TW200520077A - A method and an apparatus for producing microchips - Google Patents

A method and an apparatus for producing microchips

Info

Publication number
TW200520077A
TW200520077A TW093133521A TW93133521A TW200520077A TW 200520077 A TW200520077 A TW 200520077A TW 093133521 A TW093133521 A TW 093133521A TW 93133521 A TW93133521 A TW 93133521A TW 200520077 A TW200520077 A TW 200520077A
Authority
TW
Taiwan
Prior art keywords
immersion
microchips
fluid
immersion fluid
additive
Prior art date
Application number
TW093133521A
Other languages
English (en)
Chinese (zh)
Inventor
Shahab Jahromi
Dietrich Wienke
Leonardus Gersrdus Bernardus Bremer
Original Assignee
Dsm Ip Assets Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP03078487A external-priority patent/EP1530086A1/en
Application filed by Dsm Ip Assets Bv filed Critical Dsm Ip Assets Bv
Publication of TW200520077A publication Critical patent/TW200520077A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW093133521A 2003-11-05 2004-11-03 A method and an apparatus for producing microchips TW200520077A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
EP03078487A EP1530086A1 (en) 2003-11-05 2003-11-05 A method and an apparatus for producing micro-chips
US55162904P 2004-03-10 2004-03-10
EP04075712 2004-03-10
EP04075984 2004-03-31
EP04077144 2004-07-23

Publications (1)

Publication Number Publication Date
TW200520077A true TW200520077A (en) 2005-06-16

Family

ID=46045499

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093133521A TW200520077A (en) 2003-11-05 2004-11-03 A method and an apparatus for producing microchips

Country Status (5)

Country Link
US (1) US20070105050A1 (ja)
EP (1) EP1685446A2 (ja)
JP (1) JP2007525824A (ja)
TW (1) TW200520077A (ja)
WO (1) WO2005050324A2 (ja)

Families Citing this family (83)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI232357B (en) 2002-11-12 2005-05-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR100588124B1 (ko) 2002-11-12 2006-06-09 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스제조방법
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE10261775A1 (de) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
KR101643112B1 (ko) 2003-02-26 2016-07-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR20050110033A (ko) 2003-03-25 2005-11-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101176817B1 (ko) 2003-04-07 2012-08-24 가부시키가이샤 니콘 노광장치 및 디바이스 제조방법
KR20110104084A (ko) 2003-04-09 2011-09-21 가부시키가이샤 니콘 액침 리소그래피 유체 제어 시스템
KR101178754B1 (ko) 2003-04-10 2012-09-07 가부시키가이샤 니콘 액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템
JP4488005B2 (ja) 2003-04-10 2010-06-23 株式会社ニコン 液浸リソグラフィ装置用の液体を捕集するための流出通路
KR20170064003A (ko) 2003-04-10 2017-06-08 가부시키가이샤 니콘 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
KR101178756B1 (ko) 2003-04-11 2012-08-31 가부시키가이샤 니콘 액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침액체를 유지하는 장치 및 방법
WO2004092830A2 (en) 2003-04-11 2004-10-28 Nikon Corporation Liquid jet and recovery system for immersion lithography
CN106444292A (zh) 2003-04-11 2017-02-22 株式会社尼康 沉浸式光刻装置、清洗方法、器件制造方法及液体沉浸式光刻装置
JP2006523958A (ja) 2003-04-17 2006-10-19 株式会社ニコン 液浸リソグラフィで使用するためのオートフォーカス素子の光学的構造
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TW201806001A (zh) 2003-05-23 2018-02-16 尼康股份有限公司 曝光裝置及元件製造方法
TWI421906B (zh) 2003-05-23 2014-01-01 尼康股份有限公司 An exposure method, an exposure apparatus, and an element manufacturing method
KR101728664B1 (ko) 2003-05-28 2017-05-02 가부시키가이샤 니콘 노광 방법, 노광 장치, 및 디바이스 제조 방법
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7684008B2 (en) 2003-06-11 2010-03-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101528089B1 (ko) 2003-06-13 2015-06-11 가부시키가이샤 니콘 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
TWI433212B (zh) 2003-06-19 2014-04-01 尼康股份有限公司 An exposure apparatus, an exposure method, and an element manufacturing method
EP2843472B1 (en) 2003-07-08 2016-12-07 Nikon Corporation Wafer table for immersion lithography
EP1643543B1 (en) 2003-07-09 2010-11-24 Nikon Corporation Exposure apparatus and method for manufacturing device
WO2005006415A1 (ja) 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
WO2005006418A1 (ja) 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
EP1650787A4 (en) 2003-07-25 2007-09-19 Nikon Corp INVESTIGATION METHOD AND INVESTIGATION DEVICE FOR AN OPTICAL PROJECTION SYSTEM AND METHOD OF MANUFACTURING AN OPTICAL PROJECTION SYSTEM
EP1503244A1 (en) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
CN102323724B (zh) 2003-07-28 2014-08-13 株式会社尼康 液浸曝光装置及其制造方法、曝光装置、器件制造方法
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR101380989B1 (ko) 2003-08-29 2014-04-04 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
TWI245163B (en) 2003-08-29 2005-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR101590686B1 (ko) 2003-09-03 2016-02-01 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
WO2005029559A1 (ja) 2003-09-19 2005-03-31 Nikon Corporation 露光装置及びデバイス製造方法
KR101498437B1 (ko) 2003-09-29 2015-03-03 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
JP4335213B2 (ja) 2003-10-08 2009-09-30 株式会社蔵王ニコン 基板搬送装置、露光装置、デバイス製造方法
KR101203028B1 (ko) 2003-10-08 2012-11-21 가부시키가이샤 자오 니콘 기판 반송 장치 및 기판 반송 방법, 노광 장치 및 노광 방법, 디바이스 제조 방법
TWI553701B (zh) 2003-10-09 2016-10-11 尼康股份有限公司 Exposure apparatus and exposure method, component manufacturing method
US7411653B2 (en) 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
SG2014014955A (en) 2003-12-03 2014-07-30 Nippon Kogaku Kk Exposure apparatus, exposure method, method for producing device, and optical part
ATE491221T1 (de) 2003-12-15 2010-12-15 Nikon Corp Bühnensystem, belichtungsvorrichtung und belichtungsverfahren
JP4843503B2 (ja) 2004-01-20 2011-12-21 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置および投影レンズのための測定装置
US20050161644A1 (en) 2004-01-23 2005-07-28 Peng Zhang Immersion lithography fluids
TWI259319B (en) 2004-01-23 2006-08-01 Air Prod & Chem Immersion lithography fluids
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
KR101276392B1 (ko) 2004-02-03 2013-06-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101707294B1 (ko) 2004-03-25 2017-02-15 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
EP1747499A2 (en) 2004-05-04 2007-01-31 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005119371A1 (en) 2004-06-01 2005-12-15 E.I. Dupont De Nemours And Company Ultraviolet-transparent alkanes and processes using same in vacuum and deep ultraviolet applications
US7796274B2 (en) 2004-06-04 2010-09-14 Carl Zeiss Smt Ag System for measuring the image quality of an optical imaging system
KR101440746B1 (ko) 2004-06-09 2014-09-17 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101202230B1 (ko) 2004-07-12 2012-11-16 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP4264038B2 (ja) * 2004-07-13 2009-05-13 パナソニック株式会社 液浸露光用の液体及びパターン形成方法
KR20070048164A (ko) 2004-08-18 2007-05-08 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102005045862A1 (de) 2004-10-19 2006-04-20 Carl Zeiss Smt Ag Optisches System für Ultraviolettlicht
US7623218B2 (en) * 2004-11-24 2009-11-24 Carl Zeiss Smt Ag Method of manufacturing a miniaturized device
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7880860B2 (en) 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8692973B2 (en) 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
EP3079164A1 (en) 2005-01-31 2016-10-12 Nikon Corporation Exposure apparatus and method for producing device
US7282701B2 (en) 2005-02-28 2007-10-16 Asml Netherlands B.V. Sensor for use in a lithographic apparatus
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
WO2007001848A2 (en) * 2005-06-24 2007-01-04 Sachem, Inc. High refractive index fluids with low absorption for immersion lithography
US7291569B2 (en) 2005-06-29 2007-11-06 Infineon Technologies Ag Fluids for immersion lithography systems
JP4687334B2 (ja) * 2005-08-29 2011-05-25 Ｊｓｒ株式会社 液浸露光用液体および液浸露光方法
JP2007103841A (ja) * 2005-10-07 2007-04-19 Toshiba Corp 半導体装置の製造方法
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
US20080084549A1 (en) * 2006-10-09 2008-04-10 Rottmayer Robert E High refractive index media for immersion lithography and method of immersion lithography using same
EP1939689A1 (en) * 2006-12-28 2008-07-02 DSM IP Assets B.V. Immersion fluid and method for producing microchips
US8654305B2 (en) 2007-02-15 2014-02-18 Asml Holding N.V. Systems and methods for insitu lens cleaning in immersion lithography
US8817226B2 (en) 2007-02-15 2014-08-26 Asml Holding N.V. Systems and methods for insitu lens cleaning using ozone in immersion lithography
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
WO2008148411A1 (en) * 2007-06-07 2008-12-11 Dsm Ip Assets B.V. A method and an apparatus for producing microchips
US8134684B2 (en) * 2008-02-22 2012-03-13 Sematech, Inc. Immersion lithography using hafnium-based nanoparticles
US9176393B2 (en) 2008-05-28 2015-11-03 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB627719A (en) * 1946-10-25 1949-08-15 Eastman Kodak Co Improvements in and relating to photographs and to sensitive photographic materials
US3746541A (en) * 1971-01-28 1973-07-17 Western Electric Co Method of irradiating a non-line-of-sight surface of a substrate
DE2963537D1 (en) * 1979-07-27 1982-10-07 Tabarelli Werner W Optical lithographic method and apparatus for copying a pattern onto a semiconductor wafer
DE4219287A1 (de) * 1992-06-12 1993-12-16 Merck Patent Gmbh Anorganische Füllstoffe und organische Matrixmaterialien mit Brechungsindex-Anpassung
DE19613645A1 (de) * 1996-04-04 1997-10-09 Inst Neue Mat Gemein Gmbh Optische Bauteile mit Gradientenstruktur und Verfahren zu deren Herstellung
JP3817836B2 (ja) * 1997-06-10 2006-09-06 株式会社ニコン 露光装置及びその製造方法並びに露光方法及びデバイス製造方法
US5900354A (en) * 1997-07-03 1999-05-04 Batchelder; John Samuel Method for optical inspection and lithography
FR2780514B1 (fr) * 1998-06-26 2003-05-09 France Etat Procede et dispositif attenuation selective d'un rayonnement
CN1202015C (zh) * 1998-07-30 2005-05-18 美国3M公司 钛基氧化物粒子，含该粒子的胶体、组合物，及陶瓷体制品
JP2001272604A (ja) * 2000-03-27 2001-10-05 Olympus Optical Co Ltd 液浸対物レンズおよびそれを用いた光学装置
AU2003217546A1 (en) * 2002-02-19 2003-09-09 Photon-X, Inc. Polymer nanocomposites for optical applications
AU2003297714A1 (en) * 2002-12-09 2004-06-30 Gregory D. Cooper Programmable photolithographic mask based on nano-sized semiconductor particles
US20050164522A1 (en) * 2003-03-24 2005-07-28 Kunz Roderick R. Optical fluids, and systems and methods of making and using the same
US6867844B2 (en) * 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US6809794B1 (en) * 2003-06-27 2004-10-26 Asml Holding N.V. Immersion photolithography system and method using inverted wafer-projection optics interface
KR20060027832A (ko) * 2003-07-01 2006-03-28 가부시키가이샤 니콘 광학 엘리먼트로서 동위원소적으로 특정된 유체를 사용하는방법
US7070915B2 (en) * 2003-08-29 2006-07-04 Tokyo Electron Limited Method and system for drying a substrate
JP2005136374A (ja) * 2003-10-06 2005-05-26 Matsushita Electric Ind Co Ltd 半導体製造装置及びそれを用いたパターン形成方法
US20050161644A1 (en) * 2004-01-23 2005-07-28 Peng Zhang Immersion lithography fluids
JP2007520893A (ja) * 2004-02-03 2007-07-26 ロチェスター インスティテュート オブ テクノロジー 流体を使用したフォトリソグラフィ法及びそのシステム
JP4264038B2 (ja) * 2004-07-13 2009-05-13 パナソニック株式会社 液浸露光用の液体及びパターン形成方法

Also Published As

Publication number Publication date
WO2005050324A3 (en) 2005-09-22
WO2005050324A2 (en) 2005-06-02
EP1685446A2 (en) 2006-08-02
JP2007525824A (ja) 2007-09-06
US20070105050A1 (en) 2007-05-10

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