TW200745747A - Photosensitive composition, material for forming light sielding-film for display device using the photosensitive composition, and photosensitive transferable material using the photosensitive composition - Google Patents

Photosensitive composition, material for forming light sielding-film for display device using the photosensitive composition, and photosensitive transferable material using the photosensitive composition

Info

Publication number
TW200745747A
TW200745747A TW096109430A TW96109430A TW200745747A TW 200745747 A TW200745747 A TW 200745747A TW 096109430 A TW096109430 A TW 096109430A TW 96109430 A TW96109430 A TW 96109430A TW 200745747 A TW200745747 A TW 200745747A
Authority
TW
Taiwan
Prior art keywords
photosensitive
photosensitive composition
copolymer
sielding
display device
Prior art date
Application number
TW096109430A
Other languages
Chinese (zh)
Inventor
Kousaku Yoshimura
Kazuhito Miyake
Hiroki Sasaki
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200745747A publication Critical patent/TW200745747A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Abstract

The invention provides a photosensitive material havings a metal particle and/or a metal-containing particle; an alkali-soluble resin; an addition polyrderizable monomer having an ethylenic unsaturated double bond; and a photopolymerization initiator. The alkali-soluble resin is a .copolymer including a repeating unit B represented by the following Formula (1). An amount of the repeating unit Bis 30 to 90 mass% relative to a total amount of the copolymer. An acid value of the copolymer is 50 mgKOH/g or more. An I/O value of the copolymer is 0.45 to 0.65. In Formula (1), R1 representsa hydrogen atom or a methyl group, and R2 represents an alkyl group which has 2 to 8 carbon atoms and may have a cyclic structure or a branched structure. The invention further provides a material for forming a light sielding-film for display device and a photosensitive transferable material using the photosensitive composition.
TW096109430A 2006-03-23 2007-03-20 Photosensitive composition, material for forming light sielding-film for display device using the photosensitive composition, and photosensitive transferable material using the photosensitive composition TW200745747A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006081771A JP4571087B2 (en) 2006-03-23 2006-03-23 Photosensitive composition, light-shielding film forming material for display device using the same, and photosensitive transfer material

Publications (1)

Publication Number Publication Date
TW200745747A true TW200745747A (en) 2007-12-16

Family

ID=38522326

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096109430A TW200745747A (en) 2006-03-23 2007-03-20 Photosensitive composition, material for forming light sielding-film for display device using the photosensitive composition, and photosensitive transferable material using the photosensitive composition

Country Status (5)

Country Link
JP (1) JP4571087B2 (en)
KR (1) KR20080104320A (en)
CN (1) CN101405654B (en)
TW (1) TW200745747A (en)
WO (1) WO2007108291A1 (en)

Cited By (3)

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TWI452425B (en) * 2011-01-27 2014-09-11 Echem Solutions Corp A developerizable photosensitive resin composition for use in a panel structure
TWI686669B (en) * 2014-03-31 2020-03-01 日商日鐵化學材料股份有限公司 Photosensitive resin composition for light shielding film, light shielding film using the same, and color filter including that film
TWI707200B (en) * 2015-09-29 2020-10-11 德商馬克專利公司 A photosensitive composition and color converting film, applications thereof and methods for preparing the same

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JP4994136B2 (en) * 2006-07-26 2012-08-08 富士フイルム株式会社 Photosensitive composition, photosensitive resin transfer film, photospacer production method, liquid crystal display substrate, and liquid crystal display device
JP2008202006A (en) * 2007-02-22 2008-09-04 Fujifilm Corp Fluorine-containing compound, resin composition, photosensitive transfer material, partition wall and its forming method, color filter and its manufacturing method, and display device
JP2009244619A (en) * 2008-03-31 2009-10-22 Fujifilm Corp Color filter and method of manufacturing the same, and liquid crystal display device
TWI516450B (en) * 2009-10-19 2016-01-11 富士軟片股份有限公司 Titanium black dispersion, photosensitive resin composition, wafer level lens, light-shielding film and producing method thereof, and solid-state image pick-up device
JP5657337B2 (en) * 2009-10-19 2015-01-21 富士フイルム株式会社 Titanium black dispersion for wafer level lens, photosensitive resin composition containing the same, and wafer level lens
SG181620A1 (en) * 2009-12-11 2012-07-30 Fujifilm Corp Black curable composition, light-shielding color filter, light-shielding film and method for manufacturing the same, wafer level lens, and solid-state imaging device
JP5997431B2 (en) * 2011-11-02 2016-09-28 旭化成株式会社 Photosensitive resin composition
CN109154775A (en) * 2016-05-31 2019-01-04 富士胶片株式会社 Photosensitive polymer combination, transfer film, the manufacturing method of pattern, decorative pattern and touch panel
JP6685461B2 (en) * 2017-02-22 2020-04-22 富士フイルム株式会社 Photosensitive transfer material, method for manufacturing circuit wiring, and method for manufacturing touch panel
CN113632005A (en) * 2019-03-26 2021-11-09 富士胶片株式会社 Photosensitive resin composition, transfer film, cured film, laminate, and method for producing touch panel
RU2745015C2 (en) * 2019-04-17 2021-03-18 Федеральное государственное автономное образовательное учреждение высшего образования "Уральский федеральный университет имени первого Президента России Б.Н. Ельцина" Method of producing photosensitive layers of lead selenide

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4220796B2 (en) * 2003-02-04 2009-02-04 富士フイルム株式会社 Black matrix preparation composition and photosensitive transfer material, black matrix and manufacturing method thereof, color filter, liquid crystal display device, and black matrix substrate
JP2004279662A (en) * 2003-03-14 2004-10-07 Fuji Photo Film Co Ltd Polymerizable lithographic printing plate
JP4401112B2 (en) * 2003-06-23 2010-01-20 富士フイルム株式会社 Coloring composition and photosensitive transfer material for producing black matrix, black matrix, and color filter
JP2005271576A (en) * 2004-01-09 2005-10-06 Fuji Photo Film Co Ltd Lithographic printing plate original form and lithographic printing method using that
JP2005266166A (en) * 2004-03-17 2005-09-29 Fuji Photo Film Co Ltd Photosensitive transfer material and method for manufacturing printed wiring board using the same
JP2005309425A (en) * 2004-03-25 2005-11-04 Fuji Photo Film Co Ltd Lithographic printing original plate

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI452425B (en) * 2011-01-27 2014-09-11 Echem Solutions Corp A developerizable photosensitive resin composition for use in a panel structure
TWI686669B (en) * 2014-03-31 2020-03-01 日商日鐵化學材料股份有限公司 Photosensitive resin composition for light shielding film, light shielding film using the same, and color filter including that film
TWI707200B (en) * 2015-09-29 2020-10-11 德商馬克專利公司 A photosensitive composition and color converting film, applications thereof and methods for preparing the same
TWI749817B (en) * 2015-09-29 2021-12-11 德商馬克專利公司 A photosensitive composition and color converting film, applications thereof and methods for preparing the same
US11269255B2 (en) 2015-09-29 2022-03-08 Merck Patent Gmbh Photosensitive composition and color converting film

Also Published As

Publication number Publication date
CN101405654A (en) 2009-04-08
JP2007256683A (en) 2007-10-04
WO2007108291A1 (en) 2007-09-27
JP4571087B2 (en) 2010-10-27
CN101405654B (en) 2012-03-07
KR20080104320A (en) 2008-12-02

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