, the straight-moving type transporting portions disposed on the left and right sides of the floating platform detachably hold the substrates floating on the floating platform, and transport the substrates in the longitudinal direction of the platform.

The upper surface (floating upper surface) of the floating platform is divided into three loading and unloading areas, a coating area, and a carry-out area along the transport direction. The coating area is here In the region where the resist liquid is supplied onto the substrate, the elongated resist nozzle is disposed above the center portion of the coating region. The floating height of the coating region is a coating gap (for example, 200 μm) between the lower end (discharge port) of the resist nozzle and the upper surface (treated surface) of the substrate. This coating gap is an important parameter of the film thickness of the left and right resist coating films or the amount of resist consumption, and needs to be maintained at a high precision. Therefore, on the stage of the coating area, a plurality of suction ports for taking in air at a negative pressure are provided in the discharge port which is mixed with the high-pressure air. Then, for the portion passing through the coated region of the substrate, the vertical upward force of the high-pressure air is applied from the discharge port, and the vertical downward force of the negative pressure attraction force is applied by the suction port to control the two-way force against the opposite force. The balance is such that the predetermined floating height (usually 30 to 60 μm) can be stably maintained with a large floating rigidity.

In this way, the application area is a precise floating area in which the discharge port and the suction port are mostly mixed to make the substrate float with a small floating height which can obtain a large floating rigidity, and the cost per unit area is relatively high. The size of the application region in the transport direction is such that the above-described narrow coating gap can be stably formed in the vicinity of the right underside of the resist nozzle, and is usually smaller than the size of the substrate, for example, 1/3~ 1/10 degree.

On the other hand, the carry-in area is a region where the loading of the substrate and the start of the floating transport are performed, and the carry-out region is a region where the floating transport is completed and the substrate is carried out. The floating height of the loading area and the carrying-out area does not require particularly high precision, and even if the floating rigidity is small, it is usually necessary to maintain the rough range of 200 to 2000 μm. On the other hand, the carry-in area and the carry-out area have a size exceeding the substrate in the transport direction. Thus, in The loading area and the moving out area are provided with a spout on one side.

[prior technical literature] [Patent Document]

[Patent Document 1] JP-A-2005-244155

The above-described floating-type resist application device is assembled in the production facility of the device manufacturer in the same manner as other FPD manufacturing devices, and is subjected to final test and confirmation of device performance. Then, the resist coating device is decomposed into constituent elements (units, modules, subassemblies, and the like) on the hard body. Further, the decomposed components are usually transported to a plurality of trucks or containers to be shipped to the ordering party (FPD manufacturing plant), and the resist coating device is again assembled at the device operating site.

What is problematic here is that it takes a lot of labor and time to adjust the same height of each floating surface of the loading platform, the coating area, and the loading area of the floating platform.

That is, the floating platform used in the resist coating apparatus has a total length of several times that of the substrate, and is sufficient for LCD (liquid crystal display) to exceed 5 m. Therefore, in recent years, it is normal to divide the floating platform into the detachable three platform blocks according to the loading area, the coating area, and the unloading area, and the platform blocks are respectively installed on the independent gantry, and the The platform block and the gantry are decomposed as one component (segment assembly). Conveying, ordering The setting place of the square arranges the three sets of the gantry and the platform block into a row to reassemble the floating platform. At this time, the adjusters provided between the gantry and the platform block are manually operated in each segment assembly, so that the height positions of the platform blocks are identical.

However, the floating height of the loading area and the carrying-out area is 200 to 2000 μm, and the floating height of the coating area is 30 to 60 μm, which is one-digit or two-digit. Therefore, it is necessary to reduce the difference in height position or the step difference to several tens of μm or less between the platform block at the both ends of the loading and unloading areas and the platform block in the middle of the mounting application area. More precisely, as will be described later, the step tolerance between the loading area and the coating area is higher when the floating upper surface of the former (loading area) is higher than the floating surface of the latter (coating area), and once the step is exceeded When the floating height (30 to 60 μm) of the coating region is applied, the substrate may be damaged by rubbing the step portion. Further, between the coating area and the carry-out area, the step tolerance of the floating upper surface of the latter (coating area) is higher than that of the former (loading area), and the step difference exceeds the floating area of the coating area. At the height, the substrate may be damaged by the collision of the step portion.

For the reason described above, in the conventional floating type resist coating apparatus, it is not uncommon for the positional adjustment of the platform block to take place all day in the reassembly operation of the ordering device, resulting in a large relationship between the scenes. The burden. inconvenient.

Moreover, even if the height adjustment of the platform block is made to make the height positions of the platform blocks consistent, the joint of the platform block may be undesirably higher than the allowable value due to time change or other maintenance. Poor (high and low difference). Therefore, it is necessary to perform the height position adjustment on the very troublesome platform block floating periodically or at any time.

The present invention is to solve the problems of the prior art as described above, and to provide an allowance for the step difference of the boundary (joint) of the platform block in the floating platform which can be decomposed in a plurality of platform blocks corresponding to the floating height. A floating type coating apparatus that can easily improve the safety and reliability of the floating coating process while performing the height position adjustment work on the floating surface.

