TW200937667A - Package structure of chemical compound semiconductor device and fabricating method thereof - Google Patents
Package structure of chemical compound semiconductor device and fabricating method thereof Download PDFInfo
- Publication number
- TW200937667A TW200937667A TW097105846A TW97105846A TW200937667A TW 200937667 A TW200937667 A TW 200937667A TW 097105846 A TW097105846 A TW 097105846A TW 97105846 A TW97105846 A TW 97105846A TW 200937667 A TW200937667 A TW 200937667A
- Authority
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- Taiwan
- Prior art keywords
- package structure
- conductive film
- die
- groove
- film
- Prior art date
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 48
- 239000004065 semiconductor Substances 0.000 title claims abstract description 32
- 238000000034 method Methods 0.000 title claims description 26
- 239000000758 substrate Substances 0.000 claims abstract description 53
- 229910052751 metal Inorganic materials 0.000 claims abstract description 38
- 239000002184 metal Substances 0.000 claims abstract description 38
- 239000003989 dielectric material Substances 0.000 claims abstract description 13
- 239000013078 crystal Substances 0.000 claims description 44
- 239000007787 solid Substances 0.000 claims description 26
- 238000004519 manufacturing process Methods 0.000 claims description 17
- 239000011810 insulating material Substances 0.000 claims description 11
- 239000003566 sealing material Substances 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000000853 adhesive Substances 0.000 claims description 5
- 230000001070 adhesive effect Effects 0.000 claims description 5
- 238000005553 drilling Methods 0.000 claims description 5
- 238000007789 sealing Methods 0.000 claims description 5
- 238000003466 welding Methods 0.000 claims description 5
- 238000005323 electroforming Methods 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 4
- 238000000206 photolithography Methods 0.000 claims description 4
