TW200713467A - Semiconductor device﹑CMOS device and P-type semiconductor device - Google Patents
Semiconductor device﹑CMOS device and P-type semiconductor deviceInfo
- Publication number
- TW200713467A TW200713467A TW095129773A TW95129773A TW200713467A TW 200713467 A TW200713467 A TW 200713467A TW 095129773 A TW095129773 A TW 095129773A TW 95129773 A TW95129773 A TW 95129773A TW 200713467 A TW200713467 A TW 200713467A
- Authority
- TW
- Taiwan
- Prior art keywords
- semiconductor device
- region
- cmos
- type semiconductor
- family
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 239000013078 crystal Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823807—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the channel structures, e.g. channel implants, halo or pocket implants, or channel materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823821—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of transistors with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823878—Complementary field-effect transistors, e.g. CMOS isolation region manufacturing related aspects, e.g. to avoid interaction of isolation region with adjacent structure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/8252—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using III-V technology
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/8258—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using a combination of technologies covered by H01L21/8206, H01L21/8213, H01L21/822, H01L21/8252, H01L21/8254 or H01L21/8256
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/84—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
- H01L27/0922—Combination of complementary transistors having a different structure, e.g. stacked CMOS, high-voltage and low-voltage CMOS
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1203—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1203—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
- H01L27/1207—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI combined with devices in contact with the semiconductor body, i.e. bulk/SOI hybrid circuits
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/785—Field effect transistors with field effect produced by an insulated gate having a channel with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/220,176 US7737532B2 (en) | 2005-09-06 | 2005-09-06 | Hybrid Schottky source-drain CMOS for high mobility and low barrier |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200713467A true TW200713467A (en) | 2007-04-01 |
TWI312544B TWI312544B (en) | 2009-07-21 |
Family
ID=37829268
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095129773A TWI312544B (en) | 2005-09-06 | 2006-08-14 | Semiconductor device, cmos device and p-type semiconductor device |
Country Status (4)
Country | Link |
---|---|
US (1) | US7737532B2 (zh) |
JP (1) | JP4639172B2 (zh) |
CN (1) | CN1929139A (zh) |
TW (1) | TWI312544B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI476919B (zh) * | 2010-02-10 | 2015-03-11 | Taiwan Semiconductor Mfg Co Ltd | n通道電晶體及反相器電路 |
TWI487039B (zh) * | 2011-09-14 | 2015-06-01 | Broadcom Corp | 半鰭式fet半導體裝置及其製造方法 |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
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US7575975B2 (en) * | 2005-10-31 | 2009-08-18 | Freescale Semiconductor, Inc. | Method for forming a planar and vertical semiconductor structure having a strained semiconductor layer |
JP4960007B2 (ja) * | 2006-04-26 | 2012-06-27 | 株式会社東芝 | 半導体装置及び半導体装置の製造方法 |
US7897994B2 (en) | 2007-06-18 | 2011-03-01 | Texas Instruments Incorporated | Method of making (100) NMOS and (110) PMOS sidewall surface on the same fin orientation for multiple gate MOSFET with DSB substrate |
US7863712B2 (en) * | 2007-10-30 | 2011-01-04 | International Business Machines Corporation | Hybrid orientation semiconductor structure with reduced boundary defects and method of forming same |
EP2073267A1 (en) * | 2007-12-19 | 2009-06-24 | INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM vzw (IMEC) | Method of fabricating multi-gate semiconductor devices and devices obtained |
US20090206416A1 (en) * | 2008-02-19 | 2009-08-20 | International Business Machines Corporation | Dual metal gate structures and methods |
US7943479B2 (en) * | 2008-08-19 | 2011-05-17 | Texas Instruments Incorporated | Integration of high-k metal gate stack into direct silicon bonding (DSB) hybrid orientation technology (HOT) pMOS process flow |
US8241970B2 (en) | 2008-08-25 | 2012-08-14 | International Business Machines Corporation | CMOS with channel P-FinFET and channel N-FinFET having different crystalline orientations and parallel fins |
JP2010258124A (ja) | 2009-04-23 | 2010-11-11 | Renesas Electronics Corp | 半導体装置及び半導体装置の製造方法 |
JP5700621B2 (ja) * | 2009-04-24 | 2015-04-15 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
US8232627B2 (en) * | 2009-09-21 | 2012-07-31 | International Business Machines Corporation | Integrated circuit device with series-connected field effect transistors and integrated voltage equalization and method of forming the device |
CN101771088A (zh) * | 2010-01-21 | 2010-07-07 | 复旦大学 | Pn结和肖特基结混合式二极管及其制备方法 |
US9184050B2 (en) | 2010-07-30 | 2015-11-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Inverted trapezoidal recess for epitaxial growth |
US8378394B2 (en) | 2010-09-07 | 2013-02-19 | International Business Machines Corporation | Method for forming and structure of a recessed source/drain strap for a MUGFET |
US8236634B1 (en) * | 2011-03-17 | 2012-08-07 | International Business Machines Corporation | Integration of fin-based devices and ETSOI devices |
US8871600B2 (en) | 2011-11-11 | 2014-10-28 | International Business Machines Corporation | Schottky barrier diodes with a guard ring formed by selective epitaxy |
US9406518B2 (en) * | 2011-11-18 | 2016-08-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | (110) surface orientation for reducing fermi-level-pinning between high-K dielectric and group III-V compound semiconductor substrate |
CN106847805B (zh) * | 2011-12-23 | 2020-08-21 | 英特尔公司 | 具有包含不同材料取向或组成的纳米线或半导体主体的共衬底半导体器件 |
US8941187B2 (en) * | 2012-01-13 | 2015-01-27 | Globalfoundries Inc. | Strain engineering in three-dimensional transistors based on strained isolation material |
US9059044B2 (en) | 2012-11-15 | 2015-06-16 | International Business Machines Corporation | On-chip diode with fully depleted semiconductor devices |
KR102069609B1 (ko) | 2013-08-12 | 2020-01-23 | 삼성전자주식회사 | 반도체 소자 및 그 제조 방법 |
US9490161B2 (en) * | 2014-04-29 | 2016-11-08 | International Business Machines Corporation | Channel SiGe devices with multiple threshold voltages on hybrid oriented substrates, and methods of manufacturing same |
CN106463533B (zh) * | 2014-06-20 | 2021-09-28 | 英特尔公司 | 高电压晶体管和低电压非平面晶体管的单片集成 |
US11610887B2 (en) * | 2019-01-09 | 2023-03-21 | Intel Corporation | Side-by-side integration of III-n transistors and thin-film transistors |
DE102020112203A1 (de) * | 2020-03-13 | 2021-09-16 | Taiwan Semiconductor Manufacturing Co. Ltd. | Verfahren zum einbetten planarer fets mit finfets |
Family Cites Families (17)
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JPS6292361A (ja) | 1985-10-17 | 1987-04-27 | Toshiba Corp | 相補型半導体装置 |
JPH04372166A (ja) * | 1991-06-21 | 1992-12-25 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
JP3017860B2 (ja) | 1991-10-01 | 2000-03-13 | 株式会社東芝 | 半導体基体およびその製造方法とその半導体基体を用いた半導体装置 |
JP3217015B2 (ja) * | 1996-07-18 | 2001-10-09 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 電界効果トランジスタの形成方法 |
US6261932B1 (en) | 1999-07-29 | 2001-07-17 | Fairchild Semiconductor Corp. | Method of fabricating Schottky diode and related structure |
US6303479B1 (en) | 1999-12-16 | 2001-10-16 | Spinnaker Semiconductor, Inc. | Method of manufacturing a short-channel FET with Schottky-barrier source and drain contacts |
EP1468440A2 (en) | 2002-01-23 | 2004-10-20 | Spinnaker Semiconductor, Inc. | Field effect transistor having source and/or drain forming schottky or schottky−like contact with strained semiconductor substrate |
US6974737B2 (en) | 2002-05-16 | 2005-12-13 | Spinnaker Semiconductor, Inc. | Schottky barrier CMOS fabrication method |
US6869868B2 (en) | 2002-12-13 | 2005-03-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of fabricating a MOSFET device with metal containing gate structures |
US7329923B2 (en) * | 2003-06-17 | 2008-02-12 | International Business Machines Corporation | High-performance CMOS devices on hybrid crystal oriented substrates |
US6911383B2 (en) | 2003-06-26 | 2005-06-28 | International Business Machines Corporation | Hybrid planar and finFET CMOS devices |
JPWO2005022637A1 (ja) * | 2003-08-28 | 2007-11-01 | 日本電気株式会社 | フィン型電界効果トランジスタを有する半導体装置 |
JP2005079277A (ja) * | 2003-08-29 | 2005-03-24 | Toshiba Corp | 電界効果トランジスタ |
JP4439358B2 (ja) * | 2003-09-05 | 2010-03-24 | 株式会社東芝 | 電界効果トランジスタ及びその製造方法 |
US7235433B2 (en) * | 2004-11-01 | 2007-06-26 | Advanced Micro Devices, Inc. | Silicon-on-insulator semiconductor device with silicon layers having different crystal orientations and method of forming the silicon-on-insulator semiconductor device |
US7298009B2 (en) * | 2005-02-01 | 2007-11-20 | Infineon Technologies Ag | Semiconductor method and device with mixed orientation substrate |
JP2006278818A (ja) * | 2005-03-30 | 2006-10-12 | Renesas Technology Corp | 半導体装置 |
-
2005
- 2005-09-06 US US11/220,176 patent/US7737532B2/en active Active
-
2006
- 2006-08-14 TW TW095129773A patent/TWI312544B/zh active
- 2006-08-29 CN CN200610125733.3A patent/CN1929139A/zh active Pending
- 2006-09-01 JP JP2006237361A patent/JP4639172B2/ja active Active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI476919B (zh) * | 2010-02-10 | 2015-03-11 | Taiwan Semiconductor Mfg Co Ltd | n通道電晶體及反相器電路 |
TWI487039B (zh) * | 2011-09-14 | 2015-06-01 | Broadcom Corp | 半鰭式fet半導體裝置及其製造方法 |
US9082751B2 (en) | 2011-09-14 | 2015-07-14 | Broadcom Corporation | Half-FinFET semiconductor device and related method |
Also Published As
Publication number | Publication date |
---|---|
JP2007073960A (ja) | 2007-03-22 |
CN1929139A (zh) | 2007-03-14 |
US7737532B2 (en) | 2010-06-15 |
US20070052027A1 (en) | 2007-03-08 |
JP4639172B2 (ja) | 2011-02-23 |
TWI312544B (en) | 2009-07-21 |
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