A floating type coating apparatus according to a first aspect of the present invention includes: a floating upper platform in which a first floating region and a fine floating region are placed on the first and second platform blocks that are physically separated from each other; The precision floating region is such that the substrate is floated in the air at a precise first floating height suitable for the coating process in a large portion of the region, and the rough floating region is such that the substrate is larger than the first floating height. (2) the floating height is floated in the air; the substrate transporting portion detachably holds the substrate, and is transported to the floating platform in the order of the rough floating region and the precise floating region; and the processing liquid supply portion has a long nozzle that discharges a processing liquid for coating onto a surface to be processed of the substrate floating at the first floating height at a predetermined position in the precise floating region, and the second platform block and the aforementioned The vicinity of the end of the first platform block connection is disposed adjacent to the aforementioned precision floating area, and is The first floating height is higher than the third floating height of the first floating surface.

In the above-described configuration, when the first and second platform blocks are connected, the second platform block on the side of the fine floating region becomes lower than the first platform block on the rough floating region side, and an undesired step occurs. At the boundary of the two (joints), the rough floating height on the rough floating area of the first platform block is pulled down to the precise floating height on the coated area of the second platform block, but due to the position The top floating height above the upstream side of the cloth area is higher than the precision floating height, so the substrate does not rub the rear end corner of the first platform block as long as the step does not exceed the top floating height. Come through it. In this way, by providing a structure in which the top floating portion having a higher flying height than the precision floating height can be obtained at the beginning of the second platform block, the first and second platform blocks can be formed between the first and second platform blocks. The allowable amount of undesired steps is greater than ever.

A floating top coating apparatus according to a second aspect of the present invention includes: a floating upper platform in which a first floating region and a rough floating region are placed on the first and second platform blocks that are physically separated from each other The precision floating region is such that the substrate is floated in the air at a precise first floating height suitable for the coating process in a large portion of the region, and the rough floating region is such that the substrate is larger than the first floating height. 2 floating up in the air; a substrate transporting unit that detachably holds the substrate and transports the substrate to the floating platform in the order of the precise floating area and the rough floating area; a processing liquid supply unit having a long nozzle that discharges a processing liquid for coating onto a surface to be processed of the substrate floating at the first floating height at a predetermined position in the precise floating region, and The vicinity of the end portion of the first platform block that is connected to the second platform block is provided with a third floating height that is adjacent to the precise floating upper region and higher than the first floating height to lift the substrate Float the area.

In the above-described configuration, when the first and second platform blocks are connected, the first platform block on the side of the fine floating region becomes lower than the second platform block on the rough floating region side, and an undesired step occurs. At the boundary of the two (joints), the rough floating height on the rough floating area of the second platform block is pulled down to the precise floating height on the coated area of the first platform block, but due to the position The top floating height on the top floating side of the cloth area is higher than the precision floating height, so as long as the step does not exceed the top floating height, the substrate does not collide with the beginning corner of the second platform block. Come through it. In this way, by providing a structure in which the top floating portion having a higher flying height than the precision floating height can be obtained at the end portion of the first platform block, it can occur between the first and second platform blocks. The allowable amount of undesired steps is greater than ever.

A floating type coating apparatus according to a third aspect of the present invention includes: a first platform block having a plurality of transport rollers for horizontally transporting a substrate; and a floating platform connected to the first platform block; Mounted in the second platform block physically separated from the first platform block In the floating area, the substrate is suspended in the air in a large portion of the region in which the precise floating region is applied, and the substrate transfer unit holds the substrate detachably and transports the substrate. And a processing liquid supply unit having a long nozzle that discharges a processing liquid for coating onto a surface to be processed of the substrate floating at the first floating height at a predetermined position in the precise floating region , Further, in the vicinity of the end portion of the second platform block that is connected to the first platform block, the substrate is floated adjacent to the precise floating upper region and has a third floating height higher than the first floating height. Lift up the floating area.

According to the floating type coating apparatus of the present invention, in the assembly or reassembly of the floating platform by the above-described configuration and action, the height of the floating surface between the platform blocks connected to each other can be completed in a short time. A job with a consistent height position adjustment. Moreover, even if an undesired step difference occurs in the boundary (joint) of the platform block due to a change in time or other maintenance, the frequency or the number of times of re-adjustment can be reduced because the allowable amount is large.

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

1 to 3 show a resist coating device according to an embodiment of the present invention The composition of the floating platform around. 1 is a side view showing a floating platform, FIG. 2 is a top view showing a floating platform, and FIG. 3 is a side view showing a divided assembly (platform block/stand) of each group to be separated.

This resist coating apparatus is, for example, a rectangular glass substrate G for LCD, as a substrate to be processed, and has a rectangular parallelepiped floating platform 10 having a length several times that of the substrate G. The floating platform 10 is divided into three platform blocks SB _A , SB _B , SB _C which are physically separated in the longitudinal direction of the platform (X direction) which is the transport direction. The floating platform 10 is a joint state in which the joints (boundaries) of the platform blocks SB _A , SB _B , and SB _C are substantially assembled into a gap-free state.

As shown in Fig. 2, the platform block SB _A disposed at the left end of the most upstream side in the transport direction is mounted with a loading area in which a plurality of discharge ports 12 are exclusively disposed at a constant density or arrangement pattern (the first rough floating Area) M _IN . In the middle platform block SB _B, a substrate collision prevention region (top up floating region) in which a plurality of discharge ports 12 are exclusively disposed at a constant density or arrangement pattern is partially mounted at both end portions in the conveyance direction (X direction). M _P , M _Q , and a coating area in which a plurality of discharge ports 12 and suction ports 14 are mixed and arranged at a constant density or arrangement pattern between the partial regions M _P and M _Q at the both end portions (Precision floating area) M _CT . In addition, the platform block SB _C at the right end of the most downstream side (the last end) is mounted with a carry-out area (second rough floating area) in which a plurality of discharge ports 12 are exclusively disposed at a constant density or arrangement pattern. _OUT .

