TW200745506A - Method of measuring amount of eccentricity - Google Patents

Method of measuring amount of eccentricity

Info

Publication number
TW200745506A
TW200745506A TW096119269A TW96119269A TW200745506A TW 200745506 A TW200745506 A TW 200745506A TW 096119269 A TW096119269 A TW 096119269A TW 96119269 A TW96119269 A TW 96119269A TW 200745506 A TW200745506 A TW 200745506A
Authority
TW
Taiwan
Prior art keywords
point
cross
image
shaped
center
Prior art date
Application number
TW096119269A
Other languages
English (en)
Chinese (zh)
Other versions
TWI327639B (https=
Inventor
Ping Sun
Takayuki Saito
Original Assignee
Fujinon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujinon Corp filed Critical Fujinon Corp
Publication of TW200745506A publication Critical patent/TW200745506A/zh
Application granted granted Critical
Publication of TWI327639B publication Critical patent/TWI327639B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G01M11/0264—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested by using targets or reference patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0221—Testing optical properties by determining the optical axis or position of lenses

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
TW096119269A 2006-06-06 2007-05-30 Method of measuring amount of eccentricity TW200745506A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006157198A JP4774332B2 (ja) 2006-06-06 2006-06-06 偏芯量測定方法

Publications (2)

Publication Number Publication Date
TW200745506A true TW200745506A (en) 2007-12-16
TWI327639B TWI327639B (https=) 2010-07-21

Family

ID=38928343

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096119269A TW200745506A (en) 2006-06-06 2007-05-30 Method of measuring amount of eccentricity

Country Status (4)

Country Link
JP (1) JP4774332B2 (https=)
KR (1) KR100923059B1 (https=)
CN (1) CN100567888C (https=)
TW (1) TW200745506A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI396837B (zh) * 2008-06-10 2013-05-21 Fujinon Corp Method for determination of eccentricity

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5359048B2 (ja) * 2008-06-20 2013-12-04 株式会社ニコン 偏芯測定装置および偏芯測定方法
JP5317619B2 (ja) * 2008-10-06 2013-10-16 富士フイルム株式会社 偏芯量測定方法
JP2010230578A (ja) 2009-03-27 2010-10-14 Fujifilm Corp 偏芯量測定方法
JP5222796B2 (ja) * 2009-06-08 2013-06-26 富士フイルム株式会社 光学素子の偏芯調整組立方法および偏芯調整組立装置
JP2010281792A (ja) * 2009-06-08 2010-12-16 Fujifilm Corp 非球面体測定方法および装置
JP2011069797A (ja) * 2009-09-28 2011-04-07 Saxa Inc 変位量測定装置及び変位量測定方法
JP6075993B2 (ja) * 2012-08-02 2017-02-08 株式会社ディスコ 板状ワーク中心検出方法
CN102879182B (zh) * 2012-09-27 2014-12-24 中国科学院长春光学精密机械与物理研究所 采用激光跟踪仪检测离轴非球面偏心量的方法
CN104101482B (zh) * 2013-04-10 2016-08-10 致茂电子(苏州)有限公司 发光模块检测装置以及发光模块检测方法
CN103940377B (zh) * 2014-03-26 2017-01-04 中国科学院长春光学精密机械与物理研究所 光学镜头球心偏差测量装置
KR101538129B1 (ko) * 2014-10-24 2015-07-23 한국표준과학연구원 검안용 굴절력계용 표준렌즈
CN104406547B (zh) * 2014-12-09 2017-11-07 上海新跃仪表厂 一种光学零件的偏心量测量装置及其测量方法
CN108139205B (zh) 2015-10-23 2020-01-03 卡驰诺光电系统股份有限公司 光学元件特性测定装置
CN107339955B (zh) * 2017-01-07 2020-11-13 深圳市灿锐科技有限公司 一种高精度透镜中心偏检测仪器及其测量方法
CN107843213B (zh) * 2017-10-23 2020-06-16 北京理工大学 共焦自准直中心偏和曲率半径测量方法与装置
CN109946046B (zh) * 2017-12-21 2022-01-07 宁波舜宇车载光学技术有限公司 偏心测试装置及方法
DE112019000745T5 (de) * 2018-03-12 2020-10-22 Fujifilm Corporation Exzentrizitätsmessvorrichtung und exzentrizitätsmessverfahren
CN110595736A (zh) * 2019-08-20 2019-12-20 扬州辰亚光学科技有限公司 一种光学零件的偏心量测量装置
CN114216362B (zh) * 2021-12-15 2023-09-15 中国科学院合肥物质科学研究院 一种基于图像处理自动测量校靶镜机械轴线偏差的方法
CN117405358B (zh) * 2023-08-29 2024-07-19 河南微米光学科技有限公司 分离式光学透镜偏心仪

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2842310B2 (ja) * 1995-07-27 1999-01-06 日本電気株式会社 光モジュール光軸調整装置及び方法
JP3414975B2 (ja) * 1997-03-06 2003-06-09 日立電子エンジニアリング株式会社 位置ずれ量測定装置
JP4425449B2 (ja) * 2000-09-28 2010-03-03 フジノン株式会社 斜入射干渉計装置
JP2004309514A (ja) * 2003-04-01 2004-11-04 Pulstec Industrial Co Ltd ピンホール素子および同素子を用いた光学装置
JP2005024254A (ja) * 2003-06-30 2005-01-27 Mitsutoyo Corp 情報処理装置、情報処理装置の校正方法、情報処理プログラム、このプログラムを記録した記録媒体、偏芯測定装置
JP2005055202A (ja) * 2003-08-06 2005-03-03 Mitsutoyo Corp 偏芯測定装置、レンズ取付方法およびレンズ偏芯検査方法
JP4474150B2 (ja) * 2003-11-28 2010-06-02 キヤノン株式会社 偏心測定方法
JP4555021B2 (ja) 2004-08-04 2010-09-29 株式会社 ソキア・トプコン 測量機検査方法及びこの検査方法に使用するコリメータ

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI396837B (zh) * 2008-06-10 2013-05-21 Fujinon Corp Method for determination of eccentricity

Also Published As

Publication number Publication date
JP4774332B2 (ja) 2011-09-14
CN100567888C (zh) 2009-12-09
JP2007327771A (ja) 2007-12-20
CN101086445A (zh) 2007-12-12
KR20070116721A (ko) 2007-12-11
KR100923059B1 (ko) 2009-10-22
TWI327639B (https=) 2010-07-21

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