TW200745506A - Method of measuring amount of eccentricity - Google Patents

Method of measuring amount of eccentricity

Info

Publication number
TW200745506A
TW200745506A TW096119269A TW96119269A TW200745506A TW 200745506 A TW200745506 A TW 200745506A TW 096119269 A TW096119269 A TW 096119269A TW 96119269 A TW96119269 A TW 96119269A TW 200745506 A TW200745506 A TW 200745506A
Authority
TW
Taiwan
Prior art keywords
point
cross
image
shaped
center
Prior art date
Application number
TW096119269A
Other languages
Chinese (zh)
Other versions
TWI327639B (en
Inventor
Ping Sun
Takayuki Saito
Original Assignee
Fujinon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujinon Corp filed Critical Fujinon Corp
Publication of TW200745506A publication Critical patent/TW200745506A/en
Application granted granted Critical
Publication of TWI327639B publication Critical patent/TWI327639B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G01M11/0264—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested by using targets or reference patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0221—Testing optical properties by determining the optical axis or position of lenses

Abstract

To substantially improve measurement accuracy by a simple constitution, in a technique for measuring the amount of eccentricity to which an autocollimation method is applied. A lens to be inspected is set at a prescribed position of rotation angle (S3), horizontal lines P1 and P2 which intersect with an image vertical line of a reticle are set (S4), vertical lines Q1 and Q2 which intersect with an image horizonal line of the reticle are set (S5), an A-point and a B-point of light intensity peak locations on the horizontal lines P1 and P2 and a C-point and a D-point of light intensity peak locations on the vertical lines Q1 and Q2 are specified (S6, 7), and a cross-shaped vertical line, connecting the A-point and B-point and a cross-shaped horizontal line connecting the C-point and the D-point are determined (S8, 9). After this, the intersection between the cross-shaped vertical line and the cross-shaped horizontal line is specified (S10) to specify the center position of gravity of light intensity within a square region centered at the intersection to be the center point R of the image of the cross-shaped reticle (S11). A locus circle of image center is determined, on the basis of each center point R at a plurality of rotational positions (S14), and the radius of the locus circle of image center is taken as the amount of eccentricity Ec of the surface to be inspected (S15).
TW096119269A 2006-06-06 2007-05-30 Method of measuring amount of eccentricity TW200745506A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006157198A JP4774332B2 (en) 2006-06-06 2006-06-06 Eccentricity measurement method

Publications (2)

Publication Number Publication Date
TW200745506A true TW200745506A (en) 2007-12-16
TWI327639B TWI327639B (en) 2010-07-21

Family

ID=38928343

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096119269A TW200745506A (en) 2006-06-06 2007-05-30 Method of measuring amount of eccentricity

Country Status (4)

Country Link
JP (1) JP4774332B2 (en)
KR (1) KR100923059B1 (en)
CN (1) CN100567888C (en)
TW (1) TW200745506A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI396837B (en) * 2008-06-10 2013-05-21 Fujinon Corp Method for determination of eccentricity

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JP5359048B2 (en) * 2008-06-20 2013-12-04 株式会社ニコン Eccentricity measuring apparatus and eccentricity measuring method
JP5317619B2 (en) * 2008-10-06 2013-10-16 富士フイルム株式会社 Eccentricity measurement method
JP2010230578A (en) 2009-03-27 2010-10-14 Fujifilm Corp Method of measuring amount of eccentricity
JP5222796B2 (en) * 2009-06-08 2013-06-26 富士フイルム株式会社 Optical element eccentricity adjustment assembly method and eccentricity adjustment assembly apparatus
JP2010281792A (en) * 2009-06-08 2010-12-16 Fujifilm Corp Method and apparatus for measuring aspherical surface object
JP2011069797A (en) * 2009-09-28 2011-04-07 Saxa Inc Displacement measuring device and displacement measuring method
JP6075993B2 (en) * 2012-08-02 2017-02-08 株式会社ディスコ Plate work center detection method
CN102879182B (en) * 2012-09-27 2014-12-24 中国科学院长春光学精密机械与物理研究所 Method for measuring off-axis aspheric surface eccentricity by laser tracker
CN104101482B (en) * 2013-04-10 2016-08-10 致茂电子(苏州)有限公司 Light emitting module detection device and light emitting module detection method
CN103940377B (en) * 2014-03-26 2017-01-04 中国科学院长春光学精密机械与物理研究所 Optical lens centre of sphere deviation measurement device
KR101538129B1 (en) * 2014-10-24 2015-07-23 한국표준과학연구원 Standard lens for eye refractometer
CN104406547B (en) * 2014-12-09 2017-11-07 上海新跃仪表厂 The eccentric measuring device and its measuring method of a kind of optical element
WO2017068813A1 (en) 2015-10-23 2017-04-27 株式会社カツラ・オプト・システムズ Device for measuring characteristics of optical element
CN107339955B (en) * 2017-01-07 2020-11-13 深圳市灿锐科技有限公司 High-precision lens center deviation detection instrument and measurement method thereof
CN107843213B (en) * 2017-10-23 2020-06-16 北京理工大学 Confocal auto-collimation center deviation and curvature radius measuring method and device
CN109946046B (en) * 2017-12-21 2022-01-07 宁波舜宇车载光学技术有限公司 Eccentricity testing device and method
JP6874211B2 (en) * 2018-03-12 2021-05-19 富士フイルム株式会社 Eccentricity measuring device and method
CN110595736A (en) * 2019-08-20 2019-12-20 扬州辰亚光学科技有限公司 Eccentricity measuring device of optical part
CN114216362B (en) * 2021-12-15 2023-09-15 中国科学院合肥物质科学研究院 Method for automatically measuring mechanical axis deviation of target correcting mirror based on image processing

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JP2842310B2 (en) * 1995-07-27 1999-01-06 日本電気株式会社 Optical module optical axis adjusting apparatus and method
JP3414975B2 (en) * 1997-03-06 2003-06-09 日立電子エンジニアリング株式会社 Position shift amount measuring device
JP4425449B2 (en) * 2000-09-28 2010-03-03 フジノン株式会社 Oblique incidence interferometer device
JP2004309514A (en) * 2003-04-01 2004-11-04 Pulstec Industrial Co Ltd Pinhole element, and optical device using pinhole element
JP2005024254A (en) * 2003-06-30 2005-01-27 Mitsutoyo Corp Information processor, calibration method for the same, information processing program, record medium recording the program, and eccentricity measuring apparatus
JP2005055202A (en) * 2003-08-06 2005-03-03 Mitsutoyo Corp Eccentricity measuring device, lens mounting method, and eccentricity measuring method for lens
JP4474150B2 (en) * 2003-11-28 2010-06-02 キヤノン株式会社 Eccentricity measurement method
JP4555021B2 (en) 2004-08-04 2010-09-29 株式会社 ソキア・トプコン Surveyor inspection method and collimator used in this inspection method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI396837B (en) * 2008-06-10 2013-05-21 Fujinon Corp Method for determination of eccentricity

Also Published As

Publication number Publication date
TWI327639B (en) 2010-07-21
CN101086445A (en) 2007-12-12
CN100567888C (en) 2009-12-09
JP4774332B2 (en) 2011-09-14
KR100923059B1 (en) 2009-10-22
KR20070116721A (en) 2007-12-11
JP2007327771A (en) 2007-12-20

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MM4A Annulment or lapse of patent due to non-payment of fees