The platform block SB _A at the left end of the inlet side is mounted via a plurality of struts 18 on a gantry FL _A that can be independently moved and transported. A manual adjuster (height position adjusting unit) 20 is provided at a lower end portion of each of the pillars 18. The adjusters 20 are operated by hand, and the height position and level of the floating top of the platform block SB _A can be adjusted.

The intermediate platform block SB _B is mounted on the gantry FL _B that can be independently moved and transported via a plurality of struts 22, respectively. A manual adjuster 24 is provided at each lower end portion of each of the pillars 22. The adjusters 24 are operated by hand, and the height position and level of the floating top of the platform block SB _B can be adjusted separately.

The platform block SB _C on the outlet side is attached to the gantry FL _C that can be independently moved and transported via a plurality of struts 26, and a manual adjuster 28 is provided at the lower end of each of the struts 26. The adjusters 28 are operated by hand, and the height position and level of the floating surface of the platform block SB _C can be adjusted.

High-pressure air introduction ports 30 and 32 are provided on the back surface (lower surface) of the platform blocks SB _A and SB _C on which the loading area M _IN and the carry-out area M _OUT are mounted, respectively. These high-pressure air introduction ports 30, 32 are connected to the high-pressure air supply portion 36 via the high-pressure air supply pipe 34. The inside of each of the platform blocks SB _A and SB _C is provided to distribute the high-pressure air supplied by the high-pressure air supply unit 36 to the respective discharge ports 12 in the carry-in area M _IN or the carry-out area M _OUT with a uniform pressure. Hose and gas passage (not shown).

The high pressure air introduction port 38 and the vacuum introduction port 40 are attached to the back surface (lower surface) of the platform block SB _B on which the coating region M _CT is mounted. The high-pressure air introduction port 38 is connected to the high-pressure air supply portion 36 via the high-pressure air supply pipe 34. The vacuum introduction port 40 is connected to the vacuum device 44 via a vacuum tube 42. Provided inside the platform block SB _B is a manifold and a gas passage for distributing the high-pressure air supplied by the high-pressure air supply unit 36 to the discharge port 12 in the coating area M _CT at a uniform pressure (not shown), and is used by the suction force of the vacuum means 44 is supplied at a uniform pressure distribution to the manifold and a gas passage (not shown) of each suction port 14 in the coating area M _CT.

The gantry FL _A , FL _B , FL _C are respectively frame or bodies 46 , 48 , 50 and legs 52 , 54 , 56 made of stainless steel, such that the platform blocks SB _A , SB _B , SB _{C are in} this order with each other. The connections are arranged in a row in the ground 58. The long resist nozzle 60 is disposed directly above the center portion of the land block SB _B .

In the factory of the device manufacturer who produced the resist coating device, the floating platform 10 was assembled in the state shown in Fig. 1, and the final test and performance of the device were confirmed. Prior to this final test, the height adjustment of the platform blocks SB _A , SB _B , SB _C was performed on the gantry FL _A , FL _B , FL _C by manual operation of the adjusters 20, 24, 28, respectively. In this embodiment, as described later in detail, the substrate collision preventing region (the top floating region) M _P , M _{Q is} mounted on both end portions in the conveying direction (X direction) of the coating platform block SB _B . The configuration makes it easier and faster than ever to complete the height position adjustment of the platform blocks SB _A , SB _B , and SB _C .

Once the final test and performance confirmation of the device is completed, the resist coating device is broken down into hardware components (units, modules, segmented assemblies, etc.). In this case, the floating platform 10 is as shown in FIG. 3. The platform block SB _A and the gantry FL _A will become the segment assembly J _A of the first group, and the platform block SB _B and the gantry FL _B will become the second group. The segment assembly J _B , the platform block SB _C and the platform FL _C will become the segment assembly J _C of the third group.

The three segment assemblies J _A , J _B , and J _C are usually divided into a plurality of trucks or containers for delivery to the ordering party (LCD manufacturing plant). Then, on the floor of the equipment operation place of the ordering party, the three segment assemblies J _A , J _B , and J _C are arranged in a row, and the floating platform 10 is assembled.

In the reassembly operation of the floating platform 10, the height adjustment of the platform blocks SB _A , SB _B , and SB _C can be performed simply and in a short time for the same reason as described above. Thereby, the present resist application device can be quickly started.

Next, the overall configuration and operation of the resist application device of this embodiment will be described with reference to Figs. 4 and 5 .

As shown in FIG. 4, the first (left) and second (right) transporting portions 64L, 64R of the straight-moving type are disposed on the left and right sides of the floating platform 10. The transport units 64L and 64R are detachably held by the substrate G that is detachably held by the platform 10, and transport the substrate G in the longitudinal direction of the platform (X direction). In the floating platform 100, the substrate G is transported in a horizontal position in which the pair of sides are parallel to the transport direction (X direction), and the other pair of sides are orthogonal to the transport direction.

