TW200834231A - Black-colored photosensitive resin composition, method for formation of black matrix, method for production of color filter, and color filter - Google Patents

Black-colored photosensitive resin composition, method for formation of black matrix, method for production of color filter, and color filter

Info

Publication number
TW200834231A
TW200834231A TW96134108A TW96134108A TW200834231A TW 200834231 A TW200834231 A TW 200834231A TW 96134108 A TW96134108 A TW 96134108A TW 96134108 A TW96134108 A TW 96134108A TW 200834231 A TW200834231 A TW 200834231A
Authority
TW
Taiwan
Prior art keywords
color filter
black
resin composition
photosensitive resin
colored photosensitive
Prior art date
Application number
TW96134108A
Other languages
English (en)
Inventor
Yukio Kamiya
Toshizumi Yoshino
Kuniaki Sato
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of TW200834231A publication Critical patent/TW200834231A/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/281—Interference filters designed for the infrared light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
TW96134108A 2006-09-12 2007-09-12 Black-colored photosensitive resin composition, method for formation of black matrix, method for production of color filter, and color filter TW200834231A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006246653 2006-09-12
JP2007145984 2007-05-31

Publications (1)

Publication Number Publication Date
TW200834231A true TW200834231A (en) 2008-08-16

Family

ID=39183734

Family Applications (1)

Application Number Title Priority Date Filing Date
TW96134108A TW200834231A (en) 2006-09-12 2007-09-12 Black-colored photosensitive resin composition, method for formation of black matrix, method for production of color filter, and color filter

Country Status (4)

Country Link
JP (1) JP4640505B2 (zh)
KR (1) KR20090027257A (zh)
TW (1) TW200834231A (zh)
WO (1) WO2008032675A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI420244B (zh) * 2011-04-08 2013-12-21 Chi Mei Corp 感光性樹脂組成物及使用其之彩色濾光片與液晶顯示裝置
TWI807001B (zh) * 2018-04-19 2023-07-01 日商富士軟片股份有限公司 圖案的製造方法、光學濾波器的製造方法、固體攝像元件的製造方法、圖像顯示裝置的製造方法、光硬化性組成物及膜

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101441998B1 (ko) * 2008-04-25 2014-09-18 후지필름 가부시키가이샤 중합성 조성물, 차광성 컬러필터, 흑색 경화성 조성물, 고체촬상소자용 차광성 컬러필터와 그 제조 방법, 및 고체촬상소자
JP5184993B2 (ja) * 2008-06-26 2013-04-17 富士フイルム株式会社 黒色硬化性組成物、固体撮像素子用遮光性カラーフィルタ、その製造方法、および固体撮像素子
JP5441352B2 (ja) * 2008-04-25 2014-03-12 富士フイルム株式会社 重合性組成物、遮光性カラーフィルタ、および固体撮像素子
JP5184226B2 (ja) * 2008-06-26 2013-04-17 富士フイルム株式会社 黒色硬化性組成物、固体撮像素子用遮光性カラーフィルタ及びその製造方法、並びに固体撮像素子。
KR101121038B1 (ko) * 2008-07-01 2012-03-15 주식회사 엘지화학 복수의 광개시제를 포함한 감광성 수지 조성물, 이를 이용한 투명 박막층 및 액정 표시 장치
JP2010122381A (ja) * 2008-11-18 2010-06-03 Hitachi Chem Co Ltd 黒色感光性樹脂組成物、ブラックマトリクスの製造方法、カラーフィルタの製造方法及びカラーフィルタ
KR101084262B1 (ko) 2009-12-15 2011-11-16 삼성모바일디스플레이주식회사 액정 패널 및 그의 제조 방법
JP5456552B2 (ja) * 2010-04-19 2014-04-02 東レコーテックス株式会社 低吸湿性とアルカリ水溶解性を併せ持つポリマー
JP5456183B2 (ja) * 2013-01-11 2014-03-26 富士フイルム株式会社 黒色硬化性組成物、固体撮像素子用遮光性カラーフィルタ及びその製造方法、並びに固体撮像素子。
JP5456184B2 (ja) * 2013-01-15 2014-03-26 富士フイルム株式会社 黒色硬化性組成物、固体撮像素子用遮光性カラーフィルタ、固体撮像素子用反射防止膜、固体撮像素子用遮光性カラーフィルタの製造方法、および固体撮像素子
CN108027562B (zh) 2015-09-30 2019-07-05 东丽株式会社 负型着色感光性树脂组合物、固化膜、元件及显示装置
KR102254366B1 (ko) 2017-03-28 2021-05-24 도레이 카부시키가이샤 감광성 수지 조성물, 경화막, 경화막을 구비하는 소자, 경화막을 구비하는 유기 el 표시 장치, 경화막의 제조 방법, 및 유기 el 표시 장치의 제조 방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4843858B2 (ja) * 2001-03-27 2011-12-21 大日本印刷株式会社 黒色樹脂組成物、黒色被膜、ブラックマトリックス基板および黒色樹脂組成物の製造方法
JP2004219978A (ja) * 2002-12-27 2004-08-05 Sakata Corp 遮光性感光性樹脂組成物及びそれを用いて形成した遮光性樹脂硬化体
JP4258279B2 (ja) * 2003-06-02 2009-04-30 住友化学株式会社 カラーフィルタ
JP4534697B2 (ja) * 2003-10-27 2010-09-01 住友化学株式会社 着色感光性樹脂組成物
JP2005331938A (ja) * 2004-04-23 2005-12-02 Showa Denko Kk ブラックマトリックス用感光性組成物
WO2005111674A1 (ja) * 2004-05-13 2005-11-24 Showa Denko K.K. カラーフィルター用黒色レジスト組成物
JP5140903B2 (ja) * 2004-07-02 2013-02-13 三菱化学株式会社 着色樹脂組成物、カラーフィルタ及び液晶表示装置
JP2006058821A (ja) * 2004-08-24 2006-03-02 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、及び液晶表示装置
TWI348592B (en) * 2004-12-15 2011-09-11 Mitsubishi Chem Corp A resin composition for liquid crystal panel, a color filter and a liquid crystal using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI420244B (zh) * 2011-04-08 2013-12-21 Chi Mei Corp 感光性樹脂組成物及使用其之彩色濾光片與液晶顯示裝置
TWI807001B (zh) * 2018-04-19 2023-07-01 日商富士軟片股份有限公司 圖案的製造方法、光學濾波器的製造方法、固體攝像元件的製造方法、圖像顯示裝置的製造方法、光硬化性組成物及膜

Also Published As

Publication number Publication date
KR20090027257A (ko) 2009-03-16
JPWO2008032675A1 (ja) 2010-01-28
JP4640505B2 (ja) 2011-03-02
WO2008032675A1 (fr) 2008-03-20

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