TW200631660A - Visible light responsive photocatalyst composition and method for manufacturing the same - Google Patents

Visible light responsive photocatalyst composition and method for manufacturing the same

Info

Publication number
TW200631660A
TW200631660A TW095101707A TW95101707A TW200631660A TW 200631660 A TW200631660 A TW 200631660A TW 095101707 A TW095101707 A TW 095101707A TW 95101707 A TW95101707 A TW 95101707A TW 200631660 A TW200631660 A TW 200631660A
Authority
TW
Taiwan
Prior art keywords
visible light
photocatalyst composition
manufacturing
responsive photocatalyst
same
Prior art date
Application number
TW095101707A
Other languages
English (en)
Inventor
Shinya Kitaguchi
Original Assignee
Nippon Catalytic Chem Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2005010190A external-priority patent/JP4883912B2/ja
Priority claimed from JP2005010192A external-priority patent/JP4883913B2/ja
Priority claimed from JP2005291995A external-priority patent/JP4878141B2/ja
Priority claimed from JP2005291994A external-priority patent/JP4842607B2/ja
Application filed by Nippon Catalytic Chem Ind filed Critical Nippon Catalytic Chem Ind
Publication of TW200631660A publication Critical patent/TW200631660A/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
    • B01J23/24—Chromium, molybdenum or tungsten
    • B01J23/30—Tungsten
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86—Catalytic processes
    • B01D53/8678—Removing components of undefined structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86—Catalytic processes
    • B01D53/88—Handling or mounting catalysts
    • B01J35/30—
    • B01J35/39—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G41/00—Compounds of tungsten
    • C01G41/02—Oxides; Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2255/00—Catalysts
    • B01D2255/20—Metals or compounds thereof
    • B01D2255/207—Transition metals
    • B01D2255/20776—Tungsten
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2255/00—Catalysts
    • B01D2255/80—Type of catalytic reaction
    • B01D2255/802—Photocatalytic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • B01J21/063—Titanium; Oxides or hydroxides thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J29/00—Catalysts comprising molecular sieves
    • B01J29/89—Silicates, aluminosilicates or borosilicates of titanium, zirconium or hafnium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02—Impregnation, coating or precipitation
    • B01J37/0215—Coating
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/45—Inorganic continuous phases
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475—Inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/71—Photocatalytic coatings
TW095101707A 2005-01-18 2006-01-17 Visible light responsive photocatalyst composition and method for manufacturing the same TW200631660A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2005010190A JP4883912B2 (ja) 2005-01-18 2005-01-18 可視光応答型光触媒およびその製造方法
JP2005010192A JP4883913B2 (ja) 2005-01-18 2005-01-18 光触媒およびその製造方法
JP2005291995A JP4878141B2 (ja) 2005-10-05 2005-10-05 複合光触媒体
JP2005291994A JP4842607B2 (ja) 2005-10-05 2005-10-05 可視光応答型光触媒、可視光応答型光触媒組成物およびその製造方法

Publications (1)

Publication Number Publication Date
TW200631660A true TW200631660A (en) 2006-09-16

Family

ID=36692228

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095101707A TW200631660A (en) 2005-01-18 2006-01-17 Visible light responsive photocatalyst composition and method for manufacturing the same

Country Status (4)

Country Link
US (1) US20080119352A1 (zh)
EP (1) EP1857179A1 (zh)
TW (1) TW200631660A (zh)
WO (1) WO2006077839A1 (zh)

Cited By (4)

* Cited by examiner, † Cited by third party
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CN101595072B (zh) * 2007-09-14 2013-05-08 卡迪奈尔镀膜玻璃公司 低维护涂布技术
TWI404569B (zh) * 2008-03-04 2013-08-11 Toshiba Kk An antibacterial material and an antibacterial film and an antibacterial member using the same
TWI414355B (zh) * 2011-06-07 2013-11-11 Showa Denko Kk Tungsten oxide photocatalyst and its manufacturing method
CN103950253B (zh) * 2008-09-16 2016-08-17 株式会社东芝 亲水性薄膜以及使用该亲水性薄膜的构件和结构物

