TW200838971A - Surface-protective adhesive tape for solid-state imaging device, and method for mounting solid-state imaging device - Google Patents
Surface-protective adhesive tape for solid-state imaging device, and method for mounting solid-state imaging device Download PDFInfo
- Publication number
- TW200838971A TW200838971A TW097104307A TW97104307A TW200838971A TW 200838971 A TW200838971 A TW 200838971A TW 097104307 A TW097104307 A TW 097104307A TW 97104307 A TW97104307 A TW 97104307A TW 200838971 A TW200838971 A TW 200838971A
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- Taiwan
- Prior art keywords
- solid
- adhesive tape
- adhesive
- imaging device
- state imaging
- Prior art date
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- 239000002390 adhesive tape Substances 0.000 title claims abstract description 46
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- 229910052851 sillimanite Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 229920000638 styrene acrylonitrile Polymers 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0203—Containers; Encapsulations, e.g. encapsulation of photodiodes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/04—Non-macromolecular additives inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14618—Containers
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/50—Constructional details
- H04N23/54—Mounting of pick-up tubes, electronic image sensors, deviation or focusing coils
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2433/00—Presence of (meth)acrylic polymer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Inorganic Chemistry (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Studio Devices (AREA)
Description
200838971 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種固態攝像裝置用表面保護黏著帶及使 用該固態攝像裝置用表面保護黏著帶之固態攝像裳置之安 裝方法。 < 【先前技術】 於固態攝像裝置之製造步驟中’為防止於安襞及製造步 =中異=附著、劃傷影像感測器表面’而採取對影像感測 …光部側貼合具有黏著劑層之表面保護黏著帶之方 法0 此時’零件安裝步驟較多係使用下述方法,gp,將影像 感測器之端子部與安裝基板在對位之狀態下,投入至回流 焊爐中,藉此一次性地連接安裝 ^ ^ 咬任女屐但由於包括焊接等高溫 £域下之步驟’因而要求作 材之㈣及黏著劑層具有 耐熱性。然而,由於日^p1 T , 、目則之表面保護黏著帶大多不具有與 上述步驟相稱之耐埶性,田 、"" …、i因此於零件安裝步驟時,須先刹 離表面保護黏著帶’在零件安I步驟之後再貼 面保護黏著帶。 丁貼口表 當前,作為其改善措施,亦 册 』抹用有使用表面保護用黏著 ▼之方法,該表面保護用黏著 部耆甲使用以聚醯亞胺為主成分 之具有高耐熱性之薄膜,伯士 膜但由於聚醯亞胺薄膜具有茶褐色 之色調’因而視認性較差 進仃零件安裝後之光學檢查時
的王光線透過率較低。田A ⑯目&’難以在帶貼附形態下進行光 学檢查。 128848.doc 200838971 一口此提出有使用聚對苯二甲酸乙二酯或聚萘二甲酸乙 ^一函日等透明性優显夕往祕 、 良…之溥膜之方法(專利文獻1)。 然广’於高溫環境下之步驟中,當黏著劑層之耐熱性較 低日守’有日守黏著帶會自影像感測器表面剝離,從而導致劃 傷或異物附著等問題。 專利文獻日本專利特開2005-341523號公報 【發明内容】 發明欲解決之問題 本%月之目的在於提供—種於高溫環境下之固態攝像裝 製k v驟中,保護影像感測器表面不受異物污染、劃 傷’並且黏著帶不會自影像感測器剥離之固態攝像裝置用 表面保護用黏著帶以及使用該黏著帶之固態攝像裝置之安 裝方法。 解決問題之技術手段 參 本务明者們為解決上述課題而反覆專心研究之結果發 現’利用以下黏著帶可達成上述目的,從而完成本發明。 即’本發明係一種固態攝像裝置用表面保護黏著帶,其 特徵在於’於基材之單面具有黏著劑層, 含有親油性層狀黏土礦物。 # 、本發明之固態攝像裝置用表面保護黏著帶較好的是,上 述黏著劑層中,相對於黏著劑1〇〇重 狀黏土礦物1〜40重量份^ 3有親油性層 、本發明之固態攝像裝置用表面保護黏著帶較好的是,上 述親油性層狀黏土礦物為層狀矽酸鹽。 疋 128848.doc 200838971 本發明之固態攝像裝置之攻壯 不衣罝之女裝方法之特徵在於,使用上 述固態攝像裝置用表面保護黏著帶。 發明之效果 本發明之固態攝像裝置用表面保護黏著帶藉由於黏著劑 層中含有親油性之層狀黏土礦物,而提高黏著劑之凝聚 力,從而於零件安褒步驟中之高温條件下,可對黏附體例 如影像感測器之受光部侧保持黏著力,因而黏著帶不會自 影像感測H剝離’而可㈣影像感測器表面不受異物污 染、劃傷。又,即便是在18(rc左右之高溫加熱處理後, 亦不會於影像感測器上產生黏著#1殘潰而可剝離,因而本 务明之固態攝像裝置用表面保護黏著帶有效。 【實施方式】 以下,對本發明之實施形態進行說明。 本發明之黏著帶基本上係由基材及設置於基材單面之黏 著劑層开> 成,但亦可至少於單面上經由黏著劑層而貼合實 施有脫模處理之脫模薄膜。 黏著帶之基材並無特別限定,較好的是在高溫條件下, 例如於100〜200°c之溫度範圍内具有耐熱性之薄膜。具體 而ό ’較好的疋由聚對苯二曱酸乙二酉旨(polyethylene terephthalate ’ PET)薄膜、聚蔡二甲酸乙二酷(p〇iyethylene naphtahalate,PEN)薄膜、聚醚颯(p〇lyether sulfone,PES)薄膜、 聚醚醯亞胺(polyetherimide,PEI)薄膜、聚砜(p〇lySUlfone, PSF)薄膜、聚苯硫醚(polyphenylene sulfide,PPS)薄膜、 聚 酮(polyether ether ketone,PEEK)薄膜、聚芳酯 128848.doc 200838971 (polyarylate,PAR)薄膜、芳族聚醯胺薄膜、聚醯亞胺薄膜 或液晶聚合物(liquid crystal p〇lyester,LCP)薄膜構成。 較理想的是,基材之厚度較好的是1〇〜5〇 μιη,更好的是 3〇〜45 μηι,進而好的是35〜4〇 μηι。當基材之厚度小於ι〇 μπι時,於剝離時將難以剝離。又,當基材之厚度超過5〇 μιη時,會於高溫環境中自感測器剝離。 基材之熱收縮率較好的是10%以下,更好的是〇.5%以 下,進而好的是〇·3%以下。熱收縮率之測定方法為,於帶 形悲下’將黏著帶切割成2〇 mm見方並貼合於βa板上,於 1 80°C之溫度條件下放置1小時,使用投影機(Mitut〇y〇製 造:PROFILE PROJECTOR PJ_H300F)在 MD方向及 TD方向 上均對其加熱前後之帶尺寸進行測定。再者,所謂BA 板’係指遵照JIS「BA精加工」,對BA5號進行表面精加工 而形成之SU S3 04板(曰本金屬(股)製造之BA5號精加工 SUS304)。再者,鑒於基材之收縮率及對影像感測器之貼 附’較好的是由以兼具耐熱性及貼合時之辨識性之聚萘二 甲酸乙二酯為主成分的基材構成。 對於本發明之黏著劑層而言,只要具有黏著性及耐熱 性’則並無特別限定,例如可列舉丙烯酸系黏著劑等。作 為丙烯酸系黏著劑,具體而言,係包含丙烯酸系聚合物的 黏著劑’該丙烯酸系聚合物係由至少含有(甲基)丙烯酸烷 基醋之單體進行共聚合而獲得。作為此處所述之(甲基)丙 烯酸燒基酯之示例,可列舉:(甲基)丙烯酸甲酯、(甲基) 丙烯酸乙酯 '(曱基)丙烯酸丁酯、(甲基)丙烯酸異戊酯、 128848.doc 200838971 (甲基)丙烯酸正己酯、(曱基)丙烯酸2_乙基己酯、(甲基)丙 烯i異辛酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、 (曱基)丙稀酸十二烧基酯等。上述丙稀酸系黏著劑之耐熱 f生相對較南’係對於本發明而言最為合適之黏著劑。 為實現凝聚力、耐熱性等之改性,上述丙烯酸系聚合物 亦可視需要而包含與可與上述(甲基)丙烯酸烷基酯進行共 久己之/、他早體成勿相對應的单元。作為如此之單體成 分,例如可列舉:丙烯酸、甲基丙烯酸、(甲基)丙烯酸羧 乙酉曰、(甲基)丙稀酸魏戊酯、伊康酸、馬來酸、富馬酸、 丁細自文荨含羧基之單體,馬來酸肝、伊康酸酐等酸酐單 體,(甲基)丙烯酸2-羥乙_、(甲基)丙烯酸2_羥丙酉旨 '(甲 基)丙烯酸4-羥丁酯、(甲基)丙烯酸6•羥己酯、(甲基)丙烯 酸8-备辛酯、(甲基)丙烯酸1〇_羥癸酯、(甲基)丙烯酸12_經 十一烷基酯、(甲基)丙烯酸(4-羥甲基環己基)甲酯等含羥 基之單體;苯乙烯磺酸、烯丙基磺酸、2_(曱基)丙烯醯胺· 2-甲基丙磺酸、(甲基)丙烯醯胺丙磺酸、(甲基)丙烯酸磺 丙自曰、(甲基)丙稀氧基奈石頁酸等含績酸基之單體;2_經 乙基丙烯醯磷酸酯等含磷酸基之單體;(甲基)丙烯酸縮水 甘油酯、(甲基)丙烯醯胺、(甲基)丙稀酸經甲基醯胺、 (甲基)丙稀酸烧基胺基烧基酯(例如甲基丙烯酸二甲胺基乙 醋、曱基丙烯酸第三丁胺基乙酯等)、N-乙烯基吡洛燒 酉同、丙卸基嗎嚇^、乙酸乙稀醋、丙酸乙稀g旨、苯乙稀' 丙烯腈;(甲基)丙烯酸環烷基酯(例如環戊基酯、環己基酉旨 等)等。該等可共聚合之單體成分可使用一種或兩種以 128848.doc -10- 200838971 上上述可共聚之單體之使用量較好的是所有單體成分之 重里/〇以下,更好的是40重量%以下。 入、 :、進行父、,上述丙婦酸系聚合物可視需要而亦 3有多官能性單體等作為共聚用單體成分。作為如此之多 官广f生單體,例如可列舉:己二醇二(甲基)丙烯酸醋、 (匕聚)乙一醇一(T基)丙婦酸醋、(聚)丙二醇二(甲基)丙稀酸 酉曰、新戊二醇二(卞基)丙烯酸酯、季戊四醇二(甲基)丙烯 酸醋、三W基丙院三(甲基)丙婦酸酉旨、季戊四醇三(甲 基)丙烯酸酯、二季戊 戊I、(甲基)丙婦酸醋、(甲基)丙晞 酉文%乳酯、聚酯(甲基)丙婦酸 (甲基)丙細酸胺基甲酸 1曰專。㈣多官能性單體亦可使用—種或兩種以上。 著特性等方面考;#,多官Ab卜σ 、 置m 考二”月“生早體之使用量較好的是所有 早體成…重量%以下,更好的是3〇重量%以下。 又’該等丙烯酸系黏著劑中可含有適當之交聯劑。例如 作為-例’可含有異氰酸酷交聯劑、環氧 、5 系化合物、螯合物系交聯劑等。 # ”氮丙啶 交聯劑之使用量並無特別限制,例如相對 系聚合物100重量份,較好的是〇1〜15 二上述丙烯酸 1〜10重量份。 畺伤,更好的是 作為親油性之層狀黏土確物,並無特別 樣是使用層狀石夕酸鹽。作為層狀石夕酸鹽 ’車父好的態 石、鋅蒙脫石、矽鎂石、鋰蒙贈 Ν如可列舉:皂 豕脫石、珍珠雲 雲母、白雲母、纖蛇紋石、綠 、⑺石、金 、、來〉也石、虫Φ石、丄山 雲母、狄克石、珍珠陶土、整轉 、向嶺石、綠脆 錢石、蒙脫石、貝m 128848.doc 200838971 脫石、四矽酸雲母(tetrasilylic mica)、鈉帶雲母、葉蛇紋 石、埃洛石等。上述層狀石夕酸鹽可為天然物或合成物中^ 任-種,同時使用該等中之-種或兩種以上亦無問題,作 尤其好的態樣是使用蒙脫石。 〜 上述層狀矽酸鹽之平均粒徑較好的是〇〇1〜1〇〇 更好 的是0.05〜10 μηι,縱橫比較好的是2〇〜5〇〇,更好子 50〜200 。 的是 上述層狀黏土礦物之使用量並無特別限定,為 附體而獲得耐熱性及脫模效果,可適當決定使用量。、, 如,相對於上述丙烯酸系共聚物1〇〇重量份,較好:= ^〜重量份’更好的是1G〜3G重量份4使用量小於二 量份,則難以展現出耐熱性。較好的態樣是,上述使用旦 對應於剝離效果來進行適當調整。又,由㈣_ = 或黏著力之調整會變得困難等原目,較好的 小於議重量份’但上述使用量並無特別限定,亦可:; 100重量份以上。 j」添加 進而,可視需要添加例如起始劑、 顏料、染料、矽烷偶合劑等各種添加劑,:作^ 劑。 為/、他添加 用於製備上述黏著劑之溶劑並無特別限制 有機溶劑。作為有機溶劑,可使 地2 者在製膜時之塗膜穩定性方面較好。地溶解 可列舉:丁貌、己院、庚燒、甲,有機洛劑,例如 甲 苯、對二甲苯、環己炫甲醇本、鄰二"、間 •戊醇 衣匕況甲知、乙醇、異丙醇 128848.doc .12· 200838971 壤已醇、2 -审: 丫巷裱已醇、二乙醚、異丙醚、二丁醚、二苄 峻、四氯咬喃、丙_、甲基乙基酮、甲基異丁基酮、2_庚 酉同(甲基戊基g同)、二異丁基酮、環己酮、甲基環己酮、環 5 乙酸戊0旨、乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸 — 甲基甲酿胺(dimethyl formamide,DMF)、 Ν,Ν· 一甲基乙酿胺(dimethyl acetamide,DMAc)、N-甲基 比各烷酮、2-甲氧基乙醇、2-乙氧基乙醇、2_ 丁氧基乙醇
