TW200520226A - Thin-film field effect transistor and making method thereof - Google Patents
Thin-film field effect transistor and making method thereofInfo
- Publication number
- TW200520226A TW200520226A TW093126007A TW93126007A TW200520226A TW 200520226 A TW200520226 A TW 200520226A TW 093126007 A TW093126007 A TW 093126007A TW 93126007 A TW93126007 A TW 93126007A TW 200520226 A TW200520226 A TW 200520226A
- Authority
- TW
- Taiwan
- Prior art keywords
- thin
- field effect
- effect transistor
- film field
- making method
- Prior art date
Links
- 230000005669 field effect Effects 0.000 title abstract 3
- 239000010409 thin film Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 230000007547 defect Effects 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- 238000000059 patterning Methods 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 238000011282 treatment Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/15—Deposition of organic active material using liquid deposition, e.g. spin coating characterised by the solvent used
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/471—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising only organic materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Thin Film Transistor (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003304019A JP2005072528A (ja) | 2003-08-28 | 2003-08-28 | 薄層電界効果トランジスター及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200520226A true TW200520226A (en) | 2005-06-16 |
TWI373134B TWI373134B (zh) | 2012-09-21 |
Family
ID=34101211
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093126007A TW200520226A (en) | 2003-08-28 | 2004-08-27 | Thin-film field effect transistor and making method thereof |
Country Status (6)
Country | Link |
---|---|
US (2) | US20050045876A1 (zh) |
EP (1) | EP1511096B1 (zh) |
JP (1) | JP2005072528A (zh) |
KR (2) | KR100915508B1 (zh) |
CN (1) | CN100514673C (zh) |
TW (1) | TW200520226A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI497788B (zh) * | 2008-09-01 | 2015-08-21 | Univ Osaka | 有機場效電晶體及其製造方法 |
Families Citing this family (33)
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WO2005001940A1 (ja) * | 2003-06-27 | 2005-01-06 | Tdk Coroporation | 電界効果トランジスタ |
KR101260981B1 (ko) | 2004-06-04 | 2013-05-10 | 더 보오드 오브 트러스티스 오브 더 유니버시티 오브 일리노이즈 | 인쇄가능한 반도체소자들의 제조 및 조립방법과 장치 |
EP1648040B1 (en) * | 2004-08-31 | 2016-06-01 | Osaka University | Thin-layer chemical transistors and their manufacture |
US7619242B2 (en) * | 2005-02-25 | 2009-11-17 | Xerox Corporation | Celluloses and devices thereof |
US7265380B2 (en) * | 2005-03-25 | 2007-09-04 | Osaka University | Ambipolar organic thin-film field-effect transistor and making method |
JP4883558B2 (ja) * | 2005-03-25 | 2012-02-22 | 国立大学法人大阪大学 | 両極性有機電界効果薄層トランジスター及びその製造方法 |
JP4914828B2 (ja) * | 2005-03-28 | 2012-04-11 | パイオニア株式会社 | ゲート絶縁膜、有機トランジスタ、有機el表示装置の製造方法、ディスプレイ |
JP4984416B2 (ja) * | 2005-03-31 | 2012-07-25 | 凸版印刷株式会社 | 薄膜トランジスタの製造方法 |
JP2007053147A (ja) * | 2005-08-16 | 2007-03-01 | Sony Corp | 有機半導体装置及びその製造方法 |
US8057870B2 (en) * | 2006-05-04 | 2011-11-15 | Lg Chem, Ltd. | Composition for forming gate insulating layer of organic thin-film transistor and organic thin film transistor using the same |
