TW200831714A - Guide device used for electroplating treatment system - Google Patents
Guide device used for electroplating treatment system Download PDFInfo
- Publication number
- TW200831714A TW200831714A TW096109192A TW96109192A TW200831714A TW 200831714 A TW200831714 A TW 200831714A TW 096109192 A TW096109192 A TW 096109192A TW 96109192 A TW96109192 A TW 96109192A TW 200831714 A TW200831714 A TW 200831714A
- Authority
- TW
- Taiwan
- Prior art keywords
- sheet
- pipe
- workpiece
- pair
- shaped
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
- C25D17/04—External supporting frames or structures
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007011957A JP2008174827A (ja) | 2007-01-22 | 2007-01-22 | 電気メッキ処理システムに用いられるガイド装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200831714A true TW200831714A (en) | 2008-08-01 |
TWI351448B TWI351448B (ko) | 2011-11-01 |
Family
ID=39702048
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096109192A TW200831714A (en) | 2007-01-22 | 2007-03-16 | Guide device used for electroplating treatment system |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2008174827A (ko) |
KR (1) | KR20080069108A (ko) |
TW (1) | TW200831714A (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106591932A (zh) * | 2016-12-30 | 2017-04-26 | 宁波工程学院 | 用于深孔电镀的电镀制具及电镀方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009287098A (ja) * | 2008-05-30 | 2009-12-10 | I Plant:Kk | メッキ処理装置 |
JP5398223B2 (ja) * | 2008-10-23 | 2014-01-29 | 上村工業株式会社 | 処理液槽のゲート装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5818798B2 (ja) * | 1980-01-14 | 1983-04-14 | 東洋技研工業株式会社 | プリント配線基板のスル−ホ−ルめつき方法とその装置 |
JP2642282B2 (ja) * | 1992-08-11 | 1997-08-20 | 新日本製鐵株式会社 | 液体供給装置 |
JPH07331493A (ja) * | 1994-06-08 | 1995-12-19 | C Uyemura & Co Ltd | 小幅スリットノズル装置 |
JP3366319B2 (ja) * | 2000-07-25 | 2003-01-14 | 和夫 大場 | 連続自動メッキ装置 |
JP3382610B1 (ja) * | 2001-10-15 | 2003-03-04 | 丸仲工業株式会社 | メッキ液噴出管を設けた液中搬送式のメッキ処理装置 |
-
2007
- 2007-01-22 JP JP2007011957A patent/JP2008174827A/ja active Pending
- 2007-03-16 TW TW096109192A patent/TW200831714A/zh not_active IP Right Cessation
- 2007-04-20 KR KR1020070038790A patent/KR20080069108A/ko not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106591932A (zh) * | 2016-12-30 | 2017-04-26 | 宁波工程学院 | 用于深孔电镀的电镀制具及电镀方法 |
CN106591932B (zh) * | 2016-12-30 | 2023-09-29 | 宁波工程学院 | 用于深孔电镀的电镀制具及电镀方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI351448B (ko) | 2011-11-01 |
KR20080069108A (ko) | 2008-07-25 |
JP2008174827A (ja) | 2008-07-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |