TW200604217A - Radiation-sensitive resin composition, spacer, and method of forming the same - Google Patents
Radiation-sensitive resin composition, spacer, and method of forming the sameInfo
- Publication number
- TW200604217A TW200604217A TW094105668A TW94105668A TW200604217A TW 200604217 A TW200604217 A TW 200604217A TW 094105668 A TW094105668 A TW 094105668A TW 94105668 A TW94105668 A TW 94105668A TW 200604217 A TW200604217 A TW 200604217A
- Authority
- TW
- Taiwan
- Prior art keywords
- radiation
- resin composition
- sensitive resin
- spacer
- forming
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
- C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004137257 | 2004-05-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200604217A true TW200604217A (en) | 2006-02-01 |
TWI365196B TWI365196B (ja) | 2012-06-01 |
Family
ID=35320360
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094105668A TW200604217A (en) | 2004-05-06 | 2005-02-24 | Radiation-sensitive resin composition, spacer, and method of forming the same |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4650638B2 (ja) |
KR (1) | KR101084384B1 (ja) |
CN (1) | CN1950751A (ja) |
TW (1) | TW200604217A (ja) |
WO (1) | WO2005109100A1 (ja) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4923496B2 (ja) * | 2005-02-18 | 2012-04-25 | Jsr株式会社 | カラーフィルタ用感放射線性樹脂組成物およびカラーフィルタ |
KR101250733B1 (ko) * | 2005-03-15 | 2013-04-03 | 제이에스알 가부시끼가이샤 | 감방사선성 수지 조성물, 그로부터 형성된 돌기 및 스페이서, 및 이들을 구비하는 액정 표시 소자 |
JP4705426B2 (ja) * | 2005-07-14 | 2011-06-22 | 互応化学工業株式会社 | プリント配線板製造用アルカリ現像型感光性レジストインキ組成物、その硬化物およびプリント配線板 |
JP4895034B2 (ja) * | 2006-05-24 | 2012-03-14 | Jsr株式会社 | 感放射線性樹脂組成物、スペーサーおよびその形成方法 |
JP4748321B2 (ja) * | 2007-01-18 | 2011-08-17 | Jsr株式会社 | 感放射線性樹脂組成物および液晶表示素子用スペーサー |
JP5234715B2 (ja) * | 2007-03-07 | 2013-07-10 | 凸版印刷株式会社 | フォトスペーサ用感光性樹脂組成物、これを用いた液晶表示装置用基板及び液晶表示装置 |
TWI559079B (zh) * | 2008-11-18 | 2016-11-21 | Sumitomo Chemical Co | Photosensitive resin composition and display device |
JP5505066B2 (ja) * | 2010-04-28 | 2014-05-28 | Jsr株式会社 | 感放射線性樹脂組成物、表示素子の層間絶縁膜、保護膜及びスペーサーならびにそれらの形成方法 |
JP5765049B2 (ja) * | 2010-05-27 | 2015-08-19 | Jsr株式会社 | 硬化膜形成用感放射線性樹脂組成物、硬化膜形成用感放射線性樹脂組成物の製造方法、硬化膜、硬化膜の形成方法及び表示素子 |
KR20130088166A (ko) * | 2010-11-17 | 2013-08-07 | 히타치가세이가부시끼가이샤 | 감광성 수지 조성물, 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 프린트 배선판의 제조 방법 |
JP5834630B2 (ja) * | 2011-02-04 | 2015-12-24 | 日立化成株式会社 | 樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
JP5853588B2 (ja) * | 2011-10-26 | 2016-02-09 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
JP6098063B2 (ja) * | 2012-08-01 | 2017-03-22 | 日立化成株式会社 | 樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
JP6079277B2 (ja) * | 2013-02-04 | 2017-02-15 | 日本ゼオン株式会社 | 感放射線樹脂組成物及び電子部品 |
CN103336390B (zh) * | 2013-06-21 | 2015-09-09 | 合肥京东方光电科技有限公司 | 隔垫物及其制作方法、基板及显示装置 |
KR102028477B1 (ko) | 2013-07-19 | 2019-10-04 | 동우 화인켐 주식회사 | 투명화소 형성용 감광성 수지조성물 |
KR102093759B1 (ko) | 2013-07-19 | 2020-03-26 | 동우 화인켐 주식회사 | 투명화소 형성용 감광성 수지조성물 |
KR102069199B1 (ko) | 2013-09-05 | 2020-02-11 | 동우 화인켐 주식회사 | 투명화소 형성용 감광성 수지조성물 |
KR102218948B1 (ko) | 2014-09-23 | 2021-02-23 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물, 및 이로써 제조된 액정 표시장치용 블랙 매트릭스 및 칼럼 스페이서 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11133600A (ja) * | 1997-10-30 | 1999-05-21 | Jsr Corp | 表示パネルスペーサー用感放射線性樹脂組成物 |
JP2000081701A (ja) * | 1998-09-03 | 2000-03-21 | Jsr Corp | カラーフィルター保護膜用感放射線性樹脂組成物 |
JP4269115B2 (ja) * | 1999-05-10 | 2009-05-27 | Jsr株式会社 | 感放射線性樹脂組成物、層間絶縁膜およびスペーサー |
JP2001261761A (ja) | 2000-03-22 | 2001-09-26 | Jsr Corp | 感放射線性樹脂組成物および表示パネル用スペーサー |
JP2003041224A (ja) * | 2001-07-31 | 2003-02-13 | Kanegafuchi Chem Ind Co Ltd | 粘着剤組成物 |
JP3734436B2 (ja) * | 2001-09-19 | 2006-01-11 | 奇美実業股▲分▼有限公司 | 液晶ディスプレーのスペーサー用感光性樹脂組成物 |
JP3967947B2 (ja) * | 2002-03-29 | 2007-08-29 | 富士フイルム株式会社 | 染料含有ネガ型硬化性組成物、カラーフィルタ及びその製造方法 |
-
2005
- 2005-02-18 KR KR1020067023101A patent/KR101084384B1/ko active IP Right Grant
- 2005-02-18 CN CNA2005800139437A patent/CN1950751A/zh active Pending
- 2005-02-18 JP JP2006512918A patent/JP4650638B2/ja active Active
- 2005-02-18 WO PCT/JP2005/003090 patent/WO2005109100A1/ja active Application Filing
- 2005-02-24 TW TW094105668A patent/TW200604217A/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO2005109100A1 (ja) | 2005-11-17 |
KR20070007895A (ko) | 2007-01-16 |
TWI365196B (ja) | 2012-06-01 |
KR101084384B1 (ko) | 2011-11-18 |
JPWO2005109100A1 (ja) | 2008-03-21 |
CN1950751A (zh) | 2007-04-18 |
JP4650638B2 (ja) | 2011-03-16 |
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Legal Events
Date | Code | Title | Description |
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MM4A | Annulment or lapse of patent due to non-payment of fees |