TW200615692A - Radiation sensitive composition and method for the preparation of the same - Google Patents

Radiation sensitive composition and method for the preparation of the same

Info

Publication number
TW200615692A
TW200615692A TW094123441A TW94123441A TW200615692A TW 200615692 A TW200615692 A TW 200615692A TW 094123441 A TW094123441 A TW 094123441A TW 94123441 A TW94123441 A TW 94123441A TW 200615692 A TW200615692 A TW 200615692A
Authority
TW
Taiwan
Prior art keywords
radiation sensitive
sensitive composition
preparation
same
pigment
Prior art date
Application number
TW094123441A
Other languages
English (en)
Chinese (zh)
Inventor
Masatsugu Ayabe
Tatsuyoshi Kawamoto
Tomio Nagatsuka
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200615692A publication Critical patent/TW200615692A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
TW094123441A 2004-07-15 2005-07-11 Radiation sensitive composition and method for the preparation of the same TW200615692A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004208620A JP4407410B2 (ja) 2004-07-15 2004-07-15 カラーフィルタ用感放射線性組成物およびその調製法

Publications (1)

Publication Number Publication Date
TW200615692A true TW200615692A (en) 2006-05-16

Family

ID=35896980

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094123441A TW200615692A (en) 2004-07-15 2005-07-11 Radiation sensitive composition and method for the preparation of the same

Country Status (5)

Country Link
JP (1) JP4407410B2 (ja)
KR (1) KR101134278B1 (ja)
CN (1) CN100443931C (ja)
SG (1) SG119305A1 (ja)
TW (1) TW200615692A (ja)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI428691B (zh) 2006-09-25 2014-03-01 Fujifilm Corp 硬化組成物、彩色濾光片及其製法
JP5344790B2 (ja) 2006-12-28 2013-11-20 富士フイルム株式会社 硬化性組成物、カラーフィルタ及びその製造方法
US8778575B2 (en) 2007-01-15 2014-07-15 Fujifilm Corporation Curable composition, color filter using the same and manufacturing method therefor, and solid image pickup element
JP5030638B2 (ja) 2007-03-29 2012-09-19 富士フイルム株式会社 カラーフィルタ及びその製造方法
JP5213375B2 (ja) 2007-07-13 2013-06-19 富士フイルム株式会社 顔料分散液、硬化性組成物、それを用いるカラーフィルタ及び固体撮像素子
JP4990085B2 (ja) 2007-09-28 2012-08-01 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子
JP5371449B2 (ja) 2008-01-31 2013-12-18 富士フイルム株式会社 樹脂、顔料分散液、着色硬化性組成物、これを用いたカラーフィルタ及びその製造方法
JP2009204816A (ja) * 2008-02-27 2009-09-10 Fujifilm Corp 着色硬化性組成物、カラーフィルタ、及び液晶表示装置
JP5448352B2 (ja) 2008-03-10 2014-03-19 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子
JP5334624B2 (ja) 2008-03-17 2013-11-06 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
JP5137662B2 (ja) 2008-03-31 2013-02-06 富士フイルム株式会社 硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
JP2010002886A (ja) * 2008-05-21 2010-01-07 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
JP5171514B2 (ja) 2008-09-29 2013-03-27 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
JP5602448B2 (ja) 2009-03-26 2014-10-08 富士フイルム株式会社 顔料分散液、着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
JP5479163B2 (ja) 2009-03-31 2014-04-23 富士フイルム株式会社 カラーフィルタ用着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
JP6008760B2 (ja) 2013-03-05 2016-10-19 富士フイルム株式会社 着色感光性組成物、カラーフィルタ及びカラーフィルタの製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000155209A (ja) * 1998-11-20 2000-06-06 Jsr Corp カラーフィルタ用感放射線性組成物
JP2002022925A (ja) * 2000-07-11 2002-01-23 Nippon Steel Chem Co Ltd カラーフィルターの製造方法及び着色感光性樹脂組成物
TWI230321B (en) * 2000-08-10 2005-04-01 Sumitomo Chemical Co Photosensitive coloring composition, and color filter and liquid crystal display panel using the same
JP2003149810A (ja) * 2001-08-28 2003-05-21 Sumitomo Chem Co Ltd 着色感光性樹脂組成物
TWI257527B (en) * 2001-12-18 2006-07-01 Jsr Corp Radiation sensitive composition for color filter, method to form color filter, color filter and color liquid crystal display device
SG102064A1 (en) * 2001-12-25 2004-02-27 Toray Industries Color filter, liquid crystal display device, and method for making color filter
JP4198363B2 (ja) * 2002-01-29 2008-12-17 富士フイルム株式会社 反射型カラーフィルタ
JP3951731B2 (ja) * 2002-02-08 2007-08-01 東洋インキ製造株式会社 カラーフィルタ用着色組成物およびカラーフィルタ
JP3860806B2 (ja) * 2002-12-19 2006-12-20 Ｊｓｒ株式会社 カラーフィルタ用着色層の形成方法
JP3767552B2 (ja) * 2002-12-26 2006-04-19 Ｊｓｒ株式会社 感放射線性組成物、ブラックマトリクス、カラーフィルタおよびカラー液晶表示装置

Also Published As

Publication number Publication date
SG119305A1 (en) 2006-02-28
CN1758077A (zh) 2006-04-12
CN100443931C (zh) 2008-12-17
KR20060050157A (ko) 2006-05-19
JP4407410B2 (ja) 2010-02-03
KR101134278B1 (ko) 2012-04-12
JP2006030541A (ja) 2006-02-02

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