TW201217550A - containing 2.0-4.0 mass% of Ti, 0.01-0.15 wt% of one or more of Fe, Co, Ni, Cr, V, Nb, Mo, Mn, Zr, Si, Mg, B and P in total and the remainder containing Cu and unavoidable impurities, and having excellent strength and bendability - Google Patents

containing 2.0-4.0 mass% of Ti, 0.01-0.15 wt% of one or more of Fe, Co, Ni, Cr, V, Nb, Mo, Mn, Zr, Si, Mg, B and P in total and the remainder containing Cu and unavoidable impurities, and having excellent strength and bendability Download PDF

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TW201217550A
TW201217550A TW100136249A TW100136249A TW201217550A TW 201217550 A TW201217550 A TW 201217550A TW 100136249 A TW100136249 A TW 100136249A TW 100136249 A TW100136249 A TW 100136249A TW 201217550 A TW201217550 A TW 201217550A
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copper
crystal plane
temperature
copper alloy
ray diffraction
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TW100136249A
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Chinese (zh)
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Hiroyasu Horie
Naohiko Era
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Jx Nippon Mining & Metals Corp
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • H01B1/026Alloys based on copper
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/02Contact members
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C2202/00Physical properties

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  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Conductive Materials (AREA)
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Abstract

Provided is a titanium copper with excellent strength and bendability. A copper alloy is a copper alloy used for electronic parts, which contains: 2.0-4.0 mass% of Ti, 0.01-0.15 wt% of one or more of Fe, Co, Ni, Cr, V, Nb, Mo, Mn, Zr, Si, Mg, B and P in total and the remainder containing copper and unavoidable impurities. The integral intensity of x-ray diffraction from a rolled surface of the copper alloy satisfies the relationship of (1) and (2): (1) 30 ≤ (I/I0{220})/(I/I0{200})9 ≤ 5; (2) 0.36 ≤ 2x(I/I0{111})+(I/I0{311}) ≤ 0.48.

Description

201217550 六、發明說明: 【發明所屬之技術領域】 本發明係關於-種適合作為連接器等電子零件用構件 之鈦銅及其製造方法。 【先前技術】 近年來,攜帶終端等所代表之電子機器日益小型化, 因此其所使用之連接器明顯越來越窄間距化及低高度化。 越是小型連接器,接腳寬度越窄,越形成為摺疊得較小之 加工2狀,故而對於使用之構件,要求用以獲得必需之彈 性的鬲強度與可承受嚴苛彎曲加工的優異彎曲加工性。於 此方=,含有鈦之銅合金(以下稱作「鈦銅」)由於強度相 對較阿’ a應力緩和特性優於所有的銅合金,故而自以前 一直使用作為特別要求強度之訊號系統端子用構件。 鈦銅係時效硬化型銅合金。若藉由固溶處理而形成耵 (作為溶質原子)之過飽和固溶體,並自該狀態於低溫實 施相對較長時間之熱處理,則會因離相分解而使作為乃濃 度之週期性變動的調變結構於母相中發展,從而提升強 度。此時,會成為問題的是強度與彎曲加工性為相反的特 即若k升強度,則會使彎曲加工性受損,反之若重 視彎曲加工性,則無法獲得所期望之強度。通常,越提高 =壓延之軋縮率,所導入之差排量變得越大而使差排密度 變得越高,因此,可增加有助於析出之成核位置,提高時 政處理後之強度,但若過度提高軋縮率,則會使彎曲加工 !·生w化。因此,本發明之課題在於謀求強度及彎曲加工性[Technical Field] The present invention relates to a titanium copper suitable as a member for an electronic component such as a connector, and a method for producing the same. [Prior Art] In recent years, electronic devices represented by portable terminals and the like have been increasingly miniaturized, and thus the connectors used thereof have become increasingly narrower in pitch and lower in height. The smaller the connector, the narrower the width of the pin, and the more the shape of the process is smaller. Therefore, for the member to be used, it is required to obtain the necessary elastic strength and excellent bending which can withstand severe bending. Processability. In this case, the copper alloy containing titanium (hereinafter referred to as "titanium copper") is superior to all copper alloys because of its relatively high strength, and thus has been used as a signal system terminal for particularly required strength. member. Titanium copper age hardening type copper alloy. When a supersaturated solid solution of ruthenium (as a solute atom) is formed by solution treatment, and heat treatment is performed for a relatively long period of time at a low temperature from this state, the phase separation is caused by the phase separation. The modulation structure develops in the parent phase to increase strength. In this case, it is a problem that if the strength and the bending workability are opposite to each other, the k-strength is deteriorated, and the bending workability is impaired. On the other hand, if the bending workability is emphasized, the desired strength cannot be obtained. In general, the higher the pressing ratio of the calendering is, the larger the difference in the introduced displacement is, and the higher the density of the difference is. Therefore, the nucleation site which contributes to precipitation can be increased, and the strength after the treatment is increased. However, if the rolling reduction rate is excessively increased, the bending process will be performed. Therefore, the object of the present invention is to achieve strength and bending workability.

S 3 201217550 之並存。 因此’提出藉由添加Cr、zr、Ni、Fe等第三元素,以 促進結晶粒之微細化’來進行鈦銅之特性改良(例如日本 特開平6 - 248375號公報、日本特開2〇〇4_ 231985號公報 及曰本特開2009 - 084592號公報)。 [專利文獻1]日本特開平6 — 248375號公報 [專利文獻2]日本特開2004 — 231985號公報 [專利文獻3]日本特開2009 — 084592號公報 【發明内容】 隨著增加添加至鈦銅之該等第三元素的量,會使得Ti 之固溶極限溫度上升,變得容易析出粗大之第2相粒子, 故而先前藉由進行兩次固溶處理來彌補該缺點。即,以提 尚之溫度實施第一次固溶處理,藉此使Ti充分地固溶,再 利用第二次固溶處理獲得微細之再結晶組織。 然而,由於實施兩次固溶處理之方法會相應地增加生 產時間、生產成本、能量消耗,故在工業生產之考量上, 認為若能夠-次完成固溶處理,則較為㈣。因此,本發 明之課題在於提供一種僅實施一次固溶處理便可製造,而 且強度及彎曲加工性之平衡優異的鈦銅。又,本發明之另 一課題在於提供一種製造此種鈦鋼之方法。 本發明人為了解決上述課題而進行潛心研究後得知, 當嚴格抑制第三元素之添加量時,可利用一次固溶處理同 時進行固溶及再結晶’若相較於以相同之第三元素添加量 所獲得之鈦銅的特性,則反而進行—次固溶處理之情形較 201217550 為優異。而且發現,若藉由x射線繞射測定(XRD)對以 此方式獲得之鈦銅的壓延面進行結晶方位調查,則會顯示 具有特徵之波峰。 基於上述見解而完成之本發明於一態樣中為一種銅合 金,其係含有Ti : 2.0〜4.0質量%,並且含有選自Fe、c〇、 Νι、Cr、V、Nb、Mo、Μη、Zr、Si、Mg、B 及 P 中之工種 以上總計〇·〇 1〜〇. 1 5重量%,剩餘部分由銅及不可避免之雜 質所構成的電子零件用銅合金, 若將自壓延面中之{200}結晶面之X射線繞射積分強度 相對於純銅標準粉末之{200}結晶面之X射線繞射積分強度 的比設為1/1〇{200}、自壓延面中之{220}結晶面之X射線 繞射積分強度相對於純銅標準粉末之{220}結晶面之X射線 繞射積分強度的比設為1/1〇{220}、自壓延面中之{311}結 晶面之X射線繞射積分強度相對於純銅標準粉末之{3 u }結 晶面之X射線繞射積分強度的比設為I〇 {3丨丨}、自壓延面 中之{ 111}結晶面之X射線繞射積分強度相對於純銅標準粉 末之{ 111}結晶面之X射線繞射積分強度的比設為I / Μ 111},則滿足以下(1 )及(2 )之關係。 ‘ (1 ) 30$ ( I/I〇{220} ) / ( I/I0{200} ) S 95 (2) 0.36$2χ (Ι/Ι0{111}) + (ι/ι〇{311}) $0.48 於本發明之銅合金之一實施形態中,更滿足以下(3 ) 之關係。 (3) 1.02S (I/I〇{lll}) / (I/l〇{200}) S2.00 本發明於另一態樣中為一種伸銅品,其係由上述銅合Coexistence of S 3 201217550. Therefore, it is proposed to improve the characteristics of titanium copper by adding a third element such as Cr, zr, Ni, or Fe to promote the refinement of crystal grains (for example, Japanese Patent Laid-Open No. Hei 6-248375, No. 2, No. 2) 4_231985 and 曰本特开2009-084592). [Patent Document 1] Japanese Laid-Open Patent Publication No. 2004-231985 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2009-084592 The amount of the third element causes the solid solution limit temperature of Ti to rise, and the coarse second phase particles are easily precipitated. Therefore, the solution is previously compensated by performing two solution treatments. Namely, the first solution treatment is carried out at the elevated temperature, whereby Ti is sufficiently solid-solved, and a second re-dissolution treatment is used to obtain a fine recrystallized structure. However, since the method of performing the two solution treatments increases the production time, the production cost, and the energy consumption correspondingly, it is considered that in the case of industrial production, if it is possible to complete the solution treatment, it is more (4). Accordingly, an object of the present invention is to provide a titanium copper which can be produced by performing only one solution treatment and which is excellent in balance between strength and bending workability. Further, another object of the present invention is to provide a method of producing such a titanium steel. In order to solve the above problems, the present inventors have conducted intensive studies and found that when the amount of the third element is strictly suppressed, solid solution and recrystallization can be simultaneously performed by one solution treatment, if compared with the same third element. The characteristics of the titanium copper obtained by the addition amount are inferior to those of 201217550. Further, it has been found that if the crystal orientation of the rolled surface of the titanium copper obtained in this manner is examined by x-ray diffraction measurement (XRD), a characteristic peak is displayed. The present invention completed based on the above findings is a copper alloy containing Ti: 2.0 to 4.0% by mass and containing Fe, c〇, Ν, Cr, V, Nb, Mo, Μ, In the case of Zr, Si, Mg, B, and P, the total amount of 〇·〇1~〇. 1 5 wt%, the remaining part of copper alloy for electronic parts composed of copper and unavoidable impurities, if self-rolling surface The ratio of the integrated intensity of the X-ray diffraction of the {200} crystal plane to the integrated intensity of the X-ray diffraction of the {200} crystal plane of the pure copper standard powder is set to 1/1 〇 {200}, and {220 in the self-rolling surface } The ratio of the X-ray diffraction integral intensity of the crystal plane to the X-ray diffraction integral intensity of the {220} crystal plane of the pure copper standard powder is set to 1/1 〇{220}, and the {311} crystal plane in the self-rolling surface The ratio of the integrated intensity of the X-ray diffraction integral to the X-ray diffraction integral intensity of the {3 u } crystal plane of the pure copper standard powder is set to I〇{3丨丨}, and the X of the {111} crystal plane in the self-rolling surface The ratio of the integrated intensity of the ray diffraction to the integral intensity of the X-ray diffraction of the {111} crystal plane of the pure copper standard powder is set to I / Μ 111}, then full Sufficient to the relationship between (1) and (2). ' (1 ) 30$ ( I/I〇{220} ) / ( I/I0{200} ) S 95 (2) 0.36$2χ (Ι/Ι0{111}) + (ι/ι〇{311}) $0.48 In one embodiment of the copper alloy of the present invention, the relationship of the following (3) is more satisfied. (3) 1.02S (I/I〇{lll}) / (I/l〇{200}) S2.00 In another aspect, the invention is a copper-extended product which is composed of the above-mentioned copper

