TW200602635A - Method of measuring concentration of impurity element - Google Patents

Method of measuring concentration of impurity element

Info

Publication number
TW200602635A
TW200602635A TW094118165A TW94118165A TW200602635A TW 200602635 A TW200602635 A TW 200602635A TW 094118165 A TW094118165 A TW 094118165A TW 94118165 A TW94118165 A TW 94118165A TW 200602635 A TW200602635 A TW 200602635A
Authority
TW
Taiwan
Prior art keywords
secondary ion
impurity element
time
measuring concentration
concentration
Prior art date
Application number
TW094118165A
Other languages
English (en)
Other versions
TWI297774B (zh
Inventor
Kiyoshi Nagai
Tetsuo Ishida
Original Assignee
Komatsu Denshi Kinzoku Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komatsu Denshi Kinzoku Kk filed Critical Komatsu Denshi Kinzoku Kk
Publication of TW200602635A publication Critical patent/TW200602635A/zh
Application granted granted Critical
Publication of TWI297774B publication Critical patent/TWI297774B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2255—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident ion beams, e.g. proton beams
    • G01N23/2258—Measuring secondary ion emission, e.g. secondary ion mass spectrometry [SIMS]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Molecular Biology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
TW094118165A 2004-06-03 2005-06-02 Method of measuring concentration of impurity element TW200602635A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004166145 2004-06-03

Publications (2)

Publication Number Publication Date
TW200602635A true TW200602635A (en) 2006-01-16
TWI297774B TWI297774B (zh) 2008-06-11

Family

ID=35463018

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094118165A TW200602635A (en) 2004-06-03 2005-06-02 Method of measuring concentration of impurity element

Country Status (6)

Country Link
US (1) US8090544B2 (zh)
EP (1) EP1752761B1 (zh)
JP (1) JP4707657B2 (zh)
KR (1) KR101096115B1 (zh)
TW (1) TW200602635A (zh)
WO (1) WO2005119229A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5142273B2 (ja) * 2008-06-20 2013-02-13 独立行政法人産業技術総合研究所 中性粒子質量分析装置及び分析方法
KR100977194B1 (ko) * 2008-07-07 2010-08-20 주식회사 실트론 이차이온질량분석기를 이용한 불순물 농도 분석방법
KR101323721B1 (ko) 2012-04-24 2013-10-31 주식회사 엘지실트론 Ｓｉｍｓ를 이용한 시료 분석 방법
JP6645379B2 (ja) * 2016-08-09 2020-02-14 住友電気工業株式会社 質量分析方法
JP7403272B2 (ja) * 2019-10-11 2023-12-22 Ｔｉａｎｍａ Ｊａｐａｎ株式会社 磁気光学式計測装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4733073A (en) * 1983-12-23 1988-03-22 Sri International Method and apparatus for surface diagnostics
JPH05188020A (ja) * 1991-09-17 1993-07-27 Sony Corp ２次イオン質量分析法による定量分析方法及び２次イオン質量分析装置
US6035246A (en) * 1994-11-04 2000-03-07 Sandia Corporation Method for identifying known materials within a mixture of unknowns
JPH0921768A (ja) * 1995-07-06 1997-01-21 Kao Corp 基材表面の有機化合物の分析方法
DE19720458C1 (de) 1997-05-15 1998-12-03 Atomika Instr Gmbh Verfahren zur Analyse einer Probe
JP2001021460A (ja) * 1999-07-02 2001-01-26 Nec Corp 二次イオン質量分析のための定量用標準試料の作製方法
US6603119B1 (en) 2000-05-09 2003-08-05 Agere Systems Inc. Calibration method for quantitative elemental analysis
JP3725803B2 (ja) * 2001-06-15 2005-12-14 株式会社東芝 半導体ウエハの不純物の測定方法及び半導体ウエハの不純物の測定プログラム

Also Published As

Publication number Publication date
JPWO2005119229A1 (ja) 2008-04-03
WO2005119229A1 (ja) 2005-12-15
EP1752761B1 (en) 2014-03-05
EP1752761A4 (en) 2009-07-08
KR101096115B1 (ko) 2011-12-20
US8090544B2 (en) 2012-01-03
US20090198452A1 (en) 2009-08-06
KR20070027631A (ko) 2007-03-09
TWI297774B (zh) 2008-06-11
JP4707657B2 (ja) 2011-06-22
EP1752761A1 (en) 2007-02-14

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