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US7713632B2 (en) 2004-07-12 2010-05-11 Cardinal Cg Company Low-maintenance coatings
JP5374747B2 (ja) 2006-02-01 2013-12-25 東芝マテリアル株式会社 光触媒材料およびそれを用いた光触媒組成物並びに光触媒製品
US7862910B2 (en) 2006-04-11 2011-01-04 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
JP4772818B2 (ja) * 2007-03-30 2011-09-14 国立大学法人北海道大学 酸化タングステン光触媒体
US9670369B2 (en) 2007-09-05 2017-06-06 Kabushiki Kaisha Toshiba Visible-light-responsive photocatalyst powder, and visible-light-responsive photocatalytic material, photocatalytic coating material and photocatalytic product each using the same
CN101821005B (zh) * 2007-09-05 2012-09-26 株式会社东芝 可见光响应型光催化剂粉末及其制造方法，以及使用了该粉末的可见光响应型光催化剂材料、光催化剂涂料、光催化剂产品
EP2066594B1 (en) 2007-09-14 2016-12-07 Cardinal CG Company Low-maintenance coatings, and methods for producing low-maintenance coatings
JP4730400B2 (ja) * 2007-10-09 2011-07-20 住友化学株式会社 光触媒体分散液
WO2009096177A1 (ja) * 2008-01-28 2009-08-06 Kabushiki Kaisha Toshiba 可視光応答型光触媒粉末とそれを用いた可視光応答型の光触媒材料、光触媒塗料、光触媒製品
JP5082950B2 (ja) * 2008-03-13 2012-11-28 住友化学株式会社 揮発性芳香族化合物の分解方法
JP2011005475A (ja) * 2009-05-29 2011-01-13 Sumitomo Chemical Co Ltd 光触媒体分散液およびそれを用いた光触媒機能製品
JP2011036770A (ja) * 2009-08-07 2011-02-24 Hokkaido Univ 貴金属担持光触媒体粒子の製造方法
JP5780960B2 (ja) 2009-08-12 2015-09-16 株式会社東芝 抗ウイルス性材料とそれを用いた膜および製品
WO2011022683A1 (en) * 2009-08-20 2011-02-24 Research Foundation Of The City University Of New York A method for conversion of carbon dioxide to methane using visible and near infra-red light
US8821967B2 (en) * 2010-10-04 2014-09-02 National Cheng Kung University Method for manufacturing an oxide thin film
JPWO2012073269A1 (ja) * 2010-11-29 2014-05-19 パナソニック株式会社 有機ｅｌパネル、有機ｅｌパネルの製造方法、有機ｅｌパネルを用いた有機発光装置、及び有機ｅｌパネルを用いた有機表示装置
JP5793570B2 (ja) * 2011-07-15 2015-10-14 株式会社Ｊｏｌｅｄ 有機発光素子の製造方法
JP5894451B2 (ja) * 2012-02-03 2016-03-30 株式会社東芝 消臭機能付きシート
WO2015164780A1 (en) * 2014-04-25 2015-10-29 The Regents Of The University Of Michigan Nanoparticle therapy in cancer
KR102101220B1 (ko) * 2015-02-26 2020-04-17 (주)엘지하우시스 가시광 활성 광촉매 코팅 조성물 및 공기정화용 필터
CN105461008B (zh) * 2016-01-25 2017-11-03 河南科技学院 一种采用八面体结构wo3光催化剂用于降解罗丹明b的方法
US10898600B2 (en) * 2016-08-10 2021-01-26 Panasonic Intellectual Property Management Co., Ltd. Disinfecting method and disinfecting apparatus
CN106475089A (zh) * 2016-10-13 2017-03-08 中国科学院城市环境研究所 一种具有表面氧空位的TiO2/WO3 可见光催化剂及其制备方法和应用
EP3541762B1 (en) 2016-11-17 2022-03-02 Cardinal CG Company Static-dissipative coating technology
CN110997140A (zh) * 2017-08-22 2020-04-10 三菱电机株式会社 光催化剂、光催化剂负载体、光催化剂的制造方法及光催化剂负载体的制造方法
CN107999110A (zh) * 2017-11-14 2018-05-08 肇庆市华师大光电产业研究院 一种氧空位氧化钨/氮化碳复合光催化剂及其制备方法和应用
JP7084509B2 (ja) * 2018-06-27 2022-06-14 日東電工株式会社 紫外活性化光触媒材料及び揮発性化合物分解におけるその使用
CN109647496A (zh) * 2018-11-09 2019-04-19 南京工业大学 一种沸石改性玻璃纤维的多组分光催化材料及其制备方法和应用
CN111573930B (zh) * 2020-05-20 2022-04-05 山东大学 一种可见光催化-ClO2氧化联用高效去除废水中有机污染物的方法
CN114797852A (zh) * 2022-03-17 2022-07-29 太原理工大学 一种含氧缺陷Ru/W18O49光催化剂的制备方法及其在储氢领域的应用

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101595072B (zh) * 2007-09-14 2013-05-08 卡迪奈尔镀膜玻璃公司 低维护涂布技术
TWI404569B (zh) * 2008-03-04 2013-08-11 Toshiba Kk An antibacterial material and an antibacterial film and an antibacterial member using the same
CN103950253B (zh) * 2008-09-16 2016-08-17 株式会社东芝 亲水性薄膜以及使用该亲水性薄膜的构件和结构物
TWI414355B (zh) * 2011-06-07 2013-11-11 Showa Denko Kk Tungsten oxide photocatalyst and its manufacturing method

Also Published As

Publication number Publication date
EP1857179A1 (en) 2007-11-21
WO2006077839A1 (ja) 2006-07-27
US20080119352A1 (en) 2008-05-22

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