TW200745748A - Curable composition, color filter and production thereof - Google Patents

Curable composition, color filter and production thereof

Info

Publication number
TW200745748A
TW200745748A TW096118642A TW96118642A TW200745748A TW 200745748 A TW200745748 A TW 200745748A TW 096118642 A TW096118642 A TW 096118642A TW 96118642 A TW96118642 A TW 96118642A TW 200745748 A TW200745748 A TW 200745748A
Authority
TW
Taiwan
Prior art keywords
group
curable composition
color filter
respect
adhesiveness
Prior art date
Application number
TW096118642A
Other languages
Chinese (zh)
Other versions
TWI438568B (en
Inventor
Taeko Aizawa
Kazuto Shimada
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200745748A publication Critical patent/TW200745748A/en
Application granted granted Critical
Publication of TWI438568B publication Critical patent/TWI438568B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Abstract

In order to provide a curable composition having good pattern formability and superior adhesiveness with respect to a hard surface serving as a substrate even when a coloring agent is contained in a high concentration, a color filter obtained by forming a high resolution color pattern, and a production method thereof, a curable composition including (A) a radical polymerizable compound having, in a molecule thereof, an ethylenically unsaturated double bond and a group having adhesiveness with respect to a hard material and (B) a photopolymerization initiator is used. The group having adhesiveness with respect to a hard material in the polymerizable compound is preferably one or more selected from the group consisting of an acid group, an acidic ester group, an acidic onium salt, an acidic metal salt, a substituent that generates a silanol group by hydrolysis, an onium group, a phenolic hydroxyl group, a zwitterionic group, and a chelating group. This curable composition is useful in the formation of a color pattern of a color filter.
TW096118642A 2006-05-26 2007-05-25 Curable composition, color filter and production thereof TWI438568B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006147355A JP5196738B2 (en) 2006-05-26 2006-05-26 Colored curable composition for color filter, color filter, and production method thereof

Publications (2)

Publication Number Publication Date
TW200745748A true TW200745748A (en) 2007-12-16
TWI438568B TWI438568B (en) 2014-05-21

Family

ID=38850341

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096118642A TWI438568B (en) 2006-05-26 2007-05-25 Curable composition, color filter and production thereof

Country Status (4)

Country Link
JP (1) JP5196738B2 (en)
KR (1) KR101460576B1 (en)
CN (1) CN101109901B (en)
TW (1) TWI438568B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI465852B (en) * 2008-07-31 2014-12-21 Jsr Corp Radiation-sensitive composition for coloring layer formation, color filter, and color liquid crystal display element
TWI781550B (en) * 2020-03-18 2022-10-21 南韓商三星Ｓｄｉ股份有限公司 Photosensitive resin composition, photosensitive resin layer using the same and display device

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Publication number Priority date Publication date Assignee Title
JP5339781B2 (en) * 2008-05-30 2013-11-13 富士フイルム株式会社 Colored curable composition, color filter, and solid-state imaging device
JP5581078B2 (en) * 2009-03-02 2014-08-27 富士フイルム株式会社 Planographic printing plate precursor and lithographic printing plate preparation method
CN101613365B (en) * 2009-07-17 2012-02-08 哈尔滨工业大学 Compound lipid based on pentaerythritol and preparation method thereof
US8729257B2 (en) 2009-07-17 2014-05-20 Harbin Institute Of Technology Hybrid lipid compounds based on pentaerythritol, intermediates, preparation methods and use thereof
JP5570229B2 (en) * 2010-01-22 2014-08-13 クラレノリタケデンタル株式会社 Phosphate ester compound and polymerizable composition containing the same
CN103415808B (en) * 2011-02-28 2017-06-23 富士胶片株式会社 Original edition of lithographic printing plate and the method for preparing lithographic plate
JP5659918B2 (en) * 2011-03-31 2015-01-28 東洋インキＳｃホールディングス株式会社 Coloring composition for color filter, and color filter
JP6017894B2 (en) * 2012-09-03 2016-11-02 信越化学工業株式会社 Photosensitive composition for negative lithographic printing plate precursor and negative lithographic printing original plate using the same
CN103293856B (en) * 2013-05-30 2015-04-01 京东方科技集团股份有限公司 Colored photosensitive resin composition, color filter and display device
JP2015078339A (en) * 2013-09-10 2015-04-23 昭和電工株式会社 Organic-inorganic composite production method, curable composition, curable composition production method, curable composition cured product, hard coat material, and hard coat film
KR101684976B1 (en) * 2013-10-17 2016-12-09 제일모직 주식회사 Novel compound, photosensitive resin composition and light blocking layer using the same
KR102487545B1 (en) * 2016-10-21 2023-01-11 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter and image display device produced using the same
KR20190049975A (en) 2017-10-31 2019-05-10 신라대학교 산학협력단 A method for preparing fermented ossified antler extract by lactic acid bacteria and antler ferment perpared by the same method
JP2019218335A (en) * 2018-05-30 2019-12-26 住友化学株式会社 Compound, resin, resist composition, and method for producing resist pattern