The first (left) and second (right) transporting portions 64L, 64R have first and second guide rails 66L, 66R that are arranged in parallel on the left and right sides of the floating platform 10, and the guide rails 66L. The first and second sliders 68L and 68R that are movably mounted in the transport direction (X direction) on the 66R, and the first and second sliders 68L and 68L that move the sliders 68L and 68L simultaneously or individually. The second transport drive unit (not shown) and the first carriage mounted on the two sliders 68L and 68R for detachably holding the substrate G And second holding portions 70L, 70R. Each of the transport drive units is constituted by a linear drive mechanism such as a linear motor.

The first (left) holding portion 70L has a plurality of adsorption pads 72L that are bonded to the back surface (lower surface) of the left side of the substrate G by vacuum suction force, and a plurality of pad support portions 74L. Supporting each of the adsorption pads 72L by limiting the displacement in the vertical direction at a plurality of intervals of a certain interval in the transport direction (X direction); and a plurality of pad actuators 76L for making the plurality of pads The pad support portions 74L are independently moved up and down or moved up and down.

The second (right) holding portion 70R has a plurality of adsorption pads 72R that are bonded to the back surface (lower surface) of the left side of the substrate G by vacuum suction force, and a plurality of pad supporting portions 74R. Supporting each of the adsorption pads 72R by limiting the displacement in the vertical direction at a plurality of intervals of a certain interval in the transport direction (X direction); and a plurality of pad actuators 76R for the plurality of pad supports The 74R is independently moved up and down or moved up and down.

Although the respective adsorption pads 72L and 72R on the left and right sides are not shown, a plurality of suction ports are actually provided on the upper surface of the rectangular parallelepiped pad body made of, for example, stainless steel (SUS). These suction ports are respectively connected to a vacuum source (not shown) of the pad adsorption control unit via a vacuum passage in the pad body and an external vacuum tube.

In the floating stage 10, the new substrate G to be processed which is subjected to the resist coating treatment in the resist coating device is, for example, the substrate to be processed G from the sorter unit (not shown) provided on the upstream side in the transport direction. In the horizontal state, it is horizontally moved into the carry-in area M _IN in the X direction.

The loading area M _IN is a region where the floating conveyance of the substrate G is started. In this region, the substrate G is floated at a relatively large floating height H _β (standard value: 200 to 2000 μm) as described above. Or a pattern is arranged to provide a plurality of discharge ports 12 for discharging high-pressure air. Further, an alignment mechanism (not shown) for positioning the substrate G on the stage 10 is also provided in the loading area M _IN .

The coating region M _CT set in the longitudinal center portion of the floating platform 10 is a resist liquid supply region, and the substrate G receives the supply of the resist liquid R from the upper resist nozzle 60 when passing through the coating region M _CT . . As described above, in the coating region M _CT , in order to make the substrate G float stably with a high floating height H _α (standard value: 30 to 60 μm) having a large floating rigidity, it is mixed and set at a constant density or arrangement pattern. A discharge port 12 for discharging high-pressure air and a suction port 14 for taking in air with a negative pressure are provided.

The carry-out area M _OUT at the other end of the floating upper stage 10 on the downstream side of the coating area M _{CT is} the area where the floating transfer of the substrate G is completed. The substrate G that has been subjected to the coating process in the application region M _CT is transferred from the carry-out region M _OUT to the classifier unit (not shown) on the downstream side in the X direction horizontally, for example, in the horizontal state. Drying unit under reduced pressure (not shown). In the carry-out area M _OUT , a plurality of ejection ports 12 for floating the substrate G at a relatively large floating height H _β (standard value: 200 to 2000 μm) are provided in a certain density or arrangement pattern.

The resist nozzle 60 is a slit-shaped discharge port 60a having a slit shape covering the substrate G on the floating platform 10 from one end to the other end in the longitudinal direction (Y direction), and is attached to the gate shape or upside down. The frame (not shown) of the zigzag can be moved up and down by, for example, driving of a nozzle lifting portion (not shown) having a ball screw mechanism, and connected to a resist liquid supply pipe from a resist liquid supply portion (not shown). 62.

In the resist coating process of the resist coating apparatus, the substrate G is changed in the order of the floating height by the floating loading on the floating platform 10 in the order of the loading area M _IN , the coating area M _{CT ,} and the loading area M _IN . mobile. At this time, as shown in FIG. 5, using precision floating during the height _H α M _CT region by coating the substrate G, a resist solution R by the resist nozzle 60 above the strip will be supplied on the substrate G The coating film RM of the resist liquid R is formed uniformly from the front end to the rear end of the substrate G with a constant film thickness.

Next, a specific action of the embodiment will be described, that is, the substrate collision prevention region (the top floating region) is mounted adjacent to the application region M _CT at both end portions in the conveyance direction (X direction) of the land portion SB _B. The role of the composition of M _P and M _Q.

First, as a comparative example corresponding to the prior art, as shown in FIG. 6 , a configuration in which only the application region M _CT is mounted and the substrate collision prevention region (the top floating region) M _P , M _Q are not mounted (as a platform block) will be described. The role of SB _B ') and its problems.

In this case, in the transport direction (X direction), it is assumed that the substrate G is untouched as shown in FIG. 7(a), even if the loading area M _IN is not stopped as it is on the downstream side of the loading platform block SB _A. Maintain the standard value of the coarse floating height H _β and place the platform block SB _A behind. On the other hand, if it is assumed that the coating region M _CT is also extended on the upstream side of the coating platform block SB _B ', as shown in (b) of FIG. 7, the substrate G is maintained at a precise floating height H _{α .} Enter the platform block SB _B ' in the state of the standard value.