S 5 201217550 金所構成。 本發明於再另一態樣中為一種 述銅合金。 零件’其具備有上 本發明於再另一態樣中為 銅合金。 ^逑接益,其具備有上述 本發明於再另一態樣中Λ 。休1r马本發明之鋼 方法,其包括如下步驟: 幻口金之第-製造 對含有Ti·· 2.0〜4_〇質量%, r χτ χ 並且含有選自Fe、Co、 N!、Cr、V、Nb、M〇、Mn、z 以t妯叫· n rn n Sl、、B及P中之1種 乂上〜计0.01〜0.15重量0/〇,剩 所私德Αλα砲7 1刀田剩及不可避免之雜 貝所構成的電子零件用鋼合 scn〇r ^ 备原材科’進行加熱至較730 〜880 C内1固溶極限與添加 溫度的固溶處理, 相门之舰度南出〇〜20Τ:之 繼固溶處理後,進行軋验 仃軋細率5〜40%之最後冷壓延, 繼最後冷壓延後,以M姓、、w A、 材枓度300〜50(TC進行〇·〗〜15 小時之時效處理;且 ’ 固溶處理僅實施一次。 本發明於再另一能接士从k 〜、樣中為本發明之鋼合金之第二製造 方法,其包括如下步驟: 對3有丁1 · 2.0〜4·〇質量%,並且含有選自Fe、、S 5 201217550 Gold. In still another aspect, the invention is a copper alloy. The part 'which is provided with the above invention is a copper alloy in still another aspect. ^逑接益, which has the above described invention in another aspect. The method of steel according to the invention of the present invention comprises the following steps: The first part of the phantom gold-manufactured pair contains Ti·· 2.0~4_〇% by mass, r χτ χ and contains a selected from the group consisting of Fe, Co, N!, Cr, V , Nb, M〇, Mn, z, t 妯 n n n n n,, B, and P, one of the above ~ count 0.01 ~ 0.15 weight 0 / 〇, left private de Α α α gun 7 1 knife field And the inevitable miscellaneous shells used in the electronic parts of the steel scn〇r ^ prepared raw materials 'heated to 730 ~ 880 C within 1 solid solution limit and the addition temperature of the solution treatment, the phase of the ship south 〇 〇 Τ Τ Τ Τ Τ 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 The aging treatment is carried out for a period of 15 hours; and the 'solution treatment is performed only once. The second manufacturing method of the steel alloy of the present invention is the following another method, which includes the following Step: 3 has a D1 · 2.0 to 4 · 〇 mass %, and contains a selected from Fe,

Ni、Cr、V、Nb、M〇、Mn、☆、⑴、蚴、B 及 p 中之 1 種 以上U 0·01〜〇· i 5重量% ’剩餘部分由銅及不可避免之雜 質所構成的電子零件用銅合金原材料進行加熱至較73〇 880 C内Τι固溶極限與添加量相同之溫度高出〇〜2代之 201217550 溫度的固溶處理, 繼固溶處理後,進行將材料溫度設為3 〇〇〇c以上且未達 700°c加熱0.001〜12小時之時效處理, 繼時效處理後,進行軋縮率5〜4〇%之最後冷壓延;且 固溶處理僅實施一次。 本發明之鈦銅由於強度及彎曲加工性優異,且可藉由 實施一次固溶處理而製造,故工業生產價值高。 【實施方式】 < Ti含量> 若Ti未達2.0質量%,則由於無法充分地獲得由鈦銅本 來之調變結構之形成帶來的強化機構,因此無法獲得充分 之強度,反之若超過4·〇質量%,則有變得容易析出粗大之One or more of Ni, Cr, V, Nb, M〇, Mn, ☆, (1), 蚴, B, and p U 0·01 〇 〇 · i 5 wt% 'The remainder is composed of copper and unavoidable impurities The electronic parts are heated with a copper alloy raw material to a temperature higher than the solid solution limit of 73 〇 880 C, which is the same as the addition amount of 〇1 to the second generation of the 201217550 temperature, and after the solution treatment, the material temperature is performed. It is set to an aging treatment of 3 〇〇〇c or more and less than 700 ° C for 0.001 to 12 hours, and after the aging treatment, the final cold rolling is performed at a rolling reduction ratio of 5 to 4%; and the solution treatment is performed only once. The titanium copper of the present invention is excellent in strength and bending workability, and can be produced by performing one-time solution treatment, so that the industrial production value is high. [Embodiment] <Ti content> When Ti is less than 2.0% by mass, since the reinforcing mechanism due to the formation of the original copper-transformed structure cannot be sufficiently obtained, sufficient strength cannot be obtained, and if it exceeds 4·〇% by mass, it becomes easy to precipitate coarse

TiCh,強度及彎曲加工性劣化的傾向。因此,本發明之銅 合金中的Τι含量為2 〇〜4 〇質量%,較佳為2 7〜3 $質量 %。如此藉由使Ti之含量適當化,可同時實現適於電子零 件用之強度及彎曲加工性。 <第3元素:> 若將規疋之第3元素添加於鈦銅,則具有即使於丁丨充 分固溶之高溫進行固溶處理’結晶粒亦容易微細化而提高 強度的效果°且’規定之第3元素會促進調變結構之形成。 並且’亦具有抑制Ti - Cu系、之穩定相急劇粗大化的效果。 因此’可獲得鈦鋼本來之時效硬化能力。 於鈦錮Φ,、, 上述效果最高者為Fe。而且,於Mn、Mg、 Co、Νι、Si、、v、Nb、M〇、Zr>、B 及 p 中亦可期待以TiCh has a tendency to deteriorate in strength and bending workability. Therefore, the content of the ruthenium in the copper alloy of the present invention is 2 〇 4 to 4 % by mass, preferably 2 7 to 3 % by mass. Thus, by optimizing the content of Ti, it is possible to simultaneously achieve strength and bending workability for electronic parts. <Third element:> When the third element of the standard is added to titanium copper, it has an effect of improving the strength by crystallizing the crystal grains even when the solution is sufficiently solid-dissolved at a high temperature. The third element of the regulation promotes the formation of a modulation structure. Further, it has an effect of suppressing the sharpening of the stable phase of the Ti-Cu system. Therefore, the original age hardening ability of titanium steel can be obtained. In the case of titanium 锢Φ,, the highest effect is Fe. Furthermore, it is expected that Mn, Mg, Co, Νι, Si, v, Nb, M〇, Zr>, B and p

S 7 201217550S 7 201217550

Fe為標準之效果,藉由單 棺田早獨之添加亦可表現出效果,但亦 可複合添加2種以上。 該等元素若合計含有0·01質量%以上,則會表現出其 效果,但若合計超過〇·15質量%,則有難以藉由一次固溶 處理同時兼顧充分之固溶與適當之再結晶粒之出現,強度 與彎曲加工性之平衡劣化的傾向。因此,可含有合計0.01 〜0.15質1之選自作為第3元素群之由Mn、Fe、c〇、Fe is a standard effect, and it can also be effective by adding a single addition to the field, but it is also possible to add two or more types in combination. When the total amount of these elements is 0.1% by mass or more, the effect is exhibited. However, when the total amount exceeds 〇·15% by mass, it is difficult to achieve sufficient solid solution and appropriate recrystallization by one-time solution treatment. In the presence of particles, the balance between strength and bending workability tends to deteriorate. Therefore, it is possible to contain a total of 0.01 to 0.15 mass 1 selected from the group consisting of Mn, Fe, c〇, and the third element group.

