TW200745747A - Photosensitive composition, material for forming light sielding-film for display device using the photosensitive composition, and photosensitive transferable material using the photosensitive composition - Google Patents

Photosensitive composition, material for forming light sielding-film for display device using the photosensitive composition, and photosensitive transferable material using the photosensitive composition

Info

Publication number
TW200745747A
TW200745747A TW096109430A TW96109430A TW200745747A TW 200745747 A TW200745747 A TW 200745747A TW 096109430 A TW096109430 A TW 096109430A TW 96109430 A TW96109430 A TW 96109430A TW 200745747 A TW200745747 A TW 200745747A
Authority
TW
Taiwan
Prior art keywords
photosensitive
photosensitive composition
copolymer
sielding
display device
Prior art date
Application number
TW096109430A
Other languages
English (en)
Chinese (zh)
Inventor
Kousaku Yoshimura
Kazuhito Miyake
Hiroki Sasaki
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200745747A publication Critical patent/TW200745747A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Optical Filters (AREA)
TW096109430A 2006-03-23 2007-03-20 Photosensitive composition, material for forming light sielding-film for display device using the photosensitive composition, and photosensitive transferable material using the photosensitive composition TW200745747A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006081771A JP4571087B2 (ja) 2006-03-23 2006-03-23 感光性組成物並びにそれを用いた表示装置用遮光膜形成用材料及び感光性転写材料

Publications (1)

Publication Number Publication Date
TW200745747A true TW200745747A (en) 2007-12-16

Family

ID=38522326

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096109430A TW200745747A (en) 2006-03-23 2007-03-20 Photosensitive composition, material for forming light sielding-film for display device using the photosensitive composition, and photosensitive transferable material using the photosensitive composition

Country Status (5)

Country Link
JP (1) JP4571087B2 (ja)
KR (1) KR20080104320A (ja)
CN (1) CN101405654B (ja)
TW (1) TW200745747A (ja)
WO (1) WO2007108291A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI452425B (zh) * 2011-01-27 2014-09-11 Echem Solutions Corp A developerizable photosensitive resin composition for use in a panel structure
TWI686669B (zh) * 2014-03-31 2020-03-01 日商日鐵化學材料股份有限公司 遮光膜用感光性樹脂組成物、使其硬化而成的遮光膜及彩色濾光片
TWI707200B (zh) * 2015-09-29 2020-10-11 德商馬克專利公司 光敏組合物及色轉變膜、彼等之應用以及製備方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4994136B2 (ja) * 2006-07-26 2012-08-08 富士フイルム株式会社 感光性組成物、感光性樹脂転写フイルム及びフォトスペーサーの製造方法並びに液晶表示装置用基板、及び液晶表示装置
JP2008202006A (ja) * 2007-02-22 2008-09-04 Fujifilm Corp 含フッ素化合物、樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
JP2009244619A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp カラーフィルタ及びその製造方法、ならびに液晶表示装置
TWI516450B (zh) * 2009-10-19 2016-01-11 富士軟片股份有限公司 鈦黑分散物、感光性樹脂組成物、晶圓級透鏡、遮光膜及其製造方法、以及固態攝像元件
JP5657337B2 (ja) * 2009-10-19 2015-01-21 富士フイルム株式会社 ウエハレベルレンズ用チタンブラック分散物、それを含有する感光性樹脂組成物、及び、ウエハレベルレンズ
CN102652284B (zh) * 2009-12-11 2014-10-08 富士胶片株式会社 黑色可固化组合物、遮光彩色滤光片、遮光膜及其制备方法，晶片级透镜，以及固态成像器件
JP5997431B2 (ja) * 2011-11-02 2016-09-28 旭化成株式会社 感光性樹脂組成物
WO2017209002A1 (ja) * 2016-05-31 2017-12-07 富士フイルム株式会社 感光性樹脂組成物、転写フィルム、パターンの製造方法、加飾パターン、及びタッチパネル
JP6685461B2 (ja) * 2017-02-22 2020-04-22 富士フイルム株式会社 感光性転写材料、回路配線の製造方法及びタッチパネルの製造方法
JP7252318B2 (ja) * 2019-03-26 2023-04-04 富士フイルム株式会社 感光性樹脂組成物、転写フィルム、硬化膜、積層体、及び、タッチパネルの製造方法
RU2745015C2 (ru) * 2019-04-17 2021-03-18 Федеральное государственное автономное образовательное учреждение высшего образования "Уральский федеральный университет имени первого Президента России Б.Н. Ельцина" Способ получения фоточувствительных слоев селенида свинца

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4220796B2 (ja) * 2003-02-04 2009-02-04 富士フイルム株式会社 ブラックマトリックス作製用組成物及び感光性転写材料、ブラックマトリックス及びその製造方法、カラーフィルター、液晶表示素子並びにブラックマトリックス基板
JP2004279662A (ja) * 2003-03-14 2004-10-07 Fuji Photo Film Co Ltd 重合性平版印刷版
JP4401112B2 (ja) * 2003-06-23 2010-01-20 富士フイルム株式会社 ブラックマトリックス作製用着色組成物および感光性転写材料、ブラックマトリックス、並びに、カラーフィルター
JP2005271576A (ja) * 2004-01-09 2005-10-06 Fuji Photo Film Co Ltd 平版印刷版原版及びそれを用いた平版印刷方法
JP2005266166A (ja) * 2004-03-17 2005-09-29 Fuji Photo Film Co Ltd 感光性転写材料およびそれを用いたプリント配線基板の製造方法
JP2005309425A (ja) * 2004-03-25 2005-11-04 Fuji Photo Film Co Ltd 平版印刷版原版

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI452425B (zh) * 2011-01-27 2014-09-11 Echem Solutions Corp A developerizable photosensitive resin composition for use in a panel structure
TWI686669B (zh) * 2014-03-31 2020-03-01 日商日鐵化學材料股份有限公司 遮光膜用感光性樹脂組成物、使其硬化而成的遮光膜及彩色濾光片
TWI707200B (zh) * 2015-09-29 2020-10-11 德商馬克專利公司 光敏組合物及色轉變膜、彼等之應用以及製備方法
TWI749817B (zh) * 2015-09-29 2021-12-11 德商馬克專利公司 光敏組合物及色轉變膜、彼等之應用以及製備方法
US11269255B2 (en) 2015-09-29 2022-03-08 Merck Patent Gmbh Photosensitive composition and color converting film

Also Published As

Publication number Publication date
KR20080104320A (ko) 2008-12-02
CN101405654A (zh) 2009-04-08
JP2007256683A (ja) 2007-10-04
JP4571087B2 (ja) 2010-10-27
CN101405654B (zh) 2012-03-07
WO2007108291A1 (ja) 2007-09-27

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