US8975073B2 (en) | 2006-11-21 | 2015-03-10 | The Charles Stark Draper Laboratory, Inc. | Microfluidic device comprising silk films coupled to form a microchannel |
WO2008085904A1 (en) * | 2007-01-05 | 2008-07-17 | Charles Stark Draper Laboratory, Inc. | Biodegradable electronic devices |
JP5152493B2 (ja) * | 2007-03-26 | 2013-02-27 | 国立大学法人大阪大学 | 有機電界効果トランジスター及びその製造方法 |
US8389862B2 (en) | 2008-10-07 | 2013-03-05 | Mc10, Inc. | Extremely stretchable electronics |
US8886334B2 (en) | 2008-10-07 | 2014-11-11 | Mc10, Inc. | Systems, methods, and devices using stretchable or flexible electronics for medical applications |
US8372726B2 (en) | 2008-10-07 | 2013-02-12 | Mc10, Inc. | Methods and applications of non-planar imaging arrays |
WO2010042653A1 (en) | 2008-10-07 | 2010-04-15 | Mc10, Inc. | Catheter balloon having stretchable integrated circuitry and sensor array |
US8097926B2 (en) | 2008-10-07 | 2012-01-17 | Mc10, Inc. | Systems, methods, and devices having stretchable integrated circuitry for sensing and delivering therapy |
TWI468493B (zh) * | 2009-02-27 | 2015-01-11 | Nippon Steel & Sumikin Chem Co | A polymer luminescent material, a method for manufacturing the same, and an organic electroluminescent device |
US9723122B2 (en) | 2009-10-01 | 2017-08-01 | Mc10, Inc. | Protective cases with integrated electronics |
US10441185B2 (en) | 2009-12-16 | 2019-10-15 | The Board Of Trustees Of The University Of Illinois | Flexible and stretchable electronic systems for epidermal electronics |
US10918298B2 (en) | 2009-12-16 | 2021-02-16 | The Board Of Trustees Of The University Of Illinois | High-speed, high-resolution electrophysiology in-vivo using conformal electronics |
US9936574B2 (en) | 2009-12-16 | 2018-04-03 | The Board Of Trustees Of The University Of Illinois | Waterproof stretchable optoelectronics |
CN104224171B (zh) | 2010-03-17 | 2017-06-09 | 伊利诺伊大学评议会 | 基于生物可吸收基质的可植入生物医学装置 |
US9765934B2 (en) | 2011-05-16 | 2017-09-19 | The Board Of Trustees Of The University Of Illinois | Thermally managed LED arrays assembled by printing |
WO2012166686A2 (en) | 2011-05-27 | 2012-12-06 | Mc10, Inc. | Electronic, optical and/or mechanical apparatus and systems and methods for fabricating same |
EP2713863B1 (en) | 2011-06-03 | 2020-01-15 | The Board of Trustees of the University of Illionis | Conformable actively multiplexed high-density surface electrode array for brain interfacing |
JP6231489B2 (ja) | 2011-12-01 | 2017-11-15 | ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ | プログラム可能な変化を被るように設計された遷移デバイス |
WO2013149181A1 (en) | 2012-03-30 | 2013-10-03 | The Board Of Trustees Of The University Of Illinois | Appendage mountable electronic devices conformable to surfaces |
US9171794B2 (en) | 2012-10-09 | 2015-10-27 | Mc10, Inc. | Embedding thin chips in polymer |
EP3000125A4 (en) | 2013-05-22 | 2017-02-08 | Transient Electronics, Inc. | Controlled transformation of non-transient electronics |
US10925543B2 (en) | 2015-11-11 | 2021-02-23 | The Board Of Trustees Of The University Of Illinois | Bioresorbable silicon electronics for transient implants |
TW201917098A (zh) * | 2017-10-20 | 2019-05-01 | 行政院原子能委員會核能硏究所 | 奈米結構複合材料及其製作方法 |
Family Cites Families (18)
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JPS5931521B2 (ja) * | 1979-07-23 | 1984-08-02 | 信越化学工業株式会社 | シアノエチルプルランおよびその製造方法 |