Ni、Cr、V、Nb、Mo、Zr、Si、B及p所組成之群中的工 種或2種以上,較佳為含有合計〇 〇1〜〇 〇8質量%。 射線繞射之積分強度> 本發明之鈦銅,若將自壓延面中之{2〇〇}結晶面之χ射 線繞射積分強度相對於純銅標準粉末之{200 }結晶面之X射 線繞射積分強度的比設為J/LPOO}、自壓延面中之{22〇} 結晶面之X射線繞射積分強度相對於純銅標準粉末之{22〇} 結晶面之X射線繞射積分強度的比設為1/ 1〇{22〇}、自壓 延面中之{3 11}結晶面之X射線繞射積分強度相對於純銅標 準粉末之{3 11 }結晶面之X射線繞射積分強度的比設為1/ 1〇 {311}、自壓延面中之{in}結晶面之χ射線繞射積分強度 相對於純銅標準粉末之{ 111}結晶面之χ射線繞射積分強度 的比設為1/ I〇{ 111},則滿足以下(1 )及(2 )之關係。 (1) 30‘(I/I0{220}) / (1/10{200}) $95 (2) 0.36^2x (I/I〇{lll}) + (I/I〇{311}) ^0.48 {200}結晶面係主要藉由固溶處理而發展之結晶方位, 於剛固溶處理後(1/1〇{220}) / (1/1〇{200})變成未達 201217550 之程度的極小值。針對此情形,若於固溶處理後實施冷 壓乙貝丨{220}結晶面會依冷壓延之軋縮率而逐漸地發展,(工 /I〇{220} ) / ( ι/Ι〇{2〇〇})變大。因此,(j/^220} ) / (1/1〇{200})於一態樣中可說是評價冷壓延之程度的指 才示。右(I/I〇{220}) / d/^poo})過小,則無法獲得 充分之強度,另一方面,若(I/I〇{22〇}) / (1/1〇{2〇〇}) 過高,則隨後彎曲加工性將會劣化。若考慮強度與彎曲加 工性之平衡,則較佳設為3〇$ ( J/K220) ) / (丨/hpoq ) $ 95 ’ 更佳設為 40$ ( 1/1。{220} ) / ( 1/ 10{200} ) $ 70。 又’對於添加有第三元素之鈦銅,先前為了獲得所期 望之強度與彎曲加工性而實施兩次固溶處理,因此在第二 次固溶處理後{ 2 〇 〇 }結晶面會過度發展❶其後,若實施冷壓 延’則由於會發生{111}結晶面—{3丨丨}結晶面之結晶方位旋 轉,因此{111}結晶面及{3 11}結晶面會依冷壓延之軋縮率而 依序發展,最後向{220}結晶面的配向變大,但先前由於向 固溶處理後之{200}結晶面的配向較大,因此於冷壓延後亦 相對較多地殘存向處於該過渡階段之{111}結晶面及{3 i i} 結晶面的配向,而變成2x ( Ι/Ι〇{111} ) + ( I/I〇{311}) > 0.48 » 另一方面,由於本發明之欽銅僅實施一次固溶處理, 故而固溶處理後之{200}結晶面的發展程度較小。因此,於 冷壓延後向{220}結晶面之配向占主導地位,向{111}結晶面 及{311}結晶面之配向的殘存較少。典型的是本發明之鈦銅 滿足 2χ ( 1/1〇{111} ) + ( 1/1。{311} ) S 0.48,較佳為滿The work type or two or more kinds of the group consisting of Ni, Cr, V, Nb, Mo, Zr, Si, B, and p preferably contain a total of 〇1〇〇8% by mass. Integral intensity of ray diffraction> The titanium copper of the present invention is obtained by diffraction of the integrated intensity of the χ ray diffraction of the {2〇〇} crystal plane from the calendered surface with respect to the {200 } crystal plane of the pure copper standard powder. The ratio of the integrated intensity of the shot is set to J/LPOO}, the integral intensity of the X-ray diffraction of the {22〇} crystal plane from the calendered surface is relative to the integral intensity of the X-ray diffraction of the {22〇} crystal plane of the pure copper standard powder. The X-ray diffraction integral intensity of the {3 11} crystal plane in the self-calendering surface is set to 1/1 〇{22〇}, and the X-ray diffraction integral intensity of the {3 11 } crystal plane of the pure copper standard powder is The ratio of the integrated intensity of the χ ray diffraction of the {in} crystal plane in the self-rolling surface to the 积分 ray diffraction integral intensity of the {111} crystal plane of the pure copper standard powder is set as 1 / 1 〇 {311} 1/ I〇{ 111}, the relationship between (1) and (2) below is satisfied. (1) 30'(I/I0{220}) / (1/10{200}) $95 (2) 0.36^2x (I/I〇{lll}) + (I/I〇{311}) ^0.48 The crystal orientation of the {200} crystallized surface which is mainly developed by solution treatment, which becomes less than 201217550 after the solution treatment (1/1〇{220}) / (1/1〇{200}) Minimum value. In this case, if the cold-pressed Ebene {220} crystallized surface is solidified after the solution treatment, it will gradually develop according to the cold rolling ratio (工/I〇{220} ) / ( ι/Ι〇{ 2〇〇}) becomes bigger. Therefore, (j/^220}) / (1/1〇{200}) can be said to be an indication of the degree of cold rolling in one aspect. Right (I/I〇{220}) / d/^poo}) is too small to obtain sufficient strength. On the other hand, if (I/I〇{22〇}) / (1/1〇{2〇 〇}) If it is too high, then the bending workability will deteriorate. If the balance between strength and bending workability is considered, it is preferably set to 3〇$ (J/K220)) / (丨/hpoq) $ 95 ' More preferably set to 40$ ( 1/1.{220} ) / ( 1/ 10{200} ) $ 70. Further, for the titanium copper to which the third element is added, the solution treatment is performed twice in order to obtain the desired strength and bending workability, so that the { 2 〇〇} crystal surface is excessively developed after the second solution treatment. Then, if cold rolling is performed, the crystal orientation of the {111} crystal plane-{3丨丨} crystal plane will occur, so the {111} crystal plane and the {3 11} crystal plane will be rolled by cold rolling. The shrinkage rate develops sequentially, and finally the orientation to the {220} crystal plane becomes larger. However, since the orientation of the {200} crystal plane after the solution treatment is large, it remains relatively much after cold rolling. On the other hand, the orientation of the {111} crystal plane and the {3 ii} crystal plane in the transition phase becomes 2x ( Ι / Ι〇 {111} ) + ( I / I 〇 {311} ) > 0.48 » Since the copper of the present invention is subjected to only one solution treatment, the degree of development of the {200} crystal plane after the solution treatment is small. Therefore, the orientation to the {220} crystal plane after cold rolling is dominant, and the distribution to the {111} crystal plane and the {311} crystal plane is less. Typically, the titanium copper of the present invention satisfies 2χ (1/1〇{111}) + (1/1.{311}) S 0.48, preferably full

S 9 201217550 足 2χ ( I/I0{111} ) + ( I/I0{311} ) $ 0·45。然而,若固 溶處理不充分,則2χ ( Ι/Ι〇{111}) + ( Ι/Ι〇{311})變得 過小,而無法獲得良好之彎曲加工性。因此,較佳為滿足 〇·36$2χ (1/1〇{111}) + (1/10{311}),更佳為滿足 〇.38 S2x (I/I0{lll}) + d/iopil})。對 Ι/Ι0{ΐιΐ}乘以 2 進行加權之原因在於:剛固溶處理後之{200}結晶面的發展 越大’殘存之{111}結晶面越亦容易較大地殘存,因果關係 越大。 又’本發明之銅合金於較佳之實施形態中,進一步滿 足以下(3 )之關係。 (3) 1.02$ (I/I0{111}) / (1/10{20〇}) $2.00 (ϊ/Ι〇{111}) / (1/1〇{200})可表示由固溶處理後 之冷壓延所引起之自{2 〇 〇}結晶面向{111}結晶面旋轉的容 易程度。雖然理由並不明確’但藉由將(1〇{丨丨丨丨)/ ( j /1〇{200})設為該範圍,可進一步提高強度與彎曲加工性 之平衡。更佳為 1.10S / (1/1(){200}:) $S 9 201217550 足 2χ ( I/I0{111} ) + ( I/I0{311} ) $ 0·45. However, if the solution treatment is insufficient, 2χ(Ι/Ι〇{111}) + (Ι/Ι〇{311}) becomes too small to obtain good bending workability. Therefore, it is preferable to satisfy 〇·36$2χ (1/1〇{111}) + (1/10{311}), and it is better to satisfy 〇.38 S2x (I/I0{lll}) + d/iopil }). The reason why the weight of Ι/Ι0{ΐιΐ} is multiplied by 2 is that the larger the development of the {200} crystal plane after the solution treatment is, the more the remaining {111} crystal plane is more likely to remain, and the larger the causal relationship . Further, in the preferred embodiment, the copper alloy of the present invention further satisfies the relationship of (3). (3) 1.02$ (I/I0{111}) / (1/10{20〇}) $2.00 (ϊ/Ι〇{111}) / (1/1〇{200}) can be expressed after solution treatment The degree of easiness of rotation from the {2 〇〇} crystal to the {111} crystal plane caused by cold rolling. Although the reason is not clear 'But by setting (1〇{丨丨丨丨)/( j /1〇{200}) to this range, the balance between strength and bending workability can be further improved. More preferably 1.10S / (1/1(){200}:) $

Uo。為了使(I/I0{ni}) / (1/1〇{2〇〇})為上述範圍, 有效的是如後述般於固溶處理後'實施冷壓延前實施規定 之熱處理。 <用途> 本發明之銅合金可以各種伸銅品例如板、條、管、棒 及線之形式提供。本發明之鈦銅並無限定,可較佳地使用 作為開關、連接器、插孔、端子、繼電器等電子零件之材 料。 201217550 <製法> 本發明之鈦銅可藉由僅膏 1重貫知一次固溶處理’於其後之Uo. In order to make (I/I0{ni}) / (1/1〇{2〇〇}) into the above range, it is effective to perform the predetermined heat treatment before the cold rolling after the solution treatment as described later. <Use> The copper alloy of the present invention can be provided in the form of various copper-extension products such as plates, strips, tubes, rods and wires. The titanium copper of the present invention is not limited, and it can be preferably used as a material for electronic parts such as switches, connectors, jacks, terminals, relays, and the like. 201217550 <Preparation method> The titanium copper of the present invention can be treated by a paste-only one-time solution.

步驟中實施適當之熱處理及A 夂令壓延來進行製造。以下,按 照每一步驟依序說明較佳之製造例。 ο鑄錠製造 利用炫解及禱造來製造德於甘〇_ 水Ik鑄錠,基本上係於真空中或惰 性氣體環境中進行。若於熔 浴解時有添加凡素之熔解殘餘, 則不能對強度之提高發捏古 < 此m 輝有效作用。因此,為消除熔解殘 餘’必須於添加Fe戎rr梦古β 飞C專同熔點之第3元素後充分地攪 拌’之後保持固定時間。另一古品 丄 J另 方面,由於Ti較容易熔解於In the step, appropriate heat treatment and A 夂 calendering are carried out for the production. Hereinafter, preferred manufacturing examples will be described in order of each step. οIngot manufacturing Manufacture and use of dazzling and praying to make Degan Ganzi _ water Ik ingots, basically in a vacuum or inert gas environment. If there is a melting residue added in the molten bath solution, the strength can not be increased. Therefore, in order to eliminate the melting residue, it is necessary to maintain a fixed time after the addition of Fe戎rr Menggu β fly C and the third element of the melting point after the third element is sufficiently stirred. Another ancient product, 另J, because Ti is easier to melt

Cu中’因此於第3元辛位 京熔解後添加即可。因此,較理想為 將選自由 Fe、Co、Ni、〇、'/ xTuIn the case of Cu, it is added after the melting of the third element. Therefore, it is preferable to be selected from Fe, Co, Ni, 〇, '/ xTu

Lr、V、Nb、Mo、Μη、Zr、Si、Mg、 B及P所組成之群中之i括—、 1種或2種以上以合計含有〇 〇1〜 0.15質置%之方式添加於cu,技装丨v人士。λ J力a Lu ’接者以含有2 〇〜4 〇質量% 之方式添加Ti來製造鑄錠。 2)均質化退火及熱壓延 由於製造禱鍵時產生之凝固偏析或結晶物較為粗大, 因此較理想為利用均質化退火儘可能地使之固溶於母相而 減小’並儘可能地加以消除。其原因在於,此可有效防止 彎曲破裂。 具體而言,較佳為於鑄錠製造步驟後加熱至9〇〇〜97〇 °C進行3〜24小時之均質化退火後,實施熱壓延。為了防 止液體金屬脆性,較佳為將熱軋前及熱軋時設為9 6 t以 下,且將自原始厚度至整體軋縮率達到9〇%為止之道次 201217550 (pass )設為900°C以上。而且,為了使每道次產生適度之 再結晶而有效地降低Ti之偏析,故只要使每道次之壓下量 為10〜20 mm而實施即可。 3 )中間壓延 於固溶處理刖實施中間壓延。越提高中間壓延之軋縮 率,越能將固溶處理中之再結晶粒控制為均一且微細。然 而’若過度提尚加工度而進行最後之固溶處理,則有時會 使再結晶織構發展’產生塑性異向性,而損害加壓成形性。 因此’中間壓延之軋縮率較佳為70〜99%。軋縮率係由{((壓 延前之厚度一壓延後之厚度)/壓延前之厚度)叫〇〇%}所 定義。 4 )固溶處理 中間壓延之後進行一次固溶處理。較理想為於固溶處 理中使析出物完全地固溶,但若加熱至析出物完全消失為 止之尚溫,則結晶粒容易粗大化,因此將加熱溫度設為第 二相粒子組成之固溶極限附近的溫度(於Ti之添加量為2.0 〜4.0質量%的範圍内,Ti之固溶極限與添加量相等的溫度 為730〜84(TC左右,例如若Ti之添加量為3 2質量%,則 為800〇C左右)。而且若快速加熱至該溫度,亦加快冷卻速 度,則可抑制粗大之第二相粒子的產生。因此,典型上係 加熱至730〜880°C之Ti固溶極限與添加量相同的溫度以 上,更典型為加熱至較730〜88〇t之Ti固溶極限與添加量 相同的溫度高出0〜2(TC的溫度,較佳為加熱至高出〇〜1〇 °C之溫度。於本發明中,雖然僅實施一次固溶處理,但由 12 201217550In the group consisting of Lr, V, Nb, Mo, Μη, Zr, Si, Mg, B, and P, one or two or more of them are added in a total amount of 〇〇1 to 0.15% by mass. Cu, technicians and v. The λ J force a Lu ' is added by adding Ti in an amount of 2 〇 to 4 〇 by mass to produce an ingot. 2) Homogenization annealing and hot calendering are relatively coarse as the solidification segregation or crystals produced during the manufacture of the prayer bond, so it is desirable to use the homogenization annealing to make it as solid as possible in the matrix phase to reduce 'and as much as possible Eliminate it. The reason is that this can effectively prevent bending cracking. Specifically, it is preferred to carry out heat rolling after heating to 9 〇〇 to 97 ° C for 3 to 24 hours after the ingot production step. In order to prevent the brittleness of the liquid metal, it is preferable to set the pass before the hot rolling and the hot rolling to 9 6 t or less, and the pass from the original thickness to the overall rolling reduction rate of 9〇% is set to 900° 201217550 (pass). Above C. Further, in order to effectively reduce the segregation of Ti by causing moderate recrystallization per pass, it is sufficient to carry out the reduction of each pass to 10 to 20 mm. 3) Intermediate calendering The intermediate calendering is carried out in solution treatment. The more the rolling reduction ratio of the intermediate rolling is increased, the more the recrystallized grains in the solution treatment can be controlled to be uniform and fine. However, if the final solution treatment is carried out by excessively increasing the degree of processing, the recrystallization texture may develop to cause plastic anisotropy and impair press formability. Therefore, the rolling reduction of the intermediate calendering is preferably from 70 to 99%. The rolling reduction ratio is defined by {((thickness before calendering, thickness after calendering) / thickness before calendering). 4) Solution treatment After the intermediate rolling, a solution treatment is carried out once. It is preferable that the precipitate is completely dissolved in the solution treatment. However, if the temperature is too high until the precipitate completely disappears, the crystal grains are easily coarsened. Therefore, the heating temperature is set to be a solid solution of the second phase particles. Temperature in the vicinity of the limit (in the range where the amount of addition of Ti is in the range of 2.0 to 4.0% by mass, the temperature at which the solid solution limit of Ti is equal to the amount of addition is 730 to 84 (about TC, for example, if the amount of addition of Ti is 32% by mass) , if it is heated to this temperature quickly, and also accelerates the cooling rate, the generation of coarse second phase particles can be suppressed. Therefore, Ti is usually solidified by heating to 730 to 880 ° C. The temperature is equal to or higher than the added amount, and is more typically heated to a temperature of 730 to 88 〇t. The solid solution limit is the same as the temperature at which the addition amount is 0 to 2 (the temperature of TC is preferably high to 〇~1). 〇 ° C temperature. In the present invention, although only one solution treatment is carried out, but by 12 201217550

微細之再結晶粒。 溶,亦獲得 結晶粒粗大Fine recrystallized grains. Soluble, also obtained coarse crystal grains