- 229920005989 resin Polymers 0.000 claims description 4
- 239000011347 resin Substances 0.000 claims description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 3
- 239000003822 epoxy resin Substances 0.000 claims description 3
- 239000012774 insulation material Substances 0.000 claims description 3
- 229920000647 polyepoxide Polymers 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 claims description 3
- 229920001296 polysiloxane Polymers 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- HBGPNLPABVUVKZ-POTXQNELSA-N (1r,3as,4s,5ar,5br,7r,7ar,11ar,11br,13as,13br)-4,7-dihydroxy-3a,5a,5b,8,8,11a-hexamethyl-1-prop-1-en-2-yl-2,3,4,5,6,7,7a,10,11,11b,12,13,13a,13b-tetradecahydro-1h-cyclopenta[a]chrysen-9-one Chemical compound C([C@@]12C)CC(=O)C(C)(C)[C@@H]1[C@H](O)C[C@]([C@]1(C)C[C@@H]3O)(C)[C@@H]2CC[C@H]1[C@@H]1[C@]3(C)CC[C@H]1C(=C)C HBGPNLPABVUVKZ-POTXQNELSA-N 0.000 claims 1
- PFRGGOIBYLYVKM-UHFFFAOYSA-N 15alpha-hydroxylup-20(29)-en-3-one Natural products CC(=C)C1CCC2(C)CC(O)C3(C)C(CCC4C5(C)CCC(=O)C(C)(C)C5CCC34C)C12 PFRGGOIBYLYVKM-UHFFFAOYSA-N 0.000 claims 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims 1
- SOKRNBGSNZXYIO-UHFFFAOYSA-N Resinone Natural products CC(=C)C1CCC2(C)C(O)CC3(C)C(CCC4C5(C)CCC(=O)C(C)(C)C5CCC34C)C12 SOKRNBGSNZXYIO-UHFFFAOYSA-N 0.000 claims 1
- 229910052744 lithium Inorganic materials 0.000 claims 1
- 238000005121 nitriding Methods 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 238000004080 punching Methods 0.000 claims 1
- 125000006850 spacer group Chemical group 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 73
- 239000000463 material Substances 0.000 abstract description 12
- 238000005538 encapsulation Methods 0.000 abstract description 4
