SG119305A1 - Radiation sensitive composition and method for thepreparation of the same - Google Patents

Radiation sensitive composition and method for thepreparation of the same

Info

Publication number
SG119305A1
SG119305A1 SG200504360A SG200504360A SG119305A1 SG 119305 A1 SG119305 A1 SG 119305A1 SG 200504360 A SG200504360 A SG 200504360A SG 200504360 A SG200504360 A SG 200504360A SG 119305 A1 SG119305 A1 SG 119305A1
Authority
SG
Singapore
Prior art keywords
thepreparation
same
radiation sensitive
sensitive composition
composition
Prior art date
Application number
SG200504360A
Inventor
Ayabe Masatsugu
Kawamoto Tatsuyoshi
Nagatsuka Tomio
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of SG119305A1 publication Critical patent/SG119305A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
SG200504360A 2004-07-15 2005-07-11 Radiation sensitive composition and method for thepreparation of the same SG119305A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004208620A JP4407410B2 (en) 2004-07-15 2004-07-15 Radiation sensitive composition for color filter and preparation method thereof

Publications (1)

Publication Number Publication Date
SG119305A1 true SG119305A1 (en) 2006-02-28

Family

ID=35896980

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200504360A SG119305A1 (en) 2004-07-15 2005-07-11 Radiation sensitive composition and method for thepreparation of the same

Country Status (5)

Country Link
JP (1) JP4407410B2 (en)
KR (1) KR101134278B1 (en)
CN (1) CN100443931C (en)
SG (1) SG119305A1 (en)
TW (1) TW200615692A (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI428691B (en) 2006-09-25 2014-03-01 Fujifilm Corp Curable composition, color filter and manufacturing method thereof
JP5344790B2 (en) 2006-12-28 2013-11-20 富士フイルム株式会社 Curable composition, color filter and method for producing the same
US8778575B2 (en) 2007-01-15 2014-07-15 Fujifilm Corporation Curable composition, color filter using the same and manufacturing method therefor, and solid image pickup element
JP5030638B2 (en) 2007-03-29 2012-09-19 富士フイルム株式会社 Color filter and manufacturing method thereof
JP5213375B2 (en) 2007-07-13 2013-06-19 富士フイルム株式会社 Pigment dispersion, curable composition, color filter using the same, and solid-state imaging device
JP4990085B2 (en) 2007-09-28 2012-08-01 富士フイルム株式会社 Colored curable composition, color filter, and solid-state imaging device
JP5371449B2 (en) 2008-01-31 2013-12-18 富士フイルム株式会社 Resin, pigment dispersion, colored curable composition, color filter using the same, and method for producing the same
JP2009204816A (en) * 2008-02-27 2009-09-10 Fujifilm Corp Colored curable composition, color filter and liquid crystal display
JP5448352B2 (en) 2008-03-10 2014-03-19 富士フイルム株式会社 Colored curable composition, color filter, and solid-state imaging device
JP5334624B2 (en) 2008-03-17 2013-11-06 富士フイルム株式会社 Colored curable composition, color filter, and method for producing color filter
JP5137662B2 (en) 2008-03-31 2013-02-06 富士フイルム株式会社 Curable composition, color filter and method for producing the same, and solid-state imaging device
JP2010002886A (en) * 2008-05-21 2010-01-07 Sumitomo Chemical Co Ltd Colored photosensitive resin composition
JP5171514B2 (en) 2008-09-29 2013-03-27 富士フイルム株式会社 Colored curable composition, color filter, and method for producing color filter
JP5602448B2 (en) 2009-03-26 2014-10-08 富士フイルム株式会社 Pigment dispersion, colored curable composition, color filter, and method for producing color filter
JP5479163B2 (en) 2009-03-31 2014-04-23 富士フイルム株式会社 Colored curable composition for color filter, color filter, method for producing the same, and solid-state imaging device
JP6008760B2 (en) 2013-03-05 2016-10-19 富士フイルム株式会社 Colored photosensitive composition, color filter and method for producing color filter

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000155209A (en) * 1998-11-20 2000-06-06 Jsr Corp Radiation sensitive composition for color filter
JP2002022925A (en) * 2000-07-11 2002-01-23 Nippon Steel Chem Co Ltd Method for producing color filter and colored photosensitive resin composition
TWI230321B (en) * 2000-08-10 2005-04-01 Sumitomo Chemical Co Photosensitive coloring composition, and color filter and liquid crystal display panel using the same
JP2003149810A (en) * 2001-08-28 2003-05-21 Sumitomo Chem Co Ltd Colored photosensitive resin composition
TWI257527B (en) * 2001-12-18 2006-07-01 Jsr Corp Radiation sensitive composition for color filter, method to form color filter, color filter and color liquid crystal display device
SG102064A1 (en) * 2001-12-25 2004-02-27 Toray Industries Color filter, liquid crystal display device, and method for making color filter
JP4198363B2 (en) * 2002-01-29 2008-12-17 富士フイルム株式会社 Reflective color filter
JP3951731B2 (en) * 2002-02-08 2007-08-01 東洋インキ製造株式会社 Coloring composition for color filter and color filter
JP3860806B2 (en) * 2002-12-19 2006-12-20 Ｊｓｒ株式会社 Method for forming colored layer for color filter
JP3767552B2 (en) * 2002-12-26 2006-04-19 Ｊｓｒ株式会社 Radiation-sensitive composition, black matrix, color filter, and color liquid crystal display device

Also Published As

Publication number Publication date
KR101134278B1 (en) 2012-04-12
CN1758077A (en) 2006-04-12
JP4407410B2 (en) 2010-02-03
TW200615692A (en) 2006-05-16
CN100443931C (en) 2008-12-17
JP2006030541A (en) 2006-02-02
KR20060050157A (en) 2006-05-19

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