Then, when the land block SB _A and the land block SB _B ' are connected, the contour of the floating height of the substrate G in the transport direction (X direction) is formed as shown in (c) of FIG. 7 . That is, in the loading area M _IN of the platform block SB _A , the substrate G can be floated by the high-pressure air from the discharge port 12, and the rough floating height H _β is large in size but extremely small in floating rigidity. On the other hand, the coating area (precise floating area) M _CT in the land block SB _B ' is such that the vertical upward force of the high-pressure air from the discharge port 12 and the negative pressure attraction force from the suction port 14 are vertically downward. The force is relatively resistant, and the balance is controlled to ensure that the small precision floats on the height H _α and the floating stiffness is very large. Therefore, the rough floating height H _β on the loading platform block SB _A is a precision floating height H _α on the coating platform block SB _B ' irrespective of its standard value, in comparison with the two platform blocks SB The position on the upstream side of the boundary (joint) of _A , SB _B ' is pulled down to the same height as the precision floating height H _α . As a result, the floating height H _P near the boundary (joint) of the two platform blocks SB _A , SB _B ' is about the precision floating height H _α , and generally forms H _P =H _α .

Here, it is imagined that there is a step difference or a height difference δH in the boundary (joint) of the two platform blocks SB _A and SB _B '. This step δH is relative to the floating upper surface of the loading platform block SB _A , and when the floating upper surface of the coating platform block SB _B ' becomes high (SB _A <SB _B ') and becomes low (SB _A > SB) Two cases of _B ').

When the step δH of SB _A <SB _B ' occurs, the coarse floating height H _β on the loading platform block SB _A is pulled down to be curved to the precision of the coating platform block SB _B ' as described above. The floating height H _α , as shown in FIG. 8 , does not have any collision or friction with the two platform blocks SB _A , SB _B ', as long as the step δH is not extremely large (for example, not 1000 μm or more). ) It is possible to move through the two blocks SB _A , SB _B ' without any obstacles.

However, when the step δH of SB _A > SB _B ' occurs, the coarse floating height H _β on the loading platform block SB _A is pulled down to be curved to the precision of the coating platform block SB _B ' floating height H _α, when the step difference exceeds δH precision floating height H α ₍₃₀ ~ 60μm), as shown in Figure 9, the substrate carrying corners rub G K _P block SB _a rear end of the platform. As a result, the substrate G may be damaged and may be damaged or broken. In this case, the tip end of the substrate G does not rub the corner portion K _P and passes therethrough. However, as the substrate G advances toward the coating region (precision floating region) M _CT , the front end portion of the substrate G is slightly raised to the height H. _α is gradually lowered by G(1)→G(2)→G(3)→G(4), and in this process, the back surface of the substrate G is slidably attached to the rear corner of the loading platform block SB _A K _P .

In the present embodiment, the substrate collision preventing region (the top floating region) M _{P is} provided at the beginning end portion of the coating platform block SB _B . This area M _P is as shown in Fig. 10. Although there is a coating area (precise floating area) M _CT which is very rigid on the downstream side, it can resist the precision floating height H _α (30~60μm). The third floating height is higher (for example, about 120 μm), that is, the floating height H _P . For this reason, in this region M _P , a layout in which only the discharge port 12 is disposed (FIG. 2) is adopted, and a relatively strong discharge pressure, that is, a discharge pressure higher than that in the coating region M _CT is set, and the ratio is higher than that. The discharge pressure at the discharge pressure on the platform block SB _A is higher.

In this embodiment, when the loading platform block SB _A and the coating platform block SB _B are connected, a step δH of SB _A > SB _B occurs at the boundary (joint) of the two platform blocks SB _A and SB _B . . In this case, the rough floating height H _β on the loading platform block SB _A is pulled down to a precise floating height H _α on the coating area M _CT of the coating platform block SB _B , but as shown in FIG. 11 as shown, due to a previous coating zone M _CT collision preventing the substrate region (floating zone from the top) on top of the floating height H M _{P P} from floating height H greater precision than _α, so long as not exceeding the level difference δH jacking When the height H _{P is} raised, the substrate G does not rub against the rear end corner portion K _{P of the} loading platform block SB _A and passes therethrough.

In addition, when the boundary δH of SB _A <SB _B occurs in the boundary (joint) of the two platform blocks SB _A and SB _B , the contour similar to that of FIG. 8 is basically formed, and the substrate G does not have the two platform regions. In the case where one of the blocks SB _A and SB _B collides or rubs, as long as the step δH is not extremely large (for example, not more than 1000 μm or more), floating on the two platform blocks SB _A , SB _B does not cause any obstacles. .

As described above, according to this embodiment, the substrate collision of the top floating end height H _{P which} is higher (for example, twice) than the precision floating height H _α is provided at the beginning end portion of the coating platform block SB _B . preventing (floating from the top region) of the region constituting the M _P enables the loading platform with the block SB _a difference in the coating step occurs between the δH internet blocks SB _B greater tolerance than a conventional (e.g., about 2 times). Thereby, in the assembly or reassembly of the floating platform 10, the height position adjustment in which the height positions of the floating surfaces are aligned between the loading platform block SB _A and the coating platform block SB _B can be completed in a short time. operation. Moreover, even if an undesired step δH of SB _A >SB _B occurs between the two platform blocks SB _A and SB _B due to a change in time or other maintenance, the δH tolerance is large, so that it can be reduced. The frequency or number of adjustments.