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JPH08184960A (en) * 1994-11-02 1996-07-16 Toray Ind Inc Damping waterless planographic printing master plate
JP2874091B2 (en) * 1995-07-27 1999-03-24 株式会社アイテス Colored photosensitive composition and color filter
JP2001183829A (en) * 1999-12-27 2001-07-06 Hitachi Chem Co Ltd Colored image forming material, photosensitive fluid using same, photosensitive element, method for producing color filter and color filter
JP3788911B2 (en) * 2001-02-07 2006-06-21 信越化学工業株式会社 Organopolysiloxane composition
KR100933735B1 (en) * 2001-12-25 2009-12-24 후지필름 가부시키가이샤 Dye-containing negative curable composition, and color filter using same and manufacturing method thereof
JP3855998B2 (en) * 2002-02-28 2006-12-13 日立化成工業株式会社 Photosensitive resin composition, photosensitive element using the same, resist pattern forming method, and printed wiring board manufacturing method
JP2003313213A (en) * 2002-04-24 2003-11-06 Hitachi Chem Co Ltd Photopolymerizable unsaturated compound and process for manufacturing photosensitive resin composition, photosensitive element, and diffuse reflection plate using the same
JP4276923B2 (en) * 2003-02-27 2009-06-10 富士フイルム株式会社 Photocurable colored resin composition and color filter using the same
CN100587596C (en) * 2003-03-27 2010-02-03 户田工业株式会社 Transparent coloured composition and colour filter
JP4830310B2 (en) * 2004-02-23 2011-12-07 三菱化学株式会社 Oxime ester-based compound, photopolymerizable composition, and color filter using the same
JP4572664B2 (en) * 2004-05-28 2010-11-04 三菱化学株式会社 Photosensitive composition for liquid crystal split alignment protrusion and liquid crystal display device
JP4720318B2 (en) * 2004-06-28 2011-07-13 住友化学株式会社 Colored photosensitive resin composition
JP5140903B2 (en) * 2004-07-02 2013-02-13 三菱化学株式会社 Colored resin composition, color filter, and liquid crystal display device
JP4526964B2 (en) * 2005-01-27 2010-08-18 旭化成イーマテリアルズ株式会社 Photopolymerizable resin laminate, glass substrate with black matrix using the same, and method for producing color filter
JP4821206B2 (en) * 2005-07-29 2011-11-24 東レ株式会社 Photosensitive coloring composition for color filter and color filter
JP2007279668A (en) * 2006-03-14 2007-10-25 Asahi Kasei Electronics Co Ltd Black matrix and method for producing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI465852B (en) * 2008-07-31 2014-12-21 Jsr Corp Radiation-sensitive composition for coloring layer formation, color filter, and color liquid crystal display element
TWI781550B (en) * 2020-03-18 2022-10-21 南韓商三星Ｓｄｉ股份有限公司 Photosensitive resin composition, photosensitive resin layer using the same and display device

Also Published As

Publication number Publication date
KR20070114057A (en) 2007-11-29
JP5196738B2 (en) 2013-05-15
TWI438568B (en) 2014-05-21
CN101109901B (en) 2014-07-02
KR101460576B1 (en) 2014-11-13
JP2007316445A (en) 2007-12-06
CN101109901A (en) 2008-01-23

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