又,固溶處理中之加熱時間較短時可抑制 化。加熱時間例如可設為30〜90秒,典型上可 固/谷處理後之步驟(冷壓延—時效處理之模式) 繼固溶處理後,可依序進行最後之冷壓延及時效處 理。藉由最後之冷加工可提高鈦銅之強度。該冷壓延之軋 縮率會對上述結晶方位之積分強度造成影響。為了滿足本 發明中規定之各種結晶方位之積分強度,將軋縮率設為5 〜40 /❶’較佳為設為丨〇〜3 〇%,更佳為設為1 5〜25%。 於上述冷壓延後進行時效處理。時效處理只要於慣例 之條件下進行即可,例如較佳為以材料溫度3〇〇〜5〇〇加 熱0.1〜15小時,更佳為以材料溫度350〜45(TC加熱0:5〜 8小時。 5,)固溶處理後之步驟(時效處理—冷壓延之模式) 較佳為繼固溶處理後,依序進行時效處理及最後之冷 壓延。以往雖然習慣在最後之固溶處理後先進行冷壓延, 但藉由在最後之固溶處理後不進行冷壓延而立即進行時效 處理’然後再進行冷壓延,可變得容易設為1.02 S ( 1/ Mill} ) / ( I/I〇{2〇〇} ) $ 2.00之範圍,強度及彎曲加工Further, when the heating time in the solution treatment is short, it can be suppressed. The heating time can be, for example, 30 to 90 seconds, and the step after the solid/valley treatment is usually performed (cold rolling-aging treatment mode). After the solution treatment, the final cold rolling and aging treatment can be sequentially performed. The strength of titanium copper can be increased by the final cold working. The cold rolling reduction ratio affects the integrated strength of the above crystal orientation. In order to satisfy the integral strength of various crystal orientations specified in the present invention, the rolling reduction ratio is preferably 5 to 40 / ❶', preferably 丨〇 〜 3 〇 %, and more preferably 15 to 25%. The aging treatment is carried out after the above cold rolling. The aging treatment may be carried out under customary conditions, for example, preferably at a material temperature of 3 Torr to 5 Torr for 0.1 to 15 hours, more preferably at a material temperature of 350 to 45 (TC heating for 0: 5 to 8 hours). 5)) The step after solution treatment (aging treatment - cold rolling mode) is preferably followed by aging treatment and finally cold rolling after solution treatment. In the past, although it is customary to perform cold rolling after the final solution treatment, it can be easily set to 1.02 S by immediately performing aging treatment without cold rolling after the final solution treatment, and then performing cold rolling. 1/ Mill} ) / ( I/I〇{2〇〇} ) $ 2.00 range, strength and bending

S 13 201217550 性之平衡提升。 若對固/合處理後之鈦銅進行熱處理,則導電率會隨著 周變、=構之發展而上升,因此退火之程度,可將退火前後 ,導電率的變化視為指#。根據本發明人之研究,熱處理 較理想為以使導電率上彳〇 5〜8%iacs (較佳為工〜 4%IACS)之條件進行。上述導電率之上升所對應之具體的 …處里條件為將材料溫度設為3〇〇(>c以上且未達它加熱 0.001〜12小時之條件。 熱處理較佳為以下述任一條件進行。 將材料溫度設為300。(:以上且未達400。(:加熱0.5〜3 小時 將材料溫度設為4〇〇。(:以上且未達500。〇加熱〇 〇1〜 0.5小時 將材料溫度設為500°C以上且未達600它加熱〇 〇〇ι〜 0.01小時 將材料溫度設為600°C以上且未達700T:加熱0.001〜 0.005小時 又’熱處理更佳為以下述任一條件進行。 •將材料溫度設為350〇C以上且未達400。(:加熱1〜3小 時 .將材料溫度設為400。(:以上且未達500°C加熱0.2〜 0.5小時 •將材料溫度設為500°C以上且未達550°C加熱0.005〜 0·01小時 14 201217550 .將材料溫度設為55(TC以上且未達6〇(rc加熱〇〇〇1〜 0.005小時 .將材料溫度設為600。(:以上且未達65(rc加熱〇 〇〇25 〜〇·〇〇5小時 上述時效處理後進行最後之冷壓延。藉由最後之冷加 工可提高鈦銅之強度。該冷壓延之軋縮率會對上述結晶方 位之積分強度造成影響。為了滿足本發明中規定之各種& 晶方位之積分強度,係、將軋縮率設為5〜術。,較佳設為1〇 〜3〇°/° ’更佳設為15〜25〇/〇。 力、/tr㈣5,)中之最後之冷壓延後,視需要進行他 力退火或時效處理。時效處理之條件為慣用之條件即可, :較先前輕微地進行時效處理,騎進—步提升強度 加工性之平衡。具體而言’時效處理較佳為於以材料溫 又300〜40(rc加熱3〜12小時之條件下進行。 時效處理更佳為以下述任一條件進行。 時·將材料溫度設為贿以上且未達續加熱Μ小 時 時 時 .將材料溫度設為3航以上且未達3啊加熱Μ小 .將材料溫度設為38代以上且未達_。(:加#3〜6小 時效處理再更佳為以下述任—條件進行。 ’將材料溫度設為赠以上且未達靴加熱6S 13 201217550 Balance of sexuality. If the titanium copper after the solid/combination treatment is heat-treated, the electrical conductivity will increase with the development of the cycle and the structure of the structure. Therefore, the degree of annealing can be regarded as the value of # before and after annealing. According to the study by the present inventors, the heat treatment is preferably carried out under the conditions of a conductivity of 5 to 8% iACs (preferably 4% IACS). The specific conditions in the above-mentioned increase in the electrical conductivity are such that the material temperature is set to 3 〇〇 (>c or less and it is not heated for 0.001 to 12 hours. The heat treatment is preferably carried out under any of the following conditions. Set the material temperature to 300. (: Above and less than 400. (: Heating for 0.5 to 3 hours, set the material temperature to 4 〇〇. (: Above and not up to 500. 〇 Heat 〇〇 1~ 0.5 hours to material The temperature is set to 500 ° C or more and less than 600. It is heated to 〇〇〇 1 to 0.01 hours to set the material temperature to 600 ° C or more and less than 700 T: heating 0.001 to 0.005 hours and 'heat treatment is better than any of the following conditions • The material temperature is set to 350 ° C or more and less than 400. (: Heating for 1 to 3 hours. Set the material temperature to 400. (: Above and less than 500 ° C heating for 0.2 to 0.5 hours • Material temperature Set to 500 ° C or more and less than 550 ° C heating 0.005 ~ 0 · 01 hours 14 201217550 . Set the material temperature to 55 (TC above and less than 6 〇 (rc heating 〇〇〇 1 ~ 0.005 hours. Material temperature Set to 600. (: above and not up to 65 (rc heating 〇〇〇 25 ~ 〇 · 〇〇 5 hours above) After the treatment, the final cold rolling is carried out. The strength of the titanium copper can be increased by the final cold working. The cold rolling shrinkage rate affects the integrated strength of the above crystal orientation. In order to satisfy the various & crystals specified in the present invention The integral intensity of the orientation is set to 5 to Φ. It is preferably set to 1 〇 to 3 〇 ° / ° 'more preferably set to 15 to 25 〇 / 〇. Force, /tr (4) 5,) After the final cold rolling, the force annealing or aging treatment may be carried out as needed. The conditions of the aging treatment may be the conventional conditions: the aging treatment is slightly performed earlier, and the balance of the strength processing is improved by riding. The aging treatment is preferably carried out at a material temperature of 300 to 40 (arc heating for 3 to 12 hours. The aging treatment is preferably carried out under any of the following conditions. When the material temperature is set to be more than one bribe and not reached Continue heating Μ hours. Set the material temperature to 3 voyages or more and less than 3 ah. Heat the Μ small. Set the material temperature to 38 generations or more and not reach _. (: Add #3~6 hourly treatment is better In order to carry out the following conditions - 'to set the temperature of the material Gifts or more and less than 6 is heated shoe