Further, in this embodiment, the problem of the prior art can be eliminated between the coating platform block SB _B and the carry-out platform block SB _C . That is, in the conventional art corresponding to Comparative Example, is coated with a platform between SB _C block SB _B 'and the unloading platform with the blocks to carry-out block floating platform on a small rigid coarse SB _C The floating height H _{β is} not in the form of its standard value and is bent into the form of a fine floating height H _α on the coating platform block SB _B ', which is larger than the two platform blocks SB _B ', SB _C The position on the downstream side of the boundary (joint) is pulled down to the same height as the precision floating height H _α . Thereby, the floating height H _Q near the boundary (joint) of the two blocks SB _B ', SB _C is about the precision floating height H _α , and usually H _Q = H _α is formed.

When the two platform blocks SB _B ', SB _C are connected, when the step δH of SB _B '> SB _C occurs, even if the coarse floating height H _β on the unloading platform block SB _C is pulled down to be curved to the coating cloth internet block SB _B 'floats on the precise height H _α, as shown also in FIG. 12, the substrate G not have internet two blocks SB _B', SB _C case which side collision or friction, As long as the step δH is not extremely large (for example, not more than 1000 μm), it can pass through the two blocks SB _B ', SB _C , and the floating transport does not cause any obstacle.

However, when the step δH of SB _B '< SB _C occurs, the floating height on the unloading platform block SB _C is pulled down to be bent to the precise floating height H _{α of the} coating platform block SB _B ', When the step δH exceeds the precision floating height H _α (30 to 60 μm), as shown in FIG. 13 , the substrate G collides with the corner K _Q at the beginning of the carry-out platform block SB _C . As a result, the substrate G may be damaged or broken. This case, the front end portion of the substrate G may portion after passing through the upper corner toward K _Q coarse floating height _H β to G (1) → G (2 ) → G (3) → G (4) gradually increased floating height However, before the rise, the front end of the substrate G may face the front end corner K _{Q of the} carry-out platform block SB _C.

In the present embodiment, the substrate collision preventing region (the top floating region) M _{Q is} provided at the end portion of the coating platform block SB _B . This region M _Q is as shown in Fig. 14. Although there is a coating area (precise floating area) M _CT which is very rigid on the upstream side, it can resist the precision floating height H _α (30~60 μm). The third floating height is higher (for example, about 120 μm), that is, the floating height H _Q . For this reason, in this region M _Q , a layout in which only the discharge port 12 is disposed (FIG. 2) is adopted, and a relatively strong discharge pressure, that is, a discharge pressure higher than that in the coating region M _CT is set, and the ratio is higher than that. The discharge pressure at the discharge pressure on the platform block SB _C is higher.

In this embodiment, when the coating platform block SB _B and the carry-out platform block SB _C are connected, a step δH of SB _B <SB _C occurs at the boundary (joint) of the two platform blocks SB _B and SB _C . . In this case, the rough floating height H _β on the unloading platform block SB _C is pulled down to a precise floating height H _α on the coating area M _CT of the coating platform block SB _B , but as shown in FIG. 15 As shown in the figure, since the top floating height H _Q on the substrate collision preventing area (uplifting floating area) M _Q adjacent to the downstream side in the coating region M _{CT is} higher than the precision floating height H _α , as long as the step δH It is not the size of the top floating height H _Q , and the substrate G does not collide with the starting end corner K _Q of the carry-out platform block SB _C and passes therethrough.

In addition, when the boundary (δ) of SB _B > SB _C occurs in the boundary (joint) of the two platform blocks SB _B and SB _C , the contour similar to that of FIG. 12 is basically formed, and the substrate G does not have the two platform regions. In the case where one of the blocks SB _B and SB _C collides or rubs, as long as the step δH is not extremely large (for example, not more than 1000 μm or more), floating on the two platform blocks SB _B , SB _C does not cause any obstacles. .

As described above, according to this embodiment, the substrate collision of the top floating height H _{Q which} is higher (for example, twice) than the precision floating height H _α is provided at the end portion of the coating platform block SB _B . In the configuration of the prevention region (the top floating region) M _Q , the allowable amount of the step δH generated between the coating platform block SB _B and the carry-out platform block SB _C can be made larger than in the past (for example, 2 times). Thereby, in the assembly or reassembly of the floating platform 10, the height position adjustment in which the height positions of the floating surfaces are aligned between the coating platform block SB _B and the carry-out platform block SB _C can be completed in a short time. operation. Moreover, even if an undesired step δH of SB _B <SB _C occurs between the two platform blocks SB _B and SB _C due to a change in time or other maintenance, the δH tolerance is large, so that it can be reduced. The frequency or number of adjustments.

[Other Embodiments or Modifications]

The preferred embodiment of the present invention has been described above, but the present invention is not limited to the above embodiment, and various modifications can be made without departing from the spirit and scope of the invention.

For example, the configuration of the floating surface of the substrate collision prevention region (the top floating region) M _P , M _Q , the configuration example shown in FIG. 2 is such that one row of the discharge ports 12 is arranged in each of the regions M _P and M _Q , but The discharge port 12 is arranged in a plurality of columns.

Alternatively, as shown in Fig. 16, the discharge port 12 and the suction port 14 may be mixed in the respective regions M _P and M _Q to control the balance between the discharge pressure and the suction pressure to achieve the desired lift height H _P , H _Q . In this case, the consumption of the high-pressure gas in each of the regions M _P and M _Q increases, but the floating stiffness and the stability of the top floating height H _P , H _Q can be improved. In addition, the hardware of the discharge port 12 and the suction port 14 included in the conventional application region M _CT can be used as it is in the substrate collision prevention region (the top floating region) M _P , M _Q .

Further, in the above embodiment, the floating platform 10 is divided into three platform blocks SB _A , SB _B , SB _C which are physically separated for each of the loading area M _IN , the application area M _CT , and the carry-out area M _OUT . However, the floating platform 10 may also be divided so as to be physically separated two platform blocks SB _A, SB _D, the block in the preceding stage SB _A platform mounting introducing area M _IN, internet integrally posterior segment block SB _D The configuration of the coating area M _CT and the carry-out area M _OUT is mounted. In this case, it is only necessary to provide the substrate collision preventing region (the top floating region) M _P next to the upstream side of the coating region M _CT , and the substrate collision preventing region (the top floating region) M _Q on the downstream side is not required.

Alternatively, the floating platform 10 may be divided into two platform blocks SB _E and SB _C which are physically separated, and the loading area M _IN and the coating area M _{CT are} integrally mounted in the platform section SB _{E of the} preceding stage, in the latter stage. The platform block SB _{C is configured to} carry out the carry-out area M _OUT . In this case, it is only necessary to provide the substrate collision prevention region (the top floating region) M _Q beside the downstream side of the coating region M _CT , and the substrate collision prevention region (the top floating region) M _P on the upstream side is not required.

The values of the first floating height (precision floating height) H _α , the second floating height (rough floating height) H _β , and the third floating height (top lifting height) H _P , H _Q in the above embodiment are examples, and may be an example. Various values are taken in accordance with the specifications of the coating process and the like.

Further, as long as the coating quality is not affected (for example, coating unevenness is not caused), the rear end corner portion K _{P of the} loading platform block SB _A and/or the starting end corner portion K of the carry-out platform block SB _C may be used. _{Q is} chamfered.

For example, the platform blocks SBa, SBe shown in FIG. 17 may be used instead of the platform blocks SBa, SBc. The platform blocks SBd and SBe are cylindrical or disk-shaped transport rollers 100 for transporting the substrate G to be processed. The conveyance roller 100 is set to be longer than the width of the substrate G to be processed in the Y direction. Further, a roller rotating means (not shown) for rotating the conveying roller 100 is provided. The substrate G to be processed is placed on the transport roller 100, and the transport roller 100 is rotated, so that the substrate G to be processed can be transported in the X direction on the land blocks SBd and SBe. Further, the height of the substrate mounting surface (the upper end of the transport roller 100) of the transport roller 100 is set to be away from the platform block. Above the SBb, h (h = float height Hβ) above the height. This is a consideration of the bending of the substrate G to be processed on the transport roller 100. In this case, the platform blocks SBd and SBe do not need to inject high-pressure air to float the substrate G to be processed, so that the use amount of high-pressure air can be reduced more than the use of the platform blocks SBa and SBc.

Further, the transport roller 100 may be set to be shorter in the Y direction than the width of the substrate G to be processed.

The above embodiment relates to a resist coating device for LCD manufacturing, but the present invention is also applicable to any coating device that applies a processing liquid to a substrate to be processed. Therefore, the treatment liquid of the present invention may be, for example, a coating liquid such as an interlayer insulating material, a dielectric material or a wiring material, or a developing liquid or a washing liquid, in addition to the resist liquid. The substrate to be processed of the present invention is not limited to an LCD substrate, and may be another substrate for a flat panel display, a semiconductor wafer, a CD substrate, a glass substrate, a photomask, a printed substrate, or the like.

10‧‧‧Floating platform

12‧‧‧Spray outlet

14‧‧‧Attraction

60‧‧‧Long resist nozzle

64L, 64R‧‧‧Transport Department

SB _A ‧‧‧Loading platform block

SB _B ‧‧‧Application platform block

SB _C ‧‧‧Mobile platform

M _IN ‧‧‧ moving into the area

M _CT ‧‧‧coated area

M _OUT ‧‧‧Out of the area

M _P , M _Q ‧‧‧Substrate conflict prevention area (top up floating area)

Fig. 1 is a side view showing a configuration around a floating platform of a resist application device according to an embodiment of the present invention.

Fig. 2 is a plan view showing the division of each region of the floating platform and the configuration of the floating upper surface.

Fig. 3 is a side view showing a state in which the floating platform and the gantry are disassembled together in a segment assembly unit.

4 is a perspective view showing the overall configuration of the above-described resist application device.

Figure 5 is a view showing formation of a resist on a substrate in the above-mentioned resist coating device The tweezers of the coated film.

Fig. 6 is a top view showing division of each region of the floating platform of the comparative example.

Fig. 7 is a plan view showing a flying height profile in the vicinity of a joint of a loading platform block and a coating platform block of a comparative example.

FIG. 8 is a view showing the floating transport when the coating platform block has a high step with respect to the loading platform block in the comparative example.

FIG. 9 is a view showing a floating transport (problem) when the coating platform block has a low step with respect to the loading platform block in the comparative example.

Fig. 10 is a view showing a flying height profile in the vicinity of a joint of a loading platform block and a coating platform block according to the embodiment;

FIG. 11 is a view showing the floating transport (the problem is solved) when the coating platform block has a low step with respect to the loading platform block in the embodiment.

