TW200845332A - Package substrate and its solder pad - Google Patents
Package substrate and its solder pad Download PDFInfo
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- TW200845332A TW200845332A TW096115961A TW96115961A TW200845332A TW 200845332 A TW200845332 A TW 200845332A TW 096115961 A TW096115961 A TW 096115961A TW 96115961 A TW96115961 A TW 96115961A TW 200845332 A TW200845332 A TW 200845332A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3452—Solder masks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49838—Geometry or layout
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- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/0401—Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0555—Shape
- H01L2224/05552—Shape in top view
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L24/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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- H01L2924/01033—Arsenic [As]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/099—Coating over pads, e.g. solder resist partly over pads
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10613—Details of electrical connections of non-printed components, e.g. special leads
- H05K2201/10621—Components characterised by their electrical contacts
- H05K2201/10734—Ball grid array [BGA]; Bump grid array
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
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- Manufacturing & Machinery (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Wire Bonding (AREA)
Description
200845332 九、發明說明: 【發明所屬之技術領域】 本發明係有關一種球柵陣列(Ball Grid Array,BGA)基 板^寸別是一種具有防鐸層界定(Solder Mask Define,SMD) 鮮墊设计以供植設銲球之封裝基板結構。 【先前技術】 在一般BGA半導體封裝件中,通常需利用一基板作為 晶片承載件,以便於基板之一側設置晶片並使晶片與基板上 之導電結構電性連接,且基板之另一側植設有複數個銲球與 V包結構電性連接,進而藉由銲球與一印刷電路板銲接,使 晶片經由導電結構及銲球而與印刷電路板形成電性連接關 係。 請參閱第la圖,基板1〇主要包括一芯層12及一防銲 層14,芯層12上形成有導電結構(圖中未示)及與導電結構連 接之銲墊16,以供藉由銲墊接合銲球,其中銲墊可區分為 SMD録塾與非防銲層界定(N〇ne s〇lderMask Define ,NSMD) 在干墊,如第la圖所示之銲墊即為一 SMD銲墊16,其中銲墊 16尺寸大於防銲層η上之開口 2〇,以藉由開口 2〇界定銲墊 16之暴露面積;如第lb圖所示,當將具有smd銲墊16設 計之封裝體2與印刷電路板3進行電性連接時,係藉由焊球 18與印刷電路板3上之銲墊16對位接合,其中由於銲球18 與銲墊16的接觸面積較小,會造成封裝體於板層級的溫度循 環測試(Board Level Temperature Cycling Test,Board TCT)結 果不佳,易導致銲球18與銲墊16的接合面間,或是幾何尺 寸不連續處發生應力集中,而產生裂損(crack)。 5 200845332 而NSMD銲墊係指銲墊μ之周邊不被防銲層14覆蓋, 如第2a圖所示,即銲墊16之表面及銲墊16周邊之部分芯層 12藉由開口 20露出,以利銲球μ之接合;當BGA封裝件 採用NSMD銲墊16時,雖然於銲球18與銲墊16間具有較 佳之TCT結果,但如第2b圖所示,當封裝體承受外在應力 時’ NSMD銲墊16因沒有防銲層加以覆蓋,容易與芯層12 分離,而同樣造成訊號線路裂損(crack)。 美國專利第6,201,305號案與台灣專利1234838號案即 在針對提出一種NSMD銲墊之結構設計,以改善銲墊與芯層 的分離現象;在美國專利第6,201,305號中,係使銲墊具有 多數呈輻射狀排列之臂部的海星形狀,並於防銲層上設計一 圓形開口,使臂部的外端受到防銲層覆蓋,而銲墊中央區域、 臂部内端與二相鄰臂部間的部分芯層露出,使銲球得同時與 露出的部分銲墊與部分芯層接觸,除增加接觸面積之外,亦 不易與芯層分離;而台灣專利1234838號即利用上述概念, 在if墊上開δ又多個中空部分,使銲墊外端受到防銲層覆蓋, 而銲墊的内端與經由中空部分所露出的部分芯層則同時與銲 球接觸,以增加銲球的接觸面積。 然而,上述美國專利第6,2〇1,3〇5號案與台灣專利 1234838號係皆在針對NSMD銲墊進行改良,在製程上皆須 針對銲墊的形狀先進行複雜且困難之蝕刻製程。 【發明内容】 為了解決上述問題’本發明目的之—係提供—種半導體晶 片封裝基減其銲⑽構,藉由圖㈣㈣之設計可增加銲塾與 球的接觸面積並改善黏著效果。 〃 6 200845332 /本發明目的之一係提供一種半導體晶片封裝基板及其銲墊結 構,係利用防銲層之圖案化開Π設計定義出圖案化銲墊,可有 效改善銲墊與銲球_著狀況與封裝品質。 ^ 本發明目的之一係提供一種半導體晶片封裝基板及其銲墊 ^構’可強化銲塾與銲球的黏著效果使封裝元件具備有較佳 之TCT測試結果。 ^ 本發明目的之一係提供一種半導體晶片封裝基板及其銲墊 、、’-構’係利用防銲層之圖案化開口設計定義出圖案化辉塾,其 ^,防銲層之圖案化開口係利用一般微影技術即可完成無須 領外製程’具有製作簡單之優點。 曰 為了達到上述目的,本發明之一實施例提供一種半導體 曰曰片封I基板,包括:一芯層;一導電結構設置於芯層之一表 面上,以及一絕緣層覆蓋於導電結構上,其中絕緣層具有至 v圖案化開口;圖案化開口係暴露部份導電結構作為一圖 >、、干墊,以及圖案化開口包括一中央部及複數個翼部自中 央部周緣向外延伸。 勹本發明之另一實施例提供一種防銲層界定之銲墊結構, 包括·一中央區;以及複數翼面區自令央部周緣向外延伸。 以下糟由具體實施例配合所附的圖式詳加說明,當更容易瞭解 本發明之目的、技_容、_及其所達成之功效。 【實施方式】 社播Γ參閱第3a圖及第3b圖,分別為本發明—實施例封裝基板 =圖與其AA、線段剖視圖,如圖所示,此封裝基板包 層30; -導電結構32係設置於芯層%之一表面上, 夺迅、、、。構32預設有作為銲塾的端部;—絕緣層,例如一防 7 200845332 銲層34,覆蓋於芯層30表面以遮蓋導電結構32,防銲層34 上形成有至少一圖案化開口 36,使開口 36的位置與端部的 位置對應,其中開口 36包括一中央部361及複數翼部 (wing)362自中央部361周緣向外延伸,以便藉由中央部361 及翼部362界定端部的暴露區域,此外露之端部即供作為銲 墊38,以便與銲球(圖中未示)進行接合。 接續上述說明,中央部361係為一圓形孔,翼部362係 呈圓弧形,翼部362的數目可為二個或多個且以對稱的分佈 關係與中央部361連接,此具有中央部361及翼部362的開 口 36係使用一般封裝基板防銲層製作方式,以微影技術經曝 光與顯影而形成;又芯層30之材質主要為環氧樹脂、聚亞醯 胺樹脂、BT(bismaleimide triazine)樹脂、FR4 樹脂或 FR5 樹 脂,導電結構32係由銅薄膜壓合於芯層30表面且經蝕刻等 圖案化製程所形成之一圖案化金屬層。 在本發明中,由於防銲層之開孔具有圓形中央部及周緣 翼部的設計,使由防銲層之開口所界定之銲墊38如第4圖所 示,包括一圓形之中央區381,以及連接中央區381周緣之 複數個呈圓弧形的翼面區382,翼面區382係對稱分佈於於 中央區381周緣,此種具有翼面區382之銲墊38的設計將可 額外增加銲墊38與銲球的接觸面積,以增加銲墊38與銲球 的黏著效果,進而具有較佳之封裝品質;同時,藉由銲墊38 之翼面區382的設計,亦可具有較佳之TCT測試結果。 另一方面,在本發明中,由於銲墊的形狀係由防銲層之 開口所界定,在製程上僅需對防銲層進行一般微影技術即可 形成,製作簡單,使本發明同時具備有製程簡單且可有效改 善銲墊與銲球的黏著效果之優點。 8 200845332 以上所述之實施例僅係為說明本發明之技術思想及特 點,其目的在使熟習此項技藝之人士能夠瞭解本發明之内容 並據以實施,當不能以之限定本發明之專利範圍,即大凡依 本發明所揭示之精神所作之均等變化或修飾,仍應涵蓋在本 發明之專利範圍内。 【圖式簡單說明】 第la圖及第ib圖所示分別為習知SMD銲墊接設有銲球之剖視圖及 其板層級封裝示意圖。 第2a圖及第2b圖所示分別為習知NSMD銲墊接設有銲球之剖視圖 及其裂損示意圖。 第如圖及第3b圖所示分別為本發明一實施例封裝基板之俯視圖 與其AA線段剖視圖。 第4圖所示為本發明一實施例防銲層界定之銲墊結構示咅圖。 【主要元件符號說明】 2 封裝體 3 印刷電路板 10 基板 芯層 防銲層 14 200845332 20 開口 30 芯層 32 導電結構 34 防銲層 36 開口 361 中央部 362 翼部 38 録塾 381 中央區 382 翼面區
Claims (1)
- 200845332 十、申請專利範圍: 1· -種半導體晶片封裝基板,包含: 一芯層; 一^電結構,係設置於該芯層之一表面上丨以及 一絕緣層,係覆蓋於該導電結構上,其中 該絕緣層具有至少一圖案化開口; 銲塾該化開口係暴露部份該導電結構作為一圖案化 •亥圖案化開口係包括—中央咅 A^ 央部周緣向外延伸。 炅数们真4自该中 n: i所述之半導體晶片 為一圖案化金屬層。 、T 結構係 3·如請求項丨所述之半導體晶 一防銲層。 了衣基板其中,該絕緣層係為 4·如請求項丨所述之半導體晶片 佈於該中央部周緣。 衣基板,其中,該翼部係對稱分 5·如請求項】所述之半導體晶片 形。 衣基板其中,该中央部係為圓 6·如請求項丨所述之半導體晶 形。 訂衣基板,其令,該翼部係為圓弧 7· —種防銲層界定之銲墊結構,包含·· 一中央區;以及 複數翼面區,係自該中央F田&人, Q 天區周緣向外延伸。 8. 如靖求項7所述之防銲層界定之銲墊結 … 區係對稱分佈於該中央區周緣。 八_,该複數翼面 9. 如請求項7所述之防銲層界定 呈圓形。 干1^口構其中,該中央區係 =广頁7所述之防銲層界定之銲 呈圓弧形。 丹丹T,该異面區係
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TW096115961A TW200845332A (en) | 2007-05-04 | 2007-05-04 | Package substrate and its solder pad |
JP2007170255A JP2008277720A (ja) | 2007-05-04 | 2007-06-28 | 半導体チップパッケージ基板とそのソルダーパッド |
US11/824,448 US20080272489A1 (en) | 2007-05-04 | 2007-06-29 | Package substrate and its solder pad |
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JP4962217B2 (ja) * | 2007-08-28 | 2012-06-27 | 富士通株式会社 | プリント配線基板及び電子装置製造方法 |
TWI365517B (en) * | 2008-05-23 | 2012-06-01 | Unimicron Technology Corp | Circuit structure and manufactring method thereof |
IL203403A (en) * | 2010-01-19 | 2016-08-31 | Cupron Inc | Biofilm resistant materials |
JP2019040924A (ja) * | 2017-08-22 | 2019-03-14 | 新光電気工業株式会社 | 配線基板及びその製造方法と電子装置 |
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JP2682496B2 (ja) * | 1995-02-28 | 1997-11-26 | 日本電気株式会社 | フレキシブルフィルム及び半導体装置 |
JP2001230339A (ja) * | 2000-02-18 | 2001-08-24 | Nec Corp | 半導体装置 |
US6201305B1 (en) * | 2000-06-09 | 2001-03-13 | Amkor Technology, Inc. | Making solder ball mounting pads on substrates |
KR100523330B1 (ko) * | 2003-07-29 | 2005-10-24 | 삼성전자주식회사 | Smd 및 nsmd 복합형 솔더볼 랜드 구조를 가지는bga 반도체 패키지 |
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2007
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