- 239000010409 thin film Substances 0.000 abstract description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 229910000679 solder Inorganic materials 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 230000017525 heat dissipation Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000008393 encapsulating agent Substances 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- HGUFODBRKLSHSI-UHFFFAOYSA-N 2,3,7,8-tetrachloro-dibenzo-p-dioxin Chemical compound O1C2=CC(Cl)=C(Cl)C=C2OC2=C1C=C(Cl)C(Cl)=C2 HGUFODBRKLSHSI-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Classifications
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- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
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- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Led Device Packages (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Description
200937667 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種化合物半導體元件之封裝結構及其製 造方法,尤係關於一種光電半導體元件之薄型封裝結構及 其製造方法。 【先前技術】 由於光電元件中發光二極體(light emitting di〇de;LED) H 有體積小、發光效率高及壽命長等優點,因此被認為是次世代 綠色節能照明的最佳光源》另外液晶顯示器的快速發展及全彩 榮幕的流行趨勢’使白光系發光二極體除了應用於指示燈及大 型顯示幕等用途外,更切入廣大之消費性電子產品,例如:手 機及個人數位助理(PDA)。 圖1係習知表面黏著(SMD)元件之發光二極體元件之剖 面不意圖。發光一極體晶粒12係藉由固晶膠丨丨固定於絕緣層 13c上N型導電銅帛13b之表面,並藉由金屬導線15與p型 Φ 導電銅箱13a^N型導電銅箱13b電性相連,其中p型導電 銅们3a、N型導電㈣⑽及絕緣層nc構成具有電路之基 板13。另外,透明封膠材料14覆蓋於基板13、金屬導線η 及晶粒12上,可以保護整個發光二極體元件1〇不受環境及 外力之破壞。 發光一極體几件10係使用一般印刷電路板作為基板13,因 此其整體厚度因受限於基板13中絕緣層仏厚度而無法更 薄。然消費性電子產品趨向於輕、薄、短、小之外型,因此其 内部之各元件或外部殼體都需要小型化。另―方面,絕緣層… 200937667 多係散熱性較差之樹脂材料製成,因此不利於高功率發光化合 物半導體元件作為傳導熱量之散熱途徑。 圖2係美國公開專利第US20040090756號揭露一高積集封裝 結構之剖面示意圖。此種結構係在一暫時基材上塗佈絕緣層, 並且在絕緣層上設計並佈局出需要的線路。帛著嗜光二極體 曰曰粒221、222被黏著在基板23上’並利用打線技術(或覆晶⑺化 Ο ❹ c_))技術將晶粒221、222與基板23内部導線藉由金屬導線 25相互導通。晶粒221、如上方係利用模麼(m〇idi⑻製程將 傳=的環氧樹脂(epoxy)覆蓋在晶粒221、222上。為了要使整 體晶片達到薄型化,把暫時基材利用雷射或紫外光(uv)光昭射 使其與絕緣層分離,並在預留的焊墊上黏著錫球^,如此即可 =到高積集度與薄型㈣目的。唯此製程較為複雜, 增加成本。 j $ 件了 ::述体市場上亟需要一種薄型光電化合物半導體元 改盖㈣ 厚度要更薄而能節省所佔空間,並且還要 【發明内容】 更有制用於尚功率元件之製作。 本發明係提供一種化合物半導體 造方法’該半導體元件係將外部電極㈣=…構及其製 遞電氣:因刷電路板介於晶粒及外部電極間傳 虱訊唬,因此可改善散熱不佳之問題。 1寻 本發明係提供—㈣薄型 造方法,由於使用薄型基板或金屬:之=結構及其製 了以更薄而能節省所佔曰,。 $之厚度 200937667 為達上述目的,本發明揭示一種化合物半導體元件之封 裝結構’丨包含-薄膜基板、—晶粒及—透明封膠材料。 該薄膜基板包含一第一導電臈、一第二導電膜及一絕緣介 電材料。該晶粒係固^於該第-導電膜之表面。該透明封 勝材料係覆蓋於該第—導電膜、該第二導電膜及該晶粒 上„亥第導電膜及該第二導電膜相對於該透明封膠之表 ❹ ❹ 面刀別作為電極,該絕緣介電材料介於該第一導電膜及該 第二導電膜之間。 該薄膜基板之厚度較佳地係為2〇〜5〇em。 該絕緣介電材料絲切⑽)、氮化邦叫、氮氧化石夕 (SiON) K匕鈕(Ta〇)、氧化鋁(A1〇)、氧化鈦⑺⑺、氮化 銘(AIN) It化飲(ΤιΝ)、環氧樹脂(ep()xy)、硬樹脂(smc_) 或高分子絕緣材料。 該晶粒可為發光二極體晶粒、雷射二極體或光感測晶粒。 該化合物半導體元件之料結構另包含至少—電性連接 該晶粒與該薄膜基板之金屬導線。該第一導電膜另包含一 可供該金屬導線熔接之第一打後 ^打線凹槽。又該第二導電膜另 包含-可供該金屬導㈣接之第二打線凹槽。 該化合物半導體元件之封|結構另包含複數個電性連接 該晶粒與該薄臈基板之凸塊。 該第一導電膜另包含一固晶 u日日凹槽,該晶粒係固定於該固 晶凹槽内。該固晶凹槽内批覆—反光層。 該化合物半導體元件之封裝結構 不。偁另包含一疊置於該薄膜 基板上被圖案化之絕緣材料層,发 ^其中該絕緣材料層包括一 200937667 一可供該金屬導線熔接之 供該晶粒固定之固晶凹槽及至少 打線凹槽。 本發明另揭示一種化人輪坐撞灿_ 、+ , D物半導體元件封裝結構之製造方 趙::含:列步驟:提供一薄臈基板,其包括-第-導電 、第導電膜及—絕緣介電材料;將-晶粒固接於該 電膜上’使传該晶粒的正極電性連接至該第一導電
膜’而該晶粒的負極電性連接至該第二導電膜;以及將一 透明膠材包覆該晶粒。 該薄膜基板係由下列步驟製成··提供—薄板;於該薄板 上形成至少—溝槽以分隔該第—導電膜及該第二導電膜; 以及在該溝槽中填入一絕緣介電材料。 該溝槽係利用鑽孔製程、蝕刻製程或是金屬沖壓製程所 形成。 該製造方法另 包含於該第一導電膜形成一固
晶凹槽之步
、該製造方法另包含於該第一導電膜及該第二導電膜形成 複數個打線凹槽之步驟,其中該打線凹槽係可供至少一金 屬導線熔接之處。 邊製造方法另包含於該薄膜基板上疊置被圖案化之絕緣 材料層中該絕緣材料層包括—供該晶粒固定之固晶凹 槽及可供至少一金屬導線熔接之複數個打線凹槽。 該將該晶粒固接於該薄膜基板之步驟包含以打線接合戈 是覆晶接合方式將該晶粒電性連接至該薄膜基板。 【實施方式】 200937667 圖3A〜3C係本發明薄膜基板之製造方法之步驟示意 圖如圖3A所不,提供一厚度為20〜50/zm之薄板34, 例如:銅箱或傳導佳之金屬薄膜。再利用鑽孔製程、蝕刻 製程或是金屬㈣等製程於薄板34上形成一溝槽%,藉由 該溝槽33使兩側之第一導電膜31及第二導電膜32相互無 法導通,亦即電性獨立,如圖3B所示。並且在溝槽33中 填入絕緣介電材料35就可完成薄膜基板30之製作,例如: ❹ 氧化石夕(si〇)、氮化石夕(SiN)、氮氧化矽(si〇N)、氧化鈕 (TaO)、氧化鋁(A1〇)、氧化鈦(Ti〇)、氮化鋁氮化鈦 (TiN)、環氧樹脂(ep〇xy)、梦樹脂⑽k_)或高分子絕緣材 料等:藉此可增加第—導電膜31及第二導電膜32間絕緣 性與薄膜基板30之支撐剛性,如圖3C所示。 圖4A係本發明化合物半導體元件封裝結構之剖面示意 圖。化合物半導體元件40係利用固晶或黏晶(die b〇nding) 技術把化合物半導體晶粒43黏著在薄膜基板3〇之第一導 G 電膜3 1上,亦即晶粒43藉由固晶膠47固定於第一導電膜 3 1之表面。該化合物半導體晶粒43可為發光二極體晶粒、 雷射二極體晶粒或光感測晶粒。再經由金屬導線44使晶粒 43與薄膜基板30電性連接,如此薄膜基板3〇即成為晶粒 43及金屬導線44之封裝載體。最後再利用模壓製程使透明 封膠材料46覆蓋晶粒43、金屬導線44及薄膜基板3〇上, 從而達到防濕氣與保護的效果,該透明膠材料46可為環氧 樹脂(epoxy)或是矽氧烷(silicone)。 圖4B係圖4A之化合物半導體元件之上視圖。使透明封 200937667 膠材料46局部被移除,可以更清楚看晶粒43、金屬導線 44及薄膜基板30之連結關係,兩金屬導線44分別自晶粒 43表面向第—導電膜31及第二導電膜32延伸並連接。 圖5係係本發明另一實施例化合物半導體元件封裝結構 之剖面示意圖。化合物半導體元件50係利用覆晶製程將晶 粒43藉由凸塊(bump)54固定在薄膜基板3〇上。與圖4A 不同係該晶粒43之主動面翻轉朝向薄臈基板3〇,並利用錫 Q 球與晶粒43上之焊墊相接合而成為凸塊54,再經過迴焊後 則凸塊54與薄膜基板3〇會因錫膏融熔後又固化而電性相 導通。最後再利用模壓製程使透明封膠材料46覆蓋晶粒43 及薄膜基板30上,從而達到防濕氣與保護的效果。本實施 例之優點係電流路捏較短及散熱佳,相較於前一個實施例 並可以減少金屬導線之線弧高度(loop height)。 