FIG. 12 is a view showing the floating transport when the coating platform block has a high step with respect to the carry-out platform block in the comparative example.

FIG. 13 is a view showing a floating transport (problem) when the coating platform block has a low step with respect to the carry-out platform block in the comparative example.

Fig. 14 is a view showing a contour of a floating height in the vicinity of a joint of a coating platform block and a carry-out platform block according to the embodiment;

FIG. 15 is a view showing the floating conveyance (destruction of the problem) when the coating platform block has a low step with respect to the loading platform block in the embodiment.

Figure 16 is a view showing each area on the floating platform according to a modification A plan view of the division and floating of the upper part.

Fig. 17 is a side view showing another modification of the configuration around the floating platform.

10‧‧‧Floating platform

12‧‧‧Spray outlet

14‧‧‧Attraction

SB _A ‧‧‧Loading platform block

SB _B ‧‧‧Application platform block

SB _C ‧‧‧Mobile platform

M _IN ‧‧‧ moving into the area

M _CT ‧‧‧coated area

M _OUT ‧‧‧Out of the area

M _P , M _Q ‧‧‧Substrate conflict prevention area (top up floating area)

Claims (12)

A floating type coating device comprising: a floating upper platform, wherein the first and second platform blocks which are physically separated from each other in a connected arrangement are respectively placed with a rough floating upper region and a precision floating upper region, wherein the precise floating upper region is In most of the regions, the substrate is floated in the air at a precise first floating height suitable for the coating process, and in the rough floating region, the substrate is floated at a second height above the first floating height. a substrate transporting unit that detachably holds the substrate and transports the substrate to the floating platform in the order of the rough floating area and the precise floating area; and the processing liquid supply unit has the precision floating a predetermined nozzle in the region is a long nozzle that discharges a processing liquid for coating onto a surface to be processed of the substrate that floats at the first floating height, and is in the first platform region of the second platform block In the vicinity of the end of the block connection, a top floating height that is adjacent to the precision floating upper region and higher than the first floating height is provided to float the top surface of the substrate region. A floating type coating apparatus according to claim 1, wherein a plurality of discharge ports for ejecting gas for applying a vertical upward pressure to the substrate are disposed in the top floating region. The above-mentioned floating-up coating device according to claim 1, wherein in the above-mentioned floating upper floating region, a discharge port for ejecting gas for applying a vertical upward pressure to the substrate is provided, and the substrate is given a vertical A plurality of suction ports of the suction gas of the downward pressure are mixed and arranged. The floating type coating apparatus according to any one of claims 1 to 3, wherein the first and second platform blocks are respectively attached to the first and second gantry that can be independently transported. The floating type coating apparatus according to claim 4, wherein at least one of the first and second gantry includes a height position adjusting unit that adjusts a height position of the floating upper surface of the land block. A floating type coating device characterized by: a floating upper platform, wherein the first and second platform blocks which are physically separated from each other are placed in a precise floating upper area and a coarse floating upper area, respectively, in the above-mentioned precision floating area The substrate is suspended in the air at a precise first floating height suitable for the coating process in a portion of the region, and the substrate is raised in the rough floating region by a coarser second floating height than the first floating height. Floating in the air; the substrate transporting portion detachably holding the substrate, and transporting the substrate to the floating platform in the order of the precise floating region and the rough floating region; and the processing liquid supply portion having the precision a long nozzle that discharges a processing liquid for coating onto a surface to be processed of the substrate floating at the first floating height, at a predetermined position in the floating region, and the first platform block and the second platform In the vicinity of the end portion of the block connection, a top floating position adjacent to the precise floating upper region and having a higher third floating height than the first floating height is provided to lift the substrate Float the area. The floating type coating apparatus according to claim 6, wherein a plurality of discharge ports for ejecting gas for applying a vertical upward pressure to the substrate are disposed in the top floating region. The floating type coating apparatus of claim 6, wherein the top floating region is a discharge port for ejecting gas for applying a vertical upward pressure to the substrate, and for giving a vertical direction to the substrate A plurality of suction ports of the suction gas of the lower pressure are mixed and arranged. The floating type coating apparatus according to any one of claims 6 to 8, wherein the first and second platform blocks are respectively attached to the first and second gantry that can be independently transported. The floating type coating apparatus according to claim 9, wherein at least one of the first and second gantry includes a height position adjusting unit that adjusts a height position of the floating upper surface of the land block. A floating type coating apparatus, comprising: a first platform block having a plurality of conveying rollers for horizontally conveying a substrate; and a floating platform connected to the first platform block, The second platform block, which is physically separable in the first platform block, is mounted with a precise floating upper region, and the precise floating upper region is attached to most of the region so that the substrate floats in the air at a precise first floating height suitable for coating processing. a substrate transfer unit that detachably holds the substrate and transports the substrate, and a processing liquid supply unit that has a predetermined position in the precise floating region and floats at the first floating height The treated surface of the substrate a long nozzle that discharges the processing liquid for coating, and is disposed adjacent to the precision floating region in the vicinity of the end portion of the second land block that is connected to the first land block, and floats above the first The height of the third higher floating height causes the aforementioned substrate to float up the floating area. The floating type coating apparatus according to claim 11, wherein the height of the substrate on which the roller is placed is set to a second height equal to or higher than the third floating height with respect to the upper surface of the floating platform.