TW200732843A - Photosensitive resin composition and manufacturing method of semiconductor device using the same - Google Patents

Photosensitive resin composition and manufacturing method of semiconductor device using the same

Info

Publication number
TW200732843A
TW200732843A TW096102479A TW96102479A TW200732843A TW 200732843 A TW200732843 A TW 200732843A TW 096102479 A TW096102479 A TW 096102479A TW 96102479 A TW96102479 A TW 96102479A TW 200732843 A TW200732843 A TW 200732843A
Authority
TW
Taiwan
Prior art keywords
manufacturing
semiconductor device
resin composition
photosensitive resin
same
Prior art date
Application number
TW096102479A
Other languages
English (en)
Other versions
TWI390351B (zh
Inventor
Kenichiro Sato
Tsukasa Yamanaka
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200732843A publication Critical patent/TW200732843A/zh
Application granted granted Critical
Publication of TWI390351B publication Critical patent/TWI390351B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F7/00—Signs, name or number plates, letters, numerals, or symbols; Panels or boards
    • G09F7/02—Signs, plates, panels or boards using readily-detachable elements bearing or forming symbols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F13/00—Illuminated signs; Luminous advertising
    • G09F13/04—Signs, boards or panels, illuminated from behind the insignia
    • G09F13/0413—Frames or casing structures therefor
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F13/00—Illuminated signs; Luminous advertising
    • G09F13/04—Signs, boards or panels, illuminated from behind the insignia
    • G09F13/0418—Constructional details
    • G09F13/0445—Frames
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F7/00—Signs, name or number plates, letters, numerals, or symbols; Panels or boards
    • G09F7/16—Letters, numerals, or other symbols adapted for permanent fixing to a support
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F13/00—Illuminated signs; Luminous advertising
    • G09F13/18—Edge-illuminated signs
    • G09F2013/1886—Special effects
    • G09F2013/189—Three dimensional effects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Materials For Photolithography (AREA)
  • Polyamides (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW096102479A 2006-01-24 2007-01-23 感光性樹脂組成物及使用它之半導體裝置之製法 TWI390351B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006015346A JP4625769B2 (ja) 2006-01-24 2006-01-24 感光性樹脂組成物及びそれを用いた半導体装置の製造方法

Publications (2)

Publication Number Publication Date
TW200732843A true TW200732843A (en) 2007-09-01
TWI390351B TWI390351B (zh) 2013-03-21

Family

ID=37812861

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096102479A TWI390351B (zh) 2006-01-24 2007-01-23 感光性樹脂組成物及使用它之半導體裝置之製法

Country Status (5)

Country Link
US (1) US7368216B2 (zh)
EP (1) EP1811340A3 (zh)
JP (1) JP4625769B2 (zh)
KR (1) KR20070077795A (zh)
TW (1) TWI390351B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI386436B (zh) * 2007-12-26 2013-02-21 Asahi Kasei Emd Corp A heat-resistant resin precursor, and a photosensitive resin composition using the same
TWI707889B (zh) * 2017-08-01 2020-10-21 日商旭化成股份有限公司 半導體裝置及其製造方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007225942A (ja) * 2006-02-24 2007-09-06 Asahi Kasei Electronics Co Ltd ポジ型感光性樹脂組成物
JP4911454B2 (ja) 2006-09-19 2012-04-04 富士フイルム株式会社 ポリベンゾオキサゾール前駆体、それを用いた感光性樹脂組成物及び半導体装置の製造方法
MY155853A (en) * 2008-07-22 2015-12-15 Sumitomo Bakelite Co Positive photosensitive resin composition, cured film, protecting film, insulating film and semiconductor and display devices using the same.
US8231785B2 (en) * 2009-05-12 2012-07-31 Uop Llc Staged membrane system for gas, vapor, and liquid separations
CN108558671A (zh) * 2018-04-17 2018-09-21 广东医科大学 一种2,2’-二氨基-联苯二甲酸的制备方法
US11822237B2 (en) * 2020-03-30 2023-11-21 Taiwan Semiconductor Manufacturing Company, Ltd. Method of manufacturing a semiconductor device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3442049B2 (ja) * 2000-03-29 2003-09-02 住友ベークライト株式会社 耐熱性樹脂前駆体、耐熱性樹脂及び絶縁膜並びに半導体装置
JP2003221444A (ja) * 2001-11-26 2003-08-05 Kansai Paint Co Ltd ポリベンゾオキサゾール前駆体及びそれを用いた被覆用組成物
KR20030043702A (ko) * 2001-11-26 2003-06-02 간사이 페인트 가부시키가이샤 폴리벤족사졸 전구체 및 그것을 이용하는 피복용 조성물
JP4556616B2 (ja) * 2003-10-28 2010-10-06 住友ベークライト株式会社 ポジ型感光性樹脂組成物、該ポジ型感光性樹脂組成物を用いた半導体装置及び表示素子、並びに半導体装置及び表示素子の製造方法
JP2005148111A (ja) 2003-11-11 2005-06-09 Toray Ind Inc 感光性樹脂前駆体組成物
JP4327616B2 (ja) 2004-01-26 2009-09-09 旭化成イーマテリアルズ株式会社 感光性コーティング樹脂組成物
JP2006018191A (ja) * 2004-07-05 2006-01-19 Sumitomo Bakelite Co Ltd ポジ型感光性樹脂組成物の製造方法並びに半導体装置及び表示素子
US7803510B2 (en) * 2005-08-17 2010-09-28 Fujifilm Electronic Materials U.S.A., Inc. Positive photosensitive polybenzoxazole precursor compositions

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI386436B (zh) * 2007-12-26 2013-02-21 Asahi Kasei Emd Corp A heat-resistant resin precursor, and a photosensitive resin composition using the same
TWI707889B (zh) * 2017-08-01 2020-10-21 日商旭化成股份有限公司 半導體裝置及其製造方法
TWI803315B (zh) * 2017-08-01 2023-05-21 日商旭化成股份有限公司 半導體裝置及其製造方法

Also Published As

Publication number Publication date
JP4625769B2 (ja) 2011-02-02
US7368216B2 (en) 2008-05-06
KR20070077795A (ko) 2007-07-27
TWI390351B (zh) 2013-03-21
EP1811340A3 (en) 2013-12-04
US20070172753A1 (en) 2007-07-26
JP2007199187A (ja) 2007-08-09
EP1811340A2 (en) 2007-07-25

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees