TW200508126A - Substrate transporting device and substrate transfer method, and vacuum processing device - Google Patents

Substrate transporting device and substrate transfer method, and vacuum processing device

Info

Publication number
TW200508126A
TW200508126A TW093114303A TW93114303A TW200508126A TW 200508126 A TW200508126 A TW 200508126A TW 093114303 A TW093114303 A TW 093114303A TW 93114303 A TW93114303 A TW 93114303A TW 200508126 A TW200508126 A TW 200508126A
Authority
TW
Taiwan
Prior art keywords
substrate
vacuum processing
transfer method
transporting
chamber
Prior art date
Application number
TW093114303A
Other languages
Chinese (zh)
Other versions
TWI265135B (en
Inventor
Hideki Nakayama
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200508126A publication Critical patent/TW200508126A/en
Application granted granted Critical
Publication of TWI265135B publication Critical patent/TWI265135B/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G60/00—Simultaneously or alternatively stacking and de-stacking of articles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Abstract

The object of the present invention is to transport a relatively large substrate via a vacuum preliminary chamber without increasing the volume of the vacuum preliminary chamber. The solution of the present invention is that inside a load-lock chamber 20 connected to a vacuum processing chamber, a substrate transfer mechanism 70 having a structure for carrying out multi-stage slide type transfer operation for a base plate 71 and a plurality of slide plates 72-74 which are laminated, and a substrate delivery mechanism 80 provided with buffer plates 81, 82 for supporting the peripheral part of the substrate G and a support pin 85 for supporting the central part of the substrate G. Delivery operation for the substrate G between a transporting arm 51 of an atmosphere side transporting mechanism 50 and the substrate transporting mechanism 70 is performed without deflecting the substrate G.
TW093114303A 2003-05-29 2004-05-20 Substrate transporting device and substrate transfer method, and vacuum processing device TWI265135B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003152813 2003-05-29
JP2004137424A JP4023543B2 (en) 2003-05-29 2004-05-06 Substrate transfer apparatus, substrate transfer method, and vacuum processing apparatus

Publications (2)

Publication Number Publication Date
TW200508126A true TW200508126A (en) 2005-03-01
TWI265135B TWI265135B (en) 2006-11-01

Family

ID=34106781

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093114303A TWI265135B (en) 2003-05-29 2004-05-20 Substrate transporting device and substrate transfer method, and vacuum processing device

Country Status (4)

Country Link
JP (1) JP4023543B2 (en)
KR (2) KR100715067B1 (en)
CN (1) CN1326228C (en)
TW (1) TWI265135B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI506716B (en) * 2009-12-01 2015-11-01 Tokyo Electron Ltd Substrate handling device and substrate processing system

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Publication number Priority date Publication date Assignee Title
KR100613265B1 (en) * 2004-09-06 2006-08-21 (주)아이씨디 Vacuum treatment system and subject transfering method using the same
KR100711290B1 (en) 2005-09-26 2007-04-25 세메스 주식회사 Apparatus for transferring glass substrate
US8128793B2 (en) 2006-04-19 2012-03-06 Ulvac, Inc. Vertical substrate transfer apparatus and film-forming apparatus
JP2010245250A (en) * 2009-04-06 2010-10-28 Ihi Corp Substrate-sorting device
JP5150608B2 (en) * 2009-11-20 2013-02-20 株式会社アルバック Conveying device and vacuum device
JP5530175B2 (en) * 2009-12-25 2014-06-25 キヤノンアネルバ株式会社 Vacuum processing equipment
CN102194731B (en) * 2010-03-12 2013-03-27 北京北方微电子基地设备工艺研究中心有限责任公司 Position calibration system and plasma processing device
JP5613001B2 (en) * 2010-10-13 2014-10-22 東京エレクトロン株式会社 Substrate processing system and substrate transfer method
CN102529424A (en) * 2010-12-25 2012-07-04 富葵精密组件(深圳)有限公司 Automatic spray printing machine
KR101945460B1 (en) 2011-12-20 2019-02-08 세메스 주식회사 Substrate treating apparatus, substrate supporting unit and undertaking and delivery substrate method
CN102963578B (en) 2012-11-23 2015-07-01 深圳市华星光电技术有限公司 Panel unpacking method and unpacking device
KR102373075B1 (en) 2012-11-30 2022-03-11 가부시키가이샤 니콘 Transfer system, exposure apparatus, transfer method, exposure method, device manufacturing method, and suction apparatus
CN104251250B (en) * 2013-06-25 2016-03-02 英属开曼群岛商精曜有限公司 Clustered vacuum engagement system
KR102316440B1 (en) * 2013-10-18 2021-10-22 브룩스 오토메이션 인코퍼레이티드 Processing apparatus
JP6478878B2 (en) * 2015-09-01 2019-03-06 東京エレクトロン株式会社 Substrate processing apparatus, substrate transport method, and computer readable storage medium storing substrate transport program
KR20190022837A (en) * 2016-07-12 2019-03-06 리젝 오스트리아 게엠베하 Conveying device
CN108406581B (en) * 2017-03-30 2019-12-27 深圳市天航光学设备有限公司 Week is thrown quick-witted glass and is gone up work or material rest
JP7402658B2 (en) * 2019-11-01 2023-12-21 東京エレクトロン株式会社 Maintenance method for vacuum transfer unit in substrate storage unit and substrate transfer device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05106039A (en) * 1991-10-11 1993-04-27 Nissin Electric Co Ltd Substrate treating equipment
JP3881062B2 (en) * 1996-08-14 2007-02-14 大日本スクリーン製造株式会社 Substrate holding mechanism and substrate processing apparatus
JPH1116981A (en) * 1997-06-20 1999-01-22 Dainippon Screen Mfg Co Ltd Substrate treatment equipment
JP4328496B2 (en) * 2001-06-26 2009-09-09 株式会社日立プラントテクノロジー Single substrate transfer equipment
JP2003100837A (en) * 2001-09-21 2003-04-04 Toyota Industries Corp Transfer system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI506716B (en) * 2009-12-01 2015-11-01 Tokyo Electron Ltd Substrate handling device and substrate processing system

Also Published As

Publication number Publication date
JP4023543B2 (en) 2007-12-19
KR20040103379A (en) 2004-12-08
KR100705846B1 (en) 2007-04-09
KR100715067B1 (en) 2007-05-07
KR20060064041A (en) 2006-06-12
CN1326228C (en) 2007-07-11
CN1574272A (en) 2005-02-02
JP2005012185A (en) 2005-01-13
TWI265135B (en) 2006-11-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees