JP5745895B2 - 蒸着装置並びに蒸着方法 - Google Patents

蒸着装置並びに蒸着方法 Download PDF

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Publication number
JP5745895B2
JP5745895B2 JP2011060963A JP2011060963A JP5745895B2 JP 5745895 B2 JP5745895 B2 JP 5745895B2 JP 2011060963 A JP2011060963 A JP 2011060963A JP 2011060963 A JP2011060963 A JP 2011060963A JP 5745895 B2 JP5745895 B2 JP 5745895B2
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Japan
Prior art keywords
vapor deposition
substrate
diffusion
evaporation source
evaporation
Prior art date
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JP2011060963A
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English (en)
Japanese (ja)
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JP2012197467A5 (https=
JP2012197467A (ja
Inventor
廣治 鳴海
廣治 鳴海
博之 田村
博之 田村
松本　栄一
栄一 松本
正浩 市原
正浩 市原
永田　博彰
博彰 永田
三之 田島
三之 田島
吉岡　正樹
正樹 吉岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Tokki Corp
Original Assignee
Canon Tokki Corp
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Filing date
Publication date
Application filed by Canon Tokki Corp filed Critical Canon Tokki Corp
Priority to JP2011060963A priority Critical patent/JP5745895B2/ja
Priority to PCT/JP2012/053940 priority patent/WO2012127957A1/ja
Priority to TW101108129A priority patent/TW201250026A/zh
Publication of JP2012197467A publication Critical patent/JP2012197467A/ja
Publication of JP2012197467A5 publication Critical patent/JP2012197467A5/ja
Application granted granted Critical
Publication of JP5745895B2 publication Critical patent/JP5745895B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2011060963A 2011-03-18 2011-03-18 蒸着装置並びに蒸着方法 Active JP5745895B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011060963A JP5745895B2 (ja) 2011-03-18 2011-03-18 蒸着装置並びに蒸着方法
PCT/JP2012/053940 WO2012127957A1 (ja) 2011-03-18 2012-02-20 蒸着装置並びに蒸着方法
TW101108129A TW201250026A (en) 2011-03-18 2012-03-09 Vapor-deposition device and vapor-deposition method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011060963A JP5745895B2 (ja) 2011-03-18 2011-03-18 蒸着装置並びに蒸着方法

Publications (3)

Publication Number Publication Date
JP2012197467A JP2012197467A (ja) 2012-10-18
JP2012197467A5 JP2012197467A5 (https=) 2014-05-01
JP5745895B2 true JP5745895B2 (ja) 2015-07-08

Family

ID=46879120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011060963A Active JP5745895B2 (ja) 2011-03-18 2011-03-18 蒸着装置並びに蒸着方法

Country Status (3)

Country Link
JP (1) JP5745895B2 (https=)
TW (1) TW201250026A (https=)
WO (1) WO2012127957A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5827965B2 (ja) * 2013-02-05 2015-12-02 シャープ株式会社 表示装置の製造方法
WO2014203632A1 (ja) * 2013-06-21 2014-12-24 シャープ株式会社 有機エレクトロルミネッセンス素子の製造方法及び有機エレクトロルミネッセンス表示装置
JP7188973B2 (ja) * 2018-10-15 2022-12-13 キヤノントッキ株式会社 成膜装置、製造システム、有機ｅｌパネルの製造システム、成膜方法、及び有機ｅｌ素子の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004353084A (ja) * 2003-05-08 2004-12-16 Sanyo Electric Co Ltd 蒸発装置の固定部材
JP5328726B2 (ja) * 2009-08-25 2013-10-30 三星ディスプレイ株式會社 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法
US8894458B2 (en) * 2010-04-28 2014-11-25 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
KR101483354B1 (ko) * 2010-05-18 2015-01-15 샤프 가부시키가이샤 유기 el 소자의 제조 방법 및 제조 장치

Also Published As

Publication number Publication date
WO2012127957A1 (ja) 2012-09-27
JP2012197467A (ja) 2012-10-18
TW201250026A (en) 2012-12-16

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