TW200642956A - Fumed silica to colloidal silica conversion process - Google Patents

Fumed silica to colloidal silica conversion process

Info

Publication number
TW200642956A
TW200642956A TW095101875A TW95101875A TW200642956A TW 200642956 A TW200642956 A TW 200642956A TW 095101875 A TW095101875 A TW 095101875A TW 95101875 A TW95101875 A TW 95101875A TW 200642956 A TW200642956 A TW 200642956A
Authority
TW
Taiwan
Prior art keywords
colloidal silica
substrate
produce
silicic acid
acid solution
Prior art date
Application number
TW095101875A
Other languages
English (en)
Inventor
Deepak Mahulikar
yu-hu Wang
Original Assignee
Planar Solutions Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Planar Solutions Llc filed Critical Planar Solutions Llc
Publication of TW200642956A publication Critical patent/TW200642956A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • A—HUMAN NECESSITIES
    • A63—SPORTS; GAMES; AMUSEMENTS
    • A63C—SKATES; SKIS; ROLLER SKATES; DESIGN OR LAYOUT OF COURTS, RINKS OR THE LIKE
    • A63C17/00—Roller skates; Skate-boards
    • A63C17/22—Wheels for roller skates
    • A—HUMAN NECESSITIES
    • A63—SPORTS; GAMES; AMUSEMENTS
    • A63C—SKATES; SKIS; ROLLER SKATES; DESIGN OR LAYOUT OF COURTS, RINKS OR THE LIKE
    • A63C17/00—Roller skates; Skate-boards
    • A63C17/04—Roller skates; Skate-boards with wheels arranged otherwise than in two pairs
    • A63C17/06—Roller skates; Skate-boards with wheels arranged otherwise than in two pairs single-track type
    • A—HUMAN NECESSITIES
    • A63—SPORTS; GAMES; AMUSEMENTS
    • A63C—SKATES; SKIS; ROLLER SKATES; DESIGN OR LAYOUT OF COURTS, RINKS OR THE LIKE
    • A63C17/00—Roller skates; Skate-boards
    • A63C17/16—Roller skates; Skate-boards for use on specially shaped or arranged runways
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C01B33/142—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
    • C01B33/143—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
    • C01B33/1435—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates using ion exchangers
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/20—Silicates
    • C01B33/22—Magnesium silicates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Silicon Compounds (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
TW095101875A 2005-06-15 2006-01-18 Fumed silica to colloidal silica conversion process TW200642956A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/152,873 US20060283095A1 (en) 2005-06-15 2005-06-15 Fumed silica to colloidal silica conversion process

Publications (1)

Publication Number Publication Date
TW200642956A true TW200642956A (en) 2006-12-16

Family

ID=37571959

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095101875A TW200642956A (en) 2005-06-15 2006-01-18 Fumed silica to colloidal silica conversion process

Country Status (6)

Country Link
US (1) US20060283095A1 (zh)
EP (1) EP1907222A2 (zh)
JP (1) JP2008546617A (zh)
KR (1) KR20060131605A (zh)
TW (1) TW200642956A (zh)
WO (1) WO2007001485A2 (zh)

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* Cited by examiner, † Cited by third party
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US20070034116A1 (en) * 2005-08-10 2007-02-15 Mac Donald Dennis L Silica sols with controlled minimum particle size and preparation thereof
US8052788B2 (en) * 2005-08-10 2011-11-08 Nalco Company Method of producing silica sols with controllable broad size distribution and minimum particle size
KR20080059266A (ko) * 2005-09-26 2008-06-26 플레이너 솔루션즈 엘엘씨 화학적 기계적 연마 용도로 사용되기 위한 초고순도의콜로이드 실리카
DE102006055469A1 (de) * 2006-11-23 2008-05-29 Universität Paderborn Verfahren zur Herstellung eines Gegenstandes zumindest teilweise mit Siliziumkarbidgefüge aus einem Rohling aus einem kohlenstoffhaltigen Material
KR101484795B1 (ko) * 2007-03-27 2015-01-20 후소카가쿠코교 가부시키가이샤 콜로이달 실리카 및 그의 제조 방법
ES2660828T3 (es) * 2010-02-06 2018-03-26 Cognis Ip Management Gmbh Soluciones de silicato estables al almacenamiento
CN102515177B (zh) * 2011-12-22 2013-07-31 华东理工大学 一种二氧化锡/二氧化硅复合纳米颗粒的制备方法
JP6141710B2 (ja) * 2013-07-16 2017-06-07 野口　崇 高純度合成シリカ粉末の製造方法
CN103497340B (zh) * 2013-09-25 2015-11-18 上海新安纳电子科技有限公司 一种水溶性聚苯乙烯-二氧化硅核壳型复合颗粒的制备方法
BR112016013522B1 (pt) 2013-12-20 2020-11-10 Colgate-Palmolive Company produto para higiene oral e branqueamento dos dentes com partículas de sílica em revestimento de núcleo
EP3084036B1 (en) 2013-12-20 2019-08-14 Colgate-Palmolive Company Core shell silica particles and use for malodor reduction
JP6179418B2 (ja) * 2014-02-13 2017-08-16 三菱ケミカル株式会社 窒化物半導体基板の製造方法
US9737860B2 (en) 2014-02-28 2017-08-22 Pall Corporation Hollow fiber membrane having hexagonal voids
US9610548B2 (en) 2014-02-28 2017-04-04 Pall Corporation Composite porous polymeric membrane with high void volume
US9302228B2 (en) 2014-02-28 2016-04-05 Pall Corporation Charged porous polymeric membrane with high void volume
US9446355B2 (en) 2014-02-28 2016-09-20 Pall Corporation Porous polymeric membrane with high void volume
US9309126B2 (en) 2014-02-28 2016-04-12 Pall Corporation Rapidly dissolvable nanoparticles
US9764292B2 (en) 2014-02-28 2017-09-19 Pall Corporation Porous polymeric membrane with high void volume
US9561473B2 (en) 2014-02-28 2017-02-07 Pall Corporation Charged hollow fiber membrane having hexagonal voids
US9776142B2 (en) 2014-02-28 2017-10-03 Pall Corporation Porous polymeric membrane with high void volume
WO2018217628A1 (en) * 2017-05-25 2018-11-29 Fujifilm Planar Solutions, LLC Chemical mechanical polishing slurry for cobalt applications
CN110010721B (zh) * 2019-03-22 2020-11-06 通威太阳能（合肥）有限公司 一种基于se的碱抛光高效perc电池工艺
CN110482559B (zh) * 2019-09-16 2021-03-30 广东惠和硅制品有限公司 一种铝改性酸性硅溶胶及其制备方法和应用
CN111847462B (zh) * 2020-08-03 2021-03-19 马惠琪 稳定获取指定粒度高纯硅溶胶的方法

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Publication number Priority date Publication date Assignee Title
US4082626A (en) * 1976-12-17 1978-04-04 Rudolf Hradcovsky Process for forming a silicate coating on metal
US4352390A (en) * 1978-12-04 1982-10-05 Sherwood Refractories, Inc. Precision silica cones for sand casting of steel and iron alloys
JP4238951B2 (ja) * 1999-09-28 2009-03-18 株式会社フジミインコーポレーテッド 研磨用組成物およびそれを用いたメモリーハードディスクの製造方法
WO2001053225A1 (en) * 2000-01-24 2001-07-26 Yazaki Corporation Sol-gel process for producing synthetic silica glass
JP4631119B2 (ja) * 2000-01-28 2011-02-16 Ｊｓｒ株式会社 疎水化コロイダルシリカの製造方法
JP3837277B2 (ja) * 2000-06-30 2006-10-25 株式会社東芝 銅の研磨に用いる化学機械研磨用水系分散体及び化学機械研磨方法
JP2003142435A (ja) * 2001-10-31 2003-05-16 Fujimi Inc 研磨用組成物およびそれを用いた研磨方法
JPWO2003045866A1 (ja) * 2001-11-30 2005-04-07 日本板硝子株式会社 着色膜付きガラス基体、着色膜形成用微粒子含有溶液および着色膜付きガラス基体の製造方法

Also Published As

Publication number Publication date
JP2008546617A (ja) 2008-12-25
WO2007001485A3 (en) 2007-11-15
WO2007001485A2 (en) 2007-01-04
KR20060131605A (ko) 2006-12-20
US20060283095A1 (en) 2006-12-21
EP1907222A2 (en) 2008-04-09

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