等。作為上述有機溶劑,較好的是乙酸乙酯、甲苯、二甲 苯等藉由溶劑,將黏著劑組成物製備成通常固形分濃度 為5 5〇重里%,較好的是5〜3 0重量%,進而妤的是10〜25重 量%之溶液。 黏著劑層之形成方法為,將丙烯酸系黏著劑塗佈於基材 上而形成黏著劑組成物層。作為該形成方法,可採用各種 方法。例如,當於黏著劑組成物層之形成中使用連續塗佈 裝置時/可列舉下述方法:連續地供給黏著劑組成物(溶 液藉由安裝於裝置前端之模帛出機構而連續地擠 出至片材基材上形成薄層。x,作為形成黏著劑組成物層 之方法’當採用批量方式時,可列舉下述方法:使黏著劑 組成物(溶液)流延至基材上,並利用敷料器或線棒、刀片 塗佈機而成形。如此,將經薄層化之㈣劑組成物積層於 基材上之後進行加熱,以去除溶劑。 較理想的是,黏著劑層之厚度較好的是3〜2〇,更好的 是5〜15 μιη,進而好的是8〜12 μπι。當黏著劑層之厚度小於 3 時,於高溫環境中會自感測器剝離。又,當黏著劑層 12B848.doc -13- 200838971 於剝離時將無法剝離。 本發明之黏㈣之#度較好的是至 ’馨於適宜的操作性,較好的是 進而,本發明中較好的是, 疋黏者f之熱收縮率較好的是 ⑽以下,更好的是〇.5%以下,進而好的是Q3%以下。此 處所述之熱收縮率,係以於㈣帶形態下貼合於板上
並於刚。〇之溫度條件下放置i小時後之值作為基準。具體 之熱收縮率之測定方法為’將黏著帶切割成20 mm見:並
貼附於BA板上,於18(rc之溫度條件下進行加熱,使用投 f^(Mitutoy〇ti4 : PR〇FILE PROJECT〇r pj.H3〇〇fJ md方向及TD方向上均對其加熱前後之帶尺寸進行測定。
之厚度超過20 μηι時, 為防止折斷或開裂, 少為5 μηι以上,進而 1 0〜100 μηι 〇 又,於本發明中,實施180°C之加熱1小時後之黏著帶之 黏著力較好的是0.5 N/19麵以上,更好的是G5〜5 G斯9 mm進而好的是1.0〜2.5 n/19 mm。若低於0.5 N/19職, 則於=財之步驟中,黏著帶有可能會自影像感測器剝 離右黏著力超過5.0 N/19 mm,則自黏附體上剝離帶之 步驟會變得困難’且有可能於黏附體表面殘存黏著劑層。 此處所述之黏著力係以遵照JIS Z0237而測定之值為基準。 較理想的是,本發明之黏著帶之光透過率較好的是5〇〇/0 以上,更好的是7〇%以上。其原因在於,藉由於對零件安 裝後之内部進行光學檢查時亦確保黏著帶之光透過率為特 疋值以上’可無須剝離黏著帶而進行檢查。此處所述之光 透過率’係表示可見光區域内的光透過性,係指4〇〇〜7〇〇 128848.doc -14- 200838971 α波長區域下之透過率。於本發明中,較好的是,該波 長區域下之任一透過率均為5〇%以上。其原因在於,當透 、率低於5G /〇時’難以經由黏著帶來確認固態攝像裝置所 2有之接線步驟等。此處所述之光透過率係以藉由以下測 定方法而測得之值為基準。 <光透過率之測定方法> ()劂疋衣置·分光光度計(島津製作所製造,⑻) (2) 利疋範圍.波帶為4〇〇 nm〜7〇〇 nm之範圍 (3) 樣品尺寸··切割成適合於測定裝置之大小 (4) 黏著γ之測疋係自黏著劑側開始進行測定。再者,對 於基材之測疋而吕,係自塗佈或存在有黏著劑之一侧開始 進行測定。 又,當對於黏著帶使用脫模薄膜時,脫模薄膜亦可使用 眾所周知之任-者。具體而言,可使用在脫模薄膜之基材 之與黏著劑層的接合面上形成有脫模塗佈層例如聚矽氧層 者。作為脫模薄膜之基材,例如可列舉玻璃紙之類的紙材 或由聚乙烯、聚丙烯、聚酯等構成之樹脂薄膜。 又,本發明之黏著帶亦可根據對象固態攝像裝置之尺寸 而進仃加工。關於加工方法,只要是可保持均勻之形狀且 :會於加工剖面部上殘留黏著劑之方法,則並無特別限 定,鑒於生產性,較好的是衝壓加工。 實施例 以下’對具體表示本發明之構成及效果之實施例等進行 說明。又’實施例等中之評價方法按下述方式進行。再 128848.doc 200838971 者,本發明當然並不限定於該等實施例、評價方法。 〈實施例1> 使用厚度為25 μιη之由聚萘二甲酸乙二酯(基材之熱收縮 率為0.4%: 150。(:至30分鐘)構成之基材。又,作為黏著劑 層,調製出由丙烯酸丁酯50重量份、丙烯酸乙酯5〇重量 份、丙烯酸2-羥乙酯(Μ重量份、三羥甲基丙烷三丙烯酸酯 〇·3重量份、丙稀酸醋5重量份構成之單體混合液所獲得的 基礎聚广物即丙稀酸系聚合物。相對於該丙浠酸系聚合物 100重里伤,使用作為層狀黏土礦物之蒙脫石(Κ仙工 業製造’ Kunipia G,平均粒徑〇1 _)1〇重量份、作為交 聯劑之聚異氰酸_化合物(曰本聚胺脂工業製造,商品 名r〇nate L)1重里伤、聚環氧化合物(三菱瓦斯化學製 造’商品名:tetrad C)4重量份、作為溶劑之甲基乙基酉同, 將溶液濃度製備成19重量%。將所得之丙烯酸系黏著劑溶 液塗佈於上述基材上,進而進行乾燥,製成具有厚度為ι〇 叫之黏著劑層的黏著帶。對該黏著帶實施赋之加幻小 時之後,遵照ns則7來測定黏著力,結果黏著力為㈣ N/19 mm,黏著帶之熱收縮率為。 〈實施例2> 實施m之層狀黏土礦物蒙脫石之含量為丄重量份,除此 以外,以相同之方法製作黏著 : ,疋該黏者帶之黏荖 力,結果黏著力為〇.55 N/19 , 〇 i 5%。 黏者f之熱收縮率為 <實施例3> 128848.doc -16·
200838971 實施例i之層狀黏土垆总 只物豕脫石之含量為40重量份,除此 以外,以相同之方Μ 、 1作黏者V。測定該黏著帶 力,結果黏著力為〇·75 Nm — " # 〇 15%。 mm,黏著帶之熱收縮率為 <實施例4> 實施例1之層狀黏土礦物豢 、 ,、物豕脫石之含ϊ為30重量份,除此 以外’以相同之方法萝作斑基册 I作黏者T。測疋該黏著帶之黏著力, 結果黏著力為1.20 N/19 mm,办f , 黏者甲之熱收縮率為015%。 <比較例1 > 不含有實施例1之層狀黏土瑪物蒙脫石,除此以外,以相 同之方法製作黏著帶。敎該黏著帶之黏著力,結果黏著 力為0.03 N/19 mm ’黏著帶之熱收縮率為〇 15%。 <比較例2> 實施例1之層狀黏土礦物蒙脫石之含量為1〇〇〇重量份,除 此以外,以相同之方法嘗試製作黏著劑層,但黏著劑之塗 佈困難’而無法均勻地製作黏著劑層。
由以上之結果可確#忍,根據本發明之固態攝像裝置用表 面保護黏著帶,即便在1 8 〇°C之高溫環境下的零件安裝资 驟中使用時,黏著力及熱收縮率仍優異,可較好地保護感 測器,而黏著帶不會自影像感測器剝離。 128848.doc -17-
Claims (1)
- 200838971 知· 十、申請專利範圍: -種固態攝像裝置用表面保護黏著帶,其特徵在於. 基材之單面具有黏著劑層,且上述黏著劑層含有黏著 及親油性層狀黏土礦物。 2·如請求項1之固態攝像裝 衣直用表面保護黏著帶,盆中 ^ 述黏著劑層中,相對於黏著 八 .^ 4 篁里份而含有親油 * 層狀黏土礦物1〜4 0重量份。 :固悲攝像焱置用表面保護黏著帶,其特徵在於: “項1或2之親油性層狀黏土礦物為層狀停。 4. 一種固態攝像裝置之安萝古^ ^ α 女衣方法,其使用如請求項丨至3 任一項之固態攝像裝置用表面保護黏著帶。 於 劑 上 性 如 中128848.doc 200838971 七、指定代表圖: (一) 本案指定代表圖為:(無) (二) 本代表圖之元件符號簡單說明: 八、本案若有化學式時,請揭示最能顯示發明特徵的化學式: (無)128848.doc
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