TW200831714A - Guide device used for electroplating treatment system - Google Patents

Guide device used for electroplating treatment system Download PDF

Info

Publication number
TW200831714A
TW200831714A TW096109192A TW96109192A TW200831714A TW 200831714 A TW200831714 A TW 200831714A TW 096109192 A TW096109192 A TW 096109192A TW 96109192 A TW96109192 A TW 96109192A TW 200831714 A TW200831714 A TW 200831714A
Authority
TW
Taiwan
Prior art keywords
sheet
pipe
workpiece
pair
shaped
Prior art date
Application number
TW096109192A
Other languages
English (en)
Chinese (zh)
Other versions
TWI351448B (ko
Inventor
Isao Wada
Yasushi Hatano
Original Assignee
Plant Co Ltd I
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plant Co Ltd I filed Critical Plant Co Ltd I
Publication of TW200831714A publication Critical patent/TW200831714A/zh
Application granted granted Critical
Publication of TWI351448B publication Critical patent/TWI351448B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02Tanks; Installations therefor
    • C25D17/04External supporting frames or structures
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06Suspending or supporting devices for articles to be coated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
TW096109192A 2007-01-22 2007-03-16 Guide device used for electroplating treatment system TW200831714A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007011957A JP2008174827A (ja) 2007-01-22 2007-01-22 電気メッキ処理システムに用いられるガイド装置

Publications (2)

Publication Number Publication Date
TW200831714A true TW200831714A (en) 2008-08-01
TWI351448B TWI351448B (ko) 2011-11-01

Family

ID=39702048

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096109192A TW200831714A (en) 2007-01-22 2007-03-16 Guide device used for electroplating treatment system

Country Status (3)

Country Link
JP (1) JP2008174827A (ko)
KR (1) KR20080069108A (ko)
TW (1) TW200831714A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106591932A (zh) * 2016-12-30 2017-04-26 宁波工程学院 用于深孔电镀的电镀制具及电镀方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009287098A (ja) * 2008-05-30 2009-12-10 I Plant:Kk メッキ処理装置
JP5398223B2 (ja) * 2008-10-23 2014-01-29 上村工業株式会社 処理液槽のゲート装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5818798B2 (ja) * 1980-01-14 1983-04-14 東洋技研工業株式会社 プリント配線基板のスル−ホ−ルめつき方法とその装置
JP2642282B2 (ja) * 1992-08-11 1997-08-20 新日本製鐵株式会社 液体供給装置
JPH07331493A (ja) * 1994-06-08 1995-12-19 C Uyemura & Co Ltd 小幅スリットノズル装置
JP3366319B2 (ja) * 2000-07-25 2003-01-14 和夫 大場 連続自動メッキ装置
JP3382610B1 (ja) * 2001-10-15 2003-03-04 丸仲工業株式会社 メッキ液噴出管を設けた液中搬送式のメッキ処理装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106591932A (zh) * 2016-12-30 2017-04-26 宁波工程学院 用于深孔电镀的电镀制具及电镀方法
CN106591932B (zh) * 2016-12-30 2023-09-29 宁波工程学院 用于深孔电镀的电镀制具及电镀方法

Also Published As

Publication number Publication date
TWI351448B (ko) 2011-11-01
KR20080069108A (ko) 2008-07-25
JP2008174827A (ja) 2008-07-31

Similar Documents

Publication Publication Date Title
KR101641475B1 (ko) 판상 제품의 전해 처리를 위한 장치 및 방법
KR101613406B1 (ko) 기판상의 수직방향 갈바닉 금속 성막을 위한 디바이스
KR101917848B1 (ko) 석션 도금장치
TW201127997A (en) Plating tank
TW548348B (en) Rotary element for making electric contact, array of at least two rotary elements, and method of placing board-shaped work electrolytically to be processed in electric contact in continuous processing plants
TW200906497A (en) Apparatus and method for the wet chemical treatment of a product and method for installing a flow member into the apparatus
TW200831714A (en) Guide device used for electroplating treatment system
JP2005519200A (ja) 加工物を湿式処理するコンベアによる水平処理ラインおよび方法
JP2006118019A (ja) 平板形状物の表面処理方法および表面処理装置
JP6115309B2 (ja) 化学処理装置
KR101603503B1 (ko) 롤투롤 공정의 인쇄회로기판 수직 도금에서 플러드 박스를 이용한 도금 장치
JP2015063717A (ja) ワーク保持枠体及びこれを用いためっき処理装置
TW200525051A (en) Method and apparatus for carrying and treating flat material without contact by continuous equipment
TWI615510B (zh) 吸入鍍覆裝置
KR102010679B1 (ko) 갈바닉 금속 디포지션을 위한 수평 갈바닉 도금 프로세싱 라인의 갈바닉 도금 디바이스 및 그것의 사용
JP2007224365A (ja) 電解めっき方法、及び電解めっき装置
TWI404833B (zh) 電鍍系統及電鍍方法
US20240141534A1 (en) Distribution system for a process fluid for chemical and/or electrolytic surface treatment of a substrate
JP3936262B2 (ja) メッキ処理装置
JPH1053892A (ja) 基板のパターン電気めっき装置及び電気メッキ方法
KR20070077901A (ko) 고속 도금 장치 및 고속 도금 방법
JP2015157984A (ja) 部分めっき方法及び部分めっき装置
JP2011058098A (ja) 平板形状物の表面処理装置
JPH10298799A (ja) めっき装置
KR20220139646A (ko) 수직 연속형 동도금 장치 및 방법

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees