CN100514550C - Lid body opening/closing mechanism of vacuum processing chamber and method for opening/closing lid body - Google Patents
Lid body opening/closing mechanism of vacuum processing chamber and method for opening/closing lid body Download PDFInfo
- Publication number
- CN100514550C CN100514550C CNB2006101645729A CN200610164572A CN100514550C CN 100514550 C CN100514550 C CN 100514550C CN B2006101645729 A CNB2006101645729 A CN B2006101645729A CN 200610164572 A CN200610164572 A CN 200610164572A CN 100514550 C CN100514550 C CN 100514550C
- Authority
- CN
- China
- Prior art keywords
- vacuum processing
- processing chamber
- mentioned
- cover body
- body opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000007246 mechanism Effects 0.000 title claims abstract description 115
- 238000012545 processing Methods 0.000 title claims abstract description 93
- 238000000034 method Methods 0.000 title claims description 28
- 239000011159 matrix material Substances 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims description 119
- 230000009467 reduction Effects 0.000 abstract description 3
- 238000009489 vacuum treatment Methods 0.000 description 52
- 230000005540 biological transmission Effects 0.000 description 44
- 238000009434 installation Methods 0.000 description 36
- 230000009471 action Effects 0.000 description 27
- 230000032258 transport Effects 0.000 description 25
- 230000008569 process Effects 0.000 description 15
- 230000008602 contraction Effects 0.000 description 14
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 11
- 238000012546 transfer Methods 0.000 description 8
- 238000012423 maintenance Methods 0.000 description 7
- 238000006073 displacement reaction Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000033001 locomotion Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 238000004904 shortening Methods 0.000 description 3
- 239000000178 monomer Substances 0.000 description 2
- 230000007306 turnover Effects 0.000 description 2
- 101000574352 Mus musculus Protein phosphatase 1 regulatory subunit 17 Proteins 0.000 description 1
- 230000002337 anti-port Effects 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000007115 recruitment Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Robotics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention is a lid body opening/closing mechanism of a vacuum processing chamber, the lid body opening/closing mechanism opens/closes the lid body in the vacuum processing chamber having a matrix body and the lid body mounted on the matrix body in a detachable manner, and is characterised by including a movable trolley, a supporting unit mounted on the trolley for supporting the lid body. Hence, space of the whole device can be saved, and cost reduction due to common usage of the lid body opening/closing mechanism can be achieved.
Description
The application is to be that May 27, application number in 2004 are that 200410038397.X, denomination of invention are dividing an application of asking in the patent of " base-board conveying device and substrate transfer method and vacuum treatment installation " applying date.
Technical field
The present invention relates to the vacuum treatment technology, particularly relate to the otherwise effective technique that is fit to following vacuum treatment installation etc., the substrate of the glass substrate that the flat-panel screens of utilizing this vacuum treatment installation to carry out liquid crystal indicator (LCD) or plasma display etc. is used etc. transports operation, or above-mentioned glass substrate is carried out the vacuum treatment of dry ecthing etc.
Background technology
In manufacturing process, as the LCD glass substrate of processed substrate, adopt the vacuum treatment of dry ecthing, sputter, CVD (chemical vapor-phase growing) etc. relatively such as LCD more.
In carrying out so vacuum treated vacuum treatment installation, adopt following structures, wherein, according to the mode of carrying out the vacuum processing chamber adjacency of above-mentioned processing with keeping vacuum, loadlock may is set, when sending into of processed substrate sent, makes the atmosphere in the vacuum treatment change minimum.
Specifically, such as, at the container that is arranged at atmospheric side with carry out being provided with the load locking room as loadlock may between the vacuum processing chamber of etch processes etc., this load locking room has the function at the interface of atmospheric side and inlet side.
In this load locking room, because when processed substrate passes through, carry out atmosphere opening repeatedly and until the exhaust that reaches with the high vacuum of vacuum processing chamber same degree, so aspect the raising of output, reduce volume as much as possible, shortening until the exhaust required time that reaches high vacuum is important factor.
Thus, the indoor substrate of load-lock transports the base-board conveying device that is adopted and requires to suppress the volume that conduct is provided with the load locking room in place, as such base-board conveying device, such as, people know that patent documentation 1 is arranged is disclosed such, connect the multiarticulate type of a plurality of arms.In addition, it is little to do one's utmost ground as the resignation state, simultaneously can guarantee the big type of transporting distance, and people also inquire into following base-board conveying device, wherein, have a plurality of arm rectilinear motions and the flexible telescopic arm of multistage.
But recently, people are strong to the requirement of the size increase of LCD glass substrate, until a limit occurring above 1m's and less than the so huge type of 2m.Such as, between vacuum processing chamber and load locking room, along continuous straight runs transports the occasion of so huge substrate, if be the such multi-joint type described in the patent documentation 1, then be difficult to reduce to be provided with the load locking room of base-board conveying device on one side, Yi Bian guarantee stroke enough for transporting minimumly.In addition, in the telescopic arm of multistage as described above, have to increase the stacked hop count of arm, so that guarantee the necessary distance of transporting, thus, the height of conveyer increases, consequently, the height that is provided with the load locking room of conveyer increases, and the size of load locking room reduces to have restriction.
On the other hand, in the maintenance care of this vacuum treatment installation, have matrix part, take off lid, carry out the situation of inner cleaning from vacuum processing chamber.Be arranged with in formation under the situation of multi-cavity system of a plurality of vacuum processing chambers (vacuum treatment installation), if constitute the switching mechanism that each vacuum processing chamber has lid, then the floor space that is provided with of each equipment increases, and efficient is poor.Particularly, in the vacuum treatment installation that large-scale substrate is handled, because the size of the equipment of monomer itself also increases, so for each vacuum processing chamber the situation of the switching mechanism of lid is set all, the increase of the above-mentioned floor space of multi-cavity system is especially remarkable.Patent documentation 1: 2001-No. 148410 documents of TOHKEMY
Summary of the invention
The present invention be directed to above-mentioned situation and propose, purpose is to be provided at shared cover body opening/closing mechanism in a plurality of vacuum processing chambers (vacuum treatment installation).
In addition, other purpose of the present invention is to provide and can increasing under the situation that the space is set of short transverse, increases the base-board conveying device that transports distance of horizontal direction, and the substrate transfer method that adopts such device.
In addition, the object of the present invention is to provide a kind of base-board conveying device, this base-board conveying device can be under the situation of the volume that does not increase set loadlock may, carries out the transporting of bigger substrate by loadlock may.
The object of the present invention is to provide a kind of base-board conveying device, this base-board conveying device can improve the vacuum treated productivity ratio of bigger substrate.
In order to solve above-mentioned problem, the invention provides a kind of cover body opening/closing mechanism of vacuum processing chamber, have matrix part and be arranged on the vacuum treatment of the lid on this matrix part in mode removably indoor, open and close above-mentioned lid, it is characterized in that this cover body opening/closing mechanism comprises: chassis and be arranged on the support portion of the above-mentioned lid of support on this chassis movably.
In addition, the invention provides a kind of cover body opening/closing method of vacuum processing chamber, have matrix part and be arranged on the vacuum treatment of the lid on this matrix part indoor, open and close above-mentioned lid, it is characterized in that in mode removably:
Make have movably chassis, being set to can be at the shared cover body opening/closing mechanism of a plurality of above-mentioned vacuum processing chambers, move to as the above-mentioned vacuum processing chamber of purpose over against the position;
Then, utilize above-mentioned cover body opening/closing mechanism that above-mentioned lid is floated upward, it is broken away from from above-mentioned matrix part;
Then, above-mentioned lid is moved on above-mentioned chassis, open above-mentioned matrix part.
In addition, in other aspects of the present invention, provide a kind of base-board conveying device, it is characterized in that this base-board conveying device comprises: the supporting station of mounting substrate; Be arranged at 1 or slidably stacked a plurality of plate-like arms of the bottom of above-mentioned supporting station; With the arm driving mechanism, this arm driving mechanism is arranged at respectively on the above-mentioned plate-like arms, the above-mentioned supporting station or the above-mentioned plate-like arms of the upside that is positioned at this plate-like arms are slided, above-mentioned supporting station and above-mentioned plate-like arms are changed between contraction state and elongation state, thus, between the primary importance and the second place, carry out the action of transporting of aforesaid substrate, above-mentioned each plate-like arms comprises the peristome of accommodating above-mentioned arm driving mechanism within it.
In addition, the present invention also provides a kind of base-board conveying device, and this base-board conveying device is arranged in the above-mentioned loadlock may in the vacuum treatment installation, and this vacuum treatment installation comprises: vacuum processing chamber, and this vacuum processing chamber is handled substrate in a vacuum; And loadlock may, this loadlock may is being sent into aforesaid substrate in the process of sending above-mentioned vacuum processing chamber, accommodate this substrate temporarily, the inside of this loadlock may keeps vacuum, it is characterized in that this base-board conveying device comprises: the supporting station of mounting substrate: 1 or slidably stacked a plurality of plate-like arms being arranged at the bottom of above-mentioned supporting station; With the arm driving mechanism, this arm driving mechanism is arranged at respectively on the above-mentioned plate-like arms, the above-mentioned supporting station or the above-mentioned plate-like arms of the upside that is positioned at this plate-like arms are slided, above-mentioned supporting station and above-mentioned plate-like arms are changed between contraction state and elongation state, thus, carry out the action of transporting of aforesaid substrate between the primary importance in above-mentioned loadlock may and the second place of above-mentioned vacuum processing chamber, above-mentioned each plate-like arms comprises the peristome of accommodating above-mentioned arm driving mechanism within it.
In addition, the present invention also provides a kind of base-board conveying device, it is characterized in that, this base-board conveying device comprises: the supporting station of mounting substrate; Be arranged on the bottom of above-mentioned supporting station slidably stacked a plurality of plate-like arms; The arm driving mechanism, this arm driving mechanism is arranged at respectively on the above-mentioned plate-like arms, the above-mentioned supporting station or the above-mentioned plate-like arms of the upside that is positioned at this plate-like arms are slided, above-mentioned supporting station and above-mentioned plate-like arms are changed between contraction state and elongation state, thus, between the primary importance and the second place, carry out the action of transporting of aforesaid substrate, above-mentioned each plate-like arms comprises within it, according to pass the peristome of accommodating above-mentioned arm driving mechanism in abutting connection with the mode of the position that arm does not overlap mutually along stacked direction.
Also have, the invention provides a kind of substrate transfer method, this substrate transfer method adopts base-board conveying device to transport substrate, and this base-board conveying device comprises: the supporting station of mounting substrate: 1 or slidably stacked a plurality of plate-like arms being arranged at the bottom of above-mentioned supporting station; With the arm driving mechanism, this arm driving mechanism is arranged at respectively on the above-mentioned plate-like arms, the above-mentioned supporting station or the above-mentioned plate-like arms of the upside that is positioned at this plate-like arms are slided, it is characterized in that, formation is contained in above-mentioned arm driving mechanism the state in the peristome of above-mentioned each plate-like arms, above-mentioned supporting station and above-mentioned plate-like arms is changed, thus between contraction state and elongation state, between the primary importance and the second place, carry out the action of transporting of aforesaid substrate.
Have, the present invention also provides a kind of vacuum treatment installation again, and this vacuum treatment installation comprises: vacuum processing chamber, and this vacuum processing chamber is handled substrate in a vacuum; Loadlock may, this loadlock may is accommodated this substrate aforesaid substrate being sent in the process of sending above-mentioned vacuum processing chamber temporarily, and the inside of this loadlock may keeps vacuum; Base-board conveying device, this base-board conveying device is arranged in the above-mentioned loadlock may, between the primary importance and the indoor second place of above-mentioned vacuum treatment of this base-board conveying device in above-mentioned loadlock may, carry out the action of transporting of aforesaid substrate, it is characterized in that the aforesaid substrate conveyer comprises the supporting station of mounting substrate; Be arranged at 1 or slidably stacked a plurality of plate-like arms of the bottom of above-mentioned supporting station; With the arm driving mechanism, this arm driving mechanism is arranged at respectively on the above-mentioned plate-like arms, the above-mentioned supporting station or the above-mentioned plate-like arms of the upside that is positioned at this plate-like arms are slided, by above-mentioned supporting station and above-mentioned plate-like arms are changed between contraction state and elongation state, between the indoor second place of primary importance in above-mentioned loadlock may and above-mentioned vacuum treatment, carry out the action of transporting of aforesaid substrate, above-mentioned each plate-like arms comprises the peristome of accommodating above-mentioned arm driving mechanism within it.
In addition, the present invention also provides a kind of base-board conveying device, it is characterized in that, it comprises pedestal; Can be arranged at 1 arm or the stacked up and down a plurality of arms on this pedestal along the mode of front and back slip; Supporting station, this supporting station be according on the arm that can be arranged at the epimere in the above-mentioned arm along the mode of sliding in front and back, supporting substrates; Drive source, this drive source drives above-mentioned arm and supporting station; And drive transmission mechanism, this drive transmission mechanism passes to above-mentioned each arm and above-mentioned supporting station with above-mentioned drive source drives power; Above-mentioned drive transmission mechanism one of them arm in making above-mentioned arm makes arm or supporting station on it slide with second stroke greater than above-mentioned first stroke when first stroke slides; By above-mentioned drive source and above-mentioned drive transmission mechanism, above-mentioned supporting station and above-mentioned one or more arms are changed between contraction state and elongation state, thus, between the primary importance and the second place, carry out the action of transporting of aforesaid substrate.
In addition, the present invention also provides a kind of base-board conveying device, and base-board conveying device is arranged in the above-mentioned loadlock may in the vacuum treatment installation, and this vacuum treatment installation comprises: vacuum processing chamber, and this vacuum processing chamber is handled substrate in a vacuum; And loadlock may, this loadlock may is accommodated this substrate aforesaid substrate being sent in the process of sending above-mentioned vacuum processing chamber temporarily, and the inside of this loadlock may keeps vacuum, it is characterized in that this base-board conveying device has: pedestal; Can be arranged at 1 arm or the stacked up and down a plurality of arms on this pedestal along the mode of front and back slip; Supporting station, this supporting station can be along on the arm that is arranged at the epimere in the above-mentioned arm slidingly back and forth, supporting substrates; Drive source, this drive source drives above-mentioned arm and supporting station; And drive transmission mechanism, this drive transmission mechanism passes to above-mentioned each arm and above-mentioned supporting station with above-mentioned drive source drives power, above-mentioned drive transmission mechanism one of them arm in making above-mentioned arm is when first stroke slides, arm or supporting station on it are slided with second stroke greater than above-mentioned first stroke, by above-mentioned drive source and above-mentioned drive transmission mechanism, above-mentioned supporting station and above-mentioned one or more arms are changed between contraction state and elongation state, thus, between between the indoor second place of primary importance in above-mentioned loadlock may and above-mentioned vacuum treatment, carry out the action of transporting of aforesaid substrate.
In addition, the invention provides a kind of substrate transfer method, this substrate transfer method adopts base-board conveying device to transport substrate, and this base-board conveying device has: pedestal; According to can be along front and back slidably mode be arranged at 1 or stacked up and down a plurality of arms on the said base: supporting station, this supporting station be arranged at epimere in the above-mentioned arm, supporting substrates according to the mode that can slide along front and back; Drive source, this drive source drives above-mentioned arm and supporting station; Drive transmission mechanism, this drive transmission mechanism passes to above-mentioned each arm and above-mentioned supporting station with above-mentioned drive source drives power, it is characterized in that, by above-mentioned drive transmission mechanism, 1 arm in making above-mentioned arm is when first stroke slides, with second stroke greater than above-mentioned first stroke, arm or supporting station on it are slided, above-mentioned supporting station and above-mentioned plate-like arms are changed between contraction state and elongation state, thus, transport substrate between the indoor second place of primary importance in above-mentioned loadlock may and above-mentioned vacuum treatment.
In addition, the invention provides a kind of vacuum treatment installation, this vacuum treatment installation comprises: vacuum processing chamber, and this vacuum processing chamber is handled substrate in a vacuum; Loadlock may, this loadlock may is accommodated this substrate aforesaid substrate being sent in the process of sending above-mentioned vacuum processing chamber temporarily, and the inside of this loadlock may keeps vacuum; And base-board conveying device, this base-board conveying device is arranged in the above-mentioned loadlock may, between the indoor second place of primary importance in above-mentioned loadlock may and above-mentioned vacuum treatment, carries out the action of transporting of aforesaid substrate, it is characterized in that the aforesaid substrate conveyer has: pedestal; Can be arranged at 1 arm or the stacked up and down a plurality of arms on this pedestal along the mode of front and back slip; Supporting station, this supporting station is according on the arm that can be arranged at the epimere in the above-mentioned arm along the mode of sliding in front and back, supporting substrates: drive source, this drive source drives above-mentioned arm and substrate supporting platform: and drive transmission mechanism, this drive transmission mechanism passes to above-mentioned each arm and above-mentioned supporting station with above-mentioned drive source drives power, above-mentioned drive transmission mechanism one of them arm in making above-mentioned arm is when first stroke slides, arm or supporting station on it are slided with second stroke greater than above-mentioned first stroke, by above-mentioned drive source and above-mentioned drive transmission mechanism, above-mentioned supporting station and above-mentioned one or more arms are changed between contraction state and elongation state, thus, between the indoor second place of primary importance in above-mentioned loadlock may and above-mentioned vacuum treatment, carry out the action of transporting of aforesaid substrate.
The effect of invention
As mentioned above, by being provided with to the shared cover body opening/closing mechanism of a plurality of vacuum processing chambers (vacuum treatment installation), carry out the switching of the lid of maintenance care operation etc., saving space that can implement device integral body and descend by the cost of the shared generation of cover body opening/closing mechanism.
In addition,,, accommodate the arm driving mechanism, so can reduce the height of the thickness part of arm driving mechanism owing to connecting in the peristome that is arranged on each plate-like arms in stacked direction along plate-like arms according to other aspects of the present invention.Thus, even, under the situation of the stacked quantity of increase plate-like arms, still can reduce the recruitment of height dimension in order to ensure the long distance of transporting with doing one's utmost.So, such as, with the loadlock may of vacuum processing chamber adjacency in base-board conveying device is set, that carries out horizontal direction transports distance in the vacuum treatment installation that transports etc. of long bigger substrate, the height of the loadlock may that this base-board conveying device is set needn't be increased, the increase of the volume of loadlock may can be prevented.Consequently, the increase of required time of the exhaust of this loadlock may that the increase of the volume of loadlock may causes can be suppressed, the productivity ratio of following through the vacuum treatment operation of the substrate that transports action of loadlock may can be improved.
In addition, because base-board conveying device adopts following scheme, wherein, this device comprises: pedestal; Can be arranged at 1 arm or the stacked up and down a plurality of arms on this pedestal along the mode of front and back slip; Supporting station, this supporting station can be along on the arm that is arranged at the epimere in the above-mentioned arm slidingly back and forth, supporting substrates; Drive source, this drive source drives above-mentioned arm and supporting station; And drive transmission mechanism, this drive transmission mechanism passes to above-mentioned each arm and supporting station with above-mentioned drive source drives power, because above-mentioned drive transmission mechanism is when one of them arm slip that makes according to first stroke in the above-mentioned arm, arm or supporting station on it are slided according to second stroke greater than above-mentioned first stroke, so compare, can increase the arm on it or the sliding stroke of supporting station with the sliding stroke of 1 arm.Thus,, still can obtain required stroke, can reduce and guarantee and identical stacked quantity of transporting the arm that stroke uses in the past, consequently, can reduce the height of conveyer by less arm quantity even have under the situation of restriction at the sliding stroke of 1 arm.So, same as described above, with the loadlock may of vacuum processing chamber adjacency in base-board conveying device is set, carry out in the vacuum treatment installation that transports etc. of the bigger substrate that transports distance of horizontal direction, needn't increase the height of the loadlock may that this base-board conveying device is set, the volume that can prevent loadlock may increases, the increase of required time of the exhaust of loadlock may can be suppressed, the productivity ratio of the vacuum treatment operation of following the substrate that transports action by loadlock may can be improved.
Description of drawings
Fig. 1 is the stereogram of the outward appearance of the vacuum treatment installation of the base-board conveying device of the suitable embodiments of the present invention 1 of expression.
Fig. 2 is the loadlock may in the vacuum treatment installation of the base-board conveying device of the suitable embodiments of the present invention 1 of expression and the sectional view of vacuum processing chamber.
Fig. 3 is the stereogram of the base-board conveying device of expression embodiments of the present invention 1.
Fig. 4 is the sectional view of the base-board conveying device of expression embodiments of the present invention 1.
Fig. 5 is the sectional view of the base-board conveying device of expression embodiments of the present invention 1.
Fig. 6 comprises the stereoscopic figure of an example of structure of multi-cavity system of the vacuum treatment installation of Fig. 1 for expression.
Fig. 7 is the stereoscopic figure of action of the multi-cavity system of presentation graphs 6.
Fig. 8 is the vertical cross-section diagram of the base-board conveying device of expression embodiments of the present invention 2.
Fig. 9 is the end view and the plane graph of the contraction state of the base-board conveying device of expression embodiments of the present invention 2.
Figure 10 is the end view and the plane graph of the elongation state of the base-board conveying device of expression embodiments of the present invention 2.
Figure 11 is the end view of the distortion example of the base-board conveying device of expression embodiments of the present invention 2.
Figure 12 is used for the vertical cross-section diagram of example of the base-board conveying device of following type for the base-board conveying device of expression embodiments of the present invention 2, and wherein, the slip pick-up part is according to 2 sections settings, and is independent respectively, can realize the discrepancy of substrate.
Label declaration: 10 vacuum processing chambers; 14 matrix parts; 15 lids; 16 bolsters; 20 load locking rooms; 30,40 families of power and influence; 50 atmospheric side conveyers; 60 vacuum pumps; 70,170,300 base plate transfer devices; The 70a CD-ROM drive motor; The 70b driving belt; 71 base plates; 71a, 72a～73a slide rail; The 71b peristome; 71c, 72c～73c belt pulley; 71d, 72d～73d belt; The 71e fixed part; 72,73,74 sliding panels; 72b～73b peristome; 72e～73e, 72f～73f fixed part; Portion is picked up in the 74a slip; 74b sliding bearing portion; 100 vacuum treatment installations; 171,271,271 ' base portion; 172,272,272 ' travelling arm; 173,273,273 ' slip pick-up part; 174,273,274 ' motor; 180,280 drive transmission mechanisms; 181 travelling arm drive divisions; 182 slip pick-up part drive divisions; 183 drive pulleys; 184 driving belts; 186; 187 belt pulleys (first belt pulley); 190 first belts; 191 first fixed parts; 192 belt pulleys (second belt pulley); 195 second belts; 196 second fixed parts; 270 hypomere conveyer portions; 270 ' epimere conveyer portion; 280 ' first drive transmission mechanism; 290 second drive transmission mechanisms; The G substrate.
Embodiment
With reference to the accompanying drawings, embodiments of the present invention are specifically described.
(execution mode 1)
Fig. 1 is the stereogram of the outward appearance of the vacuum treatment installation of the base-board conveying device of the suitable embodiments of the present invention 1 of expression, Fig. 2 is the loadlock may in the vacuum treatment installation of the base-board conveying device of the suitable embodiments of the present invention 1 of expression and the sectional view of vacuum processing chamber, Fig. 3 is the stereogram of the base-board conveying device of expression embodiments of the present invention 1, and Fig. 4 and Fig. 5 are the sectional view of the base-board conveying device of expression embodiments of the present invention 1.
As shown in Figure 1, this vacuum treatment installation 100 comprises: vacuum processing chamber 10, this vacuum processing chamber 10 is by vacuum atmosphere, to the substrate G of transparent LCD glass substrate etc., carries out plasma etching process processes, film and forms the required vacuum treatment of handling etc.; Load locking room 20, this load locking room 20 is connected with this vacuum processing chamber 10, as loadlock may; The family of power and influence 30, and this family of power and influence 30 is arranged between vacuum processing chamber 10 and the load locking room 20; The family of power and influence 40, and this family of power and influence 40 separates load locking room 20 and atmosphere outside side connecting gear 50.
As illustrated in figures 1 and 2, vacuum pump 60 is by gas exhausting valve 61, be connected with vacuum processing chamber 10, can realize reaching substrate G and carry out the vacuum exhaust that specified vacuum is handled necessary vacuum degree, handle gas supply part 12 and be connected with vacuum processing chamber 10 through gas control valve 11.In addition, can form the processing gas atmosphere of the pressure of regulation in the inside of vacuum processing chamber 10.In the inside of vacuum processing chamber 10, set handling platform 13, the substrate G of mounting process object.
In the family of power and influence 30, be provided with peristome 31, this peristome 31 is communicated with vacuum processing chamber 10 and load locking room 20, and this peristome 31 has to make and is supported on the size that the substrate G on the base-board conveying device 70 described later passes through; With valve body 32, this valve body 32 carries out the on-off action of this peristome 31.
In the family of power and influence 40, be provided with peristome 41, this peristome 41 is communicated with load locking room 20 and atmosphere outside side, and this peristome 41 has to make and is supported on the size that the substrate G on the above-mentioned atmospheric side conveyer 50 passes through; With valve body 42, this valve body 42 carries out the on-off action of this peristome 41.
In the inside of load locking room 20, be provided with base-board conveying device 70.As Fig. 3～shown in Figure 5, this base-board conveying device 70 comprises base plate 71, this base plate 71 is fixed in the bottom of load locking room 20; A plurality of sliding panels 72, these a plurality of sliding panels 72 are stacked and placed on this base plate 71 according to multistage; The sliding panel 74 of sliding panel 73 and mounting substrate G as the substrate supporting platform.
On base plate 71, be provided with a pair of slide rail 71a, this is to the sliding panel 72 directly over the slide rail 71a supporting, and along continuous straight runs leads to it.On base plate 71, the asymmetric position between a pair of slide rail 71a forms and this slide rail 71a open parallel 71b of portion according to the mode that connects along short transverse.Inside at peristome 71b contains: a pair of belt pulley 71c, and this axle to belt pulley 71c is a level, is arranged at two ends; With belt 71d, this belt 71d opens and is located on this belt pulley 71c.The bottom of the sliding panel 72 of upside is fixed in by fixed part 71e in the top leap portion of this belt 71d (the belt path of the upside between the belt pulley 71c).
On sliding panel 72, be provided with a pair of slide rail 72a, this is to the sliding panel 73 directly over the slide rail 72a supporting, and along continuous straight runs leads to it.In sliding panel 72, between a pair of slide rail 72a,,, form and this slide rail 72a open parallel 72b of portion according to the mode that connects along short transverse in the position that does not overlap with the peristome 71b of the base plate 71 of downside.In the inside of this peristome 72b, contain a pair of belt pulley 72c, this axle to belt pulley 72c is a level, this is arranged at two ends to belt pulley 72c; With belt 72d, this belt 72d opens and is located on this belt pulley 72c.
The bottom of the sliding panel 73 of upside is fixed in by fixed part 72e in the top leap portion of belt 72d, and the bottom leap portion of belt 72d (the belt path of the downside between the belt pulley 72c) is fixed on the base plate 71 of downside by fixed part 71f.
In the two sides of sliding panel 73, be provided with a pair of slide rail 73a, this is to the sliding panel 74 directly over the slide rail 73a supporting, and along continuous straight runs leads to it.In sliding panel 73, between a pair of slide rail 73a,,, form and this slide rail 73a open parallel 73b of portion according to the mode that connects along short transverse in the position that does not overlap with the peristome 72b of the sliding panel 72 of downside.In the inside of this peristome 73b, contain a pair of belt pulley 73c, this axle to belt pulley 73c is a level, this is arranged at two ends to belt pulley 73c; Belt 73d, this belt 73d open and are located on this belt pulley 73c.
The top leap portion of belt 73d is fixed on the bottom of the sliding panel 74 of upside by fixed part 73e, and the bottom leap portion of belt 73d is fixed on the sliding panel 72 of downside by fixed part 72f.
On the sliding panel 74 of topmost, be provided with a pair of sliding bearing 74b of portion, this is chimeric with the above-mentioned a pair of slide rail 73a on the two sides of sliding panel 73 that are arranged at downside to the 74b of sliding bearing portion.Like this, on the two sides of sliding panel 73, slide rail 73a is set, thus, the whole height of base-board conveying device 70 only can be reduced the height of slide rail 73a.In addition, on sliding panel 74, the 74a of portion is picked up in the slip that the following basic コ font of the substrate G that supports institute's mounting is set.
In above-mentioned such base-board conveying device that constitutes 70, if the contraction state of representing by way of example from Fig. 5, by CD-ROM drive motor 70a, the belt pulley 71c of base plate 71 is rotated in a clockwise direction, then by fixed part 71e, sliding panel 72 beginnings of upside of being fixed in the top leap portion of belt 71d are moved according to the mode to the right elongation of Fig. 5.
At this moment, because the bottom leap portion of the belt 72d of sliding panel 72 is fixed on the base plate 71 of downside, so this belt 72d follows moving relative to the base plate 71 of the downside of this sliding panel 72, along clockwise direction around, by fixed part 72e, be fixed in sliding panel 73 in the top leap portion of this belt 72d on sliding panel 72, begin to move according to mode to the right elongation of Fig. 5.
In addition, the bottom leap portion of the belt 73d of sliding panel 73 is by fixed part 72f, be fixed on the sliding panel 72 of downside, so this belt 73d follows moving relative to the sliding panel 72 of the downside of this sliding panel 73, along clockwise direction around, the sliding panel 74 of fixing topmost begins to move according to the mode of extending to the right of Fig. 5 on sliding panel 73 by the fixed part 73e of this belt 73d.
Thus, represent by example that sliding panel 72～74 moves to the distance of right-hand member of Fig. 3 and multistage ground elongation according to the fixed part 71e～73e in each the top leap portion of being fixed in belt 71d～73d as Fig. 3 and Fig. 4.Elongated distance (transport distance) is proportional and extend with the stacked hop count of sliding panel.
In addition,, make CD-ROM drive motor 70a antiport, in the counterclockwise direction, make each belt 71d～73d rotation, thus, become the contraction state shown in Fig. 5 from the elongation state of Fig. 3 and Fig. 4.
Also have, base-board conveying device 70 is as above-mentioned, carry out following action: make sliding panel 72～74 elongations in the horizontal direction multistage, with be supported on substrate G on the sliding panel 74 move into vacuum processing chamber 10 inside send into action, and sliding panel 72～74 is shunk, to the substrate G of mounting on sliding panel 74 be fetched into the action of sending of load locking room 20 in the inside of vacuum processing chamber 10.
As above-mentioned, in the base-board conveying device 70 of present embodiment, owing to adopt following scheme, wherein, according to the mode of transporting action of carrying out the substrate G of mounting on the sliding panel 74 of epimere, in multistage stacked base plate 71 and sliding panel 72～73, form peristome 71b and peristome 72b～73b, portion within it, accommodate belt pulley 71c, 72c～73c and belt 71d, belt 72d～73d, even, do not produce because of belt pulley so under the situation of the stacked hop count that increases sliding panel, only be the thickness that increases sliding panel in short transverse, the thickness of the driving mechanism of belt etc. and the size of the short transverse that causes increases.
That is, can be under the situation of the size that does not increase short transverse, realize the increase of transporting distance that the increase owing to the stacked hop count of sliding panel causes.
In addition, because the position of peristome 71b and peristome 72b～73b alternately is arranged at the position that does not hinder mutually along short transverse, can further cut down height.
In the inside of load locking room 20,, be provided with buffer board 81 and buffer board 82 in the position of clamping base-board conveying device 70; Substrate delivery mechanism 80, this substrate delivery mechanism 80 comprises makes this buffer board 81 and buffer board buffering elevating mechanism 82 liftings, not shown, the periphery of the substrate G of mounting on the sliding panel 74 of base-board conveying device 70 is supported from the below by buffer board 81 and 82, make the action of substrate G, and make the substrate G that receives from atmospheric side conveyer 50 drop to the substrate delivery actions of action on the sliding panel 74 etc. from this sliding panel 74 come-ups.
Action to present embodiment is described below.At first, base-board conveying device 70 is in the state of the inside that is retracted to load locking room 20, and the family of power and influence 30 valve body 32 is closed, and carries out exhaust by the inside of 60 pairs of vacuum processing chambers 10 of vacuum pump, until necessary vacuum degree.
Then, buffer board 81 and buffer board 82 rise, and the periphery from both sides with substrate G lifts, and thus, substrate G is from transporting arm 51 come-ups.
Then, will transport arm 51 and be retracted to atmospheric side, and make it fall back to the outside of load locking room 20, then, buffer board 81 and buffer board 82 are descended, thus, substrate G is transferred on the sliding panel 74 (74a of portion is picked up in slip) of base-board conveying device 70, with its mounting on this sliding panel 74.
Then, the family of power and influence 40 valve body 42 is closed, makes load locking room 20 be in sealing state, open gas exhausting valve 62, carry out exhaust until with the vacuum degree of vacuum processing chamber 10 same degree, then, open the family of power and influence 30 valve body 32.At this moment, because load locking room 20 is carried out vacuum exhaust, so do not damage the vacuum degree or the atmosphere of vacuum processing chamber 10.Then, peristome 31 by the family of power and influence 30, as Fig. 3, the sliding panel 72～74 of base-board conveying device 70 is extended towards multistage ground, the inside of vacuum processing chamber 10, substrate G is sent to the positive top of the treatment bench 13 of vacuum processing chamber 10, by being arranged at the not shown pin etc. of upward dashing forward of vacuum processing chamber 10 inside, mounting is on treatment bench 13, then, sliding panel 72～74 is retracted to the inside of load locking room 20, realize resignation, the family of power and influence 30 valve body 32 is closed, with vacuum processing chamber 10 sealings.
Afterwards,,, send into necessary gas, form and handle gas atmosphere,, carry out necessary processing substrate G from handling gas supply part 12 in the inside of the vacuum processing chamber 10 that seals.
After the process stipulated time, stop to handle sending into of gas, open the family of power and influence 30 valve body 32, is multistage with the sliding panel 72～74 of the base-board conveying device 70 of load locking room 20 inside to the inner elongated of vacuum processing chamber 10, according to the above-mentioned opposite order of action of sending into, with the substrate G of the processing of vacuum processing chamber 10 from treatment bench 13, transfer on the sliding panel 74, sliding panel 72～74 is shunk, it is passed out to the inside of load locking room 20, then, the family of power and influence 30 valve body 32 is closed, with vacuum processing chamber 10 sealings.
Then, stop the exhaust of load locking room 20, and buffer board 81,82 is risen, the periphery of supporting substrates G makes its come-up, sends into N
2Deng, form pressure near atmosphere, then, open the family of power and influence 40 valve body 42, with the downside that arm 51 is inserted into the substrate G of come-up that transports of atmospheric side conveyer 50,, buffer board 81,82 is descended at this state, substrate G is transferred to transport arm 51.
Then, will transport arm 51 and be pulled out to atmospheric side, the substrate G that handled from load locking room 20, will be passed out to atmospheric side, it will be contained in the frame substrate 55.
Here, when the turnover of the substrate G relative vacuum process chamber 10 that resembles process load locking room 20 as described above, if the size of substrate G increases, the distance of transporting of the horizontal direction of process load locking room 20 is increased, increase the stacked hop count of the sliding panel of base-board conveying device 70, prolong and transport distance, but, even the such base-board conveying device 70 of present embodiment is as above-mentioned, increase the stacked hop count of sliding panel, prolong and transport under the situation of distance, the size that still can suppress short transverse increases.
Consequently, can reduce to contain the volume of the load locking room 20 of base-board conveying device 70, can shorten the required time of the vacuum exhaust of this load locking room 20, comprise that the productivity ratio of vacuum treatment operation of substrate G of the exhaust stipulated time of load locking room 20 improves.
Particularly, in the load locking room 20 of accommodating 1 limit so large-scale substrate G above 1m, horizontal sectional area increases, and the height of load locking room 20 is cut down reduction effect, the shortening of exhaust stipulated time that goes far towards volume.
An example to the maintenance care technology of above-mentioned vacuum treatment installation 100 is described below.In the maintenance care of this vacuum treatment installation 100, have matrix part 14 from vacuum processing chamber 10, take off lid 15, carry out the situation of inner cleaning.
On the one hand, in the treatment process of substrate G, have, form the situation of the multi-cavity system that is arranged with a plurality of vacuum processing chambers 10 (vacuum treatment installation 100) as shown in Figure 6.In this occasion, if the mode that has a switching mechanism of lid 15 according to each vacuum processing chamber 10 forms, then the floor space that is provided with of each equipment increases, and efficient is poor.Particularly, in the vacuum treatment installation 100 that large-scale substrate G is handled, because the size of the equipment of monomer itself also increases, so at each vacuum processing chamber, switching mechanism is set, and thus, the increase of the above-mentioned floor space of multi-cavity system is further remarkable.
So, in the present embodiment, to pass through shown in the example as Fig. 6, the mode that shared cover body opening/closing mechanism 200 is set according to a plurality of vacuum processing chambers 10 (vacuum treatment installation 100) forms.
That is, cover body opening/closing mechanism 200 comprises chassis 201, and this chassis 201 voluntarily, thus, can move between a plurality of vacuum treatment installations 100 by wheel 201a is set; A pair of rail 202, this is arranged on the chassis 201 rail 202, have can be between plumbness and level crooked movable rail 202a; Live bearing portion 203, this live bearing portion 203 move on this rail 202.
In addition, adopt this shared cover body opening/closing mechanism 200,, carry out each the switching of lid 15 of vacuum processing chamber 10 of maintenance care operation as Fig. 7.
Promptly, at first, make cover body opening/closing mechanism 200 move to target vacuum process chamber 10 over against the position, pass through shown in the example as Fig. 7 (a), according to the mode of this vacuum processing chamber 10 of clamping, make movable rail 202a rotate to the position of level, a pair of bolster 16 of a pair of live bearing portion 203 and lid 15 is chimeric, make lid 15 towards the vertical direction come-up, itself and matrix part 14 are left.
Then, pass through shown in the example live bearing portion 203 of supporting lid 15 to be moved on the chassis 201 as Fig. 7 (b).Thus, open the top of matrix part 14, can carry out the maintenance operation of the cleaning etc. of the treatment bench 13 in the matrix part 14.
In addition, pass through on chassis 201,, lid 15 to be revolved turn 90 degrees shown in the example, be locked, thus, can carry out the easy mainteinance repair of the inside of lid 15 in this position according to the outside mode of peristome as Fig. 7 (c).
Also have, as Fig. 7 (d) by shown in the example, the mode that makes progress according to peristome, make lid 15 Rotate 180 degree, be locked in this position, thus, gas inside, not shown that can be positioned at lid 15 is supplied with the handling operation of the ground jack of slinging of first-class weight etc.
In addition, can according to above-mentioned opposite operation, lid 15 is installed on the matrix part 14.In addition, after installation, cover body opening/closing mechanism 200 is in such wait state shown in Figure 6 of lever arm 200a vertical folding.
Like this, a plurality of relatively vacuum processing chambers 10 (vacuum treatment installation 100) are provided with shared cover body opening/closing mechanism 200, maintain the on-off action of the lid 15 of operation etc., thus, but the space of economy system integral body, and the shared cost that causes that can realize cover body opening/closing mechanism descends.
(execution mode 2)
Below embodiments of the present invention 2 are described.
Fig. 8 is the vertical cross-section diagram of the base-board conveying device of expression embodiments of the present invention 2, Fig. 9 is the figure of contraction state of the base-board conveying device of expression embodiments of the present invention 2, and Figure 10 is the figure of elongation state of the base-board conveying device of embodiments of the present invention 2.In addition, Fig. 9 (a) and Figure 10 (a) are end view, and Fig. 9 (b) and Figure 10 (b) are plane graph.
This base-board conveying device 170 is identical with execution mode 1, is arranged in the load locking room 20 of vacuum treatment installation 100.This base-board conveying device 170 comprises: base portion 171, and this base portion 171 is arranged at the bottom of load locking room 20; Travelling arm 172, this travelling arm 172 slidably is arranged at base portion 171; As the slip pick-up part 173 of the supporting station of supporting substrates, this slip pick-up part 173 slidably is arranged at this travelling arm 172; As the motor 174 of drive source, this motor 174 drives the travelling arm 172 and the slip pick-up part 173 of the below that is arranged at base portion 171; Drive transmission mechanism 180, this drive transmission mechanism 180 passes to travelling arm 172 and pick-up part 173 with the actuating force of this motor 174.
Travelling arm 172 comprises pair of side plates 172a, 172b, this vertically is provided with side plate 172a, 172b, the mode of opening according to relative spacing is oppositely arranged, and the end of one of them is formed on protuberance 172c, the 172d of the state that in the specific length scope bottom is removed.In addition, between these side plates 172a, 172b, has drive transmission mechanism 180.In addition, as shown in Figure 8, in this outside to side plate 172a, 172b, be provided with guiding mechanism 175 and guiding mechanism 176, this guiding mechanism 175 is used to make slip pick-up part 173 slide relative arms 172 and slides, and this guiding mechanism 176 is used to make travelling arm 172 relative base portion 171 to slide.Above-mentioned guiding mechanism 175 comprises: guide rail 175a, and this guide rail 175a is installed on side plate 172a, the 172b; With guiding parts 175b, this guiding parts 175b is slidably chimeric with the guide rail 175a that is installed on the slip pick-up part 173.In addition, guiding mechanism 176 comprises: guide rail 176a, and this guide rail 176a is installed on side plate 172a, the 172b; Guiding parts 176b, this guiding parts 176b are slidably chimeric with the guide rail 176a that is installed on the base portion 171.
Drive transmission mechanism 180 has: travelling arm drive division 181 and slip pick-up part drive division 182.This travelling arm drive division 181 comprises: drive pulley 183, and this drive pulley 183 directly is connected with motor 174, the along continuous straight runs rotation; Driving belt 184, this driving belt 184, are fixed on the side plate 172a of travelling arm 172 by fixed part 184a, 184b around being hung on the drive pulley 183; A pair of free pulley 185a, 185b, this is arranged at the both sides of belt pulley 183 to free pulley 185a, 185b.This slip pick-up part drive division 182 comprises: belt pulley 187, this belt pulley 187 are fixed on the axle 186, and this is 186 according near the ways of connecting setting end of the opposite side with protuberance 172c, 172d of pair of side plates 172a, 172b; Belt pulley 189, this belt pulley 189 are fixed on the axle 188, and this is 188 according to the pars intermedia ways of connecting of pair of side plates 172a, 172b is provided with; First belt 190,190 of this first belts are located on belt pulley 187 and 189; First fixed part 191, this first fixed part 191 is fixed in base portion 171 with the bottom leap portion of first belt 190; Belt pulley 192, this belt pulley 192 is fixed on the above-mentioned axle 187 according to the mode with belt pulley 187 adjacency, and the diameter of this belt pulley 192 is greater than belt pulley 187; Belt pulley 194, this belt pulley 194 are fixed on the axle 193, and this is 193 according to near the ways of connecting setting end of the protuberance 172c of pair of side plates 172a, 172b, 172d side; Second belt 195,195 of this second belts are located on these belt pulleys 192,194; Second fixed part 196, this second fixed part 196 is fixed in the slip pick-up part with the top leap portion of second belt 195.In addition, according to the mode that second belt 195 is led along protuberance 172c, 172d belt pulley 197,198 is set.
In the base-board conveying device 170 of such formation,,, drive travelling arm 172 and slip pick-up part 173 by drive transmission mechanism 180 by driving motor 174 as drive source.At this moment, at first, the rotation of motor 174 drives the drive pulley 183 by travelling arm drive division 182, pass to driving belt 184, driving belt 184 is fixed on the side plate 172a of travelling arm 172, thus, travelling arm 172 slides along the direction shown in the arrow A from the state of Fig. 9.
At this moment, because first fixed part 191 of slip pick-up part drive division 182 makes the bottom leap portion of first belt 190 be fixed in bottom 171, so follow the slip of travelling arm 172 to move, first belt 190 moves along the arrow A direction, belt pulley 187 rotations.If belt pulley 187 rotations, then by be fixed thereon the axle 186, be fixed in belt pulley 192 rotations on the axle 186, second belt 195 moves along the arrow A direction, follow this action, by second fixed part 196, the slip pick-up part 173 that is fixed in the top leap portion of second belt 195 moves along the arrow A direction, from the contraction state of Fig. 9, be in the elongation state of Figure 10.
In this occasion, because belt pulley 187 and belt pulley 192 are fixed on the same axle 186,, determine the ratio of the displacement of first belt 190 and second belt 195 so pass through their diameter ratio, that is, and the ratio of the displacement of travelling arm 172 and slip pick-up part 173.Here, because the diameter of belt pulley 192 is greater than belt pulley 187, thus, the displacement of slip pick-up part 173 is greater than the displacement of travelling arm 172.Such as, if the diameter of belt pulley 192 be belt pulley 187 diameter n doubly, then as shown in Figure 10 (a) and (b), when travelling arm 172 displacement L, travelling arm 173 is on travelling arm 172, and the distance of mobile n * L, total displacement of slip pick-up part 173 are (n * L)+L.The n of this occasion can be set in the arbitrary value greater than 1.
Because like this, compare with the sliding stroke of travelling arm 172, can prolong the sliding stroke of the slip pick-up part 173 on it, even so the stroke of travelling arm 172 is had under the situation of restriction because of being contained in load locking room 20, still can make the stroke of slip pick-up part 173 abundant by suitably setting the diameter ratio of belt pulley 187 and belt pulley 192.Thus, only by a travelling arm 172 and a slip pick-up part 173, just in can transporting at the substrate between load locking room 20 and the vacuum processing chamber 10, guarantee the sliding stroke of abundant distance, compare with the linear motion type board device of the belt pulley of the such same size of employing and execution mode 1, the stacked quantity of travelling arm can be reduced, thus, the height of base-board conveying device can be reduced.
Consequently, can reduce to contain the volume of the load locking room 20 of base-board conveying device 170, shorten the required time of the vacuum exhaust of this load locking room 20, comprise that the productivity ratio of vacuum treatment operation of substrate G of the exhaust required time of load locking room 20 improves.Particularly, in the load locking room 20 of accommodating 1 limit so large-scale substrate G above 1m, horizontal sectional area increases, and the height of load locking room 20 is cut down the increase of the reduction effect that goes far towards volume, the shortening of exhaust required time.
In addition, from guaranteeing the bigger viewpoint of transporting distance, also can be according to more than 2 sections that travelling arm is stacked.Figure 11 is illustrated on the travelling arm 172, and the example of another travelling arm 172 ' is set.In this occasion, as travelling arm 172 ', also can adopt the structure identical with travelling arm 172, also can be the structure identical with the travelling arm 72,73 of execution mode 1.By making travelling arm 172 ', can guarantee the very big distance of transporting for the structure identical with travelling arm 172.
In addition, the base-board conveying device of present embodiment also can be suitable for according to 2 sections the slip pick-up part being set, and can distinguish the type of the turnover that realizes substrate independently.Figure 12 is the vertical cross-section diagram of the base-board conveying device of the such type of expression.This base-board conveying device 300 comprises hypomere conveyer portion 270 and epimere conveyer portion 270 '.
Epimere conveyer portion 270 ' comprising: base portion 271 '; Travelling arm 272 ', this travelling arm 272 ' slidably is arranged at base portion 271 '; As the slip pick-up part 273 ' of the supporting station of supporting substrates, this slip pick-up part 273 ' slidably is arranged on this travelling arm 272 '; As the motor 274 ' of drive source, this motor 274 ' drives the travelling arm 272 ' and the slip pick-up part 273 ' of the below of the base portion 271 that is arranged at hypomere conveyer portion 270; First drive transmission mechanism 280 ', this first drive transmission mechanism 280 ' passes to travelling arm 272 ' and pick-up part 273 ' with actuating force; With second drive transmission mechanism 290, this second drive transmission mechanism 290 passes to first drive transmission mechanism 280 ' with the actuating force of motor 274 '.In addition, the outside at pair of side plates 272a ', 272b ' is provided with: guiding mechanism 275 ', this guiding mechanism 275 ' are used to make slip pick-up part 273 ' slide relative arm 272 ' to slide; With guiding mechanism 276 ', this guiding mechanism 276 ' is used to make travelling arm 272 ' relative base portion 271 ' to realize sliding.The base portion 271 ' of epimere conveyer portion 270 ' is arranged on the pedestal 301 that is configured on the hypomere conveyer portion 270 (seeing Figure 12).
For the drive transmission mechanism 280 of above-mentioned hypomere conveyer portion 270 and first drive transmission mechanism 280 ' of epimere conveyer portion 270 ', as building block, drive pulley 283,283 ' is only described respectively, but, in fact, owing to have and above-mentioned drive transmission mechanism 180 identical structures, so other component omission.
On the other hand, second drive transmission mechanism 290 of above-mentioned epimere conveyer portion 270 ' has: drive pulley 291, and this drive pulley 291 is arranged at the inside of the base portion 271 of hypomere conveyer portion 270, directly is connected with motor 274 '; Be located at the belt pulley 292 of the end in the base portion 271 and open the belt of being located on belt pulley 291 and 292 293; Belt pulley 295, this belt pulley 295 are arranged at the belt pulley 292 corresponding positions in the base portion 271 ' with epimere conveyer portion 270 ', are connected and fixed by axle 294 and belt pulley 292; Belt pulley 296, this belt pulley 296 are arranged under the drive pulley 283 ' in the pedestal 271 '; With belt 297,297 of this belts are located on this belt pulley 295 and 296.In addition, in second drive transmission mechanism 290, the actuating force of motor 274 ' is passed to drive pulley 291, in addition,, pass to belt pulley 292 by belt 293.The rotation of this belt pulley 292 drives by axle 294, passes to belt pulley 295, in addition, by belt 297, passes to belt pulley 296, and the rotation of this belt pulley 296 drives the drive pulley 283 ' that passes to first drive transmission mechanism 280 '.
In such base-board conveying device 300, mode by CD-ROM drive motor 274, by drive transmission mechanism 280, the travelling arm 272 and the slip pick-up part 273 of hypomere conveyer portion 270 are slided, thus, the substrate of realizing epimere conveyer portion 270 transports, mode by CD-ROM drive motor 274 ', by second drive transmission mechanism 290 and first drive transmission mechanism 280 ', the travelling arm 272 ' and the slip pick-up part 273 ' of epimere conveyer portion 270 ' are slided, realize fully independently that with hypomere conveyer portion 270 substrate of epimere conveyer portion 270 ' transports.
Because like this, 2 sections conveyer portion can be set, transport substrate fully independently by 2 slip pick-up parts, so can improve the efficient that substrate transports significantly.In addition, make base portion 271 have spinfunction, thus, also can be used for the processing unit of the multi-cavity type that a plurality of process chambers are connected with loadlock may.In addition,, owing to can reduce the hop count of travelling arm, make highly lowlyer,, still can will highly remain on less degree even 2 sections conveyer portion is set like this at the base-board conveying device of present embodiment.
In addition, the invention is not restricted to the foregoing description, can in the scope of design of the present invention, carry out various distortion.Such as, the drive transmission mechanism of the sliding drive mechanism of execution mode 1 and execution mode 2 adopts belt, still, is not limited to this, also can adopt other transmission mechanism of chain, chain link, gear etc.
Also have, provided the occasion that adopts the planar display substrates of LCD, plasma display etc. as substrate, still, also can be used for other large substrate etc.
As mentioned above, base-board conveying device of the present invention is applicable to the base-board conveying device that is arranged in the vacuum treatment installation in the loadlock may adjacent with vacuum processing chamber.
Claims (10)
1. the cover body opening/closing mechanism of a vacuum processing chamber having matrix part and being arranged on the vacuum processing chamber of the lid on this matrix part in the mode that can freely load and unload, opens and closes described lid, it is characterized in that this cover body opening/closing mechanism comprises:
Chassis movably; With
Be arranged on the described chassis and the support portion of the chimeric described lid of support with being arranged on back shaft on the described lid.
2. the cover body opening/closing mechanism of vacuum processing chamber according to claim 1 is characterized in that:
Be be configured to a plurality of described vacuum processing chambers shared cover body opening/closing mechanism.
3. the cover body opening/closing mechanism of vacuum processing chamber according to claim 1 and 2 is characterized in that:
Described support portion is supported described lid and it is floated to vertical direction, breaks away from from described matrix part.
4. the cover body opening/closing mechanism of vacuum processing chamber according to claim 1 and 2 is characterized in that:
Described support portion is supported described lid and is moved it on the described chassis, opens described matrix part.
5. the cover body opening/closing mechanism of vacuum processing chamber according to claim 1 and 2 is characterized in that:
Described support portion is the parts that support described lid on described chassis in the mode that can rotate.
6. the cover body opening/closing mechanism of vacuum processing chamber according to claim 1 and 2 is characterized in that:
Described support portion is along being arranged on the parts that the pair of guide rails on the described chassis moves.
7. the cover body opening/closing mechanism of vacuum processing chamber according to claim 1 and 2 is characterized in that:
Described vacuum processing chamber is parts of handling planar display substrates.
8. the cover body opening/closing method of a vacuum processing chamber having matrix part and being arranged on the vacuum processing chamber of the lid on this matrix part in the mode that can freely load and unload, opens and closes described lid, it is characterized in that:
Make to be set to the shared cover body opening/closing mechanism of a plurality of described vacuum processing chambers, move to as the described vacuum processing chamber of purpose over against the position, this cover body opening/closing mechanism comprises: chassis movably; Be arranged on the described chassis and with being arranged on back shaft on the described lid support portion of the chimeric described lid of support,
Then, utilize described cover body opening/closing mechanism that described lid is floated upward, it is broken away from from described matrix part;
Then, described lid is moved on the described chassis, open described matrix part.
9. the cover body opening/closing method of vacuum processing chamber according to claim 8 is characterized in that:
Make the described lid rotation that moves on the described chassis.
10. the cover body opening/closing method of vacuum processing chamber according to claim 9 is characterized in that:
Also lock the described lid of rotation.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003154521 | 2003-05-30 | ||
| JP2003154521 | 2003-05-30 | ||
| JP2004146815 | 2004-05-17 | ||
| JP2004146815A JP4302575B2 (en) | 2003-05-30 | 2004-05-17 | Substrate transfer apparatus and vacuum processing apparatus |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB200410038397XA Division CN1326227C (en) | 2003-05-30 | 2004-05-27 | Substrate conveying device and conveying method, and vacuum disposal device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1971844A CN1971844A (en) | 2007-05-30 |
| CN100514550C true CN100514550C (en) | 2009-07-15 |
Family
ID=34196595
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB200410038397XA Expired - Lifetime CN1326227C (en) | 2003-05-30 | 2004-05-27 | Substrate conveying device and conveying method, and vacuum disposal device |
| CNB2006101645729A Expired - Lifetime CN100514550C (en) | 2003-05-30 | 2004-05-27 | Lid body opening/closing mechanism of vacuum processing chamber and method for opening/closing lid body |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB200410038397XA Expired - Lifetime CN1326227C (en) | 2003-05-30 | 2004-05-27 | Substrate conveying device and conveying method, and vacuum disposal device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4302575B2 (en) |
| KR (2) | KR100794807B1 (en) |
| CN (2) | CN1326227C (en) |
| TW (2) | TW200428566A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102420156A (en) * | 2010-09-28 | 2012-04-18 | 东京毅力科创株式会社 | Processing device and maintenance method thereof |
| CN106298589A (en) * | 2015-06-26 | 2017-01-04 | 泰拉半导体株式会社 | Base plate processing system |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100613265B1 (en) * | 2004-09-06 | 2006-08-21 | (주)아이씨디 | Vacuum treatment system and subject transfering method using the same |
| JP4716362B2 (en) * | 2005-06-07 | 2011-07-06 | 東京エレクトロン株式会社 | Substrate processing system and substrate processing method |
| JP4754304B2 (en) * | 2005-09-02 | 2011-08-24 | 東京エレクトロン株式会社 | Substrate processing apparatus, load lock chamber unit, and carrying-out method of transfer apparatus |
| TWI283005B (en) | 2005-12-28 | 2007-06-21 | Au Optronics Corp | Low-pressure process apparatus |
| JP4903027B2 (en) * | 2006-01-06 | 2012-03-21 | 東京エレクトロン株式会社 | Substrate transport device and substrate support |
| JP2007191278A (en) * | 2006-01-20 | 2007-08-02 | Tokyo Electron Ltd | Substrate conveying device, substrate conveying method and storage medium |
| JP4967717B2 (en) * | 2007-03-02 | 2012-07-04 | 中西金属工業株式会社 | Slide fork device |
| US10163667B2 (en) | 2007-03-22 | 2018-12-25 | Brooks Automation, Inc. | Linear wafer drive for handling wafers during semiconductor fabrication |
| JP5190303B2 (en) * | 2008-06-04 | 2013-04-24 | 東京エレクトロン株式会社 | Conveying device and processing device |
| CN101417747B (en) * | 2008-12-11 | 2011-11-23 | 友达光电股份有限公司 | Conveyer table mechanism |
| KR101175417B1 (en) * | 2009-11-27 | 2012-08-20 | 현대제철 주식회사 | a fall prvention device in cart moving pit |
| CN101831621B (en) * | 2010-04-08 | 2012-10-17 | 湖南金博复合材料科技有限公司 | Chemical vapor densification furnace body |
| JP5560909B2 (en) * | 2010-05-31 | 2014-07-30 | 東京エレクトロン株式会社 | Lid holding jig |
| DE102010022625A1 (en) * | 2010-06-04 | 2011-12-08 | Festo Ag & Co. Kg | Handling system for handling objects |
| JP5482500B2 (en) * | 2010-06-21 | 2014-05-07 | 東京エレクトロン株式会社 | Substrate processing equipment |
| JP5585238B2 (en) * | 2010-06-24 | 2014-09-10 | 東京エレクトロン株式会社 | Substrate processing equipment |
| CN103237634B (en) | 2010-10-08 | 2016-12-14 | 布鲁克斯自动化公司 | The vacuum robot of Driven by Coaxial |
| TWI402096B (en) * | 2011-01-20 | 2013-07-21 | China Steel Corp | Vacuum filter of the folding type movable cover device |
| KR101216717B1 (en) | 2011-02-25 | 2012-12-31 | 주식회사 영우디에스피 | Apparatus for transferring object |
| CN103010725B (en) * | 2011-09-27 | 2015-04-15 | 鸿富锦精密工业（深圳）有限公司 | Transfer mechanism |
| KR101460578B1 (en) | 2013-05-31 | 2014-11-13 | 주식회사 아스타 | Sample holder loading and unloading structure for vacuum system |
| CN104338883B (en) * | 2013-07-26 | 2016-05-04 | 秦皇岛戴卡兴龙轮毂有限公司 | Rotation of wheel forging press handling mould trolley |
| KR101585869B1 (en) * | 2014-02-24 | 2016-01-15 | 주식회사 아스타 | Apparatus for loading and unloading sample holder |
| DE102014209684B4 (en) * | 2014-05-21 | 2023-06-29 | Siemens Healthcare Gmbh | Medical examination and/or treatment device |
| JP6523838B2 (en) * | 2015-07-15 | 2019-06-05 | 東京エレクトロン株式会社 | Probe card transfer apparatus, probe card transfer method and probe apparatus |
| CN108091601A (en) * | 2016-11-23 | 2018-05-29 | 沈阳芯源微电子设备有限公司 | A kind of semiconductor long range wafer conveying device |
| KR20180063423A (en) * | 2016-12-01 | 2018-06-12 | 주식회사 탑 엔지니어링 | Apparatus for conveying substrate |
| JP6869136B2 (en) * | 2017-07-28 | 2021-05-12 | 日本電産サンキョー株式会社 | Industrial robot |
| CN108818598B (en) * | 2018-08-30 | 2024-03-19 | 深圳市德业智能股份有限公司 | Feeding device |
| CN109560032A (en) * | 2018-12-18 | 2019-04-02 | 深圳市矽电半导体设备有限公司 | A kind of feeding device, charging and discharging mechanism and feeding system |
| CN112027636A (en) * | 2019-06-03 | 2020-12-04 | 顺丰科技有限公司 | Linear stroke amplifying mechanism |
| TWI741338B (en) * | 2019-08-02 | 2021-10-01 | 鴻勁精密股份有限公司 | Electronic component transfer mechanism and its application job classification equipment |
| CN111660302A (en) * | 2020-07-13 | 2020-09-15 | 华东理工大学 | Intelligent dining table cleaning robot based on Internet of things |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR960002534A (en) * | 1994-06-07 | 1996-01-26 | 이노우에 아키라 | Pressure reducing and atmospheric pressure treatment device |
| DE29521292U1 (en) * | 1995-06-01 | 1997-02-13 | Samsung Electronics Co. Ltd., Kyungki-Do | Speed increasing device for a linear movement of an orthogonal coordinate robot |
| JPH09272095A (en) * | 1996-04-04 | 1997-10-21 | Nec Corp | Plate-shaped object conveying robot |
| JPH1116981A (en) * | 1997-06-20 | 1999-01-22 | Dainippon Screen Mfg Co Ltd | Substrate treatment equipment |
| JPH11121585A (en) * | 1997-10-17 | 1999-04-30 | Olympus Optical Co Ltd | Wafer carrier |
| JP2003100837A (en) * | 2001-09-21 | 2003-04-04 | Toyota Industries Corp | Transfer system |
-
2004
- 2004-05-17 JP JP2004146815A patent/JP4302575B2/en not_active Expired - Lifetime
- 2004-05-26 TW TW093114993A patent/TW200428566A/en not_active IP Right Cessation
- 2004-05-26 TW TW096117154A patent/TW200737395A/en not_active IP Right Cessation
- 2004-05-27 CN CNB200410038397XA patent/CN1326227C/en not_active Expired - Lifetime
- 2004-05-27 CN CNB2006101645729A patent/CN100514550C/en not_active Expired - Lifetime
- 2004-05-28 KR KR1020040038427A patent/KR100794807B1/en active IP Right Grant
-
2006
- 2006-02-16 KR KR1020060015256A patent/KR100654789B1/en active IP Right Grant
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102420156A (en) * | 2010-09-28 | 2012-04-18 | 东京毅力科创株式会社 | Processing device and maintenance method thereof |
| CN102420156B (en) * | 2010-09-28 | 2015-07-08 | 东京毅力科创株式会社 | Processing device and maintenance method thereof |
| CN106298589A (en) * | 2015-06-26 | 2017-01-04 | 泰拉半导体株式会社 | Base plate processing system |
| CN106298589B (en) * | 2015-06-26 | 2021-11-05 | 圆益Ips股份有限公司 | Substrate processing system |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200428566A (en) | 2004-12-16 |
| TWI349324B (en) | 2011-09-21 |
| JP2005019967A (en) | 2005-01-20 |
| JP4302575B2 (en) | 2009-07-29 |
| CN1971844A (en) | 2007-05-30 |
| KR20060025214A (en) | 2006-03-20 |
| CN1326227C (en) | 2007-07-11 |
| KR100654789B1 (en) | 2006-12-08 |
| CN1574271A (en) | 2005-02-02 |
| KR100794807B1 (en) | 2008-01-15 |
| TWI349325B (en) | 2011-09-21 |
| TW200737395A (en) | 2007-10-01 |
| KR20040103435A (en) | 2004-12-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100514550C (en) | Lid body opening/closing mechanism of vacuum processing chamber and method for opening/closing lid body | |
| KR101438150B1 (en) | Transport robot | |
| KR100778208B1 (en) | Apparatus for conveying substrate, method for conveying substrate, and system for processing substrate | |
| CN100365794C (en) | Substrate processing device | |
| KR101744372B1 (en) | Vacuum processing apparatus | |
| KR100705846B1 (en) | Substrate transporting apparatus, substrate transporting method and vacuum processing apparatus | |
| JP7137049B2 (en) | Article conveying device | |
| JP4302693B2 (en) | Lid opening / closing mechanism of vacuum processing chamber and lid opening / closing method | |
| JP2007073540A (en) | Substrate processing apparatus, load lock chamber unit, and method for carrying out conveying device | |
| CN101459100A (en) | Automatic conveying device for compact wafer | |
| JP5926694B2 (en) | Substrate relay device, substrate relay method, substrate processing apparatus | |
| KR20130087604A (en) | Deposition apparatus | |
| KR101688842B1 (en) | Substrate processing apparatus | |
| WO2016132651A1 (en) | Carrier transport device and carrier transport method | |
| TW200841414A (en) | Substrate conveyance system | |
| KR101462596B1 (en) | Substrate processing apparatus | |
| CN213356146U (en) | Automatic feeding structure of electroplating equipment | |
| JP2009147236A (en) | Vacuum processing apparatus | |
| KR100459102B1 (en) | Flat panel display apparatus adapted substrate transporting slider | |
| KR101473831B1 (en) | Transferring apparatus | |
| KR101216380B1 (en) | Thin film depositing apparatus | |
| JP2003062447A (en) | Opening/closing device of vacuum chamber | |
| JP2001260064A (en) | Depalletizer | |
| JP2018104143A (en) | Transport apparatus and transport method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20090715 |