TW201250026A - Vapor-deposition device and vapor-deposition method - Google Patents

Vapor-deposition device and vapor-deposition method Download PDF

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Publication number
TW201250026A
TW201250026A TW101108129A TW101108129A TW201250026A TW 201250026 A TW201250026 A TW 201250026A TW 101108129 A TW101108129 A TW 101108129A TW 101108129 A TW101108129 A TW 101108129A TW 201250026 A TW201250026 A TW 201250026A
Authority
TW
Taiwan
Prior art keywords
vapor deposition
substrate
mask
evaporation source
evaporation
Prior art date
Application number
TW101108129A
Other languages
English (en)
Chinese (zh)
Inventor
Hiroji Narumi
Hiroyuki Tamura
Eiichi Matsumoto
Masahiro Ichihara
Hiroaki Nagata
Miyuki Tajima
Masaki Yoshioka
Original Assignee
Canon Tokki Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Tokki Corp filed Critical Canon Tokki Corp
Publication of TW201250026A publication Critical patent/TW201250026A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
TW101108129A 2011-03-18 2012-03-09 Vapor-deposition device and vapor-deposition method TW201250026A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011060963A JP5745895B2 (ja) 2011-03-18 2011-03-18 蒸着装置並びに蒸着方法

Publications (1)

Publication Number Publication Date
TW201250026A true TW201250026A (en) 2012-12-16

Family

ID=46879120

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101108129A TW201250026A (en) 2011-03-18 2012-03-09 Vapor-deposition device and vapor-deposition method

Country Status (3)

Country Link
JP (1) JP5745895B2 (https=)
TW (1) TW201250026A (https=)
WO (1) WO2012127957A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5827965B2 (ja) * 2013-02-05 2015-12-02 シャープ株式会社 表示装置の製造方法
WO2014203632A1 (ja) * 2013-06-21 2014-12-24 シャープ株式会社 有機エレクトロルミネッセンス素子の製造方法及び有機エレクトロルミネッセンス表示装置
JP7188973B2 (ja) * 2018-10-15 2022-12-13 キヤノントッキ株式会社 成膜装置、製造システム、有機ｅｌパネルの製造システム、成膜方法、及び有機ｅｌ素子の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004353084A (ja) * 2003-05-08 2004-12-16 Sanyo Electric Co Ltd 蒸発装置の固定部材
JP5328726B2 (ja) * 2009-08-25 2013-10-30 三星ディスプレイ株式會社 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法
US8894458B2 (en) * 2010-04-28 2014-11-25 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
KR101483354B1 (ko) * 2010-05-18 2015-01-15 샤프 가부시키가이샤 유기 el 소자의 제조 방법 및 제조 장치

Also Published As

Publication number Publication date
WO2012127957A1 (ja) 2012-09-27
JP2012197467A (ja) 2012-10-18
JP5745895B2 (ja) 2015-07-08

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