15 S 201217550 將材料溫度設為360。(:以上且未達3 80°C加熱5〜6小 時 , .將材料溫度設為380〇c以上且未達4〇〇t:加熱4〜6小 時 再者,該行業者應可理解於上述各步驟之間可適當地 進行用以去除表面之氧化銹皮之研削 '研磨、珠粒喷擊酸 洗等步驟。 [實施例] 乂下’併顯示本發明之實施例與比較例,提供該等 實知例係為了更好理解本發明及其優點,而非意欲限定本 發明。 於製造本發明例之銅合金時,由於添加作為活性金屬 之Τι作為第2成分,因此於熔製時使用真空熔解爐。又, 為了防止因本發明所規定之元素以外的雜f元素混入而引 起預料外的副作用於未然,使用之原料係嚴格選取純度相 對較向者。 首先,以表1中所示之組成,分別將Mn、Fe、Mg、 再分別添加該表中所示組成《Ti。為了不使添加元素之炫 解殘餘存纟而亦充分考慮添加後之保持時間後,於沿環境 下將該等注入至鑄模中,分別製造約2kg之鑄錠。 以950。。對上述鑄錠加熱3小時之均質化退火後,於 9〇〇〜95(TC進行熱壓延’而獲得板厚1〇 _之熱軋板。藉 由端面切削去除錄皮後,進行冷壓延而形成條料之板厚 16 201217550 mm),根據試驗片推外, 處理之條件設為以第】二大:溶處理。第1次固溶 並無進行第1固溶處理:“、广1分鐘。再者’於發明例中 後板厚成為0 25 於中間之冷屢延令,以最 ,备 、mm之方式調整中間之板厚而進行冷壓延 、可决速加熱之退火爐進行最後之固溶處理,然後, 力乂尺冷_於此時之加熱條件,材料溫度以卩之固溶極 限與添加量相同之溫度(於T"農度為32質量%時約刚 C ’於T!濃度為2.0質量%時約73(rc,於Ti濃度為u 質量%時約84(TC ’於Ti濃度為2·9質量%時約79〇。〇為 基準並以》1所記載之加熱條件分別保持i分鐘。繼而, 於Ar環境中以表丨所記載之條件進行第一時效處理。於藉 由酸洗去除銹皮後,以表丨所記載之條件進行最後冷壓延\ 最後以表1所記載之各加熱條件進行時效處理而製得發明 例及比較例之試驗片。根據試驗片有時省略剛固溶處理後 之時效處理。 17 1 201217550 【ϊ<〕15 S 201217550 Set the material temperature to 360. (: Above and less than 3 80 °C heating for 5~6 hours, the material temperature is set above 380〇c and less than 4〇〇t: heating for 4~6 hours, the industry should understand the above The steps of grinding, grinding, beading, pickling, etc., for removing the rust scale on the surface may be appropriately performed between the steps. [Examples] Underarms and showing examples and comparative examples of the present invention, In order to better understand the present invention and its advantages, it is not intended to limit the present invention. In the production of the copper alloy of the present invention, since the addition of the active metal as the second component is used, it is used in the melting. In addition, in order to prevent the occurrence of unexpected side effects due to the incorporation of the impurity element other than the elements specified in the present invention, the raw materials used are strictly selected to be relatively pure. First, as shown in Table 1. The composition, respectively, Mn, Fe, Mg, respectively, added to the composition shown in the table "Ti. In order not to make the remaining elements of the dazzling residue, but also fully consider the retention time after the addition, along the environment will The injection into the mold In the middle, about 2kg of ingot was separately produced. After the homogenization annealing of the ingot for 3 hours, the hot rolling was performed at 9 〇〇 to 95 (TC was hot-rolled to obtain a sheet thickness of 1 〇). The plate is removed by the end face cutting, and then cold rolled to form a strip thickness of 16 201217550 mm). According to the test piece, the processing conditions are set to be the second largest: solution treatment. The first solid The first solid solution treatment is not carried out: ", 1 minute wide. In addition, in the invention example, the thickness of the back plate becomes 0 25 in the middle of the cold, and the thickness of the middle is adjusted in the form of the most, and the mm. The cold rolling and the annealing furnace which can be heated at a constant speed are subjected to the final solution treatment, and then, the heating condition of the workpiece is the same as the temperature at which the material temperature is the same as the addition amount (at T&quot When the agricultural degree is 32% by mass, about 73 (rc, when the concentration of T is 2.0% by mass) is about 73 (rc, when the Ti concentration is u mass%, about 84 (TC' at about Ti concentration of 2.9 mass%) 79〇. The reference is based on the heating conditions described in "1" for i minutes. Then, in the Ar environment, it is recorded by the watch. The conditions are subjected to the first aging treatment. After the scale is removed by pickling, the final cold rolling is carried out under the conditions described in Table \. Finally, the aging treatment is carried out under the respective heating conditions shown in Table 1, and the invention examples and comparisons are obtained. The test piece of the example. The aging treatment after the solution treatment is sometimes omitted according to the test piece. 17 1 201217550 [ϊ<]

製造步驟丨 | 第二時效處理 | 丨時間(h) | so \〇 s〇 n£> Ό so SO so Ο s〇 Ό so NO v〇 I溫度(°c) | I 400 I 1_ 400 1 1 400 L 400 I 400 I 400 1 400 1 400 〇 o I 400 I L 350 I O »/> s 1 350 I ι 350 1 350 I 沄 ΓΛ 350 350 1_____ S 1 350 | I最後冷壓延| |軋縮率(%) | (N ΙΛ (N Ι/Ί (N <N <N ΙΛ (N ir, ΙΛ <N »Λ (N iTt (N PM *Λι <N ΙΛ (S ίΝ ιη «η 〇 iN <S «λ <N — | 第一時效處理 | |熱處理前後之EC之差(%1ACS) 1 1 i 1 1 1 1 1 1 1 1 e*\ Ό 寸 寸 I時間(h) I 1 1 1 1 1 1 1 1 1 1 i_M·_1 1__Ml_I | o.oi | | 0.006 1 | o.oi | Ο I 0.003 1 !_Mi_1 | o.oi | | 0.005 1 0.006 0.006 | o.oi | 0.01 1 I溫度(°c) | 1 1 1 1 1 1 I 1 1 1 o 沄 1_5〇p__1 O 1550__I 〇 !_450__1 ο S 1__500__1 〇 •λ o »Ti 〇 ·/*> ο 1 最後固溶處理 | |時間(min) — — — — 丨溫度(ΐ) | o g g o g | 800 1 S 〇〇 o 00 in 00 CC o 00 V» § I_«IP__! | 820 I s 00 Ο JQ 1_85〇Ι 00 S 00 1/1 s o 〇 00 s oo oo 第一固溶處理| 1 I 1 1 1 | 850°〇7.5 分鈸 I | 850ΪΧ7.5 分錢 I | 850°〇7.5 分鈸 1 | 850°〇7.5 分錢 I | 850ΐ>7.5 分錢 1 1 1 1 | 850e〇7.5 分鈸 | 1 1 1 1 1 1 1 1 1 1 合金成分 | 1第3元素1 1 (wt%) i o | 0.01 Fe 1 | 0.15Fe | | 0.17Fe 1 | 0.17Fe 1 o | O.OlFe | 1 0.15Fe | | 0.17Fe | 1 0.17Fe | o | O.OlFe 1 | 0.15Fe | | 0.2Fe | | 0.08Fe | 1 0.08Fe 1 1 0.08Fe 1 | 0.08Fe 1 | 0.08Fe 1 | 0.08Fe | O.OlCo O.OINi O.OlCr 0.01V O.OlNb O.OlMo O.OIMn O.OlZr O.OlSi 0.01 Mg 0.01B 0.01P | 0.08Fe | 1 0.08Fe 1 - (wt%)] cn <N ΓΛ rn «Ν ΓΛ On ri <N r*> <N <N rn <N Os (N CM pn <N rn (N cn <N rn <N η ο (N <N rn rn <N rn (N rn (N CO 比較例| 發明例| 發明例| 比較例| 比較例| 比較例| 比較例| 1比較例| 比較例| 比較例| 比較例| I發明例| I發明例| I比較例| I發明例| 1發明例ι 1發明例ι 1發明例i I發明例: |發明例! 發明例 發明例 1比較例1 1比較例I 6^ — ίΝ m TJ· \〇 卜 00 〇\ 〇 — 卜 00 〇\ <N 201217550 以下述條件對所得之各試驗片 不於表2。 進行特性評價 將結果 <強度> 以拉伸方向與壓延方向平行之方式使用加 則'號試驗片。依據爪-Z2241進行該試驗片之拉= 驗’測疋壓延平行方向之0.2%保證應力(YS )。 <彎曲加工性> _依據JIS H3130進行Badway (·彎曲軸與壓延方向為相 同方向)之w彎曲試驗,測定不產生裂紋之最小半徑(mbr ) 相對於板厚(t )之比即MBR/ t值。 < x.射線繞射測定> 對於各試驗片,使用理學電機公司製造之型號Hnt Uhima2000之X射線繞射裝置,以下述測定條件取得壓延 面之繞射強度.曲線,測定{111丨結晶面、{2〇〇}結晶面、{22〇} 結晶面、{3 11}結晶面之積分強度I。以相同之測定條件, 亦對純銅粉標準試樣求出(丨丨丨丨結晶面、{2〇〇丨結晶面 、{220} 結晶面、{311}結晶面之積分強度1〇,計算1/1〇{111}、1/Manufacturing Steps 第二 | Second Aging Treatment | 丨 Time (h) | so \〇s〇n£> Ό so SO so Ο s〇Ό so NO v〇I Temperature (°c) | I 400 I 1_ 400 1 1 400 L 400 I 400 I 400 1 400 1 400 〇o I 400 IL 350 IO »/> s 1 350 I ι 350 1 350 I 沄ΓΛ 350 350 1_____ S 1 350 | I final cold rolling | | %) | (N ΙΛ (N Ι /Ί (N <N <N ΙΛ (N ir, ΙΛ <N »Λ (N iTt (N PM *Λι <N ΙΛ (S ίΝ ιη «η 〇iN <S «λ <N — | First aging treatment | | Difference between EC before and after heat treatment (%1ACS) 1 1 i 1 1 1 1 1 1 1 1 e*\ Ό Inch I time (h) I 1 1 1 1 1 1 1 1 1 1 i_M·_1 1__Ml_I | o.oi | | 0.006 1 | o.oi | Ο I 0.003 1 !_Mi_1 | o.oi | | 0.005 1 0.006 0.006 | o.oi | 0.01 1 I Temperature (°c) | 1 1 1 1 1 1 I 1 1 1 o 沄1_5〇p__1 O 1550__I 〇!_450__1 ο S 1__500__1 〇•λ o »Ti 〇·/*> ο 1 Final solution treatment | |Time ( Min) — — — — 丨 temperature (ΐ) | oggog | 800 1 S 〇〇o 00 in 00 CC o 00 V» § I_« IP__! | 820 I s 00 Ο JQ 1_85〇Ι 00 S 00 1/1 so 〇00 s oo oo First solution treatment | 1 I 1 1 1 | 850°〇7.5 minutes钹I | 850ΪΧ7.5 cents I 850°〇7.5分钹1 | 850°〇7.5 cents I | 850ΐ>7.5 cents 1 1 1 1 | 850e〇7.5 min | 1 1 1 1 1 1 1 1 1 1 Alloy composition | 1 3rd element 1 1 (wt%) io | 0.01 Fe 1 | 0.15Fe | | 0.17Fe 1 | 0.17Fe 1 o | O.OlFe | 1 0.15Fe | | 0.17Fe | 1 0.17Fe | o | O.OlFe 1 | 0.15Fe 0.2Fe | | 0.08Fe | 1 0.08Fe 1 1 0.08Fe 1 | 0.08Fe 1 | 0.08Fe 1 | 0.08Fe | O.OlCo O.OINi O.OlCr 0.01V O.OlNb O.OlMo O.OIMn O .OlZr O.OlSi 0.01 Mg 0.01B 0.01P | 0.08Fe | 1 0.08Fe 1 - (wt%)] cn <N ΓΛ rn «Ν ΓΛ On ri <N r*><N<N rn <N Os (N CM pn <N rn <N rn <N η ο (N <N rn rn <N rn (N rn (N CO Comparative Example | Invention Example | Invention Example | Comparative Example | Comparative Example | Comparative Example | Comparative Example | 1 Comparative Example | Comparative Example | Comparative Example | Comparative Example | I Invention Example | I Invention Example | I Comparative Example | I Invention Example | 1 Invention Example ι 1 Invention Example ι 1 Inventive Example i Inventive Example: |Inventive Example! WORKING EXAMPLES Inventive Example 1 Comparative Example 1 1 Comparative Example I 6^—— ίΝ m TJ· \〇 卜 00 〇 〇 卜 00 00 & & & 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 Evaluation of characteristics The result <strength> The test piece was added in such a manner that the stretching direction was parallel to the rolling direction. According to the claw-Z2241, the tensile test of the test piece was performed to determine the 0.2% proof stress (YS) in the parallel direction of the calendering. <Bending workability> The w-bend test of Badway (the same direction in which the bending axis and the rolling direction are the same) in accordance with JIS H3130, and the ratio of the minimum radius (mbr) to the thickness (t) which does not cause cracking is measured, that is, MBR /t value. <x. ray diffraction measurement> For each test piece, an X-ray diffraction apparatus of a model Hnt Uhima2000 manufactured by Rigaku Corporation was used, and the diffraction intensity of the calendered surface was obtained under the following measurement conditions. The integrated intensity I of the surface, {2〇〇} crystal plane, {22〇} crystal plane, and {3 11} crystal plane. Under the same measurement conditions, the pure copper powder standard sample was also obtained (the integral intensity of the 丨丨丨丨 crystal plane, {2 〇〇丨 crystal plane, {220} crystal plane, {311} crystal plane 1 〇, calculation 1 /1〇{111}, 1

I〇{200}、l/i〇{220}、1/1〇{311} ’ 求出(i/i〇{220} ) / ( I /1〇{20〇} )、2x( 1/ 1〇{111} ) + ( i/i〇{31 i })及(!/][“"” ) / ( 1/1〇{200})。 •乾:Cu球 •管電壓:40kV .管電流:40mA ’掃描速度:5°/min 201217550 .取樣幅度:〇.〇2° .測定範圍(2Θ ) : 60°〜80° L衣 No. 1 比較例 2χ (Ι/Ι〇{111}) + (m〇{3ii}) :0_35j…· (I/I〇{lll}) / (I/I〇{200}) W〆㉟4〇·66, (I/I〇{220}) / (I/I〇{20〇l2^ 54.94 __ YS (MPa) 836 弩曲 (MBR/t) 1.5 2 3 發明例Ί 發明例 0.39 0.45 1.01 0.95 63.02 __ 72.16 880 892 1.5 1.5 4 比較例 ' i·*' f. 0.56 ; 56.64 一^一j 890 2.5 5 比較例 ν物^:6雜、J 0:47;:,· 57.78 ^, 896 2.5 6 比較例 . ·〇;'57 ^ .- ; 36.98 753 1 7 比較例 —,· 0^,5.: 35.09 一_ 793 1 g 比較例 0.55^.; i 28.77 , 846 1.5 9 比較例 〇.81!^ —3.汶4必 864 1.5 10 比較例 >项0.—79,,::, 14.71 ____. 887 2.5 11 比較例 1.22 47.24 929 nAC 3 1? 發明例 0.39 1.04 41.37 一^ 945 2 η 發明例 0.41 1.31 68.89 980 2.5 14 比較例 .0.92 . a 0.78, ' V -\ 20.67, 985 2.5 15 發明例 0.38 1.06 52.06 一_ 960 2 16 發明例 0.40 1.18 50.08 920 1.5 】7 發明例 0.41 1.13 50.56 ______ 1015 2.5 18 發明例 0.48 1.03 35.08 __ 820 0 19 發明例 0.47 1.93 90.13 一__ 1008 2.5 20 發明例 0.41 1.20 53.81 一_ 900 1.5 21 發明例 0.48 1.10 39.62 >_ 956 2 22 發明例 0.41 1.33 71.27 971 2 23 比較例 0.55 0.90 ?! ^22.70,^1^. 755 0 24 比較例 0.40 125.67-二 r 8» ill · ' 1015 4 <考察>I〇{200}, l/i〇{220}, 1/1〇{311} ' Find (i/i〇{220} ) / ( I /1〇{20〇} ), 2x( 1/ 1 〇{111} ) + ( i/i〇{31 i }) and (!/][“"” ) / ( 1/1〇{200}). • Dry: Cu ball • Tube voltage: 40kV. Tube current: 40mA 'Scan speed: 5°/min 201217550. Sampling range: 〇.〇2°. Measuring range (2Θ) : 60°~80° L clothing No. 1 Comparative Example 2χ(Ι/Ι〇{111}) + (m〇{3ii}) :0_35j...· (I/I〇{lll}) / (I/I〇{200}) W〆354〇·66, (I/I〇{220}) / (I/I〇{20〇l2^ 54.94 __ YS (MPa) 836 弩曲(MBR/t) 1.5 2 3 Invention Example 发明 Invention Example 0.39 0.45 1.01 0.95 63.02 __ 72.16 880 892 1.5 1.5 4 Comparative Example 'i·*' f. 0.56 ; 56.64 一^jj 890 2.5 5 Comparative Example ν^^6, J 0:47;:,· 57.78 ^, 896 2.5 6 Comparative Example. 57;'57 ^ .- ; 36.98 753 1 7 Comparative Example—,· 0^,5.: 35.09 a _ 793 1 g Comparative Example 0.55^.; i 28.77 , 846 1.5 9 Comparative Example 81.81!^ —3 Wen 4 must be 864 1.5 10 Comparative Example > Item 0. —79,,::, 14.71 ____. 887 2.5 11 Comparative Example 1.22 47.24 929 nAC 3 1? Invention Example 0.39 1.04 41.37 One ^ 945 2 η Inventive Example 0.41 1.31 68.89 980 2.5 14 Comparative Example 0.92. a 0.78, 'V -\ 20.67, 985 2.5 15 Invention Example 0.38 1.06 52.06 A _ 960 2 16 Invention Example 0.40 1.18 50.08 920 1.5 】7 invention example 0.41 1.13 50.56 ______ 1015 2.5 18 invention example 0.48 1.03 35.08 __ 820 0 19 invention example 0.47 1.93 90.13 one __ 1008 2.5 20 invention example 0.41 1.20 53.81 one _ 900 1.5 21 invention example 0.48 1.10 39.62 >_ 956 2 22 Invention Example 0.41 1.33 71.27 971 2 23 Comparative Example 0.55 0.90 ?! ^22.70, ^1^. 755 0 24 Comparative Example 0.40 125.67-two r 8» ill · ' 1015 4 <Inspection>

No.2及3為發明例,可知強度與彎曲加工性均衡地獲 得提升。又,No. 12及13係於固溶處理後進行時效處理之 發明例,可知強度與彎曲加工性之平衡進一步獲得提升。 又,No. 15係將Fe濃度設為0.08質量%之發明例,No. 16 係Τι濃度為下限值之發明例,No. 17係Ti濃度為上限值之 發明例,Νο· 18係降低最後冷壓延之軋縮率之發明例,N〇. i 9 20 201217550 係提升最後冷壓延之軋縮率之發明例,No.20係未實施第二 時效處理之發明例。 另一方面,No. 1及11係Fe濃度過低的比較例。ν〇·4、 5及14係Fe濃度過高的比較例。尤其可知Ν〇· 14相當於將 Fe濃度設為〇.2質量%而進行兩次固溶處理的先前例,但於 發明例中獲得與之匹敵之強度及彎曲加工性之平衡。N〇6 〜1〇係實施兩次固溶處理的比較例’藉由與發明例相比, 可更好地理解本發明之強度及f曲加工性的平衡提升效 果。No.23係過度降低最後冷廢延之軋縮率的比較例,n〇.24 係過度提升最後冷壓延之軋縮率的比較例。 【圖式簡單說明】 無 【主要元件符號說明】 無Nos. 2 and 3 are examples of the invention, and it is understood that the strength and the bending workability are improved in a balanced manner. Further, in Examples 12 and 13 which were subjected to aging treatment after solution treatment, it was found that the balance between strength and bending workability was further improved. In addition, No. 15 is an invention example in which the Fe concentration is 0.08 mass%, the invention example in which the No. 16 system concentration is the lower limit value, and the No. 17 series invention in which the Ti concentration is the upper limit value, and the Νο· 18 series Inventive example of reducing the rolling reduction ratio of the final cold rolling, N〇. i 9 20 201217550 is an invention example in which the rolling reduction ratio of the final cold rolling is increased, and No. 20 is an invention example in which the second aging treatment is not performed. On the other hand, Nos. 1 and 11 are comparative examples in which the Fe concentration is too low. Ν〇·4, 5 and 14 are comparative examples in which the Fe concentration is too high. In particular, Ν〇·14 corresponds to a previous example in which the Fe concentration is 〇.2% by mass and two solution treatments are performed. However, in the invention example, the balance between the strength and the bending workability is obtained. A comparative example in which N〇6 to 1〇 is subjected to two solution treatments can better understand the balance-enhancing effect of the strength and the f-workability of the present invention as compared with the invention. No. 23 is a comparative example in which the final cold shrinkage rolling reduction ratio is excessively lowered, and n〇.24 is a comparative example in which the rolling reduction ratio of the final cold rolling is excessively increased. [Simple diagram description] None [Main component symbol description] None