圖6係係本發明再一實施例化合物半導體元件封裝結構 之剖面示意圖。本實施例可更進一步減少封裝結構之厚度 〇 與增加封裝元件之亮度,其係在薄膜基板30a之第一導電 膜3Γ上形成一固晶凹槽411 ’並且在固晶凹槽411之四周 側壁與底部沈積一反光層412。可以利用光微影餘刻、電鑄 製私或疋鑽孔製程來形成該固晶凹槽411。晶粒43黏著在 該固晶凹槽411之底部,如此可形成一種類似杯狀反射腔 體。該晶粒43發出的側向光線能夠有效的經由反光層412 朝向上方反射’以增加化合物半導體元件封6〇之發光亮 度本實施例另—優.點為·當晶粒4 3被放置在固晶凹槽411 中’對於利用金屬導線44使晶粒43與薄膜基板30a間電 200937667 性連接’將會有效的降低金線的線弧高度,而可以更加達 到整體封裝結構的薄型化。 圖7係係本發明再一實施例化合物半導體元件封裝結構 之剖面示意圖。相較於上述實施例,本實施例可再進—步 減少封裝結構之厚度。於薄膜基板3〇b之第一導電膜3iM 上形成一打線凹槽4I3,可提供金屬導線44第二焊點之熔 接位置;同樣,第二導電臈32,上亦形成一打線凹槽421,
❹ 可提供另一金屬導線44第二桿點之熔接位置。由於金屬導 線44第二焊點之位置下降,因此可減少化合物 封70之封裝結構的厚度。 前述實施例係採光微影蝕刻、電鑄製程 形成固晶凹槽或打線凹槽,亦可以於薄膜基板3〇上:= 圖案化之絕緣材料層36,其係利用光微影㈣於絕緣層% 上形成固晶凹槽41ι及打線凹槽413、421,如圖心。 如此不僅可減少化合物半導 _ h ㈣㈣讀封80之封裝結構的 2尚可以避免連接第二導電膜32之金屬導線Μ與第— 導電膜31間有不當接觸而短路。 圖9A-9D係本發明採電鑄劁 一土 形成固晶凹槽或打線凹神 例:於薄臈基板3〇上形成-圖案化之緣材料層36·: 例如.光阻材料。利用電鑄製 電…出…成長二程::;,電膜31及第二導 糊如:去光阻步物形成=37’再去除緣材料層 413、421。 成口日日凹槽411及打線凹槽 本發明之技術内 容及技術特點已揭示如上 然而熟悉本 200937667 項技術之人士仍可能基於本發明之教示及揭示而作種種不 背離本發明精神之替換及修飾。因此,本發明之保護範圍 應不限於實施例所揭示者’而應包括各種不背離本發明之 替換及修飾,並為以下之申請專利範圍所涵蓋。 【圖式簡單說明】 圖1係習知表面黏著(SMD)元件之發光二極體元件之剖面 示意圖; ❹ ❹ 圖2係美國公開專利第US2〇〇4〇〇9〇756號揭露—高積集封裝 結構之剖面示意圖; '、 圖3A〜3C係本發明薄膜基板之製造方法之步驟示意圖. 圖4A係本發明化合物半導體元件封裝結構之剖面;意 国係圖4A之化合物半 圖 -,一…,,〜丄%同 , 係係本發明另—實施例化合物半導體元件 之剖面示意圖; 再 之圖本發明再一實施例化合物半導體元件封裝結構 之發明再一實施例化合物半導體元件封裝結構 之施例化合物半導體元件封裝結構 圖9A-9D係本發明採電鑄製 之示意圖。 料Μ成固晶凹槽或打線凹槽
【主要元件符號說明J -12- 200937667 ❹ 10 發光二極體元件 11 固晶膠 12、 221 ' 222 晶粒 13 基板 13a P型導電銅箔 13b N型導電銅箔 13c 絕緣層 14 透明封膠材料 15 金屬導線 20 化合物半導體 23 基板 25 金屬導線 26 錫球 30、 30a〜30c 薄 31、 31’第一導電膜 32 第二導電膜 33 溝槽 34 薄板 35 絕緣介電材料 36、 36' 絕緣層 37 金屬層 40 化合物半導體元件 43 晶粒 44 金屬導線 46 透明封膠材料 47 固晶膠 50、 60、70、80 化合物半導體元件 54 凸塊 411 固晶凹槽 412 反光層 413 、421 打線凹槽 13-
Claims (1)
- 200937667 十、申請專利範圍: 1. 一種化合物半導體元件之封裝結構,包含: -薄膜基板’包含—第—導電臈、—第二導電媒及一 絕緣介電材料,其中該絕緣介電材料介於該第一 該第二導電膜之間; 、 一晶粒,固定於該第一導電膜之表面;以及 -透明封谬材料,係覆蓋於該第—導電膜、該第二導 電膜及該晶粒。2. 根據請求項丄之化合物半導體元件之封i结構其中該薄 膜基板之厚度為20〜50//m。 3. 根據請求項i之化合物半導體元件之封裝結構其中該絕 緣介電材料係氧切(Si〇)、氮切⑽)、氮氧化石夕 (SiON)氧化組(Ta〇)、氧化紹⑷〇)、氧化鈦⑺⑺、氮 化銘(A1N)、氮化鈦(TiN)、環氧樹脂一㈣、石夕樹脂 (silicone)或高分子絕緣材料。 4. 根據請求項1之化合物半導體元件之封裝結構,其中該晶 粒可為發光二極體晶粒、雷射二極體或光感測晶粒。 