TW200722919A - Pattern-forming material, pattern-forming device, and pattern-forming method - Google Patents

Pattern-forming material, pattern-forming device, and pattern-forming method

Info

Publication number
TW200722919A
TW200722919A TW095133994A TW95133994A TW200722919A TW 200722919 A TW200722919 A TW 200722919A TW 095133994 A TW095133994 A TW 095133994A TW 95133994 A TW95133994 A TW 95133994A TW 200722919 A TW200722919 A TW 200722919A
Authority
TW
Taiwan
Prior art keywords
pattern
forming
forming material
photosensitive layer
exposure
Prior art date
Application number
TW095133994A
Other languages
English (en)
Inventor
Morimasa Sato
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200722919A publication Critical patent/TW200722919A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
TW095133994A 2005-09-16 2006-09-14 Pattern-forming material, pattern-forming device, and pattern-forming method TW200722919A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005270706A JP4942969B2 (ja) 2005-09-16 2005-09-16 パターン形成材料及びパターン形成方法

Publications (1)

Publication Number Publication Date
TW200722919A true TW200722919A (en) 2007-06-16

Family

ID=37864842

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095133994A TW200722919A (en) 2005-09-16 2006-09-14 Pattern-forming material, pattern-forming device, and pattern-forming method

Country Status (3)

Country Link
JP (1) JP4942969B2 (zh)
TW (1) TW200722919A (zh)
WO (1) WO2007032246A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4992534B2 (ja) * 2007-04-27 2012-08-08 三菱化学株式会社 光重合性組成物
WO2017018053A1 (ja) * 2015-07-29 2017-02-02 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP6959887B2 (ja) * 2018-03-26 2021-11-05 ニッコー・マテリアルズ株式会社 感光性樹脂組成物、これを用いたフォトレジストフィルム、及びレジストパターンの形成方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001312056A (ja) * 2000-04-27 2001-11-09 Nichigo Morton Co Ltd 感光性樹脂組成物およびそれを用いてなる感光性フィルム
JP4172209B2 (ja) * 2002-05-31 2008-10-29 日立化成工業株式会社 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造方法及びプリント配線板の製造方法
JP2004191938A (ja) * 2002-11-27 2004-07-08 Mitsubishi Chemicals Corp 青紫色レーザー感光性組成物並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
JP2004287090A (ja) * 2003-03-20 2004-10-14 Hitachi Chem Co Ltd 感光性樹脂組成物層、感光性エレメント、これを用いたレジストパターンの製造方法及びプリント配線板の製造方法
JP2004326084A (ja) * 2003-04-08 2004-11-18 Hitachi Chem Co Ltd 感光性エレメント、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法
JP4305732B2 (ja) * 2003-04-17 2009-07-29 日立化成工業株式会社 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造方法及びプリント配線板の製造方法
JP2004348114A (ja) * 2003-04-28 2004-12-09 Hitachi Chem Co Ltd 感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP4556531B2 (ja) * 2003-09-09 2010-10-06 三菱化学株式会社 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
JP4501390B2 (ja) * 2003-09-29 2010-07-14 日本合成化学工業株式会社 青紫半導体レーザー感光性画像形成材
JP2005128508A (ja) * 2003-10-02 2005-05-19 Mitsubishi Chemicals Corp ネガ型青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
JP2005249970A (ja) * 2004-03-02 2005-09-15 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP2006184840A (ja) * 2004-03-22 2006-07-13 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
TW200622491A (en) * 2004-09-28 2006-07-01 Fuji Photo Film Co Ltd Pattern-forming material, pattern-forming device and pattern-forming method
JP4599974B2 (ja) * 2004-10-04 2010-12-15 日立化成工業株式会社 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP4315892B2 (ja) * 2004-11-25 2009-08-19 東京応化工業株式会社 感光性樹脂組成物、およびこれを用いた感光性ドライフィルム
JP4500657B2 (ja) * 2004-11-30 2010-07-14 旭化成イーマテリアルズ株式会社 パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP2006208730A (ja) * 2005-01-27 2006-08-10 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP2006208733A (ja) * 2005-01-27 2006-08-10 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法

Also Published As

Publication number Publication date
JP2007079474A (ja) 2007-03-29
JP4942969B2 (ja) 2012-05-30
WO2007032246A1 (ja) 2007-03-22

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