21 S21 S

Claims (1)

201217550 七、申請專利範圍: 1. 一種銅合金’其係含有Ti: 2.0〜4.0質量%,並且含 有選自 Fe、Co、Ni、Cr、V、Nb、Mo、Mn、Zr、Si、Mg、 B及P中之1種以上總計0.01〜〇·15重量。/〇,剩餘部分由銅 及不可避免之雜質所構成的電子零件用銅合金, 若將自壓延面中之{200}結晶面之X射線繞射積分強度 相對於純銅標準粉末之{200}結晶面之X射線繞射積分強度 的比設為1/ 1〇{200}、自壓延面中之{220}結晶面之X射線 繞射積分強度相對於純銅標準粉末之{220}結晶面之x射線 繞射積分強度的比設為1/1〇{220}、自壓延面中之{311》結 晶面之X射線繞射積分強度相對於純銅標準粉末之{3丨丨}結 晶面之X射線繞射積分強度的比設為1(>{3丨丨}、自壓延面 中之{111}結晶面之X射線繞射積分強度相對於純銅標準粉 末之{111}結晶面之X射線繞射積分強度的比設為I / “ {111},則滿足以下(1 )及(2 )之關係, (1) 30^ (I/I0{220}) / (1/1〇{200}) ^95 (2) 0.36^ 2x (1/1〇{111}) + (1/1〇{311}) ^ 0.48 〇 2. 如申請專利範圍第1項之銅合金,其進而滿足以下 (3 )之關係, (3) 1.02$ / (J/W200” $2〇〇。 3·一種伸銅品’其係由申請專利範圍第1或2項之銅合 金所構成。 4·一種電子零件’其具備有申請專利範圍第1或2項之 鋼合金。 22 201217550 5·—種連接器,其具備有申請專利範圍第丨或2項之銅 合金13 6.一種申請專利範圍第1或2項之銅合金之製造方法, 其包括如下步驟: 對含有Ti : 2.0〜4.0質量%,並且含有選自Fe、c〇、 Ni、Cr、V、Nb、Mo、Mn、心、&、峋、B 及 p 中之 i 種 以上總什0.01〜〇. 1 5重量% ’剩餘部分由銅及不可避免之雜 質所構成的電子零件用銅合金原材料,進行加熱至較73〇 880 C内Τι固溶極限與添加量相同之溫度高出〇〜2〇t之 溫度的固溶處理, 繼固溶處理後,進行軋縮率5〜4〇%之最後冷壓延, 繼最後冷壓延後,以材料溫度3〇〇〜5〇〇它進行〇.丨〜U 小時之時效處理;且 固溶處理僅實施一次。 7.種申明專利範圍第丨或2項之銅合金之製造方法 其包括如下步驟: 對含有Ti:2_〇〜4.0質量%,並且含有選自Fe、c〇、 Ni、Cr、V、Nb、Mo、Mn、Zr、Si、Mg B&pt^4 以上總計0.(Η〜〇.15重量%,剩餘部分由銅及不可避免 質所構成的電子零件用銅合金原材料,進行加熱至較73、〇 880 C内Τι固溶極限與添加量相同之溫度高出〇〜 溫度的固溶處理, < 繼固溶處理後,進行將材料溫度設為·。c以上 贿加熱0.001〜12小時之時效處理, 禾達 23 S 201217550 繼時效處理後,進行軋縮率5〜40%之最後冷壓延;且 固溶處理僅實施一次。 24201217550 VII. Patent application scope: 1. A copper alloy containing Ti: 2.0 to 4.0% by mass and containing Fe, Co, Ni, Cr, V, Nb, Mo, Mn, Zr, Si, Mg, One or more of B and P are 0.01 to 〇·15 by weight in total. /〇, the remaining part of the copper alloy for electronic parts consisting of copper and unavoidable impurities, if the X-ray diffraction integral intensity of the {200} crystal plane from the calendered surface is {200} crystallized relative to the pure copper standard powder The ratio of the X-ray diffraction integral intensity of the surface is set to 1 / 1 〇 {200}, and the integral intensity of the X-ray diffraction of the {220} crystal plane in the self-calendering surface is relative to the {220} crystal plane of the pure copper standard powder. The ratio of the integrated intensity of the ray diffraction is set to 1/1 〇{220}, and the integrated intensity of the X-ray diffraction of the {311] crystal plane from the calendered surface is relative to the X-ray of the {3丨丨} crystal plane of the pure copper standard powder. The ratio of the diffraction integral intensity is set to 1 (>{3丨丨}, the X-ray diffraction integrated intensity of the {111} crystal plane from the calendered surface is compared with the X-ray diffraction of the {111} crystal plane of the pure copper standard powder. When the ratio of the integral intensity of the shot is set to I / " {111}, the relationship between the following (1) and (2) is satisfied, (1) 30^ (I/I0{220}) / (1/1〇{200}) ^95 (2) 0.36^ 2x (1/1〇{111}) + (1/1〇{311}) ^ 0.48 〇2. As in the copper alloy of claim 1, the following further satisfies the following (3) Relationship, (3) 1.02$ / (J/W200" $2 3. A copper-extension product consisting of a copper alloy of the first or second patent application scope. 4. An electronic component that has a steel alloy of claim 1 or 2. 22 201217550 5 - a connector having a copper alloy 13 having the patent application scope or item 2. 6. A method for manufacturing a copper alloy according to claim 1 or 2, comprising the steps of: containing Ti: 2.0~ 4.0% by mass, and containing at least one selected from the group consisting of Fe, c〇, Ni, Cr, V, Nb, Mo, Mn, heart, &, 峋, B, and p, 0.01 to 〇. 'The remaining part of the copper alloy raw material for electronic parts consisting of copper and unavoidable impurities is heated to a temperature higher than the temperature of 〇~2〇t at the same temperature as the solid solution limit and the addition amount of 73〇880 C. After the solution treatment, after the solution treatment, the final cold rolling is performed at a rolling reduction ratio of 5 to 4%, and after the final cold rolling, the material temperature is 3 〇〇 5 5 〇〇, and the aging treatment is performed for 〇.丨~U hours. And the solution treatment is only carried out once. 7. The scope of the patent claim is 丨The method for producing a copper alloy according to the second aspect includes the steps of: containing Ti: 2_〇 to 4.0% by mass, and containing a selected from the group consisting of Fe, c〇, Ni, Cr, V, Nb, Mo, Mn, Zr, Si, Mg B&pt^4 or more, a total of 0. (Η~〇.15% by weight, the remaining part of the copper alloy material for electronic parts composed of copper and inevitable quality, heated to 73, 〇880 C Τι solid solution The temperature at which the limit and the amount of addition are the same is higher than the temperature of 〇~ temperature, and < After the solution treatment, the material temperature is set to ·. c above the bribe heating 0.001~12 hours aging treatment, Heda 23 S 201217550 After the aging treatment, the final cold rolling of the rolling reduction rate of 5~40%; and the solution treatment is only carried out once. twenty four
TW100136249A 2010-10-29 2011-10-06 containing 2.0-4.0 mass% of Ti, 0.01-0.15 wt% of one or more of Fe, Co, Ni, Cr, V, Nb, Mo, Mn, Zr, Si, Mg, B and P in total and the remainder containing Cu and unavoidable impurities, and having excellent strength and bendability TW201217550A (en)

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Family Cites Families (11)

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JP4439003B2 (en) * 2005-03-28 2010-03-24 日鉱金属株式会社 Titanium copper alloy excellent in strength and bending workability and manufacturing method thereof
CN101086044A (en) * 2007-07-13 2007-12-12 苏州有色金属研究院有限公司 High-strength high elasticity Cu-Ti alloy and its preparing process
JP4913902B2 (en) * 2008-08-05 2012-04-11 古河電気工業株式会社 Method for producing copper alloy material for electric / electronic parts
JP4563480B2 (en) * 2008-11-28 2010-10-13 Dowaメタルテック株式会社 Copper alloy sheet and manufacturing method thereof
JP4563495B1 (en) * 2009-04-27 2010-10-13 Dowaメタルテック株式会社 Copper alloy sheet and manufacturing method thereof
JP5479798B2 (en) * 2009-07-22 2014-04-23 Dowaメタルテック株式会社 Copper alloy sheet, copper alloy sheet manufacturing method, and electric / electronic component

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