5. 根據喷求項i之化合物光電元件的封裝結構其另包含至 少一電性連接該晶粒與該薄膜基板之金屬導線。 6. 根據請求項κ化合物光電元件的封裝結構,其另包含複 數個電性連接該晶粒與該薄胰基板之凸塊。 7. =據請求項丨之化合物光電元件的封裝結構,其中該第一 V電膜另包含一固晶凹槽,該晶粒係固定於該固晶凹槽 内。 -14· 200937667 8. 根據請求項7之化合物光電元件的封裝結構,其中該固晶 凹槽内抵覆一反光層。 9. 氣據請求項5之化合物光電元件的封裝結構,其中該第一 導電膜另包含一可供該金屬導線熔接之第一打線凹槽。 1〇·根據請求項9之化合物光電元件的封襞結構,其中該第二 導電膜另包含一可供該金屬導線熔接之第二打線凹槽。 11·根據請求項k化合物光電元件的封裝結構,其另3包含 〇 疊置於該薄膜基板上被圖案化之絕緣材料層,其中該絕 緣材料層包括一供該晶粒固定之固晶凹槽。 12. 根據請求項5之化合物光電元件的封裝結構,其另包含 疊置於該薄膜基板上被圖案化之絕緣材料層,其中該絕 緣材料層包括一供該晶粒固定之固晶凹槽及至少—可供 該金屬導線溶接之打線凹槽。 13. —種化合物光電元件封裝結構的製造方法,其步驟包含: 提供薄膜基板,其包括一第一導電膜、一第二導電 〇 膜及一絕緣介電材料; 將一晶粒固接於該第一導電膜上,使得該晶粒的正極 電性連接至該第-導電膜,而該晶粒的負極電性連接至該 第二導電膜;以及 將一透明膠材包覆該晶粒。 K根據Μ求項13之化合物光電元件封裝結構的製造方法,其 中該薄膜基板係由下列步驟製成: 提供一薄板; 於該薄板上形成至少—溝槽时隔㉟第- $電膜及該 -15· 200937667 第一導電膜;以及 在該溝槽中填入一絕緣介電材料。 •根據請求们4之化合物光電元件封I結構的製造方法,盆 中該溝槽係利用鑽孔製程、韻刻製程或是金屬沖麼製程所 形成。 吓 16.根據請求項14之化合物光電元件封裝結構的製造方法,其 另包含於該第一導電膜形成一固晶凹槽之步驟。 八 ❹17.根據請求項16之化合物光電元件封裝結構的製造方法其 中該晶粒係固定於該固晶凹槽内 八 18·根據請求項14之化合物光電元件封裝結構的製造方法,其 另包含於該第—導電膜及該第二導電膜形成複數個打線 槽之步驟,其中該打線凹槽係可供至少—金屬導線熔接 之處。 19. 根據請求項14之化合物光電元件封裝結構的製造方法,其 另包含於該薄膜基板上疊置被圖案化之絕緣材料層,其中 Q 該絕緣材料層包括一供該晶粒固定之固晶凹槽及可供至 少一金屬導線熔接之複數個打線凹槽。 20. 根據請求項13之化合物光電元件封裝結構的製造方法,該 將該晶粒固接於該薄膜基板之步驟包含以打線接合或是 覆晶接合方式將該晶粒電性連接至該薄膜基板。 21. 根據請求項16或18之化合物光電元件封裝結構的製造方 法’其中該固晶凹槽或該打線凹槽係藉由光微影蝕刻、電 鑄製程或是鑽孔製程所形成。 •16-
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EP09153073.3A EP2093811B1 (en) | 2008-02-20 | 2009-02-18 | Package structure of compound semiconductor device |
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TWI425680B (zh) * | 2010-10-29 | 2014-02-01 | Advanced Optoelectronic Tech | 發光二極體封裝結構 |
TWI424591B (zh) * | 2011-08-23 | 2014-01-21 | Jentech Prec Ind Co Ltd | 發光二極體封裝結構及其製造方法 |
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US7893528B2 (en) | 2011-02-22 |
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US20100304535A1 (en) | 2010-12-02 |
US8298861B2 (en) | 2012-10-30 |
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EP2093811A2 (en) | 2009-08-26 |
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