TW200923576A - Novel photopolymerization initiator, pigment dispersion composition using the same colored photocurable composition, and color filter - Google Patents

Novel photopolymerization initiator, pigment dispersion composition using the same colored photocurable composition, and color filter Download PDF

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Publication number
TW200923576A
TW200923576A TW097135694A TW97135694A TW200923576A TW 200923576 A TW200923576 A TW 200923576A TW 097135694 A TW097135694 A TW 097135694A TW 97135694 A TW97135694 A TW 97135694A TW 200923576 A TW200923576 A TW 200923576A
Authority
TW
Taiwan
Prior art keywords
group
pigment
composition
parts
compound
Prior art date
Application number
TW097135694A
Other languages
English (en)
Chinese (zh)
Inventor
Masaomi Makino
Kazuto Shimada
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200923576A publication Critical patent/TW200923576A/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00—Pigment pastes, e.g. for mixing in paints
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Liquid Crystal (AREA)
  • Polymerization Catalysts (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
TW097135694A 2007-09-26 2008-09-17 Novel photopolymerization initiator, pigment dispersion composition using the same colored photocurable composition, and color filter TW200923576A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007250103A JP2009079150A (ja) 2007-09-26 2007-09-26 新規な光重合開始剤、それを用いた顔料分散組成物、着色光硬化性組成物、およびカラーフィルタ

Publications (1)

Publication Number Publication Date
TW200923576A true TW200923576A (en) 2009-06-01

Family

ID=40511142

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097135694A TW200923576A (en) 2007-09-26 2008-09-17 Novel photopolymerization initiator, pigment dispersion composition using the same colored photocurable composition, and color filter

Country Status (4)

Country Link
JP (1) JP2009079150A (ja)
KR (1) KR20100071943A (ja)
TW (1) TW200923576A (ja)
WO (1) WO2009041253A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5359100B2 (ja) * 2008-08-01 2013-12-04 東洋インキＳｃホールディングス株式会社 新規オキシムエステル化合物およびそれを含んでなるラジカル重合開始剤および重合性組成物
CN103842338B (zh) 2011-05-25 2017-06-30 美洲染料资源公司 具有肟酯基和/或酰基的化合物
CN103998427A (zh) * 2011-12-07 2014-08-20 巴斯夫欧洲公司 肟酯光敏引发剂
JP2014074803A (ja) * 2012-10-04 2014-04-24 Jsr Corp 着色剤、着色組成物、カラーフィルタ及び表示素子
EP4261214A4 (en) * 2020-12-14 2024-06-05 San-Apro Ltd. PHOTOACID GENERATOR AND PHOTOSENSITIVE COMPOSITION THEREOF
KR20230039231A (ko) * 2021-09-14 2023-03-21 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 표시장치

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH657864A5 (de) * 1984-02-17 1986-09-30 Ciba Geigy Ag Wasserloesliche phthalocyaninverbindungen und deren verwendung als photoaktivatoren.
JPS6472150A (en) * 1987-09-11 1989-03-17 Fuji Photo Film Co Ltd Photopolymerizable composition
JP3399974B2 (ja) * 1992-04-28 2003-04-28 日立化成工業株式会社 新規な光開始剤、光開始剤系及びこれを用いた光重合性組成物
JPH10120766A (ja) * 1996-10-21 1998-05-12 Nippon Kayaku Co Ltd エネルギー線硬化性組成物及び物品
TW455616B (en) * 1997-11-03 2001-09-21 Ciba Sc Holding Ag New quinolinium dyes and borates, combinations thereof as photoinitiator compositions and photopolymerizable compositions comprising these photoinitiators
US6127445A (en) * 1998-11-03 2000-10-03 The University Of Georgia Research Foundation, Inc. Substituted benzoylferrocene anionic photoinitiators
JP4636823B2 (ja) * 2003-09-04 2011-02-23 富士フイルム株式会社 ２光子吸収光記録材料、それを用いた２光子吸収光記録方法及び２光子吸収光記録再生方法
JP4886374B2 (ja) * 2006-06-09 2012-02-29 キヤノン株式会社 顔料粒子の製造方法、顔料粒子を含有する液体組成物、画像形成方法および画像形成装置

Also Published As

Publication number Publication date
JP2009079150A (ja) 2009-04-16
KR20100071943A (ko) 2010-06-29
WO2009041253A1 (ja) 2009-04-02

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