JPH0822934B2 (ja) * | 1986-12-09 | 1996-03-06 | 旭化成工業株式会社 | ポリアクリロニトリル系多孔体の製造方法 |
FR2664430B1 (fr) | 1990-07-04 | 1992-09-18 | Centre Nat Rech Scient | Transistor a effet de champ en couche mince de structure mis, dont l'isolant et le semiconducteur sont realises en materiaux organiques. |
JPH06322370A (ja) * | 1993-05-14 | 1994-11-22 | Hitachi Maxell Ltd | 有機分散液晶 |
US5556706A (en) * | 1993-10-06 | 1996-09-17 | Matsushita Electric Industrial Co., Ltd. | Conductive layered product and method of manufacturing the same |
JP3246189B2 (ja) * | 1994-06-28 | 2002-01-15 | 株式会社日立製作所 | 半導体表示装置 |
JP3994441B2 (ja) * | 1995-01-09 | 2007-10-17 | 松下電器産業株式会社 | 電界効果トランジスタ |
JP4509228B2 (ja) * | 1997-08-22 | 2010-07-21 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 有機材料から成る電界効果トランジスタ及びその製造方法 |
CA2306384A1 (en) * | 1997-10-14 | 1999-04-22 | Patterning Technologies Limited | Method of forming an electronic device |
JP2000269504A (ja) * | 1999-03-16 | 2000-09-29 | Hitachi Ltd | 半導体装置、その製造方法及び液晶表示装置 |
JP2004538618A (ja) * | 1999-10-11 | 2004-12-24 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 集積回路 |
AU2015901A (en) * | 1999-12-21 | 2001-07-03 | Plastic Logic Limited | Inkjet-fabricated integrated circuits |
JP2002009290A (ja) * | 2000-06-21 | 2002-01-11 | Fuji Xerox Co Ltd | 有機電子素子の製造方法、および、該製造方法により製造された有機電子素子 |
US20020060321A1 (en) * | 2000-07-14 | 2002-05-23 | Kazlas Peter T. | Minimally- patterned, thin-film semiconductor devices for display applications |
JP3963693B2 (ja) * | 2001-10-15 | 2007-08-22 | 富士通株式会社 | 導電性有機化合物及び電子素子 |
US6946676B2 (en) * | 2001-11-05 | 2005-09-20 | 3M Innovative Properties Company | Organic thin film transistor with polymeric interface |
JP2003218329A (ja) * | 2001-11-15 | 2003-07-31 | Sekisui Chem Co Ltd | 仮転写基板及びtft回路基板の製造方法 |
US20030227014A1 (en) * | 2002-06-11 | 2003-12-11 | Xerox Corporation. | Process for forming semiconductor layer of micro-and nano-electronic devices |
-
2003
- 2003-08-28 JP JP2003304019A patent/JP2005072528A/ja active Pending
-
2004
- 2004-08-26 US US10/925,986 patent/US20050045876A1/en not_active Abandoned
- 2004-08-26 KR KR1020040067532A patent/KR100915508B1/ko active IP Right Grant
- 2004-08-27 EP EP04255178A patent/EP1511096B1/en not_active Expired - Fee Related
- 2004-08-27 TW TW093126007A patent/TW200520226A/zh not_active IP Right Cessation
- 2004-08-27 CN CNB2004100899451A patent/CN100514673C/zh not_active Expired - Fee Related
-
2008
- 2008-12-18 KR KR1020080129261A patent/KR20090016646A/ko not_active Application Discontinuation
-
2009
- 2009-01-08 US US12/350,715 patent/US8088642B2/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI497788B (zh) * | 2008-09-01 | 2015-08-21 | Univ Osaka | 有機場效電晶體及其製造方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1511096B1 (en) | 2013-02-27 |
US8088642B2 (en) | 2012-01-03 |
KR20050021318A (ko) | 2005-03-07 |
CN100514673C (zh) | 2009-07-15 |
CN1599077A (zh) | 2005-03-23 |
TWI373134B (zh) | 2012-09-21 |
EP1511096A3 (en) | 2007-09-26 |
US20090124051A1 (en) | 2009-05-14 |
KR100915508B1 (ko) | 2009-09-03 |
KR20090016646A (ko) | 2009-02-17 |
JP2005072528A (ja) | 2005-03-17 |
EP1511096A2 (en) | 2005-03-02 |
US20050045876A1 (en) | 2005-03-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |