WO2009041253A1 - 新規な光重合開始剤、それを用いた顔料分散組成物、着色光硬化性組成物、およびカラーフィルタ - Google Patents

新規な光重合開始剤、それを用いた顔料分散組成物、着色光硬化性組成物、およびカラーフィルタ Download PDF

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Publication number
WO2009041253A1
WO2009041253A1 PCT/JP2008/066225 JP2008066225W WO2009041253A1 WO 2009041253 A1 WO2009041253 A1 WO 2009041253A1 JP 2008066225 W JP2008066225 W JP 2008066225W WO 2009041253 A1 WO2009041253 A1 WO 2009041253A1
Authority
WO
WIPO (PCT)
Prior art keywords
color filter
photopolymerization initiator
pigment dispersion
same
initiator
Prior art date
Application number
PCT/JP2008/066225
Other languages
English (en)
French (fr)
Inventor
Masaomi Makino
Kazuto Shimada
Original Assignee
Fujifilm Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corporation filed Critical Fujifilm Corporation
Publication of WO2009041253A1 publication Critical patent/WO2009041253A1/ja

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00—Pigment pastes, e.g. for mixing in paints
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Liquid Crystal (AREA)
  • Polymerization Catalysts (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)

Abstract

本発明は、高色再現性の液晶表示装置用カラーフィルタを短時間の露光工程で製造し、また高解像度の固体撮像素子用カラーフィルタでもパターンプロファイルが良好な着色画素を得るため、分子内に、有機顔料の母核構造と、光によって分解して開始種を発生しうる部分構造を有する光重合開始剤、これを用いた顔料分散組成物、着色光硬化性組成物を提供する。
PCT/JP2008/066225 2007-09-26 2008-09-09 新規な光重合開始剤、それを用いた顔料分散組成物、着色光硬化性組成物、およびカラーフィルタ WO2009041253A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-250103 2007-09-26
JP2007250103A JP2009079150A (ja) 2007-09-26 2007-09-26 新規な光重合開始剤、それを用いた顔料分散組成物、着色光硬化性組成物、およびカラーフィルタ

Publications (1)

Publication Number Publication Date
WO2009041253A1 true WO2009041253A1 (ja) 2009-04-02

Family

ID=40511142

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/066225 WO2009041253A1 (ja) 2007-09-26 2008-09-09 新規な光重合開始剤、それを用いた顔料分散組成物、着色光硬化性組成物、およびカラーフィルタ

Country Status (4)

Country Link
JP (1) JP2009079150A (ja)
KR (1) KR20100071943A (ja)
TW (1) TW200923576A (ja)
WO (1) WO2009041253A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9127017B2 (en) 2011-05-25 2015-09-08 American Dye Source, Inc. Compounds with oxime ester and/or acyl groups

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5359100B2 (ja) * 2008-08-01 2013-12-04 東洋インキＳｃホールディングス株式会社 新規オキシムエステル化合物およびそれを含んでなるラジカル重合開始剤および重合性組成物
CN103998427A (zh) * 2011-12-07 2014-08-20 巴斯夫欧洲公司 肟酯光敏引发剂
JP2014074803A (ja) * 2012-10-04 2014-04-24 Jsr Corp 着色剤、着色組成物、カラーフィルタ及び表示素子
EP4261214A4 (en) * 2020-12-14 2024-06-05 San-Apro Ltd. PHOTOACID GENERATOR AND PHOTOSENSITIVE COMPOSITION THEREOF
KR20230039231A (ko) * 2021-09-14 2023-03-21 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 표시장치

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60199890A (ja) * 1984-02-17 1985-10-09 チバ‐ガイギ　アクチエンゲゼルシヤフト 水溶性フタロシアニン化合物および光活性化剤としてのその用途
JPS6472150A (en) * 1987-09-11 1989-03-17 Fuji Photo Film Co Ltd Photopolymerizable composition
JPH05301910A (ja) * 1992-04-28 1993-11-16 Hitachi Chem Co Ltd 新規な光開始剤、光開始剤系及びこれを用いた光重合性組成物
JPH10120766A (ja) * 1996-10-21 1998-05-12 Nippon Kayaku Co Ltd エネルギー線硬化性組成物及び物品
JPH11269210A (ja) * 1997-11-03 1999-10-05 Ciba Specialty Chem Holding Inc 光重合性組成物中の新規キノリニウム染料およびホウ酸塩
JP2002528552A (ja) * 1998-11-03 2002-09-03 ユニバーシティ・オブ・ジョージア・リサーチ・ファウンデイション・インコーポレイテッド 置換ベンゾイルフェロセン系のアニオン光開始剤
JP2005097538A (ja) * 2003-09-04 2005-04-14 Fuji Photo Film Co Ltd ２光子吸収重合方法、２光子吸収光記録材料及び２光子吸収光記録方法。
JP2007327014A (ja) * 2006-06-09 2007-12-20 Canon Inc 顔料粒子の製造方法、顔料粒子を含有する液体組成物、画像形成方法および画像形成装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60199890A (ja) * 1984-02-17 1985-10-09 チバ‐ガイギ　アクチエンゲゼルシヤフト 水溶性フタロシアニン化合物および光活性化剤としてのその用途
JPS6472150A (en) * 1987-09-11 1989-03-17 Fuji Photo Film Co Ltd Photopolymerizable composition
JPH05301910A (ja) * 1992-04-28 1993-11-16 Hitachi Chem Co Ltd 新規な光開始剤、光開始剤系及びこれを用いた光重合性組成物
JPH10120766A (ja) * 1996-10-21 1998-05-12 Nippon Kayaku Co Ltd エネルギー線硬化性組成物及び物品
JPH11269210A (ja) * 1997-11-03 1999-10-05 Ciba Specialty Chem Holding Inc 光重合性組成物中の新規キノリニウム染料およびホウ酸塩
JP2002528552A (ja) * 1998-11-03 2002-09-03 ユニバーシティ・オブ・ジョージア・リサーチ・ファウンデイション・インコーポレイテッド 置換ベンゾイルフェロセン系のアニオン光開始剤
JP2005097538A (ja) * 2003-09-04 2005-04-14 Fuji Photo Film Co Ltd ２光子吸収重合方法、２光子吸収光記録材料及び２光子吸収光記録方法。
JP2007327014A (ja) * 2006-06-09 2007-12-20 Canon Inc 顔料粒子の製造方法、顔料粒子を含有する液体組成物、画像形成方法および画像形成装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9127017B2 (en) 2011-05-25 2015-09-08 American Dye Source, Inc. Compounds with oxime ester and/or acyl groups
US9382259B2 (en) 2011-05-25 2016-07-05 American Dye Source, Inc. Compounds with oxime ester and/or acyl groups

Also Published As

Publication number Publication date
JP2009079150A (ja) 2009-04-16
KR20100071943A (ko) 2010-06-29
TW200923576